Optical film with gradually-changed transmissivity and optical device

Abstract

The utility model provides an optical film with gradually-changed transmissivity and an optical device, and relates to the technical field of optical elements. The optical film comprises a first light-transmitting film layer to an Nth light-transmitting film layer which are sequentially arranged in a stacked mode, when the wavelength of incident light is in a set wavelength interval, the transmissivity of the optical film is reduced along with increasing of the wavelength of the incident light, and N is an integer larger than or equal to 2. According to the technical scheme, through cooperation of the first light-transmitting film layer to the Nth light-transmitting film layer and when the wavelength of the incident light is in the set wavelength interval, the purpose that the transmittance of the optical film is gradually reduced along with increasing of the wavelength of the incident light can be achieved. Besides, the optical film provided by the utility model can be prepared through the plurality of overlapped light-transmitting thin film layers, the optical film is simple in structure and convenient to prepare, the optical film does not need to be subjected to special shape design, and high uniformity of the appearance of the optical film is ensured.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of optical elements, more particularly, to a transmittance gradient optical film and optical device. BACKGROUND

[0002] The transmittance gradient technology is mainly applied in the design of optical elements, especially in the field of optical elements such as optical filters and optical filters. The prior art changes the transmittance of the film to gradually change in a specific direction or area to achieve a specific optical effect or function. The design of transmittance gradient can optimize the performance of the optical element, such as reducing the dispersion of the optical element, improving the image quality, and enhancing the passing ability of specific wavelengths. Therefore, the optical film with transmittance gradient has become one of the main research projects of researchers today. CONTENT OF THE INVENTION

[0003] Therefore, the present application provides a transmittance gradient optical film and optical device, effectively solving the technical problems existing in the prior art, achieving the purpose of transmittance gradient of the optical film, and the optical film has simple structure and is easy to prepare. The appearance uniformity of the optical film is high.

[0004] To achieve the above purpose, the technical scheme provided by the present application is as follows:

[0005] A transmittance gradient optical film, comprising:

[0006] The first light-transmitting film layer to the Nth light-transmitting film layer are sequentially stacked, wherein when the wavelength of incident light is in a set wavelength interval, the transmittance of the optical film decreases with the increase of the wavelength of the incident light, and N is an integer greater than or equal to 2.

[0007] Optionally, at least one of the first light-transmitting film layer to the Nth light-transmitting film layer is a SiO2 light-transmitting film layer;

[0008] And at least one of the first light-transmitting film layer to the Nth light-transmitting film layer is a TiO2 light-transmitting film layer.

[0009] Optionally, N is 16, and in the first light-transmitting film layer to the sixteenth light-transmitting film layer, the SiO2 light-transmitting film layer and the TiO2 light-transmitting film layer are alternately stacked;

[0010] Among them, the first light-transmitting film layer, the third light-transmitting film layer, the fifth light-transmitting film layer, the seventh light-transmitting film layer, the ninth light-transmitting film layer, the eleventh light-transmitting film layer, the thirteenth light-transmitting film layer and the fifteenth light-transmitting film layer are the SiO2 light-transmitting film layer;

[0011] and the second, fourth, sixth, eighth, tenth, twelfth, fourteenth and sixteenth light-transmissive thin film layers are the TiO2 light-transmissive thin film layers.

[0012] Optionally, the first light-transmissive thin film layer has a thickness of 87.05 nm;

[0013] the second light-transmissive thin film layer has a thickness of 12.01 nm;

[0014] the third light-transmissive thin film layer has a thickness of 10.23 nm;

[0015] the fourth light-transmissive thin film layer has a thickness of 66.35 nm;

[0016] the fifth light-transmissive thin film layer has a thickness of 92.06 nm;

[0017] the sixth light-transmissive thin film layer has a thickness of 72.92 nm;

[0018] the seventh light-transmissive thin film layer has a thickness of 91.83 nm;

[0019] the eighth light-transmissive thin film layer has a thickness of 59.73 nm;

[0020] the ninth light-transmissive thin film layer has a thickness of 96.77 nm;

[0021] the tenth light-transmissive thin film layer has a thickness of 65.08 nm;

[0022] the eleventh light-transmissive thin film layer has a thickness of 91.3 nm;

[0023] the twelfth light-transmissive thin film layer has a thickness of 55.37 nm;

[0024] the thirteenth light-transmissive thin film layer has a thickness of 88.09 nm;

[0025] the fourteenth light-transmissive thin film layer has a thickness of 55.07 nm;

[0026] the fifteenth light-transmissive thin film layer has a thickness of 91.17 nm;

[0027] and the sixteenth light-transmissive thin film layer has a thickness of 57.3 nm.

