Wafer bottom surface cleaning device

Abstract

The utility model discloses a wafer bottom surface cleaning device in the technical field of wafer cleaning. The wafer bottom surface cleaning device comprises a load plate, a supporting seat; a rotating shaft; a protective tube; an infusion tube; a spray washing nozzle; a carrier plate; a driving mechanism; a rotation limiting assembly; a plurality of support blocks; and a plurality of positioning columns. The protection tube is arranged in the through channel and is in running fit with the rotating shaft, so that additional protection and support can be provided for the infusion tube, the working stability of the infusion tube is improved, vibration and noise generated by rotation are reduced, the stability and reliability of the cleaning process are improved, and the cleaning effect is improved by limiting rotation of the protection tube. The protection pipe, the liquid conveying pipe and the spray washing nozzle are all kept fixed, so that the bottom end of the liquid conveying pipe does not need to be connected with a liquid supply system through a rotary joint, the overall service life is prolonged, the situation that cleaning liquid is polluted by metal impurities generated by abrasion of the rotary joint is avoided, and the cleaning effect is improved.

Description

Technical Field

[0001] This utility model relates to the field of wafer cleaning technology, specifically to a wafer bottom surface cleaning device. Background Technology

[0002] In the field of wafer cleaning technology, a single-wafer cleaning method has been developed, characterized by its independent bottom-side cleaning and front-side cleaning. The core component of this bottom-side cleaning device is a vertically mounted rotating shaft with a hollow structure running from top to bottom. A fluid delivery tube is inserted within this hollow structure, with its lower end extending out of the rotating shaft and connected to a fluid supply line via a rotary joint. A support plate is mounted on the top of the rotating shaft, with a through-hole containing a nozzle. The nozzle is tightly connected to the upper end of the fluid delivery tube to ensure smooth delivery of the cleaning solution.

[0003] In actual operation, the rotating shaft is driven by a drive mechanism, causing the wafer placed on top of the support plate to rotate at high speed. At the same time, the infusion tube rotates synchronously with the rotating shaft and continuously delivers cleaning fluid to the nozzle; the nozzle sprays cleaning fluid from bottom to top onto the bottom surface of the wafer, thereby achieving the cleaning purpose.

[0004] However, while existing wafer bottom cleaning devices meet cleaning requirements to some extent, they still suffer from poor cleaning performance and short lifespan. Specifically, because the rotating shaft needs to drive the infusion tubing at high speed, a rotary joint is necessary. However, under high-speed rotation conditions, the rotary joint suffers severe wear, which not only shortens the overall lifespan of the device but also generates metallic impurities that mix into the cleaning solution, contaminating it and severely affecting the cleaning effect. Utility Model Content

[0005] The purpose of this invention is to provide a wafer bottom cleaning device that solves the technical problems of poor cleaning effect and short service life of existing wafer bottom cleaning devices.

[0006] This utility model discloses a wafer bottom surface cleaning device, comprising:

[0007] Load plates are arranged vertically.

[0008] A support base is installed on one side of the load plate;

[0009] The rotating shaft is arranged vertically and rotatably mounted on the support base, and has a coaxial through channel inside;

[0010] A protective tube passes through the through-channel and is rotatably engaged with the rotating shaft, with both ends extending out from the rotating shaft;

[0011] An infusion tubing is inserted into the protective tube, with its bottom end extending out of the protective tube;

[0012] A spray nozzle is installed at the top of the protective tube and is connected to the infusion tube;

[0013] A support plate is arranged horizontally and installed at the top of the rotating shaft, and its top surface is provided with a movable through hole that is adapted to the spray nozzle;

[0014] The drive mechanism is mounted on the load plate and is connected to the rotating shaft via a transmission.

[0015] A rotation limiting component is disposed on the load plate and connected to the lower end of the protective tube;

[0016] Multiple support blocks are installed on the top surface of the bearing plate and arranged around the rotation axis;

[0017] Multiple positioning posts are installed on the top surface of the bearing plate and arranged around the rotation axis, and located on the outer periphery of the support block;

[0018] The rotating shaft, protective tube, infusion tube, spray nozzle, and carrier plate are all coaxially arranged.

