Exhaust device exhaust system
By employing multi-stage scrubbers and gas delivery devices in epitaxy equipment, and utilizing anti-clogging gas to remove waste gas deposits, the problem of pipeline blockage in epitaxy equipment is solved, extending equipment life and improving production efficiency.
Patent Information
- Application Number
- CN202423314105.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2026-01-20
- Estimated Expiration
- 2034-12-31
AI Technical Summary
The problem of easy blockage in the exhaust gas transmission pipes of epitaxial equipment affects production efficiency and equipment lifespan.
The system employs multi-stage scrubbers and gas delivery devices. By supplying anti-clogging gases, such as inert gases, to the pipelines, it prevents waste gas from depositing and removes deposits through physical or chemical means, ensuring unobstructed pipeline flow.
It effectively prevents pipe blockage, extends service life, reduces maintenance frequency, and improves production efficiency.
Smart Images
Figure CN223810938U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of semiconductor equipment, in particular to an epitaxial equipment exhaust system. BACKGROUND
[0002] The epitaxial equipment is used for producing epitaxial layer of semiconductor, and the epitaxial layer is a thin film of high-quality crystal grown on the surface of semiconductor substrate, which is used to improve the performance of semiconductor devices or realize specific functions.
[0003] During the epitaxial process in the epitaxial equipment, the required gas needs to be introduced into the equipment, and after the process is completed, the gas is discharged through the exhaust port of the epitaxial equipment and then subjected to washing treatment. However, the exhaust gas is prone to deposit in the pipeline during the transmission between the epitaxial equipment and the scrubber, thereby causing the pipeline to be blocked. SUMMARY
[0004] Therefore, it is necessary to provide an epitaxial equipment exhaust system to solve the problem of easy blocking of the exhaust gas transmission pipeline of the epitaxial equipment in the prior art.
[0005] An epitaxial equipment exhaust system, comprising:
[0006] a first scrubber, a second scrubber and a third scrubber;
[0007] an epitaxial equipment, comprising a first process cavity, a second process cavity and a conveying cavity, the conveying cavity being communicated with the first process cavity and the second process cavity; the first process cavity comprising a first exhaust outlet and a first cleaning gas outlet, the second process cavity comprising a second exhaust outlet and a second cleaning gas outlet, the first exhaust outlet being connected to the first scrubber through a first pipeline, the second exhaust outlet being connected to the second scrubber through a second pipeline, and the first cleaning gas outlet and the second cleaning gas outlet being simultaneously connected to the third scrubber through a third pipeline;
[0008] a gas conveying device connected to the first pipeline, the second pipeline and the third pipeline, for conveying anti-blocking gas to the first pipeline, the second pipeline and the third pipeline.
[0009] In one embodiment, the epitaxial equipment exhaust system further comprises a first process gas pump comprising a first outlet and a second outlet, the first outlet being communicated with the first process cavity; the first pipeline comprises:
[0010] a first main pipeline, one end of which is communicated with the first exhaust outlet, and the other end of which is connected to the first scrubber;
[0011] The first branch pipe and the second branch pipe are both communicated with the first main pipe, and the second branch pipe is closer to the first scrubber than the first branch pipe; the first branch pipe and the second branch pipe are both connected with the gas conveying device for conveying the anti-blocking gas;
[0012] The third branch pipe is communicated with the second branch pipe at one end and communicated with the second gas outlet of the first process gas pump at the other end.
[0013] In one of the embodiments, the first branch pipe is arranged at an acute angle with the main pipe; and / or,
[0014] The second branch pipe is arranged at an acute angle with the main pipe; and / or,
[0015] The third branch pipe is arranged at an acute angle with the second branch pipe.
[0016] In one of the embodiments, the included angle between the first branch pipe and the main pipe is 20°-40°; and / or,
[0017] The included angle between the second branch pipe and the main pipe is 20°-40°; and / or,
[0018] The included angle between the third branch pipe and the second branch pipe is 20°-40°.
