Degassing device and recycling system device for electrolytic chlorine dissolving absorption liquid of etching waste liquid

Abstract

The utility model relates to the technical field of etching, in particular to a degassing device and a recycling system device for dissolving absorption liquid by electrolyzing chlorine in waste etching liquid, which comprise an overflow chamber, at least one ultrasonic generator arranged in the overflow chamber, and an air draft end arranged at the top of the overflow chamber, at least one underflow baffle and at least one overflow baffle are sequentially arranged in the overflowing chamber in the liquid inlet direction of fluid. The surfaces of the underflow baffle and the overflow baffle intersect with the liquid inlet direction of the overflowing chamber. According to the degasser provided by the utility model, the ultrasonic generator is matched with the underflow baffle and the overflow baffle to form a strong turbulent flow field, and is matched with the air draft end to realize effective removal of fluid air, so that the utilization effect of electrolytic regeneration etching waste liquid is improved, and etching factors of an etching line are basically not changed after the regeneration etching liquid is used.

Description

TECHNICAL FIELD

[0001] The utility model relates to etching technical field, concretely relates to a kind of etching waste liquid electrolytic chlorine gas dissolving absorption liquid's degassing device and recycling system device. BACKGROUND

[0002] In the electrolysis process of etching liquid, with the electrolysis, the copper concentration or cuprous ion concentration in the etching liquid will gradually accumulate, and when accumulated to a certain extent, it will lead to the etching liquid cannot bite the copper foil stably and quickly, at this time, it becomes acidic etching waste liquid.

[0003] Currently, the electrolysis regeneration methods for acidic etching waste liquid mainly include electrolysis methods based on chlorine gas precipitation and electrolysis methods based on no chlorine gas precipitation.

[0004] CN111560615A discloses a method for online recovery of copper and chlorine gas from acidic etching waste liquid and regeneration of etching liquid, comprising the following steps: etching waste liquid electrolysis, etching liquid regeneration, cathode copper recovery, copper reduction, solid-liquid separation, chlorine gas absorption, and tail gas treatment. A portion of the acidic etching waste liquid is transported to a reaction kettle for copper reduction, i.e., an iron powder reduction method is added to the diaphragm electrodeposition method. By adding iron powder, the copper ions in the acidic etching waste liquid are reduced to copper powder, and the solution is converted into a ferrous chloride solution. The ferrous chloride solution is used to absorb residual chlorine gas or as a product, providing an open circuit for the electrolysis module and the etching process solution closed-loop system. This solves the problems of excessive salt content, impurity accumulation, and decreased etching rate, avoids the increase of etching process solution, and improves the copper recovery rate.

[0005] CN113493915A discloses a regeneration method and system for acidic etching waste liquid, relating to the field of acidic etching waste liquid treatment. The steps of the method include: providing acidic etching waste liquid containing copper ions, cuprous ions, and chloride ions; electrolyzing the acidic etching waste liquid to form electrolytic regeneration liquid and chlorine gas; the electrolysis process includes: converting part of the cuprous ions in the acidic etching waste liquid to copper ions, converting part of the chloride ions to chlorine gas, and converting part of the copper ions to copper metal; reacting the chlorine gas obtained from the electrolysis with the electrolytic regeneration liquid to convert the cuprous ions in the electrolytic regeneration liquid to copper ions, forming regenerated acidic etching liquid.

[0006] However, when using chlorine gas generated during the electrolysis process, it is common to use a jetifier to transport the anode chlorine gas from the electrolytic cell to the dissolution absorption cylinder and recycle it. However, due to the presence of a certain amount of air (air volume content is 55-65%) in the chlorine gas, the chlorine gas will react with the monovalent copper in the etching liquid after the jet circulation pump is turned on to recycle the chlorine gas. However, the air bubbles dispersed in the etching liquid enter the etching machine spray system, causing the etching factor to decrease significantly and not meeting the production requirements. UTILITY MODEL CONTENT

[0007] In view of the problems in the prior art, the utility model discloses a kind of degassing device and recycling system device of etching waste liquid electrolysis chlorine gas dissolving absorption liquid, to solve the problem that air is dispersed in etching liquid with micro-bubble air bubble, after entering the etching machine spray system, make that etching factor significantly reduces, cannot satisfy production requirement.

[0008] To achieve this purpose, the utility model adopts the following technical solutions:

[0009] First, the utility model provides a kind of degassing device of etching waste liquid electrolysis chlorine gas dissolving absorption liquid, the degassing device of etching waste liquid electrolysis chlorine gas dissolving absorption liquid includes:

[0010] Flow chamber, and at least one ultrasonic generator being arranged in the flow chamber, extraction end being arranged at the top of the flow chamber;

[0011] At least one underflow baffle and at least one overflow baffle are sequentially arranged in the flow chamber along the liquid inlet direction of fluid;

[0012] The surface of the underflow baffle and overflow baffle is all crossed with the liquid inlet direction of flow chamber.

