Energy-saving gas supply system for silicon wafer production

Abstract

The utility model relates to an energy-saving gas supply system for silicon wafer production. The energy-saving gas supply system comprises a first gas path, a second gas path, a third gas path and a fourth gas path, one end of the first gas path is communicated with a gas source of the magnetic suspension gas production equipment, and the other end of the first gas path is communicated with a gas storage tank in a production area; the first gas path is used for providing a directly used low-pressure gas source and an indirectly used high-pressure gas source for a gas terminal in a production area and providing gas sources for the second gas path, the third gas path and the fourth gas path; one end of the second gas path, one end of the third gas path and one end of the fourth gas path are respectively communicated with a gas storage tank in a production area, and the other ends of the second gas path, the third gas path and the fourth gas path are respectively communicated with a gas terminal in the production area; the gas path system has the advantages that the high-pressure gas path, the medium-pressure gas path and the low-pressure gas path are arranged in the gas path system, so that the requirements of equipment on gases with various pressures can be met, the diversification and the applicability of the gas path system are improved, gas waste of the gas path system is avoided, and the energy cost of the gas supply system is saved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the field of silicon wafer production gas supply, relates to energy -conserving gas supply system for silicon wafer production. BACKGROUND

[0002] In the production process of silicon wafer, the slicing machine needs to use pressurized gas, therefore, the corresponding gas supply system needs to be equipped. However, the pressurized gas required by different gas using components of the silicon wafer slicing machine is different, therefore, the slicing machine as a gas using terminal simultaneously has gas using demand for pressurized air of multiple pressures. The gas supply mode of the traditional gas supply system is usually directly outputting high pressure pressurized gas, for the low pressure demand terminal on the slicing machine, the high pressure gas from the gas supply system is reduced in pressure to meet the gas using demand. This gas supply mode is obviously not high in energy utilization efficiency, causing energy waste of the silicon wafer factory.

[0003] In the production process of silicon wafer, the conventional air compression station provides high pressure compressed air to the process equipment. However, in actual application, the requirements of each component in the process equipment for compressed gas are different, among which the most used gas by the equipment is low pressure compressed gas. The traditional air compression station only provides single high pressure gas to meet the gas requirement of the whole process equipment. For the components of low pressure compressed gas, the high pressure gas is changed into low pressure gas through a pressure reducing valve after being reduced in pressure, and then is supplied to the components of low pressure compressed gas.

[0004] In the traditional gas supply mode, the high pressure gas from the gas supply system is usually reduced in pressure to meet the gas using demand, and this gas supply mode is obviously not high in energy utilization efficiency, which is easy to cause energy waste of the silicon wafer factory, equipment damage or safety accidents caused by excessively high pressure and other problems. INVENTION CONTENTS

[0005] The utility model aims at solving the above problems existing in the prior art, and provides a multi-stage pressure energy -conserving gas supply system.

[0006] To achieve the above purpose, the technical scheme adopted by the utility model is as follows:

[0007] An energy -conserving gas supply system for silicon wafer production, comprising: a first gas path, one end of the first gas path is in communication with a magnetic suspension gas making equipment gas source, and the other end is in intercommunication with a production area gas storage tank;The first gas path is used for providing low pressure gas source directly used and high pressure gas source indirectly used for the gas using terminal in the production area, and providing gas source for the second gas path, the third gas path and the fourth gas path;

[0008] A second gas path, one end of the second gas path being in communication with the production area gas storage tank, the other end being in communication with the low-pressure gas component of the production area gas terminal, the second gas path being used to provide low-pressure gas for the low-pressure gas component; a third gas path, one end of the third gas path being in communication with the production area gas storage tank, the other end being in communication with the medium-pressure gas component of the production area gas terminal, the third gas path being used to provide medium-pressure gas for the medium-pressure gas component; a fourth gas path, one end of the fourth gas path being in communication with the production area gas storage tank, the other end being in communication with the high-pressure gas component of the gas terminal, the fourth gas path being used to provide a high-pressure gas source for the high-pressure gas component.

