Plasma treatment device for composite foil

Abstract

The utility model discloses a plasma treatment device for composite foils, and relates to the technical field of film treatment equipment, the plasma treatment device for the composite foils comprises a shell, blowing ports are distributed at the top and the bottom of the shell, air inlets are arranged at the two ends of the shell, and the blowing ports and the air inlets are communicated with the interior of the shell; mixed gas consisting of argon and oxygen is introduced into the shell; the plane target is arranged in the shell and comprises a permanent magnet, a red copper block, a heat conduction insulating plate, a cooling water cavity and a stainless steel shell; the permanent magnets and the red copper blocks are distributed in a staggered mode. The heat-conducting insulating plate is fixedly mounted at the bottoms of the permanent magnet and the red copper block; the end part of the stainless steel shell is fixed with the edge position of the heat-conducting insulating plate; and the cooling water cavity is positioned between the bottom of the heat-conducting insulating plate and the stainless steel shell. The utility model has the beneficial effects that the surface of the flexible base material can be well etched, and the binding force between the base material layer and the metal layer of the composite foil is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of film processing equipment more particularly relates to a kind of plasma processing device for composite foil. BACKGROUND

[0002] The existing plasma processing device is mainly applied to printed circuit board, semiconductor device and other fields, and for some flexible substrates, due to its high voltage and energy, it is easy to cause flexible substrate breakdown or damage and related parameters are difficult to control.

[0003] Therefore, the utility model designs a kind of plasma processing device for flexible substrate surface treatment, can etch flexible substrate surface well, improves the adhesion between composite foil substrate layer and metal layer. UTILITY MODEL CONTENT

[0004] In order to overcome the deficiencies of the prior art, the utility model provides a kind of plasma processing device for composite foil, can etch flexible substrate surface well, improves the adhesion between composite foil substrate layer and metal layer.

[0005] The utility model solves the technical scheme that the utility model employs for its technical problems: a kind of plasma processing device for composite foil, its improvement lies in, the plasma processing device for composite foil includes:

[0006] Shell, top and bottom are distributed with air outlet, both ends are provided with air inlet, and the air outlet and the air inlet are connected with the inside of the shell;The shell is connected with the inside of the shell by the mixed gas consisting of argon and oxygen;

[0007] Plane target, set in the shell interior, and including permanent magnet, red copper block, heat-conducting insulation board, cooling water cavity and stainless steel shell;The permanent magnet and the red copper block are distributed in staggered mode;The heat-conducting insulation board is fixedly installed at the bottom of the permanent magnet and the red copper block;The edge position of the stainless steel shell is fixed with the edge position of the heat-conducting insulation board;The cooling water cavity is located between the bottom of the heat-conducting insulation board and the stainless steel shell.

[0008] In the above structure, the plane target also includes cooling water inlet and cooling water outlet, the cooling water inlet and the cooling water outlet are arranged at the bottom of the stainless steel shell, and the cooling water inlet and the cooling water outlet are connected with the cooling water cavity.

[0009] In the above structure, the position of the cooling water outlet in vertical direction is higher than that of the cooling water inlet in vertical direction.

[0010] In the above structure, the planar target further comprises an electrode wire interface, which is arranged at the bottom of the stainless steel shell and between the cooling water inlet and the cooling water outlet.

[0011] In the above structure, an air flow cavity is arranged inside the shell, which is communicated with the air inlet and the air outlet, and the planar target is located at the middle position of the air flow cavity.

[0012] In the above structure, grooves are arranged at both ends of the heat-conducting insulation plate, which are clamped with the permanent magnets.

[0013] The beneficial effects of the present application are as follows: the present application introduces the mixed gas of argon and oxygen into the air inlet, ionizes the mixed gas of argon and oxygen through the planar target, accelerates the ionized argon ions through the permanent magnet, discharges the argon ions through the exhaust port and impacts the PET base film material, so as to achieve the effect of surface treatment of the base film, thereby etching the surface of the flexible base material well and improving the bonding force between the base material layer and the metal layer of the composite foil material. BRIEF DESCRIPTION OF DRAWINGS

[0014] Figure 1 It is a whole structure schematic view of the plasma processing device for the composite foil material of the present application;

[0015] Figure 2 It is a planar target structure schematic view of the plasma processing device for the composite foil material of the present application;

[0016] Figure 3 It is an application structure view of the plasma processing device for the composite foil material of an embodiment. DETAILED DESCRIPTION

[0017] The present application will be further described below in combination with the drawings and embodiments.