[0028] Optionally, the set wavelength range is 400 nm-500 nm;

[0029] wherein the transmittance of the optical film decreases from 99.33% to 4.1% as the wavelength of the incident light increases from 400 nm to 500 nm.

[0030] Based on the same inventive concept, the application also provides an optical device for accessing incident light, the optical device comprising a transmittance-graded optical film, the optical film comprising:

[0031] a first light-transmissive film layer to an Nth light-transmissive film layer arranged in sequence, wherein the transmittance of the optical film decreases with the increase of the wavelength of the incident light when the wavelength of the incident light is in a set wavelength range, and N is an integer greater than or equal to 2.

[0032] Optionally, at least one of the first light-transmissive film layer to the Nth light-transmissive film layer is a SiO2 light-transmissive film layer.

[0033] And at least one of the first light-transmissive film layer to the Nth light-transmissive film layer is a TiO2 light-transmissive film layer.

[0034] Optionally, N is 16, and in the first light-transmissive film layer to the sixteenth light-transmissive film layer, the SiO2 light-transmissive film layer and the TiO2 light-transmissive film layer are arranged in alternation.

[0035] Among them, the first light-transmissive film layer, the third light-transmissive film layer, the fifth light-transmissive film layer, the seventh light-transmissive film layer, the ninth light-transmissive film layer, the eleventh light-transmissive film layer, the thirteenth light-transmissive film layer, and the fifteenth light-transmissive film layer are the SiO2 light-transmissive film layer.

[0036] And the second light-transmissive film layer, the fourth light-transmissive film layer, the sixth light-transmissive film layer, the eighth light-transmissive film layer, the tenth light-transmissive film layer, the twelfth light-transmissive film layer, the fourteenth light-transmissive film layer, and the sixteenth light-transmissive film layer are the TiO2 light-transmissive film layer.

[0037] Optionally, the thickness of the first light-transmissive film layer is 87.05 nanometers.

[0038] The thickness of the second light-transmissive film layer is 12.01 nanometers.

[0039] The thickness of the third light-transmissive film layer is 10.23 nanometers.

[0040] The thickness of the fourth light-transmissive film layer is 66.35 nanometers.

[0041] The thickness of the fifth light-transmissive film layer is 92.06 nanometers.

[0042] The thickness of the sixth light-transmissive film layer is 72.92 nanometers.

[0043] The thickness of the seventh light-transmissive film layer is 91.83 nanometers.

[0044] The thickness of the eighth light-transmissive film layer is 59.73 nanometers.

[0045] the ninth light-transmitting film layer has a thickness of 96.77 nanometers;

[0046] the tenth light-transmitting film layer has a thickness of 65.08 nanometers;

[0047] the eleventh light-transmitting film layer has a thickness of 91.3 nanometers;

[0048] the twelfth light-transmitting film layer has a thickness of 55.37 nanometers;

[0049] the thirteenth light-transmitting film layer has a thickness of 88.09 nanometers;

[0050] the fourteenth light-transmitting film layer has a thickness of 55.07 nanometers;

[0051] the fifteenth light-transmitting film layer has a thickness of 91.17 nanometers;

[0052] and the sixteenth light-transmitting film layer has a thickness of 57.3 nanometers.

[0053] Optionally, the set wavelength range is 400 nanometers-500 nanometers;

[0054] wherein, as the wavelength of the incident light changes from 400 nanometers to 500 nanometers, the transmittance of the optical film decreases from 99.33% to 4.1%.

