Gas uniformizing structure of Hall ion source

Abstract

The utility model provides a gas uniformizing structure of a Hall ion source, which comprises a cathode filament, a pole shoe, an anode module, a water cooling plate, a magnet, a base and a shell, a heat transfer plate is arranged between the anode module and the water cooling plate, a gas uniformizing chamber is arranged between the lower part of the anode module and the heat transfer plate, and a gas diverter is arranged in the gas uniformizing chamber. The gas diverter is connected above the heat transfer plate, the periphery of the gas diverter and the inner wall of the gas uniformizing cavity form a gas uniformizing passageway, a gas inlet and a gas flow channel are formed in the middle of the heat transfer plate, the gas flow channel comprises a plurality of gas flow sub-pipelines and a gas flow collecting pipeline, and the gas inlet is formed in the center of the heat transfer plate. Working gas enters from the gas inlet, uniformly flows to the plurality of gas flow sub-pipelines, is outwards gathered to the gas flow gathering pipeline from the gas flow sub-pipelines, upwards flows to the gas uniformizing passageway from the gas flow gathering pipeline, and finally impacts the cathode filament, the plurality of gas flow sub-pipelines and the gas flow gathering pipeline, so that the output working gas is uniformly distributed.

Description

Technical Field

[0001] This utility model relates to the technical field of ion source-assisted coating, and more specifically, to a uniform gas structure for a Hall ion source. Background Technology

[0002] Ion sources are currently the most widely used devices in ion-assisted deposition and cleaning of products to be deposited. They are used in vapor deposition processes to ionize gases through plasma discharge. Ion sources can effectively improve film density, adhesion, and the optical and mechanical properties of the film. Commonly used ion sources include Penning ion sources, Hall ion sources, and anolyte ion sources.

[0003] A Hall ion source consists of an anode, a cathode, a magnetic field, and a gas distribution assembly. The cathode emits electrons, while the anode, under the assistance of a strong axial magnetic field, ionizes the process gas, bombarding the incoming gas atoms to form plasma. Simultaneously, it provides neutralizing electrons, forming an electrically neutral plasma beam. The plasma is accelerated towards the exit by the Hall current. The strong imbalance of this axial magnetic field separates the gas ions and forms the ion beam. Due to the strength of the axial magnetic field, the Hall ion source ion beam needs additional electrons to neutralize the ion flow. A common neutralization source is a tungsten filament (cathode), which typically spans the exit. The tungsten filament corrodes quickly from the impact of the ion beam, especially with reactive gases, and generally needs to be replaced every ten to fifteen hours. Furthermore, the tungsten filament can cause contamination.

[0004] Existing technologies CN 216361482 U discloses a gas distributor made of high thermal conductivity metal located on the lower end face of a reflector, and CN 116755011 A discloses a gas diverter disposed inside a hollow shell. The above technologies only provide a device for gas diversion to disperse the gas. CN 211207376 U discloses a gas equalization seat in the mounting cavity, which is provided with a number of equally spaced air guide holes that communicate with the gaps to evenly disperse the process gas. This patent sets up a gas equalization seat and air guide holes to cooperate to achieve the effect of uniform gas diversion.

[0005] However, the above technologies only set up gas distributors or added gas guide holes, and the gas dispersion is only a one-time coarse dispersion, with low uniformity. Utility Model Content

[0006] In view of this, in order to solve the above problems, this utility model proposes a gas uniformity structure for a Hall ion source. The working gas is delivered by connecting the inlet pipe 10 through the through hole 621 on the water-cooled plate 6. The strip groove 63 guides the airflow channel biased by the magnet 7 so that the working gas is dispersed from the center position, ensuring uniform gas distribution. After the gas is dispersed by the inlet 51 and gas flow channel 52 on the heat transfer plate 5, the gas is further dispersed by the gas uniformity channel 44 between the anode module 4 and the gas distributor 43. The gas is uniformly dispersed step by step, with good dispersion effect and high uniformity. Moreover, the gas uniformity structure components are designed compactly to avoid large gas loss.

