Positioning auxiliary device

Abstract

The utility model provides an auxiliary positioning device, which is used for assisting in determining the closing position of a process door of semiconductor heat treatment equipment, the auxiliary positioning device comprises a positioning main body and a positioning column, the positioning main body is provided with a first part and a second part which is positioned below the first part and is connected with the first part, and the positioning column is fixedly connected with the first part; the first part is used for extending into the process outer pipe, the positioning column is used for penetrating into a mounting hole of the process outer pipe, and the second part is used for extending to the position below the process outer pipe and can be matched with or separated from the avoiding groove in an inserted mode. Due to the fact that the second part extends to the position below the process outer pipe, and the second part and the receding groove are matched in an inserted mode outside the process outer pipe, when the positioning auxiliary device is used for determining the door closing position, a worker can easily observe whether the second part is aligned with the corresponding receding groove or not; the sealing ring can be easily adjusted to the position, corresponding to the second part, of the receding groove according to the observation result, and the difficulty of confirming the door closing position is lowered.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and more specifically, to a positioning auxiliary device. Background Technology

[0002] Vertical furnaces are indispensable equipment in semiconductor manufacturing processes. They are mainly divided into atmospheric pressure equipment and low pressure equipment. Low pressure equipment mainly uses low pressure chemical vapor deposition (LPCVD) for thin film deposition.

[0003] Current low-pressure equipment typically employs a dual-tube design. Specifically, a vertical furnace has an open-bottom outer process tube and an inner process tube. The inner process tube is installed into the outer process tube from its bottom end. The process door of the vertical furnace is used to carry a wafer boat, which contains the wafers to be processed. The process door is movable relative to the inner process tube to transport the wafer boat from its bottom end to the inner process tube and seal the bottom end of the outer process tube, thus forming a sealed reaction chamber. During the deposition process, process gas is supplied to the inner process tube through an inlet pipe. The process gas diffuses and undergoes a deposition reaction inside the inner process tube. Byproducts and residual gases generated in the inner process tube flow into the gap between the inner and outer process tubes and are then removed by a vacuum pump through an exhaust pipe. The outlet end of the inlet pipe is located inside the inner process tube, and the inlet end extends from the side wall of the outer process tube to the outside of the outer process tube to communicate with the gas source.

[0004] However, it is quite difficult to determine the appropriate closing position of the process door during the initial closing process of the aforementioned vertical furnace. Utility Model Content

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a positioning auxiliary device.

[0006] To achieve the purpose of this utility model, a positioning auxiliary device is provided to assist in determining the closed position of the process door of a semiconductor heat treatment equipment. The process outer tube of the semiconductor heat treatment equipment is provided with a mounting hole on its side wall. The air inlet pipe of the semiconductor heat treatment equipment extends from the outside of the process outer tube through the mounting hole into the inside of the process outer tube. The process door is provided with a sealing ring and a clearance groove. The opening end of the clearance groove extends vertically downward from the top surface of the sealing ring to its end end. When the process door is in the closed position, the sealing ring is located inside the process outer tube, and part of the air inlet pipe is inserted into the clearance groove.

[0007] The positioning auxiliary device includes: a positioning body and a positioning column. The positioning body has a first part and a second part located below the first part and connected to the first part. The positioning column is fixedly connected to the first part.

[0008] The first part is used to extend into the interior of the process outer tube, the positioning post is used to pass through the mounting hole of the process outer tube, the second part is used to extend from the bottom end of the process outer tube to the outside of the process outer tube, and the second part can be inserted into or disengaged from the clearance groove.

[0009] As described above, in the positioning auxiliary device, the clearance groove includes two parallel groove walls and a groove bottom located between the two groove walls, wherein the groove bottom is an arc surface;

[0010] The second part is configured to have a first mating surface and a second mating surface that are opposite to each other along its width direction, and an arc-shaped mating surface connecting the first mating surface and the second mating surface. The first mating surface and the second mating surface are respectively used to fit against the two groove walls, and the arc-shaped mating surface is used to adapt to and fit against the arc surface.

[0011] The positioning auxiliary device described above further includes a limiting member, the top surface of which is used to fit against the bottom surface of the process outer tube. The limiting member has a through hole that penetrates its thickness, the center line of which extends vertically, and the second part passes through the through hole.

[0012] In the positioning aid device described above, the orthographic projection of the first part on the top surface of the limiting member does not completely fall into the through hole, and the top surface of the limiting member abuts against the first part.

[0013] In the positioning aid device described above, the limiting member is detachably connected to the first part.

[0014] The positioning auxiliary device described above further includes a stop portion. The positioning post has a first end and a second end along its length direction. The first end is connected to the first portion, and the second end is fixedly connected to the stop portion. The first portion has an arc-shaped surface. When the positioning post passes through the mounting hole, the arc-shaped surface is used to abut against the inner wall of the outer process tube. The stop portion is located outside the outer process tube and is used to restrict the movement of the positioning post along its length direction toward the inside of the outer process tube.

[0015] As described above, in the positioning auxiliary device, the stop portion is used to abut against the outer peripheral surface of the process outer tube when the positioning post passes through the mounting hole;

[0016] Alternatively, the semiconductor heat treatment equipment may further include a pressure ring, which surrounds the outer periphery of the process outer tube and presses against the process outer tube. The pressure ring has an opening, the center line of which coincides with the center line of the mounting hole. The second end is used to extend out of the process outer tube and into the opening when the positioning post passes through the mounting hole. The stop portion is used to abut against the outer peripheral surface of the pressure ring.

[0017] In the positioning aid device described above, at least one of the stop portion and the first portion is detachably connected to the positioning post.

[0018] In the positioning auxiliary device described above, the stop portion is detachably connected to the second end, and the positioning body is integrally formed with the positioning column.

