Multi-stage filter

Abstract

The utility model relates to the technical field of chemical reagent production, and particularly discloses a multi-stage filter which comprises a first box body, a second box body, a first filter assembly, a second filter assembly and a suction pump, a tee joint a communicated with the first box body is mounted at the bottom of the first box body; one side of the upper part of the second box body is provided with a tee joint b communicated with the second box body, the bottom of the second box body is provided with a tee joint c communicated with the second box body, and one side of the upper part of the second box body is also provided with a tee joint d not communicated with the second box body; the first filtering assembly comprises two first filtering barrels, the second filtering assembly comprises two second filtering barrels, and the suction pump is connected with the tee joint d. The semiconductor cleaning agent can be filtered for multiple times through the first filtering assembly and the second filtering assembly, so that the cleanliness of the filtered semiconductor cleaning agent is effectively guaranteed; the two first filtering barrels and the two second filtering barrels are alternately used, continuous work can be achieved, time waste is avoided, and the working efficiency is greatly improved.

Description

Technical Field

[0001] This application relates to the field of chemical reagent production technology, and in particular to a multi-stage filter. Background Technology

[0002] With the rapid development of the electronic information industry, semiconductors have become particularly important in integrated circuit production, and the quality of semiconductors directly affects the quality of integrated circuits.

[0003] Cleaning is an essential process in all stages of semiconductor manufacturing. It is mainly used to remove ultrafine particulate contaminants, metals, organic matter, and photoresist masks left over from the previous process of semiconductor materials. It also requires wet etching of thin film materials such as silicon oxide, silicon nitride, or metals to prepare the surface conditions of the semiconductor for the next process, so that the surface of the semiconductor can achieve technical indicators such as no corrosion, oxidation, and no residue.

[0004] After the semiconductor cleaning agent is produced, it needs to be filtered to ensure its high cleanliness. However, the filters used in the existing technology for filtering semiconductor cleaning agents can only achieve single-layer filtration, which has poor filtration effect. Furthermore, the machine needs to be stopped when the filter screen is replaced, which wastes a lot of time and has low work efficiency.

[0005] To address the aforementioned issues, this application discloses a multi-stage filter. Utility Model Content

[0006] To overcome the shortcomings of the prior art, this application discloses a multi-stage filter.

[0007] To achieve the above objectives, the technical solution adopted in this application is as follows: a multi-stage filter, comprising a first housing, a second housing, a first filter assembly, a second filter assembly, and a suction pump; a tee a communicating with the bottom of the first housing is installed thereon; a tee b communicating with the second housing is installed on one side of the upper part of the second housing, a tee c communicating with the second housing is installed on the bottom of the second housing, and a tee d not communicating with the second housing is also installed on one side of the upper part of the second housing; the first filter assembly comprises two first filter barrels, which are respectively disposed on the outside of the first housing, and the tee a is connected to the bottom of the two first filter barrels respectively through two first corrugated pipes; the tops of the two first filter barrels are respectively connected to the tee b through second corrugated pipes; the second filter assembly comprises two second filter barrels, which are respectively disposed on the outside of the second housing, and the tee c is connected to the bottom of the two second filter barrels respectively through two third corrugated pipes; the tops of the two second filter barrels are respectively connected to the tee d through fourth corrugated pipes; the suction pump is connected to the tee d.

[0008] More preferably, a first flow sensor and a first valve are respectively installed between the three-way valve a and the two first bellows.

[0009] More preferably, a second flow sensor and a second valve are respectively installed between the tee C and the two third bellows.

[0010] More preferably, the first filter barrel and the second filter barrel each include an upper barrel body, a lower barrel body, and a filter screen plate, wherein the upper barrel body and the lower barrel body are fixed together by a threaded structure, and the filter screen plate is disposed in the lower barrel body.

[0011] A further preferred embodiment is that the lower part of the lower barrel has a step, and the filter screen is fixed to the step by bolts.

[0012] More preferably, the pore size of the filter screen plate in the first filter barrel is larger than the pore size of the filter screen plate in the second filter barrel.