[0007] A uniform gas structure for a Hall ion source includes a cathode filament 1, an electrode shoe 3, an anode module 4, a water-cooled plate 6, a magnet 7, a base 8, and a housing 9. The housing 9 is a hollow cavity and is snapped into the base 8. The magnet 7 is installed at the center of the base 8. The water-cooled plate 6 is positioned above the magnet 7. The anode module 4, electrode shoe 3, and cathode filament 1 are sequentially positioned above the water-cooled plate 6. The two ends of the cathode filament 1 are connected by conductive posts 2. The conductive posts 2 are symmetrically arranged and extend from the top of the electrode shoe 3 to below the water-cooled plate 6. The electrode shoe 3 and the anode module 4 are connected by the conductive posts. The middle part of the electrode shoe 3 and the anode module 4 is a hollow inverted conical structure. The characteristic feature is that a heat transfer plate 5 is provided between the anode module 4 and the water-cooled plate 6. A uniform gas chamber 42 is provided between the inverted conical structure of the anode module 4 and the heat transfer plate 5. A gas distributor 43 is provided in the uniform gas chamber 42 and connected to the heat transfer plate 5. Above, the gas distributor 43 and the inner wall of the gas equalization chamber 42 form a gas equalization channel 44. The heat transfer plate 5 is provided with an air inlet 51 and a gas flow channel 52 in the middle. The gas flow channel 52 includes multiple air flow sub-pipes 521 and an air flow gathering pipe 522. The multiple air flow sub-pipes 521 are connected to the air flow gathering pipe 522. The multiple air flow sub-pipes 521 divide the middle upper surface of the heat transfer plate 5 equally. The air inlet 51 is located in the center of the heat transfer plate 5. After the working gas enters from the air inlet 51, it flows evenly to the multiple air flow sub-pipes 521. It then converges outward from the air flow sub-pipes 521 to the air flow gathering pipe 522. From the air flow gathering pipe 522, it flows upward to the gas equalization channel 44 and finally impacts the cathode filament 1. The area of ​​the gas distributor 43 is larger than the outer edge of the air flow gathering pipe 522. The multiple air flow sub-pipes 521 and the air flow gathering pipe 522 make the output working gas evenly distributed.

[0008] Furthermore, a groove 61 is provided at the center of the lower surface of the water-cooled plate 6, and the groove 61 is engaged with the top of the magnet 7.

[0009] Furthermore, the outer edge of the groove 61 is provided with an annular protrusion 62, the annular protrusion 62 is provided with a through hole 621, the base 8 is provided with an air inlet pipe 10, one end of the air inlet pipe 10 passes through and can be located outside the housing 9, and the other end is located inside the housing 9 and connected to the air inlet end of the through hole 621. The working gas is delivered to the air inlet end of the through hole 621 through the air inlet pipe 10.

[0010] Furthermore, the upper surface of the water-cooled plate 6 is provided with a strip groove 63. One end of the strip groove 63 is connected to the air outlet of the through hole 621, and the other end is connected to the air inlet 51 of the heat transfer plate 5, which is used to transport gas to the center of the heat transfer plate 5 so that the gas is dispersed upward from the center position.

[0011] Furthermore, the lower surface of the water-cooled plate 6 is provided with a cooling channel 64, which is arranged around the outer ring of the annular protrusion 62 for cooling the anode module 4.

[0012] Furthermore, the base 8 is also provided with a water inlet pipe 11 and a water outlet pipe 12. One end of the water inlet pipe 11 and the water outlet pipe 12 both pass through the housing 9 and are located outside the housing 9, while the other end is located inside the housing 9 and connected to the sealing plate 65. The sealing plate 65 is located below the cooling channel 64 and is connected to the water-cooled plate 6. The cooling channel 64 is located between the sealing plate 65 and the water-cooled plate 6. The sealing plate 65 is made of metal.

[0013] Furthermore, the middle part of the pole shoe 3 is the first chamber 31, and the middle part of the anode module 4 is the second chamber 41. The cross-sections of the first chamber 31 and the second chamber 41 are inverted trapezoidal to diffuse the gas. The working gas in the first chamber 31 is evenly distributed from the gas equalization channel 44 of the gas equalization chamber 42, and then passes through the second chamber 41 and the first chamber 31 in sequence, and finally rushes towards the cathode filament 1.

[0014] Furthermore, the heat transfer plate 5 is made of ceramic and is used to insulate the water-cooled plate 6 and the anode module 4.

[0015] Furthermore, gaskets 53 are provided between the heat transfer plate 5 and the anode module 4, and between the heat transfer plate 5 and the water-cooling plate 6, for sealing purposes. The gaskets 53 are made of indium.

[0016] Furthermore, insulating blocks are provided on both the upper and lower end faces of the conductive post 2 where it connects to the water-cooled plate 6 for insulation. The conductive post 2 is segmented, making it easy to assemble and disassemble.