[0019] In the positioning auxiliary device described above, the second end is used to extend out of the mounting hole when the positioning post passes through the mounting hole, the stop part is a nut, the nut is threadedly connected to the second end, and the outer diameter of the nut is configured to be larger than the diameter of the mounting hole.

[0020] This utility model has the following beneficial effects:

[0021] The positioning auxiliary device provided by this utility model is designed with a positioning main body and a positioning column. The positioning column is used to simulate the air intake pipe, and the insertion and cooperation relationship between the second part of the positioning main body and the clearance groove is used to simulate the insertion and cooperation relationship between the air intake pipe and the clearance groove.

[0022] Since the second part extends below the outer process tube and is inserted into the clearance groove outside the outer process tube, when using the positioning auxiliary device of this embodiment to help determine the closing position of the process door, the operator can easily observe whether the second part is aligned with the corresponding clearance groove. Based on the observation results, the sealing ring can be easily adjusted to the position corresponding to the clearance groove and the second part (i.e., the position where the sealing ring will not collide with the air inlet pipe). This reduces the difficulty of confirming the appropriate closing position of the process door, enabling the door to be closed quickly and shortening the closing time. Attached Figure Description

[0023] Figure 1 A cross-sectional view of a semiconductor thermal processing apparatus that uses the positioning assistance device provided in the embodiments of this application to help determine the process gate closing position;

[0024] Figure 2 A bottom view of a semiconductor thermal processing apparatus that uses the positioning assistance device provided in the embodiments of this application to help determine the process gate closing position;

[0025] Figure 3 and Figure 4These are schematic diagrams from a first view and a second view of a process door in an open position in a semiconductor thermal processing apparatus, which uses the positioning assistance device provided in the embodiments of this application to assist in determining the closed position of the process door.

[0026] Figure 5 A schematic diagram of the three-dimensional structure of a positioning auxiliary device provided in an embodiment of this application;

[0027] Figure 6 A schematic diagram of the three-dimensional structure of a positioning aid device provided in an embodiment of this application, omitting the limiting member and the stop;

[0028] Figure 7 A three-dimensional schematic diagram of the positioning assistance device provided in an embodiment of this application in an application scenario;

[0029] Figure 8 A cross-sectional view of the positioning assistance device provided in an embodiment of this application in an application scenario;

[0030] Figure 9 A partial cross-sectional view of a positioning assistance device provided in an embodiment of this application in an application scenario;

[0031] Figure 10 A perspective view of an outer tube introduction assembly in an introduction device used in a semiconductor heat treatment apparatus for a positioning auxiliary device provided in an embodiment of this application;

[0032] Figure 11 A perspective view of an inner tube introduction assembly in an introduction device used in a semiconductor heat treatment apparatus for a positioning auxiliary device provided in an embodiment of this application;

[0033] Figure 12 A three-dimensional schematic diagram of an introduction device used in a semiconductor thermal processing apparatus for a positioning assistance device provided in an embodiment of this application, in a connected state;

[0034] Figure 13 A schematic diagram of the cooperation between an outer tube introduction component and a process outer tube in an introduction device used in a semiconductor thermal processing equipment for the application of a positioning auxiliary device provided in an embodiment of this application;

[0035] Figure 14 A schematic diagram of an introduction device used in a semiconductor thermal processing apparatus, in connection with a process inner tube, for use with a positioning auxiliary device provided in an embodiment of this application;

[0036] Figure 15 (A) and (B) are respectively top-view cross-sectional views of a semiconductor heat treatment apparatus using a positioning auxiliary device provided in an embodiment of this application, when the slider of the introduction device is located at the first end of the slide groove and when the slider is located at the second end of the slide groove.

[0037] Figure 16 This is a partial schematic diagram of a semiconductor thermal processing apparatus used in a positioning assistance device according to an embodiment of this application, when the introduction device is in a connected state.

[0038] Explanation of reference numerals in the attached figures:

[0039] 100 - Semiconductor thermal processing equipment; 110 - Chassis; 120 - Furnace body; 130 - Process outer tube;

[0040] 131-First annular platform; 1311-Notch; 1312-Groove; 132-Second annular platform; 133-Exhaust pipe; 134-Mounting hole; 140-Process inner tube; 141-First boss; 142-Crystal boat; 150-Annular base; 151-Second boss; 160-Intake pipe; 170-Process door; 171-Sealing assembly; 1711-Matching groove; 172-Sealing ring; 1721-Allowing groove; 173-Positioning protrusion; 180-Support assembly; 190-Pressure ring; 191-Opening;

[0041] 200 - Positioning auxiliary device; 210 - Positioning main body; 211 - First part; 212 - Second part; 213 - First mating surface; 214 - Arc-shaped mating surface; 220 - Positioning post; 230 - Limiting component;

[0042] 240 - Screw; 250 - Stop;

[0043] 300 - Introducing device; 310 - Outer tube introducing assembly; 311 - Support ring; 312 - Positioning groove;

[0044] 313-Positioning block; 314-Slide groove; 320-Inner tube introduction assembly; 321-Support plate; 3211-Positioning ring; 322-Support rod; 323-Mounting plate; 324-Handle; 325-Slider. Detailed Implementation

[0045] The following embodiments of this application provide a positioning assistance device used to assist in determining the closing position of the process door of a semiconductor heat treatment equipment. To facilitate a clear understanding of the structure of the positioning assistance device in this embodiment, the semiconductor heat treatment equipment will be described first.

[0046] Figure 1 A cross-sectional view of a semiconductor thermal processing apparatus that uses the positioning assistance device provided in the embodiments of this application to help determine the process gate closing position. Figure 2 A bottom view of a semiconductor thermal processing apparatus using the positioning assistance device provided in an embodiment of this application to help determine the process gate closing position. Please refer to... Figure 1 and Figure 2Taking the semiconductor heat treatment equipment 100 as a vertical heat treatment equipment as an example, the semiconductor heat treatment equipment 100 includes a furnace body 120 with open bottom, an outer process tube 130 and an inner process tube 140. The furnace body 120 surrounds the outer circumference of the outer process tube 130, and the outer process tube 130 surrounds the outer circumference of the inner process tube 140. That is, the furnace body 120, the outer process tube 130 and the inner process tube 140 are nested in sequence.

