Wafer product size measuring instrument

Abstract

The utility model discloses a wafer product size measuring instrument which comprises a marble table board. A rotating seat; a cantilever; the number of the measuring cameras is four; an electric clamping jaw is arranged on the rotating part of the rotating seat; three clamping fingers are arranged on the electric clamping jaw; the clamping fingers are connected with extension rods; and a limiting rod is longitudinally arranged at one end of the extension rod. The actual plane size of the wafer can be directly and quickly calculated only by placing the wafer on the supporting cap, and the supporting cap can be rotated to measure a plurality of point positions to obtain an average value according to a higher precision requirement. The measuring precision is improved by reducing the detection range through the cameras, benchmarking is carried out through the benchmarking piece, and the actual size of the wafer is measured through the actual displacement difference of the two cameras. When the limiting rod is on the outer side, the wafer can be manually taken and placed conveniently; when the limiting rods move towards the inner side, the wafer is centered, and clamping is completed at the same time.

Description

TECHNICAL FIELD

[0001] The utility model belongs to wafer measurement technical field, especially relate to a wafer product size measuring instrument. BACKGROUND

[0002] In the field of glass wafer product processing and manufacturing, it is often necessary to measure the size of glass wafers after shape processing. Because of the high requirement for processing precision, the conventional way is to use an image instrument to take point measurement. Generally, the image instrument automatically moves back and forth to measure the size of multiple points and record the actual measurement value. This way takes too long to measure, and is often only suitable for production line sampling inspection. How to design a measurement device that can achieve full inspection on the production line is needed in the processing process.

[0003] The Chinese patent document with publication number CN219104734U discloses an automatic detection of fluorescent defects and wafer positioning device, which includes a mounting plate fixed on the top of the mounting base through bolts, a support stand plate is arranged on the top of the mounting plate, a fluorescent defect measurement camera is arranged on the support stand plate, a high-precision detection lens for improving detection accuracy is arranged at the bottom of the fluorescent defect measurement camera, a detection light source is connected to the bottom of the mounting plate through bolts, and a wafer positioning mechanism is arranged on the mounting base. The automatic detection of fluorescent defects and wafer positioning device can accurately and quickly detect fluorescent defects through the arrangement of high-precision detection lenses. The internal driving elements of the wafer positioning mechanism are all precision motors, which can improve the accuracy of repeated positioning of the device on the wafer. At the same time, the device is small in size, easy and fast to operate, and is suitable for installation in automatic equipment.

[0004] The above patent solution sets a positioning groove on the wafer placement plate to limit the position of the wafer when taking image detection of the wafer, and sets a vacuum suction groove to lock the position of the wafer. Therefore, when taking images of wafers of different sizes, it is difficult to manually adjust the position due to the mismatch between the positioning groove and the size of the wafer, and there is a risk of scratching the wafer. Therefore, the placement plate needs to be replaced, and the replacement process is not convenient. Therefore, the above patent is not convenient for compatibility with wafers of different size specifications. In addition, the single lens of the above patent solution needs to rotate at least one circle when measuring the size of the wafer, which also leads to low measurement efficiency. UTILITY MODEL CONTENTS

[0005] In order to overcome the technical problems of low wafer size measurement efficiency and inconvenience in compatibility with wafers of different sizes in the prior art, one purpose of the utility model is to provide a wafer product size measuring instrument. By arranging a limit rod for positioning the wafer on the clamping fingers of the electric clamp, the centripetal movement of the limit rod can concentrically align the wafer and clamp it at the same time. The placement range is large and there is no need to deliberately adjust the position. At the same time, it can be compatible with wafers of different sizes within a certain range.

[0006] In order to achieve the above-mentioned purpose, the present invention adopts the following technical solutions: a wafer product size measuring instrument, comprising a marble table, which is arranged at the upper end of a cabinet; a rotating seat, which is arranged at the upper end of the marble table; a cantilever, which is arranged above the marble table; four measuring cameras, and respectively arranged at the lower end of the cantilever; wherein an electric clamp is provided on the rotating part of the rotating seat; the electric clamp is provided with at least three clamping fingers that slide radially along the rotating seat; an extension rod is detachably connected to the clamping finger; a limit rod is longitudinally provided at one end of the extension rod away from the electric clamp.

[0007] The outer perimeter of the limit rod, when open, provides a large wafer placement area, facilitating both manual and automated wafer placement. Driven by the electric gripper, the limit rod moves centripetally, pushing the wafer coaxially with the rotating base while simultaneously clamping it to prevent movement during the calculation process. The wafer edge can be calculated within the measurement camera's field of view, ensuring compatibility with wafers of varying sizes.

