Rotating mechanism and semiconductor epitaxy equipment

Abstract

The utility model provides a rotating mechanism and semiconductor epitaxial equipment, relates to the technical field of semiconductor production equipment, and aims to solve the technical problems that a lifting pin cannot be lifted, a wafer is difficult to take out and the production efficiency is greatly reduced in the production process due to the fact that a rotating shaft gradually moves due to inertia and finally deviates from the original position too much in the prior art. The rotating mechanism comprises a rotating shaft body and a supporting seat. A first end of the rotating shaft body is provided with a first positioning structure. The supporting seat is provided with a containing cavity used for containing the first end, the inner wall of the containing cavity is provided with a second positioning structure used for being matched with the first positioning structure, and the bottom of the containing cavity is provided with a stopping structure. The semiconductor epitaxial equipment comprises the rotating mechanism. The rotating shaft has the advantages that the problem that the rotating shaft body deviates from the original point position too much due to inertia is effectively solved, a rotating mechanism can work normally, extension equipment can produce normally, and production efficiency is improved to a certain degree.

Description

TECHNICAL FIELD

[0001] The utility model relates to semiconductor production equipment technical field especially, it is a kind of rotary mechanism and semiconductor epitaxial equipment. BACKGROUND

[0002] As shown in Figure 1 The rotary mechanism of existing semiconductor epitaxial equipment includes support seat 100, rotating shaft 200, lifting mechanism 300 etc. main components, the bottom of rotating shaft 200 is provided with support seat 100, the top of rotating shaft 200 is provided with base 400, base 400 is provided with through-hole, lifting mechanism 300 is set in rotating shaft 200, and the top of lifting mechanism 300 is connected lifting pin 600 by supporting jaw 500, lifting pin 600 is stretched out through the through-hole on base 400 and is hung on base 400 by the end stop structure 700 provided on its end portion, and semiconductor wafer is placed on base 400 during production, and semiconductor wafer can be lifted by lifting pin 600 and then taken out by mechanical hand.

[0003] Figure 2 It is the explosion diagram of the rotating shaft and support seat cooperation of existing, Figure 3 It is the structure diagram of existing support seat, as Figure 2 And Figure 3 As shown in, the rotating shaft 200 of current only relies on two O-rings 800 to fix rotating shaft 200 and support seat 100, every time rotating shaft 200 rotates, if O-ring 800 is not tightly clamped, rotating shaft 200 will gradually move due to inertia, and finally deviate from the original position too much, resulting in that lifting pin 600 cannot be lifted in production process, wafer is difficult to take out, and production efficiency is greatly reduced.

[0004] Therefore, there is an urgent need for a rotary mechanism and semiconductor epitaxial equipment to solve the above technical problems. INVENTION CONTENTS

[0005] The utility model discloses a kind of rotary mechanism and semiconductor epitaxial equipment, to solve the technical problem that the rotating mechanism of current only relies on two O-rings to fix rotating shaft and support structure in prior art, every time rotating mechanism rotates, if O-ring is not tightly clamped, rotating shaft will gradually move due to inertia, and finally deviate from the original position too much, resulting in that lifting pin cannot be lifted in production process, wafer is difficult to take out, and production efficiency is greatly reduced.The many technical effects that the preferred technical scheme in the many technical schemes provided by the utility model can produce are described in the following.

[0006] To achieve the above object, the utility model provides the following technical scheme:

[0007] The utility model provides a kind of rotary mechanism, comprising:

[0008] a rotation shaft body, a first end of the rotation shaft body is provided with a first positioning structure;

[0009] a supporting seat, the supporting seat is provided with a containing cavity for containing the first end, an inner wall of the containing cavity is provided with a second positioning structure for cooperating with the first positioning structure, and a bottom of the containing cavity is provided with a stop structure.

[0010] Preferably, the first positioning structure comprises a groove structure, and the second positioning structure comprises a boss capable of extending into the groove structure.

[0011] Preferably, the rotation shaft body adopts a hollow structure, the groove structure is cut along a first end surface of the rotation shaft body towards a second end surface of the rotation shaft body, and a cross-sectional area of the groove structure is smaller than that of the rotation shaft body.

[0012] Preferably, the boss is arranged on a side wall of the containing cavity.

[0013] Preferably, a plurality of groove structures are arranged, and the plurality of groove structures are uniformly arranged along a circumferential direction of the rotation shaft body.

[0014] The number of the bosses is not more than that of the groove structures, and the bosses are uniformly arranged along a circumferential direction of the containing cavity.

[0015] Preferably, the groove structures and the bosses are one-to-one correspondingly arranged.