[0019] In one of the embodiments, the first branch pipe is connected to the first position of the first main pipe, the second branch pipe is connected to the second position of the first main pipe, and the third branch pipe is connected to the third position of the second branch pipe;
[0020] The distance between the first position and the second position is less than the distance between the second position and the third position, and the distance between the first position and the first scrubber is greater than the distance between the second position and the third position.
[0021] In one of the embodiments, the third pipe comprises:
[0022] The second main pipe is communicated with the conveying cavity at one end and connected with the third scrubber at the other end;
[0023] The fourth branch pipe and the fifth branch pipe are both communicated with the second main pipe, and the fifth branch pipe is closer to the third scrubber than the fourth branch pipe; the fourth branch pipe and the fifth branch pipe are both connected with the gas conveying device for conveying the anti-blocking gas;
[0024] The sixth branch pipe is communicated with the first cleaning gas outlet at one end and communicated with the fifth branch pipe at the other end;
[0025] The seventh branch pipeline has one end communicated with the second cleaning gas outlet and the other end communicated with the fifth branch pipeline.
[0026] In one of the embodiments, the epitaxial equipment exhaust system further comprises a gas purification assembly, the gas purification assembly comprises a third gas outlet, a fourth gas outlet and a fifth gas outlet, the third gas outlet is communicated with the first process cavity, the fourth gas outlet is communicated with the second process cavity;
[0027] The third pipeline further comprises an eighth branch pipeline, one end of the eighth branch pipeline is communicated with the fifth gas outlet and the other end is communicated with the fifth branch pipeline.
[0028] In one of the embodiments, the fourth branch pipeline is connected to a fourth position of the second main pipeline, the fifth branch pipeline is connected to a fifth position of the second main pipeline, the sixth branch pipeline is connected to a sixth position of the fifth branch pipeline, the seventh branch pipeline is connected to a seventh position of the fifth branch pipeline, and the eighth branch pipeline is connected to an eighth position of the fifth branch pipeline.
[0029] The distance between the fourth position and the fifth position is less than the distance between the fifth position and the sixth position, the distance between the eighth position and the seventh position and the distance between the seventh position and the sixth position are equal and less than the distance between the fifth position and the sixth position.
[0030] In one of the embodiments, the third pipeline further comprises a ninth branch pipeline, one end of the ninth branch pipeline is connected to the fifth branch pipeline and the other end is sealed by a detachable piece.
[0031] In one of the embodiments, the epitaxial equipment exhaust system further comprises:
[0032] A fourth scrubber, the outlet ends of the first scrubber, the second scrubber and the third scrubber are connected to the inlet end of the fourth scrubber, and the outlet end of the fourth scrubber is connected to a waste gas and liquid collector.
[0033] In the above epitaxial equipment exhaust system, the epitaxial equipment, the first scrubber, the second scrubber, the third scrubber and the gas conveying device are included. The epitaxial equipment comprises a first process cavity and a second process cavity, and each process cavity is provided with a waste gas outlet and a cleaning gas outlet. The waste gas outlets of the first process cavity and the second process cavity are connected to the first scrubber and the second scrubber respectively, and the cleaning gas outlets of the first process cavity and the second process cavity are connected to the third scrubber simultaneously. The gas conveying device introduces anti-blocking gas into the pipelines of the first scrubber, the second scrubber and the third scrubber, and the pipelines are flushed by the anti-blocking gas to avoid pipeline blockage, thereby prolonging the service life of the pipeline system, reducing the frequency of maintenance and cleaning, and improving the overall production efficiency. Attached Figure Description
[0034] Figure 1 This is a schematic diagram of the exhaust system of the epitaxial device in some embodiments;
[0035] Figure 2 This is a schematic diagram of the structure of the second pipeline in some embodiments;
[0036] Figure 3 This is a schematic diagram of the third pipeline in some embodiments.
