Deviation detection tool for substrate to be coated and substrate coating treatment device
By uniformly distributing distance measuring units on the cavity cover body to acquire distance data, the problem of inaccurate determination of the position of the substrate to be coated in the prior art is solved, thereby improving the quality of the thin film and making the operation more convenient.
Patent Information
- Application Number
- CN202520007914.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-02
- Publication Date
- 2025-12-05
- Estimated Expiration
- 2035-01-02
AI Technical Summary
In existing technologies, visual inspection is not an accurate method for determining whether the substrate to be coated is within the target area in the chamber, resulting in poor film quality.
At least three ranging units are evenly distributed on the cavity cover body to obtain distance data between the unit and the obstruction in the substrate coating process cavity, and the processing unit determines whether the substrate to be coated is offset, so as to achieve accurate position correction.
This improves the quality and ease of operation of thin film preparation, ensuring that the substrate to be coated is accurately located in the target area before coating, thus avoiding film inhomogeneity.
Smart Images
Figure CN223633462U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application belongs to the technical field of semiconductor, and relates to a chemical vapor deposition technology, in particular to a substrate film plating offset detection tool and a substrate film plating processing device. BACKGROUND
[0002] The chemical vapor deposition technology is a thin film deposition technology. A substrate to be plated is placed in a sealed chamber, and a gaseous reactant, i.e., a reaction gas, is introduced into the chamber to react on the surface of the substrate to be plated to form a thin film. It should be noted that since the reaction gas is generally introduced into the chamber through a gas inlet arranged at the center of the top of the chamber, the distribution of the reaction gas in the chamber is not uniform. In order to form a relatively uniform and high-quality film layer on the surface of the substrate to be plated, the substrate to be plated needs to be placed in a target area at the bottom of the chamber, wherein the target area is an area within a preset range of the center position.
[0003] In the prior art, a transparent window is generally opened on the chamber cover of the chamber, and an operator observes the position of the substrate to be plated to determine whether it is in the target area. However, since the visual inspection method has deviation and low accuracy, the position of the substrate to be plated may deviate from the target area, thereby affecting the quality of the thin film.
[0004] Therefore, how to determine whether the position of the substrate to be plated in the chamber is in the target area is an urgent problem to be solved by those skilled in the art. SUMMARY
[0005] The present application aims to provide a substrate film plating offset detection tool and a substrate film plating processing device to solve the problem in the prior art that the visual inspection method has deviation and cannot accurately determine whether the position of the substrate to be plated in the chamber is in the target area, thereby affecting the substrate film plating effect.
[0006] In a first aspect, the present application provides a substrate film plating offset detection tool, comprising: a chamber cover body, a region corresponding to the position and size of a target area in a substrate film plating processing chamber is set as an ideal region on the chamber cover body, and the target area is a circular placement area for a substrate to be plated when the substrate is plated in the substrate film plating processing chamber;
[0007] At least three distance measuring units are arranged on the chamber cover body, and all the distance measuring units are uniformly distributed along the boundary of the ideal region. The distance measuring units are used to obtain distance data between the distance measuring units and a blocking object in the vertical direction in the substrate film plating processing chamber;
[0008] A processing unit is in communication connection with all the distance measuring units, receives the distance data of the distance measuring units, and determines whether the substrate to be plated in the substrate film plating processing chamber is offset based on the distance data.
[0009] In the present application, the distance data is obtained by the distance measuring units uniformly arranged along the boundary of the ideal region and sent to the processing unit, and the position of the substrate to be coated is determined to ensure that the substrate to be coated is in the target region before coating, so as to obtain uniform film, thereby effectively improving the preparation quality of the film.
[0010] In an embodiment of the present application, the radius of the ideal region is greater than or equal to the radius of the substrate to be coated, and the difference between the radius of the ideal region and the radius of the substrate to be coated is a preset length.
[0011] In an embodiment of the present application, the preset length is 1mm.
[0012] In an embodiment of the present application, the cavity cover body is provided with a set of observation windows, and the set of observation windows includes at least one transparent observation window.
[0013] In an embodiment of the present application, the set of observation windows includes one observation window, and the boundary of the observation window coincides with the boundary of the ideal region.
