Integrated wafer frame cleaning machine

Abstract

The utility model discloses an integrated wafer frame cleaning machine which comprises a machine frame, a controller, a cleaning frame assembly and a cleaning tank assembly, the machine frame is vertically arranged on the ground, and a working cavity is formed in the surface of the middle end of the machine frame; the cleaning frame assembly is arranged on the inner side wall of the working cavity; the cleaning tank assembly is arranged on the inner bottom wall of the working cavity; the controller is arranged on the surface of the upper end of the rack, the controller is in seamless butt joint with an external power source through a standardized power connection plug, the controller is connected with the cleaning frame assembly and the cleaning tank assembly through an efficient control bus, and accurate instruction transmission and comprehensive monitoring of the equipment running state are achieved. Therefore, compared with a traditional cleaning pool and groove type design, the occupied area is greatly reduced, flexible deployment on a production line is more convenient, accurate management of use and timely replacement of the cleaning liquid is achieved through the controller, the stability and consistency of the cleaning process are guaranteed, the cleaning quality of products is remarkably improved, and the using effect is good.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of cleaning device especially relates to an integrated wafer frame cleaning machine. BACKGROUND

[0002] In the semiconductor manufacturing industry, the cleaning of wafer frames is a key link to ensure product quality and performance.

[0003] Traditionally, the cleaning process of wafer frames mainly relies on manual operation and the cooperation of auxiliary equipment. In this process, the wafer frame is usually lifted by large mechanical equipment such as a crane and sent into a cleaning tank for cleaning operation.

[0004] However, this cleaning method has problems. First, the traditional cleaning tank design often occupies a large area, which not only increases the space requirement of the production workshop, but also limits the flexibility and scalability of the production line. Second, due to the large volume of the cleaning tank, the cleaning liquid is not replaced frequently, and after long-term use, impurities and pollutants in the cleaning liquid gradually accumulate, which reduces the cleaning effect and further affects the cleanliness of the wafer frame. SUMMARY

[0005] The utility model aims to solve one of the technical problems in the related art at least to some extent.

[0006] To this end, the utility model aims to provide an integrated wafer frame cleaning machine. Compared with the traditional cleaning tank, the slot type design significantly reduces the land occupation and is more convenient for flexible deployment on the production line. The use and timely replacement of cleaning liquid are precisely managed by the controller to ensure the stability and consistency of the cleaning process, thereby significantly improving the cleaning quality of the product and achieving good use effect.

[0007] To achieve the above purpose, the utility model provides an integrated wafer frame cleaning machine, which includes a rack, a controller, a cleaning rack assembly and a cleaning tank assembly. The rack is vertically arranged on the ground, and a working cavity is formed in the middle end surface of the rack. The cleaning rack assembly is arranged on the inner wall of the working cavity, and the cleaning tank assembly is arranged on the bottom wall of the working cavity. The controller is arranged on the upper end surface of the rack and seamlessly connects to the external power supply using a standardized power plug. The controller is connected to the cleaning rack assembly and the cleaning tank assembly through a high-efficiency control bus to realize precise command transmission and comprehensive monitoring of the equipment operating state.

[0008] In addition, the integrated wafer frame cleaning machine according to the above application can have the following additional technical features:

[0009] Specifically, the cleaning frame assembly comprises a lifting slide, a cleaning frame, an electric push rod, a screw rod lifting mechanism and a double-shaft motor, wherein the lifting slide is symmetrically and vertically slidably connected to the inner side wall of the working cavity, the cleaning frame is horizontally slidably connected to the outer surface of the lifting slide, the electric push rod is fixedly connected to the outer surface of the lifting slide and fixedly connected to one end of the cleaning frame, the screw rod lifting mechanism is symmetrically fixedly connected to the inner wall of the rack and corresponds to the position of the lifting slide, one end of the lifting slide penetrates into the interior of the rack and is connected to the screw rod lifting mechanism, the double-shaft motor is fixedly connected to the inner wall of the rack and located between the two groups of screw rod lifting mechanisms, and the two ends of the double-shaft motor are respectively connected to the two groups of screw rod lifting mechanisms; the controller is connected to the electric push rod and the double-shaft motor through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state; the screw rod lifting mechanism comprises a fixed frame, a threaded screw rod, a first bevel gear and a second bevel gear, wherein the fixed frame is fixedly connected to the inner wall of the rack and corresponds to the position of the lifting slide, the threaded screw rod is rotatably connected to the inner wall of the fixed frame, one end of the lifting slide penetrates into the interior of the fixed frame and is threadedly connected to the outer surface of the threaded screw rod, the first bevel gear is fixedly connected to the top of the threaded screw rod, the second bevel gear is rotatably connected to the inner wall of the fixed frame and meshes with the first bevel gear, and the output end of the double-shaft motor is fixedly connected to one end of the central shaft of the first bevel gear through a shaft coupling; the cleaning tank assembly comprises a cleaning tank body, a liquid level sensor, a concentration sensor, an ultrasonic generator, a water injection assembly, a cleaning liquid injection assembly and a waste liquid discharge assembly, wherein the cleaning tank body is symmetrically and fixedly connected to the bottom wall in the working cavity and corresponds to the position of the cleaning frame, the liquid level sensor, the concentration sensor and the ultrasonic generator are fixedly connected to the inner wall of the cleaning tank body, the water injection assembly, the cleaning liquid injection assembly and the waste liquid discharge assembly are sequentially arranged on the inner wall of the rack along the Z-axis direction from top to bottom, one end of the water injection assembly and one end of the cleaning liquid injection assembly are respectively connected to the upper end of the inner cavity of the cleaning tank body, and one end of the waste liquid discharge assembly is connected to the bottom of the inner cavity of the cleaning tank body; the controller is connected to the liquid level sensor, the concentration sensor, the ultrasonic generator, the water injection assembly, the cleaning liquid injection assembly and the waste liquid discharge assembly through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state.The water injection assembly is structurally identical to the cleaning liquid injection assembly, and the water injection assembly comprises two sets of liquid inlet main pipes, liquid inlet electromagnetic valves, flow detectors, two sets of liquid distribution end bases and a liquid storage tank. The two sets of liquid distribution end bases, the two sets of liquid inlet main pipes and the liquid storage tank are respectively arranged on the inner wall of the rack. The liquid inlet electromagnetic valves and the flow detectors are respectively fixedly connected to the two sets of liquid inlet main pipes. The output ends of the two sets of liquid inlet main pipes are respectively connected to the input ends of the two sets of liquid distribution end bases. The input ends of the two sets of liquid inlet main pipes are respectively connected to the output end of the liquid storage tank. The output ends of the two sets of liquid distribution end bases are respectively connected to the upper ends of the inner cavities of the two sets of cleaning tank bodies. The waste liquid discharge assembly comprises two sets of liquid discharge main pipes, liquid discharge electromagnetic valves and a waste liquid storage tank. The two sets of liquid discharge main pipes and the waste liquid storage tank are respectively arranged on the inner wall of the rack. The input ends of the two sets of liquid discharge main pipes are respectively connected to the bottom portions of the inner cavities of the two sets of cleaning tank bodies. The output ends of the two sets of liquid discharge main pipes are respectively connected to the interiors of the waste liquid storage tank. The liquid discharge electromagnetic valves are respectively fixedly connected to the two sets of liquid discharge main pipes. The controller is connected to the liquid inlet electromagnetic valves, the flow detectors and the liquid discharge electromagnetic valves through a high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the running state of the equipment.