[0037] Explanation of reference numerals in the attached figures:
[0038] 11. Extensional equipment; 111. First process chamber; 112. Second process chamber; 113. Transfer chamber; 12. First scrubber; 13. Second scrubber; 14. Third scrubber; 15. Fourth scrubber; 16. Waste gas and waste liquid collector; 17. First process gas pump; 18. Second process gas pump; 19. Gas purification assembly; 21. First pipeline; 211. First main pipeline; 212. First branch pipeline; 213. Second branch pipeline; 214. Third branch pipeline; 22. Third pipeline; 221. Second main pipeline; 222. Fourth branch pipeline; 223. Fifth branch pipeline; 224. Sixth branch pipeline; 225. Seventh branch pipeline; 226. Eighth branch pipeline; 227. Ninth branch pipeline. Detailed Implementation
[0039] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.
[0040] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0041] In the present application, unless otherwise clearly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise clearly limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0042] Referring to Figure 1 , Figure 1 The structure of the epitaxial equipment exhaust system in an embodiment of the present application is shown. An epitaxial equipment exhaust system provided by an embodiment of the present application comprises an epitaxial equipment, a plurality of scrubbers and a gas conveying device. The exhaust gas discharged from the process cavities of the epitaxial equipment enters the scrubbers through pipelines for scrubbing, and the exhaust gas treatment is completed. The gas conveying device is in communication with the pipelines and conveys anti-blocking gas into the pipelines to avoid the deposition of the exhaust gas in the pipelines and thus avoid the blockage of the pipelines.
[0043] Specifically, the epitaxial equipment exhaust system comprises at least three scrubbers, i.e., a first scrubber 12, a second scrubber 13 and a third scrubber 14.
[0044] The epitaxial equipment 11 comprises a first process cavity 111, a second process cavity 112 and a conveying cavity 113. The conveying cavity 113 is in communication with the first process cavity 111 and the second process cavity 112. The first process cavity 111 comprises a first exhaust gas outlet and a first cleaning gas outlet. The second process cavity 112 comprises a second exhaust gas outlet and a second cleaning gas outlet. The first exhaust gas outlet is connected to the first scrubber 12 through a first pipeline 21. The second exhaust gas outlet is connected to the second scrubber 13 through a second pipeline. The first cleaning gas outlet and the second cleaning gas outlet are simultaneously connected to the third scrubber 14 through a third pipeline 22.
[0045] In this way, the exhaust gas discharged from the first exhaust gas outlet of the first process cavity 111 can be conveyed into the first scrubber 12 through the first pipeline 21. The exhaust gas discharged from the second exhaust gas outlet of the second process cavity 112 can be conveyed into the second scrubber 13 through the second pipeline.
[0046] Exemplarily, the cleaning gas can be inert gas such as nitrogen. After the first process cavity 111 and the second process cavity 112 are subjected to gas washing, the cleaning gas is discharged from the first cleaning gas outlet and the second cleaning gas outlet, respectively, and is conveyed into the third scrubber 14 through the third pipeline 22.
[0047] The gas delivery device is connected to each of the first pipeline 21, the second pipeline, and the third pipeline 22, and is configured to deliver the anti-clogging gas to the first pipeline 21, the second pipeline, and the third pipeline 22. The gas delivery device delivers the anti-clogging gas to the first pipeline 21, the second pipeline, and the third pipeline 22, and the anti-clogging gas physically or chemically reacts with the deposits in the pipelines to effectively remove the deposits.
[0048] Specifically, the anti-clogging gas can improve the flowability of the exhaust gas by flowing at a high speed to prevent the exhaust gas from depositing, can blow the deposits away from the pipeline wall by the impact of the gas flow, or can convert the deposits into substances that are easy to discharge by chemically reacting with the deposits. In this way, not only the accumulated substances in the pipeline can be removed, but also further deposition can be prevented, so that the pipeline can always remain unblocked and the epitaxial process can be performed normally. In addition, by periodically delivering the anti-clogging gas, the service life of the pipeline system can be effectively prolonged, the frequency of maintenance and cleaning can be reduced, and the overall production efficiency can be improved.
