Glass structure and electronic device

By setting multiple layers with different refractive indices and a diamond-like superhard layer on the glass substrate, the problem of balancing scratch resistance and optical performance in glass structural components is solved, thereby improving their scratch resistance and transparency.

CN119750918BActive Publication Date: 2025-12-26HUAWEI TECH CO LTD

Patent Information

Application Number
CN202411582258.7
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-11-06
Publication Date
2025-12-26
Estimated Expiration
2044-11-06

AI Technical Summary

Technical Problem

Existing glass structural components are insufficient in balancing scratch resistance and optical performance. In particular, when the diamond-like carbon film is thin, it is difficult to provide effective scratch resistance, while also affecting optical transmittance.

Method used

Alternating layers of first and second optically scratch-resistant layers with different refractive indices are stacked on a glass substrate, and a diamond-like superhard layer containing doped elements is deposited on it to form a multilayer structure to improve hardness and transmittance.

Benefits of technology

This technology enables glass structural components to maintain high optical transmittance while significantly improving scratch resistance, especially for durable scratch resistance to high-hardness materials, thus extending their service life.

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Abstract

The application provides a glass structure and an electronic device. The glass structure comprises a glass substrate and a first optical scratch-resistant layer, a second optical scratch-resistant layer and a first superhard layer which are sequentially stacked on one side of the glass substrate, the first optical scratch-resistant layer is formed by alternately stacking two layers of materials with different refractive indexes, the second optical scratch-resistant layer is formed by stacking three layers of materials with different refractive indexes, and the first superhard layer is a diamond-like layer doped with at least one element selected from silicon, aluminum, titanium, zirconium, molybdenum and nitrogen. The glass structure has good scratch resistance and optical properties which change little compared with the glass substrate, and can better meet the long-term use requirements of the electronic device shell.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of glass, in particular to a glass structure and an electronic device. BACKGROUND

[0002] Glass is a commonly used material for display screen covers of electronic devices such as mobile phones and tablet computers. In order to reduce scratches on the display screen, a layer of superhard film (such as diamond-like film) is usually plated on the surface of the glass substrate. In order not to affect the optical transmittance of the glass substrate, the thickness of the diamond-like film is usually made to be thin, but it is difficult to have good scratch resistance to high-hardness sand particles and the like. Therefore, it is necessary to provide a glass structure that can balance good scratch resistance and optical performance. SUMMARY

[0003] In view of this, the embodiments of the present application provide a glass structure and an electronic device, which can ensure that the glass structure has good scratch resistance and optical performance by controlling the specific plating layer on the surface of the glass structure.

[0004] Specifically, the first aspect of the embodiments of the present application provides a glass structure, comprising:

[0005] a glass substrate,

[0006] a first optical scratch-resistant stack layer arranged on one side of the glass substrate; wherein the first optical scratch-resistant stack layer comprises at least one layer of first refractive index material and at least one layer of second refractive index material arranged alternately and stacked, and the refractive index of the first refractive index material layer is greater than that of the second refractive index material layer;

[0007] a second optical scratch-resistant stack layer arranged on the side of the first optical scratch-resistant stack layer away from the glass substrate; wherein the second optical scratch-resistant stack layer comprises at least one layer of third refractive index material, at least one layer of fourth refractive index material and at least one layer of fifth refractive index material arranged in a stack, and the refractive indexes of the third refractive index material, the fourth refractive index material and the fifth refractive index material decrease in turn;

[0008] a first superhard layer arranged on the side of the second optical scratch-resistant stack layer away from the first optical scratch-resistant stack layer; wherein the first superhard layer is a diamond-like film containing a doping element, and the doping element comprises at least one of silicon, aluminum, titanium, zirconium, molybdenum, tungsten and nitrogen.

[0009] The glass structure has a superhard layer of diamond-like substance containing a specific doping element on the surface. Compared with a superhard layer of undoped diamond-like substance, the glass structure has a higher surface hardness and improved scratch resistance. The doping element can reduce the decrease in optical transmittance caused by the undoped diamond-like substance. In addition, a first optical scratch-resistant stack is arranged between the glass substrate and the first superhard layer, and the first optical scratch-resistant stack is composed of two film layers with different refractive indexes. A second optical scratch-resistant stack is composed of three film layers with different refractive indexes. The thickness of each of the two optical stacks can be relatively thick and substantially optically transparent, and each of the two optical stacks has good scratch resistance. The second optical scratch-resistant stack has superior scratch resistance. The presence of the two optical stacks can effectively improve the long-term scratch resistance of the glass structure with the first superhard layer on the surface to high-hardness objects. Therefore, the glass structure can have high hardness, good scratch resistance, and optical performance (such as high transmittance and low chromatic aberration).

[0010] In the embodiments of the present application, the refractive index of the first refractive index material layer is greater than or equal to 1.8, and the refractive index of the second refractive index material layer is less than or equal to 1.60. By alternately stacking the two material layers with refractive indexes in these two ranges, a first optical scratch-resistant stack with good optical transmittance and scratch resistance can be obtained, and the optical transmittance is better.

[0011] In the embodiments of the present application, the refractive index of the third refractive index material layer is greater than 1.80, the refractive index of the fourth refractive index material layer is 1.60-1.80, and the refractive index of the fifth refractive index material layer is less than 1.60. By alternately stacking the three material layers with different refractive indexes in these three ranges, a second optical scratch-resistant stack with good optical transmittance and scratch resistance can be obtained, and the scratch resistance is better.

[0012] In the embodiments of the present application, the first refractive index material layer includes one of a silicon nitride layer, an aluminum nitride layer, a silicon aluminum nitride layer, a silicon oxynitride layer, an aluminum oxynitride layer, and a silicon aluminum oxynitride layer; and the second refractive index material layer includes one of a silicon oxide layer, an aluminum oxide layer, a silicon aluminum oxide layer, a silicon oxynitride layer, an aluminum oxynitride layer, and a silicon aluminum oxynitride layer. The chemical composition of the silicon oxynitride, the aluminum oxynitride, and the silicon aluminum oxynitride can be adjusted to achieve different ranges of refractive indexes.

[0013] In some embodiments of the present application, the third refractive index material layer comprises one of a silicon nitride layer, an aluminum nitride layer, a silicon aluminum nitride layer, and a titanium oxide layer; the fourth refractive index material layer comprises one of a silicon oxynitride layer, an aluminum oxynitride layer, and a silicon aluminum oxynitride layer; and the fifth refractive index material layer comprises one of a silicon oxide layer, an aluminum oxide layer, and a silicon aluminum oxide layer. The third refractive index material layer is selected from the materials with high refractive index and good wear resistance. The chemical composition of the silicon oxynitride, the aluminum oxynitride, and the silicon aluminum oxynitride can be adjusted to achieve a refractive index of 1.60-1.80.