[0008] The measurement process only requires placing the wafer, and the four measuring cameras can directly calculate the actual plane size of the wafer. When higher precision is required, multiple points can be measured by rotating the rotating seat to obtain the average value.

[0009] Furthermore, a support cap is provided on the rotating part of the rotating seat; the electric clamp is located below the support cap, and the extension rod extends from the side wall of the support cap; a plurality of ventilation grooves are provided on the upper end of the support cap; and the side wall of the support cap is provided with ventilation holes connected to the ventilation grooves.

[0010] The support cap provides a horizontal support surface for the wafer, and the air permeable groove prevents the wafer from being adsorbed on the support cap, making it easy to remove the wafer.

[0011] Furthermore, a lifting ring is provided above the marble table, and the support cap is located inside the lifting ring; four infrared light sources are provided at the upper end of the lifting ring, and the upper ends of the infrared light sources are located below the support cap; the infrared light sources are respectively located directly below the corresponding measuring cameras.

[0012] The setting of the infrared light source helps to improve calculation accuracy, reduce interference from ambient light, and can help identify subtle defects that are difficult to detect under visible light.

[0013] Specifically, a plurality of support columns evenly distributed along the circumferential direction are provided at the lower end of the lifting ring; the lower ends of the support columns are provided on the marble table top; and two parallel notches are symmetrically provided on the outer wall of the support columns.

[0014] Furthermore, a hanging plate is provided on the cantilever, and the axis of the hanging plate coincides with the axis of the rotating base; and the measuring camera is provided on the periphery of the hanging plate.

[0015] Specifically, a fine-tuning portion is provided between the measuring camera and the hanging plate; the fine-tuning portion includes a fixed end provided on the outer periphery of the hanging plate, a sliding end longitudinally slidably connected to the fixed end, a fine-tuning knob rotatably connected to the fixed end and transmission-connected to the sliding end, and a locking knob threadedly connected to the sliding end and optionally locked on the fixed end; the measuring camera is provided on the sliding end.

[0016] Placing a standard sheet on the rotating seat and then fine-tuning the longitudinal height of the measuring camera through the fine-tuning portion helps to improve calculation accuracy.

[0017] Specifically, the four measuring cameras are divided into two symmetrically arranged groups; the angle between the line connecting the two measuring cameras in each group and the center of the hanging plate is sixty degrees.

[0018] Furthermore, the rotating portion of the rotating seat is a rotating ring rotatably connected to the upper end of the rotating seat; a positioning frame is provided inside the rotating ring; the electric clamp is installed on the positioning frame, and the electric clamp is located inside the rotating ring.

[0019] Furthermore, the front end of the cabinet is rotatably connected to a cabinet door; the front end of the cabinet is horizontally slidably connected to a keyboard drawer; and the keyboard drawer is located above the cabinet door.

[0020] Furthermore, the cantilever is in an inverted L-shape; the lower end of the cantilever is arranged on the marble table top, and the upper end of the cantilever is located directly above the rotating seat.

[0021] Compared with the prior art, the beneficial effects of the present invention are:

[0022] 1. Simply place the wafer on the support cap. The two symmetrically arranged cameras can quickly and directly calculate the actual plane dimensions of the wafer. For higher precision requirements, the support cap can be rotated to measure multiple points and take the average value.

[0023] 2. The idea of ​​improving measurement accuracy by narrowing the detection range of the camera is to align the measurement results of the two sets of cameras through a calibration sheet, and then measure the actual size of the wafer through the actual displacement difference between the two sets of cameras.

[0024] 3. When the limit rod is on the outside, the wafer placement range is large, which is convenient for manual wafer placement; when the limit rod moves inward, it aligns the wafer with the rotating seat and also completes the clamping of the wafer. Within a certain range, it can be compatible with wafers of different sizes, and at the same time prevents the wafer from moving during the measurement process, which helps to improve the measurement accuracy.

[0025] 4. The utility model adopts modular design, which has low manufacturing cost and is easy to maintain. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a structural diagram of the utility model;

[0027] Figure 2 This is a schematic diagram of the exploded parts of the present utility model;

[0028] Figure 3 This is a structural diagram of the rotating seat, electric clamping claw, and supporting cap of the utility model;

[0029] Figure 4 This is a schematic structural diagram of a measuring camera of the present utility model;

[0030] Figure 5 This is a schematic diagram of the distribution of the measurement cameras of the present invention.