[0013] The degassing device provided by the utility model is formed by using ultrasonic generator to cooperate with underflow baffle and overflow baffle, and strong turbulent field is formed, and the effective removal of fluid air is realized by cooperating with extraction end, so as to improve the chlorine gas recycling effect of chlorine gas generated when electrolytic regeneration etching waste liquid, guarantee that etching factor of etching line is basically unchanged after chlorine gas recycling.

[0014] As preferred technical scheme of the utility model, the distance between the top of the underflow baffle and the top of the flow chamber is less than the distance between the bottom of the underflow baffle and the bottom of the flow chamber;

[0015] The underflow baffle is tightly connected with the side surface of the flow chamber.

[0016] As preferred technical scheme of the utility model, the distance between the top of the underflow baffle and the top of the flow chamber is 0.1-0.2 times of the height of the flow chamber;

[0017] The distance between the bottom of the underflow baffle and the bottom of the flow chamber is 0.2-0.4 times of the height of the flow chamber.

[0018] As preferred technical scheme of the utility model, the distance between the top of the overflow baffle and the top of the flow chamber is 0.3-0.4 times of the height of the flow chamber;

[0019] The overflow baffle is tightly connected with the bottom surface and side surface of the flow chamber.

[0020] As the preferred technical scheme of the utility model, the top of the underflow baffle is higher than the liquid inlet of the flow chamber.

[0021] As the preferred technical scheme of the utility model, the top of the overflow baffle is higher than the liquid outlet of the flow chamber.

[0022] As the preferred technical scheme of the utility model, the ultrasonic generator is arranged between the underflow baffle and the overflow baffle.

[0023] In the second aspect, the utility model provides a kind of etching waste liquid electrolytic chlorine gas recycling system device, and the etching waste liquid electrolytic chlorine gas recycling system device includes:

[0024] Electrolytic equipment, the chlorine gas outlet of the electrolytic equipment is connected with dissolving absorption end;

[0025] The dissolving absorption end is connected with etching end by the degassing device of etching waste liquid electrolytic chlorine gas dissolving absorption liquid as described in the first aspect;

[0026] The etching liquid circulating outlet of the etching end is connected with dissolving absorption end.

[0027] As the preferred technical scheme of the utility model, the gas phase outlet of the electrolytic equipment is connected with the material inlet of dissolving absorption end by jetifier;

[0028] The liquid phase inlet of the jetifier is connected with the etching liquid circulating outlet of etching end.

[0029] As the preferred technical scheme of the utility model, the electrolytic equipment is connected with the etching liquid inlet of etching end by regenerative liquid deployment equipment;

[0030] The liquid inlet of the electrolytic equipment is connected with the etching liquid outlet of the etching end.

[0031] Compared with prior art scheme, the utility model has the following beneficial effects:

[0032] The degassing device provided by the utility model forms strong turbulent field by adopting ultrasonic generator cooperated with underflow baffle and overflow baffle, and realizes the effective removal of dispersed gas in liquid by cooperating with air extraction end, avoids that dispersed gas in etching liquid enters etching procedure and produces influence on etching operation, thereby improves the utilization effect of chlorine gas generated when electrolyzing regenerated etching waste liquid, and guarantees that etching factor of etching line after recycling chlorine gas generated by electrolysis does not change substantially. BRIEF DESCRIPTION OF DRAWINGS

[0033] Figure 1 It is the schematic diagram of the degassing device of etching waste liquid electrolytic chlorine gas dissolving absorption liquid provided by the utility model embodiment;

[0034] Figure 2 is a schematic view of the recycling system device for etching waste liquid electrolysis chlorine gas provided by the embodiment of the present application.

[0035] In the figure: 100 - degassing device, 110 - ultrasonic generator, 120 - undercurrent baffle, 130 - overflow baffle, 140 - air extraction end, 150 - liquid inlet, 160 - liquid outlet, 200 - electrolysis equipment, 300 - dissolution and absorption end, 400 - jet device, 500 - etching end, 600 - regenerated liquid preparation equipment.