[0014] In some embodiments of the present application, the surface layer of the first optical anti-scratch stack adjacent to the second optical anti-scratch stack is the first refractive index material layer, and the first refractive index material layer is in contact with the fourth refractive index material layer or the fifth refractive index material layer; or the surface layer of the first optical anti-scratch stack adjacent to the second optical anti-scratch stack is the second refractive index material layer, and the second refractive index material layer is in contact with the third refractive index material layer or the fourth refractive index material layer. In this way, the first optical anti-scratch stack and the second optical anti-scratch stack have high optical transmittance as a whole.

[0015] In some embodiments of the present application, the sum of the thicknesses of the first optical anti-scratch stack and the second optical anti-scratch stack is in the range of 500 nm-3000 nm. In this case, the first optical anti-scratch stack and the second optical anti-scratch stack can effectively improve the long-term scratch resistance of the overall glass structure, and they can be firmly combined with the glass substrate.

[0016] In some embodiments of the present application, the thickness of the first superhard layer is in the range of 1 nm-100 nm. The first superhard layer with a thickness of less than 100 nm can improve the surface hardness of the glass structure while not affecting the optical transmittance and appearance color.

[0017] In some embodiments of the present application, the doping concentration of the doping element in the first superhard layer is less than or equal to 20 wt%. In this way, the hardness and optical transmittance of the doped diamond-like structure can be improved without destroying the diamond-like structure.

[0018] In some embodiments of the present application, the side of the first superhard layer away from the second optical anti-scratch stack is further provided with a second superhard layer; and the material of the second superhard layer is different from that of the first superhard layer. The presence of the second superhard layer helps to ensure that the first superhard layer has long-term high hardness.

[0019] In some embodiments of the present application, the second superhard layer comprises silicon nitride, silicon carbide, silicon carbon nitride, CN x1one of the following: SiO2, GeO2, B2O3, Al2O3, TiO2, ZrO2, HfO2, Y2O3, La2O3, CeO2, Pr6O11, Nd2O3, Sm2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, In2O3, SnO2, Sb2O3, Bi2O3, and combinations thereof; wherein x1 is between (0, 4]. The second superhard layer with such material is disposed between the first superhard layer and the second optical scratch-resistant layer, which can help to improve the long-term durability of the high hardness of the first superhard layer, and in the cooperation of the two, the surface layer of the glass structure improves the long-term scratch resistance of the high-hardness object.

[0020] In some embodiments of the present application, the thickness of the second superhard layer is in the range of 1 nm-50 nm. The second superhard layer with a suitable low thickness helps to improve the long-term durability of the high hardness of the first superhard layer, and at the same time, it is also a film layer with high optical transmittance, thereby not affecting the appearance effect of the overall glass structure 100.

[0021] In some embodiments of the present application, the glass structure further comprises an anti-fingerprint layer, which is located on the side of the second superhard layer away from the first superhard layer. The anti-fingerprint layer is mainly used to reduce the probability of leaving dirt on the glass structure by the user's fingers, and to ensure that the appearance of the glass structure is relatively clean.

[0022] In some embodiments of the present application, the glass structure further comprises an anti-fingerprint layer, which is located on the side of the first superhard layer away from the second optical scratch-resistant layer. The anti-fingerprint layer is mainly used to reduce the probability of leaving dirt on the glass structure by the user's fingers, and to ensure that the appearance of the glass structure is relatively clean.

[0023] In some embodiments of the present application, the Mohs hardness of the surface of the glass structure away from the glass substrate is greater than or equal to 7. The surface of the glass structure away from the glass substrate has a high Mohs hardness, and has good scratch resistance.

[0024] In some embodiments of the present application, the nanoindentation hardness of the glass structure away from the glass substrate is greater than 14 GPa at an indentation depth greater than 150 nm. The high nanoindentation hardness reflects that the glass structure has good resistance to deep scratches or persistent scratches by high-hardness objects.

[0025] In some embodiments of the present application, the average transmittance of the glass structure in the visible light region is greater than 88%. After the film layer structure comprising the first optical scratch-resistant layer, the second optical scratch-resistant layer and the first superhard layer is disposed on one side of the glass substrate, the obtained glass structure still has high visible light transmittance, and is particularly suitable for display screen cover plates, camera protection cover plates and the like which have high requirements for transparency.

[0026] In some embodiments of the present application, the color coordinate offset value ΔE of the glass structure compared to the glass substrate is less than 1.5. This indicates that the color phase of the glass structure has not changed significantly compared to the untreated glass substrate.

[0027] The second aspect of the embodiments of the present application provides an electronic device, which comprises a shell assembled outside the electronic device, and a circuit board located inside the shell, and the shell comprises the glass structure of the first aspect of the embodiments of the present application.

[0028] In some embodiments of the present application, the shell comprises a display screen cover plate assembled on the front side of the electronic device, and the display screen cover plate adopts the glass structure. In some other embodiments of the present application, the shell comprises a back cover assembled on the back side of the electronic device, and the back cover adopts the glass structure. In some other embodiments of the present application, the electronic device further comprises a camera assembly located inside the shell, and the shell comprises a camera protection cover plate covering the camera assembly, and the camera protection cover plate adopts the glass structure.

[0029] One or more shells of the display screen cover plate, the back cover and the camera protection cover plate of the electronic device can adopt the glass structure, and the electronic device with the shell adopting the glass structure is not easy to be scratched and worn in use due to the good wear resistance and scratch resistance of the glass structure, the optical performance of the glass structure is similar to that of the glass substrate, the service life of the electronic device is long, and the market competitiveness of the electronic device is outstanding. The electronic device can include but is not limited to a mobile phone, a tablet computer, a notebook computer, a wearable device, etc. BRIEF DESCRIPTION OF DRAWINGS

[0030] Figure 1 The front side structure of the electronic device provided by the embodiments of the present application is shown in the figure.

[0031] Figure 2 The back side structure of the electronic device provided by the embodiments of the present application is shown in the figure.

[0032] Figure 3a The structure of the glass structure provided by the embodiments of the present application is shown in the figure.

[0033] Figure 3b The structure of the glass structure provided by the embodiments of the present application is shown in the figure.

[0034] Figure 4 The structure of the glass structure provided by some embodiments of the present application is shown in the figure.

[0035] Figure 5 The structure of the glass structure provided by some other embodiments of the present application is shown in the figure. DETAILED DESCRIPTION

[0036] The embodiments of the present application will be described below with reference to the drawings of the embodiments of the present application.

[0037] Reference is made to Figure 1 andFigure 2 , Figure 1 This is a schematic diagram of the front structure of an electronic device provided in an embodiment of this application. Figure 2 This is a schematic diagram of the rear structure of an electronic device provided in an embodiment of this application. The electronic device 1000 may include, but is not limited to, a cellphone, a notebook computer, a tablet computer, a personal digital assistant, a wearable device (such as a smart bracelet, watch, etc.), a virtual reality (VR) device, or a mobile device. In this embodiment, a cellphone is used as an example for illustration.

