Cleaning auxiliary device of sputter coating machine

Abstract

The utility model provides an auxiliary cleaning device for a sputter coating machine, which comprises a process coating cavity, a transition cavity is arranged on one side of the process coating cavity, a working gas input channel is arranged at the bottom of the process coating cavity, the transition cavity is communicated with the process coating cavity, and the working gas input channel is communicated with the transition cavity. A rotary shielding mechanism is arranged in the process coating cavity and comprises a shielding plate, a bearing plate and a rotating mechanism, and when the process coating cavity needs to be cleaned, the rotating mechanism rotates the shielding plate to the upper part of the working gas input channel to shield the working gas input channel, so that the working gas input channel is prevented from being damaged in the cleaning process; the target material or the gas material falls into the working gas input channel to cause pollution of the working gas input channel, and when process coating is carried out, the rotating mechanism rotates the shielding plate to the transition cavity to prevent the shielding plate from influencing input of working gas of the working gas input channel to cause non-uniformity of sputter coating.

Description

TECHNICAL FIELD

[0001] The utility model relates to sputter coating technology field, more specifically, relate to a kind of sputter coating machine's cleaning auxiliary device. BACKGROUND

[0002] Sputter deposition is a kind of physical vapor deposition (PVD) process, is widely used in thin film preparation. The principle of sputter deposition is by high-energy particle bombardment target material, and the target material particle on target material is hit out, so that target material particle deposition forms thin film. However, after high-energy particle bombardment target material, high-energy particle will be attached on target material, so that when using another particle to bombard target material again, the thin film formed will be doped with other particles, affect the reliability of sputter deposition.

[0003] Therefore, it is necessary to clean other particles on the target material during the next coating, but during the cleaning process, since the working gas input channel is always in a connected state, the target material or gas material falls into the working gas input channel, causing pollution of the working gas input channel. UTILITY MODEL CONTENT

[0004] Therefore, in order to solve the above problems, the utility model provides a kind of cleaning auxiliary device of sputter coating machine, including process coating cavity 10, its characterized in that: the one side of process coating cavity 10 is equipped with transition cavity 20, the bottom of process coating cavity 10 is equipped with working gas input channel 30, transition cavity 20 is communicated with process coating cavity 10, rotating shielding mechanism 40 is equipped in process coating cavity 10, rotating shielding mechanism 40 includes shutter 60, support plate 70 and rotating mechanism 41, shutter 60 is clamped with support plate 70, the one side lower part of support plate 70 is equipped with rotating mechanism 41, rotating mechanism 41 makes support tray rotate, so that support plate 70 carries shutter 60, when needing to clean process coating cavity 10, rotating mechanism 41 rotates shutter 60 to the upper portion of working gas input channel 30, for shielding working gas input channel 30, prevent target material or gas material from falling into working gas input channel 30 during cleaning, cause pollution of working gas input channel 30, when carrying out process coating, rotating mechanism 41 rotates shutter 60 to transition cavity 20, to prevent shutter 60 from affecting the input of working gas of working gas input channel 30, cause the unevenness of sputter coating.

[0005] The utility model provides a kind of sputtering coating machine's cleaning auxiliary device, including process coating cavity 10, it is characterized in that: the side of process coating cavity 10 is equipped with transition cavity 20, the bottom of process coating cavity 10 is equipped with working gas input channel 30, transition cavity 20 is communicated with process coating cavity 10, rotating shielding mechanism 40 is equipped in process coating cavity 10, rotating shielding mechanism 40 includes shutter 60, support plate 70 and rotating mechanism 41, shutter 60 is clamped with support plate 70, the lower side of support plate 70 is equipped with rotating mechanism 41, rotating mechanism 41 makes support tray rotate, so that support plate 70 carries shutter 60, when needing to carry out the cleaning of process coating cavity 10, rotating mechanism 41 rotates shutter 60 to the upper portion of working gas input channel 30, for shielding working gas input channel 30, prevent target material or gas material from falling into to working gas input channel 30 in the process of cleaning, cause the pollution of working gas input channel 30, when carrying out process coating, rotating mechanism 41 rotates shutter 60 to transition cavity 20, to prevent shutter 60 from affecting the input of the working gas of working gas input channel 30, cause the unevenness of sputtering coating.

[0006] Further, position detection mechanism 21 is provided at transition cavity 20, when rotating mechanism 41 rotates shutter 60 to transition cavity 20, position detection mechanism 21 detects shutter 60, for process coating cavity 10 a signal that can open coating process.

