Wafer adsorption rotary carrying table with dust collection function

The wafer rotary stage, which integrates adsorption and dust collection functions, solves the problem of dust removal, achieves miniaturization and stability of the equipment, and is suitable for various wafer processing needs.

CN223651391UActive Publication Date: 2025-12-09SUZHOU DELPHI LASER +1
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Patent Information

Application Number
CN202423176344.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-23
Publication Date
2025-12-09
Estimated Expiration
2034-12-23

AI Technical Summary

Technical Problem

The existing rotating stage lacks a dust collection function, making it difficult to effectively remove dust and debris, which affects the stability and efficiency of wafer processing.

Method used

A wafer adsorption rotary stage for dust collection was designed, integrating adsorption, rotation and dust collection functions. Through the integrated design of vacuum adsorption and dust collection components, a vacuum generator is used to generate negative pressure to adsorb wafers, and dust is removed through a dust collection pipeline system.

Benefits of technology

The equipment features miniaturization and integrated design, ensuring stability and flexibility during wafer processing. It is suitable for wafers of different sizes and types, improving processing efficiency and cleanliness.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to a wafer adsorption rotary carrying table with a dust collection function, which comprises an adsorption upper jig plate, a carrying table adapter plate, a DD motor, a motor bottom plate and an adsorption lower jig plate, the adsorption upper jig plate and the adsorption lower jig plate are sequentially arranged on the carrying table adapter plate from top to bottom, and the DD motor arranged on the motor bottom plate drives the carrying table adapter plate above to rotate; notches are formed in one side of the adsorption upper jig plate and one side of the adsorption lower jig plate, and a side pushing positioning mechanism matched with the notches is arranged on the left side of the motor bottom plate; a dust collection assembly is arranged at the bottom of the motor bottom plate. Due to the integrated design of adsorption, rotation and dust collection, the occupied volume of the equipment is small. And reliability: mechanical vacuum adsorption provides stable adsorption force, so that the stability of the wafer in the processing process can be ensured. And universality: the method is suitable for wafers of different sizes and types, and the flexibility is high.
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Description

Technical Field

[0001] This utility model relates to the field of semiconductor processing technology, and in particular to a wafer adsorption rotary stage with dust collection. Background Technology

[0002] Silicon and silicon carbide are raw materials for manufacturing semiconductor silicon devices and can be used in wafer fabrication, forming the backbone of the modern information technology industry. Furthermore, they are environmentally friendly and have a very broad future prospect, making wafer processing and manufacturing a popular sector within the semiconductor industry. With the continuous development and innovation of semiconductor technology, customer demands for individual machines are becoming more diversified. This patent can be used to adsorb silicon wafers and silicon carbide to meet micro-machining needs such as irregular cutting and drilling.

[0003] Wafer mounting technology is a seemingly insignificant but crucial step. Whether it's etching, deposition, or photolithography, the wafer must be stably and precisely fixed in the correct position to ensure efficient chip production. Typically, we choose to install a dust extraction device externally on the rotary stage assembly because the rotary stage itself is quite complex and there's no space to integrate a dust extraction device.

[0004] In view of the above-mentioned shortcomings, the designer actively researched and innovated in order to create a wafer adsorption rotating platform with dust collection, which would make it more valuable for industrial applications. Utility Model Content

[0005] To solve any of the above-mentioned technical problems, the purpose of this utility model is to provide a wafer adsorption rotary stage with dust collection.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] A wafer adsorption rotary stage with dust collection includes an upper adsorption fixture plate, a stage transfer plate, a DD motor, a motor base plate, and a lower adsorption fixture plate. The upper adsorption fixture plate and the lower adsorption fixture plate are installed on the stage transfer plate from top to bottom. The DD motor installed on the motor base plate drives the upper stage transfer plate to rotate.

[0008] Notches are provided on one side of both the upper and lower adsorption fixture plates, and a side-push positioning mechanism adapted to the notches is provided on the left side of the motor base plate.

[0009] A dust collection assembly is installed at the bottom of the motor base plate. The dust collection assembly includes a first dust collection pipe, a second dust collection pipe, and a bellows adapter flange. The first dust collection pipe is installed at the bottom of the motor base plate through a dust collection adapter plate. The second dust collection pipe is installed at the bottom of the motor base plate through an air pipe limiting block and a dust collection reinforcing block. The top of the first dust collection pipe is connected to the dust collection port at the bottom of the platform adapter plate. The bottom of the first dust collection pipe is connected to the first side of the second dust collection pipe. The second side of the second dust collection pipe is connected to the bellows adapter flange through a universal dust collection conversion block.

