Photoetching machine lens coating optimization tool

Abstract

The utility model discloses a photoetching machine lens coating optimization tool, which comprises a base, a driving part I, a support plate, a Y-axis driving component, an X-axis driving component, a transmission component, a cleaning component and an adsorption component, the driving part I is arranged in the base, the support plate is arranged at the output end of the driving part I, the Y-axis driving component is arranged on the support plate, and the X-axis driving component is arranged on the transmission component. The Y-axis driving assembly comprises a second driving part, a fixing plate and a limiting sliding block, the X-axis driving assembly is arranged on the fixing plate, the transmission assembly is arranged on the machining platform, the cleaning assembly is arranged on the transmission assembly, and the adsorption assembly is arranged on the machining platform. Therefore, the lens of the photoetching machine is adjusted through multi-directional accurate movement control, so that the angle is more accurate during film coating, high-quality light transmittance after film coating is ensured, an invalid area is cleaned in time, the cleanliness of the invalid area is kept, observation is convenient, and cleaning is convenient.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of photoetching machine, especially a photoetching machine lens coating optimization tool. BACKGROUND

[0002] The core function of photoetching machine lens coating is to significantly improve the reflectivity and transmittance of the lens, thereby optimizing the clarity of the photoetching pattern and effectively prolonging the service life of the coating. In the complex and precise photoetching process, this technology can greatly reduce the loss of light and ensure that more light accurately reaches the surface of the silicon wafer, thereby directly enhancing the efficiency and accuracy of photoetching.

[0003] It is worth noting that although models such as NIKIN6 / 7 / 8 have been used for as long as 30 years, their performance is gradually limited, mainly due to the increasingly serious photoetching and fogging phenomenon on the lens surface, which not only leads to a significant drop in light transmittance, but also may cause uneven light transmittance distribution.

[0004] In the coating process of photoetching machine lens, physical vapor deposition technology is widely used due to its high efficiency and reliability. This technology usually involves depositing a layer of molybdenum film on a high-purity quartz substrate first through chemical vapor deposition technology, then carefully stacking multiple layers of silicon film on it, and then continuing to stack multiple layers of molybdenum film on the silicon film to form a complex multilayer film structure, thereby achieving efficient reflection or transmission of specific band light.

[0005] However, the coating process is not easy. Since multiple coatings are required, and the lens usually contains an effective area and an ineffective area, film layers will inevitably be deposited in the ineffective area during the coating process, which poses a considerable challenge to subsequent cleaning work. In addition, the photoetching machine lens needs to be accurately positioned and angled before photoetching to ensure the accuracy of light source distribution. However, on traditional coating equipment, there is often a lack of mechanisms for precise adjustment of photoetching machine lenses, which may result in unsatisfactory light transmittance of the coated lens. SUMMARY

[0006] The utility model aims to at least solve one of the technical problems in the related art to some extent.

[0007] To this end, the utility model aims to provide a photoetching machine lens coating optimization tool that adjusts the photoetching machine lens through multi-directional precise movement control, making the angle more accurate during coating, ensuring high-quality light transmittance after coating, and cleaning the ineffective area in a timely manner to maintain the cleanliness of the ineffective area, making observation convenient and easy to clean.

[0008] In order to achieve the above object, the utility model provides a kind of photolithography lens coating optimization tool, including base, drive component one, support plate, Y-axis drive component, X-axis drive component, transmission component, cleaning component and adsorption component, wherein, the drive component one is arranged in the base;The support plate is arranged in the drive component one output end;The Y-axis drive component is arranged on the support plate, and the Y-axis drive component includes drive component two, fixed plate and limit sliding block, wherein, the drive component two is arranged on the support plate;The fixed plate is arranged in the drive component two output end;The limit sliding block is two groups, and two groups of limit sliding block are movably arranged on the support plate;The X-axis drive component is arranged on the fixed plate, and the X-axis drive component includes bottom plate, drive component three and processing platform, wherein, the bottom plate is arranged on the fixed plate;The drive component three is arranged on the bottom plate;The processing platform is arranged in the drive component three output end;The transmission component is arranged on the processing platform;The cleaning component is arranged on the transmission component;The adsorption component is arranged on the processing platform.

[0009] The photolithography lens coating optimization tool of the utility model adjusts the photolithography lens by multi-directional accurate movement control, so that the angle is more accurate when coating, ensures that the light transmittance after coating is high quality, and the invalid area is cleaned in time, the cleanliness of the invalid area is maintained, observation is convenient and cleaning is facilitated.

