Liquid medicine heating device capable of rapidly raising temperature

Abstract

The utility model discloses a liquid medicine heating device with a rapid temperature rise function. The liquid medicine heating device comprises a liquid medicine conveying device, a first heating assembly and a second heating assembly. The liquid medicine conveying device is arranged outside a cleaning cavity of the cleaning device, a conveying terminal of the liquid medicine conveying device is communicated with a nozzle in the cleaning cavity, and the liquid medicine conveying device comprises a liquid medicine box; a liquid feeding pipeline is led out of the liquid medicine box, and a liquid feeding pump, a plurality of pneumatic control valves, a plurality of hand valves and a liquid medicine temperature sensor are sequentially distributed on the liquid feeding pipeline; the first heating assembly is arranged in the liquid medicine box; the second heating assembly is arranged at the terminal end of the liquid feeding pipeline and located in the cleaning cavity. The second heating assembly located in the cleaning cavity is additionally arranged, and the second heating assembly is close to the liquid medicine nozzle outlet of the terminal in the cleaning cavity, so that the temperature loss is small, and the heating efficiency is high; and secondly, a double quartz tube is additionally arranged outside the thermal quartz tube in the second heating assembly, so that the falling danger caused by heating and corrosion of the nano coating and the heating coil is avoided.

Description

TECHNICAL FIELD

[0001] The utility model relates to a kind of chemical liquid heating devices, especially a kind of chemical liquid heating device for wafer high-temperature cleaning etching equipment of rapid temperature rise. BACKGROUND

[0002] Wafer needs to pass through multiple processes in production process, and cleaning etching is carried out on wafer as an important process, and currently, high-temperature chemical liquid wafer is used for cleaning etching when wafer is cleaned and etched.

[0003] Currently, wafer high-temperature cleaning etching chemical liquid temperature has higher requirement, temperature can affect etching rate, surface uniformity, etc., to ensure that chemical liquid temperature can reach the desired temperature immediately, efficient heating device needs to be used, and currently, quartz coating heating device is added outside cavity space for secondary temperature rise, but it is found in actual use that due to the long distance of chemical liquid transmission, temperature loss is large, temperature control is not rapid, and temperature rise is slow, which cannot meet use demand. UTILITY MODEL CONTENT

[0004] The utility model aims at overcoming the insufficient of prior art and provides a kind of chemical liquid heating device of rapid temperature rise, and chemical liquid temperature rise is rapid and accurate.

[0005] To achieve the above-mentioned purpose, the technical scheme adopted by the utility model is as follows: a kind of chemical liquid heating device of rapid temperature rise, including chemical liquid transmission device, first heating component and second heating component;

[0006] The chemical liquid transmission device is arranged outside the cleaning cavity of the cleaning device, and the transmission terminal of the chemical liquid transmission device is communicated with the nozzle in the cleaning cavity, and the chemical liquid transmission device includes chemical liquid tank;Liquid delivery pipeline is led out in the chemical liquid tank, and liquid delivery pump, multiple air control valves, multiple hand valves and chemical liquid temperature sensor are sequentially distributed on the liquid delivery pipeline and connected with the chemical liquid in the chemical liquid tank;

[0007] First heating component is arranged in the chemical liquid tank to heat the chemical liquid in the chemical liquid tank;

[0008] Second heating component is arranged at the terminal of the liquid delivery pipeline, and the second heating component is located in the cleaning cavity to heat the chemical liquid heated by the first heating component for the second time.

[0009] In an embodiment, the first heating component includes a heating rod arranged in the chemical liquid tank, and a first temperature sensor is further arranged in the chemical liquid tank.

[0010] In an embodiment, the second heating assembly comprises a heating quartz tube; a nano coating is arranged on the heating quartz tube; a heating coil is arranged on the nano coating; a double quartz tube is further arranged outside the heating quartz tube; one end of the double quartz tube is communicated with the nitrogen filling part, and the other end is connected with an external power source through a cable leading out from the heating coil, wherein the cable is led out from the double quartz tube through a quartz seal.

[0011] In an embodiment, the nitrogen filling part comprises a nitrogen pipeline communicated with nitrogen, and a nitrogen hand valve, a nitrogen pressure reducing valve, a nitrogen pressure gauge, a nitrogen electromagnetic valve and a nitrogen flow meter are sequentially arranged on the nitrogen pipeline; an overflow valve is further connected in parallel with the nitrogen flow meter at the front end of the nitrogen pipeline; and a monitoring pressure gauge is arranged at the front end of the nitrogen flow meter and the overflow valve.

[0012] In an embodiment, a second temperature sensor is further arranged at the rear end of the second heating assembly on the liquid feeding pipeline.

