Gluing developing machine

Abstract

The utility model provides a gluing developing machine which comprises a gluing unit, a developing unit and a control unit which are electrically connected, the developing unit comprises a liquid supply tank, the interior of the liquid supply tank is hollow, a telescopic inner bag is installed in the liquid supply tank, a liquid inlet communicated with a developing liquid supply pipeline is formed in the bottom of the telescopic inner bag, and a liquid outlet communicated with the developing liquid supply pipeline is formed in the bottom of the telescopic inner bag. A liquid outlet communicated with the developing liquid nozzle end is formed in the top of the developing box; a cavity between the liquid supply tank and the telescopic inner bag is filled with gas, and a gas supply pipeline communicated with the interior of the liquid supply tank is arranged on the tank wall of the liquid supply tank; according to the developing liquid supply device, supply of the developing liquid can be achieved through gas pressurization under the non-contact condition, the situation that the developing liquid is dissolved into gas in the pressurized liquid supply process is avoided, the undesirable phenomena such as small black spots of wafers are prevented, the yield is increased, and the production quality is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to a semiconductor technical field especially relates to a kind of gluing developing machine. BACKGROUND

[0002] Photoetching is a vital link in chip manufacturing process, it utilizes photochemical reaction principle, and with photoresist (also known as photoetching glue) the pattern on mask is transferred to substrate. Photoetching process mainly includes gluing, exposure, developing three processes, and developing is the last step of photoetching, developing refers to the developing liquid is coated on the wafer surface after exposure, the exposure area of positive glue and the non-exposure area of negative glue are dissolved in developing liquid, further after the reaction polymer and developing liquid residue are flushed, the pattern in photoetching glue can be shown;Generally speaking, gluing and developing two processes are completed by gluing developing machine, and exposure is completed by photoetching machine.

[0003] As Figure 1 It is the structure block diagram of prior art's gluing developing machine, and gluing developing machine generally includes gluing unit, developing unit and control unit, as Figure 2 It is the structure schematic diagram of prior art's developing unit, and the developing unit in prior art generally adopts the way that developing liquid supply tank is used with inert gas (such as nitrogen) pressurized supply, and factory end developing liquid supply pipeline is directly supplied to the standby tank to high liquid level, and gas is filled into standby tank to extrude developing liquid to supply tank to medium liquid level, when control unit sends liquid signal, gas is filled into supply tank to make developing liquid flow to developing liquid nozzle, and the spraying of developing liquid is realized.

[0004] The above-mentioned way of supplying liquid by gas pressurizing in supply tank directly can cause developing liquid to dissolve into gas, for example, the use of nitrogen pressurization can cause developing liquid to dissolve nitrogen, and when gas exists in developing liquid and is sprayed to wafer surface for developing, because of the bubbles of gas existing in developing liquid, it can cause small black spots on wafer, so that wafer part is not developed well, and the yield is reduced, and the production quality is affected. UTILITY MODEL CONTENTS

[0005] The utility model provides a kind of gluing developing machine, and using non-contact gas pressurized liquid supply mode, it can realize stable, high-quality developing liquid supply, and improve production quality.

[0006] The application discloses a kind of gumming developing machines, including electrically connected gumming unit, developing unit and control unit, the developing unit includes liquid supply tank, the inside hollow of liquid supply tank, and retractable inner capsule is installed, the bottom of retractable inner capsule is provided with the liquid inlet that is communicated with developing liquid supply pipeline, and the top is provided with the liquid outlet that is communicated with developing liquid nozzle end;The cavity between the liquid supply tank and retractable inner capsule is filled with gas, and the tank wall of the liquid supply tank is provided with the gas supply pipeline that is communicated with the inside of the liquid supply tank.

[0007] Further, the gas flow regulating device is provided on the gas supply pipeline, and the gas flow regulating device is electrically connected with the control unit, so that the gas supply of the gas supply pipeline can be controlled.

