Annealing device

Abstract

The utility model discloses an annealing device which comprises a frame body, a lifting platform and a radiation lamp, an accommodating space is formed in the frame body; the lifting platform is arranged in the accommodating space, and the lifting platform is used for supporting a target component to be subjected to annealing treatment; and the radiation lamp is arranged on one side of the lifting platform and used for generating radiation light rays irradiating a target component, and the radiation light rays are used for annealing the target component. The annealing device disclosed by the utility model is used for carrying out annealing treatment on a target part in a radiation annealing manner, and the uniformity of the annealing treatment is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to annealing treatment technical field especially relates to a kind of annealing device. BACKGROUND

[0002] One of the purposes of annealing device is to carry out annealing treatment to perovskite film to prepare perovskite layer.The uniformity of annealing treatment directly affects the quality of perovskite layer, and then affects the performance of solar cell using the perovskite layer.The existing annealing device generally uses hot plate annealing, and the glass substrate coated with perovskite film is placed on the hot plate, and the heat generated by the hot plate is transmitted to the perovskite film through the glass substrate to carry out annealing treatment to the perovskite film.

[0003] The temperature of glass substrate will rise when the hot plate is heated, and the glass substrate will expand and deform during the heating process, which will cause the four edges of the glass substrate to warp and prevent it from being completely attached to the hot plate. At this time, the heat transmitted from the hot plate to the glass substrate is uneven, and the heat transmitted from the glass substrate to the perovskite film is also uneven, which will affect the annealing quality of the perovskite film and the quality of the perovskite layer formed. SUMMARY

[0004] The purpose of the utility model is to provide an annealing device for annealing treatment of target components by radiation annealing method to improve the uniformity of annealing treatment.

[0005] The purpose of the utility model is achieved by adopting the following technical solutions:

[0006] An annealing device comprises:

[0007] A frame body has an accommodation space formed inside;

[0008] A lifting platform is arranged in the accommodation space, and is used to support the target components to be annealed;

[0009] A radiation lamp is arranged on one side of the lifting platform, and is used to generate radiation light rays that irradiate the target components for annealing treatment.

[0010] Preferably, the radiation lamp is an infrared lamp, and a plurality of radiation lamps are uniformly and spacedly arranged, with the center positions of the plurality of radiation lamps located directly above the lifting platform.

[0011] Preferably, it further comprises a radiation mounting rack and a cooling fan, the radiation lamp is mounted on one side of the radiation mounting rack facing the target components, the cooling fan is mounted on the radiation mounting rack, and the cooling fan is located on the side of the radiation lamp away from the lifting platform, and the cooling fan is used to cool the radiation lamp.

[0012] Preferably, an infrared temperature detector is installed on the radiation mounting frame, and the infrared temperature detector is used to monitor the radiation temperature of the radiation lamp.

[0013] Preferably, the accommodating space is capable of being separated from the outside, and the annealing device further comprises a dust-free air purification device, which is installed on the frame body and has one side exposed to the outside and the other side exposed to the accommodating space, and the dust-free air purification device is used to filter the outside air to supply dust-free clean air to the accommodating space.

[0014] Preferably, the lifting platform comprises a support table used to support the target component, a lifting assembly used to drive the support table to move towards or away from the radiation lamp, and a manual operating member used to drive the lifting assembly to move, and a user drives the lifting assembly to move by operating the manual operating member.

[0015] Preferably, the lifting assembly comprises a gear and a rack, the rack extends in the vertical direction, the gear is connected with the manual operating member and is driven to rotate by the manual operating member, and the gear is engaged with the rack to convert the rotation of the gear into the lifting movement in the vertical direction.

[0016] Preferably, the lifting platform further comprises a fixed plate, the lifting assembly further comprises a sliding block and a sliding seat, the sliding block is fixedly connected with the fixed plate, the rack is installed on the sliding block and moves synchronously with the sliding block, the sliding seat is provided with a sliding groove, the sliding seat is fixedly connected with the support table, and the gear and the manual operating member are installed on the sliding seat; the sliding block and the sliding seat are slidingly matched to guide the lifting movement of the support table.

[0017] Preferably, the lifting assembly further comprises a scale and a pointer, the scale is installed on the sliding block, and the pointer is installed on the sliding seat and is used to indicate the scale on the scale.

[0018] Preferably, the gear and the rack are provided with one respectively, and the gear and the rack are arranged in the middle part of the lifting platform.

[0019] Preferably, the bottom of the frame body is provided with a plurality of universal wheels, and the universal wheels are arranged at the edge positions of the bottom of the frame body.

[0020] The target component comprises a glass substrate and a perovskite thin film coated on the glass substrate.