[0010] In addition, the photolithography lens coating optimization tool according to the above application can also have the following additional technical features:

[0011] Specifically, the transmission component includes drive component four, rotating shaft, outer sleeve, movable shaft rod, buffer component, outer sleeve ring, wherein, the drive component four is arranged in the processing platform;The rotating shaft is arranged in the drive component four output end;The outer sleeve is arranged on the rotating shaft;The movable shaft rod is movably arranged in the outer sleeve;The two ends of the buffer component are connected with the outer sleeve and the movable shaft rod respectively;The outer sleeve ring is arranged on the movable shaft rod.

[0012] Specifically, the cleaning component includes outer frame, movable frame, reset component and cleaning component, wherein, the outer frame is arranged on the outer sleeve ring;The movable frame is movably arranged in the outer frame;The two ends of the reset component are connected with the outer frame and the movable frame respectively;The cleaning component is arranged on the movable frame.

[0013] Specifically, the adsorption component includes limit card shell, jacking plate and suction accessory, wherein, the limit card shell is arranged on the processing platform;The jacking plate is movably arranged in the limit card shell;The suction accessory is arranged on the limit card shell.

[0014] Specifically, the cleaning component is a cleaning cotton pad, and the bottom wall of the outer frame is provided with an opening slot larger than the outer diameter of the cleaning component.

[0015] Specifically, the top wall of the support plate is provided with a positioning base plate, the positioning base plate is provided with a sliding groove, and the limiting sliding block is movably arranged in the sliding groove.

[0016] The additional aspects and advantages of the present application will be partially given in the following description, and some will become apparent from the following description, or be understood through the practice of the present application. BRIEF DESCRIPTION OF DRAWINGS

[0017] The above and / or additional aspects and advantages of the present application will become apparent and more readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:

[0018] Figure 1 is a structural schematic view of the present application;

[0019] Figure 2 is a structural schematic view of the cleaning assembly of the present application;

[0020] Figure 3 is a structural schematic view of the transmission assembly of the present application;

[0021] Figure 4 is a structural schematic view of the adsorption assembly of the present application.

[0022] As shown in the figure: 10, base; 20, driving component one; 30, support plate; 40, Y-axis driving assembly; 401, driving component two; 402, fixed plate; 403, limiting sliding block; 50, X-axis driving assembly; 501, bottom plate; 502, driving component three; 503, machining platform; 60, transmission assembly; 601, driving component four; 602, rotating shaft; 603, outer sleeve; 604, movable shaft; 605, buffer component; 606, outer sleeve ring; 70, cleaning assembly; 701, outer frame; 702, movable frame; 703, reset component; 704, cleaning component; 80, adsorption assembly; 801, limiting clamping shell; 802, jacking plate; 803, adsorption accessory. DETAILED DESCRIPTION

[0023] The embodiments of the present application will be described in detail below, and examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary and are intended to explain the present application, and cannot be understood as a limitation of the present application. On the contrary, the embodiments of the present application include all changes, modifications and equivalents falling within the spirit and scope of the appended claims.

[0024] The lens coating optimization tool for a photoetching machine is described below with reference to the drawings.

[0025] As shown in the drawings, Figures 1-4 The lens coating optimization tool for a photoetching machine includes a base 10, a driving component 20, a support plate 30, a Y-axis driving assembly 40, an X-axis driving assembly 50, a transmission assembly 60, a cleaning assembly 70, and a suction assembly 80.

[0026] The driving component 20 is arranged in the base 10, the support plate 30 is arranged at the output end of the driving component 20, and the Y-axis driving assembly 40 is arranged on the support plate 30.

[0027] It should be noted that the driving component 20 is a hydraulic cylinder, which drives the support plate 30 to move up and down when the driving component 20 is running, and then drives the suction assembly 80 to move up and down synchronously to adjust the height.

[0028] The Y-axis driving assembly 40 includes a driving component 401, a fixed plate 402, and a limiting sliding block 403.

[0029] The driving component 401 is arranged on the support plate 30, the fixed plate 402 is arranged at the output end of the driving component 401, and the limiting sliding block 403 is movably arranged on the support plate 30.

[0030] It should be noted that the driving component 401 is a servo motor, which is connected to the driving component 401 through a control switch and a power supply, and drives the X-axis driving assembly 50 to move synchronously when the driving component 401 is running. The limiting sliding block 403 is limited to slide on the support plate 30 during the sliding process.

[0031] The X-axis driving assembly 50 is arranged on the fixed plate 402, and includes a bottom plate 501, a driving component 502, and a processing platform 503.

