Polycrystalline silicon thin film preparation equipment

Abstract

The utility model provides polycrystalline silicon thin film preparation equipment which comprises a plurality of high-temperature machine tables, a heat insulation cabinet body, a purification table arranged in the heat insulation cabinet body, a furnace tube arranged on one side of the purification table and a heat insulation cover arranged on the periphery of the furnace tube, the gas supply assembly is communicated with the furnace tube through a pipeline and is used for providing reaction gas for the furnace tube; the exhaust assembly is connected with the furnace tube and is used for discharging waste gas generated by the furnace tube; the heat discharge assembly is communicated with the heat insulation cabinet body and is used for discharging heat in the heat insulation cabinet body; the control system is connected with the high-temperature machine table, the air supply assembly, the exhaust assembly and the heat removal assembly so as to control the high-temperature machine table, the air supply assembly, the exhaust assembly and the heat removal assembly. Through the arrangement, the tail gas treatment capacity and the pipeline anti-blocking performance of the polycrystalline silicon thin film preparation equipment are effectively improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to a semiconductor technical field especially relates to a polycrystal silicon thin film preparation equipment. BACKGROUND

[0002] Polycrystal silicon thin film becomes one of indispensable materials in modern industry because of its wide application in solar cell, semiconductor device and other fields. In the existing polycrystal silicon thin film preparation equipment, about 20% to 60% of the silane or phosphine gas participating in the reaction is discharged from the tail gas of the reaction device, and the content of unreacted gas is high. Therefore, the design of the exhaust equipment is crucial, which is not only related to production efficiency and product quality, but also directly affects environmental protection and production safety. The traditional exhaust system often has problems such as insufficient tail gas treatment capacity and easy pipe blockage, which can cause off-gas emission not to meet the standards, frequent equipment failure, and even safety accidents. Therefore, improving the tail gas treatment capacity and preventing pipe blockage are technical problems to be solved in the design of polycrystal silicon thin film preparation equipment.

[0003] Therefore, it is necessary to design a polycrystal silicon thin film preparation equipment to solve the above problems. UTILITY MODEL CONTENT

[0004] The utility model aims at providing a polycrystal silicon thin film preparation equipment with high tail gas treatment efficiency and convenient maintenance.

[0005] To achieve the above purpose, the utility model adopts the following technical scheme: a polycrystal silicon thin film preparation equipment, comprising

[0006] A plurality of high-temperature machine tables, including a heat insulation cabinet, a purification table arranged in the heat insulation cabinet, a furnace tube arranged on one side of the purification table, and a heat insulation cover arranged on the outer periphery of the furnace tube;

[0007] A gas supply assembly is connected to the furnace tube through a pipeline and is used to provide reaction gas to the furnace tube;

[0008] An exhaust assembly is connected to the furnace tube and is used to discharge and treat the exhaust gas generated by the furnace tube. The exhaust assembly comprises a waste gas vacuum machine, a waste gas pipe, a nitrogen pipe, a combustion barrel and a fan connected by a pipeline. The waste gas pipe and the nitrogen pipe are arranged in parallel. One end of the waste gas pipe is connected to the waste gas vacuum machine, and the other end is provided with a valve. One end of the nitrogen pipe is connected to a nitrogen source, and the other end is connected to the combustion barrel. The waste gas pipe and the nitrogen pipe are connected by a branch pipe.

[0009] A heat removal assembly is connected to the heat insulation cabinet and is used to remove the heat in the heat insulation cabinet.

[0010] A control system is connected with the high-temperature platform, the gas supply assembly, the exhaust assembly and the heat exhaust assembly to control the high-temperature platform, the gas supply assembly, the exhaust assembly and the heat exhaust assembly.

[0011] As a further improved technical scheme of the present application, the fan speed is 10-25 m / s, the diameter of the exhaust pipe is 400-600 mm, the diameter of the nitrogen pipe is 40-60 mm, and the diameter of the branch pipe is 20-25 mm.

[0012] As a further improved technical scheme of the present application, the branch pipe is a flexible pipe, and a ball valve is arranged on the branch pipe.

[0013] As a further improved technical scheme of the present application, a skylight is arranged at the connection between the exhaust pipe and the branch pipe.

[0014] As a further improved technical scheme of the present application, the heat exhaust assembly comprises a plurality of heat exhaust branch pipes and a heat exhaust main pipe, the heat exhaust branch pipes are connected to the cabinet body one by one, and the heat exhaust branch pipes are gathered in the heat exhaust main pipe.

[0015] As a further improved technical scheme of the present application, the connection point of the heat exhaust branch pipe and the heat insulation cabinet body is close to the purification platform and far away from the furnace port of the furnace pipe.

[0016] As a further improved technical scheme of the present application, a heat exhaust fan is arranged on one side of the heat exhaust branch pipe close to the heat insulation cabinet body, and a wind valve is arranged on one side of the heat exhaust branch pipe close to the heat exhaust main pipe.