[0038] Electronic device 1000 includes a housing assembled on the outside of the electronic device and a circuit board located inside the housing. The housing includes a display cover 101 assembled on the front of the electronic device 1000 and a rear cover 102 assembled on the rear of the electronic device 1000. The display cover 101 covers the display screen to protect it. The display cover 101 and / or the rear cover 102 may be made of glass. Specifically, the display cover 101 may be entirely or partially made of glass; the rear cover 102 may be entirely or partially made of glass. The rear cover 102 may cover only the rear side of the electronic device 1000 (and the side facing away from the display screen), or it may cover both the rear side and the side bezels of the electronic device 1000. Optionally, the rear cover 102 may cover all or part of the side bezels of the electronic device.

[0039] In some embodiments of this application, such as Figure 2 As shown, the electronic device 1000 also includes a camera assembly 2 located inside a housing. The housing may include a camera protective cover 103, which covers the camera assembly 2 to protect it. The camera protective cover 103 may be made of glass. Similarly, the camera protective cover 103 may be partially or entirely made of glass. The location of the camera protective cover 103 depends on the location of the camera assembly 2; it may be located at the front or rear of the electronic device 1000. Figure 2In some embodiments of the present application, the camera protection cover plate 103 can be in a separate structure from the display screen cover plate 101 or the back cover 102. In some other embodiments of the present application, the camera protection cover plate 103 can be in an integrated structure with the display screen cover plate 101 or the back cover 102.

[0040] In some embodiments of the present application, the display screen cover plate 101, the back cover 102 and the camera protection cover plate 103 in the electronic device 1000 can be in any one of the following structures: a glass structure, a glass structure and a glass structure, or three glass structures.

[0041] Currently, in order to improve the scratch resistance of various components (such as the display screen cover plate 101 and the camera protection cover plate 103) in the electronic device 1000, a layer of super-hard film with a diamond-like material is usually coated on one side surface of the glass substrate. For example, a layer of diamond-like film is usually coated on the side surface of the glass cover plate 101 away from the display screen. The thickness of the diamond-like film is usually thin (less than 100 nm, and 3-50 nm is more common), because it is difficult to deposit a thick diamond-like film, and if the thickness of the diamond-like film is made thicker, not only the manufacturing cost will increase dramatically, but also the light transmittance of the glass substrate will be greatly affected, and the appearance of the electronic device will be affected. Therefore, the embodiments of the present application provide a glass structure with good wear resistance, scratch resistance and optical transmittance, so as to better meet the use requirements of the electronic device 1000.

[0042] The glass structure provided by the embodiments of the present application will be introduced below.

[0043] Please refer to Figure 3a and Figure 3b which are two exemplary structural diagrams of the glass structure provided by the embodiments of the present application. As shown in Figure 3a and Figure 3b , the glass structure 100 includes a glass substrate 10, a first optical scratch-resistant layer 11, a second optical scratch-resistant layer 12 and a first super-hard layer 13 which are sequentially stacked on one side of the glass substrate 10. Specifically, the first optical scratch-resistant layer 11 is arranged on one side of the glass substrate 10, the second optical scratch-resistant layer 12 is arranged on the side of the first optical scratch-resistant layer 11 away from the glass substrate 10, and the first super-hard layer 13 is arranged on the side of the second optical scratch-resistant layer 12 away from the first optical scratch-resistant layer 11.

[0044] The first optical scratch-resistant stack 11 comprises at least one first refractive index material layer 111 and at least one second refractive index material layer 112 which are alternately stacked, and the refractive indexes of the first refractive index material layer 111 and the second refractive index material layer 112 are different, for example, the refractive index of the first refractive index material layer 111 is greater than the refractive index of the second refractive index material layer 112.

[0045] The second optical scratch-resistant stack 12 comprises at least one third refractive index material layer 121, at least one fourth refractive index material layer 122 and at least one fifth refractive index material layer 123 which are stacked, and the refractive indexes of the three material layers are different, for example, the refractive indexes of the third refractive index material layer 121, the fourth refractive index material layer 122 and the fifth refractive index material layer 123 decrease in turn.

[0046] The first superhard layer 13 is a diamond-like film containing a doping element, and the doping element includes at least one of silicon (Si), aluminum (Al), titanium (Ti), zirconium (Zr), molybdenum (Mo), tungsten (W) and nitrogen (N).

[0047] The first optical scratch-resistant stack 11, the second optical scratch-resistant stack 12 and the first superhard layer 13 are sequentially stacked on the glass substrate 10, the first optical scratch-resistant stack 11 is formed by overlapping two material layers with different refractive indexes, the second optical scratch-resistant stack 12 is formed by stacking three material layers with different refractive indexes, and the first superhard layer 13 is formed by a diamond-like film containing a specific doping element. Firstly, the diamond-like film contains at least one of Si, Al, Ti, Zr, Mo and N, and the doping modification can be performed on the diamond-like film to help improve the hardness and enhance the wear resistance and scratch resistance of the glass structural member 100. In addition, compared with the diamond-like film without doping, the diamond-like film with the above-mentioned elements has higher optical transmittance under the same thickness, that is, the above-mentioned doping elements reduce the damage to the optical performance. Secondly, the first optical scratch-resistant stack 11 and the second optical scratch-resistant stack 12 are arranged between the glass substrate 10 and the first superhard layer 13, the thickness of the two optical stacks can be made thicker and maintain good optical transmittance, and both have good wear resistance and scratch resistance. In cooperation with the first superhard layer 13, the nanoindentation hardness of the glass structural member 100 can be improved, and the long-term scratch resistance of the glass structural member 100 to high-hardness objects (such as sand particles / dust with a Mohs hardness of 7 or more) can be enhanced. Even if the thickness of the first superhard layer 13 becomes thinner after long-term use, the presence of the first optical scratch-resistant stack 11 and the second optical scratch-resistant stack 12 can still ensure good scratch resistance of the glass structural member 100. Therefore, the glass structural member 100 can have higher hardness, good scratch resistance and scratch resistance, and the optical performance such as light transmittance and appearance color of the glass structural member 100 does not change significantly compared with the glass substrate 10.

[0048] It should be noted that, Figure 3a andFigure 3b All figures shown are exemplary illustrations of this application and do not represent the actual size of the product. Furthermore, the thickness of each film layer and the proportional relationship between the thicknesses of the film layers in the figures are not intended to limit the actual product of this application; the other figures in this application are interpreted in the same way. In addition, Figure 3a , Figure 3b The illustrations only depict one film arrangement of the first optical scratch-resistant stack 11 and one film arrangement of the second optical scratch-resistant stack 12, but this does not mean that the actual film arrangement of the first optical scratch-resistant stack 11 and the second optical scratch-resistant stack 12 is limited to that of this application. Figure 3a , Figure 3b As shown.

