Glass coating target material structure

Abstract

The utility model relates to the technical field of glass coating processing, and discloses a glass coating target material structure which is not easy to fall off in coating and high in silicon target material maintenance efficiency, the glass coating target material structure comprises a copper back plate, a target material main body and a heat conduction steel bar, the back surface of the target material main body is fixedly connected with the front surface of the copper back plate; a first annular sand blasting layer surrounding the target material main body is arranged on the front surface of the copper back plate; a groove is formed in the middle of the front surface of the target material main body, a sputtering area is formed on the inner surface of the groove, a non-sputtering area is formed on the edge of the groove on the front surface of the target material main body, a second annular sand blasting layer is arranged on the non-sputtering area, and the contour shape of the second annular sand blasting layer is the same as that of the non-sputtering area; the heat conduction steel bars are contained in the grooves and fixedly connected with the bottom faces of the grooves, strip-shaped sand blasting layers are arranged on the faces, back on to the copper back plate, of the heat conduction steel bars, and the shapes of the strip-shaped sand blasting layers are the same as the shapes of the faces, back on to the copper back plate, of the heat conduction steel bars.

Description

TECHNICAL FIELD

[0001] The utility model relates to glass coating processing technical field especially is related to a kind of glass coating target material structure for glass vacuum sputtering coating operation. BACKGROUND

[0002] Glass magnetron sputtering coating refers to in the vacuum environment of inert gas, high-voltage direct current or radio frequency electric field is applied between target material and glass substrate, makes inert gas ionization and generates plasma, by plasma impinging target material surface, target material surface atom or molecule is stripped from target material, and target material atom or molecule after stripping is deposited on substrate surface, to form the coating process of thin film layer, it has the advantages such as high precision, controllability, improves glass coating quality. At present, the industry mainly uses silicon target material with SiO2 Coating on surface to coat glass surface, and the front surface of silicon target material is smooth, and the adsorption force is insufficient, so that the binding force of target material and coating is insufficient. Because of sputtering coating process, the degree of silicon target material surface being sputtered is not uniform, on the racetrack of electron rotation, part of silicon target material surface is preferentially sputtered and forms sputtering groove, while the edge part of the front surface of silicon target material is not impacted by electron, outside the electron rotation racetrack, becomes non-sputtering area, resulting in a large amount of coating deposition in non-sputtering area and forming coating accumulation. When silicon target material circulates in each electroplating cavity, due to unstable combination of coating and silicon target material, airflow will cause the accumulated coating to be warped and fall off, and the fallen coating pollutes the electroplating chamber, so that the glass produces unerasable dirt and bright spots in the electroplating process, thereby affecting the glass coating quality. In the maintenance process of coating equipment, a large amount of air rushes into the electroplating chamber after the coating equipment is opened, causing the coating on the non-sputtering area of the front surface of the silicon target material to fall off, in order to ensure the cleanliness of the electroplating environment, manual grinding with a skin grinder is required, which is time-consuming and labor-intensive, and the maintenance efficiency of the silicon target material is insufficient. UTILITY MODEL CONTENTS

[0003] Therefore, it is necessary to provide a glass coating target material structure with non-easily-fallen coating and high silicon target material maintenance efficiency.

[0004] A glass coating target material structure includes a copper back plate, a target material body, and a heat-conducting steel strip. The back surface of the target material body is fixedly connected to the front surface of the copper back plate, and the front surface of the copper back plate has a first annular sandblasting layer surrounding the target material body. A recess is formed in the middle of the front surface of the target material body, the inner surface of the recess forms a sputtering area, and the edge of the front surface of the target material body forms a non-sputtering area. A second annular sandblasting layer is arranged on the non-sputtering area, and the profile shape of the second annular sandblasting layer is the same as that of the non-sputtering area. The heat-conducting steel strip is accommodated in the recess and is fixedly connected to the groove bottom surface of the recess. A strip-shaped sandblasting layer is arranged on the side of the heat-conducting steel strip away from the copper back plate, and the shape of the strip-shaped sandblasting layer is the same as that of the side of the heat-conducting steel strip away from the copper back plate.

