Particle beam component measurement device
Through the design of the cryogenic pump system and the gas source alignment setting, the problem of accuracy in particle beam composition measurement under high background partial pressure is solved, particle beam composition measurement with high signal-to-noise ratio is achieved, and measurement accuracy is improved.
Patent Information
- Application Number
- CN202422408762.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-08
- Publication Date
- 2025-09-30
- Estimated Expiration
- 2034-10-08
AI Technical Summary
Existing particle beam composition measurement devices have a low signal-to-noise ratio in a high-background partial pressure environment, which affects the accuracy of the measurement results. This is especially true when measuring the cracking efficiency of gas cracking sources such as hydrogen, nitrogen, and oxygen, making it difficult to achieve high-precision detection.
A cryogenic pump system is used to provide an ultra-high vacuum environment by low-temperature adsorption of interfering molecules. The gas source is aligned with the residual gas analyzer to reduce collisions between the particle beam and cavity components, reduce interfering molecule detection, and improve measurement accuracy.
It achieves accurate measurement of particle beam components under low background partial pressure, reduces the influence of interfering molecules, and improves the measurement accuracy and signal-to-noise ratio of the beam source.
Smart Images
Figure CN223401050U_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the technical field of vacuum equipment, and in particular to a particle beam composition measuring device. Background Art
[0002] The particle beam composition measurement device commonly used at present is the residual gas analyzer (RGA). The residual gas analyzer is a mass spectrometer based on a quadrupole mass detector. It generates ions by ionizing molecules / atoms and measures the current of ions with different mass-to-charge ratios to obtain the partial pressures of different particles. In a vacuum system, due to the high content of molecules such as hydrogen, nitrogen, oxygen, and water, their partial pressures increase rapidly as the temperature rises. When using a residual gas analyzer to detect particle beams containing these molecules, due to the large background partial pressure, a larger particle beam current is often required to be detected. For example, when using a residual gas analyzer to measure the cracking efficiency of gas cracking sources such as hydrogen / nitrogen / oxygen, the signal-to-noise ratio is very low under small beam currents, which seriously affects the test results. Utility Model Content
[0003] The present disclosure provides a particle beam composition measurement device, comprising:
[0004] Vacuum chamber;
[0005] a gas source, vacuum-tightly connected to the vacuum chamber, for generating a particle beam;
[0006] a cryogenic pump, comprising a pump chamber, the pump chamber being vacuum-sealed and in communication with the vacuum chamber, the pump chamber comprising an interface for a residual gas analyzer; and
[0007] The residual gas analyzer is vacuum-sealedly connected to the residual gas analyzer interface and is used to measure the gas composition in the pump cavity.
[0008] In some embodiments of the present disclosure, the residual gas analyzer includes a measurement probe located in a pump cavity of a cryopump.
[0009] In some embodiments of the present disclosure, a cryogenic pump comprises:
[0010] at least one cold head, one or more of the at least one cold head being disposed within a pump chamber of the cryopump; and
[0011] The cold umbrella is thermally coupled to one or more cold heads. The cold umbrella is arranged in the pump cavity of the cryopump and around the measuring probe.
[0012] In some embodiments of the present disclosure, the particle beam composition measurement device further includes a cold screen, which is arranged around the measurement probe of the residual gas analyzer. The end of the cold screen close to the gas source includes a channel for gas to pass through, and the cold screen and the measurement probe include a channel for gas to pass through.
[0013] In some embodiments of the present disclosure, a cold shield is disposed between a measuring probe of the residual gas analyzer and a cold umbrella, and a channel for gas to pass through is included between the cold umbrella and the cold shield.
[0014] In some embodiments of the present disclosure, the cold umbrella includes a plurality of cold umbrella sheets stacked at intervals, the cold umbrella sheets are bowl-shaped, the plurality of cold umbrella sheets include at least one bottom cold umbrella sheet located at the bottom of the measuring probe, the lower end surface of the bottom cold umbrella sheet includes a gas passage hole that allows gas to pass through and is aligned with the measuring probe, the plurality of cold umbrella sheets also include at least one surrounding cold umbrella sheet that is not located at the bottom of the measuring probe, the lower end surface of the surrounding cold umbrella sheet includes a through hole for accommodating the measuring probe or the cold screen.
