Open type magnetron sputtering ring, fixing device and electron beam welding fixing tool

Abstract

The utility model belongs to the technical field of magnetron sputtering target material manufacturing, and particularly relates to an open type magnetron sputtering ring, a fixing device and an electron beam welding fixing tool. The utility model provides an open type magnetron sputtering ring which is a non-closed open ring and can effectively avoid the problem of deformation caused by local heating of a traditional closed magnetron sputtering ring in the electron beam welding process. According to the magnetron sputtering ring fixing device disclosed by the utility model, the core shaft is arranged to be step-shaped and is matched with the cover plate, the sleeve and the end part fixing assembly of which the center is provided with the mounting through hole, so that a plurality of magnetron sputtering rings can be fixed by the magnetron sputtering ring fixing device disclosed by the utility model; and a plurality of annular mounting grooves with different sizes can be formed in the cover plate, so that the requirement for fixed mounting of the magnetron sputtering rings with different sizes can be met. By means of the device, the machining process is optimized, machining procedures are combined, material turnover is reduced, and the production efficiency and the product yield are improved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to magnetron sputtering target material manufacturing technical field, concretely relates to a kind of open type magnetron sputtering ring, fixing device and electron beam welding fixed tooling. BACKGROUND

[0002] Magnetron sputtering is to use high-energy particles to bombard the surface of high-purity target material, so that the neutral target material atoms sputtered obtain energy to overcome surface escape work and deposit on the substrate to form a uniform thin film layer. Using magnetron sputtering process, metal, alloy or dielectric thin film can be plated on the surface of wafer, which is used to prepare interconnection line, barrier layer, via, anti-reflection layer, seed layer and other layers on integrated circuit chip. However, high-energy particles bombard target material from all directions, resulting in target material atoms escaping in different directions, especially when the substrate has small feature size and large aspect ratio, only a part of target material atoms can be deposited vertically on the substrate, and the step hole with large aspect ratio is easily blocked to form a hole. By using collimating sputtering, good coverage effect can be obtained at the bottom of the contact hole, the sidewall of the via and the sidewall of the step. The method of collimating sputtering places a sputtering ring made of the same material as the target between the target and the substrate, applies a radio frequency power source to the sputtering ring to form a high-density plasma region, and the neutral atoms escaping from the target are ionized into charged particles in the plasma region. Thus, most of the target ions move in different directions under the action of the electric field between the target and the substrate, and the charged particles are deposited vertically on the substrate, which is beneficial to filling the deep hole at a vertical angle. In order to adsorb the particles generated in the sputtering process, uniform and consistent diamond patterns are processed on the inner and outer surfaces and the side edges of the sputtering ring to adsorb the particles generated in the sputtering process and prevent the substrate from being contaminated and damaged.

[0003] The structure of the sputtering ring includes a ring body and a fixing assembly. The ring body and the fixing assembly are usually connected as a whole by electron beam welding to form a sputtering ring assembly. In order to fully exert the functions of collimating sputtering and particle adsorption of the sputtering ring assembly, it is necessary to avoid discharge and falling at the welded joint. Therefore, high quality of the welded surface is required, which not only ensures the welding strength of the ring body and the fixing assembly, but also ensures the smoothness of the welded surface. This puts high requirements on the welding tooling of the ring body and the fixing assembly. During welding, special welding tooling is needed to fix the ring body and the fixing assembly.

[0004] A sputtering ring assembly using electron beam welding is disclosed in Chinese patent No. CN209503217U. The assembly fixes the closed sputtering ring through the anti-splashing groove on the two circular plates and bolts to prevent the sputtering ring from being damaged by swelling and being clamped with the tooling during the welding process, which damages the surface pattern of the sputtering ring.

[0005] The patent with the Chinese patent publication number CN213163601U discloses an electron beam welding tool for sputtering ring body and fixing assembly, which fixes the closed sputtering ring through the clamping base, the fastening cover plate and the fastening screw, effectively solves the problem that the back of the welding position of the sputtering ring is tightly clamped with the tool fixture due to the expansion caused by the heating during the welding process, and the surface of the ring body is damaged during disassembly.

[0006] The patent with the Chinese patent publication number CN113427114B discloses an assembly and method suitable for batch electron beam welding of sputtering rings, which can fix multiple sputtering rings by increasing the number of partitions, realizes batch welding of closed sputtering rings, reduces the vacuum extraction and cooling time, and improves the production efficiency.

