Optical conductive film, dimming conductive film and electrochromic glass

Abstract

The utility model discloses an optical conducting film, a dimming conducting film and electrochromic glass, which comprise a base material layer and an optical combined film layer arranged on one side of the base material layer, and a conducting layer is arranged on one side, deviating from the optical combined film layer, of the base material layer; the optical combined film layer comprises a substrate optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially laminated on the base material layer; the substrate optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer; the barrier film group layer is formed by sequentially overlapping N first optical film layers and N-1 second optical film layers, the first optical film layers are arranged on the two outermost sides of the barrier film group layer, the refractive index of the first optical film layers is larger than that of the second optical film layers, and N is larger than or equal to 2. The optical conductive film provided by the utility model has excellent conductive function, infrared radiation resistance and heat insulation performance, has higher transmission in a visible light wave band, and can effectively block the introduction of solar radiation heat.

Description

TECHNICAL FIELD

[0001] The utility model belongs to optical heat insulation film technical field, concretely relates to a kind of optical conductive film, light-adjusting conductive film and electrochromic glass. BACKGROUND

[0002] With the continuous deepening of the intelligence and electrification of automobile, the experience of various intelligent configurations in actual use scene increasingly becomes the focus of consumers. Panoramic heat-insulating color-changing awning can effectively block more than 90% of ultraviolet rays, has the characteristics such as low heat radiation and low transparency, and is highly recognized by consumers. The awning applying electrochromic technology can also realize stepless adjustment of light and dark degree, and significantly improve the driving comfort and privacy. The electrochromic process depends on a specific device structure, which is usually composed of five layers of functional materials. The two outermost layers are transparent conductive layers, which act as transparent electrodes and are used to uniformly distribute the electric field. The middle three layers are core barrier film layers: electrochromic reaction layer, which is the main body of color change; ion conductor layer, which allows ions to pass through but blocks electrons as an electrolyte; ion storage layer, which provides storage space for ions as a counter electrode.

[0003] The panoramic heat-insulating color-changing awning usually adopts a typical sandwich composite structure, which is composed of three layers of functional materials. The upper layer is coated with silver-plated glass, which mainly reflects the solar radiation from outside the vehicle; the middle layer is the electrochromic layer, which is responsible for adjusting the light transmittance to control the light and dark; the lower layer adopts Low-E coating, and its core function is to block heat exchange and maintain stable temperature inside the vehicle.

[0004] In the panoramic heat-insulating color-changing awning, although the silver-plated glass can effectively reduce the solar radiation from outside the vehicle, the silver-plated film has high absorption in the visible light region. In addition, the silver-plated film also causes certain interference to electromagnetic wave signal transmission, which affects the communication quality of electronic devices inside the vehicle. UTILITY MODEL CONTENTS

[0005] The utility model aims to provide a kind of optical conductive film, light-adjusting conductive film and electrochromic glass, the optical conductive film has electrically conductive function, anti-infrared radiation and heat insulation performance, and can be applied to electrochromic light-adjusting device.

[0006] To achieve the above purpose, the technical scheme provided by a specific embodiment of the utility model is as follows:

[0007] An optical conductive film includes a substrate layer and an optical combination film layer disposed on one side of the substrate layer. The side of the substrate layer facing away from the optical combination film layer is provided with a conductive layer.

[0008] The optical combination film layer includes a base optical matching layer, a barrier film layer and a dielectric optical matching layer, which are sequentially stacked on the substrate layer.

[0009] The base optical matching layer and the medium optical matching layer are arranged symmetrically along the barrier film group layer;

[0010] The barrier film group layer is composed of N first optical film layers and N-1 second optical film layers stacked in sequence, the outermost two sides of the barrier film group layer are first optical film layers, the refractive index of the first optical film layer is greater than that of the second optical film layer, and N is greater than or equal to 2.

[0011] The weighted average reflectivity of the optical conductive film in the near-infrared wave band of 760nm to 1800nm is greater than or equal to 28%.

[0012] In one or more embodiments of the utility model, the conductive layer is any one of ITO layer, FTO layer, GZO layer and AZO layer.

[0013] In one or more embodiments of the utility model, the refractive index of the first optical film layer is 1.9-2.4, and the thickness is 87nm-147nm.

[0014] The refractive index of the second optical film layer is 1.34-1.52, and the thickness is 145nm-205nm.

[0015] In one or more embodiments of the utility model, the first optical film layer is any one of niobium oxide plating layer, titanium oxide plating layer, mixed plating layer of titanium oxide and niobium oxide, zinc aluminum oxide plating layer, indium tin oxide plating layer, tin oxide plating layer and tungsten oxide plating layer; and / or,

[0016] The second optical film layer is any one of silicon oxide plating layer, magnesium fluoride plating layer, mixed plating layer of aluminum and silicon dioxide, and mixed plating layer of silicon nitride and silicon oxide.

[0017] In one or more embodiments of the utility model, the refractive index of the base optical matching layer and the refractive index of the medium optical matching layer are both 1.6-1.8.

[0018] In one or more embodiments of the utility model, the base optical matching layer and the medium optical matching layer are any one of aluminum oxide plating layer, calcium oxide plating layer and mixed plating layer of aluminum oxide and silicon oxide; and / or,

[0019] The thickness of the base optical matching layer and the thickness of the medium optical matching layer are both 50nm-100nm.