[0014] In an embodiment of the present application, the set of observation windows includes at least three observation windows, all of which are uniformly arranged around the center position of the cavity cover body, and the center positions of all the observation windows are located on the boundary of the ideal region. The distance measuring units and the observation windows have a one-to-one correspondence, and each distance measuring unit is located at the center position of the corresponding observation window.
[0015] In an embodiment of the present application, the set of observation windows includes four observation windows.
[0016] In an embodiment of the present application, the processing unit includes a communication subunit and a data processing subunit connected to each other.
[0017] In an embodiment of the present application, all the distance measuring units include laser range finders.
[0018] In a second aspect, the present application provides a substrate coating processing device, comprising:
[0019] A substrate coating processing chamber and a detection cavity cover matched and arranged at the opening of the substrate coating processing chamber.
[0020] The detection cavity cover is a substrate offset detection tool as described above.
[0021] As described above, this application provides a substrate offset detection tool and a substrate coating processing apparatus. By using at least three ranging units evenly distributed on the boundary of an ideal region, it acquires distance data between the measuring units and obstacles within the substrate coating processing chamber in the vertical direction. A processing unit then determines whether the substrate to be coated within the coating processing chamber has shifted based on this distance data. This method offers high accuracy and convenient operation, effectively improving the quality of the prepared thin film. Furthermore, the substrate offset detection tool provided in this application also includes an observation window group on the chamber cover body for observing the approximate position of the substrate to be coated, avoiding incorrect position determination due to excessive substrate deviation, and further improving the accuracy of substrate position determination. Attached Figure Description
[0022] Figure 1 The diagram shown is a structural schematic of a substrate offset detection tool according to an embodiment of this application.
[0023] Figure 2 The diagram shown is a schematic representation of an ideal area setting method as described in an embodiment of this application.
[0024] Figure 3 The diagram shown is a schematic diagram illustrating the ranging principle of a ranging unit as described in an embodiment of this application.
[0025] Figure 4 The diagram shown is a schematic diagram illustrating the ranging principle of another ranging unit described in this application embodiment.
[0026] Figure 5 The diagram shown is a structural schematic of another substrate offset detection tool described in an embodiment of this application.
[0027] Figure 6 The diagram shown is a structural schematic of another substrate offset detection tool described in an embodiment of this application.
[0028] Component designation explanation
[0029] 100 Cavity Cover Body
[0030] 110 Ideal Area
[0031] 120 Observation Window Group
[0032] 121 Observation Window
[0033] 200 ranging units
[0034] 300 processing units
[0035] 400 Substrate to be coated
[0036] 500 target areas DETAILED DESCRIPTION
[0037] The above objects and advantages of the present application will be more clearly understood from the following detailed description when taken in conjunction with the accompanying drawings, in which:
[0038] It is noted that the drawings of the embodiments provided herein are only schematic and are non-limiting respective of the scope of the application. The drawings in the various figures are not drawn to scale and certain components may have been exaggerated to illustrate aspects of the embodiments, and so serve to provide a conceptual understanding of aspects of the application.
[0039] The embodiments of the present application provide a substrate film deposition processing device and a substrate film deposition processing chamber for determining whether a substrate to be deposited is located in a target area in the substrate film deposition processing chamber. Generally, in order to form a more uniform film on the surface of the substrate, the substrate to be deposited is placed in the target area in the substrate film deposition processing chamber, and then the film is deposited by chemical vapor deposition. Specifically, the target area is usually an area within a predetermined range of the center of the bottom of the substrate film deposition processing chamber, and the diameter of the range is greater than the diameter of the substrate to be deposited. In the prior art, the position of the substrate to be deposited is usually corrected by visual inspection. However, this method has a large error and low accuracy, which affects the quality of the film deposited on the substrate. Therefore, the embodiments of the present application provide a substrate film deposition processing device and a substrate film deposition processing chamber for determining whether a substrate to be deposited is located in a target area in the substrate film deposition processing chamber. The distance measuring unit measures the distance before and after the substrate to be deposited is placed in the substrate film deposition processing chamber, and then determines whether the substrate to be deposited is located in the target area based on the measured distance data. This improves the accuracy of the determination and solves the problem of low accuracy of the determination of the position of the substrate to be deposited in the prior art. It avoids the influence of the position of the substrate to be deposited on the quality of the film formed, thereby achieving better film deposition effect on the substrate.
