Rolling supporting structure for eccentric driving of polishing machine and polishing machine

Abstract

The utility model provides a rolling supporting structure for eccentric driving of a polishing machine, and relates to the technical field of semiconductor equipment, the rolling supporting structure comprises a base and a mounting plate slidably supported on the base, and further comprises a sliding part fixedly connected to the opposite sides of the base and the mounting plate; the support is relatively fixed with the other opposite side of the base and the mounting plate, and the support and the sliding piece are oppositely arranged; and the rolling body is installed on the side, facing the sliding piece, of the support, the rolling body can freely roll in the support, and the sliding piece and the rolling body are in an abutting state all the time. The defect that in the prior art, the polishing machine is low in wafer machining efficiency is overcome. The defect that in the prior art, a polishing machine is low in wafer machining efficiency is overcome.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor equipment, in particular to a rolling support structure for eccentric driving of a polishing machine and the polishing machine. BACKGROUND

[0002] When diamond is used as wafer substrate, the surface roughness Ra of the diamond is required to be less than 3 nm, and the surface type accuracy is submicron, that is, the diamond surface needs to reach the level of super-smooth, super-flat and defect-free. Therefore, diamond polishing machine is needed to grind and polish the surface of the diamond.

[0003] The existing diamond polishing machine includes a polishing disc, a rotary driving device, an eccentric driving mechanism, a base and a mounting plate. The polishing disc is used for polishing the diamond. The eccentric driving mechanism is mounted on the base through a bearing. The rotary driving device is connected to the mounting plate. The driving end of the rotary driving device is connected to the polishing disc. During work, the polishing disc is driven to rotate on the wafer by the rotary driving device. The mounting plate is driven to eccentrically rotate by the eccentric driving mechanism. The rotary driving device mounted on the mounting plate follows the mounting plate to eccentrically rotate, so that the polishing disc rotates and eccentrically rotates at the same time, thereby improving the polishing effect. The mounting plate is slidingly supported on the base. Self-lubricating members are arranged on the contact surface between the base and the mounting plate.

[0004] At present, the self-lubricating members arranged between the base and the mounting plate are usually two lubricating graphite plates. The two lubricating graphite plates are respectively mounted on the lower surface of the mounting plate and the upper surface of the base. During work, the two lubricating graphite plates will slide relative to each other. The lubricating graphite plates are specially treated and have high precision and smoothness, thereby improving the operation efficiency of the equipment. However, the lubricating graphite plates are easy-to-wear parts and need to be replaced regularly. During the replacement process, the equipment needs to be stopped, thereby affecting the wafer processing efficiency of the polishing machine and reducing the processing efficiency of the polishing machine. CONTENT OF THE INVENTION

[0005] The present application aims to provide a rolling support structure for eccentric driving of a polishing machine and the polishing machine, and aims to solve the problem of low wafer processing efficiency of the polishing machine in the related art.

[0006] Additional aspects and advantages of the present application will be set forth in part in the following description, and in part will become apparent to those skilled in the art from the description, or can be learned by practice of the present application.

[0007] According to a first aspect of the present application, a rolling support structure for eccentric driving of a polishing machine is provided, comprising a base and a mounting plate slidingly supported on the base, comprising:

[0008] a sliding member fixedly connected to one of the opposite sides of the base and the mounting plate;

[0009] a support fixedly connected to the other of the opposite sides of the base and the mounting plate, the support being opposite to the sliding member;

[0010] a rolling body mounted on a side of the support facing the sliding member, the rolling body being able to freely roll in the support, the sliding member and the rolling body being always in abutment.

[0011] In an exemplary embodiment of the present application, the sliding member is fixedly connected to the lower surface of the mounting plate, and the support is fixedly connected to the upper surface of the base.

[0012] In an exemplary embodiment of the present application, the sliding member is provided as a sliding block, and a side of the sliding block facing the rolling body is provided as a plane.

[0013] In an exemplary embodiment of the present application, the rolling body is provided as a spherical ball.

[0014] In an exemplary embodiment of the present application, the sliding member and the rolling body are provided as a universal ball bearing.

