Anti-pollution base material cleaning device

Abstract

The utility model relates to the technical field of base material cleaning, in particular to an anti-pollution base material cleaning device which comprises a cleaning tank, an opening is formed in the front side of the cleaning tank, a bearing disc is arranged in the cleaning tank, and supporting legs are fixedly installed on the two sides of the lower surface of the bearing disc. The supporting legs are fixedly installed at the bottom end of the interior of the cleaning tank, a cleaning table is rotatably arranged at the upper end of the interior of the bearing disc, a submersible motor is fixedly installed in the middle of the bottom end of the interior of the cleaning tank, an output shaft of the submersible motor is fixedly connected with a rotating rod, and the rotating rod penetrates through the bearing disc and is fixedly connected to the lower surface of the cleaning table. A clamping mechanism is arranged on the inner side of the cleaning table, and under the action of the clamping mechanism, a base material needing to be cleaned can be clamped and fixed, so that under cooperation of a spray head, rotary cleaning can be carried out, the base material can be cleaned more comprehensively, and the problem that cleaning is not thorough due to the fact that the spray head only cleans and fixes one position is solved.

Description

Technical Field

[0001] This utility model relates to the field of substrate cleaning technology, and in particular to a substrate cleaning device that prevents pollution. Background Technology

[0002] Substrate is the basic material of a product or component, and it is usually formed into the final product through subsequent processing, treatment, or assembly. The choice of substrate directly affects the performance, quality, and cost of the product. Before use, the substrate needs to be cleaned to avoid contaminated substrate causing substandard products to be produced after processing.

[0003] In existing technologies, when cleaning substrates, different cleaning solvents are usually selected according to the different substrate materials. During the cleaning process, most cleaning devices typically use the cleaning nozzle to continuously rinse one area of ​​the substrate. When rinsing other areas, manual intervention is often required, which results in inconvenient rinsing and the possibility of incomplete rinsing. Utility Model Content

[0004] This utility model addresses the shortcomings of existing technologies by providing the following technical solution: a substrate cleaning device for preventing contamination, comprising a cleaning tank with an opening on its front side, a receiving plate inside the cleaning tank, and support legs fixedly installed on both sides of the lower surface of the receiving plate. The support legs are fixedly installed at the bottom of the cleaning tank. A cleaning platform is rotatably mounted on the upper part of the receiving plate. A submersible motor is fixedly installed at the middle of the bottom of the cleaning tank. The output shaft of the submersible motor is fixedly connected to a rotating rod, which passes through the receiving plate and is fixedly connected to the lower surface of the cleaning platform. A clamping mechanism is provided on the inner side of the cleaning platform. A cleaning solvent storage tank is fixedly installed on the top of the cleaning tank. A connecting pipe is fixedly installed on the lower end of the cleaning solvent storage tank. The lower end of the connecting pipe passes through the cleaning tank and is fixedly installed with an mounting plate. A plurality of equally spaced nozzles are fixedly installed on the lower surface of the mounting plate, and the nozzles are located directly above the cleaning platform.

[0005] As an improvement to the above technical solution, drainage outlets are provided on both sides of the inside of the receiving plate, and a drainage pipe is fixedly installed at the lower end of the drainage outlet, and the drainage pipe is located on the outside of the support leg.

[0006] As an improvement to the above technical solution, the rotating rod is rotatably connected to the receiving plate, and a sealing gasket is provided at the contact point between the receiving plate and the rotating rod.

[0007] As an improvement to the above technical solution, an infusion pipe is fixedly installed on the outside of the cleaning solvent storage tank, and a submersible pump for the nozzle is installed inside the cleaning solvent storage tank.

[0008] As an improvement to the above technical solution, the clamping mechanism includes clamps movably disposed on both sides of the upper surface of the cleaning table. A T-shaped groove is formed inside the cleaning table. A telescopic outer sleeve is disposed inside the T-shaped groove. Telescopic inner sleeves are movably inserted into both ends of the telescopic outer sleeve. A T-shaped slider is fixedly connected to the end of the telescopic inner sleeve away from the telescopic outer sleeve. The T-shaped slider is slidably installed inside the T-shaped groove. The clamps are disposed on the upper end of the T-shaped slider, and the clamps and the T-shaped slider are integrally formed. A fixing plate is fixedly sleeved in the middle of the telescopic outer sleeve, and the outer side of the fixing plate is fixedly connected to the inner wall of the T-shaped groove. Springs are sleeved on the outer sides of the telescopic outer sleeve and the telescopic inner sleeve, and the two ends of the springs are fixedly connected to the fixing plate and the T-shaped slider, respectively.

[0009] As an improvement to the above technical solution, the spring is a stainless steel component.

[0010] As an improvement to the above technical solution, the bottom of the T-shaped chute is provided with several equally spaced drainage holes.