[0020] In one or more embodiments of the present invention, the substrate optical matching layer includes a first substrate optical matching layer and a second substrate optical matching layer, and the dielectric optical matching layer includes a first dielectric optical matching layer and a second dielectric optical matching layer. The second substrate optical matching layer and the second dielectric optical matching layer are disposed adjacent to the barrier film layer. The refractive index of the first substrate optical matching layer is greater than the refractive index of the second substrate optical matching layer, and the refractive index of the first dielectric optical matching layer is greater than the refractive index of the second dielectric optical matching layer.

[0021] In one or more embodiments of this utility model, the refractive index of the first substrate optical matching layer and the refractive index of the first dielectric optical matching layer are both 1.9-2.4; and / or,

[0022] The refractive index of the second substrate optical matching layer and the refractive index of the second medium optical matching layer are both 1.34-1.52.

[0023] In one or more embodiments of this utility model, the first substrate optical matching layer and the first dielectric optical matching layer are both any one of niobium oxide coating, titanium oxide coating, and zinc-aluminum oxide coating; and / or,

[0024] Both the second substrate optical matching layer and the second dielectric optical matching layer are any one of silicon oxide coating, magnesium fluoride layer, lithium fluoride coating, or a mixed coating of silicon oxide and silicon nitride.

[0025] In one or more embodiments of this utility model, the thickness of the first substrate optical matching layer and the thickness of the first dielectric optical matching layer are both 8nm-18nm; and / or,

[0026] The thickness of the second substrate optical matching layer and the thickness of the second dielectric optical matching layer are both 24nm-44nm.

[0027] In one or more embodiments of this utility model, an adhesive layer is further provided between the substrate layer and the substrate optical matching layer. The adhesive layer is any one of a silicon coating, a titanium oxide coating, and a silicon nitride coating, and the thickness of the adhesive layer is less than or equal to 2 nm.

[0028] In one or more embodiments of this utility model, a hardening layer is provided between the substrate layer and the conductive layer, and the thickness of the hardening layer is 1μm-5μm.

[0029] The technical solution provided by another specific embodiment of this utility model is as follows:

[0030] A dimming conductive film includes an optical conductive film, wherein a dimming color-changing layer and an electrode layer are sequentially stacked on the side of the conductive layer opposite to the substrate layer.

[0031] The technical scheme provided by another specific embodiment of the utility model is as follows:

[0032] An electrochromic glass comprises a first glass, a light-adjusting conductive film and a second glass which are sequentially stacked.

[0033] Compared with the prior art, the optical conductive film has not only the conductive function as an electrode, but also excellent infrared radiation resistance and heat insulation performance, has a higher transmittance in the visible light band (400nm-700nm), has a strong reflection effect on near-infrared solar radiation, and has a weighted reflectivity in the near-infrared band (760nm-1800nm) of 28%-59%, thereby effectively blocking the entry of solar radiation heat.

[0034] The optical conductive film can be applied to an electrochromic light-adjusting device, has excellent infrared radiation resistance and stable light-adjusting electrode performance, can not only meet the application requirements of a sky screen and light-adjusting glass, but also can significantly promote the lightweight development of a device structure. BRIEF DESCRIPTION OF DRAWINGS

[0035] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or the prior art, the drawings needed to be used in the embodiment or the prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments in the utility model, and for those skilled in the art, other drawings can also be obtained according to these drawings without creative labor.

[0036] Figure 1 It is a structural schematic view of the optical conductive film in one embodiment of the utility model;

[0037] Figure 2 It is a structural schematic view of the optical combination film layer in the optical conductive film in one embodiment of the utility model;

[0038] Figure 3 It is a structural schematic view of the base optical matching layer and the medium optical matching layer in the optical conductive film in one embodiment of the utility model;

[0039] Figure 4 It is a structural schematic view of the optical conductive film in one embodiment of the utility model;

[0040] Figure 5 It is a structural schematic view of the optical conductive film in one embodiment of the utility model;

[0041] Figure 6 It is a structural schematic view of the light-adjusting conductive film in one embodiment of the utility model;

[0042] Figure 7 This is a schematic diagram of the structure of electrochromic glass in one embodiment of the present invention;

[0043] Figures 8-20 The graphs show the reflection of the optical conductive film in visible light and near-infrared light in Embodiments 1-9 and Comparative Examples 1-4 of this utility model.

[0044] Explanation of key figure labels:

[0045] 1. Substrate layer; 10. Optical composite film layer; 2. Adhesive layer; 3. Substrate optical matching layer; 31. First substrate optical matching layer; 32. Second substrate optical matching layer; 4. Barrier film assembly layer; 41. First optical film layer; 42. Second optical film layer; 5. Dielectric optical matching layer; 51. First dielectric optical matching layer; 52. Second dielectric optical matching layer; 6. Hardening layer; 7. Conductive layer; 8. Light-changing color-changing layer; 9. Electrode layer; 111. First glass; 112. Second glass. Detailed Implementation

[0046] To enable those skilled in the art to better understand the technical solutions in this disclosure, the technical solutions in the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments in this disclosure, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of this disclosure.