[0010] Specifically, the cleaning rack assembly further comprises two sets of electric pressing plate assemblies. The two sets of electric pressing plate assemblies are respectively arranged on the surfaces of the two sets of cleaning frames and are arranged in a staggered manner. The electric pressing plate assembly comprises a first fixing seat, a second fixing seat, a pressing plate frame, an elastic key shaft, a fixed key shaft, a first rotating key cylinder, a second rotating key cylinder and a driving motor. The first fixing seat and the second fixing seat are respectively fixedly connected to the surfaces of the cleaning frames and correspond in position. The pressing plate frame is arranged between the first fixing seat and the second fixing seat. The surface of one end of the pressing plate frame and the surface of the first fixing seat correspond in position and are respectively provided with the elastic key shaft and the first rotating key cylinder. One end of the elastic key shaft is located in the first rotating key cylinder and is slidably connected to the inner wall of the first rotating key cylinder. The surface of the other end of the pressing plate frame and the surface of the second fixing seat correspond in position and are respectively provided with the fixed key shaft and the second rotating key cylinder. One end of the fixed key shaft is located in the second rotating key cylinder and is slidably connected to the inner wall of the second rotating key cylinder. The driving motor is fixedly connected to the inner wall of the second fixing seat. The output end of the driving motor is fixedly connected to the surface of one end of the second rotating key cylinder. The controller is connected to the driving motor through a high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the running state of the equipment.

[0011] Specifically, the cleaning frame assembly further comprises a differential fixedly connected to the inner wall of the rack and located between the double-shaft motor and one of the groups of the lead screw lifting mechanisms, and the output end of the double-shaft motor is connected to one of the groups of the lead screw lifting mechanisms through the differential.

[0012] Specifically, the cleaning frame assembly further comprises two groups of infrared range finders for detecting the placement state of the frame body and the cover plate in the wafer frame respectively, and the two groups of infrared range finders are fixedly connected to the inner top wall of the working cavity respectively and face the cleaning frame, and the controller is connected to the two groups of infrared range finders through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state.

[0013] Specifically, the waste liquid discharge assembly further comprises a rapid drainage mechanism, the rapid drainage mechanism comprises a conical drainage base and a negative pressure pump, the conical drainage base is fixedly connected to the bottom of the cleaning tank body and communicates with the inside of the cleaning tank body, the negative pressure pump is fixedly connected to the inner wall of the rack, the input end of the negative pressure pump is connected to the output end of the conical drainage base, the output end of the negative pressure pump is connected to the input end of the liquid discharge main pipeline, and the controller is connected to the negative pressure pump through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state.

[0014] The additional aspects and advantages of the utility model will be partially given in the following description, some will become obvious from the following description, or be understood through the practice of the utility model.

[0015] Compared with the prior art, the utility model has the following beneficial effects:

[0016] 1、The utility model discloses a reasonable structure, the utility model discloses a rack, working cavity and cleaning tank body are compared to traditional cleaning pool, and the land area is greatly reduced to groove type design, and it is more convenient to deploy flexibly on the production line, and the use effect is good.

[0017] 2、The utility model discloses a controller, water injection assembly, cleaning liquid injection assembly and waste liquid discharge assembly, and the use and timely replacement of cleaning mixed liquor are realized accurate management through the controller, ensure the stability and consistency of the cleaning process, and then the cleaning quality of product is improved significantly, reaches the efficient and high -quality cleaning effect, satisfies the high -standard requirement of modern production to cleanliness and efficiency.