[0015] In some embodiments of the present disclosure, at least one cold head includes a primary cold head and a secondary cold head, the primary cold head is thermally coupled to the secondary cold head, and the secondary cold head is thermally coupled to the cold umbrella.
[0016] In some embodiments of the present disclosure, the gas source is aligned with the residual gas analyzer.
[0017] In some embodiments of the present disclosure, the cryopump further comprises:
[0018] a refrigerator, connected to the pump chamber in a vacuum-tight manner;
[0019] a temperature sensor for measuring the temperature of at least one cold head and / or the pump chamber;
[0020] a temperature controller connected to the secondary cold head and used to display the temperature of the secondary cold head; and / or
[0021] The cryogenic pump also includes:
[0022] The first-stage baffle is arranged at the far end of the pump chamber, and comprises a gas passage hole which is aligned with the measuring probe and allows gas to pass through.
[0023] In some embodiments of the present disclosure, the particle beam composition measurement device further includes:
[0024] a backing pump, connected to the vacuum chamber in a vacuum-tight manner; and / or
[0025] a vacuum gauge, connected to the vacuum chamber in a vacuum-tight manner, for measuring the pressure of the vacuum chamber; and / or
[0026] The terminal device is connected to the residual gas analyzer and is used to receive, display and / or analyze data from the residual gas analyzer.
[0027] In some embodiments of the present disclosure, the pump chamber of the cryopump is vacuum-tightly connected to the vacuum chamber via a gate valve.
[0028] According to some embodiments of the present disclosure, the particle beam composition measurement device can bring beneficial technical effects. For example, in some embodiments of the present disclosure, when using a residual gas analyzer to detect a particle beam, the particle beam composition measurement device uses a cryogenic pump to obtain an ultra-high vacuum environment. At the same time, the cryogenic pump is used to adsorb interfering molecules at low temperatures, reduce the background partial pressure, and provide a pure detection environment for the residual gas analyzer to accurately detect the beam source components. For another example, the residual gas analyzer is directly connected to the pump cavity of the cryogenic pump, which can further reduce interfering molecules and improve the measurement accuracy of the beam source. For another example, in some embodiments of the present disclosure, the particle beam composition measurement device is aligned with the residual gas analyzer. The particle beam generated by the gas source is coaxial with the residual gas analyzer, and the particle beam movement path is short, which reduces the probability of collision between particles and between particles and other cavity components, thereby reducing the interfering molecules generated after the particle collision from being detected by the residual gas analysis. At the same time, because the particle beam is evenly distributed in each radial direction, the alignment setting can reduce the error between the detected proportion of each particle and the actual proportion, thereby improving the accuracy of the particle beam composition measurement. BRIEF DESCRIPTION OF THE DRAWINGS
[0029] In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only one embodiment of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0030] Figure 1 A schematic structural diagram of a particle beam composition measurement device according to some embodiments of the present disclosure is shown;
[0031] Figure 2 A schematic structural diagram of a cryopump according to some embodiments of the present disclosure is shown;
[0032] Figure 3 A schematic structural diagram of a cold umbrella according to some embodiments of the present disclosure is shown;
[0033] In the above drawings, the reference numerals represent:
[0034] 100-Particle beam composition measurement device
[0035] 110-Vacuum chamber
[0036] 120-Gas Source
[0037] 130-Cryogenic Pump
[0038] 131-Pump chamber
[0039] 1311-Residual Gas Analyzer Interface
[0040] 1312-Radiation Protection Screen
[0041] 132-Cold Head
[0042] 1321-Level 1 Cold Head
[0043] 1322-Secondary Cold Head
[0044] 133-cold umbrella
[0045] 1331a, 1331b, 1331c, 1331d, 1331e, 1331f, 1331g, 1331h - cooling fins 1332a, 1332b - cooling fin mounting base
[0046] 134-Refrigerator
[0047] 135-Temperature Controller
[0048] 136-Compressor
[0049] 137-Helium tube
[0050] 138-Flange
[0051] 139-First level baffle
[0052] 140-Residual Gas Analyzer
[0053] 141-Measuring probe
[0054] 150-cold screen
[0055] 160-foreline pump
[0056] 170-Vacuum Gauge
[0057] 180-Terminal Equipment
[0058] 190-Slide Valve DETAILED DESCRIPTION
[0059] Some embodiments of the present disclosure will be described below in conjunction with the accompanying drawings. Obviously, the described embodiments are only exemplary embodiments of the present disclosure, rather than all embodiments.