[0007] Further, the area of shutter 60 is greater than the diameter of working gas input channel 30, for completely shielding working gas input channel 30.

[0008] Further, the top of working gas input channel 30 is connected wafer carrier plate, a plurality of air holes 31 are provided on wafer carrier plate, and gas input channel 30 is communicated with air holes 31, when needing to carry out the cleaning of process coating cavity 10, shutter 60 is covered above air holes 31.

[0009] Further, shutter 60 is disc type structure, the lower surface of disc type structure is annular limit boss 61 that the outer circle is protruded, the upper surface of support plate 70 is equipped with a plurality of limit posts 71, the outer diameter of the circle formed by surrounding limit post 71 is just matched with the inner diameter of annular limit boss 61, the outer side of a plurality of limit posts 71 is contacted with the inner wall of annular limit boss 61, so that when rotating support plate 70, shutter 60 and support plate 70 are relatively stationary.

[0010] In some embodiments, the rotating mechanism 41 comprises a magnetic fluid 42, a rotating shaft 44, a connecting rod 46 and a cylinder 48 sleeved inside the magnetic fluid 42, one end of the rotating shaft 44 is connected with the supporting plate 70 through the mounting column 90 and the bearing plate, the other end is connected with one end of the connecting rod 46 through the first connecting rod shaft clamp 45, the other end of the connecting rod 46 is connected with the cylinder shaft 49 of the cylinder 48 through the second connecting rod shaft clamp 47, the body of the magnetic fluid 42 is connected with the bottom of the shell of the process film coating cavity 10, and the rotating shaft 44 of the magnetic fluid 42 is driven to rotate by the cylinder 48, so as to drive the supporting plate 70 to rotate.

[0011] Further, the bottom of the body of the cylinder 48 is connected with a photoelectric switch mounting bracket 52, both ends of the photoelectric switch mounting bracket 52 are provided with a photoelectric switch 53, the two photoelectric switches 53 are arranged outside the cylinder shaft 49, one side of the cylinder shaft 49 is provided with a limiting block 51, when the limiting block 51 rotates to the slot of one of the photoelectric switches 53, the photoelectric switch 53 receives a signal and transmits the signal to the controller of the cylinder 48, so as to stop the rotation of the cylinder shaft 49, and the photoelectric switch 53 plays a role of accurate positioning.

[0012] Further, one of the photoelectric switches 53 is arranged at a position where the cylinder 48 can drive the shutter 60 to rotate to the transition cavity 20, and the other photoelectric switch 53 is arranged at a position where the cylinder 48 can drive the shutter 60 to rotate to the upper part of the working gas input channel 30.

[0013] Further, the body of the magnetic fluid 42 is provided with a first water cooling mechanism 43, because the process film coating cavity 10 needs to be heated in the processing process, in order to avoid damage to the magnetic fluid 42 caused by heating, the body of the magnetic fluid 42 needs to be cooled.

[0014] Further, the upper part of the cylinder 48 is provided with a second water cooling mechanism 80, because the process film coating cavity 10 needs to be heated in the processing process, the cylinder 48 is close to the bottom of the process film coating cavity 10, in order to avoid damage to the cylinder 48 caused by heating, the bottom of the cylinder 48 and the process film coating cavity 10 needs to be water-cooled and isolated.

[0015] The utility model discloses an advantageous effect: the utility model provides a sputter coating machine's cleaning auxiliary device, including process coating cavity 10, its characterized in that: process coating cavity 10 one side is equipped with transition cavity 20, process coating cavity 10 bottom is equipped with working gas input channel 30, transition cavity 20 with process coating cavity 10 intercommunication, be equipped with rotating shielding mechanism 40 in process coating cavity 10, rotating shielding mechanism 40 includes apron 60, bearing plate 70 and rotating mechanism 41, apron 60 is connected with bearing plate 70, bearing plate 70 one side lower part is equipped with rotating mechanism 41, makes bearing tray rotate through rotating mechanism 41, thereby makes bearing plate 70 carry apron 60, when needing to carry out process coating cavity 10's cleaning, rotating mechanism 41 will apron 60 rotate to working gas input channel 30 upper portion, is used for shielding working gas input channel 30, prevents in the process of cleaning, target material or gas material falls into to working gas input channel 30, causes working gas input channel 30's pollution, when carrying out process coating, rotating mechanism 41 will apron 60 rotate to transition cavity 20, to prevent apron 60 influence working gas's input of working gas input channel 30, causes the uneven of sputter coating. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 It is the overall structural drawing of the sputter coating machine of the utility model.