[0018] 3、The utility model discloses a cleaning frame assembly, and the cleaning frame assembly not only can drive wafer frame to enter the cleaning tank body and carry out cleaning operation, but also can drive wafer frame to move up and down and left and right in the cleaning tank body according to the set speed and set times, compared with the fixed position of crane hoisting, the cleaning quality of wafer frame can be further improved by moving the position.

[0019] 4、The utility model discloses set up electric pressing plate assembly, and electric pressing plate assembly can fix the wafer frame on the cleaning frame assembly, effectively promote the stability and security of wafer frame in the cleaning process, and use effect is good;

[0020] 5、The utility model discloses set up differential mechanism, and differential mechanism passes through the transmission ratio of accurate control biax motor, ensures that two groups of cleaning frame can independently descend with the relatively adaptive moving speed, accurately locates the different depth position in the cleaning tank body, this design not only has promoted the adaptability of equipment to frame body and cover plate, also has enhanced the flexibility and effect of cleaning operation significantly, has realized efficient and fine cleaning process;

[0021] 6、The utility model discloses set up two groups of infrared range finder, and two groups of infrared range finder are used for respectively detecting the placement state of frame body and cover plate in wafer frame, when infrared range finder detects frame body, can control water injection component and cleaning liquid injection component operation, first injects liquid to the inside of left cleaning tank body, when infrared range finder detects cover plate, can control water injection component and cleaning liquid injection component operation, and then injects liquid to the inside of right cleaning tank body, because the inside space of right cleaning tank body is less than the inside space of left cleaning tank body, therefore, first injects liquid to the inside of left cleaning tank body, can effectively shorten the liquid injection time, improves the liquid injection efficiency, and use effect is good;

[0022] 7、The utility model discloses set up quick drainage mechanism, and quick drainage mechanism utilizes gravity acceleration and negative pressure suction technology, can rapidly discharge the cleaning mixed solution in the cleaning tank body after cleaning, reduces the drainage time, improves the cleaning efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0023] The above-mentioned and / or additional aspects and advantages of the utility model will become apparent and will be easily understood from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:

[0024] Figure 1 It is a kind of integrated wafer frame cleaning machine structure schematic diagram of the utility model;

[0025] Figure 2 It is the cleaning frame assembly structure schematic diagram in the utility model of a kind of integrated wafer frame cleaning machine;

[0026] Figure 3 It is the electric pressing plate assembly structure schematic diagram in the utility model of a kind of integrated wafer frame cleaning machine;

[0027] Figure 4 It is the screw lifting mechanism structure schematic diagram in the utility model of a kind of integrated wafer frame cleaning machine;

[0028] Figure 5The utility model discloses a kind of cleaning tank assembly structural schematic diagram in integrated wafer frame cleaning machine.

[0029] As shown in the figure:

[0030] 1, rack;2, controller;3, cleaning frame assembly;4, cleaning tank assembly;11, working cavity;

[0031] 31, lifting slide;32, cleaning frame;34, electric push rod;35, screw lifting mechanism;36, double-shaft motor;

[0032] 351, fixed frame;352, threaded screw;353, first bevel gear;354, second bevel gear;

[0033] 41, cleaning tank body;42, liquid level sensor;43, concentration sensor;44, ultrasonic generator;45, water injection assembly;46, cleaning liquid injection assembly;47, waste liquid discharge assembly;

[0034] 451, liquid inlet main pipeline;452, liquid inlet electromagnetic valve;453, flow detector;454, liquid distribution end base;455, liquid storage tank;

[0035] 471, liquid discharge main pipeline;472, liquid discharge electromagnetic valve;473, waste liquid storage tank;

[0036] 33, electric pressing plate assembly;331, first fixed seat;332, second fixed seat;333, pressing plate frame;334, elastic key shaft;335, fixed key shaft;336, first rotating key cylinder;337, second rotating key cylinder;338, driving motor;

[0037] 37, differential;

[0038] 48, quick drainage mechanism;481, conical drainage base;482, negative pressure pump;

[0039] 10, infrared range finder. DETAILED DESCRIPTION

[0040] The embodiments of the utility model are described in detail below, the examples of the embodiments are shown in the drawings, wherein the same or similar reference signs represent the same or similar elements or elements with the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary, and are intended to explain the utility model, and cannot be understood as limiting the utility model. On the contrary, the embodiments of the utility model include all changes, modifications and equivalents falling within the spirit and scope of the appended claims.

[0041] One integrated wafer frame cleaning machine is described below in conjunction with the drawings.

[0042] AsFigures 1-5 The utility model discloses an integrated wafer frame cleaning machine, including frame 1, controller 2, cleaning frame subassembly 3 and cleaning tank subassembly 4, wherein frame 1 is vertically arranged on the ground, and the frame 1 middle end surface is provided with working cavity 11, the cleaning frame subassembly 3 is arranged in the inner side wall of working cavity 11, and the cleaning tank subassembly 4 is arranged in the bottom wall in working cavity 11, and the controller 2 is arranged on the upper end surface of frame 1, and the controller 2 adopts the seamless docking of external power supply with the standardization of electric plug, and the controller 2 is connected with the cleaning frame subassembly 3 and the cleaning tank subassembly 4 respectively through the high -efficient control bus, realizes accurate command transmission and equipment operation state comprehensive monitoring.

