Spray header mechanism and extension equipment

Abstract

The utility model belongs to the technical field of CVD (Chemical Vapor Deposition) equipment, and discloses a spray header mechanism and epitaxy equipment, the spray header mechanism comprises a gas distribution cavity, a cooling base and a gas inlet pipe, the gas distribution cavity is provided with a gas distribution cavity and a gas outlet hole communicated with the inside and the outside of the gas distribution cavity; the air distribution cavity is arranged on the cooling base, a cooling flow channel capable of circulating cooling fluid is arranged in the cooling base, and the cooling flow channel is provided with an inlet and an outlet; the air inlet pipe penetrates through the cooling base, so that an outlet of the air inlet pipe is formed in the air distribution cavity; the cooling base can exchange heat with the gas distribution cavity and the gas inlet pipe; the epitaxial equipment comprises a reaction cavity and the spray header mechanism, the reaction cavity is provided with a reaction cavity opening, the spray header mechanism can be fixed on the reaction cavity, the air outlet hole enters the reaction cavity through the reaction cavity opening, the temperature of the spray header can be reduced through the cooling base, and the probability that reaction gas reacts in advance is reduced as much as possible.

Description

TECHNICAL FIELD

[0001] The utility model relates to CVD equipment technical field especially relates to a shower head mechanism and epitaxial equipment. BACKGROUND

[0002] Silicon carbide (hereinafter referred to as SiC) as the typical representative of the third generation semiconductor material, has wide band gap, high breakdown field, high thermal conductivity, high electron saturation rate and strong radiation resistance and other characteristics, therefore in high temperature, high pressure and high frequency field shows the extensive application prospect,

[0003] When epitaxial equipment runs, reaction gas is distributed by the shower head and then enters into the reaction cavity, and the reaction gas in the reaction cavity chemically reacts on the surface of the substrate to grow thin film material.

[0004] Because the temperature in the reaction cavity of epitaxial equipment is higher, more heat is radiated to the shower head, which leads to the high temperature of the shower head, and the reaction gas distributed by the shower head often does not contact the surface of the substrate, and has reacted in advance in the shower head, leading to slow growth of film material on the substrate. UTILITY MODEL CONTENT

[0005] The utility model discloses a shower head mechanism and epitaxial equipment, which can reduce the temperature of the shower head.

[0006] To achieve this purpose, the utility model adopts the following technical scheme:

[0007] The shower head mechanism comprises:

[0008] The gas distribution cavity has a gas distribution cavity and a plurality of gas outlets communicating inside and outside the gas distribution cavity;

[0009] The cooling base is provided with a cooling flow channel capable of circulating cooling fluid, and the cooling flow channel has an inlet and an outlet, and the cooling flow channel is isolated from the gas distribution cavity;

[0010] The gas inlet pipe penetrates the cooling base, and the outlet of the gas inlet pipe is arranged in the gas distribution cavity.

[0011] In some embodiments, the gas distribution cavity comprises a first gas distribution cavity, the gas distribution cavity body comprises a gas distribution disc support and a gas distribution disc, the gas distribution disc support comprises an isolation plate and a ring-shaped first partition wall, a plurality of first partition walls are arranged along the radial direction of the gas distribution disc support from inside to outside, to form a plurality of first gas distribution cavities, the gas outlets are arranged on the gas distribution disc, the gas distribution disc is covered on the first partition wall, and a plurality of gas inlet pipes are in one-to-one correspondence with the first gas distribution cavities.

[0012] In some embodiments, the gas distribution cavity further comprises a second gas distribution cavity, the gas distribution disc support further comprises a second annular partition wall, the second partition wall is arranged on opposite sides of the isolation plate with the first partition wall, a plurality of the second partition walls are arranged in a sleeve from inside to outside along the radial direction of the gas distribution disc support to form the second gas distribution cavity, the first gas distribution cavity and the second gas distribution cavity are arranged one by one, and the corresponding first gas distribution cavity and the second gas distribution cavity are communicated through a plurality of air holes arranged on the isolation plate; the cooling base is covered on the second partition wall, and the outlet of the air inlet pipe is inserted into the second gas distribution cavity.

[0013] In some embodiments, a plurality of ring grooves are arranged on the cooling base, and the second partition wall is inserted into the ring grooves.

[0014] In some embodiments, the size of the cooling base is greater than the size of the gas distribution cavity body, and a sealing member surrounding the gas distribution cavity body is arranged on the end surface of the cooling base connected with the gas distribution cavity body.

[0015] In some embodiments, the air inlet pipe penetrates the cooling flow channel.