[0032] The bottom plate 501 is arranged on the fixed plate 402, the driving component 502 is arranged on the bottom plate 501, and the processing platform 503 is arranged at the output end of the driving component 502.

[0033] It should be noted that the driving component 502 is a servo motor, which is connected to the driving component 502 through a control switch and a power supply. The output end of the driving component 502 is connected to a screw rod through a speed reducer, and an internally threaded sleeve is arranged on the screw rod. The internally threaded sleeve is limited to slide on the bottom plate 501.

[0034] Further, in order to more accurately adjust the position of the photoetching machine lens, a four-axis linkage adjustment mechanism can be used on the basis of the three-axis linkage.

[0035] The transmission assembly 60 is arranged on the processing platform 503, the cleaning assembly 70 is arranged on the transmission assembly 60, and the adsorption assembly 80 is arranged on the processing platform 503.

[0036] In an embodiment of the utility model, as shown in Figure 3 The transmission assembly 60 comprises a driving component four 601, a rotating shaft 602, an outer sleeve 603, a movable shaft rod 604, a buffer component 605 and an outer sleeve ring 606.

[0037] The driving component four 601 is arranged in the processing platform 503, the rotating shaft 602 is arranged at the output end of the driving component four 601, and the outer sleeve 603 is arranged on the rotating shaft 602. The movable shaft rod 604 is movably arranged in the outer sleeve 603, the buffer component 605 is connected to the outer sleeve 603 and the movable shaft rod 604 at both ends respectively, and the outer sleeve ring 606 is arranged on the movable shaft rod 604.

[0038] It should be noted that the driving component four 601 is a stepping motor, the driving component four 601 is operated by controlling the switch and the power supply connection, the output end of the driving component four 601 is connected to the rotating shaft 602 through a speed reducer, and the driving component four 601 rotates to drive the outer sleeve 603 to rotate. The movable shaft rod 604 moves in the outer sleeve 603, and the height of the cleaning assembly 70 is adjusted. The buffer component 605 is a buffer spring, which pushes the movable shaft rod 604 to reset.

[0039] In an embodiment of the utility model, as shown in Figure 2 The cleaning assembly 70 comprises an outer frame 701, a movable frame 702, a reset component 703 and a cleaning component 704.

[0040] The outer frame 701 is arranged on the outer sleeve ring 606, the movable frame 702 is movably arranged in the outer frame 701, the reset component 703 is connected to the outer frame 701 and the movable frame 702 at both ends respectively, and the cleaning component 704 is arranged on the movable frame 702.

[0041] It should be noted that the reset component 703 is a reset spring, the movable frame 702 moves up and down in the outer frame 701 and is reset through the reset component 703, and the cleaning component 704 cleans the coated lens.

[0042] In an embodiment of the utility model, as shown in Figure 4 The adsorption assembly 80 comprises a limiting clamping shell 801, a jacking plate 802 and an adsorption component 803.

[0043] The limiting clamping shell 801 is arranged on the processing platform 503, the jacking plate 802 is movably arranged in the limiting clamping shell 801, and the adsorption component 803 is arranged on the limiting clamping shell 801.

[0044] It should be noted that the lifting plate 802 is lifted and adjusted in the limiting clamping shell 801, the suction accessory 803 is a suction machine, the suction accessory 803 is prior art, and the plated photoetching lens is placed and adsorbed when the suction accessory 803 is operated, and the air hole is arranged on the lifting plate 802.

[0045] Further, in order to facilitate the adjustment of the lifting movement of the lifting plate 802, the lifting motor is arranged in the limiting clamping shell 801.

[0046] In an embodiment of the utility model, as shown in Figure 2 The cleaning component 704 is a cleaning cotton pad, and the bottom wall of the outer frame 701 is provided with an opening slot larger than the outer diameter of the cleaning component 704.

[0047] It should be noted that the cleaning component 704 cleans the excess coating on the limiting clamping shell 801 during movement.

[0048] In an embodiment of the utility model, as shown in Figure 1 The top wall of the support plate 30 is provided with a positioning base plate, the positioning base plate is provided with a sliding groove, and the limiting sliding block 403 is movably arranged in the sliding groove.

[0049] It should be noted that the limiting sliding block 403 is limited to slide in the sliding groove, so that the bottom plate 501 slides on the support plate 30.

