Target table for magnetron sputtering medium-high-resistance target material

Abstract

The utility model belongs to the technical field of target tables, and particularly relates to a target table for magnetron sputtering medium-high resistance target materials, which comprises a target table main body, a plug is arranged on the left side of the target table main body, a connector is inserted on the outer side of the plug, a fixing block is fixedly connected on the left side of the target table main body, and the fixing block is in contact with the connector. The outer side of the fixing block is rotationally connected with a limiting sleeve, and the outer side of the fixing block is fixedly connected with a protruding block. According to the utility model, components such as the fixing block, the limiting sleeve and the positioning plate are arranged, so that when the connector is plugged with the plug, the limiting sleeve is rotated to enable the limiting sleeve and the connector to generate threaded motion, and the limiting sleeve plays a role in limiting the connector, namely, the connector and the plug can be kept stable when being plugged with each other; the target table solves the problems that when the target table for the high-resistance target material in magnetron sputtering is used, insertion connection between a connector and a plug is not stable, and the phenomenon that the connector falls off easily is caused.

Description

TECHNICAL FIELD

[0001] The utility model relates to target table technical field, concretely is a target table for high resistance target material in magnetron sputtering. BACKGROUND

[0002] In the application scene (such as sputtering film coating etc.) involving high resistance target material, target table mainly plays the role of supporting and fixing high resistance target material. When carrying out physical vapor deposition process etc., for example, sputtering process, ions will impact high resistance target material, so that target material atom is sputtered and deposited on substrate to form thin film. Target table can ensure that target material is stably placed in this process, so that it can accurately receive the impact of ion beam, and ensure that the atom sputtered is deposited in the expected direction. At the same time, the part of connecting circuit of target table can be connected with power supply and other equipment, to provide suitable electric environment for sputtering process.

[0003] And the target table for high resistance target material in magnetron sputtering is unstable in the use of connecting head and plug, which can easily cause the connecting head to fall off. UTILITY MODEL CONTENT

[0004] The utility model discloses a target table for high resistance target material in magnetron sputtering, solve the problem that the target table for high resistance target material in magnetron sputtering is unstable in the use of connecting head and plug, which can easily cause the connecting head to fall off.

[0005] To achieve the above object, the utility model provides the following technical scheme: a target table for high resistance target material in magnetron sputtering, including target table main part, the left side of target table main part is provided with the plug, the outside of plug is inserted and is connected with the connecting head, the left side of target table main part is fixedly connected with fixed block, and the fixed block is in contact with connecting head, the outside of fixed block is rotatably connected with the limit bushing, the outside of fixed block is fixedly connected with the protruding block, the left side of target table main part is fixedly connected with the positioning rod, the outside of connecting head is fixedly connected with the positioning plate, the left side of target table main part is fixedly connected with the fixed plate, and the fixed plate is provided with the limiting mechanism.

[0006] Preferably, the limit bushing is in contact with the target table main part, and the limit bushing is connected with the connecting head through threads, and the limit bushing can limit the connecting head through the design of the limit bushing.

[0007] Preferably, the limit bushing is in contact with the target table main part, and the limit bushing is connected with the connecting head through threads, and the limit bushing can limit the connecting head through the design of the limit bushing.

[0008] Preferably, the limit bushing is in contact with the target table main part, and the limit bushing is connected with the connecting head through threads, and the limit bushing can limit the connecting head through the design of the limit bushing.

[0009] Preferably, the limiting mechanism includes a sleeve, with the upper end of the fixed plate fixedly connected to the sleeve. A sliding rod is slidably connected inside the sleeve, and a limiting plate is fixedly connected to the upper end of the sliding rod. The limiting plate contacts the target body and the limiting sleeve. A limiting block is fixedly connected to the side of the limiting plate near the limiting sleeve. A limiting groove is formed inside the limiting sleeve, and a limiting block is slidably connected inside the limiting groove. A spring is provided inside the sleeve. By releasing the limiting plate, the spring force can drive the sliding rod to move, causing the sliding rod to move the limiting plate, which in turn moves the limiting block. The limiting block slides into the limiting groove on the limiting sleeve, thus limiting the limiting plate against the limiting sleeve. This ensures that the limiting sleeve remains stable when limiting the connector, thereby ensuring stable connection between the connector and the plug.

[0010] Preferably, a limiting ring is fixedly connected inside the sleeve, and the limiting ring is slidably connected to the slide rod. Through the design of the limiting ring, the slide rod can be limited.