[0047] A specific embodiment of this utility model provides an optical conductive film, such as... Figure 1 As shown, the optical composite film layer 10 includes a substrate layer 1 and an optical composite film layer 10 disposed on one side of the substrate layer 1. A conductive layer 7 is disposed on the side of the substrate layer 1 facing away from the optical composite film layer 10. The optical composite film layer 10 includes a base optical matching layer 3, a barrier film group layer 4, and a dielectric optical matching layer 5 sequentially stacked on the substrate layer 1. The base optical matching layer 3 and the dielectric optical matching layer 5 are symmetrically arranged along the barrier film group layer 4. The barrier film group layer 4 is composed of N first optical film layers 41 and N-1 second optical film layers 42 sequentially stacked. The outermost two sides of the barrier film group layer 4 are both first optical film layers 41. The refractive index of the first optical film layer 41 is greater than that of the second optical film layer 42, and N≥2. In order to ensure good reflection effect in the near-infrared band, N≥2 in this invention, that is, the barrier film group layer 4 has at least two first optical film layers 41 and at least one corresponding second optical film layer 42.

[0048] Specifically, first, the first optical film layer 41 (high refractive index) and the second optical film layer 42 (low refractive index) with different refractive indexes are stacked and arranged, and the number of layers of the first optical film layer 41 and the second optical film layer 42 is controlled, so that the film can effectively ensure excellent reflectivity in the near-infrared wave band, and different numbers of layers of the first optical film layer 41 and the second optical film layer 42 can be used according to different heat insulation needs. Through the above setting, the weighted average reflectivity of the optical conductive film in the near-infrared wave band of 760nm-1800nm is greater than or equal to 28%.

[0049] Secondly, the utility model discloses a conductive layer 7 is arranged on the substrate layer 1, and the optical conductive film has the conductive function, so that the optical conductive film can be applied to the electrochromic light modulation device, thereby when meeting the light modulation demand, the heat can be effectively blocked from entering, and excellent heat insulation effect is achieved.

[0050] Further, the substrate layer 1 is selected from transparent materials with high light transmittance, and PET (polyethylene terephthalate), TAC (triacetyl cellulose), PMMA (polymethyl methacrylate), PC (polycarbonate), COP (cyclic olefin polymer) and CPI (transparent polyimide) can be selected.

[0051] Further, the substrate optical matching layer 3 and the medium optical matching layer 5 in the utility model mainly match the barrier film group layer 4 to ensure that the entire optical film has good transmittance in the visible light wave band, and also can reduce the reflectivity of the film material in the visible light wave band.

[0052] As a preferred embodiment, the refractive index of the substrate optical matching layer 3 and the medium optical matching layer 5 can adopt a single-layer film structure formed by a medium refractive index material, and the refractive index is 1.6-1.8. The substrate optical matching layer 3 and the medium optical matching layer 5 are any one of an aluminum oxide plating layer, a calcium oxide plating layer, a mixed plating layer of aluminum oxide and silicon oxide. The thickness of the substrate optical matching layer 3 and the thickness of the medium optical matching layer 5 are both 50nm-100nm, and can be 50nm, 60nm, 70nm, 80nm, 90nm or 100nm.

[0053] As another preferred embodiment, the substrate optical matching layer 3 and the medium optical matching layer 5 both adopt a double-layer film structure formed by different refractive index materials, such as Figure 3As shown, the base optical matching layer 3 includes a first base optical matching layer 31 and a second base optical matching layer 32, and the medium optical matching layer 5 includes a first medium optical matching layer 51 and a second medium optical matching layer 52, wherein the second base optical matching layer 32 is located between the first base optical matching layer 31 and the barrier film group layer 4, and the second medium optical matching layer 52 is located between the first medium optical matching layer 51 and the barrier film group layer 4, that is, the second base optical matching layer 32 and the second medium optical matching layer 52 are arranged close to the barrier film group layer 4, so that the first base optical matching layer 31, the second base optical matching layer 32, the first medium optical matching layer 51 and the second medium optical matching layer 52 in the base optical matching layer 3 and the medium optical matching layer 5 constitute a structure symmetrically arranged along the barrier film group layer 4. Wherein, the base optical matching layer 3 and the medium optical matching layer 5 are symmetrically arranged, which means that the base optical matching layer 3 and the medium optical matching layer 5 are symmetrically arranged along the barrier film group layer 4 in terms of position. Regarding the thickness of the base optical matching layer 3 and the thickness of the medium optical matching layer 5, they can be set to be the same or different thicknesses with slight differences according to actual needs.

[0054] Further, the refractive index of the first base optical matching layer 31 is greater than the refractive index of the second base optical matching layer 32.

[0055] Specifically, the refractive index of the first base optical matching layer 31 is 1.9-2.4, and the refractive index of the second base optical matching layer 32 is 1.34-1.52. The first base optical matching layer 31 is any one of a niobium oxide plating layer, a titanium oxide plating layer, and a zinc aluminum oxide plating layer, and the thickness is 8nm-18nm, and specifically can be 8nm, 10nm, 13nm, 15nm, 18nm. The second base optical matching layer 32 is any one of a silicon oxide plating layer, a magnesium fluoride layer, a lithium fluoride plating layer, and a mixed plating layer of silicon oxide and silicon nitride, and the thickness is 24nm-44nm, and specifically can be 24nm, 30nm, 33nm, 35nm, 38nm, 40nm, 44nm. It should be noted that the refractive index, specific type selection, and thickness selection of the first medium optical matching layer 51 in the medium optical matching layer 5 meet the above description of the first base optical matching layer 31, and the refractive index, specific type selection, and thickness selection of the second medium optical matching layer 52 meet the above description of the second base optical matching layer 32.

