Device for uniformly coating photoresist

Abstract

The utility model discloses a device for uniformly coating photoresist, which comprises a base, the outer surface of the base is fixedly connected with a support frame, the outer surface of the support frame is fixedly connected with a main body of the device for uniformly coating the photoresist, a rotating seat above the base is rotated, and a rotating disc connected with the rotating seat through a fixed column can rotate; the rotation of the rotating disc enables the telescopic strip connected with the rotating disc to stretch out and draw back, the drying device body is pushed out of the base, then the protective sleeve where the drying device body is located is lifted through the first hydraulic rod on the telescopic strip, and the drying device body can stretch out of the protective sleeve through the second hydraulic rod stretching out and drawing back. The photoresist in the uniform photoresist coating device main body is dried, the drying device main body can be hidden in the base, the occupied area in equipment layout is reduced, the device is suitable for a production environment with a limited space, meanwhile, the drying device main body is protected in the protective sleeve when not used, and interference and potential damage of external environmental factors to equipment are reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to photoresist technical field, especially a device for even coating photoresist. BACKGROUND

[0002] The substrate used for electronic packaging is a kind of base electronic component, which is used to provide mechanical bearing support for electronic components and their interconnection, such as wafer, ceramic substrate, etc.; in the packaging process of chip, metal film needs to be plated on the surface of the substrate to form a conductive circuit, and currently the conductive circuit is mainly formed by traditional etching method, that is, first, photoresist is dripped in the middle of the substrate, then the photoresist is spread to the periphery under the action of centrifugal force by rotating, so that the photoresist is evenly coated on the outer surface of the substrate, then the designed pattern is projected onto the photoresist by exposure and development, and finally the conductive circuit is formed by using the photosensitive and corrosion-resistant properties of the photoresist, and currently the photoresist coated by the coating machine needs to be baked to volatilize the solvent in the photoresist, so as to ensure that the photoresist has enough hardness to resist the impact of ion beam in the subsequent etching-removal (Etch-Trim) process, so that the step layer line after etching is uniform and straight, but the uniform photoresist coating device and its drying device are relatively large in size, which is not suitable for production environment with limited space. SUMMARY

[0003] The utility model discloses a device for even coating photoresist, rotates the rotary seat above the base, so that the rotating disc connected with the rotary seat by the fixed column can rotate, the rotation of the rotating disc makes the telescopic strip connected with the rotating disc can extend and retract, the drying device main part is pushed out of the base, then the protection sleeve where the drying device main part is located is lifted by hydraulic rod one on the telescopic strip, the drying device main part can be extended out of the protection sleeve by using the extension and retraction of hydraulic rod two, the photoresist in the drying even photoresist coating device main part is dried, the drying device main part can be hidden in the base, reduce the floor area in the equipment layout, be suitable for the production environment with limited space, and at the same time, the drying device main part is protected in the protection sleeve when not in use, reduces the interference and potential damage of external environmental factors to the equipment.

[0004] The utility model also provides a device for even coating photoresist with above -mentioned one, include: base, the outer surface fixed connection of base has support frame, the outer surface fixed connection has even coating photoresist device main part in support frame, the lower bottom wall fixed connection of base has fixed frame, the upper surface rotation is connected to fixed frame and has rotary disc, the upper surface fixed connection of rotary disc has fixed column, the upper end fixed connection of fixed column has rotary seat, the inner wall movable joint of rotary disc has telescopic strip, the upper surface fixed connection of telescopic strip has hydraulic pressure rod no. 1, the output fixed connection of hydraulic pressure rod no. 1 has protective sleeve, the outer surface of protective sleeve is provided with fixed hole, the inner wall fixed connection of fixed hole has hydraulic pressure rod no. 2, the output fixed connection of hydraulic pressure rod no. 2 has drying device main part.

[0005] According to the device for even coating photoresist, the inner wall of the rotary seat is rotationally connected with a fixed strip, and the outer surface of the base is provided with a fixed groove, so that the fixed strip and the fixed groove are matched to provide stronger stability and prevent the rotary seat from moving when not in use.

[0006] According to the device for even coating photoresist, the lower surface of the rotary seat is in abutment with the upper surface of the base, and the lower surface of the rotary seat and the upper surface of the base are both smooth surfaces, so that the smooth surface design reduces friction between the two, helps smoothness during rotation, and improves operation efficiency.

[0007] According to the device for even coating photoresist, one end of the telescopic strip is fixedly connected with a baffle, and the outer surface of the baffle is movably connected with the base, so that the baffle design not only has functionality, but also helps to improve the appearance of the equipment, makes the entire device more clean and professional in vision, and the baffle can effectively block dust, chemicals or other external substances from entering the base.