[0016] In some embodiments, a locking hole is further arranged on the cooling base, and the cooling base can be connected to an external device through the locking hole by a locking member.

[0017] In some embodiments, the shower head mechanism further comprises a sleeve and a temperature monitoring member, one end of the sleeve is blocked by a monitoring window, the sleeve penetrates the cooling base and the gas distribution cavity body, and the temperature monitoring member monitors the temperature through the monitoring window.

[0018] In some embodiments, the monitoring window is a quartz window, and the temperature monitoring member is an infrared temperature sensor.

[0019] In some embodiments, the shower head mechanism further comprises a driving assembly, the cooling base is arranged on the output end of the driving assembly, and the driving assembly can drive the gas distribution cavity body to ascend and descend.

[0020] In some embodiments, the output end of the driving assembly is provided with a support seat, a plurality of support sleeves are arranged on the support seat, and a positioning column is further arranged on the cooling base and can be inserted into the support sleeve.

[0021] An epitaxial device is also provided, which comprises a reaction cavity provided with a reaction cavity opening and the shower head mechanism as described above, the shower head mechanism can be fixed on the reaction cavity, and the air outlet hole enters the reaction cavity through the reaction cavity opening.

[0022] The utility model discloses the beneficial effects:

[0023] By injecting cooling fluid into the cooling flow channel through the inlet and flowing out through the outlet, and the gas distribution cavity being arranged on the cooling base, when heat in the reaction cavity is radiated to the shower head mechanism, heat exchange with the cooling fluid can be performed, so that the temperature of the gas distribution cavity is reduced, and the air inlet pipe also penetrates the cooling base, so that the temperature of the reaction gas can also be reduced, the probability of the reaction gas reacting on the shower head mechanism in advance is reduced as much as possible, and the influence on the film material growth is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 is a schematic view of one angle of the shower head mechanism of the utility model;

[0025] Figure 2 is a schematic view of another angle of the shower head mechanism of the utility model;

[0026] Figure 3 is an exploded view of the gas distribution cavity and the cooling base in the utility model;

[0027] Figure 4 is a schematic view of the gas distribution cavity showing the first gas distribution cavity in the utility model;

[0028] Figure 5 is a schematic view of the gas distribution cavity showing the second gas distribution cavity in the utility model;

[0029] Figure 6 is a sectional view of the gas distribution cavity and the cooling base in the utility model;

[0030] Figure 7 is a schematic view of the driving assembly in the utility model;

[0031] Figure 8 is a schematic view of the driving assembly without the support plate in the utility model.

[0032] In the drawings:

[0033] 1, gas distribution cavity; 11, gas distribution disc support; 111, isolation plate; 112, first partition wall; 113, first gas distribution cavity; 114, second partition wall; 115, second gas distribution cavity; 116, air hole; 12, gas distribution disc; 13, air outlet hole;

[0034] 2, cooling base; 21, support base; 22, cooling shell; 23, cooling flow channel; 24, ring groove; 25, embedding groove; 26, locking hole; 27, positioning column; 28, protrusion;

[0035] 3, air inlet pipe;

[0036] 4, sleeve;

[0037] 5, drive assembly; 51, fixed seat; 52, screw rod; 53, first bevel gear; 54, drive shaft; 55, second bevel gear; 56, hand wheel; 57, screw nut; 58, support plate; 59, support arm; 510, slide rail pair;

[0038] 6, support seat; 61, plug hole; 62, support sleeve. DETAILED DESCRIPTION

[0039] The utility model will be described in further detail below in combination with the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the utility model and are not limited to the utility model. In addition, it should be noted that only the parts related to the utility model are shown in the drawings for ease of description, not all the structures.

[0040] In the description of the utility model, unless otherwise explicitly specified and limited, the terms "connected", "connected", "fixed" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship of two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0041] In the utility model, unless otherwise explicitly specified and limited, the first feature "on" or "below" the second feature can include that the first and second features are in direct contact, or the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the first feature "on", "above" and "above" the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0042] In the description of the embodiment, the terms "up", "down", "left", "right" and other orientation or position relationship are based on the orientation or position relationship shown in the drawings, only for the convenience of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore it cannot be understood as a limitation of the utility model. In addition, the terms "first" and "second" are only used to distinguish in description and have no special meaning.

[0043] As Figures 1 to 8As shown, this application provides a spray head mechanism, which includes an air distribution chamber 1, a cooling base 2, and an air inlet pipe 3. The air distribution chamber 1 has an air distribution cavity and multiple air outlets 13 connecting the inside and outside of the air distribution cavity. The air distribution chamber 1 is disposed on the cooling base 2. The cooling base 2 is provided with a cooling channel 23 that allows cooling fluid to flow through it. The cooling channel 23 has an inlet and an outlet and is isolated from the air distribution cavity. The air inlet pipe 3 passes through the cooling base 2, so that the outlet of the air inlet pipe 3 is placed in the air distribution cavity. The cooling base 2 can exchange heat with the air distribution chamber 1 and the air inlet pipe 3.