[0043] It should be noted that the wafer frame is composed of a frame body and a cover plate.

[0044] It should be noted that the controller 2 is a prior art, and therefore will not be described here.

[0045] In use, the wafer frame to be cleaned is placed on the cleaning frame subassembly 3, and then the water injection assembly 45 and the cleaning liquid injection assembly 46 operate according to the instructions to inject a set amount of water and cleaning liquid into the cleaning tank body 41, respectively. In this process, the ultrasonic wave generator 44 operates according to the instructions and emits ultrasonic waves to improve the mixing efficiency of the water and cleaning liquid. The liquid level sensor 42 operates according to the instructions to detect the liquid level in the cleaning tank body 41 in real time. The concentration sensor 43 operates according to the instructions to detect the concentration of the cleaning mixture in real time, so as to determine the mixing effect of the water and cleaning liquid. When the water and cleaning liquid are completely injected, and the concentration sensor 43 detects that the cleaning mixture is in the best use state, the cleaning frame subassembly 3 operates according to the instructions and drives the wafer frame into the cleaning tank body 41 for ultrasonic cleaning. The wafer frame is moved in and out of the cleaning tank body 41 according to the set rate and set number of times. Then, the cleaned wafer frame is removed and a new wafer frame to be cleaned is placed. In this process, the rapid drainage mechanism 48 and the waste liquid discharge assembly 47 operate according to the instructions to quickly discharge the cleaning mixture in the cleaning tank body 41, facilitating the next liquid injection.

[0046] In one embodiment of the utility model, as shown in Figures 1-5As shown, the cleaning frame assembly 3 comprises a lifting slide 31, a cleaning frame 32, an electric push rod 34, a screw rod lifting mechanism 35 and a double-shaft motor 36, wherein the lifting slide 31 is symmetrically and vertically slidably connected to the inner side wall of the working cavity 11, the cleaning frame 32 is horizontally slidably connected to the outer surface of the lifting slide 31, the electric push rod 34 is fixedly connected to the outer surface of the lifting slide 31 and fixedly connected to one end of the cleaning frame 32, the screw rod lifting mechanism 35 is fixedly connected to the inner wall of the rack 1 and corresponds to the position of the lifting slide 31, one end of the lifting slide 31 penetrates into the interior of the rack 1 and is connected to the screw rod lifting mechanism 35, the double-shaft motor 36 is fixedly connected to the inner wall of the rack 1 and located between the two groups of screw rod lifting mechanisms 35, and the two ends of the double-shaft motor 36 are respectively connected to the two groups of screw rod lifting mechanisms 35; the controller 2 is connected to the electric push rod 34 and the double-shaft motor 36 through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state; the screw rod lifting mechanism 35 comprises a fixed frame 351, a threaded screw rod 352, a first bevel gear 353 and a second bevel gear 354, wherein the fixed frame 351 is fixedly connected to the inner wall of the rack 1 and corresponds to the position of the lifting slide 31, the threaded screw rod 352 is rotatably connected to the inner wall of the fixed frame 351, one end of the lifting slide 31 penetrates into the interior of the fixed frame 351 and is threadedly connected to the outer surface of the threaded screw rod 352, the first bevel gear 353 is fixedly connected to the top of the threaded screw rod 352, the second bevel gear 354 is rotatably connected to the inner wall of the fixed frame 351 and meshes with the first bevel gear 353, and the output end of the double-shaft motor 36 is fixedly connected to one end of the central shaft of the first bevel gear 353 through a shaft coupling; the cleaning tank assembly 4 comprises a cleaning tank body 41, a liquid level sensor 42, a concentration sensor 43, an ultrasonic generator 44, a water injection assembly 45, a cleaning liquid injection assembly 46 and a waste liquid discharge assembly 47, wherein the cleaning tank body 41 is fixedly connected to the bottom wall inside the working cavity 11 and corresponds to the position of the cleaning frame 32, the liquid level sensor 42, the concentration sensor 43 and the ultrasonic generator 44 are fixedly connected to the inner wall of the cleaning tank body 41, the water injection assembly 45, the cleaning liquid injection assembly 46 and the waste liquid discharge assembly 47 are sequentially arranged on the inner wall of the rack 1 along the Z-axis direction from top to bottom, one end of the water injection assembly 45 and one end of the cleaning liquid injection assembly 46 are respectively connected to the upper end of the inner cavity of the cleaning tank body 41, and one end of the waste liquid discharge assembly 47 is connected to the bottom of the inner cavity of the cleaning tank body 41; the controller 2 is connected to the liquid level sensor 42, the concentration sensor 43, the ultrasonic generator 44, the water injection assembly 45, the cleaning liquid injection assembly 46 and the waste liquid discharge assembly 47 through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state.The water injection assembly 45 is the same as the cleaning liquid injection assembly 46 in structure, and the water injection assembly 45 comprises two groups of liquid inlet main pipes 451, liquid inlet electromagnetic valves 452, flow detectors 453, two groups of liquid distribution end bases 454 and liquid storage tanks 455, wherein the two groups of liquid distribution end bases 454, the two groups of liquid inlet main pipes 451 and the liquid storage tanks 455 are arranged on the inner wall of the rack 1, the liquid inlet electromagnetic valves 452 and the flow detectors 453 are fixedly connected to the two groups of liquid inlet main pipes 451 respectively, the output ends of the two groups of liquid inlet main pipes 451 are connected to the input ends of the two groups of liquid distribution end bases 454 respectively, the input ends of the two groups of liquid inlet main pipes 451 are connected to the output ends of the liquid storage tanks 455 respectively, and the output ends of the two groups of liquid distribution end bases 454 are connected to the upper ends of the inner cavities of the two groups of cleaning tank bodies 41 respectively. The waste liquid discharge assembly 47 comprises two groups of liquid discharge main pipes 471, liquid discharge electromagnetic valves 472 and a waste liquid storage tank 473, wherein the two groups of liquid discharge main pipes 471 and the waste liquid storage tank 473 are arranged on the inner wall of the rack 1, the input ends of the two groups of liquid discharge main pipes 471 are connected to the bottoms of the inner cavities of the two groups of cleaning tank bodies 41 respectively, the output ends of the two groups of liquid discharge main pipes 471 are connected to the inside of the waste liquid storage tank 473 respectively, and the liquid discharge electromagnetic valves 472 are fixedly connected to the two groups of liquid discharge main pipes 471 respectively. The controller 2 is connected to the liquid inlet electromagnetic valves 452, the flow detectors 453 and the liquid discharge electromagnetic valves 472 through the high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment running state.