[0007] However, the above welding tool cannot simultaneously meet the welding and fixing requirements of sputtering rings with different outer diameters, and does not have universality. In the actual use process, the welding tool assembly needs to be frequently replaced according to the size of the sputtering ring, resulting in low production efficiency. Practical new type content

[0008] In view of the problems existing in the prior art, the utility model provides an open type magnetic control sputtering ring, a fixing device and an electron beam welding fixing tool, and the utility model specifically includes the following contents:

[0009] An open type magnetic control sputtering ring, the magnetic control sputtering ring is an open ring that is not closed; a plurality of grooves are arranged on the outer side wall of the magnetic control sputtering ring.

[0010] Further, the width of the opening is 4-8 mm; and / or, the outer diameter of the magnetic control sputtering ring is 260-300 mm; and / or, the height of the magnetic control sputtering ring is 45-55 mm; and / or, the number of the grooves is 4-6; and / or, the plurality of grooves are uniformly distributed along the circumferential direction of the magnetic control sputtering ring.

[0011] A magnetic control sputtering ring fixing device for fixing an open type magnetic control sputtering ring, comprising a mandrel, at least two cover plates, a sleeve, an end fixing assembly,

[0012] The mandrel comprises a first end and a second end, the mandrel is a stepped shaft, the stepped shaft comprises n cylindrical segments with different diameters, the n cylindrical segments with different diameters are sequentially arranged in the order of decreasing diameter, the cylindrical segment at the first end of the mandrel is the first segment, and the cylindrical segment at the second end of the mandrel is the nth segment, the diameter of the nth segment is the smallest;

[0013] The number of the cover plates is n-1, the center of the cover plate is provided with a mounting through hole, the n-1 cover plates are respectively and correspondingly sleeved on the second to the nth cylinder segments through the mounting through holes, and the diameter of the mounting through hole of the cover plate on the subsequent cylinder segment is smaller than the diameter of the previous cylinder segment; at least one group of annular mounting grooves for mounting the magnetron sputtering ring are arranged at the opposite positions of the adjacent cover plates; it should be noted that the "subsequent cylinder segment" refers to the adjacent cylinder segment with a smaller diameter, for example, the third cylinder segment is the subsequent cylinder segment of the second cylinder segment, and the nth cylinder segment is the subsequent cylinder segment of the n-1th cylinder segment;

[0014] The inner diameter of the sleeve is not less than the outer diameter of the nth cylinder segment of the mandrel, the sleeve is sleeved on the nth cylinder segment, and one end of the sleeve abuts against the side surface of the cover plate arranged on the cylinder segment; n≥3;

[0015] The end fixing assembly is detachably connected with the second end of the mandrel, and the end fixing assembly abuts against the other end of the sleeve.

[0016] Further, the stepped shaft further comprises a 0th cylinder segment, the 0th cylinder segment is connected with the end of the first cylinder segment, and the diameter of the 0th cylinder segment is equal to the diameter of the nth cylinder segment.

[0017] Further, the side surface of the cover plate sleeved on each cylinder segment abuts against the end step of the previous cylinder segment;

[0018] Further, the mounting groove comprises two open opposite opening grooves respectively arranged at the corresponding positions of the opposite side surfaces of the adjacent cover plates, the inner diameter of the two opening grooves is not greater than the inner diameter of the magnetron sputtering ring, the outer diameter of the two opening grooves is not less than the outer diameter of the magnetron sputtering ring, and the distance between the groove bottoms of the two opening grooves is not less than the height of the magnetron sputtering ring.

[0019] Further, the distance between the opposite side surfaces of the adjacent cover plates is not less than the width of the groove on the outer side wall of the magnetron sputtering ring.

[0020] Further, a plurality of groups of annular mounting grooves with different sizes are arranged at the opposite positions of the adjacent cover plates.

[0021] Further, a plurality of fixing assemblies are further included, the number of the fixing assemblies is consistent with the number of the grooves on the outer side wall of the magnetron sputtering ring.

[0022] Further, the end fixing assembly comprises an end plate and a threaded rod vertically connected with the side surface of the end plate, the diameter of the end plate is greater than the outer diameter of the sleeve; the end of the second end of the mandrel is provided with a threaded hole, and the end plate and the second end of the mandrel are connected through the threaded rod and the threaded hole.

[0023] The electron beam welding fixing tool comprises the magnetic control sputtering ring fixing device and at least one open type magnetic control sputtering ring.

[0024] The electron beam welding fixing tool comprises the magnetic control sputtering ring fixing device and at least one open type magnetic control sputtering ring.