[0044] Cooling fluid is injected into the cooling channel 23 through the inlet and flows out through the outlet. The gas distribution chamber 1 is set on the cooling base 2. When the heat in the reaction chamber radiates to the spray head mechanism, it can exchange heat with the cooling fluid, thereby reducing the temperature of the gas distribution chamber 1. In addition, the air inlet pipe 3 also passes through the cooling base 2, which can also reduce the temperature of the reaction gas, minimize the probability of the reaction gas reacting prematurely on the spray head mechanism, and reduce the impact on membrane growth.

[0045] In some embodiments, the intake pipe 3 passes through the cooling channel 23, thereby enabling the fluid in the cooling channel 23 to directly contact the intake pipe 3, thus improving the heat exchange efficiency.

[0046] like Figures 3 to 5 As shown, in some embodiments, the air distribution chamber 1 includes an air distribution tray 11 and an air distribution tray 12. The air distribution tray 11 includes an isolation plate 111 and an annular first partition wall 112. The first partition wall 112 and the cooling base 2 are disposed on both sides of the isolation plate 111. Multiple first partition walls 112 are spaced apart from the inside to the outside along the radial direction of the air distribution tray 11, and a first air distribution chamber 113 is formed between two adjacent first partition walls 112. The air distribution tray 11 can have different specifications, and air distribution trays 11 of different specifications have different numbers of first partition walls 112, so that air distribution trays 11 of different specifications have different numbers of first air distribution chambers 113. A vent 13 is disposed on the gas distribution plate 12, which in turn covers the first partition wall 112. Multiple first gas inlets 3 are also provided, each corresponding to a first gas distribution chamber 113. This allows for the supply of different amounts or concentrations of reactant gas to different first gas distribution chambers 113 based on the different reactions at different substrate locations, thereby adjusting the reaction in different regions of the substrate. Exemplarily, the connection method between the gas distribution plate 12 and the first partition wall 112 is not limited and can be, but is not limited to, a screw connection.

[0047] Further, the gas distribution plate support 11 further comprises a plurality of annular second partition walls 114, the first partition walls 112 and the second partition walls 114 are located on opposite sides of the isolation plate 111, the distribution form of the plurality of second partition walls 114 is the same as that of the first partition walls 112, that is, the plurality of second partition walls 114 are spaced and sleeved from inside to outside to form a plurality of second gas distribution cavities 115 which are isolated from each other on the isolation plate 111, wherein the first gas distribution cavities 113 and the second gas distribution cavities 115 are arranged one by one, and the corresponding first gas distribution cavities 113 and the second gas distribution cavities 115 are communicated through a plurality of evenly arranged air holes 116 arranged on the partition plate, and the cooling base 2 is covered on the second partition wall 114; it can be understood that the cooling base 2 and the gas distribution plate support 11 can also be fastened by bolts or screws. The outlet of the gas inlet pipe 3 is inserted into the second gas distribution cavity 115, and then communicated with the first gas distribution cavity 113 through the air hole 116; the first gas distribution cavity 113 and the second gas distribution cavity 115 form a complete gas distribution cavity. After the gas inlet pipe 3 supplies the reaction gas into the second gas distribution cavity 115, the reaction gas is uniformly dispersed by a plurality of dispersed air holes 116 before entering the first gas distribution cavity 113, which improves the uniformity of the reaction gas distribution, thereby avoiding the direct single outlet of the gas inlet pipe 3 into the first gas distribution cavity 113, reducing the non-uniformity of the outlet gas, and reducing the influence of the film material growth.

[0048] In order to facilitate connection, the cooling base 2 is provided with a plurality of annular protrusions 28, the plurality of protrusions 28 are spaced and sleeved from inside to outside along the radial direction of the cooling base 2, and the annular grooves 24 are formed between adjacent protrusions 28, the annular grooves 24 are arranged correspondingly with the second partition walls 114, and the second partition walls 114 are correspondingly embedded in the annular grooves 24, so that the top surface of the protrusion 28 and the groove wall surface of the second partition wall 114 form a complete second gas distribution cavity 115. In the present embodiment, the cooling base 2 comprises a support base 21 and a cooling shell 22 which are reversely buckled, and the cooling flow channel 23 is clamped by the support base 21 and the cooling shell 22. The cooling flow channel 23 and the gas distribution cavity are located on opposite sides of the support base 21 and are isolated by the support base 21. It can be understood that the support base 21 and the cooling shell 22 are buckled and welded after buckling, so as to avoid the cooling fluid from flowing out.

