Multistage filtering wafer groove device and wet process equipment

Abstract

The utility model discloses a multi-stage filtering wafer groove device and wet process equipment, and relates to the technical field of semiconductor processing, and the multi-stage filtering wafer groove device comprises a groove body and a circulating filtering assembly; the circulating filtering assembly comprises a circulating pipeline, a first filter, a second filter and a power pump; the first filter, the second filter and the power pump are mounted on the circulating pipeline; a deposition cavity and a floating cavity communicated with the deposition cavity are formed in the first filter; a first filtering inlet of the first filter is communicated with the deposition cavity, and the height of the first filtering inlet is lower than that of the communication position between the deposition cavity and the floating cavity; a first filtering outlet of the first filter is communicated with the floating cavity and is lower than the communication position between the deposition cavity and the floating cavity. Due to the design of multi-stage filtration, the first filter is mainly responsible for treating large-particle sediments and part of suspended matters, and the second filter focuses on finer impurities, so that the overall filtration efficiency is improved, and the service life is prolonged.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor processing, in particular to a multi-stage filtering wafer tank device and a wet process equipment. BACKGROUND

[0002] In the manufacturing process of semiconductor micro-nano devices, a wet bench is needed for wafer surface cleaning and acid-base etching. The cleaning or etching liquid will gradually become turbid during use. In order to improve the cleaning efficiency and save the amount of liquid, a circulating filtration pipeline is added in the cleaning process in the prior art to extract the cleaning or etching liquid and then return it after filtration. For example, a scientific research type wet etching full-automatic system and machine table disclosed in Chinese Patent No. CN118053795B specifically discloses a circulating filtration module which extracts the liquid in the liquid chamber and returns it to the liquid chamber after filtration.

[0003] The existing circulating filtration pipeline design, such as the one disclosed in the above patent, is mostly a single filter arranged on the pipeline. Such a filter has relatively poor filtering efficiency and is prone to increase the burden of the filter, thereby shortening the service life of the filter. Therefore, there is an urgent need to provide a new design scheme to solve the above technical problems. CONTENT OF THE UTILITY MODEL

[0004] Therefore, the purpose of the present application is to provide a multi-stage filtering wafer tank device and a wet process equipment to improve the filtering efficiency and prolong the service life.

[0005] To achieve the above technical purpose, the present application provides a multi-stage filtering wafer tank device, which comprises a tank body and a circulating filtration assembly.

[0006] The circulating filtration assembly comprises a circulating pipeline, a first filter, a second filter and a power pump.

[0007] The input end and the output end of the circulating pipeline are respectively in communication with the tank body.

[0008] The first filter, the second filter and the power pump are installed on the circulating pipeline.

[0009] The first filter and the second filter are sequentially arranged along the input end to the output end direction of the circulating pipeline.

[0010] The first filter is provided with a deposition cavity and a plankton cavity in communication with the deposition cavity.

[0011] The first filtration inlet of the first filter is in communication with the deposition cavity, and the height thereof is lower than the height of the communication position between the deposition cavity and the plankton cavity.

[0012] The first filtering outlet of the first filter is communicated with the floating cavity, and the height of the first filtering outlet is lower than the height of the communication position between the sediment cavity and the floating cavity.

[0013] Further, a collecting net for collecting sediments is installed in the sediment cavity below the first filtering inlet.

[0014] Further, a filtering net for filtering floating matters is installed in the floating cavity.

[0015] The height of the first filtering outlet is lower than the height of the filtering net.

[0016] Further, the collecting net and / or the filtering net is in a groove structure.

[0017] Further, a first handle is arranged on the collecting net.

[0018] A second handle is arranged on the filtering net.

[0019] Further, a supporting structure for supporting the filtering net is arranged on the side wall of the floating cavity.

[0020] Further, the supporting structure is a protruding block.

[0021] The filtering net is provided with a clamping groove part into which the protruding block can be clamped.

[0022] Further, the first filter comprises a box body and a box cover.

[0023] The top of the box body is provided with an opening.

[0024] The box cover is detachably covered on the opening.

[0025] A partition plate is arranged in the box body.

[0026] The partition plate separates the cavity in the box body into the sediment cavity and the floating cavity.

[0027] The top of the partition plate is lower than the top of the box body, and a communication gap is formed between the top of the partition plate and the top of the box body.

[0028] The sediment cavity and the floating cavity are communicated through the communication gap.

[0029] Further, the circulating filtering assembly further comprises a buffer tank.

