Adjusting device of wafer rotary table

Abstract

The utility model discloses an adjusting device for a wafer rotary table, which comprises a bottom plate, the wafer rotary table is rotatably mounted on the bottom plate, a rotary connecting rod synchronously rotating with the wafer rotary table is fixedly mounted on the wafer rotary table, and a pushing block for pushing the rotary connecting rod is horizontally and linearly mounted on the bottom plate in a sliding manner. The end of the pushing block is tightly attached to the side face of the rotary connecting rod, the pushing block is driven by a linear pushing power device, the bottom plate is provided with a reset structure which is connected with the rotary connecting rod to pull the wafer rotary table to rotate, and the bottom plate is provided with a limiting structure which limits the rotating range of the rotary connecting rod along with the wafer rotary table. The adjusting device can effectively drive the wafer turntable to rotate stably and accurately, meanwhile, the practical cost is reduced, and the practicability is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor turntable equipment, in particular to an adjusting device for a wafer turntable. Background Art

[0002] A wafer refers to a silicon chip used in the manufacture of silicon semiconductor integrated circuits. It is round in shape and needs to be placed on a wafer turntable. The wafer needs to be etched multiple times during photolithography, so it will be put on and taken off multiple times. During etching, it is necessary to ensure that the wafer is placed in the same position as the previous time. Therefore, the wafer turntable is rotated to change the position of the wafer to ensure that it is in the same position as the previous wafer.

[0003] Patent No. 202223067713.9 discloses a turntable adjustment mechanism and a detection device. The turntable adjustment mechanism drives the screw to rotate through a driving member, thereby driving the moving block to move linearly, and the moving block is connected to the rotating plate through a connecting assembly. The moving block moves linearly. In order for the rotating plate to be able to rotate in a circle, the connecting assembly is also provided with guide rails, bearings and other components, thereby increasing the complexity of the structure when driven to rotate, and the screw and nut also require higher fitting accuracy, which will also increase the complexity of the structure and increase the cost of use. Utility Model Content

[0004] The technical problem to be solved by the utility model is: an adjusting device for a wafer turntable, which can effectively drive the wafer turntable to rotate stably and accurately, while reducing practical costs and improving practicality.

[0005] In order to solve the above technical problems, the technical solution of the utility model is: a wafer turntable adjustment device, comprising a base plate, on which the wafer turntable is rotatably mounted, a rotating connecting rod that rotates synchronously with the wafer turntable is fixedly mounted on the wafer turntable, a pushing block that pushes the rotating connecting rod is horizontally and linearly mounted on the base plate for slidingly pushing the rotating connecting rod, the end of the pushing block is close to the side of the rotating connecting rod, the pushing block is driven by a linear pushing power device, a reset structure is provided on the base plate for connecting to the rotating connecting rod and pulling the wafer turntable to rotate, and a limiting structure is provided on the base plate for limiting the rotation range of the rotating connecting rod following the wafer turntable.

[0006] As a preferred solution, the end of the push block is provided with an arc protrusion, the arc protrusion is close to the side of the rotating connecting rod, the base plate is provided with a sliding guide rail, and the push block is slidably mounted on the base plate through the sliding guide rail.

[0007] As a preferred solution, the reset structure includes a reset fixing rod vertically fixed on the bottom plate, and a tension spring is provided between the reset fixing rod and the end of the rotating connecting rod.

[0008] As a preferred scheme, the limiting structure comprises limiting stop rods located on both sides of the rotating connecting rod, and the limiting stop rods are fixedly installed on the bottom plate.

[0009] As a preferred scheme, the bottom plate is further provided with a sensing device for detecting the moving position of the pushing block, and the sensing device cooperates with the limiting stop rods to limit.

[0010] As a preferred scheme, the sensing device is an optical grating ruler, and the optical grating ruler is fixed on the pushing block to detect the moving distance of the pushing block.

[0011] As a preferred scheme, the bottom plate is fixedly provided with a cover shell covering the pushing block.

[0012] After the above technical scheme is adopted, the effect of the present application is that: due to the adjusting device of the wafer turntable, the adjusting device comprises a bottom plate, a wafer turntable is rotatably installed on the bottom plate, a rotating connecting rod is fixedly installed on the wafer turntable and rotates synchronously with the wafer turntable, a pushing block is horizontally and linearly slidably installed on the bottom plate and pushes the rotating connecting rod, the end of the pushing block is close to the side surface of the rotating connecting rod, the pushing block is driven by a linear pushing power device, the bottom plate is provided with a reset structure connected with the rotating connecting rod to pull and make the wafer turntable rotate back, and the bottom plate is provided with a limiting structure to limit the rotating range of the rotating connecting rod following the wafer turntable; the pushing block is driven to push by the linear pushing power device, then the pushing block pushes the rotating connecting rod to make the wafer turntable rotate, when the wafer turntable rotates back, the reset structure drives the wafer turntable to rotate back, and the pushing block pushes against the rotating connecting rod to retract; the adjusting device can effectively drive the wafer turntable to rotate stably and accurately, reduce practical cost, and improve practicality.