[0040] The principles and implementations of a substrate film deposition processing device and a substrate film deposition processing chamber according to the embodiments of the present application will be described in detail below with reference to the accompanying drawings, so that those skilled in the art can understand the substrate film deposition processing device and the substrate film deposition processing chamber of the embodiments of the present application without creative labor.
[0041] The embodiments of the present application provide a detection chamber cover of a substrate film deposition processing chamber, which is applied to the substrate film deposition processing chamber to determine the position of a substrate to be deposited 400 in the substrate film deposition processing chamber.
[0042] Specifically, as shown in Figure 1 The film deposition substrate offset detection tool comprises: a cavity cover body 100, on which an ideal area 110 is arranged; at least three distance measuring units 200 arranged on the cavity cover body 100, and all the distance measuring units 200 are distributed on the boundary of the ideal area 110, and are used to obtain the distance data between the distance measuring units 200 and the blocking object in the film deposition substrate processing chamber in the vertical direction, i.e. to obtain the distance data between the distance measuring units 200 and the bottom of the film deposition substrate processing chamber or the film deposition substrate 400, specifically, when the film deposition substrate 400 is not in the vertical direction of the distance measuring unit 200, the distance measuring unit 200 is used to measure the distance to the bottom of the film deposition substrate processing chamber in the vertical direction as the distance data, and when the film deposition substrate 400 is in the vertical direction of the distance measuring unit 200, the distance measuring unit 200 is used to measure the distance to the film deposition substrate 400 in the vertical direction as the distance data; a processing unit 300, which is respectively connected in communication with all the distance measuring units 200, so as to receive the distance data of the distance measuring units 200, and to determine whether the film deposition substrate 400 in the film deposition substrate processing chamber is offset based on the distance data; specifically, the processing unit 300 comprises a communication subunit and a data processing subunit connected with each other, wherein the communication subunit is used to receive the distance data of the distance measuring units 200, so that the data processing subunit determines the position of the film deposition substrate 400 based on the distance data.
[0043] It should be noted that, as shown in Figure 2 The ideal area 110 is an area corresponding to the target area 500 in position and size, wherein the target area 500 is the placement area of the film deposition substrate 400 in the film deposition substrate processing chamber when the film deposition substrate 400 is deposited, i.e. when the film deposition substrate 400 is located in the target area 500, the film deposition substrate 400 is deposited to obtain a more uniform and higher quality film. Exemplarily, as shown in Figure 5 The target area 500 is a circular area, and the ideal area 110 is an area on the cavity cover body 100 located directly above the target area 500 and equal in size to the target area 500.
[0044] Further, the radius of the target area 500 is generally greater than or equal to the radius of the film deposition substrate 400, so the radius of the ideal area 110 is greater than or equal to the radius of the film deposition substrate 400. Specifically, the difference between the radius of the ideal area 110 and the radius of the film deposition substrate 400 is a preset length, so as to obtain the size of the ideal area 110. The preset length is a length obtained based on the difference between the radius of the target area 500 and the radius of the film deposition substrate 400, and exemplarily, the preset length is 1 mm.
[0045] For the person skilled in the art to understand the film deposition substrate offset detection tool provided by the present application, the specific embodiments and principles of the film deposition substrate offset detection tool determining the position of the film deposition substrate 400 are described below.
[0046] It should be noted that the film deposition substrate offset detection tool provided by the present application is arranged on the mouth of the film deposition substrate processing chamber, i.e., as the cavity cover of the film deposition substrate processing chamber.
[0047] Before the film deposition substrate 200 is put into the film deposition substrate processing chamber, each distance measuring unit 200 obtains the corresponding distance data, i.e., the distance from each distance measuring unit 200 to the bottom of the film deposition substrate processing chamber, and sends it to the processing unit 300 as reference data.
[0048] After the film deposition substrate 200 is put into the film deposition substrate processing chamber, each distance measuring unit 200 re-obtains the corresponding distance data and sends it to the processing unit 300 again as comparison data.