[0036] The present application will be further described in detail below. However, the following examples are only simple examples of the present application, and do not represent or limit the protection scope of the present application, and the protection scope of the present application is subject to the claims. DETAILED DESCRIPTION

[0037] In order to better illustrate the present application, facilitate understanding of the technical scheme of the present application, the typical but non-limiting embodiments of the present application are as follows:

[0038] The present embodiment provides a degassing device for etching waste liquid electrolysis chlorine gas dissolution and absorption liquid, as shown in the figure, the degassing device 100 for etching waste liquid electrolysis chlorine gas dissolution and absorption liquid comprises: Figure 1

[0039] Overflow chamber, and at least one ultrasonic generator 110 arranged in the overflow chamber, air extraction end 140 arranged at the top of the overflow chamber;

[0040] At least one undercurrent baffle 120 and at least one overflow baffle 130 are arranged in the overflow chamber along the liquid inlet direction of the fluid in sequence.

[0041] The surface of the undercurrent baffle 120 and the overflow baffle 130 is intersected with the liquid inlet direction of the overflow chamber.

[0042] In the present application, the air extraction end 140 is arranged at the top of the overflow chamber, which ensures that the internal gas phase space of the degassing device 100 is in a micro-negative pressure state, which is beneficial to the overflow of the gas in the liquid phase.

[0043] ​The utility model discloses, the effect of ultrasonic wave is dissolved in the gas of liquid and the small bubble suspended in liquid into the big bubble with high buoyancy. When high power ultrasonic wave is coupled to liquid, liquid is compressed and expands in high pressure and low pressure cycle respectively. In low pressure cycle, tiny vacuum bubble is produced, and the dissolved gas or dispersed bubble in liquid enters vacuum bubble, so vacuum bubble becomes big bubble that grows unceasingly, and big bubble rises to the surface of liquid and breaks, thereby realizing degassing, thereby under the action of ultrasonic stirring and turbulent flow, the escape of bubble is accelerated, further with the help of underflow baffle 120 and overflow baffle 130, turbulent flow effect is intensified, and the reuse of regenerative etching liquid is guaranteed to have no influence on etching factor.

[0044] The utility model discloses, etching factor refers to the ratio of vertical etching depth and lateral etching width, and the formula is = line thickness / (0.5 * (line bottom width - line top width)).

[0045] The utility model discloses, the surface of underflow baffle 120 and overflow baffle 130 all with the liquid inlet direction of flow chamber is crossed, such as can be the surface of underflow baffle 120 and overflow baffle 130 all with the liquid inlet direction of flow chamber is perpendicular, or be a certain angle etc.

[0046] The utility model discloses, the number of ultrasonic generator 110, underflow baffle 120 and overflow baffle 130 is specifically according to the gas content of liquid to carry out reasonable selection, and can guarantee that effective degassing of liquid can be realized.

[0047] The utility model discloses, the operation parameter such as power and / or frequency of ultrasonic generator 110, adopts the conventional requirement of the field to combine the gas content in liquid and carries out reasonable design.

[0048] The top of underflow baffle 120 is less than the distance between the bottom of underflow baffle 120 and the bottom of flow chamber.

[0049] The utility model discloses, the operation parameter such as power and / or frequency of ultrasonic generator 110, adopts the conventional requirement of the field to combine the gas content in liquid and carries out reasonable design.

[0050] The top of underflow baffle 120 is less than the distance between the bottom of underflow baffle 120 and the bottom of flow chamber.

[0051] The distance between the top of the overflow baffle 130 and the top of the overflow chamber is 0.3-0.4 times the height of the overflow chamber, for example, can be 0.3 times, 0.31 times, 0.32 times, 0.33 times, 0.34 times, 0.35 times, 0.36 times, 0.37 times, 0.38 times, 0.39 times or 0.4 times, etc., but not limited to the listed values, other values not listed in the range also meet the requirements.

[0052] The distance between the top of the overflow baffle 130 and the top of the overflow chamber is 0.3-0.4 times the height of the overflow chamber, for example, can be 0.3 times, 0.31 times, 0.32 times, 0.33 times, 0.34 times, 0.35 times, 0.36 times, 0.37 times, 0.38 times, 0.39 times or 0.4 times, etc., but not limited to the listed values, other values not listed in the range also meet the requirements.

[0053] The overflow baffle 130 is closely connected with the bottom surface and the side surface of the overflow chamber.

[0054] The top of the underflow baffle 120 is higher than the liquid inlet 150 of the overflow chamber.

[0055] The top of the overflow baffle 130 is higher than the liquid outlet 160 of the overflow chamber.

[0056] The ultrasonic wave generator 110 is arranged between the underflow baffle 120 and the overflow baffle 130.

[0057] In the utility model, the air suction end 140 is used for forming negative pressure in the overflow chamber by air suction equipment such as a wind pump, a fan and the like.