[0047] It should be further explained that the electric push rod 34, the double-shaft motor 36, the liquid level sensor 42, the concentration sensor 43, the ultrasonic wave generator 44, the liquid inlet electromagnetic valve 452, the flow detector 453 and the liquid discharge electromagnetic valve 472 described in the embodiment are all prior art, and thus will not be described here.

[0048] It can be understood that the rack 1 is provided with a cleaning liquid automatic supplementing mechanism (not shown in the figure) for facilitating timely supplementing of the cleaning liquid, the output end of the cleaning liquid automatic supplementing mechanism (not shown in the figure) is connected to the inside of the liquid storage tank 455 in the cleaning liquid injection assembly 46, an automatic liquid discharging mechanism (not shown in the figure) is arranged on the rack 1 for preventing the waste liquid storage tank 473 from being full, and the controller 2 is connected to the cleaning liquid automatic supplementing mechanism (not shown in the figure) and the automatic liquid discharging mechanism (not shown in the figure) through the high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment running state.

[0049] Specifically, the structure and connection relationship of the cleaning frame assembly 3 and the cleaning tank assembly 4 are further described. In use, the cover plates and the frame bodies are placed on the two groups of cleaning frames 32 respectively. After all the cover plates and the frame bodies are placed, the liquid inlet electromagnetic valve 452 and the flow detector 453 in the water injection assembly 45 and the cleaning liquid injection assembly 46 operate according to the instructions. The liquid inlet electromagnetic valve 452 is opened to make the water and the cleaning liquid flow into the cleaning tank body 41 respectively. The flow detector 453 monitors the flow of the water and the cleaning liquid in real time. When the flow of the water and the cleaning liquid reaches the set value, the liquid inlet electromagnetic valve 452 stops operating according to the instructions, so as to control the proportion of the water and the cleaning liquid entering the cleaning tank body 41. By injecting a set amount of water and cleaning liquid into the cleaning tank body 41 respectively, the cleaning mixed liquid is ensured to be in the best state, the stability and consistency of the cleaning process are ensured, and the cleaning quality of the product is significantly improved. In this process, the ultrasonic generator 44 operates according to the instructions and emits ultrasonic waves to improve the mixing efficiency of the water and the cleaning liquid. The liquid level sensor 42 operates according to the instructions and detects the liquid level in the cleaning tank body 41 in real time. The concentration sensor 43 operates according to the instructions and detects the concentration of the cleaning mixed liquid in real time, so as to judge the mixing effect of the water and the cleaning liquid. When the water and the cleaning liquid are completely injected, and the concentration sensor 43 detects that the cleaning mixed liquid is in the best use state, the dual-shaft motor 36 operates according to the instructions and synchronously drives the two groups of screw rod lifting mechanisms 35 to operate. The screw rod lifting mechanisms 35 drive the lifting slides 31 to descend, and the lifting slides 31 descend synchronously to drive the cleaning frames 32 to enter the cleaning tank body 41. The cleaning frames 32 enter the cleaning tank body 41 synchronously to drive the frame bodies and the cover plates to enter the cleaning tank body 41 for ultrasonic cleaning operation. In the cleaning process, the dual-shaft motor 36 is used in cooperation with the screw rod lifting mechanisms 35 to drive the frame bodies and the cover plates to move up and down in the cleaning tank body 41 at a set rate and a set number of times. After the up and down operation is completed, the electric push rod 34 operates according to the instructions to drive the frame bodies and the cover plates to move left and right in the cleaning tank body 41 at a set rate and a set number of times. After the left and right operation is completed, the dual-shaft motor 36 is used in cooperation with the screw rod lifting mechanisms 35 to drive the cover plates and the frame bodies to move out of the cleaning tank body 41. After the cover plates and the frame bodies move out of the cleaning tank body 41, the cleaned cover plates and the frame bodies are removed, and then new cover plates to be cleaned and frame bodies to be cleaned are placed. In this process, the liquid outlet electromagnetic valve 472 operates according to the instructions to make the cleaning mixed liquid in the cleaning tank body 41 flow into the waste liquid storage tank 473 through the liquid outlet main pipeline 471 for collection. When the liquid level sensor 42 detects that the cleaning mixed liquid in the cleaning tank body 41 is completely discharged, the liquid inlet electromagnetic valve 452 and the flow detector 453 in the water injection assembly 45 and the cleaning liquid injection assembly 46 operate again according to the instructions to inject a set amount of water and cleaning liquid into the cleaning tank body 41 respectively for the next group of cover plates to be cleaned and frame bodies to be cleaned for cleaning operation.