[0049] As Figure 3 and Figure 6As shown in some embodiments, the size of the cooling base 2 is greater than that of the gas distribution cavity 1, and the cooling base 2 is connected to the end face of the gas distribution cavity 1, and a groove 25 is formed around the gas distribution cavity 1, and a sealing element is embedded in the groove 25, so that when the cooling base 2 is arranged at the reaction cavity opening for introducing the reaction gas, the sealing element can be squeezed by the reaction cavity and the cooling base 2, thereby sealing the reaction cavity opening. For example, the sealing element is a sealing ring. Further, in order to maintain stability and sealing, the cooling base 2 is further provided with a locking hole 26, and the cooling base 2 is connected to the external components such as the reaction cavity through the locking hole 26 by a locking element. The locking hole 26 can be a through hole, and the locking element can be a bolt or a screw.

[0050] As shown in some embodiments, Figure 2 and Figure 6 , the shower head mechanism further comprises a sleeve 4 and a temperature monitoring element, one end of the sleeve 4 is blocked with a monitoring window, the sleeve 4 penetrates the cooling base 2 and the gas distribution cavity 1, and the temperature monitoring element monitors the temperature on one side of the outlet hole 13 through the monitoring window. That is, when the shower head mechanism is installed at the reaction cavity opening, the temperature inside the reaction cavity is monitored by the temperature monitoring element, so that the temperature can be adjusted according to the feedback temperature. Further, the monitoring window is located on one side of the cooling base 2, and the monitoring window is a quartz window. The infrared observation window is a prior art which can transmit ultraviolet light, visible light and infrared light. The temperature monitoring element matched with it is an infrared temperature sensor.

[0051] As shown in some embodiments, Figure 1 and Figure 2 , the shower head mechanism further comprises a driving assembly 5, and the cooling base 2 is arranged at the output end of the driving assembly 5, so that the driving assembly 5 drives the lifting of the gas distribution cavity 1, thereby enabling the shower head mechanism to be separated from the reaction cavity for cleaning and maintenance. In the present embodiment, the cooling base 2 is detachably connected to the output end of the driving assembly 5, thereby facilitating disassembly and maintenance.

[0052] Specifically, as shown in some embodiments, Figure 2 , Figure 7 and Figure 8 , the output end of the driving assembly 5 is provided with a support seat 6, the support seat 6 is provided with a plug-in hole 61, a support sleeve 62 is plugged into the plug-in hole 61, and the cooling base 2 is provided with a positioning column 27, the positioning column 27 can be plugged into the support sleeve 62, thereby supporting the entire cooling base 2. The form of plugging the positioning column 27 into the support sleeve 62 can reduce the direct contact between the support seat 6 and the cooling base 2, thereby reducing wear.

[0053] In the current embodiment, the driving assembly 5 comprises a fixed seat 51 and a lead screw 52, the lead screw 52 is rotatable on the fixed seat 51 in the vertical direction through a bearing, a first bevel gear 53 is arranged on the lead screw 52, a driving shaft 54 is further connected to the fixed seat 51, a second bevel gear 55 is connected to one end of the driving shaft 54, the second bevel gear 55 is engaged with the first bevel gear 53, a hand wheel 56 is arranged on the other end of the driving shaft 54, a lead screw nut 57 is screwed on the lead screw 52, a support plate 58 is connected to the lead screw nut 57, the support plate 58 is provided with spaced support arms 59, and the support seat 6 is arranged on the support arms 59, so that the cooling base 2 and the gas distribution cavity 1 can be moved up and down by rotating the hand wheel 56. Further, in order to improve the stability of movement, the fixed seat 51 is further provided with a slide rail pair 510 in the vertical direction, the support plate 58 is fixedly connected with the slide block of the slide rail pair 510, the slide block of the slide rail pair 510 is slidably connected with the slide rail of the slide rail pair 510, and the slide rail of the slide rail pair 510 is fixed on the fixed seat 51, so as to improve the stability of lifting.

[0054] The application also provides an epitaxial equipment, which comprises a reaction cavity and the showerhead mechanism, the reaction cavity is provided with a reaction cavity opening, the showerhead mechanism can be fixed on the reaction cavity, so that the gas outlet 13 enters the reaction cavity through the reaction cavity opening, and the temperature of the showerhead can be reduced by the cooling base 2, thereby reducing the probability of premature reaction of the reaction gas.

