Red light polarization filter applied to high-power laser

Abstract

The utility model discloses a polarization filter with red light applied to high-power laser, which is characterized by comprising a substrate layer positioned in the middle, a main film structure layer arranged at the upper part of the substrate layer, and a secondary film structure layer arranged at the lower part of the substrate layer, the main film structure layer comprises 74 layers of high-refractive-index film structures and low-refractive-index film structures which are alternately overlapped outwards along one side close to the substrate layer, and the secondary film structure layer comprises 6 layers of high-refractive-index film structures and low-refractive-index film structures which are alternately overlapped outwards along one side close to the substrate layer. The polarization filter with the red light can achieve high transmittance of natural light in a working wave band of 635 + / -10nm, achieve high transmittance of P polarized light in a working wave band of 915 + / -10nm, and achieve high reflectivity of S polarized light in the working wave band of 915 + / -10nm.

Description

Technical Field

[0001] This utility model relates to the field of manufacturing red-polarized filters, specifically to a red-polarized filter used in high-power lasers. Background Technology

[0002] A laser polarizer is an optical element used to control the polarization state of a laser beam. It can selectively allow or block laser beams with a specific polarization direction and is widely used in laser systems, optical experiments, display technology, and other fields.

[0003] Polarizers work based on the polarization properties of light, allowing only light with a specific polarization direction to pass through while blocking light from other directions. Common types of polarizers include linear polarizers and circular polarizers.

[0004] High-energy lasers are applicable to a variety of fields, making it crucial to develop a red-polarized filter suitable for high-energy, high-power lasers. Utility Model Content

[0005] In order to overcome the above-mentioned defects of the prior art, the purpose of this utility model is to provide a red-polarized filter for use in high-power lasers.

[0006] A red-polarized filter for use in high-power lasers, comprising:

[0007] The base layer is located in the middle, and the main membrane structure layer is disposed on the upper part of the base layer.

[0008] A sub-membrane structure layer is provided at the lower part of the substrate layer;

[0009] The main film structure layer consists of 74 layers of alternating high-refractive-index and low-refractive-index film structures stacked outwards from the side closest to the substrate layer.

[0010] The main membrane structure layer is as follows:

[0011] Base layer / 132.41 nmH, 215.1 nmH, 175.66 nmH, 280.66 nmH, 120.68 nmH, 168.89 nmH, 102.79 nmH, 160.46 nmH, 92.79 nmH, 134.56 nmH, 97.89 nmH, 153.79 nmH, 97.24 nmH, 155.4 nmH, 96.44 nmH, 157.07 nmH, 98.36 nmH, 162.02 nmH, 103.03 nmH, 163.12 nmH, 98.85 nmH, 156.42 nmH, 96.44 nmH, 155.87 nmH, 96.94 nmH

[0012] 156.97nmL, 97.59nmH, 157.74nmL, 98.32nmH, 159.72nmL, 100.22nmH, 161.9nmL, 99.89nmH, 158.96nmL, 97.53nmH, 156.52nmL, 97.09nmH, 157 .3nmL, 98.38nmH, 159.16nmL, 98.94nmH, 159.46nmL, 99.08nmH, 160.04nmL, 99.57nmH, 159.39nmL, 98.07nmH, 156.82nmL, 96.61nmH, 155.9nm L, 96.88nmH, 157.44nmL, 99.19nmH, 160.98nmL, 100.43nmH, 160.43nmL, 98.87nmH, 159.2nmL, 98.25nmH, 157.85nmL, 97.32nmH, 152.29nmL, 9 3.13nmH, 141.28nmH, 94.33nmH, 162.7nmL, 101.07nmH, 164.06nmL, 112.31nmH, 292.7nmL, 190.72nmH, 182.59nmL, 149.41nmH, 225.26nmL / air;

[0013] The sub-film structure layer consists of six alternating layers of high-refractive-index and low-refractive-index film structures stacked outwards from the side closest to the substrate layer.

[0014] The submembrane structure layer is:

[0015] Base layer / 23.76 nmH, 60.6 nmH, 86.87 nmH, 23.3 nmH, 72.75 nmH, 160.33 nmH / air;

[0016] Where H represents a high refractive index film structure, L represents a low refractive index film structure, and the nanometers before H and L represent the thickness of the corresponding film structure.

[0017] In a preferred embodiment of this invention, the working wavelength of the red-polarized filter is 625-925nm.

[0018] In a preferred embodiment of this utility model, the working wavelength of the red-light polarizing filter is 635±10nm and 915±10nm, and the natural light achieves a high transmittance T>98% under the working wavelength of 635±10nm.

