Reflector adjusting structure of double-frequency laser interferometer of photoetching machine

Abstract

The utility model discloses a double-frequency laser interferometer reflector adjusting structure of a photoetching machine, which belongs to the field of photoetching machines and comprises a reflector body and a reflector frame sleeved on the outer side of the reflector body, the top of the reflector frame is connected with an adjusting assembly, the bottom of the reflector frame is connected with a turntable, the outer side of the turntable is movably sleeved with a base, the adjusting assembly comprises a protective cover, and the protective cover is sleeved on the outer side of the reflector frame. The top end of the protective cover is connected with the top end of the mirror frame through a connecting assembly, an annular sliding groove is formed in the top of the base, the bottom end of the protective cover extends into the annular sliding groove, a containing cavity is formed in the protective cover, and an arc-shaped plate is slidably arranged in the containing cavity. The rotating angle of the reflecting mirror body is adjusted in an auxiliary mode through the protective cover, the protective cover is matched with the arc-shaped plate so that the outer side of the reflecting mirror body can be protected, the situation that the connecting firmness between the mirror frame and the rotating disc is affected by mistaken touching of the mirror frame in the adjusting process is avoided, and meanwhile the protective cover is large in size and more convenient to adjust.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of photoetching machine belongs to photoetching machine double -frequency laser interferometer mirror adjustment structure. BACKGROUND

[0002] In the photoetching machine system, laser interferometer is generally used to measure the position of three directions of the silicon wafer table space. The measurement of the horizontal direction of the silicon wafer table in the photoetching machine, that is, the X and Y directions (in the photoetching machine, the projection objective lens optical axis is generally defined as the Z direction of the coordinate system, and the direction perpendicular to the projection objective lens is the horizontal direction) can generally make the laser interferometer beam horizontally shoot to the side of the silicon wafer table and directly install a mirror on the side of the silicon wafer table to reflect the horizontal measurement beam or directly process the reflection surface to reflect the beam, thereby realizing the accurate measurement of the X, Y and RZ degrees of freedom. In the double-frequency laser interferometer of the photoetching machine, the laser beam emitted by the laser light source is the basis of measurement. The primary function of the mirror is to change the direction of propagation of the laser beam. For example, after the laser beam is emitted from the light source, the reflection of the mirror can guide the beam to the target position to be measured or other optical elements. This is like a complex pipe system, where the mirror is a "bend" that allows the laser beam to propagate along the pre-designed optical path.

[0003] For example, the prior art with publication number CN203779231U discloses a laser interferometer mirror, which can reduce the time of repeated blind debugging of detection personnel, facilitate the smooth progress of the position precision detection of the inclined bed numerical control machine tool, and greatly improve the work efficiency of detection.

[0004] However, the above prior art has the following problems when in use: when adjusting the mirror, in order to improve the adjustment accuracy, the worker needs to use a measuring tool to assist in adjustment, and when using the measuring tool, the measuring tool is easy to collide with the mirror, thereby affecting the adjustment accuracy of the mirror. UTILITY MODEL CONTENTS

[0005] Therefore, the utility model provides a photoetching machine double-frequency laser interferometer mirror adjustment structure to solve the problem that the measuring tool is easy to collide with the mirror and shake during the adjustment process assisted by the measuring tool in the prior art, and affect the adjustment accuracy of the mirror.

[0006] In order to achieve the above purpose, the utility model provides the following technical scheme:

[0007] The application discloses a mirror adjusting structure of a dual-frequency laser interferometer of a photoetching machine.

[0008] Further, the rear end of the protective cover is fixedly provided with an inverted L-shaped indicating needle, and a scale line is processed on the outer wall surface of the base, so that the inverted L-shaped indicating needle and the scale line are matched to assist the staff in accurately adjusting the angle of the mirror body.

[0009] Further, the connecting assembly comprises a spring bolt, the bottom end of the spring bolt penetrates out of the protective cover, the bottom end of the pin head of the spring bolt is fixedly provided with a plug, the top end of the mirror frame is provided with a plug groove matched with the plug, and the plug is inserted into the plug groove.