[0055] Compared with the prior art, the technical solution provided by the application has at least the following advantages:

[0056] The application provides a transmittance-gradually-changing optical film and an optical device. The optical film comprises: first light-transmitting film layers to Nth light-transmitting film layers arranged in sequence, wherein, when the wavelength of incident light is in a set wavelength range, the transmittance of the optical film decreases as the wavelength of the incident light increases, and N is an integer greater than or equal to 2. As known from the foregoing, the technical solution provided by the application can achieve the purpose of gradually decreasing the transmittance of the optical film as the wavelength of the incident light increases, through the cooperation of the first light-transmitting film layers to the Nth light-transmitting film layers, when the wavelength of the incident light is in the set wavelength range. In addition, the optical film provided by the application can be prepared by stacking multiple light-transmitting film layers. The optical film not only has a simple structure and is easy to prepare, but also does not need to be specially shaped, thereby ensuring high uniformity of the appearance of the optical film. BRIEF DESCRIPTION OF DRAWINGS

[0057] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other drawings can be obtained without creative labor based on the provided drawings.

[0058] Figure 1 A structural schematic diagram of a transmittance gradient optical film provided by an embodiment of the present application;

[0059] Figure 2 A structural schematic diagram of another transmittance gradient optical film provided by an embodiment of the present application;

[0060] Figure 3 A corresponding curve diagram of the wavelength of incident light and the transmittance of the optical film provided by an embodiment of the present application. DETAILED DESCRIPTION

[0061] The technical solutions in the embodiments of the present application will be described clearly and completely in the following with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of protection of the present application.

[0062] As described in the background, the transmittance gradient technology is mainly applied in the design of optical elements, especially in the field of optical elements such as optical filters and optical filters. The prior art changes the transmittance of the film to gradually change in a specific direction or area to achieve a specific optical effect or function. The design of transmittance gradient can optimize the performance of the optical element, such as reducing the dispersion of the optical element, improving the image quality, and enhancing the passing ability of specific wavelength light. Therefore, the optical film with transmittance gradient has become one of the main research projects of researchers today. Most of the current gradient optical films are reflected in the appearance color gradient and appearance transmittance gradient of the optical film, and there is no case of appearance invariability and wavelength change with transmittance.

[0063] Based on this, the embodiments of the present application provide a transmittance gradient optical film and an optical device, which effectively solve the technical problems existing in the prior art, achieve the purpose of transmittance gradient of the optical film, and the structure of the optical film is simple and convenient to prepare, and the appearance uniformity of the optical film is high.

[0064] To achieve the above purpose, the technical solutions provided by the embodiments of the present application are as follows, which will be described in detail Figures 1 to 3 The technical solutions provided by the embodiments of the present application will be described in detail.

[0065] Reference Figure 1 As shown in FIG. 1, it is a structural schematic diagram of a transmittance gradient optical film provided by the embodiment of the present application, wherein the transmittance gradient optical film comprises: first light-transmitting film layer 101 to Nth light-transmitting film layer 10n arranged in sequence, wherein the transmittance of the optical film gradually decreases with the increase of the wavelength of the incident light when the wavelength of the incident light is in a set wavelength interval, and N is an integer greater than or equal to 2.

[0066] It can be understood that the technical scheme provided by the embodiment of the present application can realize the purpose of gradually decreasing the transmittance of the optical film with the increase of the wavelength of the incident light through the cooperation of the first light-transmitting film layer 101 to the Nth light-transmitting film layer 10n when the wavelength of the incident light is in a set wavelength interval. In addition, the optical film provided by the embodiment of the present application can be prepared by stacking multiple light-transmitting film layers, and the optical film not only has a simple structure and is easy to prepare, but also does not need to be specially shaped, which ensures the high uniformity of the appearance of the optical film.