[0017] Figure 2 It is the perspective view of the cleaning auxiliary device of the sputter coating machine of the utility model.

[0018] Figure 3 It is the overhead structure view of the cleaning auxiliary device of the sputter coating machine of the utility model.

[0019] Figure 4 It is the connecting structure view of bearing plate and rotating mechanism of the cleaning auxiliary device of the sputter coating machine of the utility model.

[0020] Figure 5 It is the structure view of rotating mechanism of the cleaning auxiliary device of the sputter coating machine of the utility model.

[0021] Figure 6 It is the connecting structure view of working gas input channel and rotating shielding mechanism of the cleaning auxiliary device of the sputter coating machine of the utility model.

[0022] Figure 7 It is the split partial close-up view of working gas input channel and rotating shielding mechanism of the cleaning auxiliary device of the sputter coating machine of the utility model.

[0023] MAIN ELEMENT SYMBOL EXPLANATION

[0024] Process film coating cavity 10, transition cavity 20, position detection mechanism 21, working gas input channel 30, air hole 31, rotating shielding mechanism 40, rotating mechanism 41, magnetic fluid 42, first water cooling mechanism 43, rotating shaft 44, first connecting rod shaft clamp 45, connecting rod 46, second connecting rod shaft clamp 47, air cylinder 48, air cylinder shaft 49, limit block 51, photoelectric switch mounting bracket 52, photoelectric switch 53, shutter 60, annular limit boss 61, supporting plate 70, limit column 71, second water cooling mechanism 80, supporting plate mounting column 90.

[0025] The following specific embodiments will further illustrate the present application in conjunction with the above figures. Specific embodiments Example 1:

[0026] As Figure 1 , Figure 2 , Figure 6 A kind of cleaning auxiliary device of sputtering coating machine, including process film coating cavity 10, the side of process film coating cavity 10 is equipped with transition cavity 20, the bottom of process film coating cavity 10 is equipped with working gas input channel 30, transition cavity 20 is communicated with process film coating cavity 10, rotating shielding mechanism 40 is equipped in process film coating cavity 10, rotating shielding mechanism 40 includes shutter 60, supporting plate 70 and rotating mechanism 41, shutter 60 is clamped with supporting plate 70, the lower side of supporting plate 70 is equipped with rotating mechanism 41, rotating mechanism 41 makes supporting tray rotate, so that the shutter 60 carried by the supporting plate 70, when needing to clean process film coating cavity 10, rotating mechanism 41 rotates shutter 60 to the upper portion of working gas input channel 30, for shielding working gas input channel 30, prevent target material or gas material from falling into working gas input channel 30 in the process of cleaning, cause the pollution of working gas input channel 30, when carrying out process film coating, rotating mechanism 41 rotates shutter 60 to transition cavity 20, to prevent shutter 60 from affecting the input of working gas of working gas input channel 30, cause the unevenness of sputtering coating, position detection mechanism 21 is equipped at transition cavity 20, when rotating mechanism 41 rotates shutter 60 to transition cavity 20, position detection mechanism 21 detects shutter 60, for giving process film coating cavity 10 a signal capable of opening coating process, the area of shutter 60 is greater than the diameter of working gas input channel 30, for completely shielding working gas input channel 30.

[0027] As Figure 7As shown, the top of the working gas input channel 30 is connected to a wafer carrying disc, and the wafer carrying disc is provided with a plurality of air holes 31, and the gas input channel 30 is communicated with the air holes 31, and when the process film coating cavity 10 needs to be cleaned, the shutter 60 covers the air holes 31.

[0028] As shown in the drawings, Figure 3 As shown, the shutter 60 is a disc type structure, and the lower surface of the disc type structure is provided with an annular limiting boss 61 which is convexly outward, and the upper surface of the supporting plate 70 is provided with a plurality of limiting columns 71 which are arranged to form a circle, and the outer diameter of the circle is matched with the inner diameter of the annular limiting boss 61, and the outer side of the plurality of limiting columns 71 is in contact with the inner wall of the annular limiting boss 61, so that when the supporting plate 70 rotates, the shutter 60 and the supporting plate 70 are in a relatively static state.

