PECVD (plasma enhanced chemical vapor deposition) equipment with compact structure

Abstract

The utility model relates to the field of photovoltaic equipment, and discloses PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment with a compact structure, which comprises a sheet feeding preheating cavity, a one-stop process cavity and a cooling sheet discharging cavity which are sequentially connected through gate valves. And the one-stop process cavity comprises a plurality of deposition cavities which are communicated with one another and can work independently. The sheet inlet preheating cavity comprises a sheet inlet and outlet stacking cavity and a heating sheet, and the cooling sheet outlet cavity comprises a sheet inlet and outlet stacking cavity and a cooling sheet. The in-out wafer stacking cavity comprises a cavity body, a carrier plate transmission mechanism, a stack lifting mechanism and a vacuum generator. The stack lifting mechanism is provided with a plurality of supporting intervals for placing carrier plates, and heating pieces or cooling pieces are arranged at the bottoms of the supporting intervals. A multi-station deposition technology is replaced by a one-station deposition structure, a door plate valve between deposition cavities is omitted, the number of pump sets is reduced, the cost is saved, the auxiliary process time of a process cavity is shortened, and the equipment takt is reduced. And meanwhile, cavities are integrated, the number of the cavities is reduced, the length of a production line is shortened, and the occupied space cost is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic equipment field especially a compact PECVD equipment of structure. BACKGROUND

[0002] The conventional plate type PECVD equipment reduces the equipment beat and improves single machine capacity with multiple deposition cavities in series multi-station deposition technology, although this technology is a feasible cost reduction technology route, but with the research in-depth, the multi-station deposition technology finds the shortcomings: the increase of the number of deposition cavities makes the process deposition be forcedly evenly divided by the beat, which affects the integrity of amorphous / microcrystalline composite film layer deposition process of certain functional layer and narrows the process window. Figure 5 As shown in the figure, the multi-station deposition technology needs to be equipped with a pump group 700 and an exhaust valve 600 for each deposition cavity to ensure stable connection. At the same time, the multi-station deposition technology has a feeding beat block, which results in a short time for front and rear feeding and auxiliary. In order to ensure the operation beat, the feeding cavity 100, the preheating cavity 200, the process cavity 300, the cooling cavity 400 and the sheet outlet cavity 500 are arranged in sequence, and the main factory is about 37 meters. Due to the large area occupied by one cavity, the more cavities not only increase the equipment cost but also increase the factory cost. At the same time, the multi-station deposition needs to open and close the valve when conveying the carrier plate in the process cavity, which increases the auxiliary time of deposition and affects the capacity. CONTENT OF THE UTILITY MODEL

[0003] The utility model aims at solving the problems of large area occupation and capacity efficiency to be improved in the prior art, and provides a compact PECVD equipment, which can not only shorten the production line length, save equipment and land cost, but also improve the capacity efficiency.

[0004] To achieve the above-mentioned purpose, the utility model adopts the following technical scheme:

[0005] The utility model discloses a compact PECVD equipment which comprises a sheet feeding preheating cavity, a one-station process cavity and a cooling sheet outlet cavity connected through a door valve in sequence. The one-station process cavity comprises a plurality of deposition cavities which are communicated and can work independently. The sheet feeding preheating cavity comprises a sheet feeding and stacking cavity and a heating sheet, and the cooling sheet outlet cavity comprises a sheet feeding and stacking cavity and a cooling sheet.

[0006] The in-out wafer stack cavity comprises a cavity, a carrier plate transmission mechanism, a stack lifting mechanism and a vacuum generator.

[0007] Further, the carrier plate transmission mechanism comprises a transmission wheel and a transmission driving element, the transmission wheel is rotatably arranged at two sides of the cavity, the carrier plate is placed on the transmission wheel, and the transmission driving element is fixed outside the cavity and is in power connection with the transmission wheel for driving the transmission wheel to rotate.

[0008] Further, the stack lifting mechanism comprises a lifting driving unit, a guide rod group and a carrier plate storage frame, one end of the guide rod group is fixed to the upper end or the lower end of the cavity, and the other end penetrates through the carrier plate storage frame, the lifting driving unit is connected with the carrier plate storage frame for driving the carrier plate storage frame to move up and down along the guide rod group, and the support interval is located in the carrier plate storage frame.

[0009] Further, the in-out wafer stack cavity further comprises a cavity rack, the cavity is fixed above the cavity rack, one end of the vacuum generator is in communication with the bottom of the cavity, and the other end is in communication with the outside.