[0013] Thanks to the above technical scheme, the present application has the following advantages compared with the prior art:

[0014] The liquid heating device with rapid temperature rising of the present application adds a second heating assembly on the liquid feeding channel, and the second heating assembly is arranged inside the cleaning cavity, so that the second heating assembly is closer to the liquid nozzle outlet at the terminal end of the cleaning cavity, the temperature loss is small, and the temperature rising efficiency is high; in addition, a double quartz tube is arranged outside the hot quartz tube in the second heating assembly, so that the falling risk of the nano coating and the heating coil caused by heating and corrosion is avoided. BRIEF DESCRIPTION OF DRAWINGS

[0015] The technical scheme of the present application will be further described below with reference to the drawings:

[0016] Fig. 1 Fig. 1 is a structural schematic view of an embodiment of the present application;

[0017] Fig. 2 Fig. 2 is a structural schematic view of a nitrogen filling part in an embodiment of the present application;

[0018] Fig. 3 Fig. 3 is a structural schematic view of a second heating assembly in an embodiment of the present application.

[0019] Wherein: 1, liquid medicine transmission device;2, first heating assembly;3;Second heating assembly;4, cleaning cavity outside;10, liquid medicine tank;11, liquid delivery pipeline;12, liquid delivery pump;13, pneumatic valve;14, hand valve;15, liquid medicine temperature sensor;16, second temperature sensor;20, heating rod;21, first temperature sensor;30, heating quartz tube;31, nano coating;32, heating coil;33, double quartz tube;34, nitrogen filling part;35, cable;36, quartz;340, nitrogen pipeline;341, nitrogen hand valve;342, nitrogen pressure reducing valve;343, nitrogen pressure gauge;344, nitrogen solenoid valve;345, nitrogen flow meter;346, overflow valve;347, monitoring pressure gauge. DETAILED DESCRIPTION

[0020] In order to make the person skilled in the art better understand the scheme of the present application, the technical scheme in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by the person skilled in the art without creative labor should belong to the scope of protection of the present application.

[0021] The utility model provides a kind of liquid medicine heating device of rapid heating to solve the problem of poor heating effect and inaccurate heating in wafer high-temperature cleaning etching equipment in prior art.

[0022] For the convenience of understanding, the specific process in the embodiments of the present application will be described below, please refer to Figs. 1-2 The liquid medicine heating device of rapid heating in the embodiments of the present application includes liquid medicine transmission device 1, first heating assembly 2 and second heating assembly 3;The liquid medicine transmission device 1 is arranged outside the cleaning cavity 4 of the cleaning device, and the transmission terminal of the liquid medicine transmission device is communicated with the nozzle in the cleaning cavity, and the liquid medicine transmission device includes liquid medicine tank 10;Liquid delivery pipeline 11 is led out in the liquid medicine tank, and liquid delivery pipeline 11 is sequentially distributed with liquid delivery pump 12, multiple pneumatic valves 13, multiple hand valves 14 and liquid medicine temperature sensor 15 connected with the liquid in the liquid medicine tank;First heating assembly 2 is arranged in the liquid medicine tank 10 to heat the liquid in the liquid medicine tank;Second heating assembly 3 is arranged at the terminal of the liquid delivery pipeline 11, and the second heating assembly 3 is located in the cleaning cavity 4 to heat the liquid heated by the first heating assembly 2.

[0023] The liquid medicine of the utility model is heated twice, the heating speed of liquid medicine is fast, and at the same time, the second heating assembly 3 is located in the cleaning cavity 4, at the terminal corresponding to the nozzle in the cleaning cavity 4, so that the temperature loss of the heated liquid medicine is less, and the liquid medicine temperature rises rapidly and accurately.

[0024] In an embodiment, the first heating assembly comprises a heating rod 20 arranged in the chemical liquid tank, and a first temperature sensor 21 is arranged in the chemical liquid tank. The chemical liquid in the chemical liquid tank 10 is heated by the heating rod 20, and the real-time monitoring of the chemical liquid temperature is performed by the first temperature sensor 21, so that the related information of the chemical liquid temperature can be understood in time.

[0025] In an embodiment, the second heating assembly 3 comprises a heating quartz tube 30, the heating quartz tube is provided with a nano coating 31, the nano coating is provided with a heating coil 32, the heating quartz tube is further sleeved with a double quartz tube 33, one end of the double quartz tube is communicated with the nitrogen filling part 34, and the other end is connected with an external power source through a heating coil lead cable 35, wherein the lead cable 35 is sealed by a quartz 36 at the position where the lead cable 35 passes through the double quartz tube.

[0026] Specifically, the second heating assembly 3 is arranged in the inside of the cleaning cavity 4, so that the distance from the nozzle is short, thereby reducing the temperature loss of the high-temperature chemical liquid during transmission, ensuring that the temperature of the heated chemical liquid is high, and meeting the actual use requirements. At the same time, in order to avoid the risk of falling of the nano coating 31 and the heating coil 32 due to corrosion by the chemical liquid, corrosive gas and the like, a double quartz tube 33 is further arranged outside the heating quartz tube 30, thereby improving the heat resistance, and avoiding the falling of the nano coating 31 or the corrosion of the heating coil 32, thereby avoiding failure.