[0005] In one of the embodiments, the surface roughness Ra of the first annular sandblasted layer is 4-6um, the surface roughness Ra of the second annular sandblasted layer is 4-6um, the surface roughness Ra of the strip-shaped sandblasted layer is 4-6um, and the surface roughness Ra of the inner surface of the groove is less than or equal to 1.6um.

[0006] In one of the embodiments, the thickness of the first annular sandblasted layer is 32-48um, the thickness of the second annular sandblasted layer is 32-48um, and the thickness of the strip-shaped sandblasted layer is 32-48um.

[0007] In one of the embodiments, the height of the heat-conducting steel strip is less than or equal to the depth of the groove.

[0008] In one of the embodiments, the heat-conducting steel strip is centrally arranged in the groove and fixedly connected with the groove bottom surface.

[0009] In one of the embodiments, the copper back plate is provided with a plurality of mounting holes penetrating the front surface and the back surface of the copper back plate at positions corresponding to the first annular sandblasted layer.

[0010] The glass coating target material structure of the utility model is provided with the first annular sandblasted layer on the front surface of the copper back plate, the second annular sandblasted layer on the front surface of the target material body, and the strip-shaped sandblasted layer on the heat-conducting steel strip, the combination of the non-sputtering area and the coating on the surface of the glass coating target material structure is improved by the sandblasted layers, the excess coating accumulated in the non-sputtering area is not easy to fall off and fly, the influence of the coating falling off in the electroplating chamber on the glass coating operation is prevented, and the glass coating quality is improved; the increase of the combination of the coating and the non-sputtering area on the glass coating target material structure makes the coating not easy to fall off in the atmospheric state, manual polishing and cleaning are not needed during the maintenance of the glass coating target material structure, the glass coating target material structure can be used for the second time by only simple wiping with a dust-free cloth, and the maintenance efficiency of the glass coating target material structure is improved. BRIEF DESCRIPTION OF DRAWINGS

[0011] Figure 1 It is a top view of the glass coating target material structure in one of the embodiments of the utility model;

[0012] Figure 2 It is a side view of the glass coating target material structure in one of the embodiments of the utility model. DETAILED DESCRIPTION

[0013] In order to make the above-mentioned purpose, features and advantages of the utility model more apparent, obvious and easy to understand, the specific embodiments of the utility model are explained in detail below. In the following description, a large number of specific details are set forth in order to fully understand the utility model. However, the utility model can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the utility model, so the utility model is not limited by the specific embodiments disclosed below.

[0014] Please combine Figure 1 With Figure 2 The utility model discloses a kind of glass coating target structures with coating not easy to fall off, silicon target material maintenance efficiency is high, which includes copper backplate 100, target body 200 and heat-conducting steel strip 300, the back of target body 200 is fixedly connected with the front of copper backplate 100, and the front of copper backplate 100 has the first annular sand blasting layer 110 around target body 200, that is, the width of the back of target body 200 is less than the width of the front of copper backplate 100, the length of the back of target body 200 is less than the length of the front of copper backplate 100. The middle part of the front of target body 200 is provided with groove 210, the inner surface of groove 210 forms sputtering area, the edge of the front of target body 200 in groove 210 forms non-sputtering area, that is, when glass coating target structure is sputtered in electroplating chamber, only the inner surface of groove 210 is impacted by plasma generated by inert gas ionization. The shape of groove 210 is set according to the electron rotation trajectory when glass coating target structure is sputtered, preferably, in the embodiment, the cross section of groove 210 is approximately track-like structure, groove 210 includes two parallel flat surfaces, a first arc surface connected to the two flat surfaces on one side and a second arc surface connected to the two flat surfaces on the other side. The non-sputtering area is provided with a second annular sand blasting layer 220, the contour shape of the second annular sand blasting layer 220 is the same as that of the non-sputtering area, that is, the second annular sand blasting layer 220 covers the entire non-sputtering area. Heat-conducting steel strip 300 is accommodated in groove 210 and fixedly connected with the groove bottom surface of groove 210, one side of heat-conducting steel strip 300 away from copper backplate 100 is provided with a strip-shaped sand blasting layer 310, the shape of strip-shaped sand blasting layer 310 is the same as that of one side of heat-conducting steel strip 300 away from copper backplate 100, that is, strip-shaped sand blasting layer 310 covers one side of heat-conducting steel strip 300 away from copper backplate 100. Before sputtering coating operation, the non-sputtering area of the front of glass coating target structure is covered with coating, the first annular sand blasting layer 110, the second annular sand blasting layer 220 and the strip-shaped sand blasting layer 310 jointly constitute the non-sputtering area of the front of glass coating target structure, that is, the surface of the first annular sand blasting layer 110, the surface of the second annular sand blasting layer 220 and the surface of the strip-shaped sand blasting layer 310 are combined with coating.