[0049] The processing unit 300 compares the reference data and the comparison data to determine whether the film deposition substrate in the film deposition substrate processing chamber is in the target area. Specifically, when the film deposition substrate 400 is in the target area 500, as shown by the solid line in the middle of the film deposition substrate 400, since the distance measuring unit 200 is arranged on the boundary of the ideal area 110, the distance between it in the vertical direction and the blocking object in the film deposition substrate processing chamber is actually the distance from the distance measuring unit 200 to the bottom of the film deposition substrate processing chamber, i.e., the comparison data is the same as the reference data; when the film deposition substrate 400 deviates from the target area 500, i.e., the film deposition substrate 400 at least partially exceeds the target area 500, as shown by the dashed line in the middle of the film deposition substrate 400, the distance measuring unit 200 above the part of the film deposition substrate 400 exceeding the target area 500, the distance between it in the vertical direction and the blocking object in the film deposition substrate processing chamber is actually the distance from the distance measuring unit 200 to the film deposition substrate 400, so the comparison data is actually smaller than the reference data. Figures 3-4 Figures 3-4
[0050] Based on this, the distance data of all distance measuring units 200 before and after the film deposition substrate 200 is put into the film deposition substrate processing chamber is obtained, if the distance data remains unchanged, i.e., the comparison data and the reference data of all distance measuring units 200 are the same, the film deposition substrate 400 is in the target area 500, and the subsequent film growth step can be performed; if the distance data of at least one distance measuring unit 200 changes, i.e., the comparison data and the reference data are different, the film deposition substrate 400 deviates from the target area 500, and the position of the film deposition substrate 400 needs to be corrected.
[0051] Further, the substrate to be coated offset detection tool provided by the embodiment can also obtain a position correction method of the substrate to be coated 400 based on the distance data corresponding to each ranging unit 200. Specifically, as shown in Figures 3-4 the distance data corresponding to the ranging unit 200 above the part of the substrate to be coated 400 exceeding the target area 500 will change, so for the ranging unit 200 whose distance data changes, the substrate to be coated 400 is moved in a direction away from the ranging unit 200 to achieve the position correction of the substrate to be coated 400. Further, the substrate to be coated 400 is moved by a preset step, and after each movement, the distance data of each ranging unit 200 is repeatedly obtained and sent to the processing unit 300 to determine the position of the substrate to be coated 400 based on the new distance data until the substrate to be coated 400 is in the target area 500.
[0052] It should be noted that the substrate to be coated offset detection tool provided by the embodiment is actually the cavity cover of the substrate coating processing chamber, and the distance from each ranging unit 200 to the bottom of the substrate coating processing chamber remains unchanged, that is, the reference data corresponding to each ranging unit 200 remains unchanged. Based on this, the reference data corresponding to each ranging unit 200 is measured only once as the reference for subsequent determination of the position of the substrate to be coated 400, so as to reduce the steps of subsequent determination of the position of the substrate to be coated 400, simplify the process of position correction of the substrate to be coated 400, and thus improve the coating efficiency of the substrate to be coated 400.
[0053] In some optional embodiments, the ranging unit 200 includes a laser range finder, as shown in Figure 3 the distance between the laser range finder and the blocking object is obtained based on the time taken by the laser range finder to emit laser light to receive reflected light, so as to quickly and conveniently obtain distance data. Of course, the ranging unit 200 can also use other ranging instruments for ranging, for example, a steel ruler or a vernier caliper, as long as the distance between the ranging unit 200 in the vertical direction and the blocking object in the substrate coating processing chamber can be measured, which is not limited in the present application.