[0015] In an exemplary embodiment of the present application, a protective cover is further provided, the support is located in the protective cover, a top of the protective cover is provided with a clearance, and the rolling body extends out of the clearance.

[0016] In an exemplary embodiment of the present application, an inner wall of the protective cover abuts against the support, so that the support cannot move.

[0017] In an exemplary embodiment of the present application, the upper surface of the base is provided with a threaded hole, and the bottom of the protective cover extends into the threaded hole and is threadedly connected with the base.

[0018] In an exemplary embodiment of the present application, a retaining sleeve is mounted on the top of the support, the rolling body is mounted on the top of the support, the retaining sleeve is provided with a through hole penetrating therethrough, the diameter of the through hole is smaller than the diameter of the rolling body, and the top of the rolling body extends out of the through hole.

[0019] According to a second aspect of the present application, a polishing machine is provided, which comprises the rolling support structure as described above.

[0020] The exemplary embodiments of the present application can have the following partial or all beneficial effects:

[0021] In the rolling support structure for eccentric drive of the polishing machine provided in the example embodiment of the present application, the mounting plate can be suspended on the base by the support structure, and when the polishing machine is started, the relative displacement between the mounting plate and the base is generated to cause the rolling body to form rolling motion on the surface of the sliding body. Compared with the conventional technology, on the one hand, the transition from the sliding friction between the two lubricated graphite plates to the rolling friction between the rolling body and the sliding member is realized, the friction of the support structure of the polishing machine in the working state is significantly reduced, and the stability and accuracy of the operation of the polishing machine are ensured; on the other hand, after the friction is reduced, the wear of the sliding member and the rolling body can be effectively reduced, the service life of the two is prolonged, the maintenance and replacement cycle of the support structure is reduced, and the processing efficiency of the polishing machine on the wafer is effectively improved.

[0022] It should be understood that the above general description and the following detailed description are only exemplary and explanatory, and cannot limit the present application. BRIEF DESCRIPTION OF DRAWINGS

[0023] The drawings incorporated in the specification and constituting a part of the specification illustrate embodiments consistent with the present application and, together with the specification, serve to explain the principles of the present application. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of these drawings.

[0024] Figure 1 A structure diagram of a rolling support structure for eccentric drive of the polishing machine in the example embodiment of the present application is shown;

[0025] Figure 2 A partial sectional view of the rolling support structure in the example embodiment of the present application is shown.

[0026] Explanation of reference signs:

[0027] 1, base; 2, mounting plate; 3, sliding member; 4, support; 5, rolling body; 6, protective cover; 61, avoiding opening; 7, threaded hole; 8, retaining sleeve. DETAILED DESCRIPTION

[0028] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in various forms and should not be construed as limited to the implementations set forth in this document; rather, these implementations are provided so that this application will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals in the drawings indicate the same or similar components, and thus detailed descriptions thereof will be omitted. In addition, the drawings are only schematic diagrams of the present application and are not necessarily drawn to scale.

[0029] Although relative terms are used in this description, such as "upper," "lower," to describe one component's relationship to another component, these terms are used herein solely for convenience and are not intended to limit the scope of the application to a particular orientation. It is to be understood that the described components can be inverted, and that the terms "upper" and "lower" are intended to encompass such variations. When a structure is "on" another structure, it can mean that the structure is formed integrally with the other structure or that the structure is "directly" on the other structure, or that the structure is "indirectly" on the other structure via another structure.

[0030] The terms "one," "a," "an," and "the" are used to mean that "at least one" or "one or more" unless otherwise indicated. The terms "including" and "having" are used to mean "comprising" and are used open-ended in the manner that the term "comprising" is used. The term "first," "second," and the like are used to describe multiple components that are not necessarily limited to a particular number.

[0031] Embodiment 1

[0032] Referring to Figure 1 and Figure 2 In the embodiment of the present application, a rolling support structure for eccentric driving of a polishing machine is provided, which comprises a base 1 and a mounting plate 2 slidingly supported on the base 1, and further comprises:

[0033] a sliding member 3 fixedly connected to one of the opposite sides of the base 1 and the mounting plate 2;

[0034] a support 4 fixedly connected to the other of the opposite sides of the base 1 and the mounting plate 2, the support 4 being arranged opposite to the sliding member 3;

[0035] a rolling body 5 mounted on the side of the support 4 facing the sliding member 3, the rolling body 5 being capable of freely rolling in the support 4, and the sliding member 3 and the rolling body 5 being always in abutting state.

