Ultrahigh-temperature plasma joule heat heating device
By using the metal electrodes of carbon nanotube assemblies to generate plasma in a high-temperature thermal shock device, the problems of low temperature limit and complex operation are solved, 8000K high-temperature thermal shock is achieved, the sample preparation process is simplified, and the possibilities of material processing are expanded.
Patent Information
- Application Number
- CN202422221973.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-10
- Publication Date
- 2025-09-16
- Estimated Expiration
- 2034-09-10
AI Technical Summary
The existing high-temperature thermal shock device has a low upper temperature limit, cumbersome operation and complex sample preparation, which leads to limitations in material processing.
The carbon nanotube assembly is connected using a metal positive electrode and a metal negative electrode. The sample is placed between the discharge ends of the carbon nanotubes on both sides. Power is applied to generate plasma, achieving a high-temperature thermal shock of 8000K.
It breaks through the temperature limit of traditional Joule heating, provides more material processing possibilities, simplifies the operation process, and improves sample preparation efficiency.
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Figure CN223348819U_ABST
Abstract
Description
Technical Field
[0001] The utility model shows an ultra-high temperature plasma Joule heat heating device, belonging to the technical field of nano material heating devices. Background Art
[0002] Fast and efficient high-temperature thermal shock technology is a unique and novel method for preparing various nanomaterials for energy storage and conversion. The entire preparation process lasts only a few seconds or milliseconds, the heating / cooling rate can be as high as 105K / s, and the reaction temperature can reach above 3000K. The high-temperature thermal shock device mainly consists of four parts, namely DC power supply, heating reaction chamber, spectrometer and vacuum pump. Specifically, the sample material is connected to the copper sheet through conductive silver glue and fixed on the glass bracket, and the copper sheets at both ends of the sample are connected to the DC power supply. Turning on the power supply will trigger a high-temperature thermal shock; the spectrometer is used to record the emission spectrum and estimate the sample temperature; the blackbody radiation equation is used to fit the emission spectrum of the sample, and the instantaneous temperature of the conductive sample during the high-temperature thermal shock process can be analyzed.
[0003] However, the high-temperature thermal shock device in the existing technology uses Joule heat, and the upper limit of the heating temperature is 3000K, which makes it difficult to achieve a higher temperature, which in turn leads to many limitations in material processing. In addition, the existing heating process uses carbon cloth to wrap the sample, and then the cylindrical carbon cloth is clamped between two electrodes. This method is relatively cumbersome to operate, the sample preparation is complicated, and the sample wrapping is prone to leakage, resulting in sample production failure. Utility Model Content
[0004] The purpose of the utility model is to solve the problems of low temperature upper limit, cumbersome operation and complicated sample preparation of existing heating devices. To this end, an ultra-high temperature plasma Joule heat heating device is provided, which can break through the temperature limit of existing heating devices and is conducive to the preparation of more newer material structures.
[0005] To solve the above technical problems, the present invention adopts the following technical solutions:
[0006] A super-high temperature plasma Joule heat heating device is used to perform thermal shock on a sample, comprising a metal positive electrode and a metal negative electrode, both of which are connected to a carbon nanotube assembly, the carbon nanotube assembly comprising a substrate and a plurality of carbon nanotubes spaced apart on the substrate, the carbon nanotubes comprising a fixed end and a discharge end, the fixed end being fixedly connected to the substrate, the sample being located between the carbon nanotube discharge end of the metal positive electrode and the carbon nanotube discharge end of the metal negative electrode, the metal positive electrode and the metal negative electrode being energized so that the two discharge ends discharge and form a thermal shock on the sample.
[0007] The beneficial effects of adopting the utility model are:
[0008] The metal positive electrode and the metal negative electrode described in the utility model are both connected to a carbon nanotube assembly, and the sample is placed between the discharge ends of the two carbon nanotubes. The carbon nanotubes on both sides of the sample serve as two electrodes. When the metal positive electrode and the metal negative electrode are energized, the discharge ends of the carbon nanotubes on both sides of the sample discharge, thereby generating plasma. Instantaneous energization can generate a high temperature of 8000K, thereby significantly breaking through the temperature limit of traditional Joule heat heating, thereby providing more possibilities for sample processing and facilitating the preparation of more newer material structures.
[0009] Preferably, both the metal positive electrode and the metal negative electrode are provided with positioning grooves, and the substrate is fixedly installed in the positioning grooves.
[0010] Preferably, the discharge ends of all carbon nanotubes on the substrate form a discharge region, and the entire sample is located in the discharge region.
[0011] Preferably, the heating device also includes a mounting frame, which includes a base and a movable arm. The movable arm is located on the upper side of the base and can reciprocate in the vertical direction. One of the metal positive electrode and the metal negative electrode is placed on the base and is used to place the sample, and the other is fixed to the bottom of the movable arm.
