Auxiliary containing device for photoresist barrel

Abstract

The utility model relates to the technical field of semiconductors, in particular to an auxiliary containing device for a photoresist barrel. Comprising a bottom surface supporting seat and a side surface supporting seat, the bottom surface supporting seat and the side surface supporting seat respectively comprise an inclined surface I and an inclined surface II, the inclined surface I and the inclined surface II are intersected and form an included angle, a space between the inclined surface I and the inclined surface II is used for accommodating a photoresist barrel and enabling the photoresist barrel to incline, and the inclination angle of the photoresist barrel is the same as that of the inclined surface II. By using the device provided by the utility model, the waste of photoresist can be reduced to the maximum extent, and resources are saved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, specifically to an auxiliary container for photoresist buckets. Background Technology

[0002] In chip manufacturing, a process called photoresist coating is required. Currently, this is done by directly drawing photoresist from a tube inside a photoresist container. The tube is inserted directly into the container to extract the photoresist. Since the photoresist container is a cylindrical tube, as... Figure 1 As shown, the tube cannot be placed too close to the bottom wall of the photoresist container when drawing photoresist; otherwise, it will not be able to draw any photoresist. Therefore, a distance of h needs to be reserved at the bottom of the photoresist container. If the tube extends any further down, it will not be able to draw any more photoresist, resulting in a significant waste of photoresist. To address this situation, a solution is urgently needed to reduce the amount of photoresist remaining in the photoresist container. Utility Model Content

[0003] The problem to be solved is to propose a device for placing a photoresist container to reduce the amount of photoresist residue remaining in the container during the coating process.

[0004] To achieve the above objectives, the present invention provides the following technical solution: an auxiliary container for photoresist buckets, comprising a bottom support base and a side support base, wherein the bottom support base and the side support base each comprise an inclined surface one and an inclined surface two, the inclined surface one and the inclined surface two intersect and form an included angle α, the space between the inclined surface one and the inclined surface two is used to accommodate the photoresist bucket and tilt the photoresist bucket to a preset angle, the tilt angle of the photoresist bucket being the same as the tilt angle of the inclined surface two.

[0005] Preferably, the inclined surface is provided with a bottom limiting groove, and the bottom surface of the bottom limiting groove is parallel to the inclined surface.

[0006] Preferably, the inclined surface two is provided with a side limiting groove, which is an arc-shaped groove.

[0007] Preferably, the inclined surface is further provided with a limiting protrusion, which is arc-shaped and detachably connected to the inclined surface.

[0008] Preferably, the second inclined surface is provided with a limiting strip, which is a cuboid structure and is detachably connected to the second inclined surface.

[0009] Preferably, the included angle α between inclined plane one and inclined plane two is 90°.

[0010] Preferably, both the bottom support and the side support are straight prism structures, and the cross-section of the straight prism is a right triangle. The bottom support and the side support are connected to the operating table through a base.

[0011] Compared with the prior art, the present invention provides an auxiliary container for photoresist buckets, which has the following advantages:

[0012] 1. Low cost: It is developed based on the existing process station and does not require the use of new machines.

[0013] 2. Simple operation: Simply place the photoresist bucket on the device.

[0014] 3. Setting a suitable tilt angle for the photoresist container can minimize photoresist waste. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the photoresist bucket involved in the background technology;

[0016] Figure 2 This is a schematic diagram of the structure of the device of this utility model;

[0017] Figure 3 for Figure 2 Diagram of the device in use;

[0018] Figure 4 A schematic diagram of a tilted photoresist tank;

[0019] Figure 5 This is a schematic diagram of another embodiment of the device of this utility model;

[0020] Figure 6 for Figure 5 Diagram of the device in use;

[0021] Explanation of reference numerals in the attached drawings: 1. Photoresist barrel; 11. Barrel bottom; 12. Barrel top; 2. Base; 3. Bottom support seat; 31. Inclined surface one; 32. Barrel bottom limiting groove; 33. Limiting protrusion; 4. Side support seat; 41. Inclined surface two; 42. Side limiting groove; 43. Limiting strip. Detailed Implementation

[0022] The technical solutions of the present utility model will now be described with reference to the accompanying drawings in the embodiments of the present utility model:

[0023] like Figure 1 The diagram shown is a schematic of a photoresist container involved in the background technology. In the prior art, the photoresist container 1 is placed directly on the operating table, and a distance of length h is generally reserved between the bottom of the tube and the bottom of the container 11 to facilitate the absorption of photoresist. This results in excessive residual material and waste. Figure 1 In the medium case, the volume of material wasted, V, in each photoresist bucket is: V = πR 2 h, this would result in significant waste throughout the entire production line. To address the problems mentioned in the background art, this utility model provides an auxiliary holding device for photoresist buckets, such as... Figure 2The device shown includes a bottom support 3 and a side support 4. The bottom support 3 includes a first inclined plane 31, and the side support 4 includes a second inclined plane 41. The first inclined plane 31 and the second inclined plane 41 intersect and form an angle α. The space between the first inclined plane 31 and the second inclined plane 41 is used to accommodate the photoresist bucket 1 and tilt the photoresist bucket 1. The tilt angle of the photoresist bucket 1 is the same as the tilt angle of the second inclined plane 41. The angle between the second inclined plane 41 and the horizontal plane is β. The bottom 11 of the photoresist bucket 1 abuts against the first inclined plane 31, and the side of the photoresist bucket 1 is in close contact with the second inclined plane 41. Thus, the photoresist bucket 1 will tilt after being placed in the space between the first inclined plane 31 and the second inclined plane 41. The tilt angle of the photoresist bucket 1 is the same as β.