[0060] In the description of the present disclosure, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", "top", "bottom", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present disclosure. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance. In the description of the present disclosure, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", and "coupled" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal connection of two elements. In the description of the present disclosure, the distal end or distal side refers to the end or side that extends into a vacuum environment (e.g., a vacuum chamber), and the proximal end or proximal side refers to the end or side opposite to the distal end or distal side (e.g., the end or side away from the vacuum chamber, or the end or side within the vacuum chamber close to the vacuum chamber wall, etc.). Alternatively, the end or side close to the driving device is the proximal end or proximal side, and the end or side away from the driving device is the distal end or distal side. For those of ordinary skill in the art, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.
[0061] Figure 1 A schematic structural diagram of a particle beam composition measurement device 100 according to some embodiments of the present disclosure is shown. Figure 2 FIG. 1 shows a schematic structural diagram of a cryopump 130 according to some embodiments of the present disclosure.
[0062] like Figure 1 As shown, in some embodiments of the present disclosure, a particle beam composition measurement apparatus 100 may include a vacuum chamber 110, a gas source 120, a cryopump 130, and a residual gas analyzer 140. The gas source 120 is vacuum-tightly connected to the vacuum chamber 110 for generating a particle beam.
[0063] like Figure 2 As shown, the cryopump 130 may include a pump chamber 131. The pump chamber 131 is vacuum-tightly connected to and communicates with the vacuum chamber 110. The pump chamber 131 may include a residual gas analyzer interface 1311. The residual gas analyzer 140 is vacuum-tightly connected to the residual gas analyzer interface 1311 for measuring the gas composition within the pump chamber 131.
[0064] In some embodiments of the present disclosure, the particle beam composition measurement device 100, when using a residual gas analyzer 140 to detect a particle beam (e.g., a particle beam from a gas cracking source such as hydrogen, nitrogen, or oxygen), uses a cryopump 130 to achieve a vacuum environment. Simultaneously, the cryopump 130 performs cryogenic adsorption on interfering molecules (e.g., hydrogen, nitrogen, oxygen, water, and other molecules in the vacuum chamber), thereby reducing the background partial pressure and providing a pure detection environment for the residual gas analyzer 140 to accurately detect the particle beam components. Furthermore, the residual gas analyzer 140 is directly connected to the pump chamber 131 of the cryopump 130, which can further reduce interfering molecules and improve the measurement accuracy of the beam source.
[0065] In some embodiments, the gas source 120 may include a hydrogen pyrolysis source, an oxygen pyrolysis source, or a radio frequency plasma source. For example, a hydrogen pyrolysis source heats hydrogen gas to break it down into hydrogen atoms, which can be used in a molecular beam epitaxy system for sample processing or growth assistance. The particle beam composition measurement apparatus 100 of some embodiments of the present disclosure measures the particle beam composition of the gas source 120, and the process parameters of the gas source can be adjusted based on the measurement results to optimize the process effect.
[0066] like Figure 2 As shown, in some embodiments of the present disclosure, the residual gas analyzer 140 may include a measurement probe 141 . The measurement probe 141 is located in the pump cavity 131 of the cryopump 130 .
[0067] In some embodiments, the residual gas analyzer 140 can employ various suitable structures and designs, which are not limited in this disclosure. The residual gas analyzer 140 can be used to perform qualitative and quantitative analysis of the gas in the vacuum chamber 110. In some embodiments, the residual gas analyzer 140 can include a quadrupole probe, an electronic control unit, and control software for data acquisition and analysis and probe control.