[0016] Preferably, a depth of the groove structure is greater than a distance between a top surface of the boss and the stop structure.

[0017] Preferably, the stop structure is formed along a bottom of the containing cavity towards a center of the containing cavity.

[0018] A semiconductor epitaxial device comprises the rotation mechanism.

[0019] The rotation mechanism and the semiconductor epitaxial device have the following advantages: the first positioning structure is arranged at an end of the rotation shaft body, the second positioning structure for cooperating with the first positioning structure is arranged in the containing cavity of the supporting seat, when epitaxy is continuously produced, the rotation shaft body is positioned and stopped by the second positioning structure arranged in the supporting seat and the stop structure during a process of rotating back after rotating, the rotation shaft body is always fixed in a certain range of the supporting seat, the problem that the rotation shaft body deviates from an original position too much due to inertia is effectively avoided, the rotation mechanism normally works, the epitaxial device normally produces, and production efficiency is improved to a certain extent. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained from these drawings without creative labor.

[0021] Figure 1 is a structural schematic diagram of a rotating mechanism of a semiconductor epitaxial equipment in the prior art;

[0022] Figure 2 is an exploded view of a rotating shaft and a support seat in the prior art;

[0023] Figure 3 is a structural schematic diagram of a support seat in the prior art;

[0024] Figure 4 is a structural schematic diagram of an embodiment of the rotating mechanism of the present application;

[0025] Figure 5 is an exploded structural schematic diagram of Figure 4 ;

[0026] Figure 6 is a structural schematic diagram of a rotating shaft main body in the rotating mechanism of the present application;

[0027] Figure 7 is a structural schematic diagram of a support seat in the rotating mechanism of the present application;

[0028] Figure 8 is a top view structural schematic diagram of Figure 4 ;

[0029] Figure 9 is an A-A sectional view structural schematic diagram in Figure 8 .

[0030] In the drawings: 100, support seat; 200, rotating shaft; 300, lifting mechanism; 400, base; 500, supporting claw; 600, lifting pin; 700, stop structure; 800, O-ring;

[0031] 1, rotating shaft main body; 11, first positioning structure; 101, first end; 102, second end; 2, support seat; 20, accommodating cavity; 21, second positioning structure; 22, stop structure. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical scheme and advantages of the utility model clearer, the technical scheme of the utility model will be described in detail below. Obviously, the described embodiments are only part of the embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor belong to the scope protected by the utility model.

[0033] Figure 4 It is the structural schematic view of the embodiment, Figure 5 It is Figure 4 The explosion structural schematic view is shown as Figure 4 And Figure 5 The embodiment provides a rotating mechanism, and the rotating mechanism comprises a rotating shaft body 1 and a supporting seat 2.

[0034] Among them, Figure 6 It is the structural schematic view of the rotating shaft body in the embodiment, Figure 7 It is the structural schematic view of the supporting seat in the embodiment, as shown in Figure 6 And Figure 7 The first end 101 of the rotating shaft body 1 is provided with a first positioning structure 11; the supporting seat 2 is provided with a containing cavity 20 for containing the first end 101, the inner wall of the containing cavity 20 is provided with a second positioning structure 21 for cooperating with the first positioning structure 11, and the bottom of the containing cavity 20 is provided with a stop structure 22.

[0035] The rotating mechanism, by setting the first positioning structure 11 at the end of the rotating shaft body 1 and setting the second positioning structure 21 for cooperating with the first positioning structure 11 in the containing cavity 20 of the supporting seat 2, in the process of rotating and returning of the rotating shaft body 1 after rotating, once the rotating shaft body 1 deviates from a certain position, the rotating shaft body 1 will be positioned by the second positioning structure 21 arranged in the supporting seat 2 and stopped by the stop structure 22, so that the rotating shaft body 1 is always fixed in a certain range of the supporting seat 2, thereby effectively avoiding the problem that the rotating shaft body 1 deviates from the original position too much due to inertia, making the rotating mechanism work normally, the epitaxial equipment produce normally, and the production efficiency is improved to a certain extent.

[0036] In order to improve the positioning effect of the rotating shaft body 1 and the supporting seat 2, the cooperation of the groove structure and the boss is adopted for positioning in the embodiment. Specifically, the first positioning structure 11 in the embodiment comprises a groove structure, and the second positioning structure 21 comprises a boss capable of extending into the groove structure, so that the groove structure can be quickly cooperated with the boss in the process of returning of the rotating shaft body 1, and simple and rapid positioning is realized.