[0056] Further, the barrier film group layer 4 is composed of N first optical film layers 41 and N-1 second optical film layers 42 stacked in sequence, wherein the refractive index of the first optical film layer is 1.9-2.4, and the thickness is 87nm-147nm, and specifically can be 87nm, 90nm, 95nm, 100nm, 105nm, 110nm, 115nm, 120nm, 125nm, 130nm, 147nm. The refractive index of the second optical film layer is 1.34-1.52, and the thickness is 145nm-205nm, and specifically can be 145nm, 150nm, 160nm, 170nm, 180nm, 205nm. By adjusting the thickness, the barrier film group layer can better reduce reflection.

[0057] Further, the first optical film layer 41 is any one of a niobium oxide plating layer, a titanium oxide plating layer, a mixed plating layer of titanium oxide and niobium oxide, a zinc aluminum oxide plating layer, an indium tin oxide plating layer, a tin oxide plating layer, and a tungsten oxide plating layer. According to actual needs, in order to reduce the influence of the plating layer with conductive performance on the touch function of the display device, for display devices without touch requirements, the first optical film layer with conductive performance can be selected from the zinc aluminum oxide plating layer, the indium tin oxide plating layer, the tin oxide plating layer, and the tungsten oxide plating layer. The second optical film layer 42 is any one of a silicon oxide plating layer, a magnesium fluoride plating layer, a lithium fluoride plating layer, a mixed plating layer of aluminum and silicon dioxide, and a mixed plating layer of silicon nitride and silicon oxide.

[0058] Further, the conductive layer 7 is a transparent metal oxide conductive layer, that is, a TCO material film, such as any one of an ITO layer, an FTO layer, a GZO layer, and an AZO layer, and the thickness is 3nm-500nm, and specifically can be 3nm, 50nm, 100nm, 200nm, 300nm, 400nm, and 500nm. By selecting the transparent conductive materials ITO (indium tin oxide), FTO (fluorine-doped tin oxide), GZO (gallium-doped zinc oxide), and AZO (aluminum-doped zinc oxide), the optical conductive film has high transmittance when it has a conductive function. The thickness of the conductive layer 7 can be set according to different resistance requirements, such as a sheet resistance of about 400Ω / □ when the thickness is 3nm, and a sheet resistance of about 3Ω / □ when the thickness is 500nm. The optical conductive film obtained by selecting the conductive layer 7 with different thicknesses in the utility model has very small reflectivity to the infrared wave band, and can meet the heat insulation requirements.

[0059] Further, as shown in FIG. 1, the barrier film group layer 4 is composed of N first optical film layers 41 and N-1 second optical film layers 42 stacked in sequence, wherein the refractive index of the first optical film layer is 1.9-2.4, and the thickness is 87nm-147nm, and specifically can be 87nm, 90nm, 95nm, 100nm, 105nm, 110nm, 115nm, 120nm, 125nm, 130nm, 147nm. The refractive index of the second optical film layer is 1.34-1.52, and the thickness is 145nm-205nm, and specifically can be 145nm, 150nm, 160nm, 170nm, 180nm, 205nm. By adjusting the thickness, the barrier film group layer can better reduce reflection. Figure 4As shown, an adhesive layer 2 is further provided between the substrate layer 1 and the optical composite film layer 10. The adhesive layer 2 is any one of a silicon coating, a titanium oxide coating, or a silicon nitride coating, which can enhance the adhesion between the substrate layer 1 and the optical composite film layer 10. The thickness of the adhesive layer 2 is less than or equal to 2 nm, specifically 0.5 nm, 1 nm, 1.5 nm, or 2 nm.

[0060] Furthermore, such as Figure 5 As shown, a hardening layer 6 is provided between the substrate layer 1 and the conductive layer 7. The hardening layer 6 is formed by coating with a hardening resin, specifically Shin-Etsu Chemical SY-5228. The hardening layer 6 can improve the hardness of the substrate coating, avoiding damage to the substrate surface before back coating, which would affect the continuity of the conductive layer 7 coating. The thickness of the hardening layer 6 is 2μm-15μm, specifically 2μm, 5μm, 7μm, 10μm, 12μm, and 15μm.

[0061] Another specific embodiment of this utility model provides a dimming conductive film, such as Figure 6 As shown, it includes an optical conductive film, and a color-changing layer 8 and an electrode layer 9 are sequentially stacked on the side of the conductive layer 7 away from the substrate layer 1.

[0062] Specifically, the optically conductive film in this invention can be applied to electrochromic color-changing devices. It not only possesses the conductive function of electrodes but also exhibits excellent resistance to infrared radiation, heat insulation, and high transmittance. When used in automotive sunroofs, it can effectively block the transmission of solar radiation heat from outside the vehicle. The color-changing layer 8 is not specifically limited in this invention; it can be a conventional three-layer structure, such as an electrochromic reaction layer, an ion conductor layer, and an ion storage layer. The electrode layer 9 is also conventionally configured.