[0017] Furthermore, the base 8 is provided with a wire groove 81, the two ends of which are connected to the base 8. The middle part of the wire groove 81 is wavy, which is used to organize the internal wiring so that it is not easy to get messy.

[0018] The beneficial effects of this utility model are as follows: This utility model proposes a uniform gas structure for a Hall ion source. The working gas is delivered by connecting the inlet pipe 10 through the through hole 621 on the water-cooled plate 6. The strip groove 63 guides the airflow channel biased by the magnet 7 so that the working gas is dispersed from the center position, ensuring uniform gas distribution. After the gas is dispersed by the inlet 51 and gas flow channel 52 on the heat transfer plate 5, the gas is further dispersed by the uniform gas channel 44 between the anode module 4 and the gas distributor 43. The gas is uniformly dispersed step by step, with good dispersion effect and high uniformity. Moreover, the compact design between the components of the uniform gas structure will not lead to a large amount of gas loss. Attached Figure Description

[0019] Figure 1 This is an overall structural diagram of the uniform gas structure of the Hall ion source of this utility model.

[0020] Figure 2 This is a cross-sectional view of the uniform gas structure of the Hall ion source of this invention. Figure 1 .

[0021] Figure 3 This is a structural diagram of the heat transfer plate of the uniform gas structure of the Hall ion source of this utility model.

[0022] Figure 4 This is a cross-sectional view of the uniform gas structure of the Hall ion source of this invention. Figure 2 .

[0023] Figure 5 This is a structural diagram of the lower part of the water-cooled plate of the uniform gas structure of the Hall ion source of this utility model.

[0024] Figure 6 This is a structural diagram of the upper part of the water-cooled plate of the uniform gas structure of the Hall ion source of this utility model.

[0025] Figure 7 This is a structural diagram of the uniform gas structure of the Hall ion source of this invention without the shell.

[0026] Explanation of main component symbols

[0027] 1. Cathode filament; 2. Conductive post; 3. Pole shoe; 31. First chamber; 4. Anode module; 41. Second chamber; 42. Gas distribution chamber; 43. Gas distributor; 44. Gas distribution channel; 5. Heat transfer plate; 51. Air inlet; 52. Gas flow channel; 521. Gas flow sub-pipe; 522. Gas flow gathering pipe; 53. Gasket; 6. Water cooling plate; 61. Groove; 62. Annular protrusion; 621. Through hole; 63. Strip groove; 64. Cooling channel; 65. Sealing plate; 7. Magnet; 8. Base; 81. Wire groove; 9. Housing; 10. Air inlet pipe; 11. Water inlet pipe; 12. Water outlet pipe.

[0028] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this utility model. Detailed Implementation Example

[0029] like Figures 1-4 As shown, a uniform gas structure for a Hall ion source includes a cathode filament 1, an electrode shoe 3, an anode module 4, a water-cooled plate 6, a magnet 7, a base 8, and a housing 9. The housing 9 is a hollow cavity and is snapped into the base 8. The magnet 7 is installed at the center of the base 8. The water-cooled plate 6 is located above the magnet 7. The anode module 4, electrode shoe 3, and cathode filament 1 are sequentially arranged above the water-cooled plate 6. The two ends of the cathode filament 1 are connected by conductive posts 2. The conductive posts 2 are symmetrically arranged and extend from the top of the electrode shoe 3 to below the water-cooled plate 6. The electrode shoe 3 and the anode module 4 are connected by conductive posts. The middle part of the electrode shoe 3 and the anode module 4 is a hollow inverted conical structure. The characteristic feature is that a heat transfer plate 5 is provided between the anode module 4 and the water-cooled plate 6. A uniform gas chamber 42 is provided between the inverted conical structure of the anode module 4 and the heat transfer plate 5. A gas splitter 43 is provided in the uniform gas chamber 42 and is connected to the heat transfer plate 5. Above plate 5, the gas distributor 43 and the inner wall of the gas equalization chamber 42 form a gas equalization channel 44. The heat transfer plate 5 is provided with an air inlet 51 and a gas flow channel 52 in the middle. The gas flow channel 52 includes multiple air flow sub-pipes 521 and an air flow gathering pipe 522. The multiple air flow sub-pipes 521 are connected to the air flow gathering pipe 522. The multiple air flow sub-pipes 521 divide the middle upper surface of the heat transfer plate 5 equally. The air inlet 51 is located in the center of the heat transfer plate 5. After the working gas enters from the air inlet 51, it flows evenly to the multiple air flow sub-pipes 521. It then converges outward from the air flow sub-pipes 521 to the air flow gathering pipe 522. From the air flow gathering pipe 522, it flows upward to the gas equalization channel 44 and finally impacts the cathode filament 1. The area of ​​the gas distributor 43 is larger than the outer edge of the air flow gathering pipe 522. The multiple air flow sub-pipes 521 and the air flow gathering pipe 522 make the output working gas evenly distributed.