[0025] (1) The open type magnetic control sputtering ring is provided, the magnetic control sputtering ring is a non-closed open ring, and the opening width of the open ring is designed, so that the deformation problem of the traditional closed magnetic control sputtering ring caused by local heating during the electron beam welding process can be effectively avoided while the concentricity of the magnetic control sputtering ring is ensured.

[0026] (2) The magnetic control sputtering ring fixing device is disclosed, the mandrel is arranged in a stepped shape, the cover plate, the sleeve and the end fixing assembly are provided with the mounting through holes, at least one group of annular mounting grooves for mounting the magnetic control sputtering rings are arranged on the opposite positions of the adjacent cover plates, during the fixing, firstly, the first cover plate is sleeved on the second cylindrical section, one end of the first magnetic control sputtering ring is clamped in the opening groove of the first cover plate, the second cover plate is installed, the other end opening of the magnetic control sputtering ring is clamped into the opening groove of the second cover plate, the cover plates and the magnetic control sputtering rings are installed in this way, then the sleeve and the end fixing assembly are installed at the second end of the mandrel, the sleeve abuts against the side surface of the last cover plate, the fixing of the multiple cover plates and the multiple magnetic control sputtering rings is realized, and finally, one end of the multiple fixing assemblies is arranged in the multiple grooves on the outer side wall of the open type magnetic control sputtering ring in a one-to-one correspondence, and the fixing assemblies and the open type magnetic control sputtering ring are welded, so that the installation of the whole fixing tool can be realized. During the magnetic control sputtering, the other end of the fixing assembly is installed on the electron beam welding machine chuck, and the electron beam welding machine tailstock is topped at the end fixing assembly. The magnetic control sputtering ring fixing device disclosed by the utility model can realize the fixing of multiple magnetic control sputtering rings, in addition, multiple annular mounting grooves with different sizes can be arranged on the cover plate, and the fixing and installation of the magnetic control sputtering rings with different sizes can be met. The use of the device optimizes the machining process, combines the machining procedures, reduces the material turnover, and improves the production efficiency and product yield. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 It is a side view of the open type magnetic control sputtering ring disclosed by the utility model;

[0028] Figure 2 It is an assembly structure schematic view of the open type magnetic control sputtering ring and the fixing assembly disclosed by the utility model;

[0029] Figure 3 The utility model discloses an assembly structure section view of electron beam welding fixing tooling,

[0030] Figure 4 The utility model discloses an assembly structure section view of electron beam welding fixing tooling,

[0031] Figure 5 The utility model discloses a cover plate structure diagram of magnetron sputtering ring fixing device,

[0032] Figure 6 The utility model discloses an assembly three -dimensional structure schematic diagram of electron beam welding tooling,

[0033] Figure 7 It is magnetron sputtering ring's conventional processing flow and processing flow after using this tool contrastive drawing. DETAILED DESCRIPTION

[0034] The utility model will be explained in detail below in combination with the drawings and specific embodiment. The embodiment shown below does not have any limiting effect on the utility model content recorded in the claim. In addition, the constitution represented in the following embodiment is not limited to the solution necessary as the utility model recorded in the claim.

[0035] Reference drawings Figures 1-2 An open type magnetron sputtering ring 600, the magnetron sputtering ring is non-enclosed open ring;The outer side wall of the magnetron sputtering ring is provided with a plurality of grooves 601.

[0036] In some embodiments of the utility model, the width of the opening is 4-8mm.

[0037] In some embodiments of the utility model, the outer diameter of the magnetron sputtering ring is 260-300mm.

[0038] In some embodiments of the utility model, the height of the magnetron sputtering ring is 45-55mm.

[0039] In some embodiments of the utility model, the number of grooves 601 is 4-6.

[0040] In some embodiments of the utility model, the plurality of grooves 601 is evenly distributed along the circumference of the magnetron sputtering ring.

[0041] Reference drawings Figures 3-6 A magnetron sputtering ring fixing device for fixing open type magnetron sputtering ring 600, including mandrel 100, at least two cover plates 300, sleeve 400, end fixed assembly 500,

[0042] The mandrel 100 comprises a first end and a second end, the mandrel 100 is a stepped shaft, the stepped shaft comprises n cylinder segments with different diameters, the n cylinder segments with different diameters are sequentially arranged in the order of diameters from large to small, a cylinder segment at the first end of the mandrel 100 is the first segment, and a cylinder segment at the second end of the mandrel 100 is the n segment, and the n segment has the smallest diameter;

[0043] The number of the cover plates 300 is n-1, the center of each cover plate 300 is provided with a mounting through hole, the n-1 cover plates 300 are correspondingly sleeved on the second to n segments through the mounting through holes, and the diameter of the mounting through hole of the cover plate 300 on the subsequent segment is smaller than that of the previous segment; at least one group of annular mounting grooves for mounting the magnetron sputtering ring are arranged at the opposite positions of the adjacent cover plates 300.