[0063] Another specific embodiment of this utility model provides an electrochromic glass, comprising a first glass, the aforementioned dimming conductive film, and a second glass stacked sequentially.

[0064] The present invention will be further described in detail below with reference to specific embodiments.

[0065] In the following examples and comparative cases, the conductive layer material is ITO, with a thickness of approximately 50 nm and a sheet resistance of 32 Ω / □. The thickness of the conductive layer can be adjusted in later applications to meet different sheet resistance requirements.

[0066] Example 1

[0067] The optical conductive film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer. A hardening layer and a conductive layer are sequentially stacked on the side of the substrate layer away from the bonding layer.

[0068] The substrate is PET with a thickness of 125 μm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 37 nm. The hardening layer is formed by acrylic resin coating with a thickness of 1 μm; and the conductive layer is ITO with a thickness of 50 nm.

[0069] The barrier film group layer is composed of two first optical film layers and one second optical film layer which are sequentially stacked, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, and the third layer is the first optical film layer, the first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0070] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm respectively, and the thickness of the second optical film layer is 179 nm.

[0071] Embodiment 2

[0072] The optical conductive film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer. A hardening layer and a conductive layer are sequentially stacked on the side of the substrate layer away from the bonding layer.

[0073] The substrate is PET with a thickness of 125 μm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 34 nm. The hardening layer is formed by acrylic resin coating with a thickness of 1 μm; and the conductive layer is ITO with a thickness of 50 nm.

[0074] The barrier film group layer is composed of 3 first optical film layers and 2 second optical film layers stacked in sequence, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, the third layer is the first optical film layer, the fourth layer is the second optical film layer, and the fifth layer is the first optical film layer. The first optical film layer is made of niobium oxide, and the second optical film layer is made of silicon oxide.

[0075] In the direction away from the substrate layer, the thicknesses of the three first optical film layers are 117 nm, 110 nm and 174 nm in sequence, and the thicknesses of the two second optical film layers are 175 nm and 175 nm in sequence.

[0076] Example 3

[0077] The optical conductive film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer. A hardening layer and a conductive layer are sequentially stacked on the side of the substrate layer away from the bonding layer.

[0078] The substrate is made of PET with a thickness of 125 μm; the bonding layer is made of silicon with a thickness of 0.2 nm; the first base optical matching layer and the first medium optical matching layer are made of niobium oxide with a thickness of 13 nm, and the second base optical matching layer and the second medium optical matching layer are made of silicon oxide with a thickness of 35 nm. The hardening layer is formed by coating with acrylic resin with a thickness of 1 μm; and the conductive layer is made of ITO with a thickness of 50 nm.

[0079] The barrier film group layer is composed of 4 first optical film layers and 3 second optical film layers stacked in sequence, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, the third layer is the first optical film layer, the fourth layer is the second optical film layer, the fifth layer is the first optical film layer, the sixth layer is the second optical film layer, and the seventh layer is the first optical film layer. The first optical film layer is made of niobium oxide, and the second optical film layer is made of silicon oxide.

[0080] In the direction away from the substrate layer, the thicknesses of the four first optical film layers are 116 nm, 102 nm, 102 nm and 116 nm in sequence, and the thicknesses of the three second optical film layers are 171 nm, 164 nm and 171 nm in sequence.

[0081] Example 4

[0082] The optical conductive film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially arranged, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer. A hardening layer and a conductive layer are sequentially arranged on the side of the substrate layer away from the bonding layer.

[0083] The substrate is PET with a thickness of 125 μm; the bonding layer is silicon with a thickness of 0.2 nm; the first base optical matching layer in the base optical matching layer is niobium oxide with a thickness of 15 nm, and the second base optical matching layer is silicon oxide with a thickness of 33 nm. The first medium optical matching layer in the medium optical matching layer is niobium oxide with a thickness of 12 nm, and the second medium optical matching layer is silicon oxide with a thickness of 36 nm. The hardening layer is formed by acrylic resin coating with a thickness of 1 μm; and the conductive layer is ITO with a thickness of 50 nm.

[0084] The barrier film group layer is composed of five first optical film layers and four second optical film layers which are sequentially stacked, that is, in the direction away from the substrate layer of the barrier film group layer, the odd layers, i.e. the first layer, the third layer, the fifth layer, the seventh layer and the ninth layer, in the barrier film group layer are the first optical film layers, and the even layers, i.e. the second layer, the fourth layer and the sixth layer, in the barrier film group layer are the second optical film layers, the first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0085] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the five first optical film layers are 117 nm, 100 nm, 96 nm, 100 nm and 113 nm in sequence, and the thicknesses of the four second optical film layers are 169 nm, 159 nm, 156 nm and 163 nm in sequence.

[0086] Embodiment 5

[0087] The optical conductive film in the embodiment comprises a substrate layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially arranged, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer. A hardening layer and a conductive layer are sequentially arranged on the side of the substrate layer away from the bonding layer.