[0009] Preferably, the first gas path is a gas production gas path, comprising an air dryer, a gas filter, a gas supply input control electric valve, a power station gas storage tank, and a production area gas storage tank connected in sequence; wherein the air dryer, the gas filter, the gas supply input control electric valve, the power station gas storage tank, and the production area gas storage tank are all connected to each other through gas path pipelines; a first pressure gauge is arranged between the magnetic levitation gas production equipment and the air dryer; a dew point instrument is arranged between the air dryer and the gas filter; and a first flow meter is arranged between the power station gas storage tank and the production area gas storage tank.

[0010] Preferably, the magnetic levitation gas production equipment is used to provide pressurized air for the entire gas path system; the air dryer is used to dry the pressurized air from the magnetic levitation gas production equipment; the gas filter is used to filter impurities from the dry pressurized air from the air dryer; the gas supply input control electric valve is used to control the amount of gas entering the power station gas storage tank; the power station gas storage tank is used to store pressurized gas prepared by the power station and subjected to drying and filtering treatment; and the production area gas storage tank is used to store pressurized gas from the power station and for the gas production equipment in the production area.

[0011] Preferably, the second gas path is a low-pressure gas supply gas path, comprising a low-pressure gas output control electric valve, the low-pressure gas output control electric valve being used to control the amount of gas from the production area gas storage tank entering the low-pressure gas component of the gas terminal; wherein the low-pressure gas output control electric valve, the production area gas storage tank, and the gas terminal are all connected to each other through gas path pipelines; and a second pressure gauge and a second flow meter are further arranged on the gas path pipeline between the low-pressure gas output control electric valve and the gas terminal, the second flow meter being arranged behind the second pressure gauge.

[0012] Preferably, the third gas path is a medium-pressure gas supply path, comprising a first booster gas pump and a medium-pressure gas output control electric valve, the first booster gas pump being connected with the production area gas tank and the medium-pressure gas output control electric valve through gas path pipelines; one end of the medium-pressure gas output control electric valve is also connected with the medium-pressure gas components of the gas terminal; a third pressure gauge and a third flow meter are arranged on the gas path pipeline between the medium-pressure gas output control electric valve and the gas terminal; and the third flow meter is arranged behind the third pressure gauge.

[0013] Preferably, the first booster gas pump is used to pressurize the low-pressure gas from the production area gas tank to medium pressure to provide the gas terminal with medium-pressure gas; and the medium-pressure gas output control electric valve is used to control the amount of gas entering the medium-pressure gas components of the gas terminal from the first booster gas pump.

[0014] Preferably, the fourth gas path is a high-pressure gas supply path, comprising a second booster gas pump and a high-pressure gas output control electric valve, the second booster gas pump being connected with the first booster gas pump and the high-pressure gas output control electric valve through gas path pipelines; one end of the high-pressure gas output control electric valve is also connected with the high-pressure gas components of the gas terminal; a fourth pressure gauge and a fourth flow meter are arranged on the gas path pipeline between the high-pressure gas output control electric valve and the gas terminal; and the fourth flow meter is arranged behind the fourth pressure gauge.

[0015] Preferably, the second booster gas pump is used to pressurize the medium-pressure gas from the first booster gas pump to high pressure to provide the gas terminal with high-pressure gas; and the high-pressure gas output control electric valve is used to control the amount of gas entering the high-pressure gas components of the gas terminal from the second booster gas pump.

[0016] As the above technical solutions are adopted, the present application has the following beneficial effects:

[0017] The present application can meet the needs of the equipment for various pressure gases by arranging the high-pressure gas path, the medium-pressure gas path and the low-pressure gas path in the gas path system, improve the diversified applicability of the gas path system, avoid the waste of gas in the gas path system, and save the energy cost of the gas supply system. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 is a structure flow chart of one embodiment of the energy-saving gas supply system for silicon wafer production of the present application.

