Gas spray header and chemical vapor deposition device

Abstract

The utility model provides a gas spray header and a chemical vapor deposition device, and relates to the technical field of semiconductor device equipment. A gas spray head comprises a shell, a gas inlet channel, a gas uniformizing plate, a shower plate and a first heating part. A gas diffusion chamber is arranged in the shell; the gas inlet channel is arranged at one end of the shell and is communicated with the gas diffusion chamber; the gas uniformizing plate is arranged in the gas diffusion chamber, and a plurality of gas uniformizing holes penetrating through the gas uniformizing plate are formed in the gas uniformizing plate; the shower plate is arranged at the other end, opposite to the air inlet channel, of the shell and provided with a plurality of spraying holes, and the spraying holes communicate with the interior and the exterior of the air diffusion chamber. The first heating part is arranged on the wall of the shell so as to heat the wall body of the gas diffusion chamber; by arranging the first heating part on the wall of the shell, the wall body of the gas diffusion chamber can be heated, so that the problem that the temperature is suddenly reduced when gas enters the spraying head can be relieved, the uniformity of the film thickness is improved, the granularity is reduced, and the production quality and the production efficiency are improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor device equipment technology, specifically to a gas spray head and a chemical vapor deposition apparatus. Background Technology

[0002] Integrated circuit manufacturing processes involve the deposition of multilayer materials using various technologies. Among these, Chemical Vapor Deposition (CVD) is a crucial step in the process of depositing materials on semiconductor substrates. CVD utilizes the reaction of gaseous or vaporous substances at the gas-phase or gas-solid interface to generate solid deposits. With technological advancements and process miniaturization, the requirements for film deposition are becoming increasingly stringent. Existing methods often result in a sharp temperature drop when the gas passes through the spray nozzle, which can easily lead to problems with film thickness uniformity. Utility Model Content

[0003] In view of the problems existing in the prior art, the present invention provides a gas spray head and a chemical vapor deposition device to improve the situation where the temperature of the gas drops sharply when passing through the spray head, resulting in problems with the uniformity of film thickness.

[0004] To achieve the above and other related objectives, the first aspect of this utility model provides a gas spray head, including a housing, an air inlet channel, an air distribution plate, a spray nozzle, and a first heating element. A gas diffusion chamber is disposed within the housing; the air inlet channel is located at one end of the housing and communicates with the gas diffusion chamber; the air distribution plate is disposed within the gas diffusion chamber and has a plurality of air distribution holes penetrating the plate; the spray nozzle is located at the other end of the housing opposite to the air inlet channel and has a plurality of spray holes communicating with the inside and outside of the gas diffusion chamber; the first heating element is disposed on the wall of the housing to heat the wall of the gas diffusion chamber.

[0005] In one embodiment of the present invention, the first heating part includes a plurality of heating zones, which are arranged sequentially from the center of the gas diffusion chamber to the outer periphery of the gas diffusion chamber.

[0006] In one embodiment of this utility model, the heating zone is an annular heating zone, and there is a gap between adjacent heating zones; the working temperatures of the plurality of heating zones are independent.

[0007] In one embodiment of this utility model, the heating zone near the central axis of the gas diffusion chamber is a first heating zone, and a through hole is provided on the first heating zone, the diameter of which is not less than the diameter of the air inlet channel.

[0008] In one embodiment of the present invention, the first heating zone includes two heating elements, each of which is semi-circular, and the two heating elements overlap to form the first heating zone.

[0009] In one embodiment of the present invention, the first heating part is disposed on the outer wall of the housing away from the shower plate; the gas spray head further includes a second heating part, which is disposed on the side wall of the housing.

[0010] In one embodiment of the present invention, the second heating part includes a heating coil that surrounds the side wall of the housing, and a heating water channel is provided inside the heating coil along the circumference of the heating coil.

[0011] In one embodiment of the present invention, the gas spray head further includes: a plurality of gas outlet channels, one end of which is connected to the gas inlet channel and the other end of which is connected to the gas diffusion chamber.

[0012] In one embodiment of this utility model, a plurality of the gas outlet channels are arranged in a circumferential array around the central axis of the gas diffusion chamber.

[0013] In one embodiment of this utility model, the axis of the air intake channel coincides with the central axis of the gas diffusion chamber.