[0049] The above-described epitaxial device exhaust system includes the epitaxial device 11, the first scrubber 12, the second scrubber 13, the third scrubber 14, and the gas delivery device. The epitaxial device 11 includes the first process chamber 111 and the second process chamber 112, each of which is provided with an exhaust gas outlet and a cleaning gas outlet. The exhaust gas outlets of the first process chamber 111 and the second process chamber 112 are connected to the first scrubber 12 and the second scrubber 13, respectively, and the cleaning gas outlets of the first process chamber 111 and the second process chamber 112 are connected to the third scrubber 14 at the same time. The gas delivery device delivers the anti-clogging gas to the pipelines of the first scrubber 12, the second scrubber 13, and the third scrubber 14, and the anti-clogging gas flushes the pipelines to prevent the pipelines from being blocked, thereby prolonging the service life of the pipeline system, reducing the frequency of maintenance and cleaning, and improving the overall production efficiency.
[0050] In some embodiments, when the epitaxial process is performed, at least one of hydrogen, hydrogen chloride, chloroform, phosphine, borane, and silane is delivered into the first process chamber 111 and the second process chamber 112, and any of the above may be included in the exhaust gas. The exhaust gas is in a high-temperature state in the first process chamber 111 and / or the second process chamber 112, and when it flows in the cooled pipeline, it is easily liquefied and deposited, causing the scrubber to be blocked.
[0051] By delivering the anti-clogging gas into the first pipeline 21, the second pipeline (not shown in the figure, which can have the same structure as the first pipeline 21), and the third pipeline 22, the anti-clogging gas physically or chemically reacts with the exhaust gas in the pipelines to limit the liquefaction of the exhaust gas, thereby preventing the pipelines from being blocked. Exemplarily, the anti-clogging gas can be an inert gas such as nitrogen, helium, or argon, which does not react with the exhaust gas and prevents the exhaust gas from depositing by promoting the flow of the exhaust gas.
[0052] In some embodiments, the epitaxial equipment exhaust system further comprises: a first process gas pump 17 comprising a first outlet and a second outlet, the first outlet being in communication with the first process cavity 111. Exemplarily, the first process gas pump 17 can be any one of hydrogen, hydrogen chloride, chloroform, phosphine, borane, silane, and the first process gas pump 17 is in communication with the first process cavity 111 and is capable of sending the gas required by the epitaxial process into the first process cavity 111. In some embodiments, a second process gas pump 18 is further included, one outlet of the second process gas pump 18 being in communication with the second process cavity 112 and the other outlet being in communication with the second pipeline.
[0053] Referring to Figure 2 , Figure 2 A structural schematic diagram of the first pipeline 21 in some embodiments is shown. The first pipeline 21 comprises a first main pipeline 211, a first branch pipeline 212, a second branch pipeline 213 and a third branch pipeline 214, the first branch pipeline 212 and the second branch pipeline 213 being branches of the first main pipeline 211, and the third branch pipeline 214 being a branch of the second branch pipeline 213. One end of the first main pipeline 211 is in communication with the first waste gas outlet, and the other end is connected to the first scrubber 12, so that the waste gas of the first process cavity 111 can be transmitted to the first scrubber 12 via the first main pipeline 211.
[0054] The first branch pipeline 212 and the second branch pipeline 213 are both in communication with the first main pipeline 211, and the second branch pipeline 213 is closer to the first scrubber 12 than the first branch pipeline 212; the first branch pipeline 212 and the second branch pipeline 213 are both connected to a gas conveying device for conveying anti-blocking gas. In this way, the anti-blocking gas can be simultaneously input into the first main pipeline 211 from the first branch pipeline 212 and the second branch pipeline 213 to promote the flow of the waste gas and improve the flow rate of the waste gas in the first main pipeline 211.
[0055] The second branch pipeline 213 has a distance from the first branch pipeline 212, so that the anti-blocking gas is graded into the first main pipeline 211, and the graded input can ensure that appropriate pushing force is obtained in different regions of the waste gas pipeline, thereby improving the pushing effect on the waste gas.