[0027] In an embodiment, the nitrogen filling part 34 comprises a nitrogen pipeline 340 communicated with nitrogen, the nitrogen pipeline 340 is sequentially provided with a nitrogen hand valve 341, a nitrogen pressure reducing valve 342, a nitrogen pressure gauge 343, a nitrogen electromagnetic valve 344 and a nitrogen flowmeter 345, and a overflow valve 346 is connected in parallel with the front end of the nitrogen flowmeter 345; a monitoring pressure gauge 347 is arranged at the front end of the nitrogen flowmeter 345 and the overflow valve 346 connected in parallel.

[0028] The nitrogen filling part 34 in the embodiment fills nitrogen into the interlayer of the double quartz tube 33 and the heating quartz tube 30, so that the heating quartz tube 30 is in an anaerobic environment, thereby preventing the heating coil 32 and the electrode from being oxidized and corroded.

[0029] Secondly, if it is necessary to detect whether the joint and the like are leaked, a certain pressure of nitrogen can be filled periodically, the nitrogen electromagnetic valve 344 is closed, and pressure maintaining test is performed. If the pressure P2 detected by the monitoring pressure gauge 347 does not decrease, it indicates safety; if the pressure P2 detected by the monitoring pressure gauge 347 decreases obviously, it indicates leakage, and the machine needs to be stopped for inspection.

[0030] In addition, when starting, the interlayer between the double quartz tube 33 and the heating quartz tube 30 is filled with normal-temperature nitrogen of a constant pressure, the nitrogen electromagnetic valve 344 is closed, the nitrogen expands with the heating of the heater during the pressure maintaining, the pressure of the quartz interlayer is increased, the nitrogen is released by the overflow valve 346, the safety and the constant pressure are ensured.

[0031] In an embodiment, the liquid delivery pipeline is provided with a second temperature sensor 16 at the rear end of the second heating assembly, and the real-time temperature of the liquid is detected by the second temperature sensor 16, so that the temperature of the liquid transferred to the wafer can be well controlled.

[0032] In conclusion, the liquid heating device with rapid heating can heat the liquid through twice heating, the heating is rapid, the secondary heating is closer to the liquid nozzle outlet at the terminal, the heating efficiency is high, the temperature loss is small, and the actual use requirement is met.

[0033] The above-described embodiments are only used to illustrate the technical solutions of the present application, rather than limit them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions recorded in the foregoing embodiments can be modified, or some technical features can be replaced equivalently; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments.

Claims

1. A pharmaceutical liquid heating device capable of rapid temperature increase, characterized by: The utility model relates to a cleaning device, which comprises a liquid delivery device (1), a first heating assembly (2) and a second heating assembly (3). The liquid delivery device (1) is arranged outside a cleaning cavity (4) of the cleaning device, and a delivery terminal of the liquid delivery device (1) is communicated with a nozzle in the cleaning cavity; the liquid delivery device (1) comprises a liquid tank (10); a liquid delivery pipeline (11) is led out from the liquid tank (10); a liquid delivery pump (12), a plurality of air control valves (13), a plurality of hand valves (14) and a liquid temperature sensor (15) are sequentially arranged on the liquid delivery pipeline (11) and connected with liquid in the liquid tank (10); The first heating assembly (2) is arranged in the liquid tank (10) and used for heating liquid in the liquid tank (10); The second heating assembly (3) is arranged at a terminal of the liquid delivery pipeline (11) and located in the cleaning cavity, and used for secondary heating of the liquid heated by the first heating assembly (2).

2. The rapid-warming chemical liquid heating device according to claim 1, wherein: The first heating assembly (2) comprises a heating rod (20) arranged in the liquid tank (10), and a first temperature sensor (21) is further arranged in the liquid tank (10).

3. The rapid-warming chemical liquid heating device according to claim 1, wherein: The second heating assembly (3) comprises a heating quartz tube (30); a nano coating (31) is arranged on the heating quartz tube (30); a heating coil (32) is arranged on the nano coating (31); a double quartz tube (33) is further sleeved on the heating quartz tube (30); one end of the double quartz tube (33) is communicated with a nitrogen filling part (34), and the other end leads out a cable (35) from the heating coil (32) and connected with an external power supply; the cable (35) is sealed by quartz (36) at a position where the cable (35) passes through the double quartz tube (33).

4. The rapid-warming chemical liquid heating device according to claim 3, wherein: The nitrogen filling part (34) comprises a nitrogen pipeline (340) communicated with nitrogen; a nitrogen hand valve (341), a nitrogen pressure reducing valve (342), a nitrogen pressure gauge (343), a nitrogen electromagnetic valve (344) and a nitrogen flow meter (345) are sequentially arranged on the nitrogen pipeline (340); a front end of the nitrogen flow meter (345) is further connected with an overflow valve (346) in parallel; a monitoring pressure gauge (347) is arranged at a position before the nitrogen flow meter (345) and the overflow valve (346) in parallel.

5. The rapid-warming chemical liquid heating device according to claim 1, wherein: A second temperature sensor (16) is further arranged at a rear end of the second heating assembly (3) on the liquid delivery pipeline (11).

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