[0013] In addition, the end of the pushing block is provided with a circular arc protrusion, the circular arc protrusion is close to the side surface of the rotating connecting rod, the bottom plate is provided with a sliding guide rail, and the pushing block is slidably installed on the bottom plate through the sliding guide rail; the pushing block is not fixedly connected with the rotating connecting rod, so that the pushing block can be offset when pushing the rotating connecting rod to rotate, the circular arc protrusion can facilitate relative movement between the pushing block and the rotating connecting rod when pushing the rotating connecting rod, and the circular arc protrusion can ensure that the pushing is stable and accurate, and when the circular arc protrusion pushes the rotating connecting rod, since there is a certain distance between the rotating connecting rod and the wafer turntable, when rotating by the same angle, the swinging distance of the rotating connecting rod can be much larger than the rotating distance of the wafer turntable, so that the influence of the swinging error of the rotating connecting rod can be reduced, and the use effect is improved.

[0014] In addition, the reset structure comprises a reset fixed rod vertically fixed on the bottom plate, and a tension spring is arranged between the reset fixed rod and the end of the rotating connecting rod; the tension spring can always pull the rotating connecting rod, so that the rotating connecting rod can be pulled back, and the pushing block is cooperated to complete the rotation of the wafer turntable, the structure is simple, and the use is convenient.

[0015] Furthermore, since the limiting structure includes limiting bars located on both sides of the rotating connecting rod, and the limiting bars are fixedly mounted on the bottom plate, the wafer turntable is prevented from rotating excessively, thereby improving the rotation accuracy.

[0016] Furthermore, since a sensing device for detecting the moving position of the push block is further provided on the bottom plate, the sensing device cooperates with the limiting lever to limit the position, thereby further improving the rotation accuracy of the wafer turntable.

[0017] Furthermore, since the sensing device is a grating ruler, the grating ruler is fixed on the pushing block to detect the moving distance of the pushing block; the moving distance is made to correspond to the rotation angle of the wafer turntable, effectively ensuring the accuracy of the rotation.

[0018] Furthermore, since a cover shell for covering the pushing block is fixedly mounted on the bottom plate, the pushing block is effectively protected to push safely and stably. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0020] Figure 1 It is a three-dimensional diagram of an embodiment of the utility model;

[0021] Figure 2 This is a schematic diagram of the structure inside the housing of an embodiment of the utility model;

[0022] Figure 3 This is a schematic structural diagram of the push block in an embodiment of the present utility model;

[0023] In the attached figure: 1. Base plate; 2. Wafer turntable; 3. Rotating connecting rod; 4. Push block; 5. Arc protrusion; 6. Voice coil motor; 7. Motor mounting plate; 8. Cross ball guide; 9. Reset fixing rod; 10. Tension spring; 11. Limit stop rod; 12. Grating scale; 13. Cover. DETAILED DESCRIPTION

[0024] The present invention will be described in further detail below through specific embodiments.

[0025] like Figures 1 to 3 As shown, a wafer turntable adjustment device comprises a base plate 1, on which a wafer turntable 2 is rotatably mounted, and a rotating connecting rod 3 which rotates synchronously with the wafer turntable 2 is fixedly mounted on the wafer turntable 2, and a pushing block 4 which pushes the rotating connecting rod 3 is horizontally and linearly mounted on the base plate 1 for slidingly pushing the rotating connecting rod 3, the end of the pushing block 4 is in close contact with the side of the rotating connecting rod 3, and the pushing block 4 is driven by a linear pushing power device, and a reset structure which is connected to the rotating connecting rod 3 and pulls the wafer turntable 2 to rotate is provided on the base plate 1, and a limiting structure which limits the rotating connecting rod 3 to follow the rotation range of the wafer turntable 2 is provided on the base plate 1.

[0026] In this embodiment, the end of the pushing block 4 is provided with an arc protrusion 5, and the arc protrusion 5 is close to the side of the rotating connecting rod 3. The base plate 1 is provided with a sliding guide rail, and the pushing block 4 is slidably installed on the base plate 1 through the sliding guide rail; the pushing block 4 is not fixedly connected to the rotating connecting rod 3, so it will deviate when pushing the rotating connecting rod 3 to rotate, and the arc protrusion 5 can facilitate the relative movement with the rotating connecting rod 3 when pushing the rotating connecting rod 3 and ensure that the pushing can also be stable and accurate, and when the arc protrusion 5 pushes the rotating connecting rod 3, since there is a certain distance between the rotating connecting rod 3 and the wafer turntable 2, when rotating the same angle, the rotating connecting rod 3 The swing distance can be much greater than the rotation distance of the wafer turntable 2, thereby reducing the impact of the swing error of the rotating connecting rod 3 and improving the use effect. The linear propulsion power device includes a voice coil motor 6, which is fixedly mounted on the motor mounting plate 7 and drives the push block 4 to move horizontally and linearly. The voice coil motor 6 has the characteristics of simple structure, small size, high speed, high acceleration and fast response, so the structure can be made more compact. The sliding guide rail is a cross ball guide rail 8, one part of which is fixed to the push block 4, and the other part is fixed to the base plate 1, so that the push block 4 can slide linearly and effectively determine the direction of linear movement.