[0014] A second aspect of this invention provides a chemical vapor deposition apparatus, comprising the gas spray head described in any one of the above-mentioned methods.

[0015] In combination with existing technologies, the beneficial effects of this utility model are as follows:

[0016] Existing gas technologies suffer from a sharp temperature drop when flowing through a spray head, leading to uneven film thickness or particle formation, thus impacting production efficiency. This invention addresses this issue by introducing gas into a gas diffusion chamber via an inlet channel. The gas is then dispersed to the other end of the diffusion chamber by a gas equalization plate, and finally flows out of the spray head via a showerhead. By incorporating a first heating element on the casing wall, the wall of the gas diffusion chamber is heated, thereby reducing the temperature difference between the gas entering the spray head and the chamber wall. This mitigates the problem of a sudden temperature drop upon gas entry, improving film thickness uniformity, reducing particle size, and ultimately enhancing production quality and efficiency. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other embodiments can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a perspective view of one embodiment of the gas spray head of this utility model;

[0019] Figure 2 This is a top view of one embodiment of the gas spray head of this utility model;

[0020] Figure 3 for Figure 2 Sectional view along direction AA;

[0021] Figure 4 This is a bottom view of one embodiment of the gas spray head of this utility model;

[0022] Figure 5 This is a bottom view of the shell structure in one embodiment of the gas spray head of this utility model;

[0023] Figure 6 This is a schematic diagram of the first heating zone structure in one embodiment of the gas spray head of this utility model.

[0024] Component designation explanation:

[0025] 100. Shell; 110. Gas diffusion chamber; 120. Overlapping part;

[0026] 200. Air intake passage;

[0027] 300. Air distribution plate; 310. Air distribution holes;

[0028] 400. Shower head panel; 410. Spray nozzle;

[0029] 500, First heating section; 510, Heating zone; 511, First heating zone; 512, Through hole; 513, Heating element; 5131, Overlapping step;

[0030] 600, Second heating section; 610, Heating coil; 611, Heating water channel; 612, First groove; 613, Second groove;

[0031] 700. Vent passage. Detailed Implementation

[0032] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model. It should be noted that, in the absence of conflict, the following embodiments and features in the embodiments can be combined with each other. It should also be understood that the terminology used in the embodiments of this utility model is for describing specific implementation schemes and not for limiting the scope of protection of this utility model. Test methods in the following embodiments that do not specify specific conditions are generally performed under conventional conditions or according to the conditions recommended by the respective manufacturers.

[0033] When numerical ranges are given in the embodiments, it should be understood that, unless otherwise specified in this invention, both endpoints of each numerical range and any value between the two endpoints may be selected. Unless otherwise defined, all technical and scientific terms used in this invention, as well as the prior art known to those skilled in the art and the description of this invention, may be implemented using any prior art methods, equipment, and materials similar to or equivalent to those in the embodiments of this invention.

[0034] It should be noted that the terms such as "upper", "lower", "left", "right", "middle" and "one" used in this specification are only for clarity of description and are not intended to limit the scope of implementation of this utility model. Changes or adjustments to their relative relationships, without substantially altering the technical content, should also be considered as within the scope of implementation of this utility model.

[0035] As semiconductor manufacturing processes shrink, the required film thickness is getting thinner and the uniformity is getting better. Existing reactive gases are vaporized at high temperatures after being heated by the gas box, and the temperature drops sharply when they enter the spray head, which can easily lead to problems such as uneven film thickness or particles, and can only maintain low production efficiency.

[0036] In view of this, the present invention provides a gas spray head and a chemical vapor deposition apparatus. By setting a first heating part 500 on the gas spray head to heat the wall of the gas diffusion chamber 110, the temperature difference between the gas entering the spray head and the wall of the gas diffusion chamber 110 is reduced, thereby alleviating the problem of a sharp drop in temperature after the reaction gas enters the spray head, thereby improving the uniformity of film thickness, reducing particles, and improving production efficiency.