[0019] This application provides additional protection and support to the internal infusion tubing by placing a protective tube within the through-channel and rotating it in conjunction with the rotating shaft. This improves the operational stability of the infusion tubing and helps reduce vibration and noise caused by rotation, thus enhancing the smoothness and reliability of the cleaning process. Furthermore, the rotation-limiting component restricts the rotation of the protective tube, keeping the protective tube, infusion tubing, and spray nozzle stationary. This eliminates the need for the bottom end of the infusion tubing to connect to the fluid supply system via a rotary joint, extending the overall service life of the device and preventing metal impurities from contaminating the cleaning fluid due to wear of the rotary joint, thereby improving the cleaning effect.

[0020] Based on the above technical solution, the solution of this application can be further improved as follows:

[0021] Preferably, the support base includes:

[0022] The support cylinder is arranged vertically, and both the upper and lower ends are provided with first annular grooves;

[0023] A fixing frame is mounted on the load plate and connected to the support cylinder;

[0024] Several first bearings are respectively disposed in the first annular groove and sleeved on the outside of the rotating shaft;

[0025] The top cover is installed on the top of the support cylinder and fitted onto the outside of the rotating shaft;

[0026] The rotating shaft has a support ring on its outer side, and the bottom of the support ring abuts against the first bearing. This design enhances structural stability, optimizes rotational performance, and improves sealing performance. Furthermore, through a reasonable structural layout and easy-to-disassemble connection method, it reduces maintenance costs and downtime, and improves the effectiveness, safety, and reliability of the device.

[0027] Preferably, the rotating shaft has a guide cover located above the top cover and covering the opening of the top cover. This design prevents cleaning fluid from flowing into the support cylinder through the opening of the top cover, thereby further ensuring the cleanliness and lubrication of the first bearing and improving its long-term stability.

[0028] Preferably, the fixing frame includes:

[0029] The first plate is horizontally mounted on the load plate and fitted onto the upper end of the support cylinder;

[0030] The second plate is horizontally installed on the load plate and fitted onto the lower end of the support cylinder;

[0031] Two reinforcing plates are disposed between the load plate and the second support plate, and are located on both sides of the support cylinder respectively. This solution can effectively share the load and improve the load-bearing performance of the structure, making the structure safer and more reliable, thereby ensuring the stability of the support cylinder, increasing the strength, stiffness and stability of the structure, and helping to resist the influence of external forces or vibrations, thus improving the overall stability of the structure.

[0032] Preferably, flanges are fixedly fitted at the upper and lower ends of the support cylinder, and the two flanges are respectively attached to the first support plate and the second support plate and bolted together. This solution serves to vertically limit the support cylinder and facilitates disassembly and assembly through bolt connection, thereby improving the efficiency of device assembly and maintenance.

[0033] Preferably, the drive mechanism includes:

[0034] The motor is mounted on the second support plate;

[0035] The drive wheel is mounted on the drive shaft of the motor;

[0036] The driven wheel is arranged below the support cylinder and fixedly sleeved on the outside of the rotating shaft;

[0037] A transmission belt is fitted between the driving pulley and the driven pulley; this design effectively reduces impact and vibration loads, resulting in less noise and allowing for smooth and stable high-speed rotation of the rotating shaft.

[0038] Preferably, the spin-limiting component includes:

[0039] A limiting strip is arranged horizontally and installed on the outer periphery of the bottom end of the protective tube;

[0040] The concave block has slots on both sides of its top that are adapted to the limiting strip;

[0041] The connector is connected at one end to the concave block and at the other end to the load plate. This design can stably support and restrict the rotation of the protective tube, and the snap-fit ​​connection facilitates disassembly and assembly, thereby improving assembly efficiency.

[0042] Preferably, it includes:

[0043] A photoelectric sensor is mounted on the load board;

[0044] A light-shielding plate is horizontally arranged and installed on the rotating shaft, located below the support cylinder, and can pass through the sensing area of ​​the photoelectric sensor. With this solution, the rotational speed of the rotating shaft can be stably counted in real time, thereby understanding the operating status of the equipment in a timely manner and facilitating automated control.

[0045] Preferably, a second annular groove is provided at both the upper and lower ends of the through channel, and a second bearing is installed in the second annular groove. The second bearing is sleeved on the outside of the protective tube. With this solution, the protective tube is ensured to be stably supported and not affected by the high-speed rotation of the rotating shaft, thereby improving the smoothness of operation. Furthermore, by setting the second annular groove, an installation position for the second bearing is provided, thereby ensuring the stability of the installation and improving the compactness of the structure.