[0047] The semiconductor heat treatment equipment 100 also includes a chassis 110 for supporting the furnace body 120, and a through hole is provided on the top plate of the chassis 110. The bottom end of the furnace body 120 is fixedly connected to the top plate of the chassis 110, and the bottom end of the furnace body 120 surrounds the outer periphery of the through hole, with the process outer tube 130 passing through the through hole.

[0048] The bottom end of the process outer tube 130 is the first transmission port, and the top end is closed. The process inner tube 140 can be installed inside the process outer tube 130 through the first transmission port. The bottom side wall of the process outer tube 130 is also provided with an exhaust port, and an exhaust pipe 133 is also provided on the outside of the process outer tube 130. The inflow end of the exhaust pipe 133 is connected to the exhaust port.

[0049] The bottom end of the inner process tube 140 is the second transfer port. The semiconductor thermal processing equipment 100 also includes a process gate 170 and a wafer carrier 142. The wafer carrier 142 is mounted on the process gate 170. The process gate 170 can be raised and lowered relative to the outer process tube 130. The process gate 170 has an open position and a closed position. In the closed position, the process gate 170 closes the first transfer port, and the outer process tube 130 and the process gate 170 together define a sealed reaction chamber. As the process gate 170 moves from the open position to the closed position, it moves vertically upwards, causing the wafer carrier 142 to be transported from the second transfer port into the inner process tube 140.

[0050] Specifically, such as Figure 2As shown, a first annular platform 131 protrudes from the inner circumferential surface of the bottom end of the outer process tube 130 towards the interior of the outer process tube 130. The centerline of the first annular platform 131 coincides with the central axis of the outer process tube 130. The diameter D1 of the first annular platform 131 is smaller than the inner diameter D2 of the outer process tube 130, and the top surface of the first annular platform 131 forms a first stepped surface. Multiple notches 1311 penetrating the thickness of the first annular platform 131 are provided on the first annular platform 131. Multiple grooves 1312 are also recessed on the first stepped surface. The depth of the grooves 1312 is less than the thickness of the first annular platform 131, i.e., the grooves 1312 are blind holes. The multiple grooves 1312 and multiple notches 1311 are all spaced around the central axis of the outer process tube 130, and each groove 1312 can be located between two adjacent notches 1311. The outer circumferential surface of the bottom end of the inner process tube 140 protrudes outward from the inner process tube 140, and the multiple first protrusions 141 are distributed at intervals around the central axis of the inner process tube 140. Each of the multiple first protrusions 141 corresponds one-to-one with a multiple notch 1311, and each first protrusion 141 can pass through its corresponding notch 1311 vertically. Simultaneously, each of the multiple first protrusions 141 also corresponds one-to-one with a multiple groove 1312, and each first protrusion 141 can be placed in its corresponding groove 1312, allowing the first annular platform 131 to support the inner process tube 140. Therefore, it can be understood that... Figure 2 As shown, when the inner process tube 140 is placed on the first annular platform 131, the exhaust channel formed between the inner process tube 140 and the outer process tube 130 is connected to the interior of the inner process tube 140 through the notch 1311.

[0051] Figure 3 and Figure 4 These are schematic diagrams from a first view and a second view of a semiconductor thermal processing apparatus 100 in the open position, where the positioning assistance device 200 provided in this application is used to assist in determining the closed position of the process gate 170. For ensuring the sealing of the reaction chamber, please refer to... Figure 3 and Figure 4 A sealing assembly 171 is detachably provided on the process door 170, and a sealing ring 172 is provided on the sealing assembly 171. When the door is closed, the sealing ring 172 extends into the process outer tube 130. The projection of multiple notches 1311 onto the top surface of the process door 170 falls within the projection of the sealing ring 172 onto the top surface of the process door 170, thus the sealing ring 172 blocks the notches 1311. The sealing assembly 171 fits against the bottom surface of the process outer tube 130 to seal the first transmission port. The sealing ring 172 can be made of any of the following materials: quartz, graphite, or ceramic.

[0052] Please see Figure 3The process outer tube 130 is also provided with a mounting hole 134 on its side wall. In some embodiments, the center line of the mounting hole 134 is perpendicular to the central axis of the process outer tube 130. For example, the center line of the mounting hole 134 is arranged radially along the process outer tube 130. The gas inlet pipe 160 of the semiconductor heat treatment equipment 100 includes, for example, a vertical section and a horizontal section connected together. The vertical section stands upright inside the process inner tube 140, and the horizontal section passes through the mounting hole 134. The horizontal section extends from inside the process outer tube 130 to the outside of the process outer tube 130 and communicates with the gas source. This embodiment does not specifically limit the position of the mounting hole 134. For example, in Figure 3 In the specific example shown, the mounting hole 134 extends from the inner circumferential surface of the first annular platform 131 to the outer circumferential surface of the process outer tube 130; or, the mounting hole 134 may also be located above the first annular platform 131, extending from the inner circumferential surface of the process outer tube 130 to the outer circumferential surface of the process outer tube 130.

[0053] To avoid interference between the sealing ring 172 and the intake pipe 160, such as Figure 3 As shown, the sealing ring 172 is also provided with a relief groove 1721, the opening end of the relief groove 1721 extending vertically downward from the top surface of the sealing ring 172. When the process door 170 is in the closed position, the horizontal section of the air intake pipe 160 is inserted into the corresponding relief groove 1721 through the opening end of the relief groove 1721.