[0036] In the embodiment of the present application, a plurality of sliding members 3, supports 4 and rolling bodies 5 are arranged between the base 1 and the mounting plate 2, each sliding member 3 corresponding to one support 4 and one rolling body 5, and the three corresponding members are arranged as a support group. In order to ensure that the mounting plate 2 can be provided with good support, the support group should be arranged as at least three groups, and the plurality of support groups are evenly distributed around the base 1 and the mounting plate 2. In the current embodiment, the support group is preferably arranged as four groups.

[0037] In the embodiment of the present application, the polishing machine suitable for the rolling support structure in the embodiment of the present application comprises a polishing disc, a rotary driving device and an eccentric driving mechanism. The polishing disc is used for fine polishing of high-hardness materials such as diamond, so that the surface of the wafer reaches good smoothness. The eccentric driving mechanism is connected to the base 1 through a bearing, ensuring the stability and reliability of the system. The rotary driving device is installed on the mounting plate 2, and its driving end is closely connected to the polishing disc, realizing the rotation of the polishing disc. In actual operation, on the one hand, the rotary driving device drives the polishing disc to rotate accurately on the surface of the wafer, realizing uniform processing of the material surface; on the other hand, the eccentric driving mechanism drives the mounting plate 2 to rotate eccentrically, so that the rotary driving device mounted on the mounting plate 2 can rotate eccentrically, and then the polishing disc rotates eccentrically while rotating, which greatly improves the polishing effect, ensures the machining precision and surface quality, and meets the stringent requirements of high-precision material processing.

[0038] In the embodiment of the present application, the rolling body 5 and the support 4 are connected in a rolling manner, and the support 4 positions the rolling body 5, ensuring that the position of the rolling body 5 is fixed during rolling, so as to improve the reliability and stability of the overall structure.

[0039] The mounting plate 2 is suspended on the base 1 by the support structure, ensuring that the mounting plate 2 and the base 1 can produce relative displacement when the polishing machine is started and runs. This displacement causes the rolling body 5 to form a rolling motion on the surface of the sliding member 3, replacing the traditional sliding motion. Specifically, the sliding friction between the two blocks of lubricating graphite is converted into rolling friction between the rolling body 5 and the sliding member 3, which effectively reduces the friction of the polishing machine in the working state, significantly improves the stability and accuracy of the polishing machine operation, and provides a solid guarantee for high-precision processing.

[0040] Furthermore, by effectively reducing the friction, the wear rate of the sliding member 3 and the rolling body 5 is also effectively slowed down, thereby prolonging the service life of the sliding member 3 and the rolling body 5. Not only does it reduce the maintenance and replacement frequency of the support structure and reduce operating costs, but it also effectively improves the processing efficiency of the polishing machine for wafers and ensures the continuity and economic benefits of the production process.

[0041] In the embodiments of the present application, the fixed mounting position of the sliding piece 3 has the following two schemes, specifically, the sliding piece 3 can be fixedly connected to the upper surface of the base 1 or the lower surface of the mounting plate 2. When the sliding piece 3 is fixedly connected to the upper surface of the base 1, the support 4 is fixed relative to the mounting plate 2, and the rolling body 5 is rollingly connected to the lower surface of the support 4, so that the rolling body 5 can roll on the upper surface of the sliding piece 3. Conversely, when the sliding piece 3 is fixedly connected to the lower surface of the mounting plate 2, the support 4 is in a state of being fixed relative to the base 1, and at this time, the rolling body 5 is rollingly connected to the upper surface of the support 4, so that the rolling body 5 is rollingly connected to the lower surface of the sliding piece 3.