[0013] This application achieves the following beneficial effects:

[0014] This application enables multiple filtrations of the semiconductor cleaning agent through the first and second filtration components, effectively ensuring the cleanliness of the filtered semiconductor cleaning agent. In addition, by using two first filter barrels and two second filter barrels alternately, this application can achieve continuous operation, avoid wasting time, and greatly improve work efficiency.

[0015] Other features and advantages of this application will be set forth in the following description and will be apparent in part from the description, or may be learned by practicing the application. The objectives and other advantages of this application may be realized and obtained by means of the structures shown in the description and the accompanying drawings. Attached Figure Description

[0016] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with the disclosure of this application and, together with the specification, serve to explain the principles of this disclosure.

[0017] Figure 1 This is a schematic diagram of the overall structure disclosed in this application;

[0018] Figure 2 This is a schematic diagram of the side structure disclosed in this application;

[0019] Figure 3 This is a schematic diagram of the first filter barrel structure disclosed in this application;

[0020] In the diagram: 10, First housing; 20, Second housing; 30, First filter assembly; 31, First filter barrel; 311, Upper barrel; 312, Lower barrel; 3121, Step; 313, Filter screen; 314, Bolt; 40, Second filter assembly; 41, Second filter barrel; 50, Suction pump; 60, T-junction a; 70, T-junction b; 80, T-junction c; 90, T-junction d; 100, First bellows; 110, Second bellows; 120, Third bellows; 140, Fourth bellows; 150, First flow sensor; 160, First valve; 170, Second flow sensor; 180, Second valve. Detailed Implementation

[0021] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments.

[0022] In the description of this application, it should be understood that the terms "opening", "upper", "lower", "thickness", "top", "middle", "length", "inner", "around", etc., which indicate orientation or positional relationship, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the component or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0023] Example

[0024] To address the problem that existing filters used for filtering semiconductor cleaning agents can only perform single-layer filtration, thus failing to guarantee the quality of the filtered semiconductor cleaning agent, this paper refers to... Figures 1-3As shown, this application discloses a multi-stage filter, including a first housing 10, a second housing 20, a first filter assembly 30, a second filter assembly 40, and a suction pump 50; a tee a60 communicating with the bottom of the first housing 10 is installed there; a tee b70 communicating with the second housing 20 is installed on one side of the upper part of the second housing 20, a tee c80 communicating with the bottom of the second housing 20 is installed there, and a tee d90 not communicating with the second housing 20 is also installed on one side of the upper part of the second housing 20; the first filter assembly 30 includes two first filter barrels 31, which are respectively disposed on the outside of the first housing 10. The tee a60 is connected to the bottom of the two first filter barrels 31 via two first corrugated pipes 100 respectively; the top of the two first filter barrels 31 is connected to the tee b70 via second corrugated pipes 110 respectively; the second filter assembly 40 includes two second filter barrels 41, which are respectively located on the outside of the second housing 20; the tee c80 is connected to the bottom of the two second filter barrels 41 via two third corrugated pipes 120 respectively; the top of the two second filter barrels 41 is connected to the tee d90 via fourth corrugated pipes 140 respectively; the suction pump 50 is connected to the tee d90.

[0025] In addition to the above structure, a first flow sensor 150 and a first valve 160 are respectively installed between the tee a60 and the two first bellows 100, and a second flow sensor 170 and a second valve 180 are respectively installed between the tee c80 and the two third bellows 120.

[0026] Based on the above structure, in the specific implementation process of this application, the produced semiconductor cleaning agent is poured into the first tank 10 and the suction pump 50 is started. Under normal conditions, only the first valve 160 and the second valve 180 are open. The semiconductor cleaning agent in the first tank 10 enters a first filter tank 31, and the corresponding first flow sensor 150 will detect the flow in real time. After that, the semiconductor cleaning agent will flow into the second tank 20 and then into a second filter tank 41, and the corresponding second flow sensor 170 will detect the flow in real time. During the above operation, if the flow value detected by the first flow sensor 150 is lower than the set threshold, the corresponding first valve 160 will be closed and the other first valve 160 will be opened. If the flow value detected by the second flow sensor 170 is lower than the set threshold, the corresponding second valve 180 will be closed and the other second valve 180 will be opened. In this way, the semiconductor cleaning agent can be filtered multiple times continuously, which has strong practicality.