[0054] It should be understood that the number of mounting holes 134, the number of air intake pipes 160, and the number of clearance grooves 1721 are not limited. There can be multiple air intake pipes 160, and correspondingly, the process outer pipe 130 is provided with multiple mounting holes 134 corresponding to the multiple air intake pipes 160, and the sealing ring 172 is provided with multiple clearance grooves 1721 corresponding to the multiple air intake pipes 160.

[0055] To enable those skilled in the art to better understand the technical solution of this utility model, the positioning auxiliary device 200 provided by this utility model will be described in detail below with reference to the accompanying drawings.

[0056] Figure 5 This is a schematic diagram of the three-dimensional structure of the positioning assistance device 200 provided in one embodiment of this application. Figure 6 This is a schematic diagram of the three-dimensional structure of the positioning aid 200 provided in one embodiment of this application, omitting the limiting member 230 and the stop portion 250. Please refer to... Figure 5 and Figure 6The positioning auxiliary device 200 includes a positioning body 210 and a positioning post 220. The positioning body 210 has a first part 211 and a second part 212. The second part 212 is located below the first part 211 and connected to the first part 211. The positioning post 220 is fixedly connected to the first part 211. The central axis of the positioning post 220 extends horizontally, and the shape of the positioning post 220 is adapted to the shape of the mounting hole 134.

[0057] Figure 7 This is a three-dimensional schematic diagram of the positioning assistance device 200 provided in one embodiment of this application in an application scenario. Figure 8 This is a cross-sectional view of the positioning assistance device 200 provided in an embodiment of this application in an application scenario. Figure 9 This is a partial cross-sectional view of the positioning assistance device 200 provided in an embodiment of this application in an application scenario. Please refer to... Figures 7 to 9 The first part 211 extends into the interior of the outer process tube 130, the positioning post 220 is inserted into the mounting hole 134 of the outer process tube 130, and the second part 212 extends from the bottom end of the outer process tube 130 to the outside of the outer process tube 130, and the second part 212 can be inserted into or disengaged from the clearance groove 1721. The positioning post 220 mentioned in this application is not limited to a solid post, but can also be a hollow post.

[0058] Taking a semiconductor heat treatment equipment 100 having three or more air inlet pipes 160 and a process outer pipe 130 having three or more mounting holes 134 as an example, with the assistance of the positioning auxiliary device 200 in this embodiment, the closing process of the process door 170 of the semiconductor heat treatment equipment 100 during the first closing specifically includes steps S10 to S40.

[0059] S10, the process outer tube 130 is installed into the furnace body 120 using the introduction device 300.

[0060] S20, the process inner tube 140 is installed into the process outer tube 130 using the introduction device 300.

[0061] S30, using the positioning auxiliary device 200 to determine the appropriate closing position of the process door 170.

[0062] S40, install intake pipe 160, and close the door according to the closing position determined by S30.

[0063] Please see Figures 10 to 12The introduction device 300 includes an outer tube introduction assembly 310 and an inner tube introduction assembly 320. The outer tube introduction assembly 310 includes a support ring 311. The bottom surface of the support ring 311 has multiple positioning grooves 312 spaced apart around its center line. These positioning grooves 312 can correspond one-to-one with multiple positioning protrusions 173 protruding from the process gate 170. A positioning block 313 extends outward from the top edge of the support ring 311, as shown in the image. Figure 9 As shown, a second annular platform 132 protrudes from the outer circumferential surface of the bottom end of the process outer tube 130 towards the outside of the process outer tube 130. The semiconductor heat treatment equipment 100 also includes an annular base 150 sleeved on the outer circumference of the process outer tube 130. The outer diameter of the annular base 150 is larger than the outer diameter of the second annular platform 132. The bottom surface of the second annular platform 132 fits against the annular base 150, so that the second annular platform 132 rests on the annular base 150. Figure 7 As shown, the outer periphery of the annular base 150 protrudes outward from the process outer tube 130 and is provided with a plurality of second protrusions 151 spaced apart around the central axis of the process outer tube 130. The top edge of the support ring 311 is also recessed to form a groove 314, which extends circumferentially along the support ring 311.

[0064] The inner tube introduction assembly 320 includes a support plate 321, an upright support rod 322, and a mounting plate 323 arranged sequentially from top to bottom. A positioning ring 3211 protrudes from the top edge of the support plate 321, and the outer diameter of the positioning ring 3211 is equal to the inner diameter of the process inner tube 140. There is a gap between the outer circumferential surface of the positioning ring 3211 and the outer circumferential surface of the support plate 321. At least one handle 324 protrudes from the outer circumferential surface of the mounting plate 323, and a slider 325 protrudes from the bottom edge of the mounting plate 323. The slider 325 can be inserted into or separated from the groove 314, allowing the introduction device 300 to switch between a connected state and a disassembled state.

[0065] In the disassembled state, the slider 325 is separated from the slide groove 314, and the outer tube introduction assembly 310 can be used alone to introduce the process outer tube 130 into the furnace body 120. In the connected state, the mounting plate 323 is placed on the support ring 311 and abuts against the top surface of the support ring 311. The slider 325 is inserted into the slide groove 314, and the slider 325 and the slide groove 314 slide in cooperation. In this state, the introduction device 300 can be used to introduce the process inner tube 140 into the process outer tube 130.

[0066] Based on the above, the specific implementation process of step S10 is as follows: The sealing assembly 171 is disassembled from the process gate 170, the introducing device 300 is in a disassembled state, the outer tube introducing assembly 310 is placed on the process gate 170, and the multiple positioning grooves 312 on the support ring 311 all cooperate with the corresponding positioning protrusions 173 on the process gate 170. Next, please refer to... Figure 13 The process outer tube 130 is moved so that the annular base 150 outside the process outer tube 130 is placed on the top surface of the support ring 311. The process outer tube 130 is rotated so that one of the second protrusions 151 is aligned with the positioning block 313. Then, the lifting device drives the process door 170 to rise, thereby transporting the process outer tube 130 from the bottom of the furnace body 120 into the furnace body 120. The annular base 150 is then connected to the housing 110 by screws, so that the process outer tube 130 is connected to the housing 110. The lifting device drives the process door 170 to descend to a position away from the process outer tube 130.