[0017] As a further improved technical scheme of the present application, the heat exhaust fan is a high-temperature-resistant and explosion-proof axial flow fan.

[0018] According to the above technical scheme, the polycrystalline silicon thin film preparation equipment has the following advantages:

[0019] 1. The exhaust gas treatment capacity is improved: by selecting a high-efficiency exhaust vacuum machine and optimizing the pipeline layout, the exhaust gas extraction speed and treatment capacity are improved, the airflow resistance is reduced, the stability of gas flow is increased, the exhaust gas generated in the furnace pipe can be discharged in time, and the reaction efficiency and product quality are avoided.

[0020] 2. Preventing pipe blockage: first, the exhaust gas is connected with the combustion bucket through the nitrogen pipe, and the inert characteristics of nitrogen can effectively dilute harmful gas, so as to protect the combustion bucket and reduce the emission of harmful substances; the design of the combustion bucket can also prevent the exhaust gas from entering the subsequent treatment link, thereby reducing the risk of pipe blockage; during maintenance, the nitrogen pipe connected with the combustion bucket can be closed, the valve at the end of the exhaust pipe can be opened, nitrogen can be introduced into the exhaust pipe in the reverse direction, the flow of nitrogen can be adjusted according to actual needs, and then the accumulated dust particles in the exhaust pipe can be blown off by nitrogen, so that the pipe wall can be cleaned in time, thereby effectively preventing pipe blockage.

[0021] 3. Economic and environmental protection: by increasing the exhaust treatment capacity and preventing pipe blockage, the emission of harmful gas is significantly reduced, which meets the environmental protection requirements; the optimized exhaust assembly reduces the equipment failure rate, reduces the maintenance cost, and improves the production efficiency and product quality. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 FIG. 1 is a schematic view of a polycrystalline silicon thin film preparation equipment according to an embodiment of the present application. DETAILED DESCRIPTION

[0023] In order to make the purpose, technical scheme and advantages of the present application more clear, the present application will be described in detail below with reference to the drawings and specific embodiments.

[0024] Please refer to Figure 1 As shown in FIG. 1, the present application provides a polycrystalline silicon thin film preparation equipment, which comprises a plurality of high-temperature machine tables 10, a gas supply assembly (not shown), an exhaust assembly 20, a heat exhaust assembly 30 and a control system (not shown).

[0025] The high-temperature machine table 10 comprises an insulating cabinet 12, a purification table arranged in the insulating cabinet 12, a furnace pipe 11 arranged on one side of the purification table, and an insulating cover arranged on the outer periphery of the furnace pipe 11. The gas supply assembly is communicated with the furnace pipe 11 through a pipeline, and is used for providing reaction gas to the furnace pipe 11.

[0026] The exhaust assembly 20 is connected with the furnace tube 11, and is used for discharging the exhaust gas generated by the furnace tube 11. The exhaust assembly 20 comprises an exhaust gas vacuum machine 21, an exhaust gas pipe 22, a nitrogen pipe 24, a combustion bucket 25 and a fan 26 connected by pipes. The exhaust gas pipe 22 and the nitrogen pipe 24 are arranged in parallel. One end of the exhaust gas pipe 22 is communicated with the exhaust gas vacuum machine 21, and the other end is provided with a valve 222. The exhaust gas vacuum machine 21 can be arranged to be connected with the furnace tube 11 one by one, that is, one furnace tube 11 is arranged with one exhaust gas vacuum machine 21, so as to improve the exhaust gas treatment capacity. The exhaust gas pipe 22 and the nitrogen pipe 24 are connected through a branch pipe 23, and the branch pipe 23 is provided with a ball valve. One end of the nitrogen pipe 24 is connected with a nitrogen source, and the other end is connected with the combustion bucket 25. The fan 26 has a wind speed of 10-25 m / s. The pipe diameter of the exhaust gas pipe 22 is 400-600 mm. The pipe diameter of the nitrogen pipe 24 is 40-60 mm. The pipe diameter of the branch pipe 23 is 20-25 mm. A skylight 221 is arranged at the connection position of the exhaust gas pipe 22 and the branch pipe 23. A cleaning port can be arranged on the cover plate of the skylight 221. When the dust amount in the pipe is too large through the skylight 221, the cleaning port can be opened, and a dust collector is used for manual cleaning.

[0027] The outlet end of the fan 26 is further provided with a washing tower 40, so as to wash the exhaust gas generated by combustion. Sulfuric acid is added for neutralization reaction when necessary. The washing sewage is discharged into a wastewater station 50 through a sewage discharge pipe.

[0028] During maintenance, the end of the nitrogen pipe 24 connected with the combustion bucket 25 is closed, the valve 222 at the end of the exhaust gas pipe 22 is opened, the nitrogen is reversely introduced into the exhaust gas pipe 22, the flow of the nitrogen is adjusted according to the actual needs, and then the dust particles accumulated in the exhaust gas pipe 22 are blown away by the nitrogen, so as to clean the pipe wall in time, thereby effectively preventing the pipe from being blocked.