[0046] Preferably, it includes:

[0047] A support plate is installed at the top of the rotating shaft and is movably sleeved outside the protective tube, with its top surface connected to the bearing plate;

[0048] A flow guide cover is installed on the top surface of the support plate and movably sleeved outside the spray nozzle, and has a frustum on the top, with multiple concentric nested lower ring plates on the top surface of the frustum.

[0049] The spray nozzle has a retaining ring on its outer periphery, and the bottom surface of the retaining ring is provided with multiple concentric nested upper ring plates. The upper ring plates and the lower ring plates are arranged alternately. This design achieves a sealing effect, preventing the cleaning fluid from flowing into the through channel, ensuring the cleanliness and lubrication of the second bearing, improving the stability of long-term operation, and extending its service life.

[0050] Through the above technical solution, this utility model achieves the following beneficial effects:

[0051] 1. This application provides additional protection and support for the internal infusion tube by setting a protective tube inside the through channel and rotating it in conjunction with the rotating shaft. This improves the working stability of the infusion tube and helps reduce vibration and noise caused by rotation, thereby enhancing the smoothness and reliability of the cleaning process.

[0052] 2. This application restricts the rotation of the protective tube by setting a rotation limiting component, so that the protective tube, infusion tube and spray nozzle will remain stationary and fixed. This eliminates the need for the bottom end of the infusion tube to be connected to the liquid supply system through a rotary joint, thereby extending the overall service life of the device and avoiding the contamination of the cleaning fluid by metal impurities caused by wear of the rotary joint, thus improving the cleaning effect. Attached Figure Description

[0053] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0054] Figure 1 This is a schematic diagram of the wafer bottom cleaning device according to a specific embodiment of the present invention;

[0055] Figure 2 for Figure 1 Front sectional view of the wafer bottom cleaning apparatus shown;

[0056] Figure 3 for Figure 2 Enlarged view of point A in the middle;

[0057] Figure 4 for Figure 2 Enlarged view of point B in the middle;

[0058] Figure 5 for Figure 2 A magnified schematic diagram of a portion of the structure in the wafer bottom cleaning device shown;

[0059] Explanation of reference numerals in the attached figures:

[0060] 1. Load plate; 2. Support base; 3. Rotating shaft; 4. Protective tube; 5. Infusion tube; 6. Spray nozzle; 7. Carrier plate; 8. Drive mechanism; 9. Rotation limiting assembly; 10. Support block; 11. Positioning column; 12. Photoelectric sensor; 13. Light shield; 14. Second bearing; 15. Support plate; 16. Flow guide cover;

[0061] 21. Support cylinder; 22. Fixing frame; 23. First bearing; 24. Top cover; 31. Through channel; 32. Support ring; 33. Guide cover; 61. Retaining ring; 62. Upper ring plate; 71. Movable through hole; 81. Motor; 82. Driving wheel; 83. Driven wheel; 84. Transmission belt; 91. Limiting strip; 92. Concave block; 93. Connecting piece;

[0062] 161. Frustum; 162. Lower ring plate; 211. First ring groove; 212. Flange; 221. First support plate; 222. Second support plate; 223. Reinforcing plate; 311. Second ring groove; 921. Slot. Detailed Implementation

[0063] The embodiments of the present invention will now be described in detail with reference to the accompanying drawings. These embodiments are merely illustrative of the present invention and should not be construed as limiting the scope of protection of the present invention.

[0064] First, it should be noted that some directional terms used in the following description to clearly illustrate the technical solution of this utility model, such as the terms "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer," are all derived from the normal orientation of the components in the wafer bottom cleaning device. They are only used to facilitate the description of this utility model and simplify the description, and are not intended to indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0065] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the stated features.

[0066] In this application, unless otherwise expressly specified and limited, the terms "installation" and "connection" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0067] To better understand the above technical solutions, the following will provide a detailed description of the technical solutions in conjunction with the accompanying drawings and specific embodiments.

[0068] Example:

[0069] like Figure 1 As shown in the figure, this application discloses a wafer bottom surface cleaning device for rotating and spraying the wafer bottom surface. Its specific structure includes: a load plate 1, a support base 2, a rotating shaft 3, a protective tube 4, an infusion tube 5, a spray nozzle 6, a carrier plate 7, a drive mechanism 8, a rotation limiting component 9, multiple support blocks 10 and multiple positioning columns 11.