[0056] One end of the third branch pipeline 214 is in communication with the second branch pipeline 213, and the other end is in communication with the second outlet of the first process gas pump 17. In this way, the first process gas pump 17 can also deliver gas from the third branch pipeline 214 to the first main pipeline 211, and when the first process gas pump 17 is initially operated, the gas output is unstable, at which time the gas can be first discharged to the first main pipeline 211 through the second outlet, and after the gas output of the first process gas pump 17 is stable, the epitaxial process gas can be delivered to the first process cavity 111 through the first outlet.
[0057] It can be understood that the second pipeline can be the same structure as the first pipeline 21, which will not be repeated here. Under such conditions, the first process cavity 111 and the second process cavity 112 can respectively exhaust waste gas through the first pipeline 21 and the second pipeline, and when the first process cavity 111 is abnormal, the epitaxial process can be performed using the second process cavity 112, and when the second process cavity 112 is abnormal, the epitaxial process can be performed using the first process cavity 111, thereby avoiding the influence of the damaged process chamber on the production efficiency.
[0058] In some embodiments, the first branch pipeline 212 is arranged at an acute angle with the main pipeline; and / or, the second branch pipeline 213 is arranged at an acute angle with the main pipeline; and / or, the third branch pipeline 214 is arranged at an acute angle with the second branch pipeline 213. Such design can effectively avoid gas backflow, reduce turbulence and stagnation of gas flow in the pipeline, thereby improving the pushing effect of the waste gas. Specifically, the acute angle connection between the pipelines can reduce the backflow phenomenon during gas flow, ensure that the gas flow can continuously and smoothly advance forward, avoid waste gas accumulation or local flow rate reduction caused by gas backflow, and prevent clogging problems in the system.
[0059] At the same time, by designing the acute angle arrangement between different branch pipelines and the main pipeline and between each branch pipeline, the reverse flow area of the gas in the pipeline can be effectively reduced, and the gas flow resistance caused by the reverse or uneven gas flow can be reduced. The anti-clogging gas can push the waste gas in a more uniform and efficient manner, further improving the stability of the waste gas flow and the overall working efficiency.
[0060] Further, the included angle between the first branch pipeline 212 and the main pipeline is 20°-40°; and / or, the included angle between the second branch pipeline 213 and the main pipeline is 20°-40°; and / or, the included angle between the third branch pipeline 214 and the second branch pipeline 213 is 20°-40°. By designing the included angle between each branch pipeline and the main pipeline and the included angle between the branch pipelines within this range, the flow direction of the gas flow can be effectively balanced, and the gas flow rate and flow path can be optimized, thereby avoiding unnecessary flow interference and backflow phenomenon, and maintaining the continuity and stability of the anti-clogging gas flow.
[0061] In some embodiments, the first branch pipeline 212 is connected to a first position of the first main pipeline 211, the second branch pipeline 213 is connected to a second position of the first main pipeline 211, and the third branch pipeline 214 is connected to a third position of the second branch pipeline 213.
[0062] The distance between the first position and the second position is less than the distance between the second position and the third position, at this time, the turning and flow path change of the gas flow is relatively small, thereby the pressure loss and flow resistance of the gas flow when passing through these positions can be reduced, and the turbulence and backflow phenomenon in the first main pipeline 211 can also be reduced.
[0063] The distance from the first position to the first scrubber 12 is greater than the distance between the second position and the third position. At this time, the anti-blocking gas will pass through a longer pipeline before entering the first scrubber 12, which helps to reduce the flow rate of the gas entering the first scrubber 12, thereby improving the working efficiency of the scrubber. The longer pipeline section can allow the gas flow to be fully pre-processed or cooled before reaching the scrubber, avoiding the gas flow being too fast and causing the scrubbing efficiency to decrease.