[0031] In the figure: 11. Cabinet body; 12. Cabinet door; 13. Keyboard drawer; 14. Forma wheel; 15. Cover; 16. Cantilever; 17. Marble tabletop; 21. Lifting ring; 22. Infrared light source; 23. Support column; 231. Notch; 31. Rotating seat; 311. Rotating ring; 312. Rotating motor; 313. Positioning frame; 32. Support cap; 321. Breathing groove; 322. Spacing groove; 323. Breathing hole; 33. Electric gripper; 331. Gripping finger; 34. Extension rod; 35. Limit rod; 41. Hanging plate; 42. Measuring camera; 43. Fine-tuning unit; 431. Fine-tuning knob; 432. Locking knob; 44. L-shaped hanging plate; 5. Wafer. DETAILED DESCRIPTION

[0032] Below, the present invention is further described in conjunction with the accompanying drawings and specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments.

[0033] In the description of the present invention, it should be noted that, for directional words, such as the terms "center", "horizontal", "longitudinal", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and so on, indicating directions and positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and cannot be understood as limiting the specific scope of protection of the present invention.

[0034] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features. Therefore, the terms "first" and "second" may explicitly or implicitly refer to one or more of these features. In the description of this utility model, "several" means two or more, unless otherwise specifically defined.

[0035] In this utility model, unless otherwise specified or limited, terms such as "disposed" and "installed" should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integral connection; mechanical connection; direct connection, connection through an intermediate medium, or internal communication between two components. Those skilled in the art will understand the specific meanings of these terms in this utility model based on specific circumstances.

[0036] See also Figure 1-Figure 5 A wafer product size measuring instrument includes a cabinet 11, a marble table 17, a rotating base 31, an electric clamp 33, a support cap 32, and four measuring cameras 42, which are arranged in sequence from bottom to top.

[0037] The front end of the cabinet 11 is rotatably connected to a cabinet door 12; the front end of the cabinet 11 is horizontally slidably connected to a keyboard drawer 13; the keyboard drawer 13 is located above the cabinet door 12; four Forma wheels 14 are respectively provided at the lower end of the cabinet 11 near the four corners.

[0038] The upper end of the rotating base 31 is rotatably connected to a rotating ring 311; the side wall of the rotating base 31 is provided with a rotating motor 312 that is transmission-connected to the rotating ring 311; a positioning frame 313 is provided inside the rotating ring 311; the electric clamp 33 is installed on the positioning frame 313, and the electric clamp 33 is located inside the rotating ring 311.

[0039] The electric gripper 33 is provided with three gripping fingers 331 that slide radially along the rotating base 31. An extension rod 34 is detachably connected to the gripping fingers 331. A limit rod 35 is longitudinally provided at one end of the extension rod 34 away from the electric gripper 33. Wafers of different sizes can also be accommodated by replacing the extension rod 34.

[0040] The support cap 32 is arranged on the rotating ring 311; a plurality of ventilation grooves 321 are provided at the upper end of the support cap 32; a ventilation hole 323 connected to the ventilation groove 321 is provided on the side wall of the support cap 32; three spacing grooves 322 evenly distributed along the circumferential direction are provided on the side wall of the support cap 32; the electric clamp 33 is located below the support cap 32, and the extension rod 34 extends from the spacing groove 322.

[0041] A lifting ring 21 is positioned above the marble tabletop 17, with the rotating seat 31 located within the lifting ring 21. Four infrared light sources 22 are positioned at the upper end of the lifting ring 21, with the upper ends of the infrared light sources 22 located below the support cap 32. A plurality of support columns 23 are positioned at the lower end of the lifting ring 21, evenly distributed along the circumference. The lower ends of the support columns 23 are positioned on the marble tabletop 17. Two parallel notches 231 are symmetrically disposed on the outer walls of the support columns 23.

[0042] The upper end of the marble table 17 is detachably connected to the cover 15 ; the upper end of the cover is provided with an opening; the infrared light source 22 is located inside the cover 15 and is exposed outside the cover 15 .

[0043] A cantilever 16 in the shape of an inverted L is provided at the upper end of the marble table top 17; the lower end of the cantilever 16 is provided on the marble table top 17, and the upper end of the cantilever 16 is located directly above the rotating seat 31; a hanging plate 41 is provided at the upper end of the cantilever 16, and the axis of the hanging plate 41 coincides with the axis of the rotating seat 31.