[0050] In an embodiment of the utility model, as shown in Figure 3 As shown in the figure, the cleaning frame assembly 3 further comprises two sets of electric pressing plate assemblies 33, which are respectively arranged on the surfaces of the two sets of cleaning frames 32 and are arranged in a staggered manner. The electric pressing plate assembly 33 comprises a first fixed seat 331, a second fixed seat 332, a pressing plate frame 333, an elastic key shaft 334, a fixed key shaft 335, a first rotating key cylinder 336, a second rotating key cylinder 337, and a driving motor 338. The first fixed seat 331 and the second fixed seat 332 are respectively fixedly connected to the surfaces of the cleaning frames 32 and correspond in position. The pressing plate frame 333 is arranged between the first fixed seat 331 and the second fixed seat 332. The surface of one end of the pressing plate frame 333 corresponds in position to the surface of the first fixed seat 331, and the elastic key shaft 334 and the first rotating key cylinder 336 are respectively arranged at the corresponding position. The one end of the elastic key shaft 334 is located inside the first rotating key cylinder 336 and is slidably connected to the inner wall of the first rotating key cylinder 336. The surface of the other end of the pressing plate frame 333 corresponds in position to the surface of the second fixed seat 332, and the fixed key shaft 335 and the second rotating key cylinder 337 are respectively arranged at the corresponding position. The one end of the fixed key shaft 335 is located inside the second rotating key cylinder 337 and is slidably connected to the inner wall of the second rotating key cylinder 337. The driving motor 338 is fixedly connected to the inner wall of the second fixed seat 332. The output end of the driving motor 338 is fixedly connected to the surface of one end of the second rotating key cylinder 337. The controller 2 is connected to the driving motor 338 through a high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the running state of the equipment.

[0051] It should be noted that the driving motor 338 described in this embodiment is a stepping motor, which is a prior art and will not be described here.

[0052] Specifically, the structure and connection relationship of the electric pressing plate assembly 33 are further described. The electric pressing plate assembly 33 is arranged to fix the cover plate and the frame body, effectively improving the stability and safety of the cover plate and the frame body during the cleaning process, and has good use effect. During use, the driving motor 338 operates according to the command and drives the second rotating key cylinder 337 to rotate to a set angle. The second rotating key cylinder 337 rotates synchronously to drive the fixed key shaft 335, the pressing plate frame 333, the elastic key shaft 334, and the first rotating key cylinder 336 to rotate. When the pressing plate frame 333 contacts and compacts the top of the cover plate and the frame body, the driving motor 338 stops operating according to the command.

[0053] In an embodiment of the utility model, as shown in Figure 2 The cleaning frame assembly 3 further comprises a differential 37, which is fixedly connected to the inner wall of the rack 1 and located between the double-shaft motor 36 and one of the screw rod lifting mechanisms 35. The output end of the double-shaft motor 36 is connected to one of the screw rod lifting mechanisms 35 through the differential 37.

[0054] It should be noted that, in order to reduce resource consumption, the cleaning tank 41 of the cleaning cover plate is smaller in depth than the cleaning tank 41 of the cleaning frame.

[0055] Specifically, in order to adjust the descending speed of the cover plate and the frame, a differential mechanism 37 is specially arranged, which can ensure that the two groups of cleaning frames 32 can independently descend at a relatively adaptive speed by accurately controlling the transmission ratio of the double-shaft motor 36, and accurately position at different depth positions in the cleaning tank 41. This design not only improves the adaptability of the equipment to the frame and the cover plate, but also significantly enhances the flexibility and effect of the cleaning operation, and realizes an efficient and fine cleaning process.

[0056] In an embodiment of the utility model, as shown in Figure 2 The cleaning frame assembly 3 further comprises two groups of infrared range finders 10 for detecting the placement state of the frame and the cover plate in the wafer frame, respectively. The two groups of infrared range finders 10 are fixedly connected to the top wall in the working cavity 11 and face the cleaning frames 32. The controller 2 is connected to the two groups of infrared range finders 10 through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state.

[0057] It should be noted that the infrared range finder 10 is a prior art, and therefore will not be described here.

[0058] Specifically, the two groups of infrared range finders 10 are used to detect the placement state of the frame and the cover plate in the wafer frame, respectively. When the infrared range finder 10 detects the frame, the water injection assembly 45 and the cleaning liquid injection assembly 46 can be controlled to operate, and liquid is first injected into the inside of the left cleaning tank 41. When the infrared range finder 10 detects the cover plate, the water injection assembly 45 and the cleaning liquid injection assembly 46 can be controlled to operate, and liquid is then injected into the inside of the right cleaning tank 41. Since the internal space of the right cleaning tank 41 is smaller than that of the left cleaning tank 41, liquid is first injected into the inside of the left cleaning tank 41, which can effectively shorten the overall liquid injection time and improve the liquid injection efficiency, and the use effect is good.