[0067] The specific implementation process of step S20 is as follows: the inner tube introduction assembly 320 is placed on the outer tube introduction assembly 310, wherein the slider 325 extends into the slide groove 314 and slides in cooperation with the slide groove 314, and the bottom surface of the mounting plate 323 is in contact with the top surface of the support ring 311, so that the introduction device 300 switches to the connected state. Next, please refer to Figure 14 The process inner tube 140 is moved so that it fits onto the outer periphery of the positioning ring 3211, and the process inner tube 140 is placed on the inner tube introduction assembly 320. Furthermore, when the slider 325 is located at the first end of the groove 314, please refer to... Figure 15 In section (A), multiple first protrusions 141 on the inner process tube 140 are respectively aligned with multiple notches 1311. Please refer to [the following section]. Figure 16 The lifting device drives the process door 170 to rise, and the first protrusion 141 vertically passes through the corresponding notch 1311, thereby driving the inner process tube 140 from the first transfer port to the inside of the outer process tube 130, until the first protrusion 141 is above the first annular platform 131. The operator then grasps the handle 324 to rotate the inner tube introduction assembly 320 around the central axis of the inner process tube 140, and the slider 325 slides along the groove 314 until it reaches the second end of the groove 314. Please refer to [link / reference needed]. Figure 15 In step (B), at this point, the multiple first protrusions 141 on the inner process tube 140 are aligned with the multiple grooves 1312 one by one. The lifting device then drives the process door 170 to descend, thereby causing the introduction device 300 and the inner process tube 140 to descend vertically until the first protrusions 141 are placed on the corresponding grooves 1312, and the inner process tube 140 is placed on the first annular platform 131. The lifting device continues to drive the process door 170 to descend further away from the outer process tube 130.

[0068] The specific implementation process of step S30 is as follows: Please refer to... Figures 7 to 9Three positioning auxiliary devices 200 are provided and installed sequentially onto the process outer tube 130. Specifically, the installation process of each positioning auxiliary device 200 involves moving the first part 211 of the device into the interior of the process outer tube 130, allowing the positioning post 220 to pass through a mounting hole 134, and then extending the second part 212 to the bottom of the process outer tube 130. Next, the sealing assembly 171 and its connected sealing ring 172 are moved, allowing the sealing assembly 171 to be placed onto the process door 170. The bottom surface of the sealing assembly 171 has multiple mating grooves 1711 spaced around the center line of the sealing ring 172, and these grooves 1711 correspond one-to-one with multiple positioning protrusions 173 protruding from the process door 170. The lifting device drives the process door 170 to rise until the sealing ring 172 moves below and is close to the second part 212. The screws connecting the process door 170 and the support assembly 180 located below the process door 170 are loosened without removing them. The process door 170 is then rotated relative to the support assembly 180 around the central axis of the outer process tube 130. Based on visual observation, the process door 170 is rotated until the second parts 212 of the three positioning auxiliary devices 200 correspond one-to-one with the three clearance slots 1721. The lifting device continues to drive the process door 170 upward, and the second parts 212 of the three positioning auxiliary devices 200 are inserted into the corresponding clearance slots 1721 through their open ends until the second parts 212 abut against the ends of the corresponding clearance slots 1721, at which point the lifting device stops. The screws connecting the process door 170 and the support assembly 180 are then tightened, and the current position of the process door 170 is confirmed as the appropriate closing position.

[0069] The specific implementation process of step S40 is as follows: The lifting device drives the process door 170 to descend vertically away from the process outer tube 130, and the three positioning auxiliary devices 200 are removed from the process outer tube 130 in sequence. Then, the multiple air inlet pipes 160 are installed one-to-one into the multiple mounting holes 134. The lifting device then drives the process door 170 to rise vertically until the sealing assembly 171 is in contact with the bottom surface of the process outer tube 130, at which point the process door 170 reaches the closed position. Thus, in subsequent processes, when the process door 170 moves to this closed position to close the first transmission port, the sealing ring 172 will not collide with the air inlet pipe 160.

[0070] When the aforementioned positioning auxiliary device 200 is not used to determine the closing position, the operator needs to check whether the clearance groove 1721 corresponds to the corresponding air intake pipe 160 through the gap between the process door 170 and the process outer pipe 130 during the process door 170's as it rises, in order to find the closing position. Since the gap between the process door 170 and the process outer pipe 130 gradually decreases as the process door 170 rises, it is difficult for the operator to observe the position where the sealing ring 172 will not collide with the air intake pipe 160, resulting in a long closing time.

[0071] The positioning auxiliary device 200 in this embodiment is designed with a positioning main body 210 and a positioning post 220. The positioning post 220 is used to simulate the air intake pipe 160. The insertion and cooperation relationship between the second part 212 of the positioning main body 210 and the clearance groove 1721 is used to simulate the insertion and cooperation relationship between the air intake pipe 160 and the clearance groove 1721. Since the second part 212 extends below the process outer tube 130, and the second part 212 and the clearance groove 1721 are inserted and engaged outside the process outer tube 130, when the positioning auxiliary device 200 of this embodiment is used to help determine the closing position of the process door 170, the operator can easily observe whether the second part 212 is aligned with the corresponding clearance groove 1721 during step S30. Based on the observation results, the sealing ring 172 can be easily adjusted to the position corresponding to the clearance groove 1721 and the second part 212 (i.e., the position where the sealing ring 172 will not collide with the air inlet pipe 160), which reduces the difficulty of confirming the appropriate closing position of the process door 170, enabling the door to close quickly, shortening the closing time, and improving the closing efficiency.