[0008] Further, the gas flow regulating device is an electromagnetic valve.

[0009] Further, the liquid inlet of the retractable inner capsule is provided with a liquid supply switch, and the liquid supply switch is electrically connected with the control unit, so that the opening and closing of the liquid inlet can be controlled.

[0010] Further, the bottom of the liquid supply tank is provided with a liquid leakage detector for detecting liquid, and the liquid leakage detector is electrically connected with the control unit.

[0011] Further, the number of the liquid leakage detectors is at least two, and the liquid leakage detectors are uniformly distributed on the outer edge of the bottom of the retractable inner capsule.

[0012] Further, the cavity of the liquid supply tank is provided with a pressure detector for detecting the gas pressure in the tank, and the pressure detector is electrically connected with the control unit.

[0013] Further, the retractable inner capsule is made of PFA material with high strength and corrosion resistance.

[0014] Further, the wall thickness of the retractable inner capsule is between 0.5 mm and 2 mm.

[0015] Further, the gas filled in the cavity between the liquid supply tank and the retractable inner capsule is nitrogen.

[0016] The gumming developing machine provided by the application can supply developing liquid by gas pressurization without contact, avoid the situation that developing liquid is dissolved in gas during pressurized liquid supply, and prevent wafers from generating small black spots and other adverse phenomena. Furthermore, the electric connection between the gas flow regulating device, the liquid supply switch, the liquid leakage detector, the pressure detector and the control unit can realize precise liquid supply, improve the yield, and improve the production quality. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 is a structural block diagram of a glue coating and developing machine of the prior art.

[0018] Figure 2 is a structural diagram of a developing unit of the prior art.

[0019] Figure 3 is a structural block diagram of a glue coating and developing machine provided by the present embodiment.

[0020] Figure 4 is a structural diagram of a developing unit provided by the present embodiment.

[0021] Figure 5 is a structural diagram of a developing unit provided by the present embodiment.

[0022] The reference signs are as follows: 1 is a glue coating unit, 2 is a developing unit, 21 is a liquid supply tank, 211 is a standby tank, 212 is a supply tank, 22 is an extendable inner bag, 23 is a developing liquid supply pipeline, 24 is a developing liquid nozzle end, 25 is a gas supply pipeline, 26 is a gas flow adjusting device, 27 is a liquid supply switch, 28 is a liquid leakage detector, 29 is a pressure detector, and 3 is a control unit. DETAILED DESCRIPTION

[0023] The specific embodiments of the present application will be further described below with reference to the drawings. In order to facilitate the description, the terms "front", "back", "positive", "negative", "left", "right", "top", "bottom", "up", "down", "inner", "outer", "inside", etc. in the present application indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application and the actual orientation of the products or devices in the process of production, use, sale, etc. In addition, in the embodiments of the present application, unless otherwise explicitly specified and limited, the terms "mounting", "setting", "connecting", "fixing", "comprising", etc. should be understood in a broad sense, for example, can be fixedly connected, can be detachably connected, or can be integrated; can be directly connected, or can be indirectly connected through an intermediate medium. For ordinary skilled persons in the art, the specific meanings of the above terms in the present application can be understood according to the specific circumstances.

[0024] As Figure 1 shown is a structural block diagram of a glue coating and developing machine of the prior art, in which COT refers to glue coating, DEV refers to developing, and the glue coating and developing machine generally comprises a glue coating unit 1, a developing unit 2, and a control unit 3 for controlling the glue coating and developing process, as Figure 2As shown in the prior art development unit structure diagram, the development unit in the prior art generally adopts a development liquid supply tank 21 one standby one-way gas (such as nitrogen and other inert gases) pressurized liquid supply mode, and a factory service end development liquid supply pipeline 23 directly supplies the development liquid to the standby tank 211 above the high liquid level, and the gas is filled into the standby tank 211 to press the development liquid flow to the supply tank 212 above the medium liquid level, and when the control unit 3 sends a liquid signal, the gas is filled into the supply tank 212 to make the development liquid flow to the development liquid nozzle end 24, and the spraying of the development liquid is realized, but the pressurized liquid supply mode of the gas directly contacting with the development liquid can cause the development liquid to dissolve into the gas, so that small bubbles exist in the development liquid, which can cause small black spots on the wafer, thereby causing partial development of the wafer to be poor, reducing the yield, and affecting the production quality.