[0049] Specifically, if the first refractive index material layer 111 is designated as layer A and the second refractive index material layer 112 is designated as layer C, then in the first optical scratch-resistant stack 11, the total number of layers A and the total number of layers B can be equal or unequal. For example, in the direction from the glass substrate 10 to the first optical scratch-resistant stack 11 (i.e., Figure 3a , Figure 3b (In the Z direction indicated by the middle arrow), the layer arrangement of the first optical scratch-resistant laminate 11 can be (AC). n (like Figure 3a (as shown), or (AC) n -A, or (CA) n (like Figure 3a (as shown), or (CA) n -C; where n is an integer greater than or equal to 1. The thickness of each A layer can be the same or different. The thickness of each C layer can be the same or different. "-" indicates a stacking relationship, such as (AC). n The layers stacked sequentially along the Z direction are layer A, layer C, ..., layer A and layer C; the total number of cycles of layer A stacking layer C is n. By alternating layers of two materials with different refractive indices, a first optically scratch-resistant layer 11 with good optical transmittance and scratch resistance can be obtained, and its optical transmittance is even better.

[0050] In the second optical scratch-resistant stack 12, the arrangement of the third refractive index material layer 121, the fourth refractive index material layer 122, and the fifth refractive index material layer 123 is not limited, as long as the two contacting layers are material layers with different refractive indices. If the third refractive index material layer 121 is designated as layer D, the fourth refractive index material layer 122 as layer E, and the fifth refractive index material layer 123 as layer F, then adjacent layer D is separated by either layer E or layer F, adjacent layer E is separated by either layer D or layer F, and adjacent layer F is separated by either layer D or layer E. For example, along the Z-direction, the layer arrangement of the second optical scratch-resistant stack 12 can include, but is not limited to, (DEF). n (like Figure 3aA, (D-E-F) n A, (D-E-F) n D-E, (F-E-D) n D-E, (F-E-D) n F, (F-E-D) n F-E, (E-F-D) n F-E, or (D-E) m (D-E-F) n and the like. m, n are integers greater than or equal to 1. Similar to the above, “-” represents the stacking relationship in the Z direction. By stacking three materials with different refractive indexes, a second optical anti-scratch stack 12 with good optical transmittance and better scratch resistance can be obtained.

[0051] In the present application, the transmittance of the visible light of the stack structure formed by the first optical anti-scratch stack 11 and the second optical anti-scratch stack 12 is greater than or equal to 90%. The stack structure has high optical transparency (for example, the average transmittance of visible light is above 90%), and the setting of the stack structure between the glass substrate 10 and the first superhard layer 13 will not affect the visible light transmittance of the overall glass structure 100. Among them, the first optical anti-scratch stack 11 is an optically transparent layer, and the second optical anti-scratch stack 12 is an optically transparent layer.

[0052] In the present application, in the first optical anti-scratch stack 11, the refractive index of the first refractive index material layer 111 (the aforementioned A layer) is greater than or equal to 1.80, and the refractive index of the second refractive index material layer 112 (the aforementioned C layer) is less than or equal to 1.60. By alternately stacking two different refractive index material layers with refractive indexes in these ranges, a first optical anti-scratch stack 11 with good optical transmittance and better scratch resistance can be obtained, and the optical transmittance is better. In some embodiments of the present application, the refractive index of the A layer is greater than or equal to 1.80, and the refractive index of the C layer is less than 1.60; or the refractive index of the A layer is greater than 1.80, and the refractive index of the C layer is less than or equal to 1.60; or the refractive index of the A layer is greater than 1.80, and the refractive index of the C layer is less than 1.60. In some embodiments, the refractive index of the A layer is greater than or equal to 1.85, and the refractive index of the C layer is less than or equal to 1.55.

[0053] The first refractive index material layer 111 can include a silicon nitride layer (i.e., a Si3N4 layer), an aluminum nitride layer (i.e., an AlN layer), a silicon aluminum nitride layer (Si w Al z N x ), a silicon oxynitride layer (Si w O y N x ), an aluminum oxynitride layer (Al z O y Nx ), silicon-aluminum oxide layer (Si) w Al z O y N x One of the following. The second refractive index material layer 112 may include a silicon oxide layer (such as a SiO2 layer), an aluminum oxide layer (i.e., an Al2O3 layer), or a silicon-aluminum oxide layer (SiO2). w Al z O y ), silicon oxynitride layer (Si) w O y N x ), aluminum oxide layer (Al) z O y N x ), silicon-aluminum oxide layer (Si) w Al z O y N x One of them.

[0054] It should be noted that the subscripts of each element in the above chemical formulas should ensure that the corresponding chemical formulas satisfy charge balance. Furthermore, there is no correlation between the 'x', 'y', 'z', and 'w' elements in the above chemical formulas. Identical letters (such as z and w) in different chemical formulas are not related; they are not distinguished for ease of description.

[0055] Although the material selection ranges for the first refractive index material layer 111 and the second refractive index material layer 112 both mention silicon oxynitride, aluminum oxynitride, and aluminum silicon oxynitride, the refractive indices of these two material layers are in different ranges. Even if they are both silicon oxynitride (using this example), the chemical formula of silicon oxynitride in the first refractive index material layer 111 is not the same as that in the second refractive index material layer 112.

[0056] In some embodiments of this application, the first refractive index material layer 111 is selected from a silicon nitride layer, an aluminum nitride layer, and an aluminum silicon nitride layer; the second refractive index material layer 112 is selected from a silicon oxide layer, an aluminum oxide layer, and an aluminum silicon oxide layer. In one embodiment, the first refractive index material layer 111 is an aluminum silicon nitride layer, and the second refractive index material layer 112 is an aluminum silicon oxide layer. In this case, while meeting the refractive index requirements described above, the interlayer bonding force between the first refractive index material layer 111 and the second refractive index material layer 112 is relatively high.

[0057] In the embodiments of the present application, the third refractive index material layer 121 (the aforementioned D layer) has a refractive index greater than 1.80, the fourth refractive index material layer 122 (the aforementioned E layer) has a refractive index ranging from 1.60 to 1.80 (i.e. greater than or equal to 1.60 and less than or equal to 1.80), and the fifth refractive index material layer 123 (the aforementioned F layer) has a refractive index less than 1.60. By layering the three different refractive index material layers with refractive indices in these ranges, respectively, the second optical anti-scratch stack layer 12 with good optical transmittance and better scratch resistance can be obtained. In some embodiments of the present application, the refractive index of the D layer is greater than or equal to 1.85, the refractive index of the F layer is less than or equal to 1.55, and the refractive index of the E layer ranges from 1.60 to 1.80.

[0058] It should be noted that the refractive indices of the A layer, the C layer, the D layer, the E layer, and the F layer in the present application may have a reasonable error within a certain range due to the influence of the test method. The above data within the reasonable error range should also be considered within the scope of protection of the present application. The other parameter ranges mentioned below in the present application should also be similarly explained.

[0059] The third refractive index material layer 121 can include one of a silicon nitride layer (i.e. a Si3N4 layer), an aluminum nitride layer (i.e. an AlN layer), a silicon aluminum nitride layer (Si w Al z N x ), a titanium oxide layer (e.g. a TiO2 layer). These materials have high hardness and good scratch resistance. The fourth refractive index material layer 122 includes one of a silicon oxynitride layer (Si w O y N x ), an aluminum oxynitride layer (Al z O y N x ), a silicon aluminum oxynitride layer (Si w Al z O y N x ). The fifth refractive index material layer 123 includes one of a silicon oxide layer (e.g. a SiO2 layer), an aluminum oxide layer (i.e. an Al2O3 layer), a silicon aluminum oxide layer (Si w Al z O y ).