[0054] Preferably, all the ranging units 200 include laser range finders. These laser range finders are also used to detect the specific position of the substrate to be coated 400, and thus assist the position correction of the substrate to be coated 400 to improve the coating efficiency. Specifically, as shown in Figure 4As shown, when the comparison data and the reference data differ, the substrate 400 to be coated needs to be moved to correct its position. Since the laser beam emitted by the laser rangefinder has a certain divergence angle, when it is incident on the surface of the obstruction in the substrate coating chamber, the angle of the reflected light and the time it takes to be received after reflection vary depending on the incident surface. Based on the reflected light received by the laser rangefinder, the position of the substrate 400 to be coated can be obtained to assist in the position correction of the substrate 400. For example, when the portion of the substrate 400 to be coated extends beyond the target area 500 and its width is greater than or equal to the incident range of the laser beam, the laser beam is reflected by the plane, and the time it takes to reflect back to the laser rangefinder is the same. Moreover, the reflection angle is different for light incident at different angles. When the portion of the substrate 400 to be coated extends beyond the target area 500 and its width is less than the incident range of the laser beam, part of the laser beam is reflected by the bottom of the substrate coating chamber and part is reflected by the upper surface of the substrate 400 to be coated. The time and reflection angle for reflecting back to the laser rangefinder are different. By analyzing the beam reflected back to the laser rangefinder, the specific position of the substrate 400 to be coated can be determined, thereby assisting in the position correction of the substrate 400 to be coated.
[0055] Furthermore, at least three ranging units 200 are evenly distributed along the boundary of the ideal region 110 to measure whether the substrate 400 to be coated exceeds the target region 500 in each direction, so as to make the position determination result of the substrate 400 to be coated more accurate.
[0056] For example, such as Figure 1 As shown, the substrate offset detection tool provided in this embodiment includes three ranging units 200 evenly distributed along the boundary of the ideal region 110. The processing unit 300 is communicatively connected to each of the three ranging units 200. The ideal region 110 is the area enclosed by the dashed line. The ranging units 200 acquire distance data and send it to the processing unit to determine whether the substrate 400 exceeds the target region 500 in three different directions, thereby determining whether the position of the substrate 400 is within the target region 500. The specific determination method and principle are described above and will not be repeated here.
[0057] Or, such as Figures 5-6As shown, the film-to-be-coated substrate offset detection tool provided by the embodiment includes four distance measuring units 200 evenly distributed along the boundary of the ideal area 110. Specifically, the four distance measuring units 200 are respectively located at positions corresponding to the front, rear, left and right directions on the boundary of the ideal area 110, so as to determine whether the film-to-be-coated substrate 400 exceeds the target area 500 in the front, rear, left and right directions, and to perform corresponding position correction in the direction in which the film-to-be-coated substrate 400 exceeds the target area 500. For example, if the left side of the film-to-be-coated substrate 400 exceeds the target area 500, the film-to-be-coated substrate 400 is moved to the right for position correction; if the rear side of the film-to-be-coated substrate 400 exceeds the target area 500, the film-to-be-coated substrate 400 is moved forward for position correction.
[0058] Of course, the film-to-be-coated substrate offset detection tool provided by the embodiment can also include more distance measuring units 200, so as to measure distances in more directions, thereby determining whether the film-to-be-coated substrate 400 is within the target area 500. Those skilled in the art can make corresponding design according to actual needs, and the embodiment is not limited again in detail.
[0059] In some alternative embodiments, the cavity cover body 100 is provided with a viewing window set 120, which is used to observe the approximate position of the film-to-be-coated substrate 400 in the substrate film-coating processing chamber, so as to avoid inaccurate determination of the position of the film-to-be-coated substrate 400 by distance data due to excessive deviation of the film-to-be-coated substrate 400 from the target area 500. For example, after the film-to-be-coated substrate 400 is placed in the substrate film-coating processing chamber, if the entire film-to-be-coated substrate 400 is outside the target area 500, the distance between each distance measuring unit 200 located on the boundary of the ideal area 110 and the blocking object in the substrate film-coating processing chamber in the vertical direction is actually the distance from the distance measuring unit 200 to the bottom of the substrate film-coating processing chamber, i.e., the comparison data is the same as the reference data, thereby causing incorrect determination of the position of the film-to-be-coated substrate 400.
[0060] Based on this, in the embodiment, the cavity cover body 100 is provided with a viewing window set 120, which includes at least one transparent viewing window 121, so that the operator can observe the approximate position of the film-to-be-coated substrate 400, thereby avoiding excessive deviation of the film-to-be-coated substrate 400.