[0030] The buffer tank is installed on the circulating pipeline and located between the first filter and the second filter.

[0031] Further, the groove body comprises an inner groove body and an overflow groove.

[0032] The overflow tank is sleeved on the outer circumferential surface of the inner tank body and used for receiving the solution overflowing from the top of the inner tank body.

[0033] Further, the top of the overflow tank is higher than the top of the inner tank body.

[0034] Further, the input end of the circulation pipeline is in communication with the overflow tank and / or the inner tank body.

[0035] The output end of the circulation pipeline is in communication with the inner tank body.

[0036] Further, the second filter is a capsule filter.

[0037] The application further discloses a wet process device comprising the multi-stage filtering wafer tank device.

[0038] From the above technical solutions, it can be seen that the multi-stage filtering wafer tank device designed by the application has the following beneficial effects:

[0039] 1. The multi-stage filtering system formed by the first filter and the second filter can effectively share the work load of a single filter. The deposition cavity and the plankton cavity in the first filter process different types of impurities respectively, and the deposits are deposited at the bottom of the deposition cavity, and the plankton is floated at the top of the plankton cavity, so that the impurities in the solution are processed in stages. This design significantly improves the overall filtering efficiency and avoids the problem of blockage caused by excessive burden of a single filter.

[0040] 2. The design of the multi-stage filtering makes the first filter mainly responsible for processing large particle deposits and part of the plankton, and the second filter focuses on finer impurities. Such division of labor reduces the operating pressure of each filter and reduces the wear of the second filter, thereby prolonging the service life of the entire filtering system. BRIEF DESCRIPTION OF DRAWINGS

[0041] In order to more clearly illustrate the technical solutions in the embodiments of the application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description only constitute some embodiments of the application, and for those skilled in the art, other drawings can also be obtained without creative labor under the premise of the drawings.

[0042] Figure 1 It is a structural schematic diagram of a multi-stage filtering wafer tank device provided in the application;

[0043] In the figure: 1, tank body; 11, inner tank body; 111, liquid discharge port; 12, overflow tank; 2, circulating pipeline; 21, connecting pipe; 3, first filter; 31, box body; 311, deposition cavity; 312, plankton cavity; 32, box cover; 33, collection net; 34, filter screen; 35, support structure; 36, partition plate; 4, second filter; 5, power pump; 6, buffer tank. DETAILED DESCRIPTION

[0044] The technical solutions of the embodiments of the present application will be described clearly and completely below with reference to the drawings. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0045] In the description of the embodiments of the present application, it should be noted that the orientations or positional relationships indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the embodiments of the present application and simplifying the description, and are not intended to indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the embodiments of the present application. In addition, the terms "first", "second", "third" are only for the purpose of description, and cannot be understood as indicating or implying relative importance.

[0046] In the description of the embodiments of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood broadly, for example, it can be fixedly connected, or it can be replaceably connected, or it can be integrally connected, it can be mechanically connected, or it can be electrically connected, it can be directly connected, or it can be indirectly connected through an intermediate medium, it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the embodiments of the present application can be understood according to the specific circumstances.

[0047] The embodiments of the present application disclose a multi-stage filtering wafer tank device and a wet process equipment.

[0048] Please refer to Figure 1 An embodiment of a multi-stage filtering wafer tank device provided in the embodiments of the present application includes:

[0049] The tank body 1 and the circulating filtering assembly.

[0050] The circulating filtration assembly comprises a circulating pipeline 2, a first filter 3, a second filter 4 and a power pump 5; the input end and the output end of the circulating pipeline 2 are communicated with the tank body 1 respectively, the circulating pipeline 2 is composed of multiple connecting pipes 21, and the specific number is not limited according to the number of components connected in series on the pipeline.

[0051] The first filter 3, the second filter 4 and the power pump 5 are installed in series on the circulating pipeline 2; the first filter 3 and the second filter 4 are arranged in sequence along the input end to the output end direction of the circulating pipeline 2; the power pump 5 is an existing liquid pump, and the arrangement position thereof can be changed and adjusted as required, and is not limited.

[0052] The first filter 3 is provided with a deposition cavity 311 and a floating cavity 312 communicated with the deposition cavity 311;

[0053] The first filter inlet of the first filter 3 is communicated with the deposition cavity 311, and the height thereof is lower than the height of the communication position between the deposition cavity 311 and the floating cavity 312, so that the solution enters the deposition cavity 311 first, and the larger deposits can be deposited in the deposition cavity 311.

