Sputtering coating process line for production of high-capacity blue light storage medium
By introducing multiple rotating disks and sputtering modules into the sputtering production line, flexible switching and buffering of products between different devices can be achieved, solving the downtime problem caused by equipment failure and improving the operating efficiency and equipment utilization of the production line.
Patent Information
- Application Number
- CN202422363181.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-27
- Publication Date
- 2025-11-07
- Estimated Expiration
- 2034-09-27
AI Technical Summary
When existing sputtering production lines malfunction, the sputtering equipment or injection molding machine needs to be shut down for maintenance, which seriously affects production efficiency.
Design a sputtering process line for the production of high-capacity Blu-ray storage media. The line employs multiple rotating disks and sputtering modules, including pre-processing equipment, sputtering equipment, rotating disks, buffer rotating disks, and robotic arms. This allows for flexible switching and buffering of products between multiple modules, ensuring that equipment failures do not affect overall production.
When the sputtering equipment malfunctions, other modules can still operate normally, keeping production running without interruption, thus improving production efficiency and equipment utilization.
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Figure CN223522659U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to storage medium sputtering process technical field especially relates to a kind of sputtering process line for large capacity blue light storage medium production. BACKGROUND
[0002] Sputtering is one of the main techniques for preparing thin film materials, which uses ions generated by ion source to form high-speed and high-energy ion beam in vacuum through acceleration and aggregation, and then bombards solid surface, so that kinetic energy exchange occurs between ions and atoms on the solid surface, and the atoms on the solid surface leave the solid and deposit on the substrate surface. The solid bombarded is the raw material for depositing thin films by sputtering method, which is called sputtering target material.
[0003] Magnetron sputtering uses magnetic field to change the direction of electron motion and bind and prolong the trajectory of electron motion, thereby increasing the ionization probability of electrons on working gas and effectively utilizing the energy of electrons. Therefore, the sputtering of target material caused by the bombardment of positive ions on the target material is more effective. At the same time, the electrons bound by the orthogonal electromagnetic field can only deposit on the substrate when their energy is exhausted. This is the reason why magnetron sputtering has the two characteristics of "low temperature" and "high speed". The main magnetron sputtering methods include DC magnetron sputtering, RF magnetron sputtering and MF magnetron sputtering. The main difference between DC magnetron sputtering and RF / MF magnetron sputtering is that DC is used for metal target sputtering, and RF / MF is used for metal target and dielectric target.
[0004] In the existing sputtering production line, sputtering equipment and injection molding machines are usually arranged on both sides of the production line. The products processed by the injection molding machines are placed into the production line and then placed into the sputtering equipment by the mechanical hand of the production line for sputtering process. In the above-mentioned scheme, when the sputtering equipment or the injection molding machine fails, the entire production line will be forced to stop production, and maintenance is required, which seriously affects the production efficiency. UTILITY MODEL CONTENTS
[0005] The utility model aims at the deficiency of prior art to provide a kind of sputtering process line for large capacity blue light storage medium production.
[0006] To achieve the above-mentioned purpose, the technical scheme of the utility model is as follows:
[0007] A kind of sputtering process line for large capacity blue light storage medium production, including conveying platform, conveying platform is provided with multiple rotating discs, rotating disc is provided with multiple positioning structures for temporarily storing products, conveying platform is arranged with multiple sputtering modules along the way, sputtering module includes the primary processing equipment and sputtering equipment that can cooperate with rotating disc;Two rotating discs between adjacent each other are connected.
[0008] Further, the rotating disc is divided into an upper and lower feeding rotating disc and a buffer rotating disc, wherein the upper and lower feeding rotating disc is respectively connected with the preliminary processing equipment and the sputtering equipment.
[0009] Further, at least one buffer rotating disc is arranged between two adjacent upper and lower feeding rotating discs.
[0010] Further, a connecting mechanical arm is arranged between the upper and lower feeding rotating disc and the buffer rotating disc.
[0011] Further, the preliminary processing equipment is provided with a feeding conveying line connected with the upper and lower feeding rotating disc of the conveying platform.
[0012] Further, the sputtering equipment is provided with a sputtering mechanical arm connected with the upper and lower feeding rotating disc of the conveying platform.
[0013] Further, an inner rotating disc and an outer rotating disc are arranged between one group of the preliminary processing equipment and the sputtering equipment and rotate respectively, the inner rotating disc and the outer rotating disc are coaxially arranged, and the inner rotating disc and the outer rotating disc are both provided with a plurality of temporary storage structures for temporarily storing products.
[0014] Further, the connecting mechanical arm is arranged between the inner rotating disc and the last buffer rotating disc, an inner-outer ring exchange mechanical arm is arranged between the inner rotating disc and the outer rotating disc, and the preliminary processing equipment and the sputtering equipment are respectively connected with the outer rotating disc.
[0015] Further, the conveying platform is further provided with a feeding mechanical arm for moving the products in the inner rotating disc to the outside.