[0010] Further, the stack lifting mechanism further comprises an upper pull rod group, the lower end of the upper pull rod group is connected with the upper end surface of the carrier plate storage frame in multiple points, and the upper end is connected with the lifting driving unit.

[0011] Further, the one-stop process cavity further comprises a vacuum pump group, and one vacuum pump group can correspond to one or more deposition cavities.

[0012] The utility model discloses the beneficial aspect is:

[0013] The utility model discloses a one-station deposition structure instead of the prior art multi-station deposition technology, and the deposition cavities in the process cavity are communicated and can work independently, so that it is not necessary to arrange an exhaust pump set for each cavity, and several deposition cavity exhaust pipelines can be connected in series through pipelines to the same pump set for exhaust, thereby reducing the number of pump sets and saving cost. Meanwhile, the door plate valve between the deposition cavities is cancelled, the auxiliary process time of the process cavity is reduced, the equipment beat is reduced, and the production capacity is improved. Meanwhile, the one-station deposition structure is used for long-beat deposition, and the feeding and discharging time and pretreatment time of the front end and rear end are lengthened, so that the cavity can be integrated, the feeding cavity and preheating cavity and the cooling cavity and discharging cavity of the prior art are combined into a feeding preheating cavity and a cooling discharging cavity, the number of cavities is reduced, the length of the production line is shortened, the land cost is reduced, and the equipment manufacturing cost and installation period are reduced. BRIEF DESCRIPTION OF DRAWINGS

[0014] In order to more clearly illustrate the technical scheme of the embodiments of the utility model, the following will be briefly introduced the drawings needed to be used in the embodiments, it should be understood, the following drawings only shows some embodiments of the utility model, therefore should not be regarded as the limitation to the scope, for the ordinary skilled person in the art, under the premise of not paying the creative labor, can also obtain other related drawings according to these drawings.

[0015] Figure 1 It is the front cross-sectional view of this embodiment.

[0016] Figure 2 It is the schematic view of this embodiment.

[0017] Figure 3 It is the side cross-sectional view of the feeding and discharging stack cavity.

[0018] Figure 4 It is the schematic view of the avoidance area.

[0019] Figure 5 It is the prior art drawing of the background art.

[0020] Main component symbol explanation:

[0021] 1, feeding preheating cavity;

[0022] 2, one-station process cavity, 21, deposition cavity, 22, exhaust pump set;

[0023] 3, cooling discharging cavity;

[0024] 4, feeding and discharging stack cavity, 41, cavity rack, 42, cavity, 43, carrier plate transmission mechanism, 431, conveying wheel, 432, conveying driving part, 44, stack lifting mechanism, 441, support interval, 442, avoidance area, 443, lifting driving unit, 444, pull rod group, 445, guide rod group, 446, carrier plate storage frame, 45, vacuum generator;

[0025] 5. Heating plate;

[0026] 6. Cooling fins. DETAILED DESCRIPTION

[0027] To make the purpose, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0028] In the present invention, unless otherwise stated, directional words such as "up, down, left, right" are generally understood in conjunction with the directions shown in the drawings and actual applications.

[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of this utility model, "plurality" means two or more, unless otherwise specifically defined.

[0030] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, a first feature being "above," "above," and "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is at a higher level than the second feature. A first feature being "below," "below," and "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is at a lower level than the second feature.

[0031] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and these ranges or values ​​should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of each range, the endpoint values ​​of each range and the individual point values, and the individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. Among them, the terms "optional" and "optional" all mean that they may be included or not (or may be present or not).

[0032] like Figure 1 、 Figure 2As shown, the utility model discloses a kind of compact PECVD equipment, it includes the preheating cavity 1 of piece into piece stack cavity 4 and heating piece 5 in sequence through gate valve connection, one station process cavity 2 and cooling piece out cavity 3.

[0033] Among them, one station process cavity 2 includes several intercommunicating and can independently work deposition cavity 21 and evacuation pump group 22. One evacuation pump group 22 can correspond to one or more deposition cavities 21. Preheating cavity 1 of piece into piece stack cavity 4 and heating piece 5 into piece, cooling piece out cavity 3 includes piece into piece stack cavity 4 and cooling piece 6.

[0034] The prior art of multiple station process cavity is short tact time deposition structure, i.e. multiple deposition cavities deposit a piece of carrier plate together, so that the carrier plate stays in the deposition cavity for a short time, and the front and rear end loading and unloading and pretreatment time is relatively short, so multiple pretreatment cavities need to be set to reduce the pretreatment time.