[0010] Further, the outer wall of the arc-shaped plate is fixedly provided with a pulling block, a fastening bolt penetrates through one side of the outer wall of the base, the fastening bolt is in threaded connection with the base, and the fastening bolt is in abutment with the protective cover.

[0011] Further, the top of the rotating disc movably comprises two fixed blocks, the two fixed blocks clamp and fix the mirror frame, the staff can quickly disassemble and assemble the mirror frame, and then the mirror body can be replaced.

[0012] Further, the top of the rotating disc movably comprises two fixed blocks, the two fixed blocks clamp and fix the mirror frame, the staff can quickly disassemble and assemble the mirror frame, and then the mirror body can be replaced.

[0013] Further, the front end of the rotating disc penetrates a knob, the rear end of the knob penetrates the rotating disc and is fixed with the front end of the lead screw, the knob and the rotating disc are detachably connected together, the lead screw can be rotated by rotating the knob, and the knob is more convenient to use.

[0014] Further, the bottom outside wall is fixed with a plurality of mounting plates, and a rectangular mounting hole is formed at the top end of each mounting plate.

[0015] The utility model has the advantages of the following:

[0016] 1. The utility model discloses a protective cover is used for assisting the rotation angle of the reflecting mirror body, and the protective cover and the arc-shaped plate are matched to protect the outside of the reflecting mirror body, so that the connection firmness between the mirror frame and the rotating disc is not affected by the accidental touch of the mirror frame during the adjustment process.

[0017] 2. The two fixed blocks are moved and clamped to the mirror frame by rotating the screw rod, which facilitates the installation and disassembly of the mirror frame, and the staff can quickly disassemble the mirror frame to clean and replace the reflecting mirror body. BRIEF DESCRIPTION OF DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description are only exemplary, and for those skilled in the art, other implementation drawings can be obtained without creative labor on the basis of the provided drawings.

[0019] The structure, proportion, size and the like shown in the specification are only used to cooperate with the content disclosed in the specification, so that those skilled in the art can understand and read, and are not used to limit the implementation conditions of the utility model, so they do not have technical significance. Any modification of structure, change of proportion relationship or adjustment of size, without affecting the effect and purpose of the utility model, should still fall within the scope of the technical content disclosed by the utility model.

[0020] Figure 1 The utility model provides whole structure schematic view;

[0021] Figure 2 The utility model provides arc-shaped plate closure schematic view;

[0022] Figure 3 The utility model provides whole structure rear view;

[0023] Figure 4 The utility model provides adjustment assembly structure schematic view;

[0024] Figure 5 The base plan view is provided by the utility model.

[0025] In the drawing: 1, reflector body; 2, mirror frame; 3, adjusting assembly; 4, rotating disc; 5, base; 6, connecting assembly; 7, inverted L-shaped indicating needle; 8, scale line; 9, dial block; 10, fastening bolt; 11, fixed block; 12, moving groove; 13, screw rod; 14, nut block; 15, knob; 16, mounting plate; 17, rectangular mounting hole;

[0026] 301, protective cover; 302, annular sliding groove; 303, storage cavity; 304, arc-shaped plate;

[0027] 601, spring bolt; 602, plug block; 603, plug groove. DETAILED DESCRIPTION

[0028] The embodiments of the utility model are explained below by specific examples, and other advantages and effects of the utility model can be easily understood by those skilled in the art from the content disclosed in the specification. Obviously, the described embodiments are only some of the embodiments of the utility model, not all. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor belong to the scope of protection of the utility model.