[0037] Please see Figures 1 to 6The first aspect of this utility model provides a gas spray head, including a housing 100, an air inlet channel 200, a gas equalization plate 300, a shower plate 400, and a first heating part 500. A gas diffusion chamber 110 is provided inside the housing 100 to allow the reaction gas to pass evenly through the spray head. The air inlet channel 200 is located at one end of the housing 100 and communicates with the gas diffusion chamber 110, allowing the reaction gas to enter the gas diffusion chamber 110 after being heated and vaporized at high temperature by a gas box. The gas equalization plate 300 is located inside the gas diffusion chamber 110 and has a plurality of gas equalization holes 310 penetrating through it. The gas equalization plate 300 is positioned between the shower plate 400 and the air inlet channel 200, so that the gas in the gas diffusion chamber 110 is first dispersed by the gas equalization plate 300, improving uniformity. A shower head 400 is disposed at the other end of the housing 100 opposite to the air inlet channel 200. The shower head 400 has several spray holes 410, which connect the inside and outside of the gas diffusion chamber 110, allowing the reactant gas to enter and deposit within the chamber. A first heating element 500 is disposed on the wall of the housing 100 to heat the wall of the gas diffusion chamber 110, thereby affecting the ambient temperature of the chamber. By heating the wall of the gas diffusion chamber 110 through the first heating element 500, the temperature difference between the reactant gas entering the chamber and the ambient temperature within the chamber is reduced, alleviating the problem of a sharp temperature drop upon the reactant gas entering the chamber. This improves the uniformity of the film, reduces particles, and enhances production efficiency and quality.

[0038] In one embodiment, the gas diffusion chamber 110 can be a cylindrical chamber, a cuboid chamber, or a chamber of other shapes. Preferably, the gas diffusion chamber 110 is a cylindrical chamber with a circular cross-section, which is more conducive to the uniform diffusion of the reactant gas and improves the uniformity of the reactant gas after flowing through the gas diffusion chamber 110.

[0039] In one embodiment, the axis of the air intake channel 200 coincides with the central axis of the gas diffusion chamber 110. The reaction gas enters the gas diffusion chamber 110 through the air intake channel 200. The air intake channel 200 is located at the center of one end of the gas diffusion chamber 110. The reaction gas diffuses evenly from the air intake channel 200 to the outer periphery, which is more conducive to improving the uniformity of the reaction gas temperature.

[0040] In one embodiment, the first heating unit 500 is an aluminum block heater. By installing the aluminum block heater on the back of the housing 100 away from the shower plate 400, the temperature of the housing 100 is controlled, thereby controlling the temperature within the gas diffusion chamber 110 and improving the temperature uniformity within the gas diffusion chamber 110. The controllable temperature range of the aluminum block heater can be selected according to actual needs, such as 0–250°C, 0–300°C, 0–200°C, 50–250°C, etc.

[0041] Please see Figures 1 to 3 In one embodiment, the first heating unit 500 includes a plurality of heating zones 510, which are arranged sequentially from the center of the gas diffusion chamber 110 to its outer periphery. By setting a plurality of heating zones 510, different areas of the gas diffusion chamber 110 can be individually temperature-controlled, making the temperature of the reacting gas in the gas diffusion chamber 110 more uniform and improving the uniformity of the film. By setting a plurality of heating zones 510, the heating zones 510 can be individually adjusted according to the feedback of the finished film quality, thereby obtaining better results and improving the finished film quality. The number of heating zones 510 can be selected according to actual needs. For example, if higher temperature control accuracy is required, a larger number of heating zones 510 can be set; if the temperature control accuracy requirement is general, a certain number of heating zones 510 can be set as needed, such as 2, 3, 4, or 5 heating zones. In another embodiment, the first heating unit 500 may also include only one heating zone 510, which is sufficient to achieve temperature control within the gas diffusion chamber 110.