[0068] like Figure 2 As shown, in some embodiments of the present disclosure, the cryopump 130 may include at least one cold head 132 (e.g., a primary cold head 1321 and a secondary cold head 1322) and a cold umbrella 133. One or more cold heads 132 (e.g., a secondary cold head 1322) of the at least one cold head 132 may be disposed within the pump chamber 131 of the cryopump 130. The cold umbrella 133 is thermally coupled to the one or more cold heads 132 (e.g., the secondary cold head 1322), and is disposed within the pump chamber 131 of the cryopump 130 and surrounding the measurement probe 141.
[0069] In some embodiments of the present disclosure, the cold umbrella 133 condenses molecules such as hydrogen, nitrogen, oxygen, and water in the vacuum chamber 110, thereby reducing the impact of interfering molecules on the measurement accuracy of the residual gas analyzer 140. Those skilled in the art will appreciate that, in some embodiments, activated carbon may also be provided on the cold umbrella 133 to adsorb molecules such as hydrogen.
[0070] like Figure 2 As shown, in some embodiments of the present disclosure, the particle beam composition measurement device 100 may further include a cold shield 150. The cold shield 150 is disposed around the measurement probe 141 of the residual gas analyzer 140. The end of the cold shield 150 close to the gas source 120 includes a channel for gas to pass through, and a channel for gas to pass through is included between the cold shield 150 and the measurement probe 141.
[0071] like Figure 2 As shown, in some embodiments, cold shield 150 is cylindrical, for example, with a circular, triangular, or quadrilateral cross-section. The proximal end of cold shield 150 is connected to residual gas analyzer interface 1311 of pump chamber 131. The measurement probe 141 of residual gas analyzer 140 passes through residual gas analyzer interface 1311 and is located within cold shield 150.
[0072] like Figure 2 As shown, in some embodiments of the present disclosure, a cold shield 150 is disposed between the measurement probe 141 of the residual gas analyzer 140 and the cold umbrella 133. In some embodiments, by adding the cold shield 150 around the measurement probe 141 of the residual gas analyzer 140, the effect of heat from the operation of the residual gas analyzer 140 on the cold umbrella 133 can be reduced, allowing the cold umbrella to maintain a good working condition, thereby ensuring the accuracy of the measurement of the residual gas analyzer 140.
[0073] Figure 3 A schematic structural diagram of a cold umbrella 133 according to some embodiments of the present disclosure is shown.
[0074] like Figure 3As shown, in some embodiments, the cold umbrella 133 includes multiple cold umbrella fins (e.g., cold umbrella fins 1331a, 1331b, 1331c, 1331d, 1331e, 1331f, 1331g, and 1331h) stacked at intervals. The cold umbrella fins are bowl-shaped, for example, a hollow frustum that is wide at the top and narrow at the bottom and does not include an upper end surface. The multiple cold umbrella fins may include at least one bottom cold umbrella fin (e.g., cold umbrella fin 1331h) located at the bottom of the measurement probe 141. The bottom end surface of the bottom cold umbrella fin includes a gas passage hole that allows gas to pass through and is aligned with the measurement probe 141. The plurality of cold umbrella sheets may further include at least one surrounding cold umbrella sheet (e.g., cold umbrella sheets 1331a, 1331b, 1331c, 1331d, 1331e, 1331f, 1331g) that is not located at the bottom of the measurement probe 141, and the lower end surface of the surrounding cold umbrella sheet includes a portion for accommodating the measurement probe 141 or Figure 2 The cold shield 150 is shown with through-holes therethrough.
[0075] In some embodiments, a gas passage hole allowing gas to pass through a lower end surface of a bottom cold umbrella (eg, cold umbrella 1331 h ) located at the bottom of the measurement probe 141 is coaxially arranged with the measurement probe 141 .
[0076] like Figure 3 As shown, in some embodiments, a single cold visor can be integrally formed or assembled from multiple components to facilitate installation and maintenance of the cold visor. For example, a single cold visor (e.g., cold visors 1331a, 1331b, 1331c, 1331d, 1331e, 1331f, 1331g) can be assembled from two symmetrical half cold visors. In some embodiments, the cold visor 133 further includes a cold visor mounting base (e.g., oppositely disposed cold visor mounting bases 1332a, 1332b), and the measuring probe 141 or Figure 2 The cold shield 150 is shown positioned between the cold wing mounts (e.g., cold wing mounts 1332a and 1332b). A plurality of cold wings (e.g., cold wing 1331a, 1331b, 1331c, 1331d, 1331e, 1331f, 1331g, and 1331h) are mounted on the cold wing mounts (e.g., cold wing mounts 1332a and 1332b) to surround the measurement probe 141 and the cold shield 150.