[0011] The beneficial effects of this utility model are:

[0012] By installing a receiving plate inside the cleaning tank and a submersible motor at the lower end of the receiving plate, and a cleaning platform rotating at the upper end of the receiving plate, the cleaning platform can be rotated under the action of the submersible motor and the rotating rod. A clamping mechanism is installed on the cleaning platform to clamp and fix the substrate to be cleaned. With the cooperation of the nozzle, the substrate can be rotated and cleaned, thus achieving a more comprehensive cleaning of the substrate. This avoids the problem of the nozzle simply rinsing a fixed position, resulting in incomplete cleaning. The cleaning tank also minimizes the contamination of the substrate by the external environment during the cleaning process. Attached Figure Description

[0013] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0014] Figure 2 This is a side view of the present invention.

[0015] Figure 3 This is a structural diagram of the receiving tray and the cleaning table in this utility model;

[0016] Figure 4 This is a structural diagram of the clamping plate and T-shaped slider in this utility model;

[0017] Figure 5 This is a structural diagram of the cleaning table in this utility model.

[0018] Reference numerals: 1. Cleaning tank; 11. Opening; 2. Cleaning solvent storage tank; 21. Infusion tube; 22. Connecting tube; 23. Mounting plate; 24. Nozzle; 3. Receiving plate; 31. Support leg; 32. Drain pipe; 33. Drain outlet; 4. Submersible motor; 41. Rotating rod; 42. Sealing gasket; 5. Cleaning table; 51. T-shaped slide; 511. Drain hole; 52. Clamping plate; 53. Telescopic outer sleeve; 54. Telescopic inner sleeve; 55. Fixing plate; 56. Spring; 57. T-shaped slider. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this utility model clearer, the following provides a more detailed description of the utility model. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of the utility model.

[0020] Please see Figure 1-5 This utility model provides a technical solution: a pollution-resistant substrate cleaning device, including a cleaning tank 1, an opening 11 on the front side of the cleaning tank 1, a receiving plate 3 inside the cleaning tank 1, and support legs 31 fixedly installed on both sides of the lower surface of the receiving plate 3. The support legs 31 are fixedly installed at the bottom of the cleaning tank 1. A cleaning platform 5 is rotatably installed at the upper end of the receiving plate 3. A submersible motor 4 is fixedly installed at the middle position of the bottom of the cleaning tank 1. The output shaft of the submersible motor 4 is fixedly connected to a rotating rod 41. The rotating rod 41 passes through the receiving plate 3 and is fixedly connected to the lower surface of the cleaning platform 5. A clamping mechanism is provided on the inner side of the cleaning platform 5. A cleaning solvent storage tank 2 is fixedly installed at the top of the cleaning tank 1. A connecting pipe 22 is fixedly installed at the lower end of the cleaning solvent storage tank 2. The lower end of the connecting pipe 22 passes through the cleaning tank 1 and is fixedly installed with an mounting plate 23. A plurality of equally spaced nozzles 24 are fixedly installed on the lower surface of the mounting plate 23, and the nozzles 24 are located directly above the cleaning platform 5.

[0021] In this embodiment, a receiving plate 3 is provided inside the cleaning tank 1, and a submersible motor 4 is provided at the lower end of the receiving plate 3. At the same time, a cleaning table 5 is rotatably provided at the upper end of the receiving plate 3. Under the action of the submersible motor 4 and the rotating rod 41, the cleaning table 5 can be rotated. A clamping mechanism is provided on the cleaning table 5. Under the action of the clamping mechanism, the substrate to be cleaned can be clamped and fixed. Thus, with the cooperation of the nozzle 24, rotational cleaning can be performed, thereby enabling a more comprehensive cleaning of the substrate and avoiding the problem of incomplete cleaning caused by the nozzle 24 simply rinsing and fixing one position.

[0022] Specifically, drain outlets 33 are provided on both sides of the inside of the receiving plate 3, and a drain pipe 32 is fixedly installed at the lower end of the drain outlet 33, and the drain pipe 32 is located on the outside of the support leg 31.

[0023] In this embodiment, the cleaning solvent after rinsing the substrate is discharged to the bottom of the cleaning tank through the drain outlet 33 and the drain pipe 32, avoiding direct discharge into the external environment and thus preventing pollution.

[0024] Specifically, the rotating rod 41 is rotatably connected to the receiving plate 3, and a sealing gasket 42 is provided at the contact point between the receiving plate 3 and the rotating rod 41.

[0025] Specifically, an infusion pipe 21 is fixedly installed on the outside of the cleaning solvent storage tank 2, and a submersible pump for the nozzle 24 is installed inside the cleaning solvent storage tank 2.