[0029] Referring to the drawings of the specification Figures 1-5 The utility model provides light etching machine double -frequency laser interferometer mirror adjustment structure, including reflector body 1 and the mirror frame 2 of the sleeve in reflector body 1 outside, mirror frame 2 top is connected with adjusting assembly 3, mirror frame 2 bottom is connected with rotating disc 4, rotating disc 4 outside movable sleeve is equipped with base 5, adjusting assembly 3 includes protective cover 301, protective cover 301 sleeve in mirror frame 2 outside, protective cover 301 top end is connected with mirror frame 2 top end through connecting assembly 6, base 5 top is equipped with annular sliding groove 302, and protective cover 301 bottom end extends into annular sliding groove 302, and protective cover 301 is equipped with storage cavity 303 in, and slidingly equipped with arc-shaped plate 304 in storage cavity 303.

[0030] Protective cover 301 rear end is fixedly equipped with inverted L-shaped indicating needle 7, and the surface of the outer wall of base 5 is processed with scale line 8.

[0031] Connecting assembly 6 includes spring bolt 601, and the bottom end of spring bolt 601 penetrates out of protective cover 301, and the plug block 602 is fixedly arranged at the bottom end of the pin head of spring bolt 601, and the plug groove 603 matched with plug block 602 is arranged at the top end of mirror frame 2, and plug block 602 is inserted with plug groove 603, and plug block 602 and plug groove 603 are inserted with the help of spring bolt 601, so as to facilitate the disassembly of protective cover 301 and mirror frame 2.

[0032] The arc-shaped plate 304 is externally fixed with a pushing block 9, and a fastening bolt 10 penetrates through one side of the base 5, and is in threaded connection with the base 5, and one end of the fastening bolt 10 abuts against the protective cover 301. After the position of the mirror body 1 is adjusted, the protective cover 301 can be fixed firmly by the fastening bolt 10, so as to prevent the mirror body 1 from rotating with the protective cover 301.

[0033] The base 5 is externally fixed with a plurality of mounting plates 16, and each mounting plate 16 is provided with a rectangular mounting hole 17 at the top end. In actual use, a plurality of screws are used to penetrate through the rectangular mounting holes 17, so as to improve the stability of the base 5, and further improve the stability of the mirror body 1 in use.

[0034] In use, the base 5 is fixed on the double-frequency laser interferometer of the photoetching machine through the mounting plates 16, and then the arc-shaped plate 304 is pushed into the receiving cavity 303, so that the mirror body 1 can be used. When the angle of the mirror body 1 needs to be adjusted, the staff member holds the protective cover 301 to drive the mirror frame 2 and the rotating disc 4 to rotate on the base 5, and the inverted L-shaped indicating needle 7 rotates with the protective cover 301. The staff member can know the angle of the protective cover 301 and the mirror body 1 by the scale line 8 pointed by the inverted L-shaped indicating needle 7. After reaching the specified position, the fastening bolt 10 on the side wall of the base 5 is tightened to firmly abut against the protective cover 301, so that the mirror body 1 can be fixed for use. In this embodiment, the protective cover 301 is used to assist in adjusting the rotation angle of the mirror body 1, and the protective cover 301 cooperates with the arc-shaped plate 304 to protect the outside of the mirror body 1, so as to prevent the connection between the mirror frame 2 and the rotating disc 4 from being affected by the accidental touch of the mirror frame 2 during the adjustment process. In addition, the protective cover 301 has a large volume, and is more convenient to adjust.

[0035] Referring to the drawings Figures 1-5 The rotating disc 4 is movably provided with two fixed blocks 11 at the top, and the two fixed blocks 11 clampingly fix the mirror frame 2.

[0036] The rotating disc 4 is provided with a moving groove 12 at the top end, and a lead screw 13 is rotatably connected in the moving groove 12. Two nut blocks 14 are in threaded connection with the lead screw 13, and the thread directions between the lead screw 13 and the two nut blocks 14 are opposite, so that the movement directions of the two nut blocks 14 are opposite. The two nut blocks 14 are respectively in detachable connection with the two fixed blocks 11. The two nut blocks 14 on the lead screw 13 drive the two fixed blocks 11 to move and clamp the mirror frame 2, so as to facilitate the installation and dismounting of the mirror frame 2, and facilitate the staff member to quickly dismount the mirror frame 2 to clean and replace the mirror body 1.