[0044] Four measuring cameras 42 are provided on the outer wall of the hanging plate 41 , and the measuring cameras 42 are directly opposite to the infrared light source 22 ; the four measuring cameras 42 are divided into two symmetrical groups; the angle between the line connecting the two measuring cameras 42 in each group and the center of the hanging plate 41 is sixty degrees.

[0045] A fine-tuning portion 43 is provided between the measuring camera 42 and the hanging plate 41; four L-shaped hanging plates 44 are provided on the outer periphery of the hanging plate 41; the fine-tuning portion 43 includes a fixed end provided on the outer side of the L-shaped hanging plate 44, a sliding end longitudinally slidably connected to the fixed end, a fine-tuning knob 431 rotatably connected to the fixed end and transmission-connected to the sliding end, and a locking knob 432 threadedly connected to the sliding end and optionally locked on the fixed end; the measuring camera 42 is provided on the sliding end.

[0046] The above description is only a specific embodiment of the present invention, but the technical features of the present invention are not limited thereto. Any changes or modifications made by any technician in this field within the scope of the present invention are included in the patent scope of the present invention.

Claims

1. A wafer product size measuring instrument, characterized by: Including A marble countertop, which is arranged at the upper end of the cabinet; A rotating seat, the rotating seat being arranged at the upper end of the marble table; a cantilever, the cantilever being arranged above the marble table; measuring cameras, wherein there are four measuring cameras, and the measuring cameras are respectively arranged at the lower end of the cantilever; Among them, an electric clamp is provided on the rotating part of the rotating seat; the electric clamp is provided with at least three clamping fingers that slide radially along the rotating seat; the clamping fingers are detachably connected to an extension rod; a limit rod is longitudinally provided on the end of the extension rod away from the electric clamp.

2. The dimension measuring instrument according to claim 1, wherein: A support cap is provided on the rotating part of the rotating seat; the electric clamp is located below the support cap, and the extension rod extends from the side wall of the support cap; a plurality of ventilation grooves are provided on the upper end of the support cap; and the side wall of the support cap is provided with ventilation holes connected to the ventilation grooves.

3. The dimension measuring instrument according to any one of claims 1 to 2, characterized in that: A lifting ring is provided above the marble table, and the support cap is located inside the lifting ring; four infrared light sources are provided at the upper end of the lifting ring, and the upper ends of the infrared light sources are located below the support cap; the infrared light sources are respectively located directly below the corresponding measuring cameras.

4. The dimension measuring instrument according to claim 3, wherein: The lower end of the lifting ring is provided with a plurality of support columns evenly distributed along the circumferential direction; the lower ends of the support columns are provided on the marble table top; and the outer wall of the support columns is symmetrically provided with two parallel notches.

5. The dimension measuring instrument according to any one of claims 1 to 2, characterized in that: A hanging plate is provided on the cantilever, and the axis of the hanging plate coincides with the axis of the rotating seat; the measuring camera is arranged on the periphery of the hanging plate.

6. The dimension measuring instrument according to claim 5, wherein: A fine-tuning portion is provided between the measuring camera and the hanging plate; the fine-tuning portion includes a fixed end provided on the outer periphery of the hanging plate, a sliding end longitudinally slidably connected to the fixed end, a fine-tuning knob rotatably connected to the fixed end and transmission-connected to the sliding end, and a locking knob threadedly connected to the sliding end and optionally locked on the fixed end; the measuring camera is provided on the sliding end.

7. The dimension measuring instrument according to claim 5, wherein: The four measuring cameras are divided into two symmetrically arranged groups; the angle between the line connecting the two measuring cameras in each group and the center of the hanging plate is sixty degrees.

8. The dimension measuring instrument according to any one of claims 1 to 2, characterized in that: The rotating part of the rotating seat is a rotating ring rotatably connected to the upper end of the rotating seat; a positioning frame is provided in the rotating ring; the electric clamp is installed on the positioning frame, and the electric clamp is located inside the rotating ring.

9. The dimension measuring instrument according to any one of claims 1 to 2, characterized in that: The front end of the cabinet is rotatably connected to a cabinet door; the front end of the cabinet is horizontally slidably connected to a keyboard drawer; and the keyboard drawer is located above the cabinet door.

10. The dimension measuring instrument according to any one of claims 1-2, characterized in that: The cantilever is in an inverted L-shape; the lower end of the cantilever is arranged on the marble table, and the upper end of the cantilever is located directly above the rotating seat.

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