[0019] The reference signs are shown as follows:

[0020] 1, magnetic levitation gas production equipment; 2, first pressure gauge; 3, air dryer; 4, dew point instrument;

[0021] 5, gas filter; 6, gas supply input control electric valve; 7, power station gas storage tank;

[0022] 8, first flow meter; 9, production area gas storage tank; 10, low pressure gas output control electric valve;

[0023] 11, first booster gas pump; 12, medium pressure gas output control electric valve;

[0024] 13, second booster gas pump; 14, high pressure gas output control electric valve;

[0025] 15, first gas path; 16, second gas path; 17, third gas path; 18, fourth gas path;

[0026] 101, second pressure gauge; 102, second flow meter; 111, gas path pipeline;

[0027] 121, third pressure gauge; 122, third flow meter;

[0028] 131, fourth pressure gauge; 132, fourth flow meter. DETAILED DESCRIPTION

[0029] Please refer to the attached drawings Figure 1The utility model discloses a kind of energy-saving gas supply systems for silicon wafer production, to solve the problem of gas path waste and high operating cost caused by the centralized gas supply gas path system of existing silicon wafer production configuration;Based on this, the gas supply system includes: first gas path 15, i.e. gas preparation gas path, one end of first gas path 15 is communicated with magnetic suspension gas preparation equipment 1 gas source, and the other end is communicated with production area gas storage tank 9;First gas path 15 is used to provide directly used low-pressure gas source and indirectly used high-pressure gas source for gas terminal in production area;And provide gas source for the second gas path 16, third gas path 17 and fourth gas path 18 of production area;Second gas path 16, i.e. low-pressure gas supply gas path, one end of second gas path 16 is communicated with production area gas storage tank 9, and the other end is communicated with low-pressure gas component of gas terminal, and second gas path 16 is used to provide low-pressure gas for low-pressure gas component;Third gas path 17, i.e. medium-pressure gas supply gas path, one end of third gas path 17 is communicated with production area gas storage tank 9, after being pressurized and treated to gas source by first pressurizing gas pump 11, the other end is communicated with medium-pressure gas component of gas terminal, and third gas path 17 is used to provide medium-pressure gas source for high-pressure gas component;Fourth gas path 18, i.e. high-pressure gas supply gas path, one end of fourth gas path 18 is communicated with first pressurizing gas pump 11, after being pressurized and treated again to gas source by second pressurizing gas pump 13, the other end is communicated with high-pressure gas component of gas terminal, and fourth gas path 18 is used to provide high-pressure gas source for high-pressure gas component.And by being provided with high-pressure gas path, medium-pressure gas path and low-pressure gas path in gas path system, the demand of equipment to various gas pressure gas can be met, the diversification applicability of gas path system is improved, avoid gas path system gas waste, save energy cost for gas supply system.

[0030] In the embodiment, the first gas path 15 comprises the air dryer 3, the gas filter 5, the gas supply input control electric valve 6, the power station gas storage tank 7, and the production area gas storage tank 9 connected in sequence; wherein the air dryer 3, the gas filter 5, the gas supply input control electric valve 6, the power station gas storage tank 7, and the production area gas storage tank 9 are connected to each other through the gas path pipeline 111; and one end of the air dryer 3 is connected with the magnetic suspension gas making equipment 1, and the first pressure gauge 2 is arranged between the magnetic suspension gas making equipment 1 and the air dryer 3; the dew point instrument 4 is arranged between the air dryer 3 and the gas filter 5; the first flow meter 8 is arranged between the power station gas storage tank 7 and the production area gas storage tank 9; and the magnetic suspension gas making equipment 1 is used to provide pressurized air for the whole gas path system; the air dryer 3 is used to dry the pressurized air from the magnetic suspension gas making equipment; the gas filter is used to filter the impurities of the dry pressurized air from the air dryer; the gas supply input control electric valve 6 is used to control the amount of gas entering the power station gas storage tank; the power station gas storage tank 7 is used to store the pressurized gas prepared by the power station and processed by drying and filtering; the production area gas storage tank 9 is used to store the pressurized gas from the power station and used in the gas making equipment of the production area; the first pressure gauge 2 is used to monitor the pressure value of the gas at the measured point; the dew point instrument 4 is used to monitor the dew point of the pressurized air processed by the air dryer; and the first flow meter 8 is used to monitor the flow of the gas at the measured point.