[0072] It is worth noting that those skilled in the art would typically think of increasing the opening of the clearance groove 1721 to allow the air inlet pipe 160 to easily insert into the corresponding clearance groove 1721 during the closing process, thereby reducing the difficulty of finding the appropriate closing position. However, with this approach, without changing the dimensional parameters of the sealing ring 172, a gap is formed between the clearance groove 1721 of the sealing ring 172 and the corresponding air inlet pipe 160. This causes gas in the process inner tube 140 to easily flow from the notch 1311 to the gap, and then from the gap to below the air inlet pipe 160, thus affecting process quality. Because the positioning auxiliary device 200 of this embodiment is less difficult to use to help determine the closing position of the process door 170, there is no need to increase the opening of the clearance groove 1721. This helps to ensure the shielding effect of the sealing ring 172, effectively reducing the possibility of gas in the process inner tube 140 escaping to below the process inner tube 140 through the gap, thus confining the process gas as much as possible within the reaction chamber, thereby ensuring process quality.

[0073] In some embodiments, please continue reading Figures 7 to 9The clearance groove 1721 includes two parallel groove walls and a groove bottom located between the two groove walls, the groove bottom being an arc surface. In other words, the clearance groove 1721 is a "U"-shaped groove. In this example, as... Figure 5 and Figure 6 As shown, the second part 212 is configured to have along its width direction ( Figure 5 The diagram shows a first mating surface 213 and a second mating surface that are mutually opposed to each other, and an arc-shaped mating surface 214 that connects the first mating surface 213 and the second mating surface. The arc-shaped mating surface 214 is adapted to the arc surface.

[0074] In this embodiment, during the execution of step S30, when the second part 212 is inserted into the corresponding clearance groove 1721 from the open end of the clearance groove 1721, the first mating surface 213 and the second mating surface are respectively attached to the two groove walls, and the lifting device continues to drive the process door 170 to move vertically until the arc-shaped mating surface 214 is attached to the arc surface.

[0075] For example, when the arc-shaped mating surface 214 of the second part 212 is in contact with the arc surface, the center of the arc surface can be concentric with the center of the arc-shaped mating surface 214, and the radius R of both the arc surface and the arc-shaped mating surface 214 is equal to the radius of the horizontal section of the air intake pipe 160. In this example, the bottom of the clearance groove 1721 can be adapted to the outer peripheral surface of the air intake pipe 160. Based on this, by setting the second part 212 to have an arc-shaped mating surface 214 adapted to the arc surface, the arc-shaped mating surface 214 is equivalent to the outer peripheral surface of the air intake pipe 160. With this design, when the positioning auxiliary device 200 determines the closing position, there is no gap between the second part 212 and the corresponding clearance groove 1721 when they are inserted and mated. This helps to ensure that there is no gap between the sealing ring 172 and the air intake pipe 160 when the process door 170 is in the closed position, thereby ensuring the shielding effect of the sealing ring 172.

[0076] In some embodiments, please continue reading Figure 5 and Figure 6 The positioning auxiliary device 200 may further include a limiting member 230, which has a through hole extending through its thickness. The center line of the through hole extends vertically, and a second part 212 passes through the through hole. That is, the limiting member 230 is fitted onto the second part 212. Furthermore, when the positioning post 220 is inserted into the mounting hole 134, the top surface of the limiting member 230 is in contact with the bottom surface of the process outer tube 130.

[0077] The limiting member 230 mentioned in this application can be implemented as a rod-shaped structure, a block-shaped structure, etc. Figure 5 The plate-like structure or other structure shown.

[0078] When using the positioning auxiliary device 200 of this embodiment to help determine the closing position of the process door 170, after moving the first part 211 into the process outer tube 130 and inserting the positioning post 220 into a mounting hole 134, the limiting member 230 is moved to the lower part of the second part 212 and the second part 212 is aligned with the through hole. Then the limiting member 230 is moved vertically upward so that the limiting member 230 is fitted onto the outside of the second part 212 until the top surface of the limiting member 230 is in contact with the bottom surface of the process outer tube 130.

[0079] Since the second part 212 extends to the lower part of the process outer tube 130 when the positioning auxiliary device 200 is installed on the process outer tube 130, the second part 212 is equivalent to a cantilever. In this embodiment, by designing a limiting member 230, the top surface of the limiting member 230 can abut against the bottom surface of the process outer tube 130. The abutment relationship between the two can ensure that the center line of the through hole extends in the vertical direction, thereby ensuring the verticality of the second part 212 inserted into the through hole. When the process door 170 is closed according to the position determined by the positioning auxiliary device 200, it can ensure that the clearance groove 1721 on the sealing ring 172 can cooperate with the vertical air inlet pipe 160.

[0080] As a further optional embodiment, the orthographic projection of the first portion 211 on the top surface of the limiting member 230 does not completely fall into the through hole. In other words, the orthographic projection of the first portion 211 on the top surface of the limiting member 230 does not completely coincide with the through hole. Thus, the first portion 211 cannot pass through the through hole, and the bottom surface of the first portion 211 can restrict the vertical upward displacement of the limiting member 230. With this configuration, when the positioning auxiliary device 200 is installed on the process outer tube 130, the top surface of the limiting member 230 simultaneously abuts against the bottom surface of the process outer tube 130 and the bottom surface of the first portion 211. The bottom surface of the first portion 211 can then serve a positioning function, making it easier to accurately locate the installation position of the limiting member 230.

[0081] For example, according to Figure 5 and Figure 6 In the example shown, the first part 211 is an arc-shaped block. The dimension of the first part 211 in its extending direction is greater than the width W of the second part 212. The shape and size of the second part 212 are adapted to the shape and size of the through hole, so that the first part 211 cannot pass through the through hole. Of course, in other examples of this application, the first part 211 can also be a plate-like structure or other structures.

