Scratch-proof device for PSG blanking bearing base

By designing a sloping structure and a buffer protection mechanism on the PSG unloading bearing base, the problem of scratches caused by height differences during silicon wafer transportation is solved, achieving safe transportation of silicon wafers. The structure is simple and easy to operate.

CN223767952UActive Publication Date: 2026-01-06弘元新材料(徐州)有限公司 +1
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Patent Information

Application Number
CN202423189020.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-24
Publication Date
2026-01-06
Estimated Expiration
2034-12-24

AI Technical Summary

Technical Problem

Existing PSG unloading bearing bases are prone to scratches during silicon wafer transportation, especially at the contact point between the small rollers and the belt transmission, making it difficult to effectively adjust for the vertical jolting and scratching of silicon wafers caused by height differences.

Method used

Design a PSG blanking bearing base, using a sloping structure to replace the original flat surface, and combining it with a buffer protection mechanism, including a rigid spring, damper, buffer cotton and support protection plate, to ensure a safe distance when the silicon wafer comes into contact with the small roller and belt, and avoid scratches.

Benefits of technology

This effectively solves the problem of two-point scratches at fixed positions during the PSG unloading process of silicon wafers, ensuring the safety of the transportation process while maintaining the structural stability and ease of operation of the device.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a PSG blanking bearing base scratch-proof device which comprises a bearing base body, a bearing hole is formed in the bearing base body, a reinforcing rib is integrally formed in the position, located in the bearing hole, of the bearing base body, and an inclined face structure is integrally formed on the surface of the bearing base body. A mounting seat and a positioning pin are positioned at one end of the bearing base main body, a buffer protection mechanism is positioned on the upper surface of the bearing base main body, the buffer protection mechanism comprises a rigid spring, a damper, buffer cotton, a supporting protection plate and a positioning seat, and the rigid spring and the damper are positioned between the bearing base main body and the supporting protection plate; the positioning seats are located at two ends of the damper. According to the scratch-proof device for the PSG blanking bearing base, the fixed base is redesigned, the surface of the fixed base is changed into the inclined surface from the original flat and straight surface, the overall thickness of the base is reduced by 1 mm, and the problem that two point-shaped scratches are generated at the fixed position when a silicon wafer is subjected to PSG blanking is solved.
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Description

Technical Field

[0001] This utility model relates to the field of automated equipment, and in particular to a scratch-resistant device for PSG unloading bearing base. Background Technology

[0002] The PSG unloading bearing base anti-scratch device is a support device for protecting silicon wafers during transportation. The PSG unloading uses a small roller + belt transmission method. During transportation, the PSG unloading bearing base is modified to increase its anti-scratch effect. With the continuous development of technology, people have increasingly higher requirements for the manufacturing process of the PSG unloading bearing base anti-scratch device.

[0003] Existing anti-scratch devices for PSG unloading bearing bases have certain drawbacks. Currently, PSG unloading uses a small roller + belt conveyor method. After the silicon wafer exits the chain conveyor, it first contacts the small roller and then passes through the belt. The fixed base of the single small roller protrudes significantly, making it prone to scratches. To address this issue, the diameter of the small roller is increased so that the silicon wafer is significantly higher than the fixed base when it contacts the small roller. However, the horizontal alignment with the belt cannot be effectively adjusted. Due to the height difference, the silicon wafer bounces up and down, which also easily causes scratches. Therefore, we propose an anti-scratch device for PSG unloading bearing bases. Utility Model Content

[0004] Technical problem solved: In view of the shortcomings of the existing technology, this utility model provides a PSG unloading bearing base anti-scratch device. The fixed base is redesigned, and the surface is changed from the original flat surface to a bevel. The overall thickness of the base is reduced by 1 mm, which solves the problem of two-point scratches on silicon wafers at fixed positions during PSG unloading. It can effectively solve the problems in the background technology.

[0005] Technical Solution: To achieve the above objectives, the technical solution adopted by this utility model is as follows: a PSG unloading bearing base anti-scratch device, comprising a bearing base body, a bearing hole on the bearing base body, a reinforcing rib integrally formed at the bearing hole position on the bearing base body, an inclined structure integrally formed on the surface of the bearing base body, a mounting seat and a positioning pin positioned at one end of the bearing base body, and a buffer protection mechanism positioned on the upper surface of the bearing base body.

[0006] Preferably, the buffer protection mechanism includes a rigid spring, a damper, a buffer cotton, a support protection plate, and a positioning seat. The rigid spring and the damper are located between the bearing base body and the support protection plate. The positioning seat is located at both ends of the damper. The buffer cotton is located on the surface of the support protection plate.

[0007] Preferably, the bearing base body, bearing hole, reinforcing rib, and inclined surface structure are integrally formed by casting.

[0008] Preferably, the bearing base body is fixedly installed by a mounting seat and a positioning pin.

[0009] Preferably, the bearing base body and the buffer protection mechanism are buffered by a rigid spring and a damper, and the damper is installed by a positioning seat.

[0010] Preferably, the support and protective plate is fixed to the cushioning cotton with strong adhesive, and the surface of the support and protective plate is protected by the cushioning cotton.

[0011] Beneficial Effects: Compared with the prior art, this utility model provides a PSG unloading bearing base anti-scratch device with the following beneficial effects: This PSG unloading bearing base anti-scratch device redesigns the fixed base, changing the surface from a flat surface to a slope, and reducing the overall thickness of the base by 1 mm. This solves the problem of two-point scratches on silicon wafers at fixed positions during PSG unloading. Without affecting the stability of the original structure, the overall thickness of the base is reduced, and the flat surface is changed to a slope. When the silicon wafer passes through the small roller and the belt, there is a safe distance between it and the base below, preventing scratches. The entire PSG unloading bearing base anti-scratch device has a simple structure, is easy to operate, and performs better than traditional methods. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the overall structure of a PSG unloading bearing base anti-scratch device according to the present invention.