[0077] like Figure 2 As shown, in some embodiments of the present disclosure, at least one cold head 132 includes a primary cold head 1321 and a secondary cold head 1322. The primary cold head 1321 is thermally coupled to the secondary cold head 1322, and the secondary cold head 1322 is thermally coupled to the cold umbrella 133. In some embodiments, the secondary cold head 1322 is thermally coupled to the cold umbrella piece mounting base (e.g. Figure 3 The cold parachute mounting base 1332b) is shown to be thermally connected.
[0078] like Figure 1 As shown, in some embodiments of the present disclosure, the gas source 120 and the residual gas analyzer 140 are aligned, for example, coaxially arranged.
[0079] In some embodiments, the gas source 120 is aligned with the residual gas analyzer 140, and the particle beam generated by the gas source 120 is coaxial with the residual gas analyzer 140. The particle beam movement path is short, which reduces the probability of collision between particles and between particles and other cavity components, thereby reducing the interference molecules generated after the particle collision and being detected by the residual gas analysis. For example, in some embodiments, the particle beam generated by the gas source 120 may collide with the components in the vacuum chamber 110, and its state changes to generate new interference molecules, thereby affecting the detection results of the residual gas analysis. At the same time, since the particle beam is evenly distributed in each radial direction, the alignment setting can reduce the error between the detected proportion of each particle and the actual proportion, thereby improving the accuracy of the particle beam component measurement.
[0080] like Figure 1 As shown, in some embodiments, the gas source 120 is coaxially disposed with the residual gas analyzer 140 .
[0081] like Figure 1 and Figure 2 As shown, in some embodiments of the present disclosure, the cryopump 130 may further include a refrigerator 134, a temperature sensor (not shown), and a temperature controller 135. The refrigerator 134 is vacuum-sealed to the pump chamber 131. The temperature controller 135 is connected to the secondary cold head 1322 and is used to display the temperature of the secondary cold head 1322.
[0082] like Figure 2 As shown, in some embodiments of the present disclosure, the cryopump 130 may further include a primary baffle 139. The primary baffle 139 is disposed at the distal end of the pump chamber 131. In some embodiments, the primary baffle 139 may include a gas passage hole aligned with (e.g., coaxially disposed with) the measurement probe 141 to allow gas to pass through.
[0083] In some embodiments, when the gas enters the pump chamber 131 of the cryopump 130 through the primary baffle 139 , the primary baffle 139 can reduce the heat input to the pump chamber 131 .
[0084] like Figure 2 As shown, in some embodiments, the pump chamber 131 of the cryopump 130 may further include a radiation shield 1312. The radiation shield 1312 surrounds the inner wall of the pump chamber 131 and maintains a certain gap with the inner wall of the pump chamber 131.
[0085] like Figure 1 and Figure 2As shown, in some embodiments, the cryopump 130 may further include a compressor 136 . The compressor 136 is connected to the refrigerator 134 via a helium pipe 137 .
[0086] like Figure 1 As shown, in some embodiments of the present disclosure, the particle beam composition measurement apparatus 100 may further include a terminal device 180. The terminal device 180 (eg, a computer, etc.) is connected to the residual gas analyzer 140 for receiving, displaying, and / or analyzing data from the residual gas analyzer 140.
[0087] like Figure 1 As shown, in some embodiments of the present disclosure, the particle beam composition measurement device 100 may further include a backing pump 160 . The backing pump 160 is connected to the vacuum chamber 110 in a vacuum-tight manner.
[0088] In some embodiments, the forepump 160 is used to reduce the pressure of the vacuum chamber 110 to a certain level so that the cryopump 130 can be started within a safe pressure range to protect the cryopump 130 .
[0089] like Figure 1 As shown, in some embodiments of the present disclosure, the particle beam composition measuring device 100 may further include a vacuum gauge 170 . The vacuum gauge 170 is vacuum-tightly connected to the vacuum chamber 110 to measure the pressure of the vacuum chamber 110 .