[0060] Similarly, although the material selection range of the fourth refractive index material layer 122 mentions the same silicon oxynitride, aluminum oxynitride, and silicon aluminum oxynitride as the first refractive index material layer 111 and the second refractive index material layer 112, the refractive indices of these three film layers are in different ranges, and even if they are the same material (e.g. silicon oxynitride), the chemical formula of the silicon oxynitride in these three film layers is not the same.

[0061] In this application, layers A, C, D, E, and F can all be independently deposited using chemical vapor deposition (CVD) or physical vapor deposition (PVD). CVD includes, but is not limited to, hot-wire CVD or plasma-enhanced CVD. PVD includes, but is not limited to, magnetron sputtering, vacuum evaporation, and ion plating (e.g., arc ion plating, radio frequency ion plating).

[0062] For example, when forming a silicon oxynitride layer using magnetron sputtering, the target material can be a Si target, and an inert gas (such as argon), nitrogen (N2), and oxygen (O2) are introduced to deposit the silicon oxynitride layer. The resulting Si can be controlled by adjusting the flow rates of N2 and O2. w O y N x The molar ratio of N to O. When forming a silicon-aluminum nitride layer using magnetron sputtering, the targets used include Si and Al targets. Argon and N2 are introduced, and the silicon-aluminum nitride layer is deposited. The sputtering power and time of the Si and Al targets can be controlled to adjust the deposition process. w Al z N x The molar ratio of Si to Al. When forming a silicon-aluminum oxynitride layer using magnetron sputtering, the targets used include Si targets and Al targets. Argon, N2, and O2 are introduced to deposit the target coating.

[0063] In some embodiments of this application, when the surface layer of the first optical scratch-resistant stack 11 near the second optical scratch-resistant stack 12 is a second refractive index material layer 112 (e.g.) Figure 3a As shown, the second refractive index material layer 112 is in contact with either the third refractive index material layer 121 or the fourth refractive index material layer 122 in the second optical scratch-resistant stack 12. This facilitates higher optical transmittance in the stacked structure of the first optical scratch-resistant stack 11 and the second optical scratch-resistant stack 12. In this case, the film layer arrangement of the first optical scratch-resistant stack 11 along the Z direction can be (AC). n (like Figure 3b (as shown), or (CA) n -C. Figure 3b The diagram shows the contact between the second refractive index material layer 112 and the third refractive index material layer 121.

[0064] In other embodiments of this application, when the surface layer of the first optical scratch-resistant stack 11 near the second optical scratch-resistant stack 12 is a first refractive index material layer 111 (e.g.) Figure 3bAs shown in FIG. 1, the first refractive index material layer 111 is in contact with the fourth refractive index material layer 122 or the fifth refractive index material layer 123 in the second optical anti-scratch coating layer 12. This is conducive to the laminated structure of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 having high optical transmittance. In this case, the film layer arrangement of the first optical anti-scratch coating layer 11 along the Z direction can be (C-A) n As shown in FIG. 1, the first refractive index material layer 111 is in contact with the fourth refractive index material layer 122 or the fifth refractive index material layer 123 in the second optical anti-scratch coating layer 12. This is conducive to the laminated structure of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 having high optical transmittance. In this case, the film layer arrangement of the first optical anti-scratch coating layer 11 along the Z direction can be (C-A) Figure 4 As shown in FIG. 1, the first refractive index material layer 111 is in contact with the fourth refractive index material layer 122 or the fifth refractive index material layer 123 in the second optical anti-scratch coating layer 12. This is conducive to the laminated structure of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 having high optical transmittance. In this case, the film layer arrangement of the first optical anti-scratch coating layer 11 along the Z direction can be (C-A) n As shown in FIG. 1, the first refractive index material layer 111 is in contact with the fourth refractive index material layer 122 or the fifth refractive index material layer 123 in the second optical anti-scratch coating layer 12. This is conducive to the laminated structure of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 having high optical transmittance. In this case, the film layer arrangement of the first optical anti-scratch coating layer 11 along the Z direction can be (C-A) Figure 4 As shown in FIG. 1, the first refractive index material layer 111 is in contact with the fourth refractive index material layer 122 or the fifth refractive index material layer 123 in the second optical anti-scratch coating layer 12. This is conducive to the laminated structure of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 having high optical transmittance. In this case, the film layer arrangement of the first optical anti-scratch coating layer 11 along the Z direction can be (C-A)

[0065] In the present application, the first optical anti-scratch coating layer 11 contains more than or equal to 2 layers of films, and further more than or equal to 3 layers of films. When the number of film layers of the first optical anti-scratch coating layer 11 is more than or equal to 3, the number of layers of the first refractive index material layer 111 and / or the second refractive index material layer 112 is more than or equal to 2. The second optical anti-scratch coating layer 12 contains more than or equal to 3 layers of films, and further more than or equal to 4 layers of films.

[0066] In the present application, the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 contain a total of more than or equal to 5 layers of films, and further can be in the range of 8-30 layers, for example, specifically 10 layers, 12 layers, 15 layers, 20 layers, 25 layers or 28 layers, etc. In this way, the laminated structure of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 can be endowed with good optical transmittance and scratch resistance by means of the stacking of a certain number of layers of refractive index different material layers, and the firm combination between them and the glass substrate 10 can be ensured.

[0067] In the present application, the thickness of each of the first refractive index material layer 111 (A layer), the second refractive index material layer 112 (C layer), the third refractive index material layer 121 (D layer), the fourth refractive index material layer 122 (E layer), and the fifth refractive index material layer 123 (F layer) is not particularly limited. In the common embodiments of the present application, the thickness of each of the A layer, the C layer, the D layer, the E layer, and the F layer can be independently in the range of 1-2500 nm, and further can be in the range of 5 nm-2000 nm.

[0068] In the present application, the thickness of the first optical anti-scratch coating layer 11 and the second optical anti-scratch coating layer 12 is greater than the thickness of the first superhard layer 13. By arranging them below the first superhard layer 13, the overall glass structure 100 can help to resist scratching by high-hardness objects for a long time.

[0069] In some embodiments of the present application, the sum of the thicknesses of the first optical scratch-resistant layer 11 and the second optical scratch-resistant layer 12 can be in the range of 500 nm to 3000 nm. In this case, the laminated structure of the first optical scratch-resistant layer 11 and the second optical scratch-resistant layer 12 can be firmly combined on the glass substrate 10 while being sufficient to improve the long-term wear resistance and long-term scratch resistance of the overall glass structure 100. For example, the sum of the thicknesses can be specifically 600 nm, 800 nm, 1000 nm, 1200 nm, 1500 nm, 1800 nm, 2000 nm, 2200 nm, or 2400 nm, etc. In some embodiments, the sum of the thicknesses of the first optical scratch-resistant layer 11 and the second optical scratch-resistant layer 12 is in the range of 1000 nm to 2500 nm.