[0018] The concept, specific structure and generated technical effects of the present application will be clearly and completely described below in combination with embodiments and drawings, so as to fully understand the purpose, features and effects of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, but not all the embodiments. Based on the embodiments of the present application, other embodiments obtained by those skilled in the art without creative labor are all within the protection scope of the present application. In addition, all the coupling / connection relations involved in the patent do not mean that the components are directly connected, but means that a better coupling structure can be composed by adding or reducing coupling auxiliary components according to the specific implementation situation. The technical features in the present application can be combined interactively without contradiction and conflict.

[0019] REFERENCEFigure 1 and Figure 2 The utility model discloses a kind of plasma processing devices 5 for composite foil, and the plasma processing device 5 for composite foil includes:

[0020] Shell, top and bottom are distributed with blowing port 2, both ends are provided with air inlet 1, and blowing port 2 and air inlet 1 are all communicated with the inside of shell;Mixed gas composed of argon and oxygen is introduced into the inside of shell;

[0021] Plane target 3 is set to the inside of shell, and it includes permanent magnet 7, red copper block 8, heat-conducting insulating plate 12, cooling water cavity 13 and stainless steel shell 6;Permanent magnet 7 and red copper block 8 are distributed in staggered mode;Heat-conducting insulating plate 12 is fixedly installed at the bottom of permanent magnet 7 and red copper block 8;The edge position of stainless steel shell 6 is fixed with heat-conducting insulating plate 12;Cooling water cavity 13 is located between the bottom of heat-conducting insulating plate 12 and stainless steel shell 6.

[0022] It needs to be explained that, in the embodiment, the shell is the external frame of the whole plasma processing device 5, plays the role of containing and protecting plane target 3, and the both ends of shell are provided with air inlet 1, for introducing mixed gas composed of argon and oxygen into the inside of shell;The top and bottom of shell are provided with blowing port 2 for discharging plasma (argon ion) and impacting PET base film material 15 close to blowing port 2, to achieve the effect of treating base film surface;Plane target 3 is used for generating plasma (argon ion), and it includes permanent magnet 7, red copper block 8, heat-conducting insulating plate 12, cooling water cavity 13 and stainless steel shell 6, wherein, permanent magnet 7 provides constant magnetic field for plane target 3, provides thrust for plasma (argon ion) impacting PET base film material 15;Red copper block 8 has conductivity and thermal conductivity, can efficiently conduct current and help to generate high-density plasma (argon ion);Heat-conducting insulating plate 12 is installed at the bottom of permanent magnet 7 and red copper block 8 for preventing direct heat conduction between permanent magnet 7 and red copper block 8, and also can play the role of insulation, guarantee electrical safety;Stainless steel shell 6 wraps the whole plane target 3, for protecting other components of plane target 3 from being damaged, and also has certain heat dissipation function;Cooling water cavity 13 is used for effectively reducing the temperature of equipment by the cooling effect of water, to prevent damage or efficiency decline caused by overheating;In the specific implementation of the utility model, plasma processing device 5 is used for treating the surface of PET base film material 15 before electroplating, PET base film material 15 is unwound from unwinding roller during electroplating, and is transmitted through roller assembly such as bending roller 4, and is plated through plating drum, and finally is wound by winding roller; Figure 3As shown, the plasma processing device 5 is arranged between the bending rollers 4 close to the unwinding roller, and the air outlet 2 of the plasma processing device 5 is arranged at a distance of 25 mm from the PET base film material 15 to process the surface of the PET base film material 15; during the processing of the surface of the PET base film material 15, the air inlet device introduces a mixed gas composed of argon and oxygen into the air flow cavity 14 inside the shell through the air inlet 1, and the mixing ratio of argon and oxygen is 75:25; the plasma processing device 5 is connected to a plasma power supply, and the plasma power supply can apply a high-voltage electric field of 0-2000V to the planar target 3, and the mixed gas near the planar target 3 is ionized under the action of the high-voltage electric field, and the ionized plasma (argon ions) is accelerated by the air outlet 2 and impacts the PET base film material 15 under the action of the magnetic field, so as to achieve the effect of processing the surface of the base film, thereby etching the surface of the flexible base material well and improving the bonding force between the composite foil base material layer and the metal layer.