[0042] Please see Figures 1 to 3In one embodiment, the heating zone 510 is an annular heating zone 510. Taking the gas diffusion chamber 110 as a cylindrical cavity as an example, several annular heating zones 510 are arranged along the radial direction of the gas diffusion chamber 110. The center phases of several annular heating zones 510 all fall on the central axis of the gas diffusion chamber 110. When the reactant gas diffuses to the outer periphery, the temperature of the reactant gas on the circumference with the central axis of the gas diffusion chamber 110 as the center is basically the same. The reactant gas at different distances from the central axis of the gas diffusion chamber 110 diffuses for different times in the gas diffusion chamber 110. During the diffusion process, the temperature continues to decrease, which leads to different temperatures of the reactant gas in different regions. This further leads to different wall temperatures in different regions of the gas diffusion chamber 110. The different wall temperatures in different regions will affect the heat transfer rate between the reactant gas and the wall of the gas diffusion chamber 110. Meanwhile, the gas diffusion chamber 110 maintains constant heat exchange with the outside environment. A larger contact area between the outer periphery of the gas diffusion chamber 110 and the outside environment leads to faster heat dissipation, thereby increasing the temperature difference between different areas of the gas diffusion chamber 110 and further affecting the temperature of the reacting gas in each area within the gas diffusion chamber 110. The combined effect of these factors results in different temperatures of the reacting gas at different distances from the central axis of the gas diffusion chamber 110. The annular heating zone 510 is more conducive to temperature control of different annular areas of the gas diffusion chamber 110, thereby controlling the temperature difference between the reacting gas and the wall of the gas diffusion chamber 110 in different annular areas as needed, and thus controlling the heat transfer rate of the reacting gas in different areas, thereby controlling the temperature of the reacting gas in different areas. The operating temperatures of the various heating zones 510 are independent, meaning that the heating temperatures of different heating zones 510 can be different, which helps to ensure a consistent temperature of the reacting gas within the gas diffusion chamber 110, thereby improving the uniformity of the film and reducing the occurrence of particles.

[0043] Please see Figure 2 and Figure 3 In one embodiment, a gap is provided between adjacent heating zones 510. By setting the gap, mutual interference between adjacent heating zones 510 can be reduced, thereby facilitating more precise temperature control and effectively improving the temperature control effect. The size of the gap between adjacent heating zones 510 is selected and determined according to actual needs, and this application does not limit it.

[0044] Please see Figure 3 and Figure 6 In one embodiment, the heating zone 510 near the central axis of the gas diffusion chamber 110 is a first heating zone 511. The first heating zone 511 is provided with a through hole 512. The diameter of the through hole 512 is not less than the diameter of the air inlet channel 200, so as to accommodate the reaction gas to enter the gas diffusion chamber 110 through the air inlet channel 200.

[0045] Please see Figure 6In one embodiment, the first heating zone 511 includes two heating elements 513, each of which is semi-circular. The two heating elements 513 overlap to form the first heating zone 511. By using the two semi-circular heating elements 513 to overlap, other structures at the air intake channel 200 can be avoided. When there are other structures with larger dimensions at the air intake channel 200, the semi-circular heating element 513 can be directly installed at the air intake channel 200 without the need for other structures to penetrate the through hole 512. This can adapt to different structures at the air intake channel 200 and prevent the diameter of the through hole 512 from being too large, reducing the heating range and affecting the temperature control effect.

[0046] Please see Figure 6 Furthermore, the connecting ends of the two semi-annular heating elements 513 are provided with matching overlapping steps 5131. The overlapping of the two semi-annular heating elements 513 is achieved through the overlapping of the overlapping steps 5131.

[0047] Please see Figures 1 to 3 In one embodiment, the first heating element 500 is disposed on the outer wall of the housing 100 away from the shower head plate 400, that is, the first heating element 500 is disposed on the outer wall of the housing 100 at the end where the air inlet channel 200 is provided. The first heating element 500 heats the wall of the housing 100, thereby controlling the temperature inside the gas diffusion chamber 110. In another embodiment, the first heating element 500 is disposed on the inner wall of the housing 100 away from the shower head plate 400, so that the temperature of each area inside the gas diffusion chamber 110 can be adjusted more directly, improving the accuracy and effect of temperature control.

[0048] Please see Figure 3 In one embodiment, the gas spray head further includes a second heating section 600 disposed on the side wall of the housing 100. The first heating section 500 heats the end wall of the housing 100, thereby adjusting the temperature of the end wall of the gas diffusion chamber 110. By providing the second heating section 600 on the side wall of the housing 100, the peripheral side wall of the housing 100 can be heated to adjust the temperature of the outer periphery of the gas diffusion chamber 110, thereby improving the uniformity and consistency of the temperature of the reacting gas in the gas diffusion chamber 110.