[0030] like Figure 5 , 6 As shown, the lower surface of the water-cooled plate 6 has a groove 61 at its center, which engages with the top of the magnet 7. The outer edge of the groove 61 has an annular protrusion 62, and the annular protrusion 62 has a through hole 621. The base 8 has an air inlet pipe 10, one end of which passes through and can be located outside the housing 9, and the other end is located inside the housing 9 and connected to the air inlet end of the through hole 621. The working gas is delivered to the air inlet end of the through hole 621 through the air inlet pipe 10.

[0031] The upper surface of the water-cooled plate 6 is provided with a strip groove 63. One end of the strip groove 63 is connected to the air outlet of the through hole 621, and the other end is connected to the air inlet 51 of the heat transfer plate 5, which is used to transport gas to the center of the heat transfer plate 5 so that the gas is dispersed upward from the center position.

[0032] The lower surface of the water-cooled plate 6 is provided with a cooling channel 64, which is arranged around the outer ring of the annular protrusion 62 and is used to cool the anode module 4.

[0033] like Figure 2 , 7 As shown, the base 8 is also provided with a water inlet pipe 11 and a water outlet pipe 12. One end of the water inlet pipe 11 and the water outlet pipe 12 both pass through the housing 9 and are located outside the housing 9, while the other end is located inside the housing 9 and connected to the sealing plate 65. The sealing plate 65 is located below the cooling channel 64 and is connected to the water-cooled plate 6. The cooling channel 64 is located between the sealing plate 65 and the water-cooled plate 6. The sealing plate 65 is made of metal.

[0034] like Figure 2 As shown, the middle part of the pole shoe 3 is the first chamber 31, and the middle part of the anode module 4 is the second chamber 41. The cross-sections of the first chamber 31 and the second chamber 41 are inverted trapezoidal to diffuse the gas. The working gas in the first chamber 31 is evenly distributed from the gas equalization channel 44 of the gas equalization chamber 42, and then passes through the second chamber 41 and the first chamber 31 in sequence, and finally rushes towards the cathode filament 1.

[0035] The heat transfer plate 5 is made of ceramic and is used to insulate the water-cooled plate 6 and the anode module 4.

[0036] Gaskets 53 are provided between the heat transfer plate 5 and the anode module 4, and between the heat transfer plate 5 and the water-cooling plate 6, for sealing purposes. The gaskets 53 are made of indium.

[0037] Insulating blocks are provided on both the upper and lower ends of the conductive post 2 where it connects to the water-cooled plate 6 for insulation. The conductive post 2 is segmented and easy to assemble and disassemble.

[0038] like Figure 7 As shown, the base 8 is provided with a wire groove 81, the two ends of the wire groove 81 are connected to the base 8, and the middle part of the wire groove 81 is wavy, which is used to organize the internal wiring so that it is not easy to get messy.

[0039] The beneficial effects of this utility model are as follows: This utility model proposes a uniform gas structure for a Hall ion source. The working gas is delivered by connecting the inlet pipe 10 through the through hole 621 on the water-cooled plate 6. The strip groove 63 guides the airflow channel biased by the magnet 7 so that the working gas is dispersed from the center position, ensuring uniform gas distribution. After the gas is dispersed by the inlet 51 and gas flow channel 52 on the heat transfer plate 5, the gas is further dispersed by the uniform gas channel 44 between the anode module 4 and the gas distributor 43. The gas is uniformly dispersed step by step, with good dispersion effect and high uniformity. Moreover, the compact design between the components of the uniform gas structure will not lead to a large amount of gas loss.