[0027] In one specific embodiment, the first filter barrel 31 and the second filter barrel 41 of this application respectively include an upper barrel body 311, a lower barrel body 312 and a filter screen plate 313. The upper barrel body 311 and the lower barrel body 312 are fixed together by a threaded structure. The filter screen plate 313 is disposed in the lower barrel body 312. During the installation process, the operator fixes the filter screen plate 313 in the lower barrel body 312 and then screws the lower barrel body 312 onto the upper barrel body 311. During the specific filtration process, the semiconductor cleaning agent will move from bottom to top, and the filtered impurities will be located in the lower barrel body 312. In this way, it is convenient for the operator to disassemble and clean.

[0028] This application provides a step 3121 at the bottom of the interior of the lower barrel 312. The filter screen 313 is fixed to the step 3121 by bolts 314. Based on this design, when disassembling and assembling the filter screen 313, the operator only needs to tighten the bolts 314, which is simple to operate and can reduce the labor intensity of the operator.

[0029] In one specific embodiment, the filter hole diameter of the filter screen plate 313 in the first filter barrel 31 is larger than the filter hole diameter of the filter screen plate 313 in the second filter barrel 41. That is to say, the two first filter barrels 31 are for filtering large particulate impurities in the cleaning agent, while the two second filter barrels 41 are for filtering small particulate impurities in the cleaning agent. This design is reasonable and has high practicality.

[0030] In the description of this specification, the references to terms such as "an embodiment," "example," "specific example," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0031] The above embodiments are only for illustrating the technical concept and features of this application, and are intended to enable those skilled in the art to understand the content of this application and implement it accordingly. They should not be used to limit the scope of protection of this application. All equivalent changes or modifications made in accordance with the spirit and essence of this application should be included within the scope of protection of this application.

Claims

1. A multi-stage filter, characterized in that, The system includes a first housing (10), a second housing (20), a first filter assembly (30), a second filter assembly (40), and a suction pump (50). A tee a (60) communicating with the bottom of the first housing (10) is installed therethrough. A tee b (70) communicating with the top of the second housing (20) is installed therethrough, and a tee c (80) communicating with the bottom of the second housing (20) is installed therethrough. A tee d (90) not communicating with the top of the second housing (20) is also installed therethrough. The first filter assembly (30) includes two first filter barrels (31), which are respectively located on the outside of the first housing (10). The tee a (60)... The two first corrugated pipes (100) are respectively connected to the bottom of the two first filter barrels (31); the top of the two first filter barrels (31) are respectively connected to the tee b (70) through the second corrugated pipes (110); the second filter assembly (40) includes two second filter barrels (41), which are respectively located on the outside of the second housing (20); the tee c (80) is respectively connected to the bottom of the two second filter barrels (41) through the two third corrugated pipes (120); the top of the two second filter barrels (41) is respectively connected to the tee d (90) through the fourth corrugated pipes (140); the suction pump (50) is connected to the tee d (90).

2. A multi-stage filter according to claim 1, characterized in that, A first flow sensor (150) and a first valve (160) are respectively installed between the tee a (60) and the two first bellows (100).

3. A multi-stage filter according to claim 1, characterized in that, A second flow sensor (170) and a second valve (180) are respectively installed between the tee c (80) and the two third bellows (120).

4. A multi-stage filter according to claim 1, characterized in that, The first filter barrel (31) and the second filter barrel (41) respectively include an upper barrel body (311), a lower barrel body (312) and a filter screen plate (313). The upper barrel body (311) and the lower barrel body (312) are fixed by a threaded structure, and the filter screen plate (313) is located inside the lower barrel body (312).

5. A multi-stage filter according to claim 4, characterized in that, The lower part of the lower barrel (312) is provided with a step (3121), and the filter screen (313) is fixed to the step (3121) by bolts (314).

6. A multi-stage filter according to claim 4, characterized in that, The filter hole diameter of the filter screen plate (313) in the first filter barrel (31) is larger than the filter hole diameter of the filter screen plate (313) in the second filter barrel (41).

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