[0059] In an embodiment of the utility model, as shown in Figure 5 The waste liquid discharge assembly 47 further comprises a quick drainage mechanism 48, and the quick drainage mechanism 48 comprises a conical drainage base 481 and a negative pressure pump 482. The conical drainage base 481 is fixedly connected to the bottom of the cleaning tank 41 and is in communication with the inside of the cleaning tank 41. The negative pressure pump 482 is fixedly connected to the inner wall of the rack 1. The input end of the negative pressure pump 482 is connected to the output end of the conical drainage base 481. The output end of the negative pressure pump 482 is connected to the input end of the liquid discharge main pipeline 471. The controller 2 is connected to the negative pressure pump 482 through the high-efficiency control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state.

[0060] It should be noted that the negative pressure pump 482 described in this embodiment is a prior art, and therefore will not be described here.

[0061] Specifically, the rapid drainage mechanism 48 utilizes gravity acceleration and negative pressure suction technology to rapidly drain the cleaning mixture in the cleaning tank 41 after cleaning is completed, reduces the drainage time, and improves the cleaning efficiency.

[0062] In summary, compared with the traditional cleaning pool, the integrated wafer frame cleaning machine has a significantly reduced land occupation due to the tank type design, and is more flexible to deploy on the production line, wherein the use and timely replacement of the cleaning liquid are precisely managed by the controller 2 to ensure the stability and consistency of the cleaning process, thereby significantly improving the cleaning quality of the product and having good use effect.

[0063] In the description of the present specification, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present utility model, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0064] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present utility model. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, the skilled in the art can combine and combine the different embodiments or examples described in the present specification and the features of the different embodiments or examples without contradiction.

[0065] Although the embodiments of the present utility model have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limiting the present utility model. The ordinary skilled in the art can change, modify, replace and deform the above embodiments within the scope of the present utility model.

Claims

1. An integrated wafer frame cleaning machine, characterized by, Including frame (1), controller (2), cleaning frame assembly (3) and cleaning tank assembly (4), wherein, The frame (1) is vertically arranged on the ground, and a working cavity (11) is formed in the end surface of the frame (1); The cleaning frame assembly (3) is arranged on the inner side wall of the working cavity (11); The cleaning tank assembly (4) is arranged on the bottom wall of the working cavity (11); The controller (2) is arranged on the upper end surface of the frame (1), the controller (2) is connected to the external power supply by a standardized electrical plug, and the controller (2) is connected to the cleaning frame assembly (3) and the cleaning tank assembly (4) through an efficient control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state; The cleaning frame assembly (3) includes a lifting slide (31), a cleaning frame (32), an electric push rod (34), a screw lifting mechanism (35) and a double-shaft motor (36), wherein the lifting slide (31) is symmetrically and vertically connected to the inner side wall of the working cavity (11), the cleaning frame (32) is horizontally connected to the outer surface of the lifting slide (31), the electric push rod (34) is fixedly connected to the outer surface of the lifting slide (31) and fixedly connected to one end of the cleaning frame (32), the screw lifting mechanism (35) is fixedly connected to the inner wall of the frame (1) and corresponds to the position of the lifting slide (31), one end of the lifting slide (31) penetrates into the interior of the frame (1) and is connected to the screw lifting mechanism (35), the double-shaft motor (36) is fixedly connected to the inner wall of the frame (1) and located between the two groups of screw lifting mechanisms (35), and the double-shaft motor (36) is connected to the two groups of screw lifting mechanisms (35) at both ends, respectively, the controller (2) is connected to the electric push rod (34) and the double-shaft motor (36) through an efficient control bus to realize accurate command transmission and comprehensive monitoring of the equipment running state; The screw lifting mechanism (35) includes a fixed frame (351), a threaded screw rod (352), a first bevel gear (353) and a second bevel gear (354), wherein the fixed frame (351) is fixedly connected to the inner wall of the frame (1) and corresponds to the position of the lifting slide (31), the threaded screw rod (352) is rotatably connected to the inner wall of the fixed frame (351), one end of the lifting slide (31) penetrates into the interior of the fixed frame (351) and is threadedly connected to the outer surface of the threaded screw rod (352), the first bevel gear (353) is fixedly connected to the top of the threaded screw rod (352), the second bevel gear (354) is rotatably connected to the inner wall of the fixed frame (351) and meshes with the first bevel gear (353), and the output end of the double-shaft motor (36) is fixedly connected to one end of the central shaft of the first bevel gear (353) through a shaft coupling. The cleaning tank assembly (4) comprises a cleaning tank body (41), a liquid level sensor (42), a concentration sensor (43), an ultrasonic generator (44), a water injection assembly (45), a cleaning liquid injection assembly (46) and a waste liquid discharge assembly (47), wherein the cleaning tank body (41) is fixedly connected symmetrically to the inner bottom wall of the working cavity (11) and corresponds in position to the cleaning frame (32), the liquid level sensor (42), the concentration sensor (43) and the ultrasonic generator (44) are fixedly connected respectively to the inner wall of the cleaning tank body (41), the water injection assembly (45), the cleaning liquid injection assembly (46) and the waste liquid discharge assembly (47) are sequentially arranged from top to bottom along the Z-axis direction on the inner wall of the rack (1), one end of the water injection assembly (45) and one end of the cleaning liquid injection assembly (46) are connected respectively to the upper end of the inner cavity of the cleaning tank body (41), one end of the waste liquid discharge assembly (47) is connected to the bottom of the inner cavity of the cleaning tank body (41), and the controller (2) is connected respectively to the liquid level sensor (42), the concentration sensor (43), the ultrasonic generator (44), the water injection assembly (45), the cleaning liquid injection assembly (46) and the waste liquid discharge assembly (47) through a high-efficiency control bus to realize precise command transmission and comprehensive monitoring of the equipment operating state; The water injection assembly (45) and the cleaning liquid injection assembly (46) are the same in structure, the water injection assembly (45) comprises two groups of liquid inlet main pipelines (451), a liquid inlet electromagnetic valve (452), a flow detector (453), two groups of liquid distribution end bases (454) and a liquid storage tank (455), wherein the two groups of liquid distribution end bases (454), the two groups of liquid inlet main pipelines (451) and the liquid storage tank (455) are arranged respectively on the inner wall of the rack (1), the liquid inlet electromagnetic valve (452) and the flow detector (453) are fixedly connected respectively to the two groups of liquid inlet main pipelines (451), the output ends of the two groups of liquid inlet main pipelines (451) are connected respectively to the input ends of the two groups of liquid distribution end bases (454), the input ends of the two groups of liquid inlet main pipelines (451) are connected respectively to the output end of the liquid storage tank (455), and the output ends of the two groups of liquid distribution end bases (454) are connected respectively to the upper ends of the inner cavities of the two groups of cleaning tank bodies (41); The waste liquid discharge assembly (47) comprises two groups of liquid discharge main pipelines (471), a liquid discharge electromagnetic valve (472) and a waste liquid storage tank (473), wherein the two groups of liquid discharge main pipelines (471) and the waste liquid storage tank (473) are arranged respectively on the inner wall of the rack (1), the input ends of the two groups of liquid discharge main pipelines (471) are connected respectively to the bottoms of the inner cavities of the two groups of cleaning tank bodies (41), the output ends of the two groups of liquid discharge main pipelines (471) are connected respectively to the inside of the waste liquid storage tank (473), and the liquid discharge electromagnetic valve (472) is fixedly connected respectively to the two groups of liquid discharge main pipelines (471). The controller (2) is connected with the liquid inlet electromagnetic valve (452), the flow detector (453) and the liquid outlet electromagnetic valve (472) through a high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment running state.

