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191 results about "Advanced materials" patented technology

Layer combination controllable carbon material with nano pole of different scale, preparation method and application

InactiveCN101054171AEfficient ion transport capabilityControllable ratioScale structureHigh energy
The invention relates to a method for design advanced materials with nano-scaled structure and techniques for preparing same. In particular, the invention relates to a carbon material capable of controllable laminated combination with the nano-holes of variable sizes and preparation and application thereof. The method comprises the steps of: preparing metal oxide sol in the alkali solution system, which is then mixed with an alcohol solution of an alcohol-soluble resin; the oxide sol being used as the template and water being the resin precipitation agent during the process to directly prepare resin/oxide sol composite system. After solvent removal, carbonization, activation and template removal processes, the carbon material with laminated nano-holes combination is prepared which is of controllable micro-holes proportion, controllable medium-holes aperture and proportion, controllable big-holes aperture and propotion and concentrated distribution of medium-holes and big-holes apertures. The carbon material capable of controllable laminated combination with the nano-holes of variable sizes prepared in the invention is characterized in laminated holes structure, excellent ion transfer performances and high electrochemical active specific surface area and the material is expected to be used as high energy density high power density electrochemical capacitor used electrode material.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI

Projection electron-beam lithography masks using advanced materials and membrane size

A stencil or scatterer mask for use with charged particle beam lithography such as projection electron-beam lithography comprises a membrane layer of a material having a Young's modulus of at least about 400 GPa and support struts supporting a surface of the membrane. The struts form and surrounding a plurality of discrete membrane areas of different aspect ratios aligned to design regions of an integrated circuit. The discrete membrane areas have different aspect ratios range from about 1:1 to about 12:1, and the discrete membrane areas have different size surface areas. The membrane is preferably silicon carbide, diamond, diamond-like carbon, amorphous carbon, carbon nitride or boron nitride. When used in scatterer masks, the ratio of discrete membrane area to membrane thickness is at least about 0.18 mm2/nm. When used in stencil masks, the ratio of discrete membrane area to membrane thickness is at least about 1.0 mm2/nm. The stencil mask is made by depositing a diamond membrane film patterned with a hardmask layer on a substrate, depositing an etch stop layer adjacent the diamond film, and forming supporting struts surrounding a plurality of discrete areas of the membrane film. The method then includes depositing a pattern over the membrane film within the discrete membrane film areas, the pattern conforming to one or more desired circuit elements, and etching the membrane film with a reactive ion etch containing oxygen to form openings in the membrane film.
Owner:IBM CORP

Manufacturing method of micro-nano structure capable of accurately controlling depth

The invention relates to a manufacturing method of a micro-nano structure capable of accurately controlling depth, which belongs to the technical field of processing of advanced materials and micro-nano structures. The manufacturing method comprises the following steps: selecting an etching resistant material to form an etching cutoff layer, and forming a structural material layer with the thickness being target depth on the surface of the etching cutoff layer by utilizing a film technique; then coating the surface of the structural layer with a layer of etching resistant agent, and manufacturing the required micro-nano structure on the etching resistant agent by utilizing a micro-nano processing technique; with the micro-nano structure on the etching resistant agent as a mask, transferring the micro-nano structure onto the structural material layer by utilizing an etching transferring process until the micro-nano structure reaches the etching cutoff layer with etching resistance, and stopping etching; and removing the etching resistant agent which remains on the structural layer so as to obtain the micro-nano structure of which the depth is up to a target value, wherein the depth precision is increased to + / -5 nanometers. The manufacturing method has the advantages of low cost, large local processing figure area, high precision and good uniformity, and wide application of high-precision optical devices to scientific research and production is promoted.
Owner:INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI

Graphene/bacterial cellulose composite material with gradient structure and preparation method thereof

The invention discloses a preparation method of a graphene/bacterial cellulose composite material with a gradient structure. A membrane liquid interface culture method is adopted. The preparation method mainly comprises preparing a culture medium and preparing a base membrane for culturing graphene/bacterial cellulose as a membrane liquid interface; preparing mixed media of graphene/nonvaccinatedmedia in various volume ratios (concentrations); spraying the mixed media of the grapheme in different concentrations in the mist form to the base membrane for multiple times according to the change of the concentration of the graphene in the mixed media from low to high based on the spraying sequence to achieve membrane and liquid contact. The next spraying is conducted each time after the mixedmedia on the membrane surface are consumed, so that the grapheme/bacterial cellulose composite material with the ratio of the graphene and the bacterial cellulose in the gradient change in the thickness direction is formed. The composite material can provide materials for preparing novel advanced materials such as biomimetic biomaterials, electromagnetic gradient materials and conductive gradientfunctional materials.
Owner:EAST CHINA JIAOTONG UNIVERSITY

Method for printing combustion chamber lining by using GRCop-42 spherical powder

The invention discloses a method for printing a combustion chamber lining by using GRCop-42 spherical powder. The GRCop-42 alloy spherical powder comprises the following chemical components in percentage by weight: 2-4wt% of Cu, 2-4wt% of Cr and Nb. The method comprises the following steps of: 1) heating the spherical powder in vacuum, cooling the spherical powder along with a furnace, then performing ultrasonic vibration, screening the spherical powder and preparing to discharge the spherical powder into the furnace; 2) establishing a process model of a part, and slicing the model in layers to form a laser scanning path of each layer; 3) setting process parameters of powder laying and printing equipment, placing a rear bottom plate substrate, and fully laying the GRCop-42 spherical powderin a powder cylinder; 4) starting the equipment and starting printing and forming; 5) after laser scans one layer, descending a forming cylinder by one layer, then ascending the powder cylinder by one layer, laying a layer of copper powder on the processed layer surface by using the powder in the powder cylinder through a scraper, then descending the powder cylinder, and repeating the steps on each layer until the printing of the structure is finished; 6) performing annealing treatment; and 7) cutting and separating the structure from the substrate, and performing sand blasting on the surfaceof the structure. The method solves the problem of domestic application of advanced materials, and meets the preparation requirement of an aerospace copper alloy structure.
Owner:SHAANXI SIRUI ADVANCED MATERIALS CO LTD

Ultra-fast preparation method of Bi nanoparticles and surface defects co-modified BiOCl nanosheets

InactiveCN110540239ABroaden the optical absorption bandwidthHigh photothermal performanceMaterial nanotechnologyBismuth compoundsFreeze-dryingOxygen
The invention discloses an ultra-fast preparation method of Bi nanoparticles and surface defects co-modified BiOCl nanosheets. The preparation method comprises the following steps: (1) adding the prepared BiOCl nanosheets and a certain amount of NaN3 into deionized water, magnetically stirring the mixture for 30 minutes for uniform mixing, slowly pouring the mixture into liquid nitrogen for rapidfreezing, and carrying out freeze-drying; and (2) after the drying is finished, placing a BiOCl and NaN3 mixture in a closed high-temperature reaction kettle, filling the kettle with nitrogen protection gas, carrying out a deflagration reaction on the NaN3 by adopting a heating wire heating mode, repeatedly cleaning products by using the deionized water after the reaction is finished, carrying outdrying, and finally obtaining the Bi nanoparticles and surface defects co-modified BiOCl nanosheets. The preparation method has the advantages of short reaction time, simultaneous completion of formation of BiOCl oxygen defects and doping of Bi nanoparticles, controllable defect and doping amount, high yield and the like; and moreover, the method is simple, the operation is simple and convenient,the universality is good, and the method can be used for preparing other advanced materials.
Owner:INST OF CHEM MATERIAL CHINA ACADEMY OF ENG PHYSICS
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