[0021] Compared with the prior art, the utility model has at least the following beneficial effects:

[0022] By setting the radiation lamp, the target component is subjected to radiation annealing, the radiation light is directly irradiated to the perovskite film of the target component, no intermediate medium such as a glass substrate is needed to conduct heat, the influence of uneven heating of the intermediate medium on the annealing quality is reduced, the uniformity of the annealing treatment is improved, and the time required for the annealing treatment can be shortened; by setting the lifting platform to support the target component, the position of the target component can be adjusted to make the target component reach the required position, and then the target component can obtain the required annealing condition. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 is the structure schematic diagram of the annealing device after removing the wall body of the embodiment of the utility model;

[0024] Figure 2 is the local structure schematic diagram of the annealing device of the embodiment of the utility model;

[0025] Figure 3 is the structure schematic diagram of the lifting platform of the embodiment of the utility model;

[0026] Figure 4 is the local structure schematic diagram of the lifting platform of the embodiment of the utility model.

[0027] In the drawing: 1, frame body; 11, containing space; 12, universal wheel; 2, lifting platform; 21, support table; 22, lifting assembly; 221, rack; 222, base plate support; 23, manual operating part; 231, rotating handle; 24, fixed plate; 25, sliding block; 26, sliding seat; 261, sliding groove; 27, scale; 28, pointer; 3, radiation mounting frame; 31, heat dissipation fan; 32, radiation lamp; 33, infrared temperature detector; 331, thermocouple TC; 4, dust-free air purification device. DETAILED DESCRIPTION

[0028] Example implementations will now be described more fully with reference to the accompanying drawings. Example implementations, however, can be implemented in many different forms and should not be construed as limited to the implementations set forth herein; rather, these implementations are provided so that this disclosure will be thorough and complete, and fully convey the inventive aspects of example implementations to those skilled in the art. Like reference numerals refer to like elements throughout the figures, and descriptions of the same elements can be omitted for brevity.

[0029] The words expressing position and direction described in the utility model are all explained by taking the drawings as examples, but changes can also be made according to needs, and the changes made are all included in the protection scope of the utility model.

[0030] As Figure 1 and Figure 2The utility model provides an annealing device, annealing device is used to carry out annealing treatment to target part, and this target part is the material that needs to carry out annealing treatment, for example, target part includes glass substrate and perovskite thin film coated on glass substrate, and perovskite thin film needs to carry out annealing treatment to form perovskite layer. Annealing device includes frame body 1, elevating platform 2 and radiation lamp 32 installed in frame body 1, in addition, annealing device can also include dustless air purification device 4, heat dissipation fan 31 and infrared temperature detector 33.

[0031] Frame body 1 includes frame and wall body installed on frame, and wall body is arranged at the circumferential side of frame and encloses a containing space 11, wherein, at least one wall body is provided with openable or closable opening and closing door, and wall body specifically includes top wall, bottom wall and side wall of annealing device. When annealing, the opening and closing door of wall body is closed, and wall body can form sealed structure so that containing space 11 is separated from the outside, when target part needs to be taken out or placed, opening and closing door can be opened to make containing space 11 communicate with the outside, at this time, target part can be taken out or placed.

[0032] In the heat plate annealing process of prior art, the heat plate is exposed to the atmosphere, and the target part on the heat plate is also exposed to the atmosphere, when annealing, the dust and other particulate matters in the environment can fall on the target part, which affects the quality of perovskite layer formed. In the present application, the target part can be placed in the containing space 11, and the containing space 11 can be separated from the outside under the action of the wall body, so as to reduce or avoid the influence of dust and other particulate matters in the external environment on the target part during annealing, and improve the quality of perovskite layer formed.

[0033] Referring to Figure 1 For the movement of annealing device, the bottom of frame body 1 is provided with universal wheel 12, and the annealing device is in contact with the ground through universal wheel 12 to facilitate the movement of the annealing device. Among them, universal wheel 12 can be provided with multiple, and universal wheel 12 can be arranged at the edge position of the bottom of frame body 1. In the embodiment, universal wheel 12 can be provided with four, and four universal wheels 12 are distributed at the four corners of frame body 1.

[0034] Referring to Figure 2The radiation lamp 32 is arranged in the accommodating space 11, and the radiation lamp 32 can be installed on the frame body 1 through the radiation mounting frame 3. Specifically, the radiation mounting frame 3 is arranged in the accommodating space 11 and fixedly installed on the frame body 1, and the radiation lamp 32 is fixedly installed on one side of the radiation mounting frame 3 facing the target component, specifically, the lower side of the radiation mounting frame 3. The radiation lamp 32 is used to generate radiation light rays irradiating towards the target component, and the target component absorbs the energy of the radiation light rays so that the target component can be annealed. Specifically, the radiation lamp 32 can be an infrared lamp, and the radiation light rays generated by the radiation lamp 32 can be infrared light rays, which irradiate to the perovskite film of the target component to heat the perovskite film, thereby realizing the annealing treatment of the perovskite film.