[0029] The heat exhaust assembly 30 is communicated with the heat insulation cabinet 12, and is used for discharging the heat in the heat insulation cabinet 12. The heat exhaust assembly 30 comprises a plurality of heat exhaust branch pipes 32 and a heat exhaust main pipe 31. The heat exhaust branch pipes 32 are connected with the heat insulation cabinet 12 one by one, and the plurality of heat exhaust branch pipes 32 are gathered in the heat exhaust main pipe 31. Figure 1 The connection point of the heat exhaust branch pipe 32 and the heat insulation cabinet 12 is close to the purification table and far away from the furnace port of the furnace tube 11 (for example, the furnace port of the furnace tube 11 is located on the right side, and therefore, the heat exhaust branch pipe 32 is connected with the side of the heat insulation cabinet 12 far away from the furnace port). A fan 322 is arranged on one side of the heat exhaust branch pipe 32 close to the heat insulation cabinet 12. The fan 322 is preferably a high-temperature resistant and explosion-proof axial flow fan. A wind valve 321 is arranged on one side of the heat exhaust branch pipe 32 close to the heat exhaust main pipe 31. In addition, the outlet end of the heat exhaust main pipe 31 is further provided with a peripheral fan, which is opened when the heat exhaust demand is high, so as to improve the overall heat exhaust capacity. The arrangement of the heat exhaust assembly 30 can quickly discharge the waste heat of the high-temperature machine table in a directional manner, reduce the boat cooling time of the high-temperature machine table, and improve the production efficiency.

[0030] The terms such as "upper", "lower", "front", "back", "left", "right" and the like used herein to indicate spatial relative positions are for the purpose of facilitating illustration to describe the relationship of one feature relative to another feature as shown in the drawings. It can be understood that the terms of spatial relative positions can be intended to include different orientations other than the orientation shown in the drawings, and should not be construed as limiting the claims.

[0031] In addition, the above embodiments are only used to illustrate the technical solutions described in the utility model and not to limit the utility model. The understanding of the specification should be based on the technical personnel in the art. Although the utility model has been described in detail in the specification with reference to the above embodiments, the ordinary skilled person in the art should understand that the technical personnel in the art can still modify or equivalently replace the utility model, and all technical solutions and improvements that do not deviate from the spirit and scope of the utility model should be covered in the scope of claims of the utility model.

Claims

1. A polycrystalline silicon thin film preparation device, characterized in that: The application relates to a high-temperature testing device. The device comprises a plurality of high-temperature testing devices, a heat-insulating cabinet, a purification table arranged in the heat-insulating cabinet, a furnace tube arranged on one side of the purification table and a heat-insulating cover arranged on the periphery of the furnace tube. A gas supply assembly is connected with the furnace tube through a pipeline and used for supplying reaction gas to the furnace tube. An exhaust assembly is connected with the furnace tube and used for discharging and treating exhaust gas generated by the furnace tube. The exhaust assembly comprises an exhaust vacuum machine, an exhaust pipe, a nitrogen pipe, a combustion barrel and a fan connected through a pipeline. An exhaust assembly is connected with the heat-insulating cabinet and used for discharging heat in the heat-insulating cabinet.

2. The polycrystalline thin film production apparatus according to claim 1, wherein: A control system is connected with the high-temperature testing device, the gas supply assembly, the exhaust assembly and the exhaust assembly to control the high-temperature testing device, the gas supply assembly, the exhaust assembly and the exhaust assembly.

3. The polycrystalline thin film production apparatus of claim 1, wherein: The fan has a wind speed of 10-25 m / s, the exhaust pipe has a pipe diameter of 400-600 mm, the nitrogen pipe has a pipe diameter of 40-60 mm and the branch pipe has a pipe diameter of 20-25 mm.

4. The polycrystalline thin film production apparatus according to claim 2, wherein: The branch pipe is a flexible pipe, and a ball valve is arranged on the branch pipe.

5. The polycrystalline thin film production apparatus of claim 1, wherein: A skylight is arranged at the connection position of the exhaust pipe and the branch pipe.

6. The polycrystalline thin film production apparatus of claim 5, wherein: The exhaust assembly comprises a plurality of exhaust branch pipes and an exhaust main pipe.

7. The polycrystalline thin film production apparatus of claim 5, wherein: The connection points of the exhaust branch pipes and the heat-insulating cabinet are close to the purification table and far away from the furnace port of the furnace tube.

8. The polycrystalline thin film production apparatus of claim 7, wherein: An exhaust fan is arranged on one side of the exhaust branch pipe close to the heat-insulating cabinet, and a wind valve is arranged on one side of the exhaust branch pipe close to the exhaust main pipe. The exhaust fan is a high-temperature-resistant explosion-proof axial fan.

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