[0064] As shown in FIG. 1, Figure 3 Figure 3 FIG. 2 shows a schematic diagram of the structure of the third pipeline 22 in some embodiments. In some embodiments, the third pipeline 22 includes a second main pipeline 221, a fourth branch pipeline 222, a fifth branch pipeline 223, a sixth branch pipeline 224, and a seventh branch pipeline 225, the fourth branch pipeline 222 and the fifth branch pipeline 223 being branch pipelines of the second main pipeline 221, and the sixth branch pipeline 224 and the seventh branch pipeline 225 being branch pipelines of the fifth branch pipeline 223.
[0065] Specifically, one end of the second main pipeline 221 is in communication with the conveying cavity 113, and the other end is connected to the third scrubber 14, so that the gas in the conveying cavity 113 can be transmitted to the third scrubber 14 through the second main pipeline 221.
[0066] The fourth branch pipeline 222 and the fifth branch pipeline 223 are both in communication with the second main pipeline 221, and the fifth branch pipeline 223 is closer to the third scrubber 14 than the fourth branch pipeline 222; the fourth branch pipeline 222 and the fifth branch pipeline 223 are both connected to the gas conveying device for transmitting the anti-blocking gas.
[0067] The fourth branch pipeline 222 and the fifth branch pipeline 223 are both in communication with the second main pipeline 221, and the fifth branch pipeline 223 is closer to the first scrubber 12 than the fourth branch pipeline 222; the fourth branch pipeline 222 and the fifth branch pipeline 223 are both connected to the gas conveying device for transmitting the anti-blocking gas. In this way, the anti-blocking gas can be simultaneously input into the second main pipeline 221 from the fourth branch pipeline 222 and the fifth branch pipeline 223 to promote the flow of the waste gas and improve the flow rate of the waste gas in the second main pipeline 221.
[0068] The fifth branch pipeline 223 has a distance from the fourth branch pipeline 222, so that the anti-blocking gas is graded into the second main pipeline 221, and the graded input can ensure that appropriate pushing force is obtained in different regions of the waste gas pipeline, thereby improving the pushing effect on the waste gas.
[0069] One end of the sixth branch pipe 224 is in communication with the first purge gas outlet, and the other end is in communication with the fifth branch pipe 223. One end of the seventh branch pipe 225 is in communication with the second purge gas outlet, and the other end is in communication with the fifth branch pipe. In this way, the purge gas of the first process cavity 111 can be output from the first purge gas outlet into the second main pipe 221, and the purge gas of the second process cavity 112 can be output from the second purge gas outlet into the second main pipe 221, and further into the third scrubber 14 for scrubbing treatment.
[0070] In some embodiments, the epitaxial equipment exhaust system further comprises a gas purification assembly 19, the gas purification assembly 19 comprising a third gas outlet, a fourth gas outlet and a fifth gas outlet, the third gas outlet being in communication with the first process cavity 111, and the fourth gas outlet being in communication with the second process cavity 112. In turn, the gas purification assembly 19 can provide purified gas to the first process cavity 111 and the second process cavity 112, ensuring the purity of the gas inside the first process cavity 111 and the second process cavity 112.
[0071] The third pipe 22 further comprises an eighth branch pipe 226, one end of the eighth branch pipe 226 being in communication with the fifth gas outlet, and the other end being in communication with the fifth branch pipe 223. In this way, the gas purification assembly 19 can exhaust gas into the eighth branch pipe 226. In the early work of the gas purification assembly 19, the gas purity is not high, and the gas with low purity is first discharged to the eighth branch pipe 226 through the fifth gas outlet, and then input to the first process cavity 111 and the second process cavity 112 when the gas purity meets the requirements.
[0072] In some embodiments, the fourth branch pipe 222 is connected to a fourth position of the second main pipe 221, the fifth branch pipe 223 is connected to a fifth position of the second main pipe 221, the sixth branch pipe 224 is connected to a sixth position of the fifth branch pipe 223, the seventh branch pipe 225 is connected to a seventh position of the fifth branch pipe 223, and the eighth branch pipe 226 is connected to an eighth position of the fifth branch pipe 223.