[0029] As shown in the drawings, Figures 3-4 As shown, the rotating mechanism 41 includes a magnetic fluid 42, a rotating shaft 44, a connecting rod 46 and a cylinder 48 which are sleeved inside the magnetic fluid 42, one end of the rotating shaft 44 is locked with the supporting plate 70 through the supporting plate mounting column 90, the other end is rotationally connected with one end of the connecting rod 46 through the first connecting rod shaft clamp 45, the other end of the connecting rod 46 is connected with the cylinder shaft 49 of the cylinder 48 through the second connecting rod shaft clamp 47, the body of the magnetic fluid 42 is locked with the bottom of the process film coating cavity 10, and the rotating shaft 44 of the magnetic fluid 42 is driven to rotate by the cylinder 48, so as to drive the supporting plate 70 to rotate.

[0030] The body of the magnetic fluid 42 is provided with a first water cooling mechanism 43, because the process film coating cavity 10 needs to be heated during processing, the body of the magnetic fluid 42 needs to be cooled to avoid damage caused by heating, and the upper part of the cylinder 48 is provided with a second water cooling mechanism 80, because the process film coating cavity 10 needs to be heated during processing, and the cylinder 48 is relatively close to the bottom of the process film coating cavity 10, so as to avoid damage caused by heating, and the cylinder 48 and the bottom of the process film coating cavity 10 need to be water-cooled and isolated.

[0031] As shown in the drawings, Figure 5As shown, the body lower part of the cylinder 48 is locked with a photoelectric switch mounting bracket 52, both ends of the photoelectric switch mounting bracket 52 are provided with a photoelectric switch 53, two photoelectric switches 53 are arranged on the outer circle of the cylinder shaft 49, one side of the cylinder shaft 49 is provided with a limiting block 51, when the limiting block 51 rotates to the slot of one of the photoelectric switches 53, the photoelectric switch 53 receives a signal and transmits the signal to the cylinder 48 controller, so as to stop the rotation of the cylinder shaft 49, the photoelectric switch 53 plays a role of accurate positioning, the position of one of the photoelectric switches 53 is that the cylinder 48 can rotate the shutter 60 to the transition cavity 20, the position of the other photoelectric switch 53 is that the cylinder 48 can rotate the shutter 60 to the upper part of the working gas input channel 30.

[0032] The utility model discloses an advantageous effect: the utility model provides a sputter coating machine's cleaning auxiliary device, including process coating cavity 10, its characterized in that: process coating cavity 10 one side is equipped with transition cavity 20, process coating cavity 10 bottom is equipped with working gas input channel 30, transition cavity 20 with process coating cavity 10 is linked together, be equipped with rotating shielding mechanism 40 in process coating cavity 10, rotating shielding mechanism 40 includes shutter 60, bearing plate 70 and rotating mechanism 41, shutter 60 with bearing plate 70 clamping, bearing plate 70 one side lower part is equipped with rotating mechanism 41, through rotating mechanism 41 makes bearing tray rotate, thereby makes bearing plate 70 carries shutter 60, when needing to carry out process coating cavity 10's cleaning, rotating mechanism 41 will shutter 60 rotate to working gas input channel 30 upper part, is used for shielding working gas input channel 30, prevents in the process of cleaning, target material or gas material falls into to working gas input channel 30, causes working gas input channel 30's pollution, when carrying out process coating, rotating mechanism 41 will shutter 60 rotate to transition cavity 20, to prevent shutter 60 influence working gas's input of working gas input channel 30, causes the uneven of sputter coating.

[0033] The above-mentioned embodiments only express several implementation manners of the utility model, and the description is more specific and detailed, but can not be understood as the limitation of the utility model patent scope. It should be pointed out that for ordinary skilled person in the art, without departing from the concept of the utility model, a number of modifications and improvements can be made, which all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent should be based on the appended claims.

Claims

1. A cleaning auxiliary device of a sputter coater, comprising a process coating chamber (10), characterized in that: The process film coating cavity (10) is provided with a transition cavity (20) on one side, and a working gas input channel (30) is arranged at the bottom of the process film coating cavity (10); the transition cavity (20) is communicated with the process film coating cavity (10); a rotating shielding mechanism (40) is arranged in the process film coating cavity (10); the rotating shielding mechanism (40) comprises a shielding plate (60), a supporting plate (70) and a rotating mechanism (41); the shielding plate (60) is clamped with the supporting plate (70); a rotating mechanism (41) is arranged at the lower side of the supporting plate (70); the supporting plate (70) is rotated through the rotating mechanism (41), so that the supporting plate (70) carries the shielding plate (60); when the process film coating cavity (10) needs to be cleaned, the rotating mechanism (41) rotates the shielding plate (60) to the upper part of the working gas input channel (30) to shield the working gas input channel (30), so as to prevent the target material or the gas material from falling into the working gas input channel (30) during the cleaning process, thereby preventing the working gas input channel (30) from being polluted; when the process film coating is carried out, the rotating mechanism (41) rotates the shielding plate (60) to the transition cavity (20), so as to prevent the shielding plate (60) from affecting the input of the working gas of the working gas input channel (30), thereby preventing the sputtering film coating from being uneven.