[0027] like Figure 2 and Figure 3 As shown, the reset structure includes a reset fixing rod 9 vertically fixed on the base plate 1, and a tension spring 10 is provided between the reset fixing rod 9 and the end of the rotating connecting rod 3; the tension spring 10 can always pull the rotating connecting rod 3, so that the rotating connecting rod 3 can be pulled back and cooperated with the push block 4 to complete the rotation of the wafer turntable 2. The structure is simple and easy to use. The connection between the tension spring 10 and the end of the rotating connecting rod 3 can maximize the force of the pull rope spring and improve the reset effect.

[0028] Furthermore, the limiting structure includes limiting bars 11 located on both sides of the rotating connecting rod 3, and the limiting bars 11 are fixedly mounted on the base plate 1; there are two limiting bars 11, which are located on both sides of the rotating connecting rod 3, respectively, to effectively block the swing range of the rotating connecting rod 3, prevent the wafer turntable 2 from rotating excessively, and improve the rotation accuracy.

[0029] In this embodiment, the base plate 1 is also provided with a sensing device for detecting the moving position of the pushing block 4, and the sensing device cooperates with the limit lever 11 to limit the position; the sensing device is a grating ruler 12, and the grating ruler 12 is fixed on the pushing block 4 to detect the moving distance of the pushing block 4; because the pushing block 4 pushes the rotating connecting rod 3, the rotating connecting rod 3 can only swing back and forth between the limit levers 11, and the extension and retraction distance of the pushing block 4 corresponds to the rotation angle of the wafer turntable 2. Therefore, by detecting the distance moved by the pushing block 4 through the grating ruler 12, the rotation angle can be accurately obtained, thereby ensuring accurate rotation and improving the use effect.

[0030] A cover shell 13 covering the pushing block 4 is fixedly mounted on the base plate 1 ; the cover shell 13 cooperates with the motor mounting plate 7 to effectively protect the pushing block 4 to push safely and stably.

[0031] The working principle of this embodiment is as follows: first, the voice coil motor 6 drives the pushing block 4 to push linearly, and the arc protrusion 5 pushes up the rotating connecting rod 3, driving the wafer turntable 2 to rotate; then the voice coil motor 6 drives the pushing block 4 to retract, and the tension spring 10 drives the rotating connecting rod 3 to retract, so that the rotating connecting rod 3 is close to the arc protrusion 5, and the rotation angle of the wafer turntable 2 is adjusted.

[0032] The above-described embodiments are merely descriptions of preferred implementations of the present invention and are not intended to limit the scope of the present invention. Various modifications and alterations to the technical solutions of the present invention, without departing from the spirit of the present invention, should fall within the scope of protection defined in the claims of the present invention.

Claims

1. A wafer turntable adjustment device, comprising a base plate on which the wafer turntable is rotatably mounted, characterized in that: A rotating connecting rod that rotates synchronously with the wafer turntable is fixedly installed on the wafer turntable, and a pushing block that pushes the rotating connecting rod is horizontally and linearly installed on the base plate. The end of the pushing block is close to the side of the rotating connecting rod. The pushing block is driven by a linear pushing power device. A reset structure connected to the rotating connecting rod to pull the wafer turntable is provided on the base plate, and a limiting structure is provided on the base plate to limit the rotation range of the rotating connecting rod following the wafer turntable.

2. The wafer turntable adjustment device according to claim 1, wherein: The end of the pushing block is provided with an arc protrusion, which is in close contact with the side of the rotating connecting rod. The bottom plate is provided with a sliding guide rail, and the pushing block is slidably mounted on the bottom plate through the sliding guide rail.

3. The wafer turntable adjustment device according to claim 2, wherein: The reset structure includes a reset fixing rod fixed on the bottom plate, and a tension spring is provided between the reset fixing rod and the end of the rotating connecting rod.

4. The wafer turntable adjustment device according to claim 3, wherein: The limiting structure includes limiting bars located on both sides of the rotating connecting rod, and the limiting bars are fixedly installed on the bottom plate.

5. The wafer turntable adjustment device according to claim 4, characterized in that: The bottom plate is also provided with a sensing device for detecting the moving position of the push block, and the sensing device cooperates with the limiting lever to limit the position.

6. The wafer turntable adjustment device according to claim 5, characterized in that: The sensing device is a grating ruler, which is fixed on the pushing block and is used to detect the moving distance of the pushing block.

7. The wafer turntable adjustment device according to claim 1, wherein: A cover shell covering the pushing block is fixedly mounted on the bottom plate.

Images