[0012] Preferably, the substrate is circular, the carbon nanotubes are arranged in a circular shape on the substrate, and the overall structure of the metal positive electrode and the metal negative electrode matches the substrate.
[0013] Preferably, the substrate is square, the carbon nanotubes are arranged in a square shape on the substrate, and the overall structure of the metal positive electrode and the metal negative electrode matches the substrate.
[0014] Preferably, the distribution density of the carbon nanotubes on the substrate is M, and 100 CNTs / μm 2 ≤M≤200CNTs / μm 2 The diameter of the carbon nanotubes in this embodiment is D, and 2nm≤D≤20nm
[0015] Other features and advantages of the present invention will be disclosed in detail in the following specific embodiments and drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] The present invention will be further described below with reference to the accompanying drawings:
[0017] Figure 1 This is an exploded view of an ultra-high temperature plasma Joule heat heating device of the utility model;
[0018] Figure 2 This is an exploded view of a square substrate in an ultra-high temperature plasma Joule heat heating device of the utility model.
[0019] Reference numerals: 11, metal positive electrode; 111, positioning groove; 12, metal negative electrode; 21, substrate; 22, carbon nanotube; 221, discharge end; 222, fixed end. DETAILED DESCRIPTION
[0020] The following is an explanation and description of the technical solutions of the embodiments of the present invention in conjunction with the drawings of the embodiments of the present invention, but the following embodiments are only preferred embodiments of the present invention and are not exhaustive. Based on the embodiments in the embodiments, other embodiments obtained by those skilled in the art without creative work are all within the scope of protection of the present invention.
[0021] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "clockwise", "counterclockwise" and the like to indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present invention.
[0022] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referenced. Thus, a feature identified as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of this utility model, "plurality" means two or more, unless expressly limited otherwise.
[0023] In this utility model, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integral connection; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on specific circumstances.
[0024] like Figure 1As shown, this embodiment demonstrates an ultra-high temperature plasma Joule heat heating device, which is used to perform thermal shock on a sample to achieve the production of nanomaterials. The heating device includes a metal positive electrode 11 and a metal negative electrode 12. The metal positive electrode 11 and the metal negative electrode 12 are both connected to a carbon nanotube 22 assembly. The carbon nanotube 22 assembly includes a substrate 21 and a plurality of carbon nanotubes 22 spaced apart on the substrate 21, wherein the two substrates 21 are fixedly connected to the metal positive electrode 11 and the metal negative electrode 12, respectively, and the two substrates 21 maintain electrical conduction with the metal positive electrode 11 and the metal negative electrode 12, respectively. The carbon nanotube 22 includes a fixed end 222 and a discharge end 221, and the fixed end 222 is fixedly connected to the substrate 21. The sample is located between the discharge end 221 of the carbon nanotube 22 of the metal positive electrode 11 and the discharge end 221 of the metal negative electrode 12. The metal positive electrode 11 and the metal negative electrode 12 are energized to cause the two discharge ends 221 to discharge and form a thermal shock on the sample.
[0025] In this embodiment, the metal positive electrode 11 and the metal negative electrode 12 are both connected to a carbon nanotube 22 assembly. The sample is placed between the discharge ends 221 of the two carbon nanotubes 22. The carbon nanotubes 22 on both sides of the sample serve as two electrodes. When the metal positive electrode 11 and the metal negative electrode 12 are energized, the discharge ends 221 of the carbon nanotubes 22 on both sides of the sample discharge, thereby generating plasma. Instantaneous energization can generate a high temperature of 8000K, which can significantly break through the temperature limit of traditional Joule heat heating, thereby providing more possibilities for sample processing and facilitating the preparation of more newer material structures.
[0026] The heating device in this embodiment further comprises a mounting frame, which comprises a base and a movable arm. The movable arm is located on the upper side of the base and can reciprocate in the vertical direction. One of the metal positive electrode 11 and the metal negative electrode 12 is placed on the base, and the other is fixed to the bottom of the movable arm. Figure 1 As shown, the metal negative electrode 12 in this embodiment is on the lower side, and the metal positive electrode 11 is on the upper side, that is, the metal negative electrode 12 is placed on the base, and the metal positive electrode 11 is fixed to the bottom of the movable arm, and the movable arm reciprocates in the vertical direction, thereby driving the metal positive electrode 11 to approach or move away from the metal negative electrode 12.
[0027] In this embodiment, the metal positive electrode 11 and the metal negative electrode 12 are both provided with a positioning groove 111, and the substrate 21 is fixedly installed in the positioning groove 111. Since the overall strength of the substrate 21 is relatively low, the substrate 21 is fixed in the positioning groove 111 of the metal positive electrode 11 or the metal negative electrode 12. The metal positive electrode 11 or the metal negative electrode 12 can wrap the substrate 21, thereby protecting the substrate 21, helping to reduce the possibility of damage to the substrate 21 due to collision, and thus significantly increasing the service life of the substrate 21. As can be understood, in other embodiments, the substrate 21 can also be an integrated structure with the metal positive electrode 11 or the metal negative electrode 12, that is, a plurality of carbon nanotubes 22 are directly spaced apart on the metal positive electrode 11 and the metal negative electrode 12.