2. The cleaning aid for a sputter coater as claimed in claim 1, characterized in that: A position detection mechanism (21) is arranged at the transition cavity (20); when the rotating mechanism (41) rotates the shielding plate (60) to the transition cavity (20), the position detection mechanism (21) detects the shielding plate (60), so as to give the process film coating cavity (10) a signal capable of starting the film coating process.

3. The cleaning aid for sputter coating machines as claimed in claim 1, characterized in that: The area of the shielding plate (60) is greater than the diameter of the working gas input channel (30), so as to completely shield the working gas input channel (30).

4. The cleaning aid for sputter coating apparatus as claimed in claim 1, wherein: A wafer supporting disc is connected to the top of the working gas input channel (30); a plurality of air holes (31) are arranged on the wafer supporting disc; the working gas input channel (30) is communicated with the air holes (31); when the process film coating cavity (10) needs to be cleaned, the shielding plate (60) is arranged above the air holes (31).

5. The cleaning aid for sputter coating apparatus as claimed in claim 1, wherein: The shielding plate (60) is in a disc structure; a lower surface of the disc structure is provided with an annular limiting boss (61) which is convexly arranged outside a circle; an upper surface of the supporting plate (70) is provided with a plurality of limiting columns (71); the outer diameter of the circle formed by the limiting columns (71) is matched with the inner diameter of the annular limiting boss (61); the outer side of the limiting columns (71) is in contact with the inner wall of the annular limiting boss (61), so that the shielding plate (60) and the supporting plate (70) are in a relatively static state when the supporting plate (70) rotates.

6. The cleaning aid for sputter coating apparatus as claimed in claim 1, wherein: The rotating mechanism (41) comprises a magnetic fluid (42), a rotating shaft (44) sleeved in the magnetic fluid (42), a connecting rod (46) and a cylinder (48), one end of the rotating shaft (44) is locked with a supporting plate (70) through a supporting plate mounting column (90), the other end is rotatably connected with one end of the connecting rod (46) through a first connecting rod shaft clamp (45), the other end of the connecting rod (46) is connected with a cylinder shaft (49) of the cylinder (48) through a second connecting rod shaft clamp (47), the body of the magnetic fluid (42) is locked with the bottom of the shell of the process film coating cavity (10), the rotating shaft (44) of the magnetic fluid (42) is driven to rotate by the cylinder (48), and the supporting plate (70) is driven to rotate.

7. The cleaning aid for a sputter coater according to claim 6, characterized in that: The body of the cylinder (48) is locked with a photoelectric switch mounting bracket (52), both ends of the photoelectric switch mounting bracket (52) are provided with a photoelectric switch (53), the two photoelectric switches (53) are arranged on the outer circle of the cylinder shaft (49), one side of the cylinder shaft (49) is provided with a limiting block (51), when the limiting block (51) is rotated into the groove of one of the photoelectric switches (53), the photoelectric switch (53) receives a signal and transmits the signal to the controller of the cylinder (48), so as to stop the rotation of the cylinder shaft (49), and the photoelectric switch (53) plays a role of accurate positioning.

8. The cleaning aid for sputter coating machines according to claim 7, characterized in that One of the photoelectric switches (53) is arranged at a position where the cylinder (48) can drive the shutter (60) to rotate to the transition cavity (20), and the other photoelectric switch (53) is arranged at a position where the cylinder (48) can drive the shutter (60) to rotate to the upper part of the working gas input channel (30). The body of the magnetic fluid (42) is provided with a first water cooling mechanism (43), because the process film coating cavity (10) needs to be heated in the processing process, the magnetic fluid (42) is prevented from being damaged due to heating, and the body of the magnetic fluid (42) needs to be cooled.

9. The cleaning aid for sputter coating machines according to claim 6, characterized in that The upper part of the cylinder (48) is provided with a second water cooling mechanism (80), because the process film coating cavity (10) needs to be heated in the processing process, the cylinder (48) is relatively close to the bottom of the process film coating cavity (10), the cylinder (48) is prevented from being damaged due to heating, and the bottom of the process film coating cavity (10) needs to be water-cooled and isolated.

10. The cleaning aid for a sputter coater according to claim 6, characterized in that: ​

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