[0040] The embodiments described above are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of this utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A uniform gas structure for a Hall ion source, comprising a cathode filament (1), an electrode shoe (3), an anode module (4), a water-cooled plate (6), a magnet (7), a base (8), and a housing (9), wherein the housing (9) is a hollow cavity, the housing (9) is snapped into the base (8), the magnet (7) is installed at the center of the base (8), the water-cooled plate (6) is provided above the magnet (7), and the anode module (4), the electrode shoe (3), and the cathode filament (1) are sequentially provided above the water-cooled plate (6), the two ends of the cathode filament (1) are connected by conductive posts (2), the conductive posts (2) are symmetrically arranged and extend from the top of the electrode shoe (3) to the bottom of the water-cooled plate (6), the electrode shoe (3) and the anode module (4) are connected by guide posts, and the middle part of the electrode shoe (3) and the anode module (4) is a hollow inverted cone structure, characterized in that: A heat transfer plate (5) is provided between the anode module (4) and the water-cooled plate (6). A gas equalization chamber (42) is provided between the inverted conical structure of the anode module (4) and the heat transfer plate (5). A gas equalization chamber (42) is provided in the gas equalization chamber (42). The gas equalization chamber (43) is connected to the top of the heat transfer plate (5). The gas equalization chamber (43) and the inner wall of the gas equalization chamber (42) form a gas equalization channel (44). An air inlet (51) and a gas flow channel (52) are provided in the middle of the heat transfer plate (5). The gas flow channel (52) includes multiple gas flow sub-pipes (521) and a gas flow collection pipe (522). The multiple gas flow sub-pipes (521) The gas is connected to the gas flow collection pipe (522). Multiple gas flow sub-pipes (521) divide the upper surface of the heat transfer plate (5) in the middle. The air inlet (51) is located in the center of the heat transfer plate (5). After the working gas enters from the air inlet (51), it flows evenly to multiple gas flow sub-pipes (521). It converges outward from the gas flow sub-pipes (521) to the gas flow collection pipe (522). It flows upward from the gas flow collection pipe (522) to the gas flow equalization channel (44) and finally impacts the cathode filament (1). The area of ​​the gas splitter (43) is larger than the outer edge of the gas flow collection pipe (522). Multiple gas flow sub-pipes (521) and the gas flow collection pipe (522) make the output working gas evenly distributed.

2. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: The water-cooled plate (6) has a groove (61) at the center of its lower surface, and the groove (61) engages with the top of the magnet (7).

3. The uniform gas structure of the Hall ion source as described in claim 2, characterized in that: The groove (61) has an annular protrusion (62) on its outer edge. The annular protrusion (62) has a through hole (621). The base (8) has an air inlet pipe (10). One end of the air inlet pipe (10) passes through and can be located outside the housing (9). The other end is located inside the housing (9) and connected to the air inlet end of the through hole (621). The working gas is delivered to the air inlet end of the through hole (621) through the air inlet pipe (10).

4. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: The upper surface of the water-cooled plate (6) is provided with a strip groove (63). One end of the strip groove (63) is connected to the air outlet of the through hole (621), and the other end is connected to the air inlet (51) of the heat transfer plate (5), which is used to transport the gas to the center of the heat transfer plate (5) so that the gas is dispersed upward from the center position.

5. The uniform gas structure of the Hall ion source as described in claim 3, characterized in that: The lower surface of the water-cooled plate (6) is provided with a cooling channel (64), which is arranged around the outer ring of the annular protrusion (62).

6. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: The base (8) is also provided with an inlet pipe (11) and an outlet pipe (12). One end of the inlet pipe (11) and the outlet pipe (12) pass through the shell (9) and are located outside the shell (9). The other end is located inside the shell (9) and connected to the sealing plate (65). The sealing plate (65) is located below the cooling channel (64) and is connected to the water-cooled plate (6). The cooling channel (64) is located between the sealing plate (65) and the water-cooled plate (6).

7. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: The middle part of the pole shoe (3) is the first chamber (31), and the middle part of the anode module (4) is the second chamber (41). The cross-sections of the first chamber (31) and the second chamber (41) are inverted trapezoidal. The working gas in the first chamber (31) is evenly distributed from the gas equalization channel (44) of the gas equalization chamber (42), and then passes through the second chamber (41) and the first chamber (31) in sequence, and finally rushes towards the cathode filament (1).

8. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: Gaskets (53) are provided between the heat transfer plate (5) and the anode module (4), and between the heat transfer plate (5) and the water cooling plate (6).

9. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: Insulating blocks are provided on both the upper and lower ends of the conductive column (2) that connects to the water-cooled plate (6).

10. The uniform gas structure of the Hall ion source as described in claim 1, characterized in that: The base (8) is provided with a wire groove (81), and the two ends of the wire groove (81) are connected to the base (8).

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