[0015] It should be noted that in the present embodiment, the front surface of each component refers to the surface of each component facing the substrate to be coated when the glass coating target structure is suspended in the coating chamber; the back surface of each component refers to the surface of each component facing away from the substrate to be coated when the glass coating target structure is suspended in the coating chamber, and the explanation in other embodiments can also be referred to.

[0016] The glass coating target structure is provided with a first annular sandblasting layer 110 on the front surface of the copper back plate 100, a second annular sandblasting layer 220 on the front surface of the target body 200, and a strip-shaped sandblasting layer 310 on the heat-conducting steel strip 300. By providing the above-mentioned sandblasting layers, the adhesion between the non-sputtering area on the surface of the glass coating target structure and the coating is improved, so that the excess coating accumulated in the non-sputtering area is not easy to fall off and fly, preventing the coating from falling off in the electroplating chamber and affecting the glass coating operation, and improving the glass coating quality. The increase in the adhesion of the coating in the non-sputtering area on the glass coating target structure makes the coating not easy to fall off in the atmospheric state, and manual polishing and cleaning are not required during maintenance of the glass coating target structure. Only a simple wiping with a dust-free cloth can be used for secondary use, improving the maintenance efficiency of the glass coating target structure.

[0017] The copper back plate 100 is made of copper alloy, which has high thermal conductivity. When the copper back plate 100 is connected with the target body 200, it can conduct the heat generated by the target body 200 under ion bombardment, which helps the target body 200 to dissipate heat quickly, thereby reducing the thermal stress and thermal deformation of the target body 200. The strength and toughness of the copper alloy material can effectively withstand the mechanical pressure generated by the target body 200 during use, thereby reducing the risk of cracking and breaking of the target body 200 and improving the service life of the target body 200. In the present embodiment, the length of the copper back plate 100 is 1214.12 mm, the width is 147.32 mm, and the height (or thickness) is 8 mm. Further, a plurality of mounting holes 120 are provided on the copper back plate 100 at positions corresponding to the first annular sandblasting layer 110, which penetrate the front and back surfaces of the copper back plate 100. In the present embodiment, mounting holes 120 are provided on the copper back plate 100, and the glass coating target structure can be installed in the electroplating chamber by screws passing through the mounting holes 120.

[0018] The target body 200 is a polycrystalline silicon plate, which is the main material for glass electroplating film formation. In the present embodiment, the length of the target body 200 is 1193.8 mm, the width is 127 mm, and the height (or thickness) is 6 mm. Preferably, the target body 200 is centrally arranged on the front surface of the copper back plate 100 and fixedly connected with the copper back plate 100. The contact area (bonding area) between the copper back plate 100 and the target body 200 is 151612.6 mm 2The non-contact area of the copper back plate 100 not combined with the target body 200 is 27251.5584mm 2 The length of the glass coating target structure is 1214.12mm, the width is 147.32mm, and the height is 14mm. The heat-conducting steel strip 300 is used to generate heat radiation to the target body 200 after being heated in the electroplating chamber, so that the target body 200 is heated more uniformly, and the problem of cracking of the target from the middle to the periphery is prevented. In this embodiment, the heat-conducting steel strip 300 is made of stainless steel material, for example, the heat-conducting steel strip 300 is made of 304 steel or 316 steel, of course, other types of stainless steel can also be used to make the heat-conducting steel strip 300.