[0042] In the present embodiment, the sliding piece 3 is preferably arranged on the lower surface of the mounting plate 2, and the support 4 is arranged on the upper surface of the base 1. In this scheme, since the rolling body 5 is arranged on the upper surface of the support 4, the support 4 can not only accurately position the rolling body 5, but also provide stable support, effectively preventing accidental disconnection between the rolling body 5 and the support 4, greatly simplifying the installation process of the rolling support structure, and greatly facilitating the operation of the staff. This structure not only improves the stability and reliability of the overall structure, but also optimizes the maintenance and assembly process of the equipment.

[0043] In the embodiments of the present application, the sliding piece 3 is arranged as a sliding block, and the side of the sliding block facing the rolling body 5 is arranged as a plane in the horizontal direction. Therefore, the sliding block can move smoothly and without obstruction in the same horizontal plane, effectively avoiding any fluctuations in the vertical direction, thereby providing good stability for the interaction between the sliding piece 3 and the rolling body 5.

[0044] In the embodiments of the present application, the part of the rolling body 5 in contact with the sliding piece 3 is arranged as a spherical surface, and the part of the rolling body 5 connected to the support 4 is not subject to specific shape restrictions. The spherical surface of the rolling body 5 in contact with the sliding piece 3 enables the sliding piece 3 to move more smoothly and smoothly, effectively avoiding any vibration, and significantly improving the stability and accuracy of the mounting plate 2 during operation. The stability of the mounting plate 2 during operation is improved. In the present application, the rolling body 5 is preferably in the form of a ball. This choice is not an absolute limitation, but is based on the good performance of balls in reducing friction and improving motion smoothness, and is more convenient to process than other shapes.

[0045] In the embodiments of the present application, the support 4 and the rolling body 5 are arranged as a universal ball bearing. It can be understood that the support 4 is arranged as a bearing seat, which is structurally stable and can provide accurate positioning and support for the rolling body 5; and the rolling body 5 adopts the form of a universal ball, so that the rolling body 5 can freely rotate in multiple directions. A plurality of steel balls are arranged below the rolling body 5 to support the rolling body 5, and the rolling body 5 is in rolling connection with the steel balls. The plurality of steel balls not only provide good support for the rolling body 5, but also ensure that the rolling body 5 can rotate smoothly. The adaptability and the convenience of operation of the polishing machine are greatly improved. The selection of the universal ball bearing not only ensures smooth and stable movement, but also effectively reduces friction and wear, thereby providing a guarantee for long-term stable operation of the polishing machine.

[0046] In the embodiments of the present application, the rolling support structure further comprises a protective cover 6, and the support 4 and the rolling body 5 are arranged under the protection of the protective cover 6. The top of the protective cover 6 is provided with a clearance 61, and the clearance 61 allows the rolling body 5 to naturally extend from the opening, thereby ensuring the function. The comprehensive protection of the protective cover 6 prevents the support 4 from being accidentally collided by external objects, thereby effectively avoiding the damage risk caused by the collision. At the same time, the structure also effectively isolates impurities from entering the gap between the support 4 and the rolling body 5, thereby reducing the possibility of jamming of the rolling body 5 during rotation, and ensuring smooth and smooth rotation. The maintenance cycle of the rolling body 5 is prolonged, thereby further improving the processing efficiency of the polishing machine for wafers.

[0047] Further, the inner wall of the protective cover 6 and the support 4 form a mutual abutting cooperation, thereby limiting any displacement of the support 4 and ensuring its stability. Through the connection and fixation of the protective cover 6 and the base 1, the relative fixation between the support 4 and the base 1 is achieved, thereby providing excellent stability for the support 4.

[0048] Further, the protective cover 6 and the upper surface of the base 1 are connected in a detachable manner, so as to facilitate the disassembly of the protective cover 6 by the staff, thereby facilitating the maintenance or replacement of the internal support 4 and the rolling body 5. The connection structure between the protective cover 6 and the base 1 is not specially limited. For example, the upper surface of the base 1 is provided with a threaded hole 7, and the circumferential outer wall of the bottom of the protective cover 6 is provided with a matching threaded structure. The bottom of the protective cover 6 is accurately inserted into the threaded hole 7 and is in threaded connection with the base 1, thereby achieving the stable connection between the protective cover 6 and the base 1. The structure not only ensures the stability and reliability of the structure, but also provides convenience for the daily maintenance and component replacement of the support structure. Of course, the above is only an exemplary description, and other various choices such as clamping and inserting are also supported for the connection mode between the protective cover 6 and the base 1.