[0058] Further, the utility model provides a kind of etching waste liquid electrolytic chlorine gas recycling system device, as shown in Figure 2 The etching waste liquid electrolytic chlorine gas recycling system device comprises:

[0059] The electrolytic equipment 200 is connected with the dissolving and absorbing end 300 at chlorine gas outlet;

[0060] The dissolving and absorbing end 300 is connected with the etching end 500 by the degassing device 100 of etching waste liquid electrolytic chlorine gas dissolving and absorbing liquid as described above;

[0061] The etching liquid circulation outlet of the etching end 500 is connected with the dissolving and absorbing end 300.

[0062] In the utility model, the dissolving and absorbing end 300 is used for carrying out absorption reaction to chlorine gas generated by electrolytic equipment 200, and specifically, chlorine gas reacts with Cu + Fast reaction.

[0063] The gas phase inlet of the dissolving and absorbing end 300 is connected with the gas phase outlet of the electrolysis device 200 through the jet device 400.

[0064] The liquid phase inlet of the jet device 400 is connected with the etching liquid circulating outlet of the etching end 500.

[0065] The chlorine gas generated by the electrolysis device 200 is mixed with the etching liquid of the etching end 500 through the jet device 400, and then is input into the dissolving and absorbing end 300 for absorption, and then is degassed through the degassing device 100, and then the etching liquid is input into the etching end 500.

[0066] In the utility model, the etching end 500 is used for etching, and with the etching, acidic etching waste liquid is formed, the formed acidic etching waste liquid is electrolyzed and regenerated, and then is adjusted through the regenerated liquid adjusting device 600, and then is returned to the etching end 500 for use.

[0067] The liquid inlet of the electrolysis device 200 is connected with the etching liquid outlet of the etching end 500.

[0068] Further, in order to illustrate the good degassing effect of the degassing device provided by the utility model, the following actual examples are used for illustration, and the details are as follows:

[0069] Example 1

[0070] The embodiment provides a recycling system device of etching waste liquid electrolysis chlorine gas, which comprises:

[0071] The electrolysis device is connected with the dissolving and absorbing end through the chlorine gas outlet.

[0072] The dissolving and absorbing end is connected with the etching end through the degassing device of etching waste liquid electrolysis chlorine gas dissolving and absorbing liquid.

[0073] The etching liquid circulating outlet of the etching end is connected with the dissolving and absorbing end.

[0074] The gas phase inlet of the dissolving and absorbing end is connected with the gas phase outlet of the electrolysis device through the jet device; the liquid phase inlet of the jet device is connected with the etching liquid circulating outlet of the etching end.

[0075] The electrolysis device is connected with the etching liquid inlet of the etching end through the regenerated liquid adjusting device; the liquid inlet of the electrolysis device is connected with the etching liquid outlet of the etching end.

[0076] The degassing device for electrolytic chlorine gas dissolved absorption liquid of the etching waste liquid comprises an overflow chamber, an ultrasonic generator arranged in the overflow chamber, and an air extraction end arranged at the top of the overflow chamber; a submerged flow baffle and an overflow baffle are sequentially arranged in the overflow chamber along the liquid inlet direction; the surfaces of the submerged flow baffle and the overflow baffle are perpendicular to the liquid inlet direction of the overflow chamber; the distance between the top of the submerged flow baffle and the top of the overflow chamber is less than the distance between the bottom of the submerged flow baffle and the bottom of the overflow chamber, wherein the distance between the top of the submerged flow baffle and the top of the overflow chamber is 0.1 times the height of the overflow chamber, and the distance between the bottom of the submerged flow baffle and the bottom of the overflow chamber is 0.2 times the height of the overflow chamber; the submerged flow baffle is tightly connected with the side surface of the overflow chamber; the overflow baffle is tightly connected with the bottom surface and the side surface of the overflow chamber, and the distance between the top of the overflow baffle and the top of the overflow chamber is 0.35 times the height of the overflow chamber; the top of the submerged flow baffle is arranged higher than the liquid inlet port of the overflow chamber; the top of the overflow baffle is arranged higher than the liquid outlet port of the overflow chamber; and the ultrasonic generator is arranged between the submerged flow baffle and the overflow baffle.

[0077] The etching factor of the etching end before and after recycling of the etching liquid chlorine gas is shown in Table 1.

[0078] Further, in order to show the specific design effect of the degassing device in the utility model, the following reference examples are provided for exemplary illustration, and the specific embodiments are as follows.

[0079] Reference Example 1

[0080] The difference from Example 1 is that the submerged flow baffle is not arranged in the overflow chamber.

[0081] Reference Example 2

[0082] The difference from Example 1 is that the overflow baffle is not arranged in the overflow chamber.