2. The integrated wafer frame cleaning machine of claim 1, wherein The cleaning frame assembly (3) further comprises two groups of electric pressing plate assemblies (33), which are arranged on the surfaces of the two groups of cleaning frames (32) and are arranged in a staggered manner, and the electric pressing plate assembly (33) comprises a first fixing seat (331), a second fixing seat (332), a pressing plate frame (333), an elastic key shaft (334), a fixed key shaft (335), a first rotating key cylinder (336), a second rotating key cylinder (337) and a driving motor (338), wherein the first fixing seat (331) and the second fixing seat (332) are fixedly connected to the surfaces of the cleaning frames (32) and correspond in position, the pressing plate frame (333) is arranged between the first fixing seat (331) and the second fixing seat (332), the surface of one end of the pressing plate frame (333) corresponds in position to the surface of the first fixing seat (331), and the elastic key shaft (334) and the first rotating key cylinder (336) are arranged at the corresponding position, one end of the elastic key shaft (334) is located in the first rotating key cylinder (336) and is in sliding connection with the inner wall of the first rotating key cylinder (336), the surface of the other end of the pressing plate frame (333) corresponds in position to the surface of the second fixing seat (332), and the fixed key shaft (335) and the second rotating key cylinder (337) are arranged at the corresponding position, one end of the fixed key shaft (335) is located in the second rotating key cylinder (337) and is in sliding connection with the inner wall of the second rotating key cylinder (337), the driving motor (338) is fixedly connected to the inner wall of the second fixing seat (332), the output end of the driving motor (338) is fixedly connected to the surface of one end of the second rotating key cylinder (337), and the controller (2) is connected with the driving motor (338) through a high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment running state.

3. The integrated wafer frame cleaning machine of claim 1, wherein, The cleaning frame assembly (3) further comprises a differential mechanism (37), which is fixedly connected to the inner wall of the rack (1) and located between the double-shaft motor (36) and one of the screw rod lifting mechanisms (35), and the output end of the double-shaft motor (36) is connected with one of the screw rod lifting mechanisms (35) through the differential mechanism (37).

4. The integrated wafer frame cleaning machine of claim 1, wherein, The cleaning frame assembly (3) further comprises two groups of infrared range finders (10), which are used for detecting the placement states of the frame bodies and cover plates in the wafer frames, and are fixedly connected to the inner top walls of the working cavities (11) and face the cleaning frames (32), and the controller (2) is connected with the two groups of infrared range finders (10) through a high-efficiency control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment running state.

5. The integrated wafer frame cleaning machine of claim 1, wherein, The waste liquid discharge assembly (47) further comprises a quick drainage mechanism (48), the quick drainage mechanism (48) comprises a conical drainage base (481) and a negative pressure pump (482), wherein the conical drainage base (481) is fixedly connected at the bottom of the cleaning tank body (41) and communicates with the inside of the cleaning tank body (41), the negative pressure pump (482) is fixedly connected to the inner wall of the rack (1), the input end of the negative pressure pump (482) is connected with the output end of the conical drainage base (481), the output end of the negative pressure pump (482) is connected with the input end of the liquid discharge main pipeline (471), and the controller (2) is connected with the negative pressure pump (482) through an efficient control bus, so as to realize accurate instruction transmission and comprehensive monitoring of the equipment running state.

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