[0070] In the first super-hard layer 13, the doping elements in the diamond-like carbon in the present application include one or more of silicon (Si), aluminum (Al), titanium (Ti), zirconium (Zr), molybdenum (Mo), tungsten (W), and nitrogen (N). For example, the doping elements in the diamond-like carbon include N; or Si; or Al; or Ti; or Zr; or Mo; or W; or Si and Ti; or Ti and Al; or Mo and W; or Si and N, etc. The diamond-like carbon doped with these elements can have a Mohs hardness of 8 or more and good optical performance, and is relatively easy to prepare.

[0071] In some embodiments of the present application, the doping elements in the diamond-like carbon in the first super-hard layer 13 can also include hydrogen (H) elements. The doping element H can also help improve the hardness of the diamond-like carbon.

[0072] In some embodiments of the present application, the first super-hard layer 13 is one of a Si-doped diamond-like carbon layer, an Al-doped diamond-like carbon layer, a Ti-doped diamond-like carbon layer, a Zr-doped diamond-like carbon layer, a Mo-doped diamond-like carbon layer, a W-doped diamond-like carbon layer, and an N-doped diamond-like carbon layer. These doped diamond-like carbon layers are relatively easy to prepare and can better balance high hardness and good optical transmittance.

[0073] In some embodiments of the present application, the doping concentration of the doping elements in the first super-hard layer 13 is less than or equal to 20 wt%. In this way, the introduction of the doping elements can ensure the structural stability of the diamond-like carbon, and at the same time ensure the high hardness and good optical transmittance of the diamond-like carbon layer after doping. It should be noted that the doping concentration of the doping elements mentioned here specifically refers to the sum of the doping concentrations of all the doping elements in the first super-hard layer 13. In the present application, the diamond-like carbon containing doping elements can be plated by physical vapor deposition (such as magnetron sputtering) or chemical vapor deposition (such as plasma-enhanced chemical vapor deposition).

[0074] In this embodiment, the thickness of the first superhard layer 13 is in the range of 1nm-100nm. A thickness of less than 100nm for the first superhard layer 13 allows it to increase the surface hardness of one side of the glass structure 100 while maintaining high transparency, ensuring that the overall glass structure 100 has similar optical transmittance and appearance to the simple glass substrate 10. Specifically, the thickness of the first superhard layer 13 can be 2nm, 3nm, 5nm, 10nm, 15nm, 20nm, 25nm, 30nm, 35nm, 40nm, 45nm, 50nm, 55nm, 60nm, 65nm, 70nm, 75nm, 80nm, 85nm, 90nm, or 95nm, etc. In some embodiments, the thickness of the first superhard layer 13 is in the range of 3nm-50nm, and more specifically, in the range of 2nm-30nm. In this case, the glass structure 100 with the first superhard layer 13 has a higher surface hardness and longer scratch resistance, and the first superhard layer 13 can have higher optical transmittance.

[0075] Figure 3a This is another structural schematic diagram of a glass structural member provided for some embodiments of this application. Wherein, Figure 4 Compare Figure 4 It has an additional second super-hard layer 14 and an anti-fingerprint layer 15.

[0076] like Figure 5 As shown, the second superhard layer 14 is disposed on the side of the first superhard layer 13 opposite to the second optical scratch-resistant stack 12. The second superhard layer 14 is made of a different material than the first superhard layer 13. The second superhard layer 14 helps the first superhard layer 13 maintain its high hardness for a longer period, and the combination of these two elements improves the surface layer of the glass structure 100's durability against scratches from high-hardness objects. The second superhard layer 14 may include silicon nitride (Si3N4), silicon carbide (SiC), or silicon carbonitride (SiN2). x2 C y2 ), CN x1 One of them. Among them, x1, x2, and y2 are all between (0, 4].

[0077] In this embodiment, the thickness of the second superhard layer 14 is in the range of 1nm-50nm. A sufficiently low thickness of the second superhard layer 14 ensures that its optical transmittance is not too low, thus not affecting the overall appearance of the glass structure 100. Specifically, the thickness of the second superhard layer 14 can be 2nm, 5nm, 10nm, 15nm, 20nm, 25nm, 30nm, 35nm, 40nm, or 45nm, etc. In some embodiments, the thickness of the second superhard layer 14 is in the range of 2nm-20nm.

[0078] In some implementations, such asFigure 5 As shown, the glass structure 100 further comprises an anti-fingerprint film (AF film) 15, which is located on the side of the second superhard layer 14 away from the first superhard layer 13. The anti-fingerprint film 15 is mainly used to reduce the formation of fingerprints on the glass structure 100 when a user touches it with his fingers, so as not to affect the appearance effect of the glass structure 100. In addition, the second superhard layer 14 described above is arranged between the anti-fingerprint film 15 and the first superhard layer 13, which can reduce the influence of the primer layer of the anti-fingerprint film 15 on the hardness degradation of the first superhard layer 13 during long-term use.

[0079] Generally, the material of the AF film 15 comprises fluorine-containing compounds and / or silicon-containing compounds. These two types of compounds have hydrophobic and oleophobic properties, so that the surface of the glass structure 100 is easy to clean and has good anti-fingerprint residue resistance. In some embodiments, the thickness of the anti-fingerprint film 15 can be in the range of 5 nm-50 nm. The anti-fingerprint film 15 with an appropriate thickness can not only help the glass structure 100 to have good anti-fingerprint durability and wear resistance, but also will not significantly affect its optical transmittance.

[0080] Figure 3a Another structure of the glass structure provided by some other embodiments of the present application is shown in the following schematic diagram. Figure 5 Compared with the glass structure shown in the above schematic diagram, the glass structure shown in the following schematic diagram further comprises an anti-fingerprint film 15. Figure 3b The anti-fingerprint film 15 is arranged on the side of the first superhard layer 13 away from the second optical scratch-resistant layer 12.

[0081] In some embodiments of the present application, as shown in the following schematic diagram, the glass structure 100 further comprises an anti-fingerprint film 15, which is located on the side of the first superhard layer 13 away from the second optical scratch-resistant layer 12. The function, thickness, material, etc. of the anti-fingerprint film 15 can be referred to the description of the previous embodiments of the present application, which will not be described here. Figure 3a It should be noted that the features of the various embodiments of the present application can be combined with each other without conflict, and any combination of the features in different embodiments is also within the protection scope of the present application, that is, the above-described multiple embodiments can be combined arbitrarily according to actual needs. For example, in the glass structure 100 shown in the following schematic diagram, the AF film 15 is arranged on the side of the first superhard layer 13 away from the second optical scratch-resistant layer 12. Further, the second superhard layer 14 can be arranged between the AF film 15 and the first superhard layer 13. In addition, the above-described glass structure 100 of the embodiments of the present application can also be flexibly arranged with other film structures according to actual needs.