[0083] Reference Example 3

[0084] The difference from Example 1 is that the ultrasonic generator is not arranged in the overflow chamber.

[0085] Reference Example 4

[0086] The difference from Example 1 is that the air extraction end is not arranged at the top of the overflow chamber, but the air outlet is still retained, that is, no negative pressure is formed.

[0087] The etching factor of the etching end before and after recycling of the etching liquid chlorine gas is shown in Table 1.

[0088] Table 1

[0089]

[0090] Through the above examples, the degassing device can ensure that the generated chlorine gas during electrolytic etching liquid regeneration is reused without adversely affecting the etching production line, thereby improving the stability of the acid etching liquid electrolytic regeneration and reuse process.

[0091] The preferred embodiments of the utility model are described in detail above, but the utility model is not limited to the specific details in the above embodiments, and various simple modifications can be made to the technical solutions of the utility model within the technical concept of the utility model, and these simple modifications all belong to the protection scope of the utility model.

[0092] In addition, it should be noted that various specific technical features described in the above specific embodiments can be combined in any appropriate manner without contradiction, and in order to avoid unnecessary repetition, the utility model will not further describe various possible combination manners.

[0093] In addition, various different embodiments of the utility model can also be combined in any manner, as long as they do not deviate from the concept of the utility model, and they should also be considered as disclosed by the utility model.

Claims

1. A degassing device for an etching waste liquid electrolyzed with chlorine gas dissolution and absorption liquid, characterized in that, The degassing device for the etching waste liquid electrolytic chlorine dissolution absorption liquid includes: A flow chamber, and at least one ultrasonic generator disposed within the flow chamber, with an exhaust end disposed at the top of the flow chamber; The flow chamber is provided with at least one submerged flow baffle and at least one overflow baffle in sequence along the fluid inlet direction; The surfaces of both the submerged flow baffle and the overflow baffle intersect with the liquid inlet direction of the flow chamber.

2. The degassing device for the electrolytic chlorine dissolution and absorption liquid of etching waste liquid as described in claim 1, characterized in that, The distance between the top of the subsurface baffle and the top of the flow chamber is less than the distance between the bottom of the subsurface baffle and the bottom of the flow chamber. The subsurface baffle is tightly connected to the side of the flow chamber.

3. The degassing device for the electrolytic chlorine dissolution and absorption liquid of etching waste liquid as described in claim 2, characterized in that, The distance between the top of the subsurface baffle and the top of the flow chamber is 0.1-0.2 times the height of the flow chamber; The distance between the bottom of the subsurface baffle and the bottom of the flow chamber is 0.2-0.4 times the height of the flow chamber.

4. The degassing device for the electrolytic chlorine dissolution and absorption liquid of etching waste liquid as described in claim 1, characterized in that, The distance between the top of the overflow baffle and the top of the flow chamber is 0.3-0.4 times the height of the flow chamber; The overflow baffle is tightly connected to the bottom and side surfaces of the flow chamber.

5. The degassing device for the electrolytic chlorine dissolution and absorption liquid of etching waste liquid as described in claim 1, characterized in that, The top of the subsurface baffle is positioned above the liquid inlet of the flow chamber.

6. The degassing device for the electrolytic chlorine dissolution and absorption liquid of etching waste liquid as described in claim 1, characterized in that, The top of the overflow baffle is positioned above the liquid outlet of the flow chamber.

7. The degassing device for the electrolytic chlorine dissolution and absorption liquid of etching waste liquid as described in claim 1, characterized in that, The ultrasonic generator is positioned between the subsurface baffle and the overflow baffle.

8. A system for recycling chlorine gas from the electrolysis of etching waste liquid, characterized in that, The etching waste liquid electrolysis chlorine gas recycling system includes: An electrolysis device, wherein the chlorine outlet of the electrolysis device is connected to the dissolution and absorption end; The dissolution and absorption end is connected to the etching end through a degassing device for the chlorine dissolution and absorption liquid of the etching waste liquid as described in any one of claims 1-7. The etching solution circulation outlet at the etching end is connected to the dissolution and absorption end.

9. The system for recycling chlorine gas from etching waste liquid as described in claim 8, characterized in that, The gas phase outlet of the electrolysis equipment is connected to the material inlet of the dissolution and absorption end via an ejector. The liquid phase inlet of the jet injector is connected to the etching solution circulation outlet at the etching end.

10. The system for recycling chlorine gas from etching waste liquid as described in claim 8, characterized in that, The electrolysis equipment is connected to the etching solution inlet at the etching end via a regeneration solution preparation device; The inlet of the electrolysis equipment is connected to the etching solution outlet of the etching end.

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