[0024] like Figure 2 As shown, to ensure the photoresist container 1 is stably positioned between inclined plane 31 and inclined plane 41, a bottom limiting groove 32 is provided on inclined plane 31. The bottom limiting groove 32 is circular and its bottom surface is parallel to inclined plane 31. The radius of the bottom limiting groove 32 is larger than the radius R of the photoresist container 1, which facilitates the insertion of the bottom 11 into the bottom limiting groove 32. Alternatively, a side limiting groove 42 is provided on inclined plane 41. The side limiting groove 42 is arc-shaped. The side of the photoresist container 1 closest to inclined plane 41 is inserted into the side limiting groove 42. The length of the side limiting groove 42 is greater than the height H of the photoresist container 1, ensuring that the height of the photoresist container 1 is completely covered within the side limiting groove 42, and the top 12 of the container is embedded within the side limiting groove 42. Figure 3 As shown Figure 2 The schematic diagram of the device shows that the photoresist bucket 1 is stably placed between inclined plane 31 and inclined plane 41, which makes it less likely to roll and facilitates the operation of drawing photoresist with a tube.

[0025] Another embodiment may further include a limiting protrusion 33 on the inclined surface 31. The limiting protrusion 33 is arc-shaped and detachably connected to the inclined surface 31. The detachable connection can be achieved by bolts. When the radius of the photoresist tank 1 changes, the limiting protrusion 33 can be moved to be close to the photoresist tank 1 to achieve the desired effect. Figure 6 The tilting effect is shown. Two limiting strips 43 can also be provided at intervals on the second inclined surface 41. The two limiting strips 43 are cuboid structures and are detachably connected to the second inclined surface 41. This detachable connection can be achieved using bolts. The limiting strips 43 fix the side of the photoresist container 1, and the limiting protrusions 33 fix the bottom 11 of the container, thus tilting the photoresist container 1 to a preset angle. For better conformity to the shape of the photoresist container 1, setting the included angle α between the first inclined surface 31 and the second inclined surface 41 to 90° provides the best stability. At this angle, the plane of the bottom 11 is parallel to the first inclined surface 31, the length direction of the photoresist container 1 is parallel to the second inclined surface 41, and the tilt angle of the photoresist container 1 is the same as the tilt angle β of the second inclined surface 41.

[0026] Both the bottom support 3 and the side support 4 are right prism structures with right-angled triangles in cross-section. The bottom support 3 and the side support 4 are connected to the operating table via the base 2. This allows the photoresist tank 1 to be tilted to a preset angle without requiring a complex structure, achieving the desired effect. Figure 4 The tilting effect shown ensures that the reserved liquid level height in the pipe remains h, but the remaining liquid volume V1 << V. For example... Figure 4 h as shown <Hsinβ, Therefore, it can be seen that the device of this utility model can achieve less waste of photoresist. With the device of this utility model, the liquid level height reserved in the tube is still h, but the remaining liquid volume V1 is much smaller than the original volume V, that is, V1 << V, thereby reducing waste.

[0027] In use, simply place the photoresist bucket 1 between inclined plane 31 and inclined plane 41, and within the limiting structure on inclined plane 31 and inclined plane 41, so that the photoresist bucket 1 can be tilted to a preset angle, ensuring that the straw is close to the bottom 11 of the bucket, reducing photoresist residue and saving resources.

[0028] The above embodiments are merely some, not all, of the embodiments of this utility model. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without inventive effort are within the scope of protection of this utility model.

Claims

1. A photoresist barrel auxiliary holding device, characterized by: The application relates to a photoresist barrel supporting device, which comprises a bottom supporting base (3) and a side supporting base (4), the bottom supporting base (3) and the side supporting base (4) respectively comprise an inclined surface one (31) and an inclined surface two (41), the inclined surface one (31) intersects with the inclined surface two (41) and forms an included angle alpha, a space between the inclined surface one (31) and the inclined surface two (41) is used for accommodating the photoresist barrel (1) and making the photoresist barrel (1) be inclined to a preset angle, the angle of the photoresist barrel (1) being inclined is the same as the angle of the inclined surface two (41) being inclined.

2. The photoresist cartridge auxiliary holding device of claim 1, wherein: The inclined surface one (31) is provided with a barrel bottom limiting groove (32), and the bottom surface of the barrel bottom limiting groove (32) is parallel to the inclined surface one (31).

3. The photoresist cartridge auxiliary holding device of claim 2, wherein: The inclined surface two (41) is provided with a side limiting groove (42), and the side limiting groove (42) is an arc-shaped groove.

4. The photoresist cartridge auxiliary holding device of claim 1, wherein: The inclined surface one (31) is further provided with a limiting protrusion (33), the limiting protrusion (33) is arc-shaped and detachably connected with the inclined surface one (31).

5. The photoresist cartridge auxiliary holding device of claim 1, wherein: The inclined surface two (41) is provided with a limiting strip (43), the limiting strip (43) is a cuboid structure and detachably connected with the inclined surface two (41).

6. The photoresist cartridge auxiliary holding device of claim 1, wherein: The included angle alpha between the inclined surface one (31) and the inclined surface two (41) is 90 degrees.

7. The photoresist cartridge auxiliary holding device of claim 1, wherein: The bottom supporting base (3) and the side supporting base (4) are both straight prism structures, the cross section of the straight prism is a right-angled triangle, and the bottom supporting base (3) and the side supporting base (4) are connected with an operation table through a base (2).

Images