[0013] Figure 2 This is a top view of the anti-scratch device for PSG blanking bearing base according to this utility model.

[0014] Figure 3 This is a structural schematic diagram of point A in the PSG unloading bearing base anti-scratch device of this utility model.

[0015] In the diagram: 1. Bearing base body; 2. Bearing hole; 3. Reinforcing rib; 4. Sloping structure; 5. Buffer protection mechanism; 6. Mounting seat; 7. Positioning pin; 8. Rigid spring; 9. Damper; 10. Buffer cotton; 11. Support and protection plate; 12. Positioning seat. Detailed Implementation

[0016] The technical solution of this utility model will be clearly and completely described below with reference to the accompanying drawings and specific embodiments. However, those skilled in the art will understand that the embodiments described below are only some embodiments of this utility model, not all embodiments, and are only used to illustrate this utility model, and should not be regarded as limiting the scope of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model. Where specific conditions are not specified in the embodiments, conventional conditions or conditions recommended by the manufacturer shall be followed. Where the manufacturers of reagents or instruments are not specified, they are all conventional products that can be purchased commercially.

[0017] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0018] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0019] like Figure 1-3 As shown, a PSG unloading bearing base anti-scratch device includes a bearing base body 1, a bearing hole 2 on the bearing base body 1, a reinforcing rib 3 integrally formed at the bearing hole 2 on the bearing base body 1, a beveled structure 4 integrally formed on the surface of the bearing base body 1, a mounting seat 6 and a positioning pin 7 positioned at one end of the bearing base body 1, and a buffer protection mechanism 5 positioned on the upper surface of the bearing base body 1. Without affecting the stability of the original structure, the overall thickness of the base is reduced, and the flat surface is changed to a beveled surface. When the silicon wafer passes through the small roller docking belt, there is a safe distance between it and the base below, so that scratches will not occur.

[0020] Furthermore, the buffer protection mechanism 5 includes a rigid spring 8, a damper 9, a buffer cotton 10, a support protection plate 11, and a positioning seat 12. The rigid spring 8 and the damper 9 are located between the bearing base body 1 and the support protection plate 11, the positioning seat 12 is located at both ends of the damper 9, and the buffer cotton 10 is located on the surface of the support protection plate 11.

[0021] Furthermore, the bearing base body 1, bearing hole 2, reinforcing rib 3, and inclined structure 4 are integrally formed by casting.

[0022] Furthermore, the bearing base body 1 is fixedly installed by the mounting seat 6 and the positioning pin 7.

[0023] Furthermore, the bearing base body 1 and the buffer protection mechanism 5 are buffered by a rigid spring 8 and a damper 9, and the damper 9 is installed by a positioning seat 12.

[0024] Furthermore, the support and protective plate 11 is fixed to the cushioning cotton 10 with strong adhesive, and the surface of the support and protective plate 11 is protected by the cushioning cotton 10.

[0025] Working principle: This utility model includes a bearing base body 1, a bearing hole 2, a reinforcing rib 3, an inclined structure 4, a buffer protection mechanism 5, a mounting base 6, a positioning pin 7, a rigid spring 8, a damper 9, a buffer cotton 10, a support and protection plate 11, and a positioning seat 12. The fixed base has been redesigned, and the surface has been changed from a flat surface to an inclined surface. The overall thickness of the base has been reduced by 1 mm, which solves the problem of two-point scratches on the silicon wafer at a fixed position during PSG unloading. Without affecting the stability of the original structure, the overall thickness of the base has been reduced, and the flat surface has been changed to an inclined surface. When the silicon wafer passes through the small roller docking belt, there is a safe distance between it and the base below, so that scratches will not occur.

[0026] It should be noted that, in this document, relational terms such as first and second (number one, number two), etc., are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0027] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model.

Claims

1. A PSG blanking bearing pedestal anti-scratching device, comprising a bearing pedestal main body (1), characterized in that: The bearing base body (1) is provided with a bearing hole (2), the bearing base body (1) is integrally formed with a reinforcing rib (3) at the position of the bearing hole (2), the surface of the bearing base body (1) is integrally formed with an inclined surface structure (4), one end of the bearing base body (1) is positioned with a mounting seat (6) and a positioning pin (7), and the upper surface of the bearing base body (1) is positioned with a buffer protection mechanism (5).

2. A PSG draw shaft bearing base scratch prevention device according to claim 1, characterized in that: The buffer protection mechanism (5) comprises a rigid spring (8), a damper (9), buffer cotton (10), a support protection plate (11) and a positioning seat (12), the rigid spring (8) and the damper (9) are located between the bearing base body (1) and the support protection plate (11), the positioning seat (12) is located at both ends of the damper (9), and the buffer cotton (10) is located on the surface of the support protection plate (11).

3. The PSG draw shaft bearing base scratch prevention device of claim 1, wherein: The bearing base body (1) and the bearing hole (2), the reinforcing rib (3) and the inclined surface structure (4) are integrally formed by casting.

4. The PSG draw shaft bearing base scratch prevention device of claim 1, wherein: The bearing base body (1) is fixedly installed through the mounting seat (6) and the positioning pin (7).

5. A PSG draw shaft bearing base scratch prevention device according to claim 2, characterized in that: The bearing base body (1) and the buffer protection mechanism (5) are buffered and moved through the rigid spring (8) and the damper (9), and the damper (9) is installed through the positioning seat (12).

6. A PSG draw shaft bearing base scratch prevention device as set forth in claim 2, characterized in that: The support protection plate (11) and the buffer cotton (10) are fixed through strong glue, and the surface of the support protection plate (11) is protected through the buffer cotton (10).