[0067] The optical film provided by the embodiment of the present application can be realized by SiO2 and TiO2, that is, at least one of the first light-transmitting film layer 101 to the Nth light-transmitting film layer 10n provided by the embodiment of the present application is a SiO2 light-transmitting film layer; and at least one of the first light-transmitting film layer 101 to the Nth light-transmitting film layer 10n is a TiO2 light-transmitting film layer. For details, refer to Figure 2 As shown in FIG. 1, it is a structural schematic diagram of another transmittance gradient optical film provided by the embodiment of the present application, wherein N provided by the embodiment of the present application is 16, and the SiO2 light-transmitting film layer and the TiO2 light-transmitting film layer are arranged in the first light-transmitting film layer 101 to the sixteenth light-transmitting film layer 1016. The first light-transmitting film layer 101, the third light-transmitting film layer 103, the fifth light-transmitting film layer 105, the seventh light-transmitting film layer 107, the ninth light-transmitting film layer 109, the eleventh light-transmitting film layer 1011, the thirteenth light-transmitting film layer 1013, the fifteenth light-transmitting film layer 1015 are the SiO2 light-transmitting film layer; and the second light-transmitting film layer 102, the fourth light-transmitting film layer 104, the sixth light-transmitting film layer 106, the eighth light-transmitting film layer 108, the tenth light-transmitting film layer 1010, the twelfth light-transmitting film layer 1012, the fourteenth light-transmitting film layer 1014 and the sixteenth light-transmitting film layer 1016 are the TiO2 light-transmitting film layer.

[0068] In some embodiments, the optical film with gradually changing transmittance provided by the embodiments of the present application can be prepared using an optical gradual coating process. The optical gradual coating process is a process for manufacturing optical lenses and optical films, which is a gradual film technology achieved by controlling the deposition rate and film thickness of the material. The optical gradual coating process has wide application in the field of optical element manufacturing and can achieve precise control of refraction and reflection of light, thereby improving the performance of optical elements. The basic principle of the optical gradual coating process is to control light by changing the refractive index and thickness of the optical film layer. In the optical film layer, the refractive index of different materials is different. By depositing thin films of different materials at different positions, the refractive index of light can be gradually changed. When incident light passes through the optical film, the refractive index and reflectivity of light will change, thereby achieving control of light. The advantage of the optical gradual coating process is that it can achieve precise control of light. By adjusting the structure and material of the film layer, precise control of the refractive index and transmittance can be achieved, thereby improving the performance of optical elements. The gradual refractive index film layer can be used to reduce light reflection and improve transmittance. In optical filters, the gradual transmittance film layer can be used to selectively transmit light of different wavelengths. These applications make the optical gradual coating process have wide application prospects in the field of optical element manufacturing.

[0069] The table shows the material and thickness of each light-transmitting film layer in the optical film. When the optical film provided by the embodiments of the present application includes the first light-transmitting film layer 101 to the sixteenth light-transmitting film layer 1016, and the optical film is a SiO2 light-transmitting film layer and a TiO2 light-transmitting film layer alternately stacked film structure, the thickness of the first light-transmitting film layer 101 is 87.05 nanometers; the thickness of the second light-transmitting film layer 102 is 12.01 nanometers; the thickness of the third light-transmitting film layer 103 is 10.23 nanometers; the thickness of the fourth light-transmitting film layer 104 is 66.35 nanometers; the thickness of the fifth light-transmitting film layer 105 is 92.06 nanometers; the thickness of the sixth light-transmitting film layer 106 is 72.92 nanometers; the thickness of the seventh light-transmitting film layer 107 is 91.83 nanometers; the thickness of the eighth light-transmitting film layer 108 is 59.73 nanometers; the thickness of the ninth light-transmitting film layer 109 is 96.77 nanometers; the thickness of the tenth light-transmitting film layer 1010 is 65.08 nanometers; the thickness of the eleventh light-transmitting film layer 1011 is 91.3 nanometers; the thickness of the twelfth light-transmitting film layer 1012 is 55.37 nanometers; the thickness of the thirteenth light-transmitting film layer 1013 is 88.09 nanometers; the thickness of the fourteenth light-transmitting film layer 1014 is 55.07 nanometers; the thickness of the fifteenth light-transmitting film layer 1015 is 91.17 nanometers; and the thickness of the sixteenth light-transmitting film layer 1016 is 57.3 nanometers.