[0011] Preferably, one end of the spring contacts the sleeve, and the other end of the spring contacts the slide rod. Through the design of the spring, the limiting plate can be driven to limit the limiting sleeve.

[0012] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0013] 1. This utility model, by setting up components such as a fixing block, a limiting sleeve, and a positioning plate, allows the limiting sleeve to rotate and cause threaded movement between the limiting sleeve and the connector when the connector is plugged in. This limits the connection of the connector and ensures stability during the plugging and connection process. This solves the problem of unstable plugging and connection of the connector and connector when using a target stage for high-resistivity targets in magnetron sputtering, which can easily lead to the connector falling off.

[0014] 2. This utility model, by setting up components such as a limiting plate, a limiting block, and a spring, can drive the limiting plate to move through the elastic force of the spring, so that the limiting plate drives the limiting block to slide into the limiting groove on the limiting sleeve, thereby limiting the limiting sleeve and keeping it stable when the limiting sleeve limits the connector, thus keeping the connector stable when it is plugged in. Attached Figure Description

[0015] Figure 1 This is a three-dimensional view of the overall structure of this utility model;

[0016] Figure 2 For the present utility model Figure 1 A three-dimensional view of the local structure;

[0017] Figure 3 For the present utility model Figure 1 A partial structural front sectional view;

[0018] Figure 4 The utility model discloses a Figure 3 The structure of A part in the utility model is enlarged.

[0019] In the figure: 1, target table main body;2, plug;3, connecting head;4, fixed block;41, limit cover;42, protruding block;43, ring groove;44, positioning rod;45, positioning plate;5, fixed plate;6, limiting mechanism;61, sleeve;62, sliding rod;63, limiting plate;64, limiting block;65, limiting groove;66, limiting ring;67, spring. DETAILED DESCRIPTION

[0020] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the utility model.

[0021] Please refer to Figures 1-4 A target table for high-resistance target material in magnetron sputtering, comprising a target table main body 1, a plug 2 is arranged on the left side of the target table main body 1, a connecting head 3 is inserted on the outside of the plug 2, a fixed block 4 is fixedly connected to the left side of the target table main body 1, the fixed block 4 is in contact with the connecting head 3, a limit cover 41 is rotatably connected to the outside of the fixed block 4, the limit cover 41 is in contact with the target table main body 1, and the limit cover 41 is connected with the connecting head 3 through threads, the design of the limit cover 41 can limit the connecting head 3, the outside of the fixed block 4 is fixedly connected with a protruding block 42, and a ring groove 43 is arranged in the inside of the limit cover 41.

[0022] Please refer to Figures 2-4 The inside of the ring groove 43 is slidably connected with the protruding block 42, the design of the ring groove 43 can limit the limit cover 41 in cooperation with the protruding block 42, the left side of the target table main body 1 is fixedly connected with a positioning rod 44, the outside of the connecting head 3 is fixedly connected with a positioning plate 45, the positioning plate 45 is in contact with the limit cover 41, and the positioning plate 45 is slidably connected with the positioning rod 44, the design of the positioning plate 45 can position the connecting head 3, the left side of the target table main body 1 is fixedly connected with a fixed plate 5, and the fixed plate 5 is provided with a limiting mechanism 6.

[0023] Please refer to Figures 2-4The limiting mechanism 6 comprises a sleeve 61, the upper end of the fixed plate 5 is fixedly connected with the sleeve 61, the inside of the sleeve 61 is slidably connected with a sliding rod 62, the upper end of the sliding rod 62 is fixedly connected with a limiting plate 63, the limiting plate 63 is in contact with the target table main body 1, the limiting plate 63 is in contact with the limiting sleeve 41, one side of the limiting plate 63 close to the limiting sleeve 41 is fixedly connected with a limiting block 64, the inside of the limiting sleeve 41 is provided with a limiting groove 65, the inside of the limiting groove 65 is slidably connected with the limiting block 64, the inside of the sleeve 61 is fixedly connected with a limiting ring 66, the limiting ring 66 is slidably connected with the sliding rod 62, through the design of the limiting ring 66, the sliding rod 62 can be limited, the inside of the sleeve 61 is provided with a spring 67, one end of the spring 67 is in contact with the sleeve 61, the other end of the spring 67 is in contact with the sliding rod 62, through the design of the spring 67, the limiting sleeve 41 can be limited by the limiting plate 63, through loosening the limiting plate 63, the sliding rod 62 can be moved by the elastic force of the spring 67, the limiting plate 63 is moved by the sliding rod 62, the limiting block 64 is moved by the limiting plate 63, the limiting block 64 is slid into the limiting groove 65 on the limiting sleeve 41, the limiting plate 63 can limit the limiting sleeve 41, so that the limiting sleeve 41 can limit the connecting head 3 and keep stable when the connecting head 3 is inserted with the plug 2.