[0035] The one station process cavity 2 designed in the present scheme is a long tact time deposition structure, i.e. each deposition cavity 21 independently deposits a piece of carrier plate, and multiple carrier plates are deposited simultaneously, thereby reserving a relatively long auxiliary time for front end loading and unloading, i.e. pretreatment, so that the preheating cavity of the prior art into piece and the cooling cavity out piece can be combined into the preheating cavity 1 of piece into piece and the cooling cavity 3 out piece respectively, to reduce the number of cavities, shorten the length of production line, reduce the cost of land occupation, and reduce the equipment manufacturing cost and installation period.

[0036] Meanwhile, the process cavity adopts one station deposition structure instead of multiple station deposition technology, and cancels the door plate valve between the deposition cavities 21. Since the multiple deposition cavities 21 of the one station process cavity 2 are interconnected, it is not necessary to set an evacuation pump group 22 for each cavity, and the exhaust pipe of several deposition cavities 21 can be connected in series through a pipe to the same pump group for evacuation and exhaust, thereby reducing the number of pump groups and saving costs. The cancellation of the door plate valve between the deposition cavities 21 can also reduce the auxiliary process time of the process cavity, reduce the equipment tact time, and improve the production capacity.

[0037] Specifically, as shown in Figure 3 , Figure 4 The piece into piece stack cavity 4 includes a cavity frame 41, a cavity 42, a carrier plate transmission mechanism 43, a stack lifting mechanism 44 and a vacuum generator 45.

[0038] The carrier plate transmission mechanism 43 is arranged on the cavity 42 and is used to transport the carrier plate to the work station of the stack lifting mechanism 44. Specifically, the carrier plate transmission mechanism 43 includes a conveying wheel 431 and a conveying drive member 432. The conveying wheel 431 is rotatably arranged on both sides of the cavity 42, and the carrier plate is placed on the conveying wheel 431. The conveying drive member 432 is fixed to the outside of the cavity 42 and is power-connected with the conveying wheel 431, and is used to drive the conveying wheel 431 to rotate.

[0039] The stack lifting mechanism 44 is movably arranged in the film feeding and preheating cavity 1. The stack lifting mechanism 44 is provided with a plurality of support intervals 441 for placing the carrier plate. The bottom of the support interval 441 is provided with a heating film 5 or a cooling film 6. The support interval 441, the heating film 5 and the cooling film 6 are provided with an avoiding area 442 for avoiding the transmission wheel 431 of the carrier plate transmission mechanism 43. When the stack lifting mechanism 44 is lowered to the lowest position, the transmission wheel 431 is located above the uppermost support interval 441. When the stack lifting mechanism 44 is raised to the highest position, the transmission wheel 431 is located below the lowermost support interval 441. Specifically, the stack lifting mechanism 44 comprises a lifting driving unit 443, an upper pull rod group 444, a guide rod group 445 and a carrier plate storage frame 446. One end of the guide rod group 445 is fixed to the upper end or the lower end of the cavity 42, and the other end penetrates through the carrier plate storage frame 446. In the embodiment, the guide rod group 445 is arranged at the lower end of the cavity 42.

[0040] The lower end of the upper pull rod group 444 is connected to the upper end surface of the carrier plate storage frame 446 at multiple points, and the upper end is connected to the lifting driving unit 443, for driving the carrier plate storage frame 446 to move up and down along the guide rod group 445. The arrangement of the upper pull rod group 444 can make the carrier plate storage frame 446 bear force more uniformly. The support interval 441 is located in the carrier plate storage frame 446.

[0041] The cavity 42 is fixed above the cavity frame 41. One end of the vacuum generator 45 is communicated with the bottom of the cavity 42, and the other end is communicated with the outside.

[0042] In use, the carrier plate storage frame 446 is first lowered to the lowest position. The carrier plate transmission mechanism 43 transports the carrier plate to above the carrier plate storage frame 446. The carrier plate storage frame 446 is driven by the lifting driving unit 443 to move upwards, so as to hold the carrier plate and store it in the support interval 441. After the support intervals 441 are filled with the carrier plates, the door valve is closed for preheating. After preheating, the carrier plate storage frame 446 is lowered in sequence. The carrier plate transmission mechanism 43 transports the carrier plates in batches to the deposition cavities 21 of the process cavity for independent deposition. After deposition, the carrier plates are transported to the next process by the same principle, through the carrier plate transmission mechanism 43, the carrier plate storage frame 446 is raised and lowered in the cooling film feeding cavity 3, and the carrier plates are cooled and then transported to the next process.