[0008] According to the device for even coating photoresist, the drying device main part is located inside the protective sleeve, and the outer surface of the fixed column is rotationally connected with the base, so that protecting the drying device in the protective sleeve can effectively prevent dust, sundries or chemicals from invading, and prolong the service life of the equipment.

[0009] According to the device for even coating photoresist, the lower surface of the base and the outer surface of the rotary seat are both provided with anti-skid pads, the upper surface of the rotary seat is in abutment with the lower surface of the even coating photoresist device main part, and the anti-skid pads can effectively increase the friction between the base and the ground, prevent slipping during operation, and improve the stability of the equipment.

[0010] The utility model discloses a device for even coating photoresist, the outer surface of telescopic strip is connected with fixed frame slidingly, the outer surface of fixed strip is connected with fixed groove movably, sliding connection structure provides more smooth movement, improves overall operation efficiency.

[0011] The utility model discloses a device for even coating photoresist, the lower surface of telescopic strip is attached with base, and the attachment design improves the support of telescopic strip, and ensures the stability in telescopic process. Beneficial effects

[0012] The even coating photoresist device of the technical scheme, the rotary seat above the rotary base is rotated, the rotary disc connected with the rotary seat through the fixed column can rotate, the rotation of the rotary disc makes the telescopic strip connected with the rotary disc can be telescopic, the drying device main part is pushed out the base, and then the protection sleeve where the drying device main part is located is lifted through the hydraulic rod one on the telescopic strip, and the drying device main part can be stretched out from the protection sleeve by using the hydraulic rod two telescopic, and the photoresist in the even coating photoresist device main part is dried evenly.

[0013] The even coating photoresist device of the technical scheme, the drying device main part can be hidden in the base, reduces the floor area in the equipment layout, is suitable for the production environment of limited space, and at the same time, the drying device main part is protected in the protection sleeve when not being used, reduces the interference and potential damage of external environmental factors to the equipment. BRIEF DESCRIPTION OF DRAWINGS

[0014] The utility model is further explained in connection with the drawings and examples:

[0015] Figure 1 It is the overall structural drawing of even coating photoresist device of the utility model;

[0016] Figure 2 It is the base connection schematic view of even coating photoresist device of the utility model;

[0017] Figure 3 It is the rotary disc connection schematic view of even coating photoresist device of the utility model;

[0018] Figure 4 It is the telescopic strip connection schematic view of even coating photoresist device of the utility model.

[0019] Legend:

[0020] 1, base, 2, support frame, 3, even coating photoresist device main part, 4, fixed frame, 5, rotary disc, 6, fixed column, 7, rotary seat, 8, telescopic strip, 9, hydraulic rod one, 10, protection sleeve, 11, hydraulic rod two, 12, drying device main part, 13, baffle, 14, fixed strip, 15, fixed groove. DETAILED DESCRIPTION

[0021] This part will describe the specific embodiments of the utility model in detail, the preferred embodiment of the utility model is shown in the drawings, the role of the drawings is to supplement the description of the text part with graphics, so that people can intuitively and visually understand each technical feature and overall technical scheme of the utility model, but it cannot be understood as the limitation of the protection scope of the utility model.

[0022] Referring to Figures 1-4 , the utility model discloses a device for even coating photoresist, it includes: base 1 as the support foundation of entire device, provides stability, the outer surface of base 1 is fixedly connected with support frame 2, and the even coating photoresist device main part 3 is supported, the outer surface of support frame 2 is fixedly connected with even coating photoresist device main part 3, is responsible for even coating photoresist on substrate, ensures the thickness and uniformity of photoresist film, the lower bottom wall of base 1 is fixedly connected with fixed frame 4, cooperates with rotary disc 5, so that telescopic strip 8 can be telescopic, the upper surface of fixed frame 4 is rotatably connected with rotary disc 5, cooperates with fixed frame 4, so that telescopic strip 8 can be telescopic, the upper surface of rotary disc 5 is fixedly connected with fixed column 6, connects rotary disc 5 and rotary seat 7, the upper end of fixed column 6 is fixedly connected with rotary seat 7, through the rotation of itself, makes rotary disc 5 connected with fixed column 6 can rotate, the inner wall of rotary disc 5 is movably connected with telescopic strip 8, can extend drying device main part 12 out of base 1, the upper surface of telescopic strip 8 is fixedly connected with hydraulic rod one 9, can raise protective sleeve 10, the output end of hydraulic rod one 9 is fixedly connected with protective sleeve 10, protects internal drying device main part 12, the outer surface of protective sleeve 10 is provided with fixed hole, the inner wall of fixed hole is fixedly connected with hydraulic rod two 11, can extend drying device main part 12 out of protective sleeve 10, the output end of hydraulic rod two 11 is fixedly connected with drying device main part 12, and it can be heated plate, can dry photoresist coated on substrate, and the outer surface is installed with cover plate, and the cover plate is abutted with protective sleeve 10.