[0031] In the embodiment, the second gas path 16 comprises the low-pressure gas output control electric valve 10, which is used to control the amount of gas from the production area gas storage tank 9 into the low-pressure gas components of the gas terminal; wherein the low-pressure gas output control electric valve 10, the production area gas storage tank 9, and the gas terminal are connected to each other through the gas path pipeline 111; and the second pressure gauge 101 and the second flow meter 102 are further arranged on the gas path pipeline between the low-pressure gas output control electric valve 10 and the gas terminal, and the second flow meter 102 is arranged behind the second pressure gauge 101; and the second pressure gauge 101 is used to monitor the pressure value of the gas from the production area gas storage tank 9 into the low-pressure gas components of the gas terminal; and the second flow meter 102 is used to monitor the flow of the gas from the production area gas storage tank 9 into the low-pressure gas components of the gas terminal.

[0032] In the embodiment, the third gas path 17 comprises the first booster gas pump 11 and the medium-pressure gas output control electric valve 12, the first booster gas pump 11 is connected with the production area gas storage tank 9 and the medium-pressure gas output control electric valve 12 through the gas path pipeline 111 respectively; one end of the medium-pressure gas output control electric valve 12 is also connected with the medium-pressure gas components of the gas terminal; wherein the first booster gas pump 11 is used to pressurize the low-pressure gas from the production area gas storage tank to medium pressure, and provide the medium-pressure pressurized gas for the gas terminal; the medium-pressure gas output control electric valve 12 is used to control the gas amount entering the medium-pressure gas components of the gas terminal from the first booster gas pump; and the third pressure gauge 121 and the third flow meter 122 are arranged on the gas path pipeline between the medium-pressure gas output control electric valve and the gas terminal; and the third flow meter 122 is arranged behind the third pressure gauge 121; wherein the third pressure gauge 121 is used to monitor the pressure value of the gas entering the medium-pressure gas components of the gas terminal after being pressurized by the first booster gas pump 11; and the third flow meter 122 is used to monitor the flow of the gas entering the medium-pressure gas components of the gas terminal after being pressurized by the first booster gas pump 11.

[0033] In the embodiment, the fourth gas path 18 comprises the second booster gas pump 13 and the high-pressure gas output control electric valve 14, the second booster gas pump 13 is connected with the first booster gas pump 12 and the high-pressure gas output control electric valve 14 through the gas path pipeline 111 respectively, one end of the high-pressure gas output control electric valve 14 is also connected with the high-pressure gas components of the gas terminal, the second booster gas pump 13 is used to pressurize the medium-pressure pressurized gas from the first booster gas pump 12 to high pressure, and provide the high-pressure pressurized gas for the gas terminal; the high-pressure gas output control electric valve 14 is used to control the gas amount entering the high-pressure gas components of the gas terminal from the second booster gas pump 12; and the fourth pressure gauge 131 and the fourth flow meter 132 are arranged on the gas path pipeline between the high-pressure gas output control electric valve 14 and the gas terminal; and the fourth flow meter 142 is arranged behind the fourth pressure gauge 131; wherein the fourth pressure gauge 131 is used to monitor the pressure value of the gas entering the high-pressure gas components of the gas terminal after being pressurized by the second booster gas pump 13; and the third flow meter 132 is used to monitor the flow of the gas entering the high-pressure gas components of the gas terminal after being pressurized by the second booster gas pump 13.