[0043] In summary, the one-station deposition structure is adopted instead of the multi-station deposition technology. The deposition cavities in the process cavity are communicated and can work independently. The door plate valve between the deposition cavities is cancelled. The number of pump groups is reduced, the cost is saved, the auxiliary process time of the process cavity is reduced, the equipment beat is reduced, and the production capacity is improved. At the same time, the one-station deposition structure is used for long-beat deposition. The feeding and pretreatment time of the front and rear ends is lengthened, so that the cavity body can be integrated, the number of cavity bodies is reduced, the length of the production line is shortened, the land cost is reduced, and the equipment manufacturing cost and installation period are reduced.

[0044] The preferred embodiments of the present application are described in detail above, but the present application is not limited thereto. Within the technical concept of the present application, various simple modifications can be made to the technical solution of the present application, including the combination of various technical features in any other suitable manner. These simple modifications and combinations should also be considered as disclosed content of the present application, and all belong to the protection scope of the present application.

Claims

1. A compact PECVD device, characterized by: The invention comprises a sheet-feeding preheating chamber (1), a one-stop process chamber (2) and a sheet-cooling discharge chamber (3) which are connected in sequence through a gate valve; the one-stop process chamber (2) comprises a plurality of deposition chambers (21) which are interconnected and can work independently; the sheet-feeding preheating chamber (1) comprises a sheet-feeding and discharge stacking chamber (4) and a heating plate (5); the sheet-cooling discharge chamber (3) comprises a sheet-feeding and discharge stacking chamber (4) and a cooling plate (6); The sheet inlet and outlet stacking chamber (4) comprises a chamber (42), a carrier plate transmission mechanism (43), a stacking lifting mechanism (44) and a vacuum generator (45); the carrier plate transmission mechanism (43) is arranged on both sides of the chamber (42); the stacking lifting mechanism (44) is arranged in the sheet inlet preheating chamber (1) so as to be movable up and down, and a plurality of supporting intervals (441) for placing the carrier plates are arranged on the stacking lifting mechanism (44), and a heating plate (5) or a cooling plate (6) is arranged at the bottom of the supporting interval (441). ), a avoidance area (442) for avoiding the carrier plate transmission mechanism (43) is provided on the support interval (441), the heating plate (5) and the cooling plate (6); when the stack lifting mechanism (44) is lowered to the lowest point, the carrier plate transmission mechanism (43) is located above the uppermost support interval (441); when the stack lifting mechanism (44) is raised to the highest point, the carrier plate transmission mechanism (43) is located below the lowermost support interval (441); the vacuum generator (45) is provided outside the cavity (42).

2. The compact PECVD device according to claim 1, characterized in that: The carrier plate transmission mechanism (43) comprises a transmission wheel (431) and a transmission drive member (432). The transmission wheel (431) is rotatably arranged on both sides of the cavity (42). The carrier plate is placed on the transmission wheel (431). The transmission drive member (432) is fixed to the outside of the cavity (42) and is connected to the transmission wheel (431) in a power manner for driving the transmission wheel (431) to rotate.

3. The compact PECVD device according to claim 1, characterized in that: The stack lifting mechanism (44) comprises a lifting drive unit (443), a guide rod group (445) and a carrier plate receiving frame (446); one end of the guide rod group (445) is fixed to the upper end or the lower end of the cavity (42), and the other end passes through the carrier plate receiving frame (446); the lifting drive unit (443) is connected to the carrier plate receiving frame (446) for driving the carrier plate receiving frame (446) to move up and down along the guide rod group (445); the support spacer (441) is located in the carrier plate receiving frame (446).

4. The compact PECVD apparatus according to claim 1, characterized in that: The sheet inlet and outlet stacking chamber (4) further comprises a chamber frame (41), the chamber (42) is fixed above the chamber frame (41), one end of the vacuum generator (45) is connected to the bottom of the chamber (42), and the other end is connected to the outside.

5. The compact PECVD device according to claim 3, characterized in that: The stack lifting mechanism (44) further includes an upper pull rod group (444), the lower ends of which are respectively connected to the upper end surface of the carrier plate storage frame (446) at multiple points, and the upper ends of which are connected to the lifting drive unit (443).

6. The compact PECVD apparatus according to claim 1, characterized in that: The one-stop process chamber (2) further comprises an evacuation pump group (22), and one evacuation pump group (22) can correspond to one or more deposition chambers (21).

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