[0082] Figure 3b It should be noted that the features of the various embodiments of the present application can be combined with each other without conflict, and any combination of the features in different embodiments is also within the protection scope of the present application, that is, the above-described multiple embodiments can be combined arbitrarily according to actual needs. For example, in the glass structure 100 shown in the following schematic diagram, the AF film 15 is arranged on the side of the first superhard layer 13 away from the second optical scratch-resistant layer 12. Further, the second superhard layer 14 can be arranged between the AF film 15 and the first superhard layer 13. In addition, the above-described glass structure 100 of the embodiments of the present application can also be flexibly arranged with other film structures according to actual needs.

[0083] ​In the embodiments of the present application, the Mohs hardness of the surface of each glass structure 100 away from the glass substrate 10 is greater than or equal to 7. The term "Mohs hardness" is also referred to as scratch hardness, which is a hardness measured based on a scratch method using a mineral with a known hardness to scratch the surface of the glass structure 100 away from the glass substrate 10. The Mohs hardness is not an absolute hardness value, but a relative hardness expressed in order of hardness.

[0084] When the surface of the glass structure 100 away from the glass substrate 10 is scratched by an object with a hardness not greater than 7, the first super-hard layer 13 with a relatively high hardness mainly resists the external scratching force, and the surface of the glass structure 100 is basically not scratched. When the surface of the glass structure 100 is scratched by an object with a hardness greater than 7, the first super-hard layer 13 and the second and first optical anti-scratch layers 12 and 11 below the first super-hard layer 13 can jointly resist scratching caused by the object with a high hardness.

[0085] It should be noted that, when the Mohs hardness is tested, a mineral with a known hardness is used to scratch the exposed surface of the glass structure 100 away from the glass substrate 10 (i.e., the surface of the layer farthest from the glass substrate 10), for example, for the glass structure 100 shown in Figure 4 and Figure 5 , the first super-hard layer 13 is scratched; and for the glass structure 100 shown in ​ and ​ , the anti-fingerprint layer 15 is scratched.

[0086] In the embodiments of the present application, the nanoindentation hardness of the surface of each glass structure 100 away from the glass substrate 10 is greater than or equal to 14 GPa at an indentation depth of greater than 150 nm. The glass structure 100 has a high nanoindentation hardness, which reflects that the glass structure 100 can better resist deep scratches or persistent scratches caused by an object with a high hardness. The method for testing the nanoindentation hardness includes: a diamond indenter is pressed against the exposed surface of the glass structure 100 away from the glass substrate 10, and then the indenter is gradually pressed in under an increasing external load until a predetermined indentation depth is reached. The indentation hardness can be calculated by measuring the indentation depth and the corresponding external load at this time. It should be noted that, during the test, in the initial stage, the indentation depth gradually increases as the external load increases, and the indentation depth basically does not change when the external load further increases.

[0087] In the embodiments of the present application, the average transmittance of each glass structure 100 in the visible light region (specifically, 400-700 nm) is greater than 88%. After the film layer structure comprising at least the first optical scratch-resistant coating layer 11, the second optical scratch-resistant coating layer 12 and the first superhard layer 13 is arranged on one side of the glass substrate 10, the obtained glass structure 100 still has a high visible light transmittance, and is particularly suitable for use in display screen cover plates 101, camera protective cover plates 103 and the like which have high transparency requirements.

[0088] In the embodiments of the present application, the color coordinate shift value ΔE of each glass structure 100 compared to the glass substrate 10 is less than 1.5. The color coordinate shift value ΔE can reflect the degree of color change of each glass structure 100 compared to the glass substrate 10. ΔE = [(ΔL) 2 + (Δa) 2 + (Δb) 2 ] 1 / 2 ; ΔL represents the difference in L value in the Lab color coordinate between the glass structure 100 and the glass substrate 10, Δa represents the difference in a value in the Lab color coordinate between the glass structure 100 and the glass substrate 10, and Δb represents the difference in b value in the Lab color coordinate between the glass structure 100 and the glass substrate 10. The greater the ΔE value, the greater the color difference of the glass structure 100 compared to the glass substrate 10. The smaller ΔE value indicates that after the film layer structure comprising at least the first optical scratch-resistant coating layer 11, the second optical scratch-resistant coating layer 12 and the first superhard layer 13 is arranged on one side of the glass substrate 10, the obtained glass structure 100 still has a low coloration, and the appearance effect is basically not affected.

[0089] The glass structure 100 provided in the embodiments of the present application can have a high hardness, good wear resistance and scratch resistance, while its optical performance is not much different from that of the pure glass substrate 10, so that the glass structure can better meet various use requirements and use experiences of electronic devices, and has high quality reliability. In addition, compared to a glass substrate having only an undoped diamond-like layer (with the same thickness as the first superhard layer 13 of the present application) on the surface, the glass structure 100 of the present application has a higher nanoindentation hardness at the same indentation depth of greater than 150 nm, and has better durability against deep scratches. In addition, when the glass structure 100 of the present application comprises the second superhard layer 14, the nanoindentation hardness can be greater, and the scratch resistance is higher.

[0090] The embodiment of the present application further provides an electronic device adopting the glass structure.

[0091] For example, when the display screen cover plate 101 adopts the glass structure 100, the glass substrate 10 of the glass structure 100 is close to the display screen. The user contacts the side surface of the glass structure 100 far away from the glass substrate 10. The display screen is covered by the display screen cover plate 101, so that the display screen is less likely to be scratched and worn during use of the electronic device, and the display effect is not affected.

[0092] For example, when the camera protection cover plate 103 adopts the glass structure 100, the glass substrate 10 of the glass structure 100 is close to the camera assembly 2, and the first superhard layer 13 is far away from the camera assembly 2. The camera assembly 2 is covered by the camera protection cover plate 103, so that the camera of the camera assembly 2 is less likely to be scratched and worn during use of the electronic device, and the camera effect is not affected.

[0093] The above merely expresses the exemplary embodiments of the present application, which are described in detail and specifically, but cannot be understood as the limitation of the patent scope of the present application. It should be noted that, for those skilled in the art, several modifications and improvements can be made without departing from the concept of the present application, which are all within the protection scope of the present application. Therefore, the patent protection scope of the present application should be subject to the appended claims.

[0094] It should be noted that all the above-mentioned drawings are exemplary drawings of the present application, and do not represent the actual size of the product. The size ratio relationship between the components in the drawings is not limited to the actual product of the present application.

[0095] The terms "first", "second", "third", "fourth" are only used for description purpose, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second", "third", "fourth" can explicitly or implicitly include one or more of the features.

[0096] In the description of the present application, unless otherwise specified, the meaning of "a plurality of" is greater than or equal to two. "At least one" refers to one or more. "At least one of the following" or the like refers to any combination of these items, including any combination of single item or multiple items. For example, "at least one of a, b, or c", or "at least one of a, b, and c", can represent: a, b, c, a-b (i.e. a and b), a-c, b-c, or a-b-c, where a, b, and c can be single or multiple.

[0097] In the present application, "and / or" describes the association relationship of the associated objects, which means that there can be three kinds of relationships, for example, A and / or B, which can represent: A exists alone, A and B exist together, and B exists alone, where A and B can be singular or plural. The character " / " generally represents that the associated objects before and after it are in an "or" relationship.

