Water tank capable of stabilizing water yield of water film

Abstract

The utility model discloses a water tank capable of stabilizing the water yield of a water film. The water tank comprises a tank body and a buffer pipe, a water inlet pipe and a water outlet are arranged on the box body, a buffer pipe is arranged on the box body, the head end of the buffer pipe is communicated with the box body, and the tail end of the buffer pipe is closed. According to the utility model, the fluctuation of the liquid level in the box body is slowed down in the water inlet process, so that the water outlet amount of a water film is stable, the surface of a chip is completely covered by the water film, and an oxide layer on the surface of the chip is effectively prevented from being corroded by hydrofluoric acid, so that the batch over-etching of a machine table in normal operation is reduced, and the yield and the yield of the machine table are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to a water tank, especially a water tank capable of stabilizing water film water yield. BACKGROUND

[0002] Alkaline etching chain type machine table (also known as solar well alkaline etching chain type machine equipment) is a surface treatment equipment based on chemical reaction principle, mainly used for cleaning, deburring and removing oxide skin of metal material surface treatment, widely used in electronic manufacturing, mechanical manufacturing and other technical fields.

[0003] When the chip is treated by using the alkaline etching chain type machine table, the water film water supply tank on the machine table is usually used to wash the chip surface, that is, the water film formed by the flowing water flow is used to flush the chip surface, mainly to remove impurities, residues and harmful substances on the chip surface, to ensure the cleanliness of the chip surface, so as to improve the quality and performance of the chip.

[0004] The water film of the existing water film water supply tank is unstable and not easy to adjust, which often leads to incomplete coverage of the water film on the chip surface. If the water film on the chip surface is not completely covered, the area of the chip not covered by the water film will be in contact with hydrofluoric acid, which will cause the oxide layer on the chip surface to be corroded, resulting in batch over-etching during normal operation, which seriously affects the yield and output of the machine table. UTILITY MODEL CONTENTS

[0005] The utility model aims at providing a water tank capable of stabilizing water film water yield, which can effectively solve the problem of unstable water film water yield of the water film water supply tank, so that the chip surface is completely covered by the water film, which can effectively prevent the oxide layer on the chip surface from being corroded by hydrofluoric acid, thereby reducing batch over-etching during normal operation and improving the yield and output of the machine table.

[0006] In order to achieve the above-mentioned purpose, the utility model provides a water tank capable of stabilizing water film water yield, which comprises:

[0007] A tank body is provided with a water inlet pipe and a water outlet;

[0008] A buffer pipe is provided on the tank body, the first end of the buffer pipe is in communication with the tank body, and the tail end of the buffer pipe is closed.

[0009] The water inlet pipe is mainly used for water inlet of the water tank, and the buffer pipe adjusts the liquid level of the water flow in the water tank during water inlet, reduces the liquid level fluctuation range of the water tank during water inlet, makes the water pressure of the water tank stable quickly, ensures that the water film water yield is stable under the condition that the water yield is basically consistent within a set time, and at the same time, the backflow pipeline of the buffer pipe can store a certain amount of water, reducing the frequency of external water supply.

[0010] Further, the buffer pipe is arranged at a height corresponding to the setting height of the first liquid level sensor on the tank body.

[0011] The buffer pipe is horizontally arranged, which can slow down the interaction of the liquid when water is filled into the tank or water is supplemented, thereby reducing the water surface fluctuation.

[0012] Further, the water tank for stabilizing water film water output quantity further comprises a first liquid level sensor arranged on the tank body, and when the first liquid level sensor is triggered, the water tank fills water into the tank body through the water inlet pipe.

[0013] In the embodiment, the first liquid level sensor serves as a water filling triggering element, can timely respond to the water consumption in the water tank, and realizes the water filling function.

[0014] Further, the buffer pipe is arranged at a height corresponding to the setting height of the first liquid level sensor on the tank body.

[0015] Further, the water tank for stabilizing water film water output quantity further comprises a partition plate arranged in the tank body and separating the tank body into at least a first space and a second space, wherein the first liquid level sensor is located in the first space, and the water inlet pipe is located in the second space.