[0061] Exemplarily, as shown in FIG. 1C, the viewing window set 120 includes two transparent viewing windows 121, which are respectively located at positions corresponding to the front and rear directions on the boundary of the ideal area 110. Figure 5As shown, the observation window group 120 includes an observation window 121, the boundary of which coincides with the boundary of the ideal region 110. At this time, each ranging unit 200 is evenly distributed on the boundary of the observation window 121. The operator observes the approximate position of the substrate 400 to be coated through the observation window 121. When the positional deviation of the substrate 400 to be coated is small, that is, when at least part of the substrate 400 to be coated is within the target region 500, the corresponding distance data is obtained through each ranging unit 200 to accurately determine the position of the substrate 400 to be coated.
[0062] Alternatively, the observation window group 120 includes at least three observation windows 121, all of which are uniformly arranged around the center of the cavity cover body 100, and the center of all observation windows 121 is located on the boundary of the ideal region 110. In this case, the ranging unit 200 is set to correspond one-to-one with the observation window 121, and each ranging unit 200 is located at the center of its corresponding observation window 121, so that the ranging units 200 are evenly distributed on the boundary of the ideal region 110. It should be noted that when the ranging unit 200 includes a laser rangefinder, the ranging unit 200 can be located above or below the cavity cover body 100. Preferably, when the ranging unit 200 is located above the cavity cover body 100, each ranging unit 200 emits a laser beam into the substrate coating processing cavity through the corresponding transparent observation window 121 for ranging. This avoids damage to the ranging unit 200 caused by the high temperature environment required during coating in the substrate coating processing cavity, thereby extending the service life of the substrate offset detection tool.
[0063] For example, such as Figure 6 As shown, the observation window group 120 includes four observation windows 121, and correspondingly, four ranging units 200 are provided to accurately determine the position of the substrate 400 to be coated in four directions (front, back, left, and right) when the positional offset of the substrate 400 to be coated is small. For the specific determination method, steps, and principles, please refer to the foregoing content; this embodiment will not repeat them here.
[0064] Based on this, the substrate offset detection tool provided in this embodiment obtains distance data by uniformly setting distance measuring units 200 along the ideal area 110 on the cavity cover body 100, thereby accurately determining whether the position of the substrate 400 to be coated is within the target area 500, so as to avoid the unevenness of the generated film caused by the position offset of the substrate 400 to be coated, thereby improving the preparation quality of the film, and is easy to operate, which is conducive to obtaining better substrate coating effect.
[0065] In another aspect, the present embodiment also provides a substrate coating processing device for coating a substrate 400. Specifically, the substrate coating processing device comprises a substrate coating processing chamber and a detection cavity cover arranged on the substrate coating processing chamber. The substrate coating processing chamber is used for placing the substrate 400 and performing coating operation after being sealed. The detection cavity cover is the substrate offset detection tool as described above, which is used for sealing the substrate coating processing device and determining the position of the substrate 400 before coating to ensure that the substrate 400 is located in the target area 500 for coating, so as to prepare a uniform film and improve the coating effect of the substrate.
[0066] In summary, the substrate offset detection tool and the substrate coating processing device provided by the present application can obtain distance data by the at least three distance measuring units 200 uniformly distributed on the ideal area boundary, so that the processing unit 300 can accurately determine that the position of the substrate 400 deviates from the target area 500 based on the distance data, thereby effectively improving the quality of the prepared film. In addition, the approximate position of the substrate 400 can be observed through the observation window group 120, so as to avoid the position determination error caused by the large deviation of the substrate 400, further ensure that the substrate 400 is located in the target area 500 before coating, and effectively improve the coating effect of the substrate.
[0067] The above description of the flow or structure corresponding to each figure has its own emphasis, and the part not described in detail in a certain flow or structure can be referred to the related description of other flows or structures.
[0068] The above embodiments only exemplarily illustrate the principles and effects of the present application, but are not used to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought of the present application should be covered by the claims of the present application.
Claims
1. A substrate offset detection tool, applied in a substrate coating processing chamber, characterized in that, The application relates to a substrate offset detection tool. The cavity cover body is provided with a region corresponding to the position and size of a target region in a substrate coating treatment chamber, the target region being a circular placement region for a substrate to be coated in the substrate coating treatment chamber. The cavity cover body is provided with at least three distance measuring units, all of which are uniformly distributed along the boundary of the ideal region, and the distance measuring units are used to obtain distance data between the units and a blocking object in the substrate coating treatment chamber in the vertical direction. A processing unit is in communication connection with all the distance measuring units, receives the distance data of the distance measuring units, and determines whether the substrate to be coated in the substrate coating treatment chamber is offset based on the distance data.