[0088] The substrate is PET with a thickness of 125 μm; the adhesive layer is silicon with a thickness of 0.2 nm; the first base optical matching layer in the base optical matching layer is niobium oxide with a thickness of 14 nm, and the second base optical matching layer is silicon oxide with a thickness of 33 nm. The first medium optical matching layer in the medium optical matching layer is niobium oxide with a thickness of 12 nm, and the second medium optical matching layer is silicon oxide with a thickness of 33 nm. The hardening layer is formed by acrylic resin coating with a thickness of 1 μm; the conductive layer is ITO with a thickness of 50 nm.

[0089] The barrier film group layer is composed of 6 first optical film layers and 5 second optical film layers stacked in sequence, that is, in the direction away from the substrate layer of the barrier film group layer, the odd layers, i.e., the 1st layer, the 3rd layer, the 5th layer, the 7th layer, the 9th layer, and the 11th layer, are the first optical film layers, and the even layers, i.e., the 2nd layer, the 4th layer, the 6th layer, the 8th layer, and the 10th layer, are the second optical film layers. The first optical film layers are made of niobium oxide, and the second optical film layers are made of silicon oxide.

[0090] In the direction away from the substrate layer of the barrier film group layer, the thicknesses of the six first optical film layers are 115 nm, 102 nm, 94 nm, 94 nm, 100 nm, and 111 nm in sequence, and the thicknesses of the five second optical film layers are 169 nm, 157 nm, 154 nm, 152 nm, and 164 nm in sequence.

[0091] Example 6

[0092] The optical conductive film in this embodiment comprises, which are sequentially stacked, a substrate layer, an adhesive layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer. The base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer. The side of the substrate layer away from the adhesive layer is sequentially stacked with a hardening layer and a conductive layer.

[0093] The substrate is PET with a thickness of 125 μm; the adhesive layer is silicon with a thickness of 0.2 nm; the base optical matching layer is aluminum oxide with a thickness of 75 nm; and the medium optical matching layer is aluminum oxide with a thickness of 75 nm. The hardening layer is formed by acrylic resin coating with a thickness of 1 μm; and the conductive layer is ITO with a thickness of 50 nm.

[0094] The barrier film group layer is composed of 2 first optical film layers and 1 second optical film layer stacked in sequence, that is, in the direction away from the substrate layer of the barrier film group layer, the 1st layer is the first optical film layer, the 2nd layer is the second optical film layer, and the 3rd layer is the first optical film layer. The first optical film layers are made of niobium oxide, and the second optical film layer is made of silicon oxide.

[0095] In the direction away from the base layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm, respectively, and the thickness of the second optical film layer is 179 nm.

[0096] Example 7

[0097] The optical conductive film in the embodiment comprises a base layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked. The base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer. A hardening layer and a conductive layer are sequentially stacked on the side of the base layer away from the bonding layer.

[0098] The base layer is made of PET with a thickness of 125 μm; the bonding layer is made of silicon with a thickness of 0.2 nm; the base optical matching layer is made of aluminum oxide with a thickness of 50 nm; the medium optical matching layer is made of aluminum oxide with a thickness of 50 nm. The hardening layer is formed by coating with acrylic resin with a thickness of 1 μm; the conductive layer is made of ITO with a thickness of 50 nm.

[0099] The barrier film group layer is composed of two first optical film layers and one second optical film layer which are sequentially stacked, i.e. in the direction away from the base layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, and the third layer is the first optical film layer. The first optical film layer is made of niobium oxide, and the second optical film layer is made of silicon oxide.

[0100] In the direction away from the base layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm, respectively, and the thickness of the second optical film layer is 179 nm.

[0101] Example 8

[0102] The optical conductive film in the embodiment comprises a base layer, a bonding layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked. The base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer. A hardening layer and a conductive layer are sequentially stacked on the side of the base layer away from the bonding layer.

[0103] The base layer is made of PET with a thickness of 125 μm; the bonding layer is made of silicon with a thickness of 0.2 nm; the base optical matching layer is made of aluminum oxide with a thickness of 100 nm; the medium optical matching layer is made of aluminum oxide with a thickness of 100 nm. The hardening layer is formed by coating with acrylic resin with a thickness of 1 μm; the conductive layer is made of ITO with a thickness of 50 nm.

[0104] The barrier film group layer is composed of two first optical film layers and one second optical film layer, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, and the third layer is the first optical film layer, the first optical film layer adopts niobium oxide, and the second optical film layer adopts silicon oxide.

[0105] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm, respectively, and the thickness of the second optical film layer is 179 nm.

[0106] Example 9

[0107] The optical conductive film in the embodiment comprises a substrate layer, a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer. The side of the substrate layer away from the adhesive layer is sequentially stacked with a hardening layer and a conductive layer.

[0108] The substrate is PET with a thickness of 125 μm; the first base optical matching layer and the first medium optical matching layer are niobium oxide with a thickness of 13 nm; the second base optical matching layer and the second medium optical matching layer are silicon oxide with a thickness of 37 nm. The hardening layer is formed by acrylic resin coating with a thickness of 1 μm; the conductive layer is ITO with a thickness of 50 nm.