[0035] To ensure the uniformity of the radiation light rays and the efficiency of the radiation annealing, the radiation lamp 32 can be provided with a plurality of radiation lamps 32 uniformly distributed. The plurality of radiation lamps 32 can be used together to anneal the target component to ensure the efficiency of the radiation annealing, and the center of the whole formed by the plurality of radiation lamps 32 can be located directly above the target component to ensure the uniformity of the radiation light rays generated by the plurality of radiation lamps 32 irradiating to the target component.

[0036] By using the radiation light rays generated by the radiation lamp 32 to anneal the target component, it can be prevented that the glass substrate and other components in the target component are expanded due to heat and cause uneven heat distribution in the target component. The radiation light rays directly irradiate to the perovskite film of the target component, without the need for an intermediate medium such as a glass substrate to conduct heat, which reduces the influence of uneven heating of the intermediate medium on the annealing quality and shortens the time required for the annealing treatment.

[0037] To monitor the thermal uniformity of the radiation light rays, a thermocouple TC 331 is used for monitoring, and temperature monitoring collection points are added to the bottom plane of the target component. The actual distance between the thermocouple TC 331 and the target component can be adjusted, and can be adjusted to be in contact with the target component. The thermocouple TC 331 can be provided in a plurality, and the number is not limited, for example, the number of thermocouples TC 331 can be five or nine, and the temperature of the center and the periphery of the target component can be monitored. The thermocouple TC 331 can be set in two modes of monitoring TC and control TC, that is, any one of the thermocouples TC 331 can be set as a control TC or a monitoring TC. After being set as a control TC, the radiation temperature can be set and adjusted, and after being set as a monitoring TC, only temperature monitoring can be performed, so that the heat required by the target component is within a suitable range.

[0038] Referring to Figure 1 and Figure 2The heat dissipation fan 31 is installed on the radiation mounting frame 3, and the heat dissipation fan 31 is located on the side of the radiation mounting frame 3 away from the target component. The heat dissipation fan 31 is used for heat dissipation and cooling of the radiation lamp 32. For example, after the annealing process is completed, the heat dissipation fan 31 can accelerate the flow of gas at the radiation lamp 32 to dissipate heat and cool the radiation lamp 32, or when the temperature of the radiation lamp 32 is higher than the required value during the annealing process, the heat dissipation fan 31 can also be used to dissipate heat and cool the radiation lamp 32. The heat dissipation fan 31 can be provided with one or more. In this embodiment, the heat dissipation fan 31 is provided with two, and the two heat dissipation fans 31 are symmetrically arranged relative to the center position of the target component, and the two heat dissipation fans 31 can jointly dissipate heat and cool the radiation lamp 32.

[0039] In order to monitor the temperature change during the annealing process, an infrared temperature detector 33 can also be installed on the radiation mounting frame 3. The infrared temperature detector 33 is installed on the radiation mounting frame 3, and the infrared temperature detector 33 is adjacent to the radiation lamp 32, so that the infrared temperature detector 33 can detect the temperature at the radiation lamp 32. Specifically, the infrared temperature detector 33 is located above the radiation lamp 32. The radiation lamp 32 is provided with a plurality of radiation lamps 32, and the plurality of radiation lamps 32 form a radiation lamp whole body, and the infrared temperature detector 33 is located above the middle part of the radiation lamp whole body. The infrared temperature detector 33 directly monitors the temperature of the radiation lamp.

[0040] The lifting platform 2 is arranged in the containing space 11, and the lifting platform 2 is fixedly installed on the frame body 1. The lifting platform 2 is used to support the target component to be annealed, and the lifting platform 2 is located on the same side of the radiation lamp 32 of the radiation mounting frame 3, for example, the lifting platform 2 is located below the radiation mounting frame 3, and the plurality of radiation lamps 32 are installed on the bottom of the radiation mounting frame 3 and above the lifting platform 2, and the radiation lamp 32 can emit radiation light to the lifting platform 2. The lifting platform 2 can be a manual lifting platform 2. The user can operate the lifting platform 2 to drive the lifting platform 2 to rise or fall, thereby driving the target component on the lifting platform 2 to approach or move away from the radiation lamp 32. By adjusting the lifting platform 2, the distance between the target component on the lifting platform 2 and the radiation lamp 32 can be adjusted, so that the target component reaches the required position, thereby achieving the required annealing condition of the target component.