[0016] Since the water tank is frequently filled with water and the fluctuation is large, the liquid level sensor in the water tank occasionally has a false sensing condition. In view of this, a partition plate is arranged in the water tank to separate the water tank into at least two areas, so that the liquid level fluctuation caused by sudden water filling in the tank body can be effectively avoided to prevent various liquid level sensors from being triggered.

[0017] Further, the extension direction of the partition plate is parallel to the axial direction of the first end of the buffer pipe.

[0018] The extension direction of the partition plate is parallel to the axial direction of the first end of the buffer pipe, which is further conducive to reducing the fluctuation of the liquid surface in the tank body and preventing turbulence.

[0019] Further, the first end of the buffer pipe is arranged on the first side wall of the water tank, the partition plate extends from the second side wall of the water tank into the water tank, and the first side wall and the second side wall are oppositely arranged.

[0020] Further, the end of the water inlet pipe is arranged close to the bottom of the water tank.

[0021] The structure can more effectively reduce the liquid surface fluctuation.

[0022] Further, the water tank for stabilizing water film water output quantity has the advantages and beneficial effects as follows.

[0023] The second liquid level sensor is arranged on the tank body and above the first liquid level sensor.

[0024] In this embodiment, the second liquid level sensor mainly serves as a triggering element for outward drainage.

[0025] Further, the water tank for stabilizing water film water output quantity has the advantages and beneficial effects as follows.

[0026] The third liquid level sensor is arranged on the tank body and below the first liquid level sensor.

[0027] The third liquid level sensor mainly serves as a triggering element for water replenishment into the tank body.

[0028] The water tank for stabilizing water film water output quantity has the advantages and beneficial effects as follows.

[0029] The water tank for stabilizing water film water output quantity can slow down the fluctuation of the liquid level in the tank body during water replenishment, thereby stabilizing the water film water output quantity, completely covering the chip surface with the water film, effectively avoiding the corrosion of the oxidation layer on the chip surface by hydrofluoric acid, and reducing the batch over-etching of the machine table during normal operation, improving the yield rate and the yield of the machine table.

[0030] In a preferred embodiment, a buffer pipe is arranged on the tank body, the leading end of the buffer pipe is in communication with the tank body, and the trailing end of the buffer pipe is closed.

[0031] The water tank for stabilizing water film water output quantity can effectively avoid the phenomenon that various liquid level sensors are mistakenly triggered due to the liquid level fluctuation caused by sudden water replenishment in the tank body.

[0032] In a preferred embodiment, a partition plate is arranged in the water tank, and the tank body is divided into at least a first space and a second space. BRIEF DESCRIPTION OF DRAWINGS

[0033] Figure 1The whole structure schematic diagram of the water tank for stabilizing water film water yield in an embodiment of the utility model is shown.

[0034] Figure 2 The structure schematic diagram of the water tank for stabilizing water film water yield in an embodiment of the utility model is shown from the perspective of top view. DETAILED DESCRIPTION

[0035] The water tank for stabilizing water film water yield of the utility model will be further explained and described below in combination with the drawings of the specification and specific embodiments, however the explanation and description do not constitute improper limitation on the technical scheme of the utility model.

[0036] In the process of chip etching, when the chip is processed by using equipment such as alkali throwing chain type machine, the water film water supply tank on the machine is usually used to wash the chip surface. Generally, the water tank is directly communicated with the water film water outlet through the water outlet, the chip passes below the water film, the water film water covers the chip surface, at this time, the water tank liquid level is lowered, the peripheral pneumatic valve is opened to supply water to the water tank through the water inlet pipe, when the required liquid level is reached, the water inlet stops, and the process is repeated.

[0037] However, the current problem is that the peripheral water supply to the water tank often leads to large water tank liquid level fluctuation, and the water tank liquid level recovery time is long, the liquid level fluctuation range is large and unstable when the water is in, and continuous water outlet in a short time will lead to unstable water film water yield in the set time, which leads to incomplete water film coverage on the chip and causes product quality abnormalities.

[0038] Based on this, the utility model provides a water tank for stabilizing water film water yield in an embodiment.

[0039] Figure 1 The whole structure schematic diagram of the water tank for stabilizing water film water yield in an embodiment of the utility model is shown.

[0040] Figure 2 The structure schematic diagram of the water tank for stabilizing water film water yield in an embodiment of the utility model is shown from the perspective of top view.