[0019] High transmittance Tp>99% was achieved for P-polarized light in the working wavelength band of 915±10nm.

[0020] High reflectivity Rs>99% is achieved for S-polarized light in the working wavelength band of 915±10nm.

[0021] In a preferred embodiment of this utility model, the high refractive index film structure is made of tantalum pentoxide (Ta2O5).

[0022] In a preferred embodiment of this utility model, the low refractive index film structure is made of silicon dioxide (SiO2).

[0023] In a preferred embodiment of this utility model, the base layer is made of quartz, preferably Hertz 313 quartz.

[0024] The beneficial effects of this utility model are as follows:

[0025] The red-polarized filter of this invention can achieve high transmittance of natural light in the working wavelength range of 635±10nm, high transmittance of P-polarized light in the working wavelength range of 915±10nm, and high reflectance of S-polarized light in the working wavelength range of 915±10nm. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the structure of this utility model.

[0027] Figure 2 This is a schematic diagram illustrating the effect of an embodiment of the present invention. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. However, it should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit its scope. Furthermore, in the following descriptions, well-known structures and technologies have been omitted to avoid unnecessary confusion regarding the concept of this utility model.

[0029] In the description of this utility model, it should be noted that the terms "upper," "lower," "inner," "outer," "top / bottom," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description. They do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0030] like Figure 1 Or, as shown in Figure 2, a red-polarized filter for high-power lasers includes a substrate layer 100 located in the middle, and a main film structure layer 200 disposed on the upper part of the substrate layer 100.

[0031] A secondary film structure layer 300 is disposed below the substrate layer 100. The main film structure layer 200 consists of 74 layers of alternating high-refractive-index and low-refractive-index film structures stacked outwards from the side closest to the substrate layer 100. The high-refractive-index film structure is made of tantalum pentoxide (Ta2O5), and the low-refractive-index film structure is made of silicon dioxide (SiO2). The substrate layer 100 is made of quartz, specifically Hellmann 313 quartz in this embodiment.

[0032] The main membrane structure layer 200 is specifically as follows:

[0033] Base layer / 132.41nmH, 215.1nmmL, 175.66nmH, 280.66nmmL, 120.68nmH

[0034] 168.89nmL, 102.79nmH, 160.46nmL, 92.79nmH, 134.56nmL, 97.89nmH, 153.79nmL, 97.24nmH, 155.4nmL, 96.44 nmH, 157.07nmL, 98.36nmH, 162.02nmL, 103.03nmH, 163.12nmL, 98.85nmH, 156.42nmL, 96.44nmH, 155.87nmL,

[0035] 96.94nmH, 156.97nmL, 97.59nmH, 157.74nmL, 98.32nmH, 159.72nmL, 100.22nmH, 161.9nmL, 99.89nmH, 158.96nmL, 97.53nmH, 156.52nmL, 97.09 nmH、157.3nmL、98.38nmH、159.16nmL、98.94nmH、159.46nmL、99.08nmH、160.04nmL、99.57nmH、159.39nmL、98.07nmH、156.82nmL、96.61nmH、155 0.9 nmL, 96.88 nmH, 157.44 nmL, 99.19 nmH, 160.98 nmL, 100.43 nmH, 160.43 nmL, 98.87 nmH, 159.2 nmL, 98.25 nmH, 157.85 nmL, 97.32 nmH, 152.29 nmL, 93.13 nmH, 141.28 nmL, 94.33 nmH, 162.7 nmL, 101.07 nmH, 164.06 nmL, 112.31 nmH, 292.7 nmL, 190.72 nmH, 182.59 nmL, 149.41 nmH, 225.26 nmL / air.

[0036] The secondary film structure layer 300 consists of six layers of alternating high-refractive-index and low-refractive-index film structures stacked outwards along one side closest to the substrate layer.

[0037] The secondary membrane structure layer 300 is:

[0038] Substrate layer / 23.76 nmH, 60.6 nmL, 86.87 nmH, 23.3 nmL, 72.75 nmH, 160.33 nmL / air. H represents a high refractive index film structure, L represents a low refractive index film structure, and the nanometers before H and L represent the thickness of the corresponding film structure.

[0039] The operating wavelength of the red polarizing filter is 625-925nm.

[0040] Specifically, the red-polarized filter operates at wavelengths of 635±10nm and 915±10nm. At 635±10nm, it achieves high transmittance (T>98%) for natural light. At 915±10nm, it achieves high transmittance (Tp>99%) for P-polarized light. At 915±10nm, it achieves high reflectance (Rs>99%) for S-polarized light.