[0090] like Figure 1 As shown, in some embodiments of the present disclosure, the pump chamber 131 of the cryopump 130 is vacuum-tightly connected to the vacuum chamber 110 via a gate valve 190 .
[0091] like Figure 2 As shown, in some embodiments, the cryopump 130 may further include a flange 138. The flange 138 is disposed at the distal end of the pump chamber 131 of the cryopump 130. The flange 138 of the cryopump 130 is vacuum-tightly connected to the vacuum chamber 110 via a gate valve 190.
[0092] It should be pointed out that the above are only exemplary embodiments of the present disclosure and are not intended to limit the present disclosure. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present disclosure should be included in the scope of protection of the present disclosure.
Claims
1. A particle beam composition measuring device, characterized in that: include: Vacuum chamber; a gas source, vacuum-tightly connected to the vacuum chamber, for generating a particle beam; a cryopump, comprising a pump chamber, the pump chamber being vacuum-sealed and in communication with the vacuum chamber, the pump chamber comprising an interface for a residual gas analyzer; as well as A residual gas analyzer is vacuum-sealedly connected to the residual gas analyzer interface and is used to measure the gas composition in the pump chamber.
2. The particle beam component measuring device according to claim 1, wherein The residual gas analyzer includes a measuring probe located in the pump cavity of the cryopump.
3. The particle beam component measuring device according to claim 2, wherein: The cryogenic pump comprises: at least one cold head, one or more of the at least one cold head being disposed within the pump chamber of the cryopump; as well as A cold umbrella is thermally coupled to the one or more cold heads, and the cold umbrella is arranged in the pump cavity of the cryopump and around the measuring probe.
4. The particle beam component measuring device according to claim 3, characterized in that It also includes a cold screen, which is arranged around the measurement probe of the residual gas analyzer. The end of the cold screen close to the gas source includes a channel for gas to pass through, and a channel for gas to pass through is included between the cold screen and the measurement probe.
5. The particle beam component measuring device according to claim 4, characterized in that The cold shield is arranged between the measuring probe of the residual gas analyzer and the cold umbrella, and a channel for gas to pass through is included between the cold umbrella and the cold shield.
6. The particle beam component measuring device according to claim 5, characterized in that The cold umbrella includes a plurality of cold umbrella sheets stacked at intervals, each of which is bowl-shaped. The plurality of cold umbrella sheets include at least one bottom cold umbrella sheet located at the bottom of the measuring probe, and the lower end surface of the bottom cold umbrella sheet includes a gas passage hole that allows gas to pass through and is aligned with the measuring probe. The plurality of cold umbrella sheets also include at least one surrounding cold umbrella sheet that is not located at the bottom of the measuring probe, and the lower end surface of the surrounding cold umbrella sheet includes a through hole for accommodating the measuring probe or the cold shield.
7. The particle beam component measuring device according to claim 3, wherein The at least one cold head includes a primary cold head and a secondary cold head, the primary cold head is thermally coupled to the secondary cold head, and the secondary cold head is thermally coupled to the cold umbrella.
8. The particle beam component measuring device according to claim 1, wherein The gas source is aligned with the residual gas analyzer.
9. The particle beam component measuring device according to claim 7, wherein The cryogenic pump further comprises: a refrigerator, connected to the pump chamber in a vacuum-tight manner; a temperature sensor, configured to measure the temperature of the at least one stage cold head and / or the pump chamber; a temperature controller connected to the secondary cold head and configured to display the temperature of the secondary cold head; and / or A primary baffle is provided at the distal end of the pump chamber, and the primary baffle comprises a gas passage hole aligned with the measuring probe and allowing gas to pass through.
10. The particle beam component measuring device according to claim 1, wherein Also includes: a front pump, vacuum-tightly connected to the vacuum chamber; and / or a vacuum gauge, vacuum-tightly connected to the vacuum chamber, for measuring the pressure of the vacuum chamber; and / or The terminal device is connected to the residual gas analyzer and is used to receive, display and / or analyze the data of the residual gas analyzer.
11. The particle beam component measuring device according to claim 1, wherein The pump chamber of the cryopump is vacuum-tightly connected to the vacuum chamber via a gate valve.