[0098] In addition, the numerical range represented by "-" in the present application refers to the range including the minimum value and the maximum value represented by the numerical values before and after "-" respectively. In the present application, the expressions related to the range of parameters, such as "greater than or equal to (≥)", "less than or equal to (≤)", "above", "below" all include the present number. The values and ranges of values related by the embodiments of the present application are approximate values, which may have a certain range of error due to the influence of manufacturing process / testing method, etc. When the above values, ranges of values are within the reasonable error range of measurement, they are also considered to be within the scope protected by the present application.

Claims

1. A glass structural member (100), characterized by, The application relates to a glass substrate (10), a first optical scratch-resistant coating layer (11) arranged on one side of the glass substrate (10), wherein the first optical scratch-resistant coating layer (11) comprises at least one first refractive index material layer (111) and at least one second refractive index material layer (112) arranged alternately, and the refractive index of the first refractive index material layer (111) is greater than that of the second refractive index material layer (112); a second optical scratch-resistant coating layer (12) arranged on the side of the first optical scratch-resistant coating layer (11) away from the glass substrate (10), wherein the second optical scratch-resistant coating layer (12) comprises at least one third refractive index material layer (121), at least one fourth refractive index material layer (122) and at least one fifth refractive index material layer (123) arranged in layers, and the refractive indexes of the third refractive index material layer (121), the fourth refractive index material layer (122) and the fifth refractive index material layer (123) decrease in turn; and a first superhard layer (13) arranged on the side of the second optical scratch-resistant coating layer (12) away from the first optical scratch-resistant coating layer (11), wherein the first superhard layer (13) is a diamond-like layer containing a doping element, and the doping element comprises at least one of aluminum, titanium, zirconium, molybdenum, tungsten and nitrogen. The refractive index of the first refractive index material layer (111) is greater than or equal to 1.8, and the refractive index of the second refractive index material layer (112) is less than or equal to 1.

60. The refractive index of the third refractive index material layer (121) is greater than 1.80, the refractive index of the fourth refractive index material layer (122) is 1.60-1.80, and the refractive index of the fifth refractive index material layer (123) is less than 1.

60. The first refractive index material layer (111) comprises one of a silicon nitride layer, an aluminum nitride layer, a silicon aluminum nitride layer, a silicon oxynitride layer, an aluminum oxynitride layer and a silicon aluminum oxynitride layer. The second refractive index material layer (112) comprises one of a silicon oxide layer, an aluminum oxide layer, a silicon aluminum oxide layer, a silicon oxynitride layer, an aluminum oxynitride layer and a silicon aluminum oxynitride layer.

2. The glass structural member of claim 1, wherein, The third refractive index material layer (121) comprises one of a silicon nitride layer, an aluminum nitride layer, a silicon aluminum nitride layer and a titanium oxide layer. The fourth refractive index material layer (122) comprises one of a silicon oxynitride layer, an aluminum oxynitride layer and a silicon aluminum oxynitride layer.

3. The glass structural member of claim 2, wherein, The fifth refractive index material layer (123) comprises one of a silicon oxide layer, an aluminum oxide layer and a silicon aluminum oxide layer. The surface layer of the first optical scratch-resistant coating layer (11) close to the second optical scratch-resistant coating layer (12) is the first refractive index material layer (111), and the first refractive index material layer (111) is in contact with the fourth refractive index material layer (122) or the fifth refractive index material layer (123).

4. The glass structural member of claim 2, wherein Alternatively, the surface layer of the first optical scratch-resistant coating layer (11) close to the second optical scratch-resistant coating layer (12) is the second refractive index material layer (112), and the second refractive index material layer (112) is in contact with the third refractive index material layer (121) or the fourth refractive index material layer (122). ​ ​ 5. The glass structure of any one of claims 1-4, wherein, ​ ​ 6. The glass structure of any one of claims 1-5, wherein, The thickness of the first refractive index material layer (111), the third refractive index material layer (121), the fourth refractive index material layer (122) and the fifth refractive index material layer (123) is in the range of 1 nm-2500 nm respectively.

7. The glass structure of any one of claims 1-6, wherein, The sum of the thickness of the first optical scratch-resistant layer (11) and the second optical scratch-resistant layer (12) is in the range of 500 nm-3000 nm.

8. The glass structure of any one of claims 1-7, wherein, The thickness of the first superhard layer (13) is in the range of 1 nm-100 nm.

9. The glass structure of any one of claims 1-8, wherein, In the first superhard layer (13), the doping concentration of the doping element is less than or equal to 20wt%.

10. The glass structure of any one of claims 1-9, wherein, The side of the first superhard layer (13) away from the second optical scratch-resistant layer (12) is further provided with a second superhard layer (14); the material of the second superhard layer (14) is different from that of the first superhard layer (13).

11. The glass structure of claim 10, wherein, The second superhard layer (14) comprises one of silicon nitride, silicon carbide, silicon carbonitride, CN x1 wherein x1 is between (0, 4].

12. The glass structure of claim 10 or 11, wherein, The thickness of the second superhard layer (14) is in the range of 1 nm-50 nm.

13. The glass structure of any of claims 10-12, wherein the glass structure comprises a glass sheet having a thickness of 0.5 mm or less. The glass structure (100) further comprises an anti-fingerprint layer (15) located on the side of the second superhard layer (14) away from the first superhard layer (13).

14. The glass structure of any of claims 1-9, wherein, The glass structure (100) further comprises an anti-fingerprint layer (15) located on the side of the first superhard layer (13) away from the second optical scratch-resistant layer (12).

15. The glass structure of any one of claims 1-14, wherein, The Mohs hardness of the side surface of the glass structure (100) away from the glass substrate (10) is greater than or equal to 7.

16. The glass structure of any one of claims 1-15, wherein, The nanoindentation hardness of the side of the glass structure (100) away from the glass substrate (10) under an indentation depth greater than 150 nm is above 14 GPa.

17. The glass structure of any one of claims 1-16, wherein, The average transmittance of the glass structure (100) in the visible light region is above 88%.

18. The glass structure of any of claims 1-17, wherein, The color coordinate offset value ΔE of the glass structure (100) compared with the glass substrate (10) is less than 1.

5.

19. An electronic device (1000), characterized by, The outer shell assembled outside the electronic device (1000) and the circuit board located inside the outer shell, the outer shell comprising the glass structure (100) of any one of claims 1-18.

20. The electronic device of claim 19, wherein, The outer shell comprises a display screen cover plate (101) assembled on the front side of the electronic device (1000) and a back cover (102) assembled on the back side of the electronic device (1000); wherein the display screen cover plate (101) and / or the back cover (102) adopt the glass structure (100).

21. The electronic device of claim 19 or 20, wherein, The electronic device (1000) further comprises a camera assembly (2) located inside the outer shell, and the outer shell comprises a camera protection cover plate (103) covering the camera assembly (2), and the camera protection cover plate (103) adopts the glass structure (100).

Citation Information

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