[0054] The first filter outlet of the first filter 3 is communicated with the floating cavity 312, and the height thereof is lower than the height of the communication position between the deposition cavity 311 and the floating cavity 312, so that the solution below the floating object is output from the first filter outlet.

[0055] The multi-stage filtration wafer tank device designed in the application has the following beneficial effects:

[0056] 1. The multi-stage filtration system formed by the first filter 3 and the second filter 4 can effectively share the work load of a single filter. The deposition cavity 311 and the floating cavity 312 in the first filter 3 process different types of impurities respectively, the deposits are deposited at the bottom of the deposition cavity 311, and the floating objects float at the top of the floating cavity 312, so that the impurities in the solution are processed in stages. This design significantly improves the overall filtration efficiency and avoids the problem of blockage caused by excessive burden of a single filter.

[0057] 2. The design of the multi-stage filtration makes the first filter 3 mainly responsible for processing large-particle deposits and part of the floating objects, and the second filter 4 focuses on finer impurities. Such division of labor reduces the operating pressure of each filter and reduces the wear of the second filter 4, thereby prolonging the service life of the entire filtration system.

[0058] The above is embodiment one of the multi-stage filtration wafer tank device provided in the embodiment of the application, and the following is embodiment two of the multi-stage filtration wafer tank device provided in the embodiment of the application, which is specifically described in the following Figure 1 .

[0059] Based on the scheme of the above embodiment one:

[0060] Further, a collecting net 33 for collecting the deposits is installed below the first filtering inlet in the depositing cavity 311. The collecting net 33 is arranged to bear the deposits, facilitating the subsequent removal of the deposits.

[0061] Further, a filtering net 34 for filtering the floaters is installed in the floating cavity 312. The filtering net 34 can block the floaters, playing a role of filtering the floaters. The mesh size (mesh number) of the collecting net 33 and the floating net can be designed according to actual needs, as long as the required functions can be realized.

[0062] The height of the first filtering outlet is lower than the height of the filtering net 34. The solution filtered by the filtering net 34 is output from the first filtering outlet.

[0063] The modular design of the collecting net 33 and the filtering net 34 in the first filter 3 facilitates the disassembly and cleaning, and the multi-stage filtering system reduces the wear speed of a single component, reduces the maintenance frequency and the cost of replacing parts.

[0064] Further, the collecting net 33 and / or the filtering net 34 are of a groove structure. The groove structure can better accommodate and collect the deposits and the floaters. Compared with the ordinary structure, the groove structure has a larger collection capacity and can more effectively prevent impurities from overflowing during the filtering process. The groove design makes it more convenient to clean the collecting net 33 and the filtering net 34. The staff can directly take out the groove body and centrally process the impurities therein. At the same time, the groove structure can also enhance the structural stability of the collecting net 33 and the filtering net 34. In the process of solution flow, the groove shape can better resist the impact of water flow and is not easy to deform, thereby ensuring the stability and continuity of the filtering effect.

[0065] Further, the collecting net 33 is provided with a first handle (not shown in the figure); and the filtering net 34 is provided with a second handle (not shown in the figure). The first handle and the second handle greatly facilitate the disassembly and installation operation of the collecting net 33 and the filtering net 34. When cleaning the collecting net 33 and the filtering net 34, the staff only needs to hold the first handle and the second handle to easily take them out of the first filter 3, avoiding direct contact with the impurities, which not only ensures the convenience of operation, but also improves the hygiene. Moreover, when installing the collecting net 33 and the filtering net 34, the handles can also be used to more accurately place them in the appropriate position, ensuring the accuracy and stability of the installation.

[0066] Further, the sidewall of the floating cavity 312 is provided with a support structure 35 for supporting the filter screen 34. The support structure 35 can provide stable support for the filter screen 34, preventing the filter screen 34 from being displaced or shaken under the impact of the solution flow. With the stable support of the support structure 35, the filter screen 34 can always remain in the appropriate position, thereby continuously and effectively filtering the floating substances.

[0067] Further, the support structure 35 is a protruding block; the filter screen 34 is provided with a clamping groove (not shown in the figure) capable of clamping the protruding block. This clamping mode of the protruding block and the clamping groove makes the installation of the filter screen 34 more secure and accurate. During installation, the worker only needs to align the clamping groove with the protruding block and clamp it in, which can quickly complete the installation and positioning of the filter screen 34, and can ensure that the filter screen 34 is tightly combined with the support structure 35. During the solution flow, the clamping of the protruding block and the clamping groove can effectively resist the impact force of the water flow, preventing the filter screen 34 from being displaced, tilted, and the like, thereby ensuring the stability of the filtering effect.