[0010] As a further improvement of this utility model, a sealing block is installed inside the platform adapter plate by means of a non-detachable screw.

[0011] As a further improvement of this utility model, a left photoelectric sensor is installed on the left side of the motor base plate via a left sensor mounting block, and a right photoelectric sensor is installed on the right side of the motor base plate via a right sensor mounting block. A photoelectric sensing sheet adapted to the left and right photoelectric sensors is installed on the platform adapter plate.

[0012] As a further improvement of this utility model, the side-push positioning mechanism includes a cylinder mounting plate installed on the motor base plate, and a pneumatic slide is installed on the cylinder mounting plate. The pneumatic slide drives the product positioning block above to move in the left and right directions.

[0013] As a further improvement of this utility model, the cylinder mounting plate is locked to the motor base plate by a positioning block on one side.

[0014] As a further improvement of this utility model, the bearing fixing plate is installed on the drive end of the pneumatic slide, and the product positioning block is connected to the bearing on the bearing fixing plate through several guide columns.

[0015] As a further improvement of this utility model, at least one elastic connector is also installed between the product positioning block and the bearing fixing plate.

[0016] As a further improvement of this utility model, the elastic connecting member is a spring.

[0017] By means of the above solution, this utility model has at least the following advantages:

[0018] 1. High integration: The adsorption, rotation and dust collection are integrated into one design, and the equipment occupies a small volume.

[0019] 2. Reliability: Mechanical vacuum adsorption provides a stable adsorption force, which can ensure the stability of the wafer during the processing.

[0020] 3. Versatility: Applicable to wafers of different sizes and types, offering high flexibility.

[0021] The above description is only an overview of the technical solution of this utility model. In order to better understand the technical means of this utility model and to implement it in accordance with the contents of the specification, the preferred embodiments of this utility model are described in detail below with reference to the accompanying drawings. Attached Figure Description

[0022] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the structure of a wafer adsorption rotating platform with dust collection according to this utility model;

[0024] Figure 2 yes Figure 1 Structural diagram of the product with a central strip;

[0025] Figure 3 yes Figure 1 A schematic diagram of the middle side thrust positioning mechanism;

[0026] Figure 4 yes Figure 1 A schematic diagram of the bottom structure.

[0027] The meanings of the labels in the figures are as follows.

[0028] 1. Sealing block; 2. Unremovable screw; 3. Product; 4. Upper suction fixture plate; 5. Platform adapter plate; 6. DD motor; 7. Side push positioning mechanism; 8. Left photoelectric sensor; 9. Left sensor mounting block; 10. Motor base plate; 11. Notch; 12. Photoelectric sensor sheet; 13. Lower suction fixture plate; 14. Right sensor mounting block; 15. Right photoelectric sensor; 16. Product positioning block; 17. Elastic connector; 18. Bearing fixing plate; 19. Bearing; 20. Guide column; 21. Pneumatic slide; 22. First air pipe connector; 23. Cylinder mounting plate; 24. Positioning block; 25. Second air pipe connector; 26. Dust collection adapter plate; 27. First dust collection pipe; 28. Air pipe limiting block; 29. ​​Dust collection reinforcing block; 30. Second dust collection pipe; 31. Universal dust collection conversion block; 32. Corrugated pipe adapter flange. Detailed Implementation

[0029] The specific embodiments of this utility model will be further described in detail below with reference to the accompanying drawings and examples. The following examples are used to illustrate this utility model, but are not intended to limit the scope of this utility model.

[0030] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0031] like Figures 1-4 As shown, a wafer adsorption rotary stage with dust collection includes an upper adsorption fixture plate 4, a stage adapter plate 5, a DD motor 6, a motor base plate 10, and a lower adsorption fixture plate 13. The upper adsorption fixture plate 4 and the lower adsorption fixture plate 13 are installed sequentially from top to bottom on the stage adapter plate 5. The DD motor 6, mounted on the motor base plate 10, drives the upper stage adapter plate 5 to rotate. A sealing block 1 is installed inside the stage adapter plate 5 by a non-detachable screw 2.