[0024] The specific implementation process of the utility model is as follows: when using, the limiting plate 63 is moved away from the limiting sleeve 41, the limiting plate 63 drives the sliding rod 62 to slide in the limiting ring 66, the sliding rod 62 is extruded to the spring 67, and the limiting block 64 of the limiting plate 63 is slid out of the limiting groove 65 on the limiting sleeve 41, so that the limiting of the limiting sleeve 41 is released.

[0025] The connecting head 3 is inserted with the plug 2, the connecting head 3 drives the positioning plate 45 to slide with the positioning rod 44, then the limiting sleeve 41 is rotated, the limiting sleeve 41 is screwed with the connecting head 3, so that the limiting sleeve 41 can limit the connecting head 3, so that the connecting head 3 can be inserted with the plug 2 and keep stable.

[0026] The limiting plate 63 is loosened, the sliding rod 62 is moved by the elastic force of the spring 67, the limiting plate 63 is moved by the sliding rod 62, the limiting block 64 is moved by the limiting plate 63, the limiting block 64 is slid into the limiting groove 65 on the limiting sleeve 41, so that the limiting plate 63 can limit the limiting sleeve 41, so that the limiting sleeve 41 can limit the connecting head 3 and keep stable when the connecting head 3 is inserted with the plug 2.

[0027] Although the embodiments of the present application have been shown and described, it is to be understood that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present application, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A target stage for high-resistivity targets in magnetron sputtering, comprising a target stage body (1), characterized in that: A plug (2) is provided on the left side of the target body (1), and a connector (3) is inserted into the outside of the plug (2). A fixing block (4) is fixedly connected to the left side of the target body (1). The fixing block (4) contacts the connector (3). A limit sleeve (41) is rotatably connected to the outside of the fixing block (4). A protrusion (42) is fixedly connected to the outside of the fixing block (4). A positioning rod (44) is fixedly connected to the left side of the target body (1). A positioning plate (45) is fixedly connected to the outside of the connector (3). A fixing plate (5) is fixedly connected to the left side of the target body (1). A limit mechanism (6) is provided on the fixing plate (5).

2. The target stage for high-resistivity targets in magnetron sputtering according to claim 1, characterized in that: The limiting sleeve (41) contacts the target body (1), and the limiting sleeve (41) is connected to the connector (3) by a thread.

3. The target stage for high-resistivity targets in magnetron sputtering according to claim 1, characterized in that: The limiting sleeve (41) has an annular groove (43) inside, and a protrusion (42) is slidably connected inside the annular groove (43).

4. A target stage for high-resistivity targets in magnetron sputtering according to claim 1, characterized in that: The positioning plate (45) contacts the limiting sleeve (41), and the positioning plate (45) is slidably sleeved with the positioning rod (44).

5. A target stage for high-resistivity targets in magnetron sputtering according to claim 1, characterized in that: The limiting mechanism (6) includes a sleeve (61), the upper end of the fixed plate (5) is fixedly connected to the sleeve (61), the inside of the sleeve (61) is slidably connected to a slide rod (62), the upper end of the slide rod (62) is fixedly connected to a limiting plate (63), the limiting plate (63) is in contact with the target body (1), the limiting plate (63) is in contact with the limiting sleeve (41), the side of the limiting plate (63) near the limiting sleeve (41) is fixedly connected to a limiting block (64), the inside of the limiting sleeve (41) is provided with a limiting groove (65), the inside of the limiting groove (65) is slidably connected to the limiting block (64), and the inside of the sleeve (61) is provided with a spring (67).

6. A target stage for high-resistivity targets in magnetron sputtering according to claim 5, characterized in that: The sleeve (61) is fixedly connected to a limiting ring (66), which is slidably connected to the slide rod (62).

7. A target stage for high-resistivity targets in magnetron sputtering according to claim 5, characterized in that: One end of the spring (67) is in contact with the sleeve (61), and the other end of the spring (67) is in contact with the slide rod (62).

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