[0070] The load plate 1 is arranged vertically, serving as the basic support structure for the entire device, and is connected to the lifting mechanism to achieve the overall lifting of the device, thereby cooperating with other devices.

[0071] The support base 2 is installed on one side of the load plate 1 to firmly support the entire rotating shaft 3 and the components mounted on it, ensuring that the rotating shaft 3 can remain stable when rotating at high speed without shaking or shifting.

[0072] The rotating shaft 3 is arranged vertically and rotatably mounted on the support base 2, and has a through channel 31 arranged coaxially inside; the through channel 31 is used to accommodate and protect other components.

[0073] The protective tube 4 passes through the through channel 31 and rotates with the rotating shaft 3, with both ends extending out of the rotating shaft 3 to provide additional protection and support for the infusion tube 5.

[0074] The infusion tubing 5 is inserted into the protective tube 4, with its bottom end extending out of the protective tube 4, for conveying the cleaning solution; it is preferably a PFA tubing, which has good resistance to high and low temperatures, corrosion resistance, and aging resistance.

[0075] The cleaning nozzle 6 is installed at the top of the protective tube 4 and is connected to the infusion tube 5, and is used to spray the cleaning solution onto the bottom surface of the wafer.

[0076] The carrier plate 7 is arranged horizontally and installed at the top of the rotating shaft 3. The top surface is provided with a movable through hole 71 that is compatible with the spray nozzle 6 for carrying the wafer.

[0077] The drive mechanism 8 is mounted on the load plate 1 and is connected to the rotating shaft 3 for driving the rotating shaft 3 and the bearing disk 7 and wafer on it to rotate at high speed.

[0078] The rotation limiting component 9 is located on the load plate 1 and connected to the lower end of the protective tube 4. It is used to support and limit the protective tube 4 to prevent it from rotating according to the rotation axis 3.

[0079] Multiple support blocks 10 are installed on the top surface of the carrier disk 7 and arranged around the rotation axis 3; they are used to support the wafer and keep the wafer at a certain distance from the carrier disk 7, thereby ensuring that the spray nozzle 6 can fully spray the bottom surface of the wafer.

[0080] Multiple positioning posts 11 are installed on the top surface of the carrier plate 7 and arranged around the rotation axis 3, and located on the outer periphery of the support block 10. They are used to ensure that the wafer can be accurately positioned in the predetermined position when placed, to prevent the wafer from shifting or shaking during rotation or cleaning, and to help ensure the uniformity and consistency of cleaning and improve the cleaning effect.

[0081] The rotating shaft 3, protective tube 4, infusion tube 5, spray nozzle 6, and bearing plate 7 are all coaxially arranged to improve the stability of high-speed rotation.

[0082] The above technical solution works as follows:

[0083] The outer edge of the wafer is supported by multiple support blocks 10 to avoid interference with the cleaning process, and is positioned in a circumferential manner by multiple positioning posts 11 to prevent displacement or shaking during the rotation cleaning process. Then, the drive mechanism 8 is activated, which drives the rotating shaft 3 and its carrier disk 7 and wafer to rotate at high speed. At the same time, since the protective tube 4 and the rotating shaft 3 are rotately coupled, and the rotation limiting component 9 restricts the rotation of the protective tube 4, the protective tube 4, the infusion tube 5 and the cleaning nozzle 6 will all remain stationary. Thus, the cleaning fluid can be input from the lower end of the infusion tube 5, and finally, the bottom surface of the high-speed rotating wafer is thoroughly cleaned by the cleaning nozzle 6.

[0084] This application provides additional protection and support for the internal infusion tube 5 by placing a protective tube 4 within the through channel 31 and rotating it in conjunction with the rotating shaft 3. This improves the working stability of the infusion tube 5 and helps reduce vibration and noise caused by rotation, thus enhancing the smoothness and reliability of the cleaning process. Furthermore, the rotation limiting component 9 restricts the rotation of the protective tube 4, keeping the protective tube 4, infusion tube 5, and spray nozzle 6 stationary. This eliminates the need for the bottom end of the infusion tube 5 to be connected to the fluid supply system via a rotary joint, extending the overall service life of the device and preventing metal impurities from contaminating the cleaning fluid due to wear of the rotary joint, thereby improving the cleaning effect.