[0109] The barrier film group layer is composed of two first optical film layers and one second optical film layer, that is, in the direction away from the substrate layer, the first layer in the barrier film group layer is the first optical film layer, the second layer is the second optical film layer, and the third layer is the first optical film layer, the first optical film layer adopts niobium oxide, and the second optical film layer adopts silicon oxide.

[0110] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm, respectively, and the thickness of the second optical film layer is 179 nm.

[0111] Comparative Example 1

[0112] The optical conductive film in the comparative example comprises a substrate layer, a hardening layer and a conductive layer which are sequentially stacked.

[0113] The substrate is PET with a thickness of 125 μm; the hardening layer is formed by acrylic resin coating with a thickness of 1 μm; and the conductive layer is ITO with a thickness of 50 nm.

[0114] Comparative Example 2

[0115] The comparative example differs from example 1 in that the base optical matching layer is removed.

[0116] Comparative example 3

[0117] The comparative example differs from example 1 in that the medium optical matching layer is removed.

[0118] Comparative example 4

[0119] The optically conductive film in the comparative example comprises, in order, a substrate layer, an adhesive layer, a base optical matching layer, a barrier film group layer, and a medium optical matching layer, the base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, and the barrier film group layer comprises a first optical film layer and a second optical film layer.

[0120] The substrate is PET with a thickness of 125 μm; the adhesive layer is silicon with a thickness of 0.2 nm; the first base optical matching layer is niobium oxide with a thickness of 13 nm; the second base optical matching layer is silicon oxide with a thickness of 34 nm; the first medium optical matching layer is niobium oxide with a thickness of 13 nm; and the second medium optical matching layer is silicon oxide with a thickness of 34 nm.

[0121] The barrier film group layer is composed of two first optical film layers and two second optical film layers stacked in order, i.e., in the direction away from the substrate layer, the first layer in the barrier film group layer is a first optical film layer, the second layer is a second optical film layer, the third layer is a first optical film layer, and the fourth layer is a second optical film layer. The first optical film layer is niobium oxide, and the second optical film layer is silicon oxide.

[0122] In the direction away from the substrate layer, the thicknesses of the two first optical film layers are 117 nm and 117 nm, respectively, and the thicknesses of the two second optical film layers are 179 nm and 179 nm, respectively.

[0123] The optically conductive films in the examples and comparative examples were tested, and the test results are shown in Figures 8-20 and Table 1, Figures 8-20 wherein the abscissa is wavelength (nm) and the ordinate is reflectance (%). Among them, the infrared reflectance test: using a spectrophotometer (LAMBDA 750S) to measure the visible light transmittance in the range of 400-700 nm and the infrared reflectance in the range of 760-1800 nm; the adhesion test: using a dry cross-hatch knife according to the test method GB / T 9286-2021, test 4B is qualified, and 5B is judged as excellent; the square resistance test refers to GB / T 1551-2021.

[0124] Table 1. Performance test results of optical conductive film

[0125]

[0126] In Examples 1-9 and Comparative Examples 1-4, the transmittance in the visible light band (400-700) was 88.62%, 89.11%, 88.92%, 89.85%, 90.02%, 87.76%, 86.54%, 86.47%, 88.60% and 88.95%, 86.97%, 86.62%, 84.26%, respectively. The use of optical matching layers and blocking films can increase or decrease the transmittance of the optical conductive film in the visible light band.

[0127] In the near-infrared band (760-1800nm), the average reflectivity of Examples 1-9 and Comparative Examples 1-4 was 25.11%, 31.52%, 36.16%, 36.42%, 38.42%, 26.20%, 26.63%, 25.69%, 26.16% and 1.71%, 25.87%, 26.01%, 27.13%, respectively. The solar spectrum energy is mainly distributed in the ultraviolet (UV), visible light (Vis) and near-infrared (NIR) three bands, and its energy ratio is approximately: ultraviolet about 5%, visible light about 43%, near-infrared about 52%, reference to the standard table of solar spectrum irradiance: ASTM G173-03. According to the energy intensity distribution at different wavelengths, the weighted average reflectivity in the near-infrared band (760-1800nm) of Examples 1-9 and Comparative Examples 1-4 was 28.39%, 40.49%, 50.51%, 55.97%, 59.17%, 28.70%, 29.59%, 28.16%, 28.42% and 2.07%, 28.19%, 29.50%, 32.41%, respectively.

[0128] In the examples, high transmittance in the visible light band (400-700nm) is ensured, and with the increase in the number of stacked structures, the average reflectivity in the near-infrared band (760-1800nm) can be gradually optimized and improved. The infrared band has high reflectivity, which can achieve high heat insulation effect.

[0129] Comparing Comparative Example 1 and Example 9, the addition of adhesive layer 2 has a promoting effect on the adhesion of the film layer.

[0130] As can be seen from the comparative example and Comparative Examples 2 and 3, the substrate optical matching layer and the medium optical matching layer can improve the average transmittance in the visible light band.

[0131] From the comparative example 1-9 and the comparative example 4, the barrier film group layer of the utility model adopts the odd layer structure of the first optical film and the second optical film in turn, compared with the even layer structure, the good transmittance of the visible light band can be ensured.

[0132] From the comparative example 1, the single ITO conductive layer structure without adding the optical conductive film has very low reflectivity in the infrared band, and almost has no infrared radiation resistance.