[0041] As Figure 1 And Figure 2 As shown in the embodiment, the water tank can include: a tank body 1, a water inlet pipe 2, a water outlet 8 and a buffer pipe 3.

[0042] Among them, referring to Figure 1 The water inlet of the tank body 1 is provided with a water inlet pipe 2, which can be installed by welding, flange, clamping, plug-in or similar connection mode.

[0043] In some more specific embodiments, in order to more effectively reduce liquid level fluctuations, the end of the water inlet pipe 2 is arranged close to the bottom of the box body 1.

[0044] When the water tank is in operation, the chip is placed at the water outlet 8 of the tank body 1 , and water flows out of the water outlet 8 to form a water film that covers the chip.

[0045] In some more specific embodiments, Figure 1 As shown, the water outlet 8 is constructed as a water outlet with an inclined nozzle at one end facing the chip. The inclined nozzle can more easily guide the water film to the surface of the chip to avoid dispersion of the water film.

[0046] Continue reading Figure 1 and Figure 2 A buffer tube 3 is connected to the box body 1. The buffer tube 3 can be arranged in an L shape. The head end of the buffer tube 3 is connected to the box body 1, and the tail end of the buffer tube 3 is closed.

[0047] The present invention can effectively mitigate the interaction of liquids during water inflow or replenishment in the water tank by providing a buffer tube 3, thereby reducing water surface fluctuations. That is, when water is introduced into the tank body 1 through the water inlet pipe 2, the buffer tube 3 can buffer and adjust the water level in the water tank during the inflow process, reducing the range of liquid level fluctuations during water inflow, allowing the water pressure in the water tank to quickly stabilize, ensuring that the water film output reaches a substantially consistent level within the set time and providing stable water output. At the same time, the buffer tube 3 can also serve as a return line to store a certain amount of water, reducing the frequency of peripheral water supply.

[0048] In some more preferred embodiments, the axial direction of the buffer tube 3 is parallel to the horizontal direction.

[0049] Of course, in other embodiments, the axial direction of the buffer tube 3 may also form a certain angle with the horizontal direction, that is, the buffer tube 3 is arranged at an angle. However, compared with the inclined buffer tube 3, the horizontal arrangement of the buffer tube 3 has a better buffering effect. For the same volume of water, the upward-tilted buffer tube will cause relatively large volume fluctuations, while the downward-tilted buffer tube will require a larger amount of pure water to be added to maintain the same working liquid level.

[0050] Furthermore, a first liquid level sensor 5 is mounted within the tank 1 and electrically connected to the device's control port. When triggered, the sensor transmits an electrical signal to the control port, which in turn controls the opening of the corresponding water inlet valve, allowing water to flow into the tank 1 via the water inlet pipe 2. Therefore, to further suppress liquid level fluctuations with the buffer tube, in some more specific embodiments, the buffer tube 3 is positioned on the tank at a height corresponding to the height at which the first liquid level sensor 5 is positioned.

[0051] In addition, in some embodiments, a second liquid level sensor 4 is installed above the first liquid level sensor 5, and the second liquid level sensor 4 is also electrically connected with the control port of the device, and it is set that when the second liquid level sensor 4 is triggered, the second liquid level sensor 4 transmits an electrical signal to the control port, and the control port makes a response to control the corresponding water outlet valve to open, so that the water in the water tank is drained outward through the water outlet 8 to form a water film covering the chip.

[0052] In some more preferred embodiments, as a protection mechanism, when the water level in the tank 1 is too low, in order to make a low liquid level protection response in time, a third liquid level sensor 6 can be arranged below the first liquid level sensor 5, and the third liquid level sensor 6 is electrically connected with the control port of the device, and it is set that when the water level in the water tank is lower than the height at which the third liquid level sensor 6 is located, the third liquid level sensor 6 is triggered, and the third liquid level sensor 6 transmits an electrical signal to the control port, and the control port makes a response to control the corresponding water inlet valve to open, so that the water tank supplements water into the tank 1 through the water inlet pipe 2 to protect the minimum liquid level.