[0085] In some embodiments, such as Figure 1 , Figure 2 and Figure 4 As shown, to improve support stability, the support base 2 includes: a support cylinder 21, a fixing frame 22, and several first bearings 23, the specific configuration of which is as follows:

[0086] The support cylinder 21 is arranged vertically, and the upper and lower ends are provided with first annular grooves 211 to provide stable support and ensure that the rotating shaft 3 will not vibrate or deviate due to structural instability when rotating at high speed, thereby improving the stability and reliability of the entire cleaning device.

[0087] The fixing frame 22 is mounted on the load plate 1 and connected to the support cylinder 21 for fixed support;

[0088] A number of first bearings 23 are arranged one-to-one in the first annular groove 211 and sleeved on the outside of the rotating shaft 3. Through rolling contact characteristics, they significantly reduce the frictional resistance and energy loss of the rotating shaft 3 during rotation, improve rotational efficiency and accuracy, and extend service life.

[0089] The top cover 24 is installed on the top of the support cylinder 21 and fitted onto the outside of the rotating shaft 3. Through its cooperation with the first annular groove 211 and the first bearing 23, it forms a relatively closed structure, which helps to prevent cleaning fluid or other contaminants from entering the interior of the first bearing 23, ensuring the cleanliness and lubrication of the first bearing 23, and improving its sealing performance and durability.

[0090] The rotating shaft 3 has a support ring 32 on its outside. The bottom of the support ring 32 abuts against the first bearing 23, which provides necessary vertical support for the rotating shaft 3 and realizes the function of axial limiting.

[0091] The above-mentioned design enhances structural stability, optimizes rotational performance, and improves sealing performance. Furthermore, the reasonable structural layout and easy-to-disassemble connection method reduce maintenance costs and downtime, while improving the device's performance, safety, and reliability.

[0092] Based on the above embodiments, such as Figure 4 As shown, the rotating shaft 3 has a guide cover 33 outside, which is located above the top cover 24 and covers the opening of the top cover 24.

[0093] By setting the guide cover 33, the cleaning fluid can be prevented from flowing into the support cylinder 21 through the opening of the top cover 24, thereby further ensuring the cleanliness and lubrication of the first bearing 23 and improving its long-term stability.

[0094] Based on the above embodiments, the fixing frame 22 includes: a first support plate 221, a second support plate 222, and two reinforcing plates 223, the specific configuration of which is as follows:

[0095] The first support plate 221 is horizontally installed on the load plate 1 and fitted onto the upper end of the support cylinder 21;

[0096] The second support plate 222 is horizontally installed on the load plate 1 and fitted onto the lower end of the support cylinder 21;

[0097] Two reinforcing plates 223 are located between the load plate 1 and the second support plate 222, and are respectively located on both sides of the support cylinder 21.

[0098] The load can be effectively distributed by the upper and lower supports of the first support plate 221 and the second support plate 222, and the load-bearing performance of the structure can be improved, making the structure safer and more reliable, thereby ensuring the stability of the support cylinder 21. Furthermore, by setting the reinforcing plate 223, the strength, stiffness and stability of the structure are increased, and it helps to resist the influence of external forces or vibrations, thereby improving the overall stability of the structure.

[0099] In this embodiment, as Figure 2 As shown, flanges 212 are fixedly fitted at the upper and lower ends of the support cylinder 21, and the two flanges 212 are respectively attached to the first support plate 221 and the second support plate 222 and bolted together.

[0100] The above-mentioned design serves to vertically limit the support cylinder 21, and the bolt connection facilitates disassembly and assembly, thereby improving the efficiency of device assembly and maintenance.

[0101] In some embodiments, such as Figure 1 and Figure 2 As shown, the drive mechanism 8 includes: a motor 81, a driving wheel 82, a driven wheel 83, and a transmission belt 84, and its specific arrangement is as follows:

[0102] Motor 81 is mounted on the second support plate 222;

[0103] The drive wheel 82 is mounted on the drive shaft of the motor 81;

[0104] Driven wheel 83 is arranged below support cylinder 21 and fixedly sleeved on the outside of rotating shaft 3;

[0105] The transmission belt 84 is fitted between the driving pulley 82 and the driven pulley 83.