[0034] In the embodiment, the magnetic suspension gas production device 1, the air dryer 3, the gas filter 5, the gas supply input control electric valve 6, the power station gas storage tank 7, and the gas pipeline and valve and pressure gauge, dew point instrument, flow meter connected with each element of the power station part of the gas system; the production area gas storage tank 9, the low-pressure gas output control electric valve 10, the first booster gas pump 11, the medium-pressure gas output control electric valve 12, the second booster gas pump 13, the high-pressure gas output control electric valve 14, and the gas pipeline and valve and auxiliary pressure gauge, flow meter connected with each element of the production area part of the gas system.

[0035] The implementation process of the utility model is as follows:

[0036] After the gas production device produces low-pressure booster gas, the compressed gas is transported from the power station to the production area through the first gas path;

[0037] For the low-pressure gas demand of the gas terminal, the low-pressure booster gas from the production area gas storage tank is directly transported to the low-pressure gas component of the gas terminal through the second gas path;

[0038] For the medium-pressure gas demand of the gas terminal, the low-pressure booster gas from the production area gas storage tank is transported to the medium-pressure gas component of the gas terminal through the third gas path, and the low-pressure booster gas is first boosted to medium pressure by the first booster gas pump during the period, and then transported to the medium-pressure gas component of the gas terminal through the third gas path;

[0039] For the high-pressure gas demand of the gas terminal, the medium-pressure booster gas from the first booster gas pump is transported to the high-pressure gas component of the gas terminal through the fourth gas path, and the low-pressure booster gas is first boosted to high pressure by the second booster gas pump during the period, and then transported to the high-pressure gas component of the gas terminal through the fourth gas path.

[0040] It should be noted that: the utility model mainly provides an energy-saving gas supply system mainly with low pressure and multi-stage pressure gas supply; unlike the traditional gas supply system, when preparing compressed gas, low-pressure compressed gas instead of high-pressure gas is produced, which can meet most gas demand of process equipment, so as to reduce the energy consumption of the gas production process; for the demand of high-pressure gas of the gas terminal, the demand of the gas terminal is flexibly matched and satisfied through the rear-end boosting mode, which can avoid energy waste caused by the traditional pressure reduction process, and at the same time, can provide multi-stage pressure gas source, so that the whole gas supply system is energy-saving, flexible and reliable; at the same time, when the gas terminal has demand for gas with different pressures, the gas amount can be adjusted through the automatic control valve of the system, so as to meet the use demand and avoid energy waste.

[0041] The above related description and the description of the embodiments are for facilitating the ordinary skilled in the art to understand and apply the present application. Those skilled in the art can obviously easily make various modifications to these contents, and apply the general principles described herein to other embodiments without creative labor. Therefore, the present application is not limited to the above related description and the description of the embodiments, and the improvements and modifications made by those skilled in the art according to the disclosure of the present application without departing from the scope of the present application should be within the protection scope of the present application.

Claims

1. An energy-saving gas supply system for silicon wafer production, characterized in that, The gas supply system includes: The first gas path has one end connected to the gas source of the magnetic levitation gas generation equipment, and the other end connected to the gas storage tank in the production area. The first gas path is used to provide a low-pressure gas source for direct use and a high-pressure gas source for indirect use to the gas-using terminals in the production area, and to provide a gas source for the second, third and fourth gas paths. The second gas line has one end connected to the gas storage tank in the production area and the other end connected to the low-pressure gas-using component of the gas-using terminal in the production area. The second gas line is used to provide low-pressure gas to the low-pressure gas-using component of the gas-using terminal. The third gas line has one end connected to the gas storage tank in the production area and the other end connected to the medium-pressure gas consumption component of the gas consumption terminal in the production area. The third gas line is used to provide medium-pressure gas to the medium-pressure gas consumption component of the gas consumption terminal. The fourth gas path is connected at one end to the gas storage tank in the production area and at the other end to the high-pressure gas-using component of the gas-using terminal. The fourth gas path is used to provide a high-pressure gas source for the high-pressure gas-using component of the gas-using terminal.