[0032] A notch 11 is provided on one side of both the upper suction fixture plate 4 and the lower suction fixture plate 13. A side-push positioning mechanism 7 adapted to the notch 11 is provided on the left side of the motor base plate 10.

[0033] The side-push positioning mechanism 7 includes a cylinder mounting plate 23 mounted on the motor base plate 10. The cylinder mounting plate 23 is locked to the motor base plate 10 by a positioning block 24 on one side. A pneumatic slide 21 is mounted on the cylinder mounting plate 23, and the pneumatic slide 21 drives the product positioning block 16 above to move in the left and right directions.

[0034] The bearing fixing plate 18 is mounted on the drive end of the pneumatic slide table 21, and the product positioning block 16 is connected to the bearing 19 on the bearing fixing plate 18 through several guide posts 20. At least one elastic connector 17, which is a spring, is also installed between the product positioning block 16 and the bearing fixing plate 18.

[0035] A dust collection assembly is provided at the bottom of the motor base plate 10. The dust collection assembly includes a first dust collection pipe 27, a second dust collection pipe 30, and a corrugated pipe adapter flange 32. The first dust collection pipe 27 is installed at the bottom of the motor base plate 10 through a dust collection adapter plate 26. The second dust collection pipe 30 is installed at the bottom of the motor base plate 10 through an air pipe limiting block 28 and a dust collection reinforcing block 29. The top of the first dust collection pipe 27 is connected to the dust collection port at the bottom of the platform adapter plate 5. The bottom of the first dust collection pipe 27 is connected to the first side of the second dust collection pipe 30. The second side of the second dust collection pipe 30 is connected to the corrugated pipe adapter flange 32 through a universal dust collection conversion block 31.

[0036] A left photoelectric sensor 8 is mounted on the left side of the motor base plate 10 via a left sensor mounting block 9, and a right photoelectric sensor 15 is mounted on the right side of the motor base plate 10 via a right sensor mounting block 14. A photoelectric sensing sheet 12 adapted to the left photoelectric sensor 8 and the right photoelectric sensor 15 is mounted on the platform adapter plate 5.

[0037] The installation structure of this utility model:

[0038] Sealing block 1 is mounted on the platform adapter plate 5 using non-removable screws 2. The upper suction fixture plate 4 is assembled onto the lower suction fixture plate 13 using screws. The plates have a flatness of 1 mm and a smoothness of 1.6 mm to prevent air leakage, and are fixed together on the platform adapter plate 5. The platform adapter plate 5 is connected to the DD motor 6 using screws. The left photoelectric sensor 8 is fixed to the left sensor mounting block 9, and similarly, the right photoelectric sensor 15 is fixed to the right sensor mounting block 14, and together they are fixed to the motor base plate 10. The photoelectric sensing element 12 is fixed to the platform adapter plate 5, and the DD motor 6 is fixed to the motor base plate 10.

[0039] The side-push positioning mechanism 7 includes the following components: a product positioning block 16 connected to a guide post 20; a bearing 19 fixed to a bearing mounting plate 18 via a set screw, providing precise guidance for the product positioning block 16 and the guide post 20; a bearing mounting plate 18 connected to the sliding end of a pneumatic slide 21; a first air pipe connector 22 fixed to the pneumatic slide 21; and the entire assembly connected to a cylinder mounting plate 23. An elastic connector 17 is installed between the product positioning block 16 and the bearing mounting plate 18. When a signal is given, the cylinder moves left and right. The bearing provides precise guidance for the guide post, while the spring allows the product positioning block 16 to flexibly press against the product, preventing damage.

[0040] The second air pipe connector 25 is fixed on the platform adapter plate 5, the first dust collection pipe 27 is fixed on the dust collection adapter plate 26, the air pipe limiting block 28 is fixed on the motor base plate 10, the dust collection reinforcing block 29 holds the second dust collection pipe 30, the second dust collection pipe 30 is connected to the dust collection adapter plate 26, the universal dust collection conversion block 31 is connected to the second dust collection pipe 30, and the corrugated pipe conversion flange 32 is connected to the universal dust collection conversion block 31, directly connected to the corrugated pipe. The dust collection fan makes the corrugated pipe connection here to extract dust.