2. The detection tool of claim 1, wherein, The radius of the ideal region is greater than or equal to the radius of the substrate to be coated, and the difference between the radius of the ideal region and the radius of the substrate to be coated is a preset length.
3. The detection tool of claim 2, wherein, The preset length is 1 mm.
4. The detection tool of claim 1, wherein, The cavity cover body is provided with a viewing window group, and the viewing window group comprises at least one transparent viewing window.
5. The detection tool of claim 4, wherein, The viewing window group comprises one viewing window, and the boundary of the viewing window is coincident with the boundary of the ideal region.
6. The detection tool of claim 4, wherein, The viewing window group comprises at least three viewing windows, all of which are uniformly arranged around the central position of the cavity cover body, and the central positions of all the viewing windows are located on the boundary of the ideal region.
7. The detection tool of claim 6, wherein, The viewing window group comprises four viewing windows.
8. The detection tool of claim 1, wherein, The processing unit comprises a communication subunit and a data processing subunit which are connected to each other.
9. The detection tool of claim 1, wherein, All the distance measuring units comprise laser range finders.
10. A substrate coating process apparatus, characterized by, The application relates to a substrate offset detection tool. The cavity cover body is provided with a region corresponding to the position and size of a target region in a substrate coating treatment chamber, the target region being a circular placement region for a substrate to be coated in the substrate coating treatment chamber. The cavity cover body is provided with at least three distance measuring units, all of which are uniformly distributed along the boundary of the ideal region, and the distance measuring units are used to obtain distance data between the units and a blocking object in the substrate coating treatment chamber in the vertical direction. A processing unit is in communication connection with all the distance measuring units, receives the distance data of the distance measuring units, and determines whether the substrate to be coated in the substrate coating treatment chamber is offset based on the distance data. The radius of the ideal region is greater than or equal to the radius of the substrate to be coated, and the difference between the radius of the ideal region and the radius of the substrate to be coated is a preset length. The preset length is 1 mm. The cavity cover body is provided with a viewing window group, and the viewing window group comprises at least one transparent viewing window. The viewing window group comprises one viewing window, and the boundary of the viewing window is coincident with the boundary of the ideal region. The viewing window group comprises at least three viewing windows, all of which are uniformly arranged around the central position of the cavity cover body, and the central positions of all the viewing windows are located on the boundary of the ideal region. The viewing window group comprises four viewing windows. The processing unit comprises a communication subunit and a data processing subunit which are connected to each other. All the distance measuring units comprise laser range finders. The application relates to a substrate offset detection tool. The cavity cover body is provided with a region corresponding to the position and size of a target region in a substrate coating treatment chamber, the target region being a circular placement region for a substrate to be coated in the substrate coating treatment chamber. The cavity cover body is provided with at least three distance measuring units, all of which are uniformly distributed along the boundary of the ideal region, and the distance measuring units are used to obtain distance data between the units and a blocking object in the substrate coating treatment chamber in the vertical direction. A processing unit is in communication connection with all the distance measuring units, receives the distance data of the distance measuring units, and determines whether the substrate to be coated in the substrate coating treatment chamber is offset based on the distance data. The radius of the ideal region is greater than or equal to the radius of the substrate to be coated, and the difference between the radius of the ideal region and the radius of the substrate to be coated is a preset length. The preset length is 1 mm. The cavity cover body is provided with a viewing window group, and the viewing window group comprises at least one transparent viewing window. The viewing window group comprises one viewing window, and the boundary of the viewing window is coincident with the boundary of the ideal region. The viewing window group comprises at least three viewing windows, all of which are uniformly arranged around the central position of the cavity cover body, and the central positions of all the viewing windows are located on the boundary of the ideal region. The viewing window group comprises four viewing windows. The processing unit comprises a communication subunit and a data processing subunit which are connected to each other. All the distance measuring units comprise laser range finders. The application relates to a substrate offset detection tool.