2. The energy-saving gas supply system for silicon wafer production according to claim 1, characterized in that, The first gas path is a gas generating path, comprising an air dryer, a gas filter, a gas supply input control electric valve, a power station gas storage tank, and a production area gas storage tank connected in sequence; wherein the air dryer, gas filter, gas supply input control electric valve, power station gas storage tank, and production area gas storage tank are all interconnected through gas pipelines; a first pressure gauge is installed between the magnetic levitation gas generating equipment and the air dryer; a dew point meter is installed between the air dryer and the gas filter; and a first flow meter is installed between the power station gas storage tank and the production area gas storage tank.

3. The energy-saving gas supply system for silicon wafer production according to claim 2, characterized in that, The magnetic levitation gas generator is used to provide pressurized air for the entire gas circuit system; the air dryer is used to dry the pressurized air from the magnetic levitation gas generator; the gas filter is used to filter impurities from the dried pressurized air from the air dryer; and the gas supply input control electric valve is used to control the amount of gas entering the power station's gas storage tank. The power station gas storage tank is used to store pressurized gas prepared by the power station and after drying and filtration. The gas storage tank in the production area is used to store pressurized gas from the power station and is used in the gas production equipment in the production area.

4. The energy-saving gas supply system for silicon wafer production according to claim 1, characterized in that, The second gas path is a low-pressure gas supply path, including a low-pressure gas output control electric valve, which is used to control the gas volume entering the low-pressure gas consumption component from the gas storage tank in the production area to the gas consumption terminal; wherein, the low-pressure gas output control electric valve is interconnected with the gas storage tank in the production area and the gas consumption terminal through gas pipelines; and a second pressure gauge and a second flow meter are also installed on the gas pipeline between the low-pressure gas output control electric valve and the gas consumption terminal, with the second flow meter shown being located after the second pressure gauge.

5. The energy-saving gas supply system for silicon wafer production according to claim 1, characterized in that, The third gas path is a medium-pressure gas supply path, including a first booster pump and a medium-pressure gas output control electric valve. The first booster pump is interconnected with the gas storage tank in the production area and the medium-pressure gas output control electric valve through gas pipelines. One end of the medium-pressure gas output control electric valve is also interconnected with the medium-pressure gas consumption component of the gas consumption terminal. A third pressure gauge and a third flow meter are also installed on the gas pipeline between the medium-pressure gas output control electric valve and the gas consumption terminal. The third flow meter is located behind the third pressure gauge.

6. The energy-saving gas supply system for silicon wafer production according to claim 5, characterized in that, The first booster pump is used to pressurize the low-pressure gas from the gas storage tank in the production area to medium pressure, so as to provide medium-pressure gas to the gas-using terminal; the medium-pressure gas output control electric valve is used to control the amount of gas entering the medium-pressure gas-using component from the first booster pump to the gas-using terminal.

7. The energy-saving gas supply system for silicon wafer production according to claim 1, characterized in that, The fourth gas path is a high-pressure gas supply path, including a second booster pump and a high-pressure gas output control electric valve. The second booster pump is interconnected with the first booster pump and the high-pressure gas output control electric valve through gas pipelines. One end of the high-pressure gas output control electric valve is also interconnected with the high-pressure gas consumption component of the gas consumption terminal. A fourth pressure gauge and a fourth flow meter are also installed on the gas pipeline between the high-pressure gas output control electric valve and the gas consumption terminal. The fourth flow meter is located behind the fourth pressure gauge.

8. The energy-saving gas supply system for silicon wafer production according to claim 7, characterized in that, The second booster pump is used to repressurize the medium-pressure gas from the first booster pump to high pressure, providing high-pressure gas to the gas-using terminal; the high-pressure gas output control electric valve is used to control the amount of gas entering the high-pressure gas-using component from the second booster pump to the gas-using terminal.

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