[0070]

[0071] Table 1

[0072] With the optical film shown in Table 1 above, the optical film provided by the embodiments of the present application can achieve the gradual change effect of transmittance in the set wavelength range. In combination with Figure 3 and Table 2, Figure 3 A corresponding curve graph of the wavelength of incident light and the transmittance of the optical film (the abscissa is the wavelength of incident light, and the ordinate is the transmittance of the optical film) is provided by the embodiments of the present application. Table 2 is a corresponding table of the wavelength of incident light and the transmittance of the optical film.

[0073] Wavelength of incident light (unit: nm) Transmittance of optical film (%) 400 99.3509 401 98.6531 402 97.7783 403 96.7806 404 95.7065 405 94.5957 406 93.4788 407 92.3725 408 91.2896 409 90.2365 410 89.2148 411 88.2218 412 87.2525 413 86.2997 414 85.3559 415 84.4133 416 83.4649 417 82.5047 418 81.5286 419 80.5338 420 79.5196 421 78.4868 422 77.4378 423 76.376 424 75.3059 425 74.2321 426 73.1825 427 72.137 428 71.0992 429 70.0721 430 69.058 431 68.0581 432 67.0731 433 66.1025 434 65.1451 435 64.1989 436 63.262 437 62.3342 438 61.4083 439 60.481 440 59.5485 441 58.6077 442 57.6556 443 56.6901 444 55.7094 445 54.7129 446 53.7006 447 52.6733 448 51.6328 449 50.5814 450 49.5222 451 48.4528 452 47.3825 453 46.3154 454 45.2551 455 44.2055 456 43.1695 457 42.1498 458 41.1482 459 40.1658 460 39.2027 461 38.2583 462 37.331 463 36.4181 464 35.5164 465 34.6217 466 33.7293 467 32.8338 468 31.9304 469 31.0152 470 30.0806 471 29.1219 472 28.135 473 27.1172 474 26.0672 475 24.9853 476 23.8776 477 22.745 478 21.5937 479 20.4309 480 19.2652 481 18.1057 482 16.9617 483 15.8424 484 14.756 485 13.7098 486 12.7099 487 11.7621 488 10.8683 489 10.0301 490 9.2481 491 8.5218 492 7.85 493 7.2307 494 6.6613 495 6.1392 496 5.6613 497 5.2246 498 4.8259 499 4.4623 500 4.1308

[0074] Table 2

[0075] As can be seen, the set wavelength range provided by the embodiments of the present application is 400 nanometers-500 nanometers; wherein, as the wavelength of the incident light changes from 400 nanometers to 500 nanometers, the transmittance of the optical film gradually decreases from 99.33% to 4.1%. As shown in Figure 3 The wavelength and transmittance gradient of the optical film provided by the embodiments of the present application is close to a straight line, and the linearity is good.

[0076] Based on the same inventive concept, the embodiments of the present application also provide an optical device, which accesses incident light, and the optical device comprises an optical film with gradually changed transmittance. As shown in Figure 1 The optical film provided by the embodiments of the present application comprises: first light-transmitting film layer 101 to Nth light-transmitting film layer 10n arranged in sequence, wherein, when the wavelength of the incident light is in a set wavelength range, the transmittance of the optical film gradually decreases as the wavelength of the incident light increases, and N is an integer greater than or equal to 2.

[0077] As can be understood, the technical solutions provided by the embodiments of the present application, through the cooperation of the first light-transmitting film layer 101 to the Nth light-transmitting film layer 10n, and when the wavelength of the incident light is in a set wavelength range, the purpose of gradually decreasing the transmittance of the optical film as the wavelength of the incident light increases is achieved. In addition, the optical film provided by the embodiments of the present application can be prepared by stacking multiple light-transmitting film layers. The optical film not only has a simple structure and is easy to prepare, but also does not need to be designed in a special shape, ensuring the high uniformity of the appearance of the optical film.