[0023] It should be further pointed out that in the embodiment, the plasma power supply adopts a medium-voltage direct-current power supply, and the generated plasma is stable, and the control of the applied voltage and other parameters will not break through the base material and damage the physical properties of the base material.

[0024] Referring to Figure 1 As shown, the planar target 3 further comprises a cooling water inlet 9 and a cooling water outlet 11, and the cooling water inlet 9 and the cooling water outlet 11 are arranged at the bottom of the stainless steel shell 6 and are in communication with the cooling water cavity 13; the position of the cooling water outlet 11 in the vertical direction is higher than that of the cooling water inlet 9 in the vertical direction.

[0025] It should be pointed out that in the embodiment, the cooling water inlet 9 and the cooling water outlet 11 are connected with the cooling water pipeline, and the cooling water enters the cooling water cavity 13 from the cooling water inlet 9 and is discharged from the cooling water outlet 11, so as to realize the circulation of the cooling water in the cooling water cavity 13; in addition, the cooling water in the cooling water cavity 13 can cool the heat generated during the plasma processing process in time, and also can ensure the stability of the generated plasma, so as to better utilize the surface processing of the base film material.

[0026] Referring to Figure 1 As shown, the planar target 3 further comprises an electrode line interface 10, and the electrode line interface 10 is arranged at the bottom of the stainless steel shell 6 and is located between the cooling water inlet 9 and the cooling water outlet 11.

[0027] It should be pointed out that in the embodiment, the electrode line interface 10 is designed to connect the plasma power supply, so as to apply a high-voltage electric field of 0-2000V to the surface of the planar target 3, so as to realize the ionization of the mixed gas near the planar target 3.

[0028] Referring toFigure 2 As shown, the two ends of the heat-conducting insulation plate 12 are provided with recesses, which are clamped with the permanent magnet 7.

[0029] It should be noted that the recesses are designed to fix the heat-conducting insulation plate 12 to the bottom of the permanent magnet and the copper block 8, so as to prevent direct heat conduction between the permanent magnet 7 and the copper block 8, and also to play an insulation role, ensuring electrical safety.

[0030] The above is a specific description of the preferred embodiment of the present application, but the present application is not limited to the above-mentioned embodiments, and those skilled in the art can make various equivalent modifications or replacements without departing from the spirit of the present application. These equivalent modifications or replacements are all included in the scope defined by the claims of the present application.

Claims

1. A plasma processing apparatus for composite foils, characterized by, The plasma processing device for composite foil comprises: a shell, a top and a bottom of which are provided with air blowing ports, both ends of which are provided with air inlet ports, and the air blowing ports and the air inlet ports are communicated with the inside of the shell; the inside of the shell is communicated with mixed gas composed of argon and oxygen; a planar target arranged in the inside of the shell and comprising a permanent magnet, a red copper block, a heat-conducting insulation plate, a cooling water cavity and a stainless steel shell; the permanent magnet and the red copper block are distributed in a staggered manner; the heat-conducting insulation plate is fixedly installed at the bottom of the permanent magnet and the red copper block; the end of the stainless steel shell is fixed with the edge of the heat-conducting insulation plate; the cooling water cavity is located between the bottom of the heat-conducting insulation plate and the stainless steel shell.

2. The apparatus for plasma processing of a composite foil according to claim 1, wherein, The planar target further comprises a cooling water inlet and a cooling water outlet, which are arranged at the bottom of the stainless steel shell and communicated with the cooling water cavity.

3. The apparatus for plasma processing of a composite foil according to claim 2, wherein, The position of the cooling water outlet in the vertical direction is higher than that of the cooling water inlet.

4. The apparatus for plasma processing of a composite foil according to claim 3, wherein The planar target further comprises an electrode wire interface, which is arranged at the bottom of the stainless steel shell and located between the cooling water inlet and the cooling water outlet.

5. The apparatus for plasma processing of a composite foil of claim 1, wherein, The inside of the shell is provided with an air flow cavity, which is communicated with the air inlet ports and the air blowing ports, and the planar target is located at the middle position of the air flow cavity.

6. The apparatus for plasma processing of a composite foil of claim 1, wherein, Both ends of the heat-conducting insulation plate are provided with grooves, which are clamped with the permanent magnets.

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