[0019] In an embodiment, the heat-conducting steel strip 300 is centrally arranged in the groove 210 and fixedly connected with the groove bottom surface of the groove 210. In this way, the distance between the heat-conducting steel strip 300 and the two opposite inner side walls of the groove 210 is equal, thereby improving the heat radiation effect of the heat-conducting steel strip 300 on the target body 200, and further improving the uniformity of the heating of the target body 200. The length of the heat-conducting steel strip 300 is 1025.04mm, and the width is 12mm. In this embodiment, the height of the heat-conducting steel strip 300 is less than or equal to the depth of the groove 210. Preferably, the height of the heat-conducting steel strip 300 is equal to the depth of the groove 210, that is, the surface of the heat-conducting steel strip 300 facing away from the copper back plate 100 is flush with the front surface of the target body 200.

[0020] In an embodiment, the surface roughness Ra of the first annular sandblasted layer 110 is 4-6um, the surface roughness Ra of the second annular sandblasted layer 220 is 4-6um, the surface roughness Ra of the strip-shaped sandblasted layer 310 is 4-6um, and the surface roughness Ra of the inner surface of the groove 210 is less than or equal to 1.6um, that is, the roughness Ra of the sputtering area on the front surface of the target body 200 is less than or equal to 1.6um. Further, the thickness of the first annular sandblasted layer 110 is 32-48um, the thickness of the second annular sandblasted layer 220 is 32-48um, and the thickness of the strip-shaped sandblasted layer 310 is 32-48um, to ensure the stability of the coating layer combined on the first annular sandblasted layer 110, the second annular sandblasted layer 220 and the strip-shaped sandblasted layer 310, so that the coating layer covering the front surface of the glass coating target structure will not fall off or curl even in the atmospheric state, preventing the coating layer from falling off from the glass coating target structure due to gas impact when the glass coating target structure is moved after being covered with the coating layer or when the glass coating target structure is opened for maintenance after being placed in the coating chamber, thereby improving the cleanliness of the electroplating chamber, reducing the risk of dirt and bright spots during the electroplating process of the glass, and improving the yield of the glass in the electroplating process section.

[0021] In the processing of the glass coating target structure, first, the copper back plate 100, the target body 200 and the heat-conducting steel strip 300 are fixed together. Laser welding or ultrasonic welding can be used to fix the three together, or other fixing methods can be used to achieve the fixed connection of the three. After the copper back plate 100, the target body 200 and the heat-conducting steel strip 300 are fixed together, a target blank is formed, and then the target blank is placed in a sandblasting jig. The sandblasting jig is composed of a base, a cover plate and a connecting piece. The base has a receiving groove that can accommodate the glass coating target structure. The base and the cover plate are made of aluminum alloy material. The cover plate corresponds to the groove 210 on the glass coating target structure, and a through hole is provided on the cover plate for the heat-conducting steel strip 300. One end of the connecting piece is fixed to the base, and the other end is fixed to the cover plate to achieve the connection of the cover plate and the base. Preferably, the connecting piece can be a chain or a flexible rope. After the target blank is placed in the receiving groove of the base, the cover plate is placed at the groove 210 of the target blank to protect the sputtering area of the target blank and prevent the sandblasting sand particles from damaging the sputtering area of the target blank. Then the sandblasting jig with the target blank is placed in a sandblasting machine for sandblasting treatment. The front surface of the target blank is roughened under the cutting action of the sandblasting sand particles, so that the front surface of the target blank forms a first annular sandblasting layer 110, a second annular sandblasting layer 220 and a strip-shaped sandblasting layer 310 to obtain a glass coating target structure, thereby increasing the adsorption force and the bonding force of the non-sputtering area on the front surface of the glass coating target structure and the electroplated film layer.