[0078] The optical film provided by the embodiments of the present application can be realized by SiO2 and TiO2, that is, at least one of the first light-transmitting film layer 101 to the Nth light-transmitting film layer 10n provided by the embodiments of the present application is a SiO2 light-transmitting film layer, and at least one of the first light-transmitting film layer 101 to the Nth light-transmitting film layer 10n provided by the embodiments of the present application is a TiO2 light-transmitting film layer. As shown in Figure 2 The N is 16, and the SiO2 light-transmitting film layer and the TiO2 light-transmitting film layer are alternately and superimposedly arranged in the first light-transmitting film layer 101 to the sixteenth light-transmitting film layer 1016. The first light-transmitting film layer 101, the third light-transmitting film layer 103, the fifth light-transmitting film layer 105, the seventh light-transmitting film layer 107, the ninth light-transmitting film layer 109, the eleventh light-transmitting film layer 1011, the thirteenth light-transmitting film layer 1013, and the fifteenth light-transmitting film layer 1015 are the SiO2 light-transmitting film layers, and the second light-transmitting film layer 102, the fourth light-transmitting film layer 104, the sixth light-transmitting film layer 106, the eighth light-transmitting film layer 108, the tenth light-transmitting film layer 1010, the twelfth light-transmitting film layer 1012, the fourteenth light-transmitting film layer 1014, and the sixteenth light-transmitting film layer 1016 are the TiO2 light-transmitting film layers.

[0079] In some embodiments, the optical device provided by the embodiments of the present application includes a transmittance-graded optical film, which can be prepared by an optical gradual plating process. The optical gradual plating process is a process for manufacturing optical lenses and optical films, which is a gradual film technology that controls the deposition rate and film thickness of materials. The optical gradual plating process has a wide range of applications in the field of optical element manufacturing and can accurately control the refraction and reflection of light, thereby improving the performance of optical elements. The basic principle of the optical gradual plating process is to control light by changing the refractive index and thickness of the optical film layer. In the optical film layer, the refractive index of different materials is different, and by depositing thin films of different materials at different positions, the refractive index of light can be gradually changed. When incident light passes through the optical film, the refractive index and reflectivity of light will change, thereby controlling the light. The advantage of the optical gradual plating process is that it can accurately control the light. By adjusting the structure and material of the film layer, the refractive index and transmittance can be accurately controlled, thereby improving the performance of optical elements. The gradual refractive index film layer can reduce light reflection and improve transmittance. In optical filters, the gradual transmittance film layer can be used to selectively transmit light of different wavelengths. These applications make the optical gradual plating process have a wide range of applications in the field of optical element manufacturing.

[0080] The material and thickness of each light-transmitting film layer in the optical film shown in Table 1. The optical film provided by the embodiments of the present application includes the first light-transmitting film layer 101 to the sixteenth light-transmitting film layer 1016, and the optical film is a film structure in which the SiO2 light-transmitting film layers and the TiO2 light-transmitting film layers are alternately stacked. In this case, the thickness of the first light-transmitting film layer 101 is 87.05 nanometers; the thickness of the second light-transmitting film layer 102 is 12.01 nanometers; the thickness of the third light-transmitting film layer 103 is 10.23 nanometers; the thickness of the fourth light-transmitting film layer 104 is 66.35 nanometers; the thickness of the fifth light-transmitting film layer 105 is 92.06 nanometers; the thickness of the sixth light-transmitting film layer 106 is 72.92 nanometers; the thickness of the seventh light-transmitting film layer 107 is 91.83 nanometers; the thickness of the eighth light-transmitting film layer 108 is 59.73 nanometers; the thickness of the ninth light-transmitting film layer 109 is 96.77 nanometers; the thickness of the tenth light-transmitting film layer 1010 is 65.08 nanometers; the thickness of the eleventh light-transmitting film layer 1011 is 91.3 nanometers; the thickness of the twelfth light-transmitting film layer 1012 is 55.37 nanometers; the thickness of the thirteenth light-transmitting film layer 1013 is 88.09 nanometers; the thickness of the fourteenth light-transmitting film layer 1014 is 55.07 nanometers; the thickness of the fifteenth light-transmitting film layer 1015 is 91.17 nanometers; and the thickness of the sixteenth light-transmitting film layer 1016 is 57.3 nanometers.