[0025] The utility model provides a kind of gluing developing machine, adopts non-contact gas pressurized liquid supply mode, can realize stable, high-quality development liquid supply, improve production quality.

[0026] Specifically, as shown in Figure 3 The gluing developing machine includes electrically connected gluing unit 1, developing unit 2 and control unit 3, wherein:

[0027] The gluing unit 1 is used to uniformly coat the liquid photoresist on the wafer surface, and ensure the thickness and quality of the photoresist layer through heating and other means, to prepare for the subsequent process;

[0028] The photolithography machine or exposure machine uses ultraviolet or other radiation sources to accurately transfer the circuit pattern to the wafer coated with photoresist through a mask, changing the chemical properties of the photoresist;

[0029] The developing unit 2 uses a specific chemical solution to remove the unexposed or exposed part of the photoresist, forms the required fine pattern, and performs cleaning and drying treatment to remove residues and ensure the cleanliness of the wafer;

[0030] The control unit 3 is responsible for controlling the entire processing process, and ensures the accuracy and consistency of operation by setting and monitoring process parameters, collecting data and providing user interface, while ensuring the safe operation of the equipment.

[0031] Among them, as shown in Figure 4As shown, the developing unit 2 comprises a liquid supply tank 21, which is hollow inside and is provided with a retractable inner capsule 22, the bottom of the retractable inner capsule 22 is provided with a liquid inlet communicating with a developing liquid supply pipeline 23, and the top of the retractable inner capsule 22 is provided with a liquid outlet communicating with a developing liquid nozzle end 24, the liquid inlet and the liquid outlet can be provided on the same side, or as shown in the embodiment, provided on the symmetric side, or provided on other different sides, which is not limited here; the cavity between the liquid supply tank 21 and the retractable inner capsule 22 is filled with gas, and the tank wall of the liquid supply tank 21 is provided with a gas supply pipeline 25 communicating with the inside of the liquid supply tank 21, preferably, the gas filled between the liquid supply tank 21 and the retractable inner capsule 22 is inert gas.

[0032] With the above structure of the glue developing machine, through the cooperation between the liquid supply tank 21, the retractable inner capsule 22, the developing liquid supply pipeline 23, the developing liquid nozzle end 24 and the gas supply pipeline 25, when liquid supply is needed for spraying, the control unit 3 sends a liquid supply signal, such as Figure 5 As shown, the gas is filled into the liquid supply tank 21 through the gas supply pipeline 25, so that the cavity between the liquid supply tank 21 and the retractable inner capsule 22 has a larger gas pressure, and the retractable inner capsule 22 is extruded under the action of the pressure difference, so that the retractable inner capsule 22 deforms, so that the developing liquid in the retractable inner capsule 22 is extruded and flows into the developing liquid nozzle end 24 through the liquid outlet at the top of the developing liquid nozzle end 24 for spraying; so that the supply of developing liquid can be realized by gas pressure in a non-contact manner, which can avoid the situation that developing liquid dissolves into gas during the process of pressurized liquid supply, prevent the wafer from having small black spots and other defects, and thus improve the yield and production quality.

[0033] In some embodiments, the gas flow regulating device 26 is provided on the gas supply pipeline 25, and the gas flow regulating device 26 is electrically connected with the control unit 3, and the gas flow regulating device 26 can control the gas supply of the gas supply pipeline 25, such as the opening and closing of the gas supply pipeline 25, the gas supply amount, the gas supply speed, etc., according to the control signal of the control unit 3.