[0049] Please see Figure 3 In one embodiment, the second heating part 600 includes a heating coil 610, which surrounds the side wall of the housing 100. The heating coil 610 includes, but is not limited to, metal materials, such as aluminum, iron, copper, etc., and preferably aluminum heating coil 610.

[0050] Please see Figure 3In one embodiment, a heating water channel 611 is provided within the heating coil 610, arranged circumferentially around the heating coil 610. Heated water flows within the heating water channel 611 to maintain the temperature stability of the heating coil 610, thereby ensuring the stability of the sidewall temperature of the housing 100. The cross-section of the heating water channel 611 can be circular, rectangular, or elliptical, etc.

[0051] In one embodiment, a spray head is mounted above the reaction chamber so that the reaction gas enters the reaction chamber through a spray hole 410. A first overlapping portion 120 is provided on the outer periphery of the housing 100, extending outward to facilitate the assembly of the spray head onto the reaction chamber. A second heating portion 600 abuts against the bottom of the overlapping portion 120 and against the side wall of the housing 100, thereby facilitating heating of the side wall of the housing 100.

[0052] Please see Figure 3 Furthermore, a first groove 612 is provided on the side of the second heating part 600 that abuts against the overlapping part 120. The first groove 612 contains a first sealing ring to seal the second heating part 600 and the overlapping part 120.

[0053] Please see Figure 3 Furthermore, a second groove 613 is provided on the side of the second heating part 600 away from the overlapping part 120. The second groove 613 contains a second sealing ring. The second heating part 600 presses against the reaction chamber wall. Through the second sealing ring and the second groove 613, the second heating part 600 and the reaction chamber wall can be sealed, thereby improving the sealing performance of the reaction chamber.

[0054] In one embodiment, the second heating part 600 presses against one side of the side wall of the housing 100 and extends away from the overlapping part 120 until it is flush with the bottom of the side wall of the housing 100, so as to ensure the heating effect of the second heating part 600 on the side wall of the housing 100 and improve the temperature uniformity in the gas diffusion chamber 110.

[0055] Please see Figure 3 and Figure 5 In one embodiment, the gas spray head further includes multiple air outlet channels 700, one end of which is connected to the air inlet channel 200, and the other end of which is connected to the gas diffusion chamber 110. Both the air inlet channel 200 and the air outlet channels 700 are located on the end wall of the housing 100 away from the shower plate 400. By increasing the number of air outlet channels 700, the uniformity of gas diffusion can be optimized. Compared to the existing single air inlet channel 200 directly connecting to the gas diffusion chamber 110, having multiple air outlet channels 700 connected at one end to the air inlet channel 200 and the other end connected to the gas diffusion chamber 110 allows for the input of reactant gases at multiple points within the gas diffusion chamber 110, which is more conducive to the diffusion of reactant gases throughout the entire gas diffusion chamber 110.

[0056] Please see Figure 3 In one embodiment, the outlet channel 700 is inclined and slopes from the middle of the gas diffusion chamber 110 toward the outside of the gas diffusion chamber 110 along the direction from the inlet channel 200 to the gas equalization plate 300. The inlet channel 200 is disposed on the wall of the housing 100. The distance between the outlet of the inlet channel 200 and the central axis of the gas diffusion chamber 110 is less than the distance between the outlet of the inlet channel 200 and the outer periphery of the gas diffusion chamber 110. The inclined arrangement of the outlet channel 700 is more conducive to the diffusion of the reactant gas to the outer periphery of the gas diffusion chamber 110, thereby improving the uniformity of the diffusion of the reactant gas in the gas diffusion chamber 110, and thus improving the uniformity of the film thickness.

[0057] Please see Figure 3 and Figure 5 In one embodiment, a plurality of the gas outlet channels 700 are arranged in a circumferential array around the central axis of the gas diffusion chamber 110. The gas outlet speed of the plurality of gas outlet channels 700 is the same, and the distance between the gas outlet of the gas outlet channel 700 and the central axis of the gas diffusion chamber 110 is the same. This can improve the uniformity of the diffusion of the reactant gas in the gas diffusion chamber 110, thereby improving the uniformity of the film thickness.

[0058] Please see Figure 5 In one embodiment, the outlets of the multiple air outlet channels 700 are evenly arranged on a circle with a point on the central axis of the gas diffusion chamber 110 as the center. The diameter of the circle is selected according to actual needs, such as 50mm, 60mm, 70mm, etc.