[0037] Optionally, in this embodiment, the rotating shaft body 1 adopts a hollow structure, and a groove structure is formed by cutting along the first end face of the rotating shaft body 1 toward the second end face of the rotating shaft body 1. The cross-sectional area of ​​the groove structure is smaller than the cross-sectional area of ​​the rotating shaft body 1.

[0038] Specifically, in this embodiment, the cross-section of the receiving cavity 20 is circular, the groove structure on the end face of the rotating shaft body 1 adopts a rectangular groove, one end of the boss is connected to the inner wall of the receiving cavity 20, and the other end is set as a rectangular block boss that cooperates with the groove structure.

[0039] To facilitate smooth engagement between the groove structure and the boss, in some embodiments, the cross-sectional area of ​​the boss is set to be smaller than the cross-sectional area of ​​the groove structure. Of course, to improve the positioning effect, the cross-sectional area of ​​the boss can also be set to be equal to the cross-sectional area of ​​the groove structure.

[0040] In actual production and use, the boss can be set on the bottom of the support base 2 or on the side wall of the support base 2. In this embodiment, to improve the stability of the cooperation between the rotating shaft body 1 and the support base 2, the boss is set on the side wall of the receiving cavity 20. This setting is more conducive to the earlier cooperation between the boss on the side wall and the rotating shaft body 1 when the rotating shaft body rotates, compared to when it is located on the bottom wall of the support base. This avoids the problem of difficulty in alignment after the rotating shaft body 1 deviates, making it safer, more stable and reliable in use.

[0041] As an optional implementation, multiple groove structures are provided, and these groove structures are evenly arranged along the circumference of the rotating shaft body 1. The number of bosses can be the same as or different from the number of groove structures. In this embodiment, the number of bosses is no more than the number of groove structures, and the bosses are evenly arranged along the circumference of the receiving cavity 20, ensuring that one or more groove structures can be positioned in conjunction with the bosses after rotation.

[0042] In this embodiment, to facilitate production and processing, the groove structure and the boss are set in a one-to-one correspondence, and there are two groove structures and two bosses. The two groove structures are symmetrically distributed along the center of the rotating shaft body 1, and the two bosses are symmetrically arranged along the center of the receiving cavity 20.

[0043] Figure 8 yes Figure 4 Top view structural diagram, Figure 9 yes Figure 8 Schematic diagram of the sectional structure of the middle AA, as shown below. Figure 8 and Figure 9 As shown, a stop structure 22 is formed by extending from the bottom of the receiving cavity 20 toward the center of the receiving cavity 20. The depth of the groove structure is greater than the distance between the top surface of the boss and the stop structure 22. With this setting, during the rotation of the shaft body 1, since there is a certain depth margin in the receiving cavity 20, it is more conducive to positioning during rotation.

[0044] The embodiment also provides a semiconductor epitaxial equipment, which comprises the rotating mechanism.

[0045] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited to this. Any skilled person in the art can easily think of changes or replacements within the technical range disclosed by the present application, which should be covered by the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A rotating mechanism characterized by comprising: The application relates to a rotating mechanism, comprising: a rotating shaft body, a first end of the rotating shaft body being provided with a first positioning structure; a supporting seat, the supporting seat being provided with a containing cavity for containing the first end, an inner wall of the containing cavity being provided with a second positioning structure for cooperating with the first positioning structure, and a bottom of the containing cavity being provided with a stop structure.

2. The rotation mechanism of claim 1, wherein: The first positioning structure comprises a groove structure, and the second positioning structure comprises a boss capable of extending into the groove structure.

3. The rotating mechanism of claim 2, wherein: The rotating shaft body adopts a hollow structure, the groove structure is cut along a first end surface of the rotating shaft body towards a second end surface of the rotating shaft body, and the cross-sectional area of the groove structure is smaller than that of the rotating shaft body.

4. The rotating mechanism of claim 3, wherein: The boss is arranged on a side wall of the containing cavity.

5. A rotating mechanism according to any one of claims 2-4, characterized in that: A plurality of groove structures are arranged along the circumference of the rotating shaft body uniformly. The number of the bosses is not more than that of the groove structures, and the bosses are arranged along the circumference of the containing cavity uniformly.

6. The rotating mechanism of claim 5, wherein: The groove structures and the bosses are arranged one by one.

7. A rotating mechanism according to any one of claims 2-4, characterized in that: The depth of the groove structure is greater than the distance between the top surface of the boss and the stop structure.

8. The rotating mechanism of claim 7, wherein: The stop structure is formed by extending along the bottom of the containing cavity towards the center of the containing cavity.

9. A semiconductor epitaxial apparatus, characterized by comprising: The rotating mechanism comprises any one of claims 1-8.

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