[0037] A knob 15 is penetrated through the front end of the rotary disc 4, the rear end of the knob 15 is penetrated through the rotary disc 4 and is fixed with the front end of the screw rod 13, and the knob 15 and the rotary disc 4 are detachably connected together, the knob 15 is rotated to drive the screw rod 13 to rotate, and use is more convenient.

[0038] Although the utility model has been described in detail above with general description and specific embodiments, some modifications or improvements can be made on the basis of the utility model, which is obvious to those skilled in the art. Therefore, these modifications or improvements made on the basis of not deviating from the spirit of the utility model all belong to the scope of protection required by the utility model.

Claims

1. A mirror adjustment structure for a dual frequency laser interferometer of a lithography machine, characterized in that: It includes mirror body (1) and mirror frame (2) of mirror body (1) outside, mirror frame (2) top is connected with adjusting assembly (3), mirror frame (2) bottom is connected with rotating disc (4), rotating disc (4) outside movable sleeve is equipped with base (5); The adjusting assembly (3) includes a protective cover (301), the protective cover (301) is sleeved outside the mirror frame (2), the protective cover (301) top end is connected with the mirror frame (2) top end through the connecting assembly (6), the base (5) top is provided with an annular sliding slot (302), the protective cover (301) bottom end extends into the annular sliding slot (302), the protective cover (301) is provided with a receiving cavity (303), and the receiving cavity (303) is provided with an arc-shaped plate (304) which is slidably arranged in the receiving cavity (303).

2. The lithography dual frequency laser interferometer mirror adjustment structure of claim 1, wherein: The protective cover (301) rear end is fixedly provided with a reverse L-shaped indicating needle (7), and the base (5) outer wall surface is processed with a scale line (8).

3. The lithography dual frequency laser interferometer mirror adjustment structure of claim 1, wherein: The connecting assembly (6) includes a spring latch (601), the spring latch (601) bottom end penetrates out of the protective cover (301), the spring latch (601) pin head bottom end is fixedly provided with an insertion block (602), the mirror frame (2) top end is provided with an insertion slot (603) matched with the insertion block (602), and the insertion block (602) is inserted with the insertion slot (603).

4. The lithography dual frequency laser interferometer mirror adjustment structure of claim 1, wherein: The arc-shaped plate (304) outer wall is fixedly provided with a pulling block (9), the base (5) one side outer wall penetrates a fastening bolt (10), the fastening bolt (10) is threadedly connected with the base (5), and one end of the fastening bolt (10) abuts against the protective cover (301).

5. The lithography dual frequency laser interferometer mirror adjustment structure of claim 1, wherein: The rotating disc (4) top is movably provided with two fixed blocks (11), and the two fixed blocks (11) clamp and fix the mirror frame (2).

6. The lithography dual frequency laser interferometer mirror adjustment structure of claim 5, wherein: The rotating disc (4) top end is provided with a moving slot (12), the moving slot (12) is rotatably connected with a lead screw (13), the lead screw (13) is threadedly connected with two nut blocks (14), the thread directions of the two nut blocks (14) and the lead screw (13) are opposite, so that the two nut blocks (14) move in opposite directions, and the two nut blocks (14) are detachably connected with the two fixed blocks (11) respectively.

7. The lithography dual frequency laser interferometer mirror adjustment structure of claim 6, wherein: The rotating disc (4) front end penetrates a handle (15), the handle (15) rear end penetrates the rotating disc (4) and is fixed with the lead screw (13) front end, and the handle (15) and the rotating disc (4) are detachably connected together.

8. The lithography dual frequency laser interferometer mirror adjustment structure of claim 1, wherein: The base (5) outer wall is fixedly provided with a plurality of mounting plates (16), and the mounting plates (16) are provided with rectangular mounting holes (17) at the top ends.

Images