[0055] Obviously, the above embodiments of the utility model are only examples for clearly illustrating the utility model, and are not a limitation on the embodiments of the utility model. For ordinary skilled in the art, various obvious changes, re-adjustment and replacement can be made without departing from the protection scope of the utility model. Here, it is not necessary and impossible to enumerate all the embodiments. Any modification, equivalent replacement and improvement made within the spirit and principle of the utility model should be included in the protection scope of the utility model claim.

Claims

1. A showerhead mechanism, characterized by, The shower head mechanism comprises: a gas distribution cavity (1) having a plurality of gas distribution cavities and a plurality of gas outlets (13) communicating between the gas distribution cavities; a cooling base (2) on which the gas distribution cavity (1) is arranged, the cooling base (2) being provided with a cooling flow channel (23) through which cooling fluid can flow, the cooling flow channel (23) having an inlet and an outlet, and the cooling flow channel (23) being isolated from the gas distribution cavity; an air inlet pipe (3) penetrating the cooling base (2) and having an outlet arranged in the gas distribution cavity.

2. The showerhead apparatus of claim 1, wherein The gas distribution cavity comprises a first gas distribution cavity (113), the gas distribution cavity (1) comprises a gas distribution disc support (11) and a gas distribution disc (12), the gas distribution disc support (11) comprises an isolation plate (111) and a plurality of annular first partition walls (112), the first partition walls (112) are arranged in a sleeve manner from inside to outside along the radial direction of the gas distribution disc support (11) to form a plurality of first gas distribution cavities (113), the gas outlets (13) are arranged on the gas distribution disc (12), the gas distribution disc (12) covers the first partition walls (112), and a plurality of air inlet pipes (3) correspond to the first gas distribution cavities (113) one by one.

3. The showerhead apparatus of claim 2, wherein, The gas distribution cavity further comprises a second gas distribution cavity (115), the gas distribution disc support (11) further comprises a plurality of annular second partition walls (114), the second partition walls (114) are arranged on opposite sides of the isolation plate (111) with the first partition walls (112), the second partition walls (114) are arranged in a sleeve manner from inside to outside along the radial direction of the gas distribution disc support (11) to form the second gas distribution cavities (115), the first gas distribution cavities (113) and the second gas distribution cavities (115) are arranged one by one, and the corresponding first gas distribution cavities (113) and the second gas distribution cavities (115) are communicated through a plurality of air holes (116) arranged on the isolation plate (111); the cooling base (2) covers the second partition walls (114), and the outlets of the air inlet pipes (3) are inserted into the second gas distribution cavities (115).

4. The showerhead assembly of claim 3, wherein, A plurality of ring grooves (24) are arranged on the cooling base (2), and the second partition walls (114) are inserted into the ring grooves (24).

5. The showerhead assembly of claim 1, wherein, The size of the cooling base (2) is greater than that of the gas distribution cavity (1), and a sealing member is arranged on the end surface of the cooling base (2) connected to the gas distribution cavity (1) and surrounds the gas distribution cavity (1).

6. The showerhead apparatus of claim 1, wherein The air inlet pipe (3) penetrates the cooling flow channel (23).

7. The showerhead assembly of claim 1, wherein: The cooling base (2) is further provided with a locking hole (26), and the cooling base (2) can be connected to an external device through the locking hole (26) by a locking member.

8. The showerhead apparatus of any of claims 1-7, wherein, The shower head mechanism further comprises a sleeve (4) and a temperature monitoring member, one end of the sleeve (4) is sealed with a monitoring window, the sleeve (4) penetrates the cooling base (2) and the gas distribution cavity (1), and the temperature monitoring member monitors the temperature through the monitoring window.

9. The showerhead apparatus of claim 8, wherein, The monitoring window is a quartz window, and the temperature monitoring member is an infrared temperature sensor.

10. The showerhead apparatus of any of claims 1-7, wherein, The spray head mechanism further comprises a driving assembly (5), and the cooling base (2) is arranged at an output end of the driving assembly (5), and the driving assembly (5) can drive the gas distribution cavity (1) to lift and lower.

11. The showerhead apparatus of claim 10, wherein, An output end of the driving assembly (5) is provided with a supporting seat (6), a plurality of supporting sleeves (62) are arranged on the supporting seat (6), and a positioning column (27) is further arranged on the cooling base (2), and the positioning column (27) can be inserted into the supporting sleeve (62).

12. Epitaxial apparatus comprising a reaction chamber provided with a reaction chamber opening, characterized in that Further comprising the spray head mechanism as claimed in any one of claims 1-11, the spray head mechanism can be fixed on the reaction cavity, and the air outlet (13) enters the reaction cavity through the reaction cavity opening.

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