[0028] During the thermal shock process on the sample, the movable arm is first controlled to move upward, thereby separating the metal positive electrode 11 and the metal negative electrode 12 from each other, and the sample is placed on the carbon nanotubes 22 of the metal negative electrode 12. Then, the movable arm is controlled to move downward, so that the carbon nanotubes 22 of the metal positive electrode 11 move downward and approach the sample until the discharge end 221 contacts the sample. Finally, the metal positive electrode 11 and the metal negative electrode 12 are energized, and the carbon nanotubes 22 on the upper and lower sides of the sample are vertically distributed, so that the carbon nanotubes 22 on the upper and lower sides of the sample serve as the upper and lower electrodes. After power is applied, a uniform and vertical ultra-high temperature plasma can be generated. The temperature of the plasma can be as high as 8000K, which can significantly break through the temperature limit of traditional Joule heat heating, thereby providing more possibilities for sample processing and facilitating the preparation of more newer material structures.
[0029] In order to ensure that the entire sample receives sufficient thermal shock, the discharge ends 221 of all carbon nanotubes 22 on the substrate 21 in this embodiment form a discharge area, and the entire sample is within the discharge area, thereby enabling the entire sample to be heated under the action of ultrahigh temperature plasma.
[0030] like Figure 1 As shown, in this embodiment, the substrate 21 is circular in shape, the carbon nanotubes 22 are arranged in a circular shape on the substrate 21, and the overall structure of the metal positive electrode 11 and the metal negative electrode 12 matches the substrate 21, that is, the overall structure of the metal positive electrode 11 and the metal negative electrode 12 are both circular. Of course, it can be understood that Figure 2 As shown, in other embodiments, the substrate 21 as a whole may also be square, the carbon nanotubes 22 are arranged in a square shape on the substrate 21, and the overall structure of the metal positive electrode 11 and the metal negative electrode 12 matches the substrate 21, that is, the overall structure of the metal positive electrode 11 and the metal negative electrode 12 are both square.
[0031] In this embodiment, the distribution density of the carbon nanotubes 22 on the substrate 21 is M, and 100 CNTs / μm 2≤M≤200CNTs / μm 2 .
[0032] In this embodiment, the diameter of the carbon nanotube 22 is D, and 2 nm ≤ D ≤ 20 nm.
[0033] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Those skilled in the art will understand that the present invention includes, but is not limited to, the contents described in the accompanying drawings and the above specific embodiments. Any modifications that do not deviate from the functional and structural principles of the present invention are intended to be included within the scope of the claims.
Claims
1. An ultra-high temperature plasma Joule heating device, the heating device is used to perform thermal shock on a sample, characterized by: It includes a metal positive electrode and a metal negative electrode, both of which are connected to a carbon nanotube assembly. The carbon nanotube assembly includes a substrate and a plurality of carbon nanotubes spaced apart on the substrate. The carbon nanotubes include a fixed end and a discharge end. The fixed end is fixedly connected to the substrate. The sample is located between the carbon nanotube discharge end of the metal positive electrode and the carbon nanotube discharge end of the metal negative electrode. The metal positive electrode and the metal negative electrode are energized to cause the two discharge ends to discharge and form a thermal shock on the sample.
2. The ultrahigh temperature plasma Joule heating device according to claim 1, characterized in that: The metal positive electrode and the metal negative electrode are both provided with positioning grooves, and the substrate is fixedly installed in the positioning grooves.
3. The ultrahigh temperature plasma Joule heating device according to claim 1, characterized in that: The discharge ends of all carbon nanotubes on the substrate form a discharge region, and the entire sample is within the discharge region.
4. The ultrahigh temperature plasma Joule heating device according to claim 1, characterized in that: The heating device also includes a mounting frame, which includes a base and a movable arm. The movable arm is located on the upper side of the base and can reciprocate in the vertical direction. One of the metal positive electrode and the metal negative electrode is placed on the base and is used to place the sample, and the other is fixed to the bottom of the movable arm.
5. The ultrahigh temperature plasma Joule heating device according to claim 1, characterized in that: The substrate is circular, the carbon nanotubes are arranged in a circular shape on the substrate, and the overall structure of the metal positive electrode and the metal negative electrode matches the substrate.
6. The ultrahigh temperature plasma Joule heating device according to claim 1, characterized in that: The substrate is square in shape, the carbon nanotubes are arranged on the substrate in a square shape, and the overall structure of the metal positive electrode and the metal negative electrode matches the substrate.