[0026] Specifically, the clamping mechanism includes clamping plates 52 movably mounted on both sides of the upper surface of the cleaning table 5. A T-shaped groove 51 is provided inside the cleaning table 5. A telescopic outer sleeve 53 is provided inside the T-shaped groove 51. Telescopic inner sleeves 54 are movably inserted into both ends of the telescopic outer sleeve 53. A T-shaped slider 57 is fixedly connected to the end of the telescopic inner sleeve 54 away from the telescopic outer sleeve 53. The T-shaped slider 57 is slidably mounted inside the T-shaped groove 51. The clamping plate 52 is located at the upper end of the T-shaped slider 57, and the clamping plate 52 and the T-shaped slider 57 are integrally formed. A fixing plate 55 is fixedly sleeved in the middle of the telescopic outer sleeve 53, and the outer side of the fixing plate 55 is fixedly connected to the inner wall of the T-shaped groove 51. A spring 56 is sleeved on the outer side of the telescopic outer sleeve 53 and the telescopic inner sleeve 54, and the two ends of the spring 56 are fixedly connected to the fixing plate 55 and the T-shaped slider 57, respectively. The spring 56 is a stainless steel component. Several equally spaced drainage holes 511 are provided at the bottom of the T-shaped groove 51.

[0027] In this embodiment, by setting a clamping mechanism on the cleaning table 5, the clamping plate 52, the telescopic outer sleeve 53, the telescopic inner sleeve 54, the fixing plate 55, the spring 56, and the T-shaped slider 57 in the clamping mechanism can be used to place the substrate to be cleaned between the clamping plates 52. With the cooperation of the telescopic outer sleeve 53, the telescopic inner sleeve 54, and the spring 56, the clamping plate 52 can clamp and fix according to the width of the substrate, thereby clamping substrates of different types and sizes for cleaning, thus increasing the applicability of the overall device.

[0028] The above embodiments are only used to illustrate the technical solution of this utility model, and are not intended to limit it.

Claims

1. A substrate cleaning device for preventing contamination, comprising a cleaning tank (1), characterized in that: The front side of the cleaning tank (1) has an opening (11). The inside of the cleaning tank (1) is provided with a receiving plate (3), and support legs (31) are fixedly installed on both sides of the lower surface of the receiving plate (3). The support legs (31) are fixedly installed at the bottom inside the cleaning tank (1). A cleaning platform (5) is rotatably installed at the upper inside of the receiving plate (3). A submersible motor (4) is fixedly installed at the middle position of the bottom inside the cleaning tank (1). The output shaft of the submersible motor (4) is fixedly connected to a rotating rod (41), and the rotating rod (41) passes through... The receiving plate (3) is fixedly connected to the lower surface of the cleaning table (5). The cleaning table (5) is provided with a clamping mechanism on the inner side. The cleaning solvent storage tank (2) is fixedly installed at the top of the cleaning tank (1). The lower end of the cleaning solvent storage tank (2) is fixedly installed with a connecting pipe (22). The lower end of the connecting pipe (22) passes through the cleaning tank (1) and is fixedly installed with an mounting plate (23). Several equally spaced nozzles (24) are fixedly installed on the lower surface of the mounting plate (23), and the nozzles (24) are located directly above the cleaning table (5).

2. The anti-pollution substrate cleaning device according to claim 1, characterized in that: The receiving plate (3) has drainage outlets (33) on both sides inside, and a drainage pipe (32) is fixedly installed at the lower end of the drainage outlet (33), and the drainage pipe (32) is located on the outside of the support leg (31).

3. The anti-pollution substrate cleaning device according to claim 1, characterized in that: The rotating rod (41) is rotatably connected to the receiving plate (3), and a sealing gasket (42) is provided at the contact point between the receiving plate (3) and the rotating rod (41).

4. The anti-pollution substrate cleaning device according to claim 1, characterized in that: The cleaning solvent storage tank (2) is fixedly installed with an infusion pipe (21) on the outside, and the cleaning solvent storage tank (2) is equipped with a submersible pump for the nozzle (24).

5. The anti-pollution substrate cleaning device according to claim 1, characterized in that: The clamping mechanism includes clamps (52) movably mounted on both sides of the upper surface of the cleaning table (5). A T-shaped groove (51) is provided inside the cleaning table (5). A telescopic outer tube (53) is provided inside the T-shaped groove (51). Telescopic inner tubes (54) are movably inserted into both ends of the telescopic outer tube (53). A T-shaped slider (57) is fixedly connected to the end of the telescopic inner tube (54) away from the telescopic outer tube (53). The T-shaped slider (57) is slidably mounted inside the T-shaped groove (51). The clamping plate (52) is set at the upper end of the T-shaped slider (57), and the clamping plate (52) and the T-shaped slider (57) are integrally formed. A fixing plate (55) is fixedly sleeved at the middle position of the telescopic outer sleeve (53), and the outer side of the fixing plate (55) is fixedly connected to the inner wall of the T-shaped slide groove (51). A spring (56) is sleeved on the outer side of the telescopic outer sleeve (53) and the telescopic inner sleeve (54), and the two ends of the spring (56) are fixedly connected to the fixing plate (55) and the T-shaped slider (57) respectively.

6. The anti-pollution substrate cleaning device according to claim 5, characterized in that: The spring (56) is a stainless steel component.

7. The anti-pollution substrate cleaning device according to claim 5, characterized in that: The bottom of the T-shaped chute (51) is provided with several equally spaced drainage holes (511).

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