[0049] In the embodiment of the present application, a retaining sleeve 8 is installed on the top of the support 4. In the present application, the retaining sleeve 8 is fixedly connected to the support 4 by bolts, which is of course not restrictive. A through hole is provided through the retaining sleeve 8, and the rolling element 5 partially extends from the through hole. It is worth noting that the diameter of the through hole is smaller than the diameter of the rolling element 5, so only the top of the rolling element 5 can extend from the through hole. It is further explained that the part of the rolling element 5 that is smaller than the size of the through hole extends from the through hole and is located above the retaining sleeve 8, while the part of the rolling element 5 that is larger than the size of the through hole is located below the retaining sleeve 8. The restriction and constraint of the rolling element 5 by the retaining sleeve 8 not only provides good stability for the rolling element 5 and prevents the rolling element 5 from detaching from the support 4, but also ensures its precise positioning and balance during high-speed operation.

[0050] Example 2

[0051] In an embodiment of the present application, a polishing machine is also provided, which includes the rolling support structure in Example 1.

[0052] Those skilled in the art will readily appreciate other embodiments of the present invention after considering the specification and practicing the embodiments of the present invention. This application is intended to cover any variations, uses, or adaptations of the present invention that follow the general principles of the present invention and include common knowledge or customary techniques in the art that are not covered by this application. The specification and embodiments are intended to be exemplary only, and the true scope and spirit of the present invention are indicated by the appended claims.

Claims

1. A rolling support structure for an eccentric drive of a polishing machine, comprising a base (1) and a mounting plate (2) slidably supported on the base (1), characterized in that: include: A sliding member (3) is fixedly connected to one of the opposite sides of the base (1) and the mounting plate (2); A support (4) is fixed relative to the other side of the base (1) and the mounting plate (2), and the support (4) is arranged relative to the sliding member (3); A rolling body (5) is installed on the side of the support (4) facing the sliding member (3). The rolling body (5) can roll freely in the support (4), and the sliding member (3) and the rolling body (5) are always in abutment.

2. The rolling support structure for eccentric drive of a polishing machine according to claim 1, characterized in that: The sliding member (3) is fixedly connected to the lower surface of the mounting plate (2), and the support (4) is relatively fixed to the upper surface of the base (1).

3. The rolling support structure for eccentric drive of a polishing machine according to claim 1, characterized in that: The sliding member (3) is configured as a sliding block, and a side of the sliding block facing the rolling body (5) is configured as a plane.

4. The rolling support structure for eccentric drive of a polishing machine according to claim 1, characterized in that: The rolling body (5) is configured as a spherical ball.

5. The rolling support structure for eccentric drive of a polishing machine according to claim 1, characterized in that: The sliding member (3) and the rolling element (5) are configured as universal ball bearings.

6. The rolling support structure for eccentric drive of a polishing machine according to any one of claims 1 to 5, characterized in that: It also includes a protective cover (6), the support (4) is located in the protective cover (6), a relief opening (61) is provided on the top of the protective cover (6), and the rolling body (5) extends out from the relief opening (61).

7. The rolling support structure for eccentric drive of a polishing machine according to claim 6, characterized in that: The inner wall of the protective cover (6) abuts against the support (4), preventing the support (4) from moving.

8. The rolling support structure for eccentric drive of a polishing machine according to claim 6, characterized in that: A threaded hole (7) is provided on the upper surface of the base (1), and the bottom of the protective cover (6) extends into the threaded hole (7) and is threadedly connected to the base (1).

9. The rolling support structure for eccentric drive of a polishing machine according to claim 4 or 5, characterized in that: A retaining sleeve (8) is installed on the top of the support (4), and the rolling body (5) is installed on the top of the support (4). The retaining sleeve (8) is penetrated by a through hole, the diameter of the through hole is smaller than the diameter of the rolling body (5), and the top of the rolling body (5) protrudes from the through hole.

10. A polishing machine, characterized in that: The rolling support structure comprises the rolling support structure according to any one of claims 1 to 9.

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