[0022] In this embodiment, white jade sand particles with a particle size of 15um are used as sandblasting sand particles during sandblasting of the target blank. The sandblasting pressure during sandblasting operation is 50-100Mpa, the sandblasting distance is 10-50mm, the sandblasting time is 4-5min, and the sandblasting angle is 70°-80°. By setting the above sandblasting parameters, the problem of sand particle embedding on the surface of the glass coating target structure caused by excessive sandblasting pressure can be avoided to ensure the coating performance of the surface of the glass coating target structure. The problem of insufficient kinetic energy of sand particles impacting the target structure caused by excessive sandblasting distance can be avoided to reduce the impact of sand particles on the target structure. The problem of uneven sand surface caused by too short sandblasting time can be avoided. The problem of excessive sandblasting caused by too long sandblasting time, which causes a large amount of sand particles to remain on the surface of the target structure and is not easy to clean, can be avoided. The problem of roughening of the surface of the target structure caused by cutting deformation being changed to extrusion deformation due to excessive particle size of the sand particles can also be avoided, thereby reducing the bonding strength between the surface of the target structure and the SiO2 film layer.

[0023] The technical features of the above-described embodiments can be combined in any manner. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described, but as long as the combinations of the technical features do not exist, they should be considered within the scope of the present disclosure.

[0024] The above-described embodiments only express several implementation manners of the utility model, the description is more specific and detailed, but can not therefore be understood as the limitation of the utility model patent range. It should be pointed out that for ordinary skilled person in the art, without departing from the utility model concept, several modifications and improvements can be made, which belong to the protection range of the utility model. Therefore, the protection range of the utility model patent should be subject to the appended claims.

Claims

1. A glass coating target structure, characterized in that: It includes a copper backing plate, a target body and a heat-conducting steel bar. The back of the target body is fixedly connected to the front of the copper backing plate, and the front of the copper backing plate has a first annular sandblasting layer surrounding the target body; a groove is opened in the middle of the front of the target body, the inner surface of the groove forms a sputtering area, and the front of the target body forms a non-sputtering area at the edge of the groove, and a second annular sandblasting layer is provided on the non-sputtering area, and the contour shape of the second annular sandblasting layer is the same as the contour shape of the non-sputtering area; the heat-conducting steel bar is accommodated in the groove and fixedly connected to the bottom surface of the groove, and a strip sandblasting layer is provided on the side of the heat-conducting steel bar facing away from the copper backing plate, and the shape of the strip sandblasting layer is the same as the shape of the side of the heat-conducting steel bar facing away from the copper backing plate.

2. The glass coating target structure according to claim 1, characterized in that: The surface roughness Ra of the first annular sandblasting layer is 4-6um, the surface roughness Ra of the second annular sandblasting layer is 4-6um, the surface roughness Ra of the strip sandblasting layer is 4-6um, and the surface roughness Ra of the inner surface of the groove is less than or equal to 1.6um.

3. The glass coating target structure according to claim 1, characterized in that: The thickness of the first annular sandblasting layer is 32 to 48 um, the thickness of the second annular sandblasting layer is 32 to 48 um, and the thickness of the strip sandblasting layer is 32 to 48 um.

4. The glass coating target structure according to claim 1, characterized in that: The height of the heat-conducting steel bar is less than or equal to the depth of the groove.

5. The glass coating target structure according to claim 1, characterized in that: The heat-conducting steel bar is centrally arranged in the groove and fixedly connected to the bottom surface of the groove.

6. The glass coating target structure according to claim 1, characterized in that: The copper back plate is provided with a plurality of mounting holes penetrating the front and back sides of the copper back plate at positions corresponding to the first annular sandblasting layer.

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