[0044] The inner diameter of the sleeve 400 is not less than the outer diameter of the n segment of the mandrel 100, the sleeve 400 is sleeved on the n segment, and one end of the sleeve 400 abuts against the side surface of the cover plate 300 arranged on the cylinder segment; n≥3.

[0045] The end fixing assembly 500 is detachably connected with the second end of the mandrel 100, and the end fixing assembly 500 abuts against the other end of the sleeve 400.

[0046] In some embodiments of the utility model, the stepped shaft further comprises a 0th segment, the 0th segment is connected with the end of the first segment, and the diameter of the 0th segment is equal to that of the n segment.

[0047] In some embodiments of the utility model, the side surface of the cover plate 300 sleeved on each cylinder segment abuts against the end of the previous cylinder segment.

[0048] In some embodiments of the utility model, the mounting groove comprises two open opposite open grooves 301 at the corresponding positions of the opposite side surfaces of the adjacent cover plates 300, the inner diameter of the two open grooves 301 is not greater than that of the magnetron sputtering ring, the outer diameter of the two open grooves 301 is not less than that of the magnetron sputtering ring, and the distance between the groove bottoms of the two open grooves 301 is not less than the height of the magnetron sputtering ring.

[0049] In some embodiments of the utility model, the distance between the opposite side surfaces of the adjacent cover plates 300 is not less than the width of the groove 601 on the outer side wall of the magnetron sputtering ring.

[0050] In some embodiments of the utility model, a plurality of groups of annular mounting grooves with different sizes are arranged at the opposite positions of the adjacent cover plates 300.

[0051] In some embodiments of the utility model, still include a plurality of fixed assembly 602, the number of fixed assembly 602 is consistent with the number of groove 601 on the outer side wall of magnetron sputtering ring.

[0052] In some embodiments of the utility model, the end fixed assembly 500 includes end plate and the vertical connection of screw rod with end plate side, the diameter of end plate is greater than the outer diameter of sleeve 400, the end of the second end of mandrel 100 is provided with threaded hole, and the end plate and the second end of mandrel 100 are connected through screw rod and threaded hole.

[0053] A kind of electron beam welding fixed tool, including the magnetron sputtering ring fixing device of the utility model and at least one the open type magnetron sputtering ring 600 of the utility model, the open type magnetron sputtering ring 600 is set in the annular mounting groove, and one end of the plurality of fixed assembly 602 is set in the plurality of groove 601 on the outer side wall of open type magnetron sputtering ring 600 one by one and is fixedly connected with open type magnetron sputtering ring 600.

[0054] Reference attached Figure 7 The device disclosed in the utility model is used, first, the magnetron sputtering ring is processed to open, then the first cover plate 300 is sleeved on the second cylindrical section, one end of the first magnetron sputtering ring is clamped in the opening slot 301 of the first cover plate 300, the second cover plate 300 is installed, the other end opening of the magnetron sputtering ring is clamped into the opening slot 301 of the second cover plate 300, after installing the cover plate 300 and the magnetron sputtering ring in this way, the sleeve 400 and the end fixed assembly 500 are installed on the second end of the mandrel 100, the sleeve 400 is against the side surface of the last cover plate 300, the fixing of multiple cover plates 300 and multiple magnetron sputtering rings is realized, one end of the plurality of fixed assembly 602 is set in the plurality of groove 601 on the outer side wall of open type magnetron sputtering ring 600 one by one and the fixed assembly 602 is welded with open type magnetron sputtering ring 600, the installation of the whole fixed tool can be realized. When magnetron sputtering is carried out, the other end of the fixed assembly 602 is installed on the electron beam welding machine chuck, and the electron beam welding machine tail center is topped to the end fixed assembly 500. The magnetron sputtering ring fixing device disclosed in the utility model can realize the fixing of multiple magnetron sputtering rings, in addition, multiple annular mounting grooves of different sizes can be arranged on the cover plate 300, so that the fixing and installation of magnetron sputtering rings of different sizes can be met. The use of the device optimizes the processing flow, combines machining procedures, reduces material turnover, and improves production efficiency and product yield.

[0055] In the description of the present application, it should be noted that the terms "upper", "lower", "vertical", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second" and the like are only for the purpose of description and cannot be understood as indicating or implying relative importance.