[0034] With the above structure of the glue developing machine, by providing the gas flow regulating device 26 electrically connected with the control unit 3 on the gas supply pipeline 25, the control of pressurized liquid supply can be more accurate, so that the liquid supply speed and the liquid supply amount of the developing liquid can meet the actual needs.

[0035] In some embodiments, the gas flow regulating device 26 is an electromagnetic valve, which can realize fast and accurate opening and closing actions, can fine-tune the gas flow, and can ensure stable and controllable gas supply pressure and flow, which is particularly important for photolithography processes that require high consistency and can improve product yield and quality. At the same time, the electromagnetic valve also has high reliability and high safety, which can ensure efficient, stable and safe operation of the pressurized liquid supply process.

[0036] In some embodiments, a liquid supply switch 27 is arranged at the liquid inlet of the retractable inner bag 22, and the liquid supply switch 27 is electrically connected to the control unit 3 to control the opening and closing of the liquid inlet.

[0037] With the above structure of the glue coating and developing machine, the liquid supply switch 27 arranged at the liquid inlet of the retractable inner bag 22 is electrically connected to the control unit 3. When there is no need for liquid supply, the liquid supply switch 27 is in a closed state, and the liquid inlet is closed. After receiving the liquid supply signal from the control unit 3, the liquid supply switch 27 is opened to open the liquid inlet, so that the developing liquid continuously enters the retractable inner bag 22 through the liquid inlet to continuously and stably supply liquid, which can further improve the stability and reliability of the liquid supply of the glue coating and developing machine.

[0038] In some embodiments, a liquid leakage detector 28 is installed at the bottom of the liquid supply tank 21, and the liquid leakage detector 28 is electrically connected to the control unit 3. The liquid leakage detector 28 can be used to detect the presence of liquid. If it is detected that liquid leaks from the retractable inner bag 22 to the bottom of the liquid supply tank 21, a signal is fed back to the control unit 3 for alarm.

[0039] With the above structure of the glue coating and developing machine, the liquid leakage detector 28 installed at the bottom of the liquid supply tank 21 can monitor the integrity of the retractable inner bag 22 in real time. If the liquid leakage detector 28 alarms when liquid is detected, it indicates that the retractable inner bag 22 is damaged and needs to be repaired, thereby improving the reliability of the glue coating and developing machine.

[0040] In some embodiments, the number of liquid leakage detectors 28 is at least two, and they are uniformly distributed on the outer edge of the bottom of the retractable inner bag 22. As shown in this embodiment, the number of liquid leakage detectors 28 is two, which are arranged on the left and right sides of the outer edge of the bottom of the retractable inner bag 22. If the number of liquid leakage detectors 28 is three, they should be uniformly distributed at 120° on the outer edge of the bottom of the retractable inner bag 22. If the number of liquid leakage detectors 28 is four, they should be uniformly distributed at 90° on the outer edge of the bottom of the retractable inner bag 22.

[0041] The glue coating and developing machine with the above structure can make the leakage detection more comprehensive, fast and accurate, and further improve the reliability of the glue coating and developing machine, by the fact that the number of the leakage detectors 28 is at least two and they are uniformly distributed on the outer edge of the bottom of the telescopic inner capsule 22.

[0042] In some embodiments, a pressure detector 29 is installed in the cavity of the liquid supply tank 21, and is electrically connected with the control unit 3, so as to detect the air pressure in the liquid supply tank 21 and feed back the detection to the control unit 3.

[0043] The glue coating and developing machine with the above structure can make the control of the pressurized liquid supply more accurate, thereby improving the reliability of the glue coating and developing machine, by the fact that the pressure detector 29 for detecting the air pressure in the tank is installed in the liquid supply tank 21, so that the air supply of the air supply pipeline 25 can be adjusted according to the air pressure in the tank.