[0016] Further, the number of the sputtering modules is more than three.
[0017] The beneficial effects of the utility model are as follows: a plurality of sputtering modules are connected with the rotating disc, the preliminary processing equipment sequentially puts the preliminary formed products into the rotating disc of the conveying platform, then the products are rotated to the sputtering equipment, and then the sputtering process is carried out on the products by the sputtering equipment; then the products are sequentially conveyed to the next process by the plurality of rotating discs; when one group of sputtering modules fails, the work of the group of sputtering modules can be paused, the remaining sputtering modules work normally, the normal operation of the equipment is maintained under the condition that the sputtering process line does not stop, and the basic production efficiency is ensured. BRIEF DESCRIPTION OF DRAWINGS
[0018] Fig. 1 It is a plane structure schematic view of the sputtering process line.
[0019] Fig. 2 It is a plane structure schematic view of one of the sputtering modules.
[0020] Fig. 3 It is a plane structure schematic view of the connection between the feeding module and the sputtering module.
[0021] The reference signs include:
[0022] 1-conveying platform,
[0023] 10-sputtering module, 11-feeding and discharging rotary table, 12-buffering rotary table, 13-primary processing equipment,
[0024] 14-feeding conveying line, 15-sputtering equipment, 16-sputtering manipulator, 17-positioning structure,
[0025] 18-connection manipulator,
[0026] 2-feeding module,
[0027] 21-inner rotary table, 22-outer rotary table, 23-temporarily storing structure, 24-inner-outer ring exchange manipulator,
[0028] 25-feeding manipulator. DETAILED DESCRIPTION
[0029] The utility model will be described in detail below in combination with the drawings.
[0030] As Figs. 1-3 shown, a sputtering process line for mass production of blue light storage medium comprises a conveying platform 1, the conveying platform 1 is provided with a plurality of rotary tables, the rotary table is provided with a plurality of positioning structures 17 for temporarily storing products, the conveying platform 1 is arranged with a plurality of sputtering modules 10 along the way, the sputtering module 10 comprises a primary processing equipment 13 and a sputtering equipment 15 capable of cooperating with the rotary table, two adjacent rotary tables are connected with each other, and the conversion manipulator can transfer the product of the previous rotary table to the next rotary table.
[0031] A plurality of sputtering modules 10 are matched with the rotary table respectively, the primary processing equipment 13 sequentially puts the primary formed product into the rotary table of the conveying platform 1, then rotates to the sputtering equipment 15, and then the sputtering equipment 15 is used for sputtering process processing on the product; then the product is sequentially conveyed to the next process by the cooperation of a plurality of rotary tables; when one group of sputtering modules 10 fails, the work of the group of sputtering modules 10 can be paused, the remaining sputtering modules 10 work normally, the normal operation of the equipment is maintained under the condition that the sputtering process line does not stop, and the basic production efficiency is ensured.
[0032] The primary processing equipment 13 is an injection molding machine. The product is a blue light storage medium, i.e. an optical disc.
[0033] The rotating disc is divided into an upper and lower disc 11 and a buffer disc 12, wherein the upper and lower disc 11 is connected with the initial processing equipment 13 and the sputtering equipment 15 respectively. The initial processing equipment 13 is provided with a lower conveying line 14 connected with the upper and lower disc 11 of the conveying platform 1, and the products processed by the initial processing equipment 13 are conveyed to the corresponding upper and lower disc 11 through the lower conveying line 14 for temporary storage. The upper and lower disc 11 is connected with the lower conveying line 14, and the products on the lower conveying line 14 enter the upper and lower disc 11.
[0034] The sputtering equipment 15 is provided with a sputtering manipulator 16 connected with the upper and lower disc 11 of the conveying platform 1, and the upper and lower disc 11 rotates. One of the upper and lower disc 11 is loaded with products, which is connected with the sputtering equipment 15, and then the products are moved to the sputtering equipment 15 by the sputtering manipulator 16 for sputtering, so as to realize the sputtering process of the products. The products after sputtering are moved to the upper and lower disc 11 by the sputtering manipulator 16 for temporary storage.
[0035] At least one buffer disc 12 is arranged between two adjacent upper and lower discs 11, and a connecting manipulator 18 is arranged between the upper and lower disc 11 and the buffer disc 12. The products after sputtering are continuously rotated to the connecting manipulator 18 through the upper and lower disc 11, and then the products are moved to the buffer disc 12 by the connecting manipulator 18 for transfer, so as to realize the connection. Since the number of sputtering modules 10 is more than one, a plurality of buffer discs 12 are arranged between two adjacent sputtering modules 10 for buffering the products after sputtering, so as to prevent too many products from hindering the normal sputtering process of the adjacent sputtering module 10.
[0036] The number of sputtering modules 10 is more than three.