[0082] In one embodiment of this application, the limiting member 230 is detachably connected to the first part 211. When using the positioning auxiliary device 200 to determine the closing position, after installing the positioning post 220 into the mounting hole 134 and moving the first part 211 into the process outer tube 130, the limiting member 230 is fitted onto the second part 212, so that the top surface of the limiting member 230 and the bottom surface of the first part 211 are in contact with the bottom surface of the process outer tube 130, and then the limiting member 230 is connected to the first part 211. After determining the closing position, the limiting member 230 is disassembled from the first part 211, and the limiting member 230 and the positioning body 210 are removed in sequence. Thus, by using the limiting member 230 to stably connect with the first part 211, it is ensured that the limiting member 230 can guarantee the verticality of the second part 212.

[0083] For example, please refer to Figure 5 The limiting member 230 is threadedly connected to the first part 211 by a screw 240. In other feasible ways, the limiting member 230 and the first part 211 can also be connected by a detachable connection technology such as snap-fit ​​or magnetic connection.

[0084] In some alternative embodiments, the through hole may also be configured to have an interference fit with the second portion 212. In other alternative embodiments, the limiting member 230 may also be threadedly connected to the process outer tube 130 by a screw 240 when it is in contact with the bottom surface of the process outer tube 130.

[0085] In some embodiments, please continue reading Figure 5 , Figure 8 and Figure 9 The positioning auxiliary device 200 also includes a stop portion 250. The positioning post 220 has a first end and a second end along its length direction. The first end is connected to the first part 211, and the second end is fixedly connected to the stop portion 250. Furthermore, the first part 211 has an arc-shaped surface. When the positioning post 220 is inserted into the mounting hole 134, the arc-shaped surface of the first part 211 is in contact with the inner wall of the outer process tube 130, while the stop portion 250 is located outside the outer process tube 130. The contact between the arc-shaped surface and the inner wall of the outer process tube 130 restricts the movement of the positioning post 220 along its length direction towards the outside of the outer process tube 130, while the stop portion 250 restricts the movement of the positioning post 220 along its length direction towards the inside of the outer process tube 130.

[0086] With this design, when the positioning auxiliary device 200 is installed on the process outer tube 130, the positioning column 220 cannot move along its length direction. This helps to avoid the positioning column 220 moving under force when the second part 212 is inserted into the corresponding clearance groove 1721 during the process of using the positioning auxiliary device 200 of this embodiment to help determine the closing position of the process door 170, thereby ensuring the accuracy of the determined closing position.

[0087] Understandably, the stop portion 250 can restrict the movement of the positioning post 220 along its length toward the interior of the process outer tube 130 in ways including but not limited to the following.

[0088] In one feasible manner, when the positioning post 220 is inserted into the mounting hole 134, the stop 250 abuts against the outer peripheral surface of the process outer tube 130, and the outer peripheral surface of the process outer tube 130 can prevent the stop 250 from moving into the process outer tube 130.

[0089] In another feasible approach, please refer to Figure 9 The semiconductor heat treatment apparatus 100 also includes a pressure ring 190, which surrounds the outer periphery of the process outer tube 130 and simultaneously presses against the process outer tube 130, specifically against the second annular platform 132 and the annular base 150. The pressure ring 190 has an opening 191, the center line of which coincides with the center line of the mounting hole 134. When the semiconductor heat treatment apparatus 100 also includes the pressure ring 190, before S30, the pressure ring 190 can also be fitted onto the process outer tube 130. When the positioning post 220 passes through the mounting hole 134, its second end extends out of the process outer tube 130 and into the opening 191. The stop portion 250 is used to abut against the outer peripheral surface of the pressure ring 190, and the outer peripheral surface of the pressure ring 190 can prevent the stop portion 250 from moving into the process outer tube 130.

[0090] Regardless of whether the stop part 250 abuts against the outer peripheral surface of the process outer tube 130 or the outer peripheral surface of the pressure ring 190, the stop part 250 and the second end of the positioning post 220 can be detachably connected or not detachably connected.

[0091] When the stop portion 250 is not detachably connected to the second end, the first end of the positioning post 220 is detachably connected to the first part 211. Using this method, during step S30, the positioning post 220 can be inserted from the outside of the process outer tube 130 into the mounting hole 134, then the first part 211 can be moved into the process outer tube 130, and then the first end can be connected to the first part 211. In this embodiment, the positioning post 220 can be a screw, and the stop portion 250 is the screw head; or, the positioning post 220 can be a bolt, and the stop portion 250 is the bolt head. In the embodiment where the stop portion 250 is a screw head or a bolt head, when the stop portion 250 abuts against the outer circumferential surface of the process outer tube 130, the second end does not extend beyond the mounting hole 134. When the stop portion 250 abuts against the outer circumferential surface of the pressure ring 190, the second end extends from the mounting hole 134 into the opening 191, but does not extend beyond the opening 191.

[0092] When the stop portion 250 is detachably connected to the second end, the connection between the first end and the first part 211 is not limited to a detachable connection, but may also be a non-detachable connection. In general, at least one of the stop portion 250 and the first part 211 is detachably connected to the positioning post 220.

[0093] Taking the non-detachable connection between the first end and the first part 211 as an example, when the positioning auxiliary device 200 determines the appropriate closing position of the process door 170, the connected positioning post 220 and positioning body 210 can be moved so that the positioning post 220 and the first part 211 are moved into the process outer tube 130, and the positioning post 220 is aligned with a mounting hole 134. Then, the positioning post 220 is moved horizontally so that it passes through the process outer tube 130 into the mounting hole 134 until the arc-shaped surface of the first part 211 abuts against the inner wall of the process outer tube 130. Then, the stop part 250 is connected to the second end outside the process outer tube 130. As disclosed in this document, the positioning auxiliary device 200 can be used to connect the first end and the first part 211 by bonding or welding. Or, as Figure 5 and Figure 6 As shown, the positioning body 210 and the positioning post 220 are integrally formed. In this way, on the one hand, it is beneficial to eliminate the assembly process of the first end and the first part 211, thereby improving the efficiency of confirming the door closing position; on the other hand, it is beneficial to improve the structural strength of the positioning auxiliary device 200 without increasing costs.