[0023] The inner wall of the rotating seat 7 is rotationally connected with a fixing strip 14, which cooperates with a fixing groove 15 to prevent the rotating seat 7 from moving when not in use. The outer surface of the base 1 is provided with the fixing groove 15, which cooperates with the fixing strip 14 to prevent the rotating seat 7 from moving when not in use. The lower surface of the rotating seat 7 abuts against the upper surface of the base 1, and the lower surface of the rotating seat 7 and the upper surface of the base 1 are both smooth surfaces. One end of the telescopic strip 8 is fixedly connected with a baffle 13, which improves the appearance of the equipment and prevents pollution and damage. The outer surface of the baffle 13 is movably connected with the base 1. The position of the drying device main body 12 is located inside the protective sleeve 10. The outer surface of the fixing column 6 is rotationally connected with the base 1. The lower surface of the base 1 and the outer surface of the rotating seat 7 are both provided with anti-skid pads. The upper surface of the rotating seat 7 is attached to the lower surface of the photoresist coating device main body 3. The outer surface of the telescopic strip 8 is slidingly connected with the fixing frame 4. The outer surface of the fixing strip 14 is movably connected with the fixing groove 15. The lower surface of the telescopic strip 8 is attached to the base 1.

[0024] Working principle: when in use, the fixing strip 14 on the rotating seat 7 is turned out of the fixing groove 15 of the base 1, so that the rotating seat 7 can rotate. The rotating seat 7 above the base 1 is further rotated, so that the rotating disc 5 connected with the rotating seat 7 through the fixing column 6 can rotate. The rotation of the rotating disc 5 enables the telescopic strip 8 connected with the rotating disc 5 to be telescopic. The drying device main body 12 is pushed out of the base 1. The protective sleeve 10 in which the drying device main body 12 is located is lifted through the hydraulic rod one 9 on the telescopic strip 8. The drying device main body 12 can be extended out of the protective sleeve 10 by telescoping the hydraulic rod two 11, so as to dry the photoresist in the photoresist coating device main body 3.

[0025] The above describes the embodiments of the present application in detail in combination with the drawings, but the present application is not limited to the above embodiments. Various changes can be made within the knowledge of those skilled in the art without departing from the spirit of the present application.

Claims

1. An apparatus for uniformly coating photoresist, characterized in that, include: A base (1) is fixedly connected to a support frame (2) on its outer surface. A photoresist coating device body (3) is fixedly connected to the outer surface of the support frame (2). A fixing frame (4) is fixedly connected to the bottom wall of the base (1). A rotating disk (5) is rotatably connected to the upper surface of the fixing frame (4). A fixing column (6) is fixedly connected to the upper surface of the rotating disk (5). A rotating seat (7) is fixedly connected to the upper end of the fixing column (6). A telescopic strip (8) is movably connected to the inner wall of the rotating disk (5). A hydraulic rod (9) is fixedly connected to the upper surface of the telescopic strip (8). A protective sleeve (10) is fixedly connected to the output end of the hydraulic rod (9). A fixing hole is provided on the outer surface of the protective sleeve (10). A hydraulic rod (11) is fixedly connected to the inner wall of the fixing hole. A drying device body (12) is fixedly connected to the output end of the hydraulic rod (11).

2. The apparatus for uniformly coating photoresist according to claim 1, characterized in that, The inner wall of the rotating seat (7) is rotatably connected to a fixing strip (14), and the outer surface of the base (1) is provided with a fixing groove (15).

3. The apparatus for uniformly coating photoresist according to claim 1, characterized in that, The lower surface of the rotating seat (7) abuts against the upper surface of the base (1), and both the lower surface of the rotating seat (7) and the upper surface of the base (1) are smooth surfaces.

4. The apparatus for uniformly coating photoresist according to claim 1, characterized in that, One end of the telescopic strip (8) is fixedly connected to a baffle (13), and the outer surface of the baffle (13) is movably connected to the base (1).

5. The apparatus for uniformly coating photoresist according to claim 1, characterized in that, The main body (12) of the drying device is located inside the protective sleeve (10), and the outer surface of the fixed column (6) is rotatably connected to the base (1).

6. The apparatus for uniformly coating photoresist according to claim 1, characterized in that, The lower surface of the base (1) and the outer surface of the rotating seat (7) are both provided with anti-slip pads, and the upper surface of the rotating seat (7) is in contact with the lower surface of the body (3) of the uniformly coated photoresist device.

7. The apparatus for uniformly coating photoresist according to claim 2, characterized in that, The outer surface of the telescopic strip (8) is slidably connected to the fixing frame (4), and the outer surface of the fixing strip (14) is movably connected to the fixing groove (15).

8. The apparatus for uniformly coating photoresist according to claim 1, characterized in that, The lower surface of the telescopic strip (8) is in contact with the base (1).

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