[0068] Further, the first filter 3 includes a box body 31 and a box cover 32; the top of the box body 31 is provided with an opening; the box cover 32 is detachably covered on the opening; the box body 31 is provided with a partition plate 36; the partition plate 36 separates the chamber in the box body 31 into a deposition cavity 311 and a floating cavity 312; the top of the partition plate 36 is lower than the top of the box body 31, and a communication gap is formed between the top of the partition plate 36 and the top of the box body 31; the deposition cavity 311 and the floating cavity 312 are communicated through the communication gap.

[0069] This detachable box cover 32 design facilitates the maintenance and cleaning work of the inside of the first filter 3. The worker can easily open the box cover 32 to check, clean or replace the collection screen 33 and the filter screen 34 in the deposition cavity 311 and the floating cavity 312. The communication gap formed between the top of the partition plate 36 and the top of the box body 31 ensures that the solution can smoothly flow between the deposition cavity 311 and the floating cavity 312, so that after the preliminary deposition in the deposition cavity 311, the solution can smoothly flow into the floating cavity 312 for the next step of floating substance filtering.

[0070] Further, the circulating filter assembly further includes a buffer tank 6; the buffer tank 6 is installed on the circulating pipeline 2 and located between the first filter 3 and the second filter 4.

[0071] The buffer tank 6 plays a role of buffering and stabilizing the solution flow. In the multi-stage filtration process, the flow and pressure of the solution flowing out of the first filter 3 may fluctuate to a certain extent. The buffer tank 6 can adjust these fluctuations, so that the flow and pressure of the solution entering the second filter 4 are more stable, thereby ensuring that the second filter 4 can perform the filtration work more efficiently and stably. At the same time, the buffer tank 6 can also serve as a temporary storage container. When the filtration speed of the first filter 3 is relatively fast, and the processing speed of the second filter 4 is relatively slow, the buffer tank 6 can temporarily store the excess solution, so as to avoid the accumulation of the solution in the pipeline and affect the normal operation of the entire circulating filtration system.

[0072] Further, the tank body 1 comprises an inner tank body 11 and an overflow tank 12; the overflow tank 12 is sleeved on the outer peripheral surface of the inner tank body 11 and is used for receiving the solution overflowing from the top of the inner tank body 11.

[0073] The overflow tank 12 can effectively prevent the solution in the inner tank body 11 from overflowing to the external environment, thereby ensuring the cleanliness and safety of the workplace. When the solution in the inner tank body 11 reaches a certain height, the excess solution will automatically flow into the overflow tank 12, thereby avoiding the waste of the solution and the possible damage to the surrounding equipment. The tank body 1 is provided with a drain port 111 for emptying and cleaning, which will not be described in detail.

[0074] Further, the top of the overflow tank 12 is higher than the top of the inner tank body 11. The overflow tank 12 higher than the top of the inner tank body 11 can better collect the overflowing solution and prevent the solution from splashing to the surrounding environment.

[0075] Further, the input end of the circulating pipeline 2 communicates with the overflow tank 12 and / or the inner tank body 11; the output end of the circulating pipeline 2 communicates with the inner tank body 11. Such a communication mode enables the circulating filtration assembly to flexibly circulate and filter the solution in the tank body 1. When the input end of the circulating pipeline 2 communicates with the overflow tank 12, the overflowing solution can be preferentially filtered, thereby reducing the influence of impurities in the overflowing solution on the subsequent equipment; if the input end communicates with the inner tank body 11, the solution in the tank can be directly circulated and purified. The output end communicating with the inner tank body 11 can re-inject the clean solution filtered through multiple stages into the inner tank body 11, thereby maintaining the purity of the solution in the inner tank body 11.

[0076] Further, the second filter 4 is a capsule filter. The capsule filter has the advantages of high filtration precision, high filtration efficiency, and convenient replacement. It can perform more fine filtration on the solution preliminarily filtered by the first filter 3, effectively remove the residual micro-impurities and particles in the solution, and further improve the purity of the solution. Moreover, the structural design of the capsule filter makes it easy to operate when replacing the filter capsule, so that the filtration function can be quickly restored, and the equipment downtime is reduced.