[0037] The products after sputtering of the first group of sputtering modules 10 are moved to the buffer disc 12 by the connecting manipulator 18 through the upper and lower disc 11, and then the products are moved to the second group of sputtering modules 10 by the connecting manipulator 18 after passing through the buffer disc 12 more than once, that is, the products enter the second group of upper and lower discs 11.
[0038] In order to prevent the conflict between the two groups of products, the production speed of the second group of sputtering modules 10 is slowed down, that is, after the initial processing equipment 13 conveys the products to the corresponding upper and lower disc 11 through the lower conveying line 14, the upper and lower disc 11 rotates at an interval of more than one positioning structure 17, and the empty positioning structure 17 is used to carry the products of the previous buffer disc 12, so as to realize the cooperation of the two groups of sputtering modules 10. In this way, the products of the first group and the second group are moved to the next buffer disc 12 by the connecting manipulator 18 for temporary storage.
[0039] The multiple sputtering modules 10 are cooperated with each other, and the multiple feeding and discharging rotary discs and the buffer rotary disc 12 are cooperated, so that the production of two groups of sputtering modules 10 can be completed on one sputtering conveying line, and the production of the sputtering conveying line will not be affected when one group of sputtering modules 10 fails, and only the production quantity will be affected, and the remaining sputtering modules 10 can normally produce, and the whole machine does not need to be stopped for maintenance, so that the production efficiency is ensured.
[0040] The third group of sputtering modules 10 are located at the end, and the inner rotary disc 21 and the outer rotary disc 22 arranged in different coaxial arrangements in the same area, ensure the normal operation of production, and reduce the occupation of space, and will not produce conflict.
[0041] The third group of sputtering modules 10 are located at the end, and the inner rotary disc 21 and the outer rotary disc 22 arranged in different coaxial arrangements in the same area, ensure the normal operation of production, and reduce the occupation of space, and will not produce conflict.
[0042] The third group of sputtering modules 10 are located at the end, and the inner rotary disc 21 and the outer rotary disc 22 arranged in different coaxial arrangements in the same area, ensure the normal operation of production, and reduce the occupation of space, and will not produce conflict.
[0043] As can be seen from the above, the utility model has the excellent characteristics described above, and can improve the performance of the prior art and has practicality, and becomes a product with high practical value.
[0044] The above merely describes preferred embodiments of the present application, and for those skilled in the art, according to the idea of the present application, changes can be made in the specific implementation manner and application range, and the content of the specification should not be understood as a limitation of the present application.
Claims
1. A sputtering process line for mass production of Blu-ray storage media, comprising a transport platform, which is provided with a plurality of rotating discs, which are provided with a plurality of positioning structures for temporarily storing products, characterized in that: The conveying platform is provided with a plurality of sputtering modules along the way, the sputtering module comprising a preliminary processing device and a sputtering device capable of cooperating with the rotating disc; and two adjacent rotating discs are connected to each other.
2. A sputtering process line for mass production of Blu-ray storage media according to claim 1, characterized in that: The rotating disc is divided into an upper and lower disc and a buffer disc, wherein the upper and lower disc is connected to the preliminary processing device and the sputtering device respectively.
3. A sputtering process line for mass production of Blu-ray storage media according to claim 2, characterized in that: At least one buffer disc is arranged between two adjacent upper and lower discs.
4. A sputtering process line for mass production of Blu-ray storage media according to claim 3, characterized in that: An interface mechanical arm is arranged between the upper and lower disc and the buffer disc.
5. A sputtering process line for mass production of Blu-ray storage media according to claim 1, characterized in that: The preliminary processing device is provided with a lower conveying line connected to the upper and lower disc of the conveying platform.
6. A sputtering process line for mass production of Blu-ray storage media according to claim 1, characterized in that: The sputtering device is provided with a sputtering mechanical arm connected to the upper and lower disc of the conveying platform.
7. A sputtering process line for mass production of Blu-ray storage media according to claim 4, characterized in that: A group of the preliminary processing device and the sputtering device is provided with an inner rotating disc and an outer rotating disc rotating respectively, the inner rotating disc and the outer rotating disc are coaxially arranged, and the inner rotating disc and the outer rotating disc are both provided with a plurality of temporary storage structures for temporarily storing products.
8. A sputtering process line for mass production of Blu-ray storage media according to claim 7, characterized in that: The interface mechanical arm is arranged between the inner rotating disc and the previous buffer disc, an inner and outer ring exchange mechanical arm is arranged between the inner rotating disc and the outer rotating disc, and the preliminary processing device and the sputtering device are connected to the outer rotating disc respectively.
9. A sputtering process line for mass production of Blu-ray storage media according to claim 8, characterized in that: The conveying platform is further provided with a lower mechanical arm for moving the products of the inner rotating disc outward.
10. A sputtering process line for the production of high capacity Blu-ray storage media according to any one of claims 1 to 9, characterized in that: The number of the sputtering modules is more than three.