[0073] The distance between the fourth position and the fifth position is less than the distance between the fifth position and the sixth position, ensuring that the flow rate between the fourth and fifth branch pipes 223 changes less during the anti-clogging gas transmission process, avoiding flow fluctuations or pressure instability caused by too compact pipe layout, and thereby improving the pushing efficiency of the exhaust gas.
[0074] The distance between the eighth position and the seventh position, and the distance between the seventh position and the sixth position are equal, and less than the distance between the fifth position and the sixth position. In this way, the flow rate and pressure between the branch pipes can be balanced, avoiding local pipe overload and ensuring the balance of each pipe.
[0075] In some embodiments, the third pipeline 22 further comprises a ninth branch pipeline 227, one end of which is connected to the fifth branch pipeline, and the other end is sealed by a detachable member. The ninth branch pipeline 227 can be used as a backup pipeline. When the epitaxial device 11 uses the third process chamber, the detachable member is removed, and the ninth branch pipeline 227 can be communicated.
[0076] In the embodiment, the necessary redundancy can be provided in the exhaust system to ensure the stable operation and reliability of the system under different working conditions, and to enhance the adaptability and efficiency of the entire pipeline system. In addition, the detachability in design also facilitates maintenance and replacement work, reduces system downtime and operation and maintenance costs.
[0077] In some embodiments, the epitaxial device exhaust system further comprises a fourth scrubber 15, the outlet ends of the first scrubber 12, the second scrubber 13 and the third scrubber 14 are connected to the inlet end of the fourth scrubber 15, and the outlet end of the fourth scrubber 15 is connected to the exhaust gas and liquid collector 16. The exhaust gas and wastewater output by the first scrubber 12, the second scrubber 13 and the third scrubber 14 are input into the fourth scrubber 15, and the fourth scrubber 15 performs secondary washing to ensure that the exhaust gas meets higher purification standards before being discharged.
[0078] In this way, the exhaust gas discharged from the first process chamber 111 and the second process chamber 112 flows through the first scrubber 12 and the second scrubber 13, and contacts the scrubbing liquid to adsorb and dissolve harmful components therein. Then the scrubbing liquid enters the fourth scrubber 15 for secondary washing, and is then discharged into the exhaust gas and liquid collector 16, thereby reducing pollution to the environment.
[0079] The technical features of the above embodiments can be combined in any way. To make the description concise, not all possible combinations of the technical features in the above embodiments are described, but as long as the combinations of the technical features do not exist contradictory, they should be considered as the scope of the present disclosure.
[0080] The above embodiments only express several embodiments of the present application, and the description is more specific and detailed, but it should not be understood as limiting the scope of the patent. It should be noted that for those skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are within the scope of the present application. Therefore, the scope of protection of the present application should be subject to the appended claims.
Claims
1. An epitaxial apparatus exhaust system, comprising: The epitaxial equipment exhaust system comprises: a first scrubber, a second scrubber, and a third scrubber; an epitaxial equipment comprising a first process cavity, a second process cavity, and a transfer cavity, the transfer cavity being in communication with the first process cavity and the second process cavity; the first process cavity comprising a first waste gas outlet and a first cleaning gas outlet, the second process cavity comprising a second waste gas outlet and a second cleaning gas outlet, the first waste gas outlet being connected to the first scrubber through a first pipeline, the second waste gas outlet being connected to the second scrubber through a second pipeline, and the first cleaning gas outlet and the second cleaning gas outlet being simultaneously connected to the third scrubber through a third pipeline; a gas feeding device connected to the first pipeline, the second pipeline, and the third pipeline, and used for feeding an anti-blocking gas to the first pipeline, the second pipeline, and the third pipeline.