[0106] Specifically, the motor 81 is vertically mounted on the bottom of the second support plate 222 via a concave plate, thereby improving the structural compactness of the device.

[0107] With the above configuration, since the transmission belt 84 is elastic, it can effectively reduce impact and vibration loads, thus generating less noise and smoothly driving the rotating shaft 3 to rotate at high speed.

[0108] In some embodiments, such as Figures 1-3 As shown, the rotation limiting component 9 includes: a limiting strip 91, a concave block 92, and a connecting member 93, and its specific configuration is as follows:

[0109] The limiting strip 91 is arranged horizontally and installed on the outer periphery of the bottom end of the protective tube 4;

[0110] The concave block 92 has slots 921 on both sides of its top that are adapted to the limiting strip 91;

[0111] One end of the connector 93 is connected to the concave block 92, and the other end is connected to the load plate 1; preferably, it is integrally formed with the concave block 92 and bolted to the load plate 1, so as to facilitate installation and improve the assembly efficiency of the device, but it is not limited thereto.

[0112] In use, the protective tube 4 is passed through the inside of the concave block 92, and the two ends of the limiting strip 91 are respectively engaged with a slot 921.

[0113] The above settings provide stable support and rotational restriction for the protective tube 4, and the snap-fit ​​connection facilitates disassembly and assembly, thereby improving assembly efficiency.

[0114] In some embodiments, such as Figure 1 and Figure 2 As shown, it also includes:

[0115] Photoelectric sensor 12 is mounted on load board 1;

[0116] The light-shielding plate 13 is arranged horizontally, installed on the rotating shaft 3, and located below the support cylinder 21, and can pass through the sensing area of ​​the photoelectric sensor 12.

[0117] With the above settings, the rotational speed of the rotating shaft 3 can be stably and statistically analyzed in real time, thereby gaining timely insight into the operating status of the equipment and facilitating automated control.

[0118] In some embodiments, such as Figure 1 , Figure 3 and Figure 5 As shown, a second annular groove 311 is provided at both the upper and lower ends of the through channel 31. A second bearing 14 is installed in the second annular groove 311 and is sleeved on the outside of the protective tube 4.

[0119] By setting the second bearing 14 as the connecting part 93 between the rotating shaft 3 and the protective tube 4, it is ensured that the protective tube 4 is stably supported and is not affected by the high-speed rotation of the rotating shaft 3, thereby improving the smoothness of operation. Furthermore, by setting the second annular groove 311, an installation position is provided for the second bearing 14, thereby ensuring the stable installation and improving the compactness of the structure.

[0120] In some embodiments, such as Figure 1 and Figure 5 As shown, it includes:

[0121] The support plate 15 is installed on the top of the rotating shaft 3 and is movably sleeved outside the protective tube 4, and its top surface is connected to the bearing plate 7;

[0122] The flow guide cover 16 is installed on the top surface of the support plate 15 and is movably sleeved on the outside of the spray nozzle 6. The top has a frustum 161, and the top surface of the frustum 161 has multiple concentric nested lower ring plates 162.

[0123] Among them, the outer periphery of the spray nozzle 6 has a retaining ring 61, and the bottom surface of the retaining ring 61 is provided with multiple concentric nested upper ring plates 62, with the upper ring plates 62 and the lower ring plates 162 arranged alternately.

[0124] In use, the cleaning fluid on the top surface of the support plate 7 falls into the frustum 161 of the guide cover 16 through the movable through hole 71, and then flows along the frustum 161 to the support plate 15 and is thrown out. Due to the cover of the baffle ring 61 and the alternating obstruction of 63 and the lower ring plate 162, the cleaning fluid cannot flow into the gap between the spray nozzle 6 and the guide cover 16.

[0125] The above-mentioned design achieves a sealing effect, preventing the cleaning fluid from flowing into the through channel 31, ensuring the cleanliness and lubrication of the second bearing 14, improving the stability of long-term operation, and extending its service life.

[0126] Numerous specific details are set forth in this specification. However, it will be understood that embodiments of this invention may be practiced without these specific details. In some instances, well-known methods, structures, and techniques have not been shown in detail so as not to obscure the understanding of this specification.

[0127] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0128] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and not to limit it. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model, and they should all be covered within the scope of the claims and specification of this utility model.