[0041] Brief description of the working principle of this utility model:

[0042] Clicking the adsorption command activates the rotating stage assembly, which uses a vacuum generator to create a negative pressure environment. The vacuum generator evacuates air from the adsorption area, reducing pressure and creating a vacuum zone between the wafer (product 3) and the adsorption fixture. A sealing block ensures the adsorption area is sealed, preventing outside air from entering. This generates sufficient suction to stably adsorb the wafer. An imaging system determines the wafer's notch orientation, and a DD motor rotates to achieve the required processing direction. The fixture features a central hollow design, allowing processing dust and debris to fall below. A synchronous dust collection fan starts, connected to the adapter flange via a corrugated pipe, to remove processing dust and debris. Furthermore, dust collection and venting grooves are provided on the fixture surface to prevent product deformation during suction.

[0043] This invention features high integration, combining adsorption, rotation, and dust collection into a single design, resulting in a compact device footprint. It offers excellent reliability; the mechanical vacuum adsorption provides stable adsorption force, ensuring wafer stability during processing. Furthermore, it boasts good versatility, suitable for wafers of different sizes and types, offering high flexibility.

[0044] In the description of this utility model, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0045] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0046] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present utility model, and these improvements and modifications should also be considered within the protection scope of the present utility model.

Claims

1. A wafer adsorption rotary stage with dust collection, comprising an upper adsorption fixture plate (4), a stage adapter plate (5), a DD motor (6), a motor base plate (10), and a lower adsorption fixture plate (13), wherein the upper adsorption fixture plate (4) and the lower adsorption fixture plate (13) are sequentially mounted on the stage adapter plate (5) from top to bottom, and the DD motor (6) mounted on the motor base plate (10) drives the upper stage adapter plate (5) to rotate; characterized in that: A notch (11) is provided on one side of both the upper adsorption fixture plate (4) and the lower adsorption fixture plate (13). A side-push positioning mechanism (7) adapted to the notch (11) is provided on the left side of the motor base plate (10). A dust collection assembly is provided at the bottom of the motor base plate (10). The dust collection assembly includes a first dust collection pipe (27), a second dust collection pipe (30), and a corrugated pipe adapter flange (32). The first dust collection pipe (27) is installed on the motor through a dust collection adapter plate (26). At the bottom of the base plate (10), the second dust collection pipe (30) is installed at the bottom of the motor base plate (10) through the air pipe limiting block (28) and the dust collection reinforcing block (29). The top of the first dust collection pipe (27) is connected to the dust collection port at the bottom of the platform adapter plate (5). The bottom of the first dust collection pipe (27) is connected to the first side of the second dust collection pipe (30). The second side of the second dust collection pipe (30) is connected to the corrugated pipe adapter flange (32) through the universal dust collection conversion block (31).

2. The wafer adsorption rotating stage with dust collection as described in claim 1, characterized in that, A sealing block (1) is installed inside the platform adapter plate (5) by a non-detachable screw (2).

3. The wafer adsorption rotating stage with dust collection as described in claim 1, characterized in that, A left photoelectric sensor (8) is mounted on the left side of the motor base plate (10) via a left sensor mounting block (9), and a right photoelectric sensor (15) is mounted on the right side of the motor base plate (10) via a right sensor mounting block (14). A photoelectric sensing sheet (12) adapted to the left photoelectric sensor (8) and the right photoelectric sensor (15) is mounted on the platform adapter plate (5).

4. The wafer adsorption rotating stage with dust collection as described in claim 1, characterized in that, The side-push positioning mechanism (7) includes a cylinder mounting plate (23) mounted on the motor base plate (10), and a pneumatic slide (21) is mounted on the cylinder mounting plate (23). The pneumatic slide (21) drives the product positioning block (16) above to move in the left and right directions.

5. The wafer adsorption rotating stage with dust collection as described in claim 4, characterized in that, The cylinder mounting plate (23) is locked to the motor base plate (10) by a positioning block (24) on one side.

6. The wafer adsorption rotating stage with dust collection as described in claim 4, characterized in that, The bearing fixing plate (18) is installed on the drive end of the pneumatic slide (21), and the product positioning block (16) is connected to the bearing (19) on the bearing fixing plate (18) through several guide columns (20).

7. The wafer adsorption rotating stage with dust collection as described in claim 6, characterized in that, At least one elastic connector (17) is also installed between the product positioning block (16) and the bearing fixing plate (18).

8. The wafer adsorption rotating stage with dust collection as described in claim 7, characterized in that, The elastic connector (17) is a spring.