[0041] The red-light polarizing filter of this invention is suitable for high-energy lasers. The quartz-based material has a low coefficient of thermal expansion, few impurities, heat resistance, moisture resistance and chemical stability.

[0042] The transmittance efficiency of the red-polarized filter of this invention for specific polarized light.

[0043] The extinction ratio of the red-light polarizing filter of this invention is 1000:1. The higher the extinction ratio, the better the performance, as it represents the ratio of the intensity of light passing through the polarizer to the intensity of the blocked light.

[0044] The damage threshold of the red-polarized filter of this invention is 15 J / cm. 2 .

[0045] The damage threshold refers to the maximum laser power that the polarizer can withstand, approximately 6000W.

[0046] This invention also has a functional application in the 635nm red light band, and can be used for low energy indication.

[0047] Laser beam combining is achieved by reflecting and transmitting lasers of different wavelengths.

[0048] The substrate of this invention uses Herringbone 313 quartz, which has the characteristics of low expansion coefficient, few impurities, high heat resistance, moisture resistance and excellent chemical stability, making it suitable for high-energy lasers.

[0049] The above shows and describes the basic principles, main features, and advantages of this utility model.

[0050] Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope. All such changes and modifications fall within the scope of this utility model as defined by the appended claims and their equivalents.

Claims

1. A red light polarizing filter for use with high power lasers, characterized in that, It comprises: a base layer in the middle, a main film structure layer is arranged on the upper part of the base layer, a secondary film structure layer is arranged on the lower part of the base layer; the main film structure layer is 74 layers of high refractive index film structure and low refractive index film structure which are alternately stacked outward along the side close to the base layer, the main film structure layer is as follows: Base layer / 132.41nmH, 215.1nmL, 175.66nmH, 280.66nmL, 120.68nmH, 168.89nmL, 102.79nmH, 160.46nmL, 92.79nmH, 134.56nmL, 97.89nmH, 153.79nmL, 97.24nmH, 155.4nmL, 96.44nmH, 157.07nmL, 98.36nmH, 162.02nmL, 103.03nmH, 163.12nmL, 98.85nmH, 156.42nmL, 96.44nmH, 155.87nmL, 96.94nmH, 156.97nmL, 97.59nmH, 157.74nmL, 98.32nmH, 159.72nmL, 100.22nmH, 161.9nmL, 99.89nmH, 158.96nmL, 97.53nmH, 156.52nmL, 97.09nmH, 157.3nmL, 98.38nmH, 159.16nmL, 98.94nmH, 159.46nmL, 99.08nmH, 160.04nmL, 99.57nmH, 159.39nmL, 98.07nmH, 156.82nmL, 96.61nmH, 155.9nmL, 96.88nmH, 157.44nmL, 99.19nmH, 160.98nmL, 100.43nmH, 160.43nmL, 98.87nmH, 159.2nmL, 98.25nmH, 157.85nmL, 97.32nmH, 152.29nmL, 93.13nmH, 141.28nmL, 94.33nmH, 162.7nmL, 101.07nmH, 164.06nmL, 112.31nmH, 292.7nmL, 190.72nmH, 182.59nmL, 149.41nmH, 225.26nmL / Air; the secondary film structure layer is 6 layers of high refractive index film structure and low refractive index film structure which are alternately stacked outward along the side close to the base layer, the secondary film structure layer is: Base layer / 23.76nmH, 60.6nmL, 86.87nmH, 23.3nmL, 72.75nmH, 160.33nmL / Air; wherein H represents high refractive index film structure, L represents low refractive index film structure, and the nanometer number before H and L is the thickness of the corresponding film structure.

2. A red-pass filter for high power laser as claimed in claim 1, wherein, The working waveband of the red light polarizing filter is 625-925 nm.

3. A red-pass filter for high power laser as recited in claim 1, wherein, The working waveband of the red light polarizing filter is 635±10 nm, 915±10 nm, and the natural light has a high transmittance T>98% at the working waveband of 635±10 nm; The P-polarized light has a high transmittance Tp>99% at the working waveband of 915±10 nm; The S-polarized light has a high reflectivity Rs>99% at the working waveband of 915±10 nm.

4. A red-pass filter for high power laser as recited in claim 1, wherein, The high-refractive-film structure is made of tantalum pentoxide Ta2O5.

5. A red-pass filter for high power laser as recited in claim 1, wherein, The low-refractive-film structure is made of silicon dioxide SIO2.

6. A red-pass filter for high power laser as recited in claim 1, wherein, The base layer is made of quartz.

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