[0053] In order to further solve the problem that the water tank frequently supplements water and the liquid level sensor in the water tank is likely to be mis-sensed due to large fluctuations, in some more preferred embodiments, the utility model further comprises a partition plate 7 arranged in the tank 1, and the partition plate 7 divides the tank 1 into at least a first space P and a second space Q, wherein the first liquid level sensor 5 is located in the first space P, and the water inlet pipe 2 is located in the second space Q, in this way, the partition plate 7 divides the water tank into two areas, and the first liquid level sensor 5 can be prevented from being triggered by mistake due to liquid level fluctuations caused by sudden water inlet.

[0054] In some more specific embodiments, as shown in the drawings, the extending direction of the partition plate 7 is parallel to the axial direction of the first end of the buffer pipe 3. Figure 2 This arrangement can provide better guidance to the water flow and avoid turbulence in the water tank, thereby ensuring the stability of the liquid level.

[0055] In some more specific embodiments, the first end of the buffer pipe 3 is arranged on the first side wall 11 of the water tank, and the partition plate 7 extends into the water tank from the second side wall 12 of the tank 1 relative to the first side wall 11.

[0056] Therefore, the water tank for stabilizing the water film outlet flow can slow down the fluctuation of the liquid level in the tank during the water inlet process, so that the water film outlet flow is stable, the chip surface is completely covered by the water film, the oxidation layer on the chip surface is effectively prevented from being corroded by hydrofluoric acid, the batch over-etching of the machine during normal operation is reduced, and the yield and the yield of the machine are improved.

[0057] It should be noted that the prior art part in the protection scope of the present application is not limited to the embodiments given in the present application file, all prior art not contradictory to the scheme of the present application, including but not limited to prior patent documents, prior published publications, prior public use, etc., can be included in the protection scope of the present application.

[0058] In addition, the combination manner of each technical feature in the present case is not limited to the combination manner recorded in the claims of the present case or the combination manner recorded in the specific embodiments, all technical features recorded in the present case can be freely combined or combined in any manner, unless contradictory to each other.

[0059] It should also be noted that the above-mentioned embodiments are only specific embodiments of the present application. Obviously, the present application is not limited to the above embodiments, and similar changes or modifications made by those skilled in the art from the content disclosed by the present application are directly derived or easily conceived, which should belong to the protection scope of the present application.

Claims

1. A water tank for stabilizing water film output, characterized in that: It comprises: a box body, which is provided with a water inlet pipe and a water outlet; a buffer pipe, which is arranged on the box body, a leading end of the buffer pipe is in communication with the box body, and a trailing end of the buffer pipe is closed.

2. The water tank for stabilizing the water discharge amount of a water film according to claim 1, wherein The buffer pipe is arranged in an axial direction parallel to a horizontal direction.

3. The water tank for stabilizing the water discharge amount of a water film according to claim 1, wherein It further comprises: a first liquid level sensor, which is arranged on the box body, when the first liquid level sensor is triggered, the water tank fills water into the box body through the water inlet pipe.

4. The water tank for stabilizing the water discharge amount of a water film according to claim 3, wherein The buffer pipe is arranged at a height position corresponding to a setting height of the first liquid level sensor on the box body.

5. The water tank for stabilizing the water discharge amount of a water film according to claim 3, wherein It further comprises: a partition plate, which is arranged in the box body and separates the box body into at least a first space and a second space, wherein the first liquid level sensor is located in the first space, and the water inlet pipe is located in the second space.

6. The water tank for stabilizing the water discharge amount of a water film according to claim 5, wherein An extension direction of the partition plate is parallel to an axial direction of the leading end of the buffer pipe.

7. The water tank for stabilizing the water discharge amount of a water film according to claim 5, wherein The leading end of the buffer pipe is arranged on a first side wall of the water tank, the partition plate extends into the water tank from a second side wall of the water tank, and the first side wall and the second side wall are oppositely arranged.

8. The water tank for stabilizing the water discharge amount of a water film according to claim 1, wherein An end of the water inlet pipe is arranged close to a bottom of the water tank.

9. The water tank for stabilizing the water discharge amount of a water film according to claim 3, wherein It further comprises: a second liquid level sensor, which is arranged on the box body and above the first liquid level sensor, when the second liquid level sensor is triggered, the water tank drains water out through the water outlet.

10. The water tank for stabilizing the water discharge amount of a water film according to claim 3, wherein It further comprises: a third liquid level sensor, which is arranged on the box body and below the first liquid level sensor.

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