[0077] The application also discloses a wet processing equipment comprising the multi-stage filtering wafer tank device. The multi-stage filtering wafer tank device can provide a pure and stable solution environment for the wet processing of wafers. In the wet processing of wafers, such as cleaning and etching, the purity of the solution has a crucial influence on the processing effect and quality of the wafers. The multi-stage filtering system can ensure that the impurities in the solution are effectively removed, reduce the pollution and damage of the impurities to the wafer surface, and thus improve the yield rate and production efficiency of the wafers. Meanwhile, the long service life and low maintenance cost of the multi-stage filtering system also reduce the operation cost and maintenance difficulty of the wet processing equipment.

[0078] The multi-stage filtering wafer tank device and the wet processing equipment are described in detail above. According to the ideas of the embodiments of the application, the specific implementation manners and application ranges can be changed by those skilled in the art. In conclusion, the content of the specification should not be understood as a limitation of the application.

Claims

1. A multi-stage filtration wafer cell device, characterized in that, Includes the tank body (1) and the circulating filter assembly; The circulating filtration assembly includes a circulating pipeline (2), a first filter (3), a second filter (4), and a power pump (5); The input and output ends of the circulation pipeline (2) are respectively connected to the tank body (1); The first filter (3), the second filter (4) and the power pump (5) are installed in the circulation pipeline (2); The first filter (3) and the second filter (4) are arranged sequentially from the input end to the output end along the circulation pipeline (2); The first filter (3) is provided with a sedimentation chamber (311) and a floating chamber (312) connected to the sedimentation chamber (311). The first filter inlet of the first filter (3) is connected to the sedimentation chamber (311), and its height is lower than the height of the connection position between the sedimentation chamber (311) and the floating chamber (312); The first filter outlet of the first filter (3) is connected to the floating cavity (312), and its height is lower than the height of the connection position between the sedimentation cavity (311) and the floating cavity (312).

2. The multi-stage filtration wafer trough device according to claim 1, characterized in that, A collection net (33) for collecting sediments is installed inside the sedimentation chamber (311) below the first filter inlet.

3. The multi-stage filtration wafer trough device according to claim 2, characterized in that, The floating cavity (312) is equipped with a filter screen (34) for filtering floating objects. The height of the first filter outlet is lower than the height of the filter screen (34).

4. The multi-stage filtration wafer trough device according to claim 3, characterized in that, The collecting net (33) and / or the filter net (34) are of the trough type.

5. The multi-stage filtration wafer trough device according to claim 3, characterized in that, The collecting net (33) is provided with a first lifting lug; The filter screen (34) is provided with a second lug.

6. The multi-stage filtration wafer trough device according to claim 3, characterized in that, The floating cavity (312) has a support structure (35) on its side wall for supporting the filter screen (34).

7. The multi-stage filtration wafer trough device according to claim 6, characterized in that, The supporting structure (35) is a protruding block; The filter screen (34) is provided with a slot into which the protrusion can be inserted.

8. The multi-stage filtration wafer tank device according to claim 1, characterized in that, The first filter (3) includes a housing (31) and a housing cover (32); The top of the box (31) is provided with an opening; The box cover (32) is detachably fitted onto the opening; The box (31) is equipped with a partition (36); The partition (36) divides the chamber inside the box (31) into the sedimentation chamber (311) and the floating chamber (312). The top of the partition (36) is lower than the top of the box (31), and a communication gap is formed between the partition (36) and the top of the box (31); The deposition chamber (311) and the floating chamber (312) are connected through the communication gap.

9. The multi-stage filtration wafer tank device according to claim 1, characterized in that, The circulating filter assembly also includes a buffer tank (6). The buffer tank (6) is installed in the circulation pipeline (2) and is located between the first filter (3) and the second filter (4).

10. The multi-stage filtration wafer trough device according to claim 1, characterized in that, The tank body (1) includes an inner tank body (11) and an overflow tank (12); The overflow trough (12) is fitted onto the outer circumferential surface of the inner tank (11) to receive the solution overflowing from the top of the inner tank (11).

11. The multi-stage filtration wafer trough device according to claim 10, characterized in that, The top of the overflow trough (12) is higher than the top of the inner tank (11).

12. The multi-stage filtration wafer trough device according to claim 10, characterized in that, The input end of the circulation pipeline (2) is connected to the overflow tank (12) and / or the inner tank (11); The output end of the circulation pipeline (2) is connected to the inner tank (11).

13. The multi-stage filtration wafer tank device according to claim 1, characterized in that, The second filter (4) is a capsule filter.

14. A wet process equipment, characterized in that, Includes the multi-stage filtration wafer cell device as described in any one of claims 1 to 13.

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