[0081] The optical film in the optical device provided by the above embodiments of the present application (the optical film parameters are shown in Table 1) can achieve the gradual change effect of the transmittance in the set wavelength range. In combination with Figure 3 and Table 2, the set wavelength range provided by the embodiments of the present application is 400 nanometers-500 nanometers; wherein, as the wavelength of the incident light changes from 400 nanometers to 500 nanometers, the transmittance of the optical film gradually decreases from 99.33% to 4.1%. As Figure 3 shown, the wavelength and the transmittance gradient of the optical film provided by the embodiments of the present application are close to a straight line, and the linearity is good.

[0082] In summary, the embodiment of the present application provides a transmittance gradually changing optical film and optical device, the optical film comprises: first light-transmitting film layer to Nth light-transmitting film layer arranged in sequence, wherein, when the wavelength of incident light is in a set wavelength interval, the transmittance of the optical film decreases with the wavelength of the incident light increasing, and N is an integer greater than or equal to 2. From the foregoing, the technical scheme provided by the embodiment of the present application can realize the purpose of gradually decreasing the transmittance of the optical film with the wavelength of the incident light increasing through the cooperation of the first light-transmitting film layer to the Nth light-transmitting film layer when the wavelength of the incident light is in a set wavelength interval. In addition, the optical film provided by the embodiment of the present application can be prepared by stacking multiple light-transmitting film layers. The optical film not only has a simple structure and is easy to prepare, but also does not need to be specially shaped, thereby ensuring high uniformity of the appearance of the optical film.

[0083] In the description of the embodiments of the present application, it should be understood that the orientation or positional relationship indicated by terms such as "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the embodiments of the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements indicated thereby must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0084] In addition, the terms "first", "second", etc. are used only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated thereby. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the embodiments of the present application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0085] In the embodiments of the present application, unless otherwise specifically defined and limited, the terms such as "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected or communicate with each other; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise specifically limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0086] In the embodiments of the present application, unless specifically defined and limited otherwise, the first feature is "on" or "under" the second feature can be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature is "over", "above" and "on top of" the second feature can be that the first feature is directly above or obliquely above the second feature, or only indicates that the first feature is higher than the second feature in horizontal height. The first feature is "under", "below" and "underneath" the second feature can be that the first feature is directly below or obliquely below the second feature, or only indicates that the first feature is lower than the second feature in horizontal height.

[0087] In the embodiments of the present application, the terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" as used herein mean that the specific feature, structure, material or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In the specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples. In addition, the skilled person can combine and combine the features of different embodiments or examples and different embodiments or examples described in the specification without contradiction.

[0088] Although the embodiments of the present application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present application, and those skilled in the art can make changes, modifications, replacements and variations to the above embodiments within the scope of the present application.

Claims

1. An optical film with gradually varying transmittance, characterized in that, include: The first to Nth light-transmitting film layers are stacked sequentially, wherein when the wavelength of the incident light is within a set wavelength range, the transmittance of the optical film decreases as the wavelength of the incident light increases, and N is an integer greater than or equal to 2.

2. The optical film with gradually varying transmittance according to claim 1, characterized in that, At least one of the first to the Nth light-transmitting film layers is a SiO2 light-transmitting film layer; Furthermore, at least one of the first to the Nth transparent film layers is a TiO2 transparent film layer.

3. The optical film with gradually varying transmittance according to claim 2, characterized in that, N is 16. In the first to the sixteenth light-transmitting film layers, the SiO2 light-transmitting film layer and the TiO2 light-transmitting film layer are alternately stacked. Wherein, the first light-transmitting film layer, the third light-transmitting film layer, the fifth light-transmitting film layer, the seventh light-transmitting film layer, the ninth light-transmitting film layer, the eleventh light-transmitting film layer, the thirteenth light-transmitting film layer, and the fifteenth light-transmitting film layer are the SiO2 light-transmitting film layers. Furthermore, the second, fourth, sixth, eighth, tenth, twelfth, fourteenth, and sixteenth light-transmitting film layers are the TiO2 light-transmitting film layers.