[0094] Taking the first end and the first part 211 as detachably connected as an example, when the positioning auxiliary device 200 determines the appropriate closing position of the process door 170, the positioning post 220 can be inserted from inside the process outer tube 130 into the mounting hole 134, or the positioning post 220 can be inserted from outside the process outer tube 130 into the mounting hole 134, making the installation method flexible.

[0095] The connection between the stop 250 and the second end can be implemented as any one of snap-fit, threaded connection, or magnetic connection. Please refer to... Figure 5 and Figure 10In a specific example of this application, the stop portion 250 is a nut, and the outer circumferential surface of the second end is provided with an external thread that mates with the nut. The nut is threadedly connected to the second end, making disassembly and assembly convenient and reducing the time required to confirm the closed position. It should be noted that in the embodiment where the stop portion 250 is a nut, when the stop portion 250 abuts against the outer circumferential surface of the process outer tube 130, the second end extends out of the process outer tube 130 through the mounting hole 134 to connect with the nut. The outer diameter of the nut is larger than the diameter of the mounting hole 134, preventing the nut from abutting against the outer circumferential surface of the process outer tube 130 through the mounting hole 134. When the stop portion 250 abuts against the outer circumferential surface of the pressure ring 190, the second end extends out of the pressure ring 190 sequentially through the mounting hole 134 and the opening 191 to connect with the nut. The outer diameter of the nut is larger than the diameters of the mounting hole 134 and the opening 191, preventing the nut from abutting against the outer circumferential surface of the pressure ring 190 through the opening 191.

[0096] The positioning aid device 200 disclosed herein may be made of materials such as resin, plastic, or ceramic, and this application does not impose specific limitations on this.

[0097] It is understood that the above embodiments are merely exemplary implementations used to illustrate the principles of this utility model, and the utility model is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of this utility model, and these modifications and improvements are also considered to be within the protection scope of this utility model.

Claims

1. A positioning auxiliary device for assisting in determining the closed position of a process door of a semiconductor heat treatment apparatus, wherein the process outer tube of the semiconductor heat treatment apparatus has a mounting hole on its side wall, an air inlet pipe of the semiconductor heat treatment apparatus extends from the outside of the process outer tube through the mounting hole into the inside of the process outer tube, a sealing ring is provided on the process door, the sealing ring has a clearance groove, the opening end of the clearance groove extends vertically downward from the top surface of the sealing ring to its end end, and when the process door is in the closed position, the sealing ring is located inside the process outer tube, and a portion of the air inlet pipe is inserted into the clearance groove; characterized in that... The positioning auxiliary device includes: a positioning body and a positioning column. The positioning body has a first part and a second part located below the first part and connected to the first part. The positioning column is fixedly connected to the first part. The first part is used to extend into the interior of the process outer tube, the positioning post is used to pass through the mounting hole of the process outer tube, the second part is used to extend from the bottom end of the process outer tube to the outside of the process outer tube, and the second part can be inserted into or disengaged from the clearance groove.

2. The positioning auxiliary device according to claim 1, characterized in that, The clearance groove includes two parallel groove walls and a groove bottom located between the two groove walls, wherein the groove bottom is an arc surface; The second part is configured to have a first mating surface and a second mating surface that are opposite to each other along its width direction, and an arc-shaped mating surface connecting the first mating surface and the second mating surface. The first mating surface and the second mating surface are respectively used to fit against the two groove walls, and the arc-shaped mating surface is used to adapt to and fit against the arc surface.

3. The positioning auxiliary device according to claim 1, characterized in that, It also includes a limiting member, the top surface of which is used to fit against the bottom surface of the process outer tube. The limiting member is provided with a through hole that penetrates its thickness. The center line of the through hole extends in the vertical direction, and the second part passes through the through hole.

4. The positioning auxiliary device according to claim 3, characterized in that, The orthographic projection of the first part on the top surface of the limiting member does not fall completely into the through hole, and the top surface of the limiting member abuts against the first part.

5. The positioning auxiliary device according to claim 4, characterized in that, The limiting member is detachably connected to the first part.

6. The positioning auxiliary device according to claim 1, characterized in that, It also includes a stop portion, wherein the positioning post has a first end and a second end along its length direction, the first end being connected to the first portion, and the second end being fixedly connected to the stop portion; the first portion has an arc-shaped surface; when the positioning post passes through the mounting hole, the arc-shaped surface is used to abut against the inner wall of the outer process tube, and the stop portion is located outside the outer process tube and is used to restrict the movement of the positioning post along its length direction toward the inside of the outer process tube.

7. The positioning auxiliary device according to claim 6, characterized in that, The stop portion is used to abut against the outer circumferential surface of the process outer tube when the positioning post passes through the mounting hole; Alternatively, the semiconductor heat treatment equipment may further include a pressure ring, which surrounds the outer periphery of the process outer tube and presses against the process outer tube. The pressure ring has an opening, the center line of which coincides with the center line of the mounting hole. The second end is used to extend out of the process outer tube and into the opening when the positioning post passes through the mounting hole. The stop portion is used to abut against the outer peripheral surface of the pressure ring.

8. The positioning auxiliary device according to claim 7, characterized in that, At least one of the stop portion and the first portion is detachably connected to the positioning post.

9. The positioning auxiliary device according to claim 8, characterized in that, The stop portion is detachably connected to the second end, and the positioning body is integrally formed with the positioning post.

10. The positioning auxiliary device according to claim 9, characterized in that, The second end is used to extend out of the mounting hole when the positioning post passes through the mounting hole. The stop part is a nut, which is threadedly connected to the second end. The outer diameter of the nut is configured to be larger than the diameter of the mounting hole.

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