2. The epitaxial equipment exhaust system of claim 1, wherein, The epitaxial equipment exhaust system further comprises a first process gas pump comprising a first outlet and a second outlet, the first outlet being in communication with the first process cavity; the first pipeline comprises: a first main pipeline having one end in communication with the first waste gas outlet and the other end connected to the first scrubber; a first branch pipeline and a second branch pipeline, both of which are in communication with the first main pipeline, and the second branch pipeline is closer to the first scrubber than the first branch pipeline; the first branch pipeline and the second branch pipeline are both connected to the gas feeding device and used for transmitting the anti-blocking gas; a third branch pipeline having one end in communication with the second branch pipeline and the other end in communication with the second outlet of the first process gas pump.
3. The epitaxial equipment exhaust system according to claim 2, wherein: the first branch pipeline is arranged at an acute angle with the first main pipeline; and / or the second branch pipeline is arranged at an acute angle with the first main pipeline; and / or the third branch pipeline is arranged at an acute angle with the second branch pipeline.
4. The epitaxial equipment exhaust system according to claim 3, wherein: the angle between the first branch pipeline and the first main pipeline is 20°-40°; and / or the angle between the second branch pipeline and the first main pipeline is 20°-40°; and / or the angle between the third branch pipeline and the second branch pipeline is 20°-40°.
5. The epitaxial equipment exhaust system according to any one of claims 2-4, wherein: the first branch pipeline is connected to a first position of the first main pipeline, the second branch pipeline is connected to a second position of the first main pipeline, and the third branch pipeline is connected to a third position of the second branch pipeline; wherein the distance between the first position and the second position is less than the distance between the second position and the third position, and the distance between the first position and the first scrubber is greater than the distance between the second position and the third position.
6. The epitaxial equipment exhaust system of claim 1, wherein, the third pipeline comprises: a second main pipeline having one end in communication with the transfer cavity and the other end connected to the third scrubber; A fourth branch pipeline and a fifth branch pipeline, both in communication with the second main pipeline, and the fifth branch pipeline is closer to the third scrubber relative to the fourth branch pipeline; the fourth branch pipeline and the fifth branch pipeline are both connected with the gas conveying device for conveying the anti-blocking gas; A sixth branch pipeline, one end of which is in communication with the first cleaning gas outlet, and the other end of which is in communication with the fifth branch pipeline; A seventh branch pipeline, one end of which is in communication with the second cleaning gas outlet, and the other end of which is in communication with the fifth branch pipeline.
7. The epitaxial equipment exhaust system of claim 6, wherein, The epitaxial device exhaust system further comprises a gas purification assembly, the gas purification assembly comprising a third gas outlet, a fourth gas outlet and a fifth gas outlet, the third gas outlet being in communication with the first process cavity, the fourth gas outlet being in communication with the second process cavity; The third pipeline further comprises an eighth branch pipeline, one end of the eighth branch pipeline being in communication with the fifth gas outlet, and the other end of the eighth branch pipeline being in communication with the fifth branch pipeline.
8. The epitaxial device exhaust system according to claim 7, wherein, The fourth branch pipeline is connected to a fourth position of the second main pipeline, the fifth branch pipeline is connected to a fifth position of the second main pipeline, the sixth branch pipeline is connected to a sixth position of the fifth branch pipeline, the seventh branch pipeline is connected to a seventh position of the fifth branch pipeline, and the eighth branch pipeline is connected to an eighth position of the fifth branch pipeline; Wherein, the distance between the fourth position and the fifth position is less than the distance between the fifth position and the sixth position, the distance between the eighth position and the seventh position, and the distance between the seventh position and the sixth position are equal, and are less than the distance between the fifth position and the sixth position.
9. The epitaxial device exhaust system according to claim 6, wherein, The third pipeline further comprises a ninth branch pipeline, one end of the ninth branch pipeline being connected to the fifth branch pipeline, and the other end of the ninth branch pipeline being sealed by a detachable piece.
10. The epitaxial equipment exhaust system of claim 1, wherein, Further comprising: A fourth scrubber, the outlet ends of the first scrubber, the second scrubber and the third scrubber are all connected to the inlet end of the fourth scrubber, and the outlet end of the fourth scrubber is connected to a waste gas and liquid collector.