Claims

1. A wafer backside cleaning apparatus, characterized by, The utility model provides a kind of automatic cleaning device for injection pump, including: Load plate, vertical arrangement; Support seat, is installed in the one side of the load plate; Rotary shaft, vertical arrangement, and rotation is installed on the support seat, and inside has coaxially arranged through channel; Protective tube, passes through the through channel, and rotation is matched with the rotary shaft, and two ends stretch out from the rotary shaft inside; Infusion tube, is inserted in the protective tube, and bottom end stretches out the protective tube; Spray nozzle, is installed in the top end of the protective tube, and is communicated with the infusion tube; Carrying disc, horizontal arrangement, and is installed in the top end of the rotary shaft, and top surface is equipped with the movable through hole that is adapted with the spray nozzle; Driving mechanism, is installed on the load plate, and is transmission connection with the rotary shaft; Rotation limiting component, is located on the load plate, and is connected with the lower end of the protective tube; A plurality of support blocks, are installed on the top surface of the carrying disc, and are arranged around the rotary shaft; A plurality of positioning columns, are installed on the top surface of the carrying disc, and are arranged around the rotary shaft, and are located in the outer periphery of the support block; Wherein, the rotary shaft, protective tube, infusion tube, spray nozzle and carrying disc are coaxially arranged; Support disc, is installed in the top end of the rotary shaft, and is movably sleeved in the protective tube outside, and top surface is connected with the carrying disc; Flow guide cover, is installed on the top surface of the support disc, and is movably sleeved in the spray nozzle outside, and top has circular table, and the circular table top has a plurality of concentric nested arrangement lower ring plate; Wherein, the outer periphery of the spray nozzle has stop ring, and the bottom surface of the stop ring is equipped with a plurality of concentric nested arrangement upper ring plate, and the upper ring plate and the lower ring plate are alternately arranged.

2. The wafer backside cleaning apparatus according to claim 1, wherein The support seat includes: Support cylinder, vertical arrangement, and first ring groove is formed in the upper and lower ends; Fixed frame, is installed on the load plate, and is connected with the support cylinder; A plurality of first bearings, are correspondingly arranged in the first ring groove, and are sleeved outside the rotary shaft; Top cover, is installed in the top end of the support cylinder, and is sleeved outside the rotary shaft; Wherein, the rotary shaft has support ring outside, and the bottom of the support ring is in contact with the first bearing.

3. The wafer backside cleaning apparatus of claim 2, wherein The rotary shaft has guide cover outside, and the guide cover is located above the top cover, and covers the through hole of the top cover.

4. The wafer backside cleaning apparatus of claim 2, wherein The fixed frame includes: First support plate, horizontal installation is carried out on the load plate, and is sleeved on the upper end of the support cylinder; Second support plate, horizontal installation is carried out on the load plate, and is sleeved on the lower end of the support cylinder; Two reinforcing plates, are located between the load plate and the second support plate, and are respectively located on both sides of the support cylinder.

5. The wafer backside cleaning apparatus of claim 4, wherein The upper and lower ends of the support cylinder are respectively fixedly sleeved with flange, and the two flanges are respectively attached with the first support plate and the second support plate and are bolted.

6. The wafer backside cleaning apparatus of claim 4, wherein The driving mechanism includes: Motor, is installed on the second support plate; Driving wheel, is installed on the drive shaft of the motor; Driven wheel, is arranged below the support cylinder, and is fixedly sleeved outside the rotary shaft; Transmission belt, is sleeved between the driving wheel and the driven wheel.

7. The wafer backside cleaning apparatus as claimed in claim 1, wherein The rotation limiting component includes: Limiting strip, horizontal arrangement, and is installed on the outer periphery of the bottom end of the protective tube; Concave block, top two sides are equipped with the clamping groove that is adapted with the limiting strip; Connecting piece, one end is connected with the concave block, and the other end is connected with the load plate.

8. The wafer backside cleaning apparatus of claim 2, wherein The utility model provides a kind of automatic cleaning device for injection pump, including: A photoelectric sensor is installed on the load plate. A light shield is horizontally arranged, installed on the rotating shaft, located below the support cylinder, and capable of passing through the sensing area of the photoelectric sensor.

9. The wafer backside cleaning apparatus of claim 2, wherein Second annular grooves are formed at the upper and lower ends of the through channel, and second bearings are installed in the second annular grooves and sleeved on the outer surface of the protection tube.

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