[0056] Unless otherwise clearly specified and limited, the terms "provided", "connected" should be understood broadly, for example, can be fixedly connected, can be detachably connected, or integrally connected; can be mechanically connected, can be directly connected, can be indirectly connected through an intermediate medium, can be connected inside two elements. For those of ordinary skill in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0057] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An open magnetic field-controlled sputtering ring, characterized by, The magnetic control sputtering ring is an open ring with an opening width of 4-8 mm; and a plurality of grooves are arranged on the outer sidewall of the magnetic control sputtering ring.

2. An open magnetic field magnetron sputter ring according to claim 1, wherein The outer diameter of the magnetic control sputtering ring is 260-300 mm; and / or the height of the magnetic control sputtering ring is 45-55 mm; and / or the number of the grooves is 4-6; and / or the plurality of grooves are uniformly distributed along the circumference of the magnetic control sputtering ring.

3. A magnetron sputter ring fixing device for fixing the open magnetron sputter ring according to any one of claims 1 to 2, characterized in that The core shaft comprises a first end and a second end, the core shaft is a stepped shaft, the stepped shaft comprises n cylindrical segments with different diameters, the n cylindrical segments with different diameters are sequentially arranged in the order of decreasing diameter, the cylindrical segment at the first end of the core shaft is the first segment, and the cylindrical segment at the second end of the core shaft is the nth segment, the diameter of the nth segment is the smallest. The number of the cover plates is n-1, a mounting through hole is arranged at the center of each cover plate, the n-1 cover plates are respectively and correspondingly sleeved on the second to nth segments through the mounting through holes, and the diameter of the mounting through hole of the cover plate on the subsequent segment is smaller than the diameter of the mounting through hole of the cover plate on the previous segment; at least one set of annular mounting slots for mounting the magnetic control sputtering ring are arranged at the opposite positions of the adjacent cover plates. The inner diameter of the sleeve is not less than the outer diameter of the nth segment of the core shaft, the sleeve is sleeved on the nth segment, and one end of the sleeve abuts against the side surface of the cover plate arranged on the cylindrical segment; n≥3. The end fixing assembly is detachably connected with the second end of the core shaft, and the end fixing assembly abuts against the other end of the sleeve. The stepped shaft further comprises a 0th segment, the 0th segment is connected with the end of the first segment, and the diameter of the 0th segment is equal to the diameter of the nth segment.

4. A magnetron sputtering ring fixture as claimed in claim 3, wherein, The side surface of the cover plate sleeved on each cylindrical segment abuts against the end of the previous cylindrical segment.

5. A magnetron sputtering ring fixture as claimed in claim 3, wherein, The mounting slot comprises two open opposite opening slots respectively arranged at the corresponding positions of the opposite side surfaces of the adjacent cover plates, the inner diameter of the two opening slots is not greater than the inner diameter of the magnetic control sputtering ring, the outer diameter of the two opening slots is not less than the outer diameter of the magnetic control sputtering ring, and the distance between the slot bottoms of the two opening slots is not less than the height of the magnetic control sputtering ring.

6. A magnetron sputtering ring fixture as claimed in claim 5, wherein, The distance between the opposite side surfaces of the adjacent cover plates is not less than the width of the groove on the outer sidewall of the magnetic control sputtering ring.

7. A magnetron sputtering ring fixture as claimed in claim 6, wherein A plurality of groups of annular mounting slots with different sizes are arranged at the opposite positions of the adjacent cover plates.

8. A magnetron sputtering ring fixture as defined in claim 3, wherein A plurality of fixing assemblies are further included, the number of the fixing assemblies is consistent with the number of the grooves on the outer sidewall of the magnetic control sputtering ring.

9. A magnetron sputtering ring fixture as defined in claim 3, wherein The end fixing assembly comprises an end plate and a threaded rod vertically connected with the side surface of the end plate, the diameter of the end plate is greater than the outer diameter of the sleeve; a threaded hole is arranged at the end of the second end of the core shaft, and the end plate and the second end of the core shaft are connected through the threaded rod and the threaded hole.

10. The magnetron sputtering ring fixture of any of claims 3-9, wherein, ​ 11. An electron beam welding fixture fixture, characterized by, The magnetron sputtering ring fixing device of any one of claims 3-10 and at least one of the open type magnetron sputtering ring of any one of claims 1-2 are arranged in the ring-shaped mounting groove, and one end of the plurality of fixing assemblies is arranged in the plurality of grooves on the outer sidewall of the open type magnetron sputtering ring in one-to-one correspondence and fixedly connected with the open type magnetron sputtering ring.

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