[0044] In some embodiments, the telescopic inner capsule 22 is made of PFA material with high strength and corrosion resistance. PFA material is a highly fluorinated polymer, which has the following advantages: (1) excellent chemical stability, can resist the corrosion of all common chemicals, including strong acid, strong base, oxidizing agent and organic solvent; (2) good mechanical strength, can withstand repeated stretching and compression without being easily damaged or deformed; (3) the surface of PFA material is smooth, the friction coefficient is extremely low and it is not easy to adhere to substances, which helps to prevent the developer from remaining on the inner wall of the container, ensures accurate dosage every time, and reduces waste.

[0045] In some embodiments, the wall thickness of the telescopic inner capsule 22 is between 0.5mm and 2mm. Within this thickness range, the telescopic inner capsule 22 can maintain sufficient mechanical strength to withstand internal pressure changes and external mechanical stress, avoid material waste and cost increase caused by excessive thickness, and ensure good flexibility and elasticity of the telescopic inner capsule 22, so that it can smoothly perform telescopic action and adapt to frequent pressure changes without being easily damaged or losing elasticity, achieving a balance in mechanical properties, durability, response speed and cost control.

[0046] In some embodiments, the gas filled in the cavity between the liquid supply tank 21 and the telescopic inner capsule 22 is nitrogen. Nitrogen is an inert gas that does not react with the developer, and it is non-toxic and non-flammable, reducing potential safety risks.

[0047] The above embodiments are only preferred embodiments of the present application, and do not limit the scope of the application. Any equivalent changes made in accordance with the shape, structure and principle of the present application shall be covered within the protection scope of the present application.

Claims

1. A coating and developing machine, comprising a coating unit (1), a developing unit (2), and a control unit (3) electrically connected, characterized in that, The developing unit (2) includes a liquid supply tank (21), which is hollow inside and has a retractable inner bladder (22). The bottom of the retractable inner bladder (22) is provided with an inlet that communicates with the developing liquid supply pipeline (23), and the top is provided with an outlet that communicates with the developing liquid nozzle end (24). The cavity between the liquid supply tank (21) and the retractable inner bladder (22) is filled with gas, and the tank wall of the liquid supply tank (21) is provided with a gas supply pipeline (25) that communicates with the inside of the liquid supply tank (21).

2. The coating and developing machine according to claim 1, characterized in that, A gas flow regulating device (26) is provided on the gas supply pipeline (25). The gas flow regulating device (26) is electrically connected to the control unit (3) and can control the gas supply status of the gas supply pipeline (25).

3. The coating and developing machine according to claim 2, characterized in that, The gas flow regulating device (26) is a solenoid valve.

4. The coating and developing machine according to claim 1, characterized in that, The retractable inner bladder (22) is provided with a liquid supply switch (27) at the liquid inlet. The liquid supply switch (27) is electrically connected to the control unit (3) and can control the opening and closing of the liquid inlet.

5. The coating and developing machine according to claim 1, characterized in that, The liquid supply tank (21) is equipped with a liquid leak detector (28) at the bottom, and the liquid leak detector (28) is electrically connected to the control unit (3).

6. The coating and developing machine according to claim 5, characterized in that, The number of leakage detectors (28) is at least two, and they are evenly distributed on the outer edge of the bottom of the retractable inner bladder (22).

7. The coating and developing machine according to claim 1, characterized in that, A pressure detector (29) capable of detecting the gas pressure inside the liquid supply tank (21) is installed inside the cavity. The pressure detector (29) is electrically connected to the control unit (3).

8. The coating and developing machine according to claim 1, characterized in that, The retractable inner capsule (22) is made of high-strength, corrosion-resistant PFA material.

9. The coating and developing machine according to claim 2, characterized in that, The wall thickness of the retractable inner capsule (22) is between 0.5 mm and 2 mm.

10. The coating and developing machine according to any one of claims 1-9, characterized in that, The cavity between the liquid supply tank (21) and the retractable inner bladder (22) is filled with nitrogen gas.

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