4. The optical film with gradually varying transmittance according to claim 3, characterized in that, The thickness of the first light-transmitting thin film layer is 87.05 nanometers; The thickness of the second light-transmitting thin film layer is 12.01 nanometers; The thickness of the third light-transmitting thin film layer is 10.23 nanometers; The thickness of the fourth light-transmitting thin film layer is 66.35 nanometers; The thickness of the fifth light-transmitting thin film layer is 92.06 nanometers; The thickness of the sixth transparent film layer is 72.92 nanometers; The thickness of the seventh light-transmitting thin film layer is 91.83 nanometers; The thickness of the eighth light-transmitting thin film layer is 59.73 nanometers; The thickness of the ninth light-transmitting thin film layer is 96.77 nanometers; The thickness of the tenth transparent film layer is 65.08 nanometers; The thickness of the eleventh transparent film layer is 91.3 nanometers; The thickness of the twelfth transparent film layer is 55.37 nanometers; The thickness of the thirteenth transparent film layer is 88.09 nanometers; The thickness of the fourteenth transparent film layer is 55.07 nanometers; The thickness of the fifteenth light-transmitting thin film layer is 91.17 nanometers; Furthermore, the thickness of the sixteenth transparent film layer is 57.3 nanometers.

5. The optical film with gradually varying transmittance according to claim 4, characterized in that, The set wavelength range is 400 nanometers to 500 nanometers; Specifically, as the wavelength of the incident light increases from 400 nanometers to 500 nanometers, the transmittance of the optical film decreases from 99.33% to 4.1%.

6. An optical device, wherein the optical device receives incident light, characterized in that, The optical device includes an optical film with a gradually varying transmittance, the optical film comprising: The first to Nth light-transmitting film layers are stacked sequentially, wherein when the wavelength of the incident light is within a set wavelength range, the transmittance of the optical film decreases as the wavelength of the incident light increases, and N is an integer greater than or equal to 2.

7. The optical device according to claim 6, characterized in that, At least one of the first to the Nth light-transmitting film layers is a SiO2 light-transmitting film layer; Furthermore, at least one of the first to the Nth transparent film layers is a TiO2 transparent film layer.

8. The optical device according to claim 7, characterized in that, N is 16. In the first to the sixteenth light-transmitting film layers, the SiO2 light-transmitting film layer and the TiO2 light-transmitting film layer are alternately stacked. Wherein, the first light-transmitting film layer, the third light-transmitting film layer, the fifth light-transmitting film layer, the seventh light-transmitting film layer, the ninth light-transmitting film layer, the eleventh light-transmitting film layer, the thirteenth light-transmitting film layer, and the fifteenth light-transmitting film layer are the SiO2 light-transmitting film layers. Furthermore, the second, fourth, sixth, eighth, tenth, twelfth, fourteenth, and sixteenth light-transmitting film layers are the TiO2 light-transmitting film layers.

9. The optical device according to claim 8, characterized in that, The thickness of the first light-transmitting thin film layer is 87.05 nanometers; The thickness of the second light-transmitting thin film layer is 12.01 nanometers; The thickness of the third light-transmitting thin film layer is 10.23 nanometers; The thickness of the fourth light-transmitting thin film layer is 66.35 nanometers; The thickness of the fifth light-transmitting thin film layer is 92.06 nanometers; The thickness of the sixth transparent film layer is 72.92 nanometers; The thickness of the seventh light-transmitting thin film layer is 91.83 nanometers; The thickness of the eighth light-transmitting thin film layer is 59.73 nanometers; The thickness of the ninth light-transmitting thin film layer is 96.77 nanometers; The thickness of the tenth transparent film layer is 65.08 nanometers; The thickness of the eleventh transparent film layer is 91.3 nanometers; The thickness of the twelfth transparent film layer is 55.37 nanometers; The thickness of the thirteenth transparent film layer is 88.09 nanometers; The thickness of the fourteenth transparent film layer is 55.07 nanometers; The thickness of the fifteenth light-transmitting thin film layer is 91.17 nanometers; Furthermore, the thickness of the sixteenth transparent film layer is 57.3 nanometers.

10. The optical device according to claim 9, characterized in that, The set wavelength range is 400 nanometers to 500 nanometers; Specifically, as the wavelength of the incident light increases from 400 nanometers to 500 nanometers, the transmittance of the optical film decreases from 99.33% to 4.1%.

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