[0133] On the basis of the process structure, the different requirements of the heat insulation performance and the conductive performance can be met by adjusting different stack numbers and stack thicknesses and the thickness of the conductive layer on the back of the substrate.

[0134] It is apparent for those skilled in the art that the present disclosure is not limited to the details of the above exemplary embodiments, and the present disclosure can be implemented in other concrete forms without departing from the spirit or essential characteristics of the present disclosure. Therefore, the embodiments should be considered in all aspects as illustrative and not restrictive, and the scope of the present disclosure is defined by the appended claims rather than the above description, and all changes falling within the meaning and range of the equivalent elements of the claims are intended to be embraced in the present disclosure.

[0135] In addition, it should be understood that, although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the specification is described in this way only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be properly combined to form other embodiments that those skilled in the art can understand.

Claims

1. An optically conductive film, characterized by, The optical combination film layer comprises a base optical matching layer, a barrier film group layer and a medium optical matching layer which are sequentially stacked on the substrate layer; The base optical matching layer and the medium optical matching layer are symmetrically arranged along the barrier film group layer; The barrier film group layer is composed of N first optical film layers and N-1 second optical film layers which are sequentially stacked, the outermost two sides of the barrier film group layer are both the first optical film layer, the refractive index of the first optical film layer is greater than that of the second optical film layer, and N is greater than or equal to 2; The optical conductive film has a weighted average reflectivity greater than or equal to 28% in the near-infrared wave band of 760nm-1800nm. The conductive layer is any one of an ITO layer, an FTO layer, a GZO layer and an AZO layer.

2. The optically conductive film according to claim 1, wherein The refractive index of the first optical film layer is 1.9-2.4, and the thickness is 87nm-147nm; 3. The optically conductive film according to claim 1, wherein The refractive index of the second optical film layer is 1.34-1.52, and the thickness is 145nm-205nm. The first optical film layer is any one of a niobium oxide plating layer, a titanium oxide plating layer, a mixed plating layer of titanium oxide and niobium oxide, a zinc aluminum oxide plating layer, an indium tin oxide plating layer, a tin oxide plating layer and a tungsten oxide plating layer; and / or, 4. The optically conductive film according to claim 3, wherein The second optical film layer is any one of a silicon oxide plating layer, a magnesium fluoride plating layer, a mixed plating layer of aluminum and silicon dioxide, and a mixed plating layer of silicon nitride and silicon oxide. The refractive index of the base optical matching layer and the refractive index of the medium optical matching layer are both 1.6-1.

8.

5. The optically conductive film according to claim 1, wherein The base optical matching layer and the medium optical matching layer are both any one of an aluminum oxide plating layer, a calcium oxide plating layer and a mixed plating layer of aluminum oxide and silicon oxide; and / or, 6. The optically conductive film according to claim 5, wherein The thickness of the base optical matching layer and the thickness of the medium optical matching layer are both 50nm-100nm. The base optical matching layer comprises a first base optical matching layer and a second base optical matching layer, the medium optical matching layer comprises a first medium optical matching layer and a second medium optical matching layer, the second base optical matching layer and the second medium optical matching layer are arranged close to the barrier film group layer, the refractive index of the first base optical matching layer is greater than that of the second base optical matching layer, and the refractive index of the first medium optical matching layer is greater than that of the second medium optical matching layer.

7. The optically conductive film according to claim 1, wherein The refractive index of the first base optical matching layer and the refractive index of the first medium optical matching layer are both 1.9-2.4; and / or, 8. The optically conductive film according to claim 7, wherein The refractive index of the second base optical matching layer and the refractive index of the second medium optical matching layer are both 1.34-1.

52. The first base optical matching layer and the first medium optical matching layer are both any one of a niobium oxide plating layer, a titanium oxide plating layer and a zinc aluminum oxide plating layer; and / or, 9. The optically conductive film according to claim 8, wherein The second base optical matching layer and the second medium optical matching layer are both any one of a silicon oxide plating layer, a magnesium fluoride layer, a lithium fluoride plating layer and a mixed plating layer of silicon oxide and silicon nitride. ​ 10. The optically conductive film according to claim 7, wherein The thickness of the first base optical matching layer and the thickness of the first medium optical matching layer are both 8nm-18nm; and / or, The thickness of the second base optical matching layer and the thickness of the second medium optical matching layer are both 24nm-44nm.

11. The optically conductive film according to claim 1, wherein A bonding layer is further arranged between the substrate layer and the base optical matching layer, the bonding layer being any one of a silicon plating layer, a titanium oxide plating layer, and a silicon nitride plating layer, and the thickness of the bonding layer being less than or equal to 2nm.

12. The optically conductive film of claim 1, wherein A hardening layer is arranged between the substrate layer and the conductive layer, and the thickness of the hardening layer is 1μm-5μm.

13. A light modulating conductive film, characterized by, The optical conductive film comprises the glass substrate, the conductive layer, the base optical matching layer, the medium optical matching layer, the bonding layer, the hardening layer, the first glass, the second glass, the light-adjusting color-changing layer, and the electrode layer.

14. An electrochromic glass characterized by, The optical conductive film comprises a first glass, the light-adjusting conductive film, and a second glass.

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