[0059] Please see Figure 3 and Figure 4 In one embodiment, the gas equalization plate 300 and the shower plate 400 are arranged parallel to each other. The central axis of the gas diffusion chamber 110 is perpendicular to both the gas equalization plate 300 and the shower plate 400. Along the central axis of the gas diffusion chamber 110, the gas equalization holes 310 and the spray holes 410 are staggered. The staggered distribution of the gas equalization holes 310 and the spray holes 410 can be partial or complete. The reactant gas enters the space between the gas equalization plate 300 and the shower plate 400 through the gas equalization holes 310, and then enters the reaction chamber through the spray holes 410, further improving the diffusion uniformity of the reactant gas in the gas diffusion chamber 110, thereby improving the uniformity of the membrane.

[0060] A second aspect of this invention provides a chemical vapor deposition (CVD) apparatus, including the gas spray head described in any one of the above descriptions. The CVD apparatus includes a reaction chamber, and the gas spray head is mounted above the reaction chamber so that the reaction gas enters the reaction chamber through a spray hole 410. The CVD apparatus also includes other components; please refer to existing CVD apparatuses, which will not be described in detail here.

[0061] The gas spray head provided by this utility model, by setting multiple heating zones 510, can control the temperature of the wall of the gas diffusion chamber 110, thereby alleviating the problem of poor membrane uniformity caused by a sharp drop in gas temperature. It can also reduce particle generation, thus lowering the maintenance frequency of the gas spray head and extending the maintenance frequency of the reaction chamber. By setting multiple gas outlet channels 700, the diffusion efficiency and uniformity of the gas can be effectively improved, thereby improving membrane uniformity, product quality, and production efficiency. Therefore, this utility model effectively overcomes some practical problems in the prior art and has high utilization value and practical significance.

[0062] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.

Claims

1. A gas spray head, characterized in that, include: The shell contains a gas diffusion chamber. An air intake channel is provided at one end of the housing, and the air intake channel is connected to the gas diffusion chamber; A gas equalization plate is disposed in the gas diffusion chamber, and the gas equalization plate is provided with a plurality of gas equalization holes penetrating the gas equalization plate. A shower head is disposed at the other end of the housing relative to the air intake channel. The shower head is provided with a plurality of spray holes, which connect the gas diffusion chamber to the outside. A first heating element is disposed on the wall of the housing to heat the wall of the gas diffusion chamber.

2. The gas spray head according to claim 1, characterized in that, The first heating section includes several heating zones, which are arranged sequentially from the center of the gas diffusion chamber to the outer periphery of the gas diffusion chamber.

3. The gas spray head according to claim 2, characterized in that, The heating zone is an annular heating zone, and there are gaps between adjacent heating zones; the operating temperatures of the heating zones are independent.

4. The gas spray head according to claim 2, characterized in that, The heating zone near the central axis of the gas diffusion chamber is the first heating zone. The first heating zone is provided with a through hole, the diameter of which is not less than the diameter of the air inlet channel.

5. The gas spray head according to claim 4, characterized in that, The first heating zone includes two heating elements, each of which is semi-circular, and the two heating elements overlap to form the first heating zone.

6. The gas spray head according to claim 1, characterized in that, The first heating element is disposed on the outer wall of the housing away from the shower head; the gas spray head further includes: The second heating element is disposed on the side wall of the housing.

7. The gas spray head according to claim 6, characterized in that, The second heating part includes a heating coil that surrounds the side wall of the housing, and a heating water channel is provided inside the heating coil along the circumference of the heating coil.

8. The gas spray head according to claim 1, characterized in that, The gas spray head also includes: Multiple air outlet channels are provided, with one end of each channel connected to the air inlet channel and the other end connected to the gas diffusion chamber.

9. The gas spray head according to claim 8, characterized in that, The multiple gas outlet channels are arranged in a circular array around the central axis of the gas diffusion chamber.

10. The gas spray head according to claim 8, characterized in that, The axis of the air intake channel coincides with the central axis of the gas diffusion chamber.

11. A chemical vapor deposition apparatus, characterized in that, Includes the gas spray head according to any one of claims 1 to 10.

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