[0050] Specifically, the steps of plating the photoetching lens are as follows: the photoetching lens is placed on the lifting plate 802, the suction accessory 803 is operated to adsorb and fix the photoetching lens on the lifting plate 802. According to the position and angle of the required plating, the driving component one 20, the driving component two 401 and the driving component three 502 are operated respectively, so as to push and move the photoetching lens. Then the photoetching lens is accurately moved to the plating position, and the plating is completed. After the plating is completed, the height of the movable shaft 604 in the outer sleeve 603 is adjusted, and then the driving component four 601 is operated, the driving component four 601 drives the cleaning component 704 to rotate, and the cleaning component 704 scrapes off the coating on the surface of the limiting clamping shell 801 during rotation.

[0051] In summary, the photoetching lens plating optimization tool of the utility model embodiment adjusts the photoetching lens through multi-directional accurate movement control, so that the angle is more accurate during plating, the light transmittance after plating is guaranteed, the invalid area is cleaned in time, the cleanliness of the invalid area is maintained, observation is convenient and cleaning is convenient.

[0052] Although the embodiments of the utility model have been shown and described above, it can be understood that the above-mentioned embodiments are exemplary and cannot be understood as limiting the utility model, and the ordinary skilled in the art can change, modify, replace and deform the above-mentioned embodiments within the scope of the utility model.

Claims

1. A lithography lens coating optimization tool, characterized in that, The utility model relates to a kind of processing platform, including base (10), drive component one (20), support plate (30), Y-axis drive assembly (40), X-axis drive assembly (50), transmission assembly (60), cleaning assembly (70) and adsorption assembly (80), wherein, The drive component one (20) is arranged in the base (10); The support plate (30) is arranged at the output end of the drive component one (20); The Y-axis drive assembly (40) is arranged on the support plate (30), and the Y-axis drive assembly (40) includes drive component two (401), fixed plate (402) and limiting slide block (403), wherein, The drive component two (401) is arranged on the support plate (30); The fixed plate (402) is arranged at the output end of the drive component two (401); The limiting slide block (403) is two groups, and the two groups of limiting slide blocks (403) are movably arranged on the support plate (30); The X-axis drive assembly (50) is arranged on the fixed plate (402), and the X-axis drive assembly (50) includes bottom plate (501), drive component three (502) and processing platform (503), wherein, The bottom plate (501) is arranged on the fixed plate (402); The drive component three (502) is arranged on the bottom plate (501); The processing platform (503) is arranged at the output end of the drive component three (502); The transmission assembly (60) is arranged on the processing platform (503); The cleaning assembly (70) is arranged on the transmission assembly (60); The adsorption assembly (80) is arranged on the processing platform (503).

2. The photoetching machine lens coating optimization tool of claim 1, wherein, The transmission assembly (60) includes drive component four (601), rotating shaft (602), outer sleeve (603), movable shaft rod (604), buffer component (605), outer sleeve ring (606), wherein, The drive component four (601) is arranged in the processing platform (503); The rotating shaft (602) is arranged at the output end of the drive component four (601); The outer sleeve (603) is arranged on the rotating shaft (602); The movable shaft rod (604) is movably arranged in the outer sleeve (603); The buffer component (605) is connected to the outer sleeve (603) and the movable shaft rod (604) at both ends, respectively; The outer sleeve ring (606) is arranged on the movable shaft rod (604).

3. The photoetching machine lens coating optimization tool of claim 2, wherein, The cleaning assembly (70) includes outer frame (701), movable frame (702), reset component (703) and cleaning component (704), wherein, The outer frame (701) is arranged on the outer sleeve ring (606); The movable frame (702) is movably arranged in the outer frame (701); The reset component (703) is connected to the outer frame (701) and the movable frame (702) at both ends, respectively; The cleaning component (704) is arranged on the movable frame (702).

4. The photolithography lens coating optimization tool of claim 1, wherein, The adsorption assembly (80) comprises a limiting clamping shell (801), a jacking plate (802) and an adsorption accessory (803), wherein, The limiting clamping shell (801) is arranged on the machining platform (503); The jacking plate (802) is movably arranged in the limiting clamping shell (801); The adsorption accessory (803) is arranged on the limiting clamping shell (801).

5. The photolithography lens coating optimization tool of claim 3, wherein, The cleaning component (704) is a cleaning cotton pad, and the bottom wall of the outer frame (701) is provided with an opening slot larger than the outer diameter of the cleaning component (704).

6. The photolithography lens coating optimization tool of claim 1, wherein, The top wall of the support plate (30) is provided with a positioning base plate, the positioning base plate is provided with a sliding groove, and the limiting sliding block (403) is movably arranged in the sliding groove.

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