[0041] Referring to Figure 3The lifting platform 2 can specifically include a support table 21, a lifting assembly 22, a manual operating member 23, and a fixed plate 24. The fixed plate 24 is fixedly connected with the frame body 1, so that the lifting platform 2 is fixedly installed on the frame body 1. One end of the lifting assembly 22 is installed on the fixed plate 24, and the other end is connected with the support table 21. The lifting assembly 22 is also connected with the manual operating member 23. A user can operate the manual operating member 23 to drive the lifting assembly 22 to lift through the manual operating member 23, and then drive the target component on the support table 21 to move towards or away from the radiation lamp 32 through the lifting assembly 22. The support table 21 is used to support the target component. The support table 21 can specifically be provided with a substrate support 222, and the target component is installed on the substrate support 222.

[0042] With reference to Figure 3 and Figure 4 The lifting assembly 22 includes a gear and a rack 221 that mesh with each other. The rack 221 can extend in the vertical direction. The gear is connected with the manual operating member 23, so that the gear can rotate under the drive of the manual operating member 23. The gear meshes with the rack 221 to convert the rotation of the gear into vertical movement between the gear and the rack 221. The gear can be directly connected with the manual operating member 23, or the gear can be connected with the manual operating member 23 through a transmission rod or the like.

[0043] The gear and the rack 221 can be provided one each, and the gear and the rack 221 are located at the center position of the lifting platform 2. Alternatively, the gear and the rack 221 can be provided multiple each. Each gear can mesh with a corresponding rack 221. Multiple racks 221 can be distributed on both sides or around the lifting assembly 22. The cooperation between each rack 221 and the gear applies driving force to the support table 21, so that the lifting assembly 22 can apply uniform and stable lifting power to the support table 21. When multiple gears are provided, the multiple gears are connected through a transmission mechanism such as a transmission rod to enable the multiple gears to rotate synchronously. When the manual operating member 23 is operated, the manual operating member 23 can simultaneously drive the multiple gears to rotate.

[0044] To ensure the moving accuracy of the support table 21 during the lifting, the lifting platform 2 can be further provided with a sliding block 25 and a sliding seat 26. The sliding seat 26 is provided with a sliding groove 261 matched with the sliding block 25, so that the sliding block 25 can slide relative to the sliding seat 26. Wherein, the sliding groove 261 and the sliding block 25 respectively extend along the vertical direction. The rack 221 in the lifting assembly can be installed on the sliding block 25, and the sliding block 25 is fixedly connected with the fixed plate 24; the gear in the lifting assembly and the manual operating piece 23 are installed on the sliding seat 26, and the sliding seat 26 is fixedly connected with the support table 21. When the manual operating piece drives the gear to rotate, the gear moves relative to the rack 221 and drives the sliding block 25 to slide relative to the sliding seat 26; the fixed plate 24 is installed on the frame 1 and keeps the position fixed, and the position of the sliding block 25 fixedly connected with the fixed plate 24 also keeps fixed, when the sliding block 25 slides relative to the sliding seat 26, the sliding seat 26 and the support table 21 connected with the sliding seat 26 move up and down along the vertical direction, and the sliding of the sliding seat 26 and the sliding block 25 is used for guiding the lifting movement of the support table 21, so as to ensure the moving accuracy of the support table 21 during the lifting.

[0045] When the user operates the manual operating piece 23, the gear can be controlled to rotate clockwise or counterclockwise through the manual operating piece 23, so that the support table 21 realizes the lifting or lowering movement. Wherein, the manual operating piece 23 can include a rotating handle 231 and a rotating shaft connected with the rotating handle 231, and the rotating shaft is connected with the gear. The user can rotate the rotating handle 231 to drive the rotating shaft to rotate, so as to realize the lifting and lowering of the support table 21.

[0046] To facilitate the control of the lifting or lowering distance of the support table 21, the lifting assembly can be further provided with a pointer 28 and a scale 27 provided with a plurality of scales, one of the pointer 28 and the scale 27 is connected with the sliding block 25, and the other is connected with the sliding seat 26. Wherein, the pointer 28 is used to indicate the scale on the scale 27, when the support table 21 moves, the sliding block 25 slides relative to the sliding seat 26, so that the pointer 28 moves relative to the scale 27, the change displacement between the pointer 28 and the scale 27 is used to judge the lifting or lowering distance of the support table 21, so as to facilitate the control of the lifting or lowering distance of the support table 21.

[0047] To monitor the thermal uniformity of the radiated light, the annealing apparatus is also equipped with thermocouples TC (Thermo Couple) 331. Thermocouples TC331 can be placed at the bottom of the target component to monitor its temperature. Specifically, thermocouples TC331 can be mounted on the substrate support 222, and multiple thermocouples TC331 can be used. Each thermocouple TC331 constitutes a temperature monitoring and acquisition point. The temperature uniformity of the target component is determined by the data collected by multiple thermocouples TC331, thereby detecting the thermal uniformity of the radiated light. The number of thermocouples TC331 can be set to five or nine, with five or nine thermocouples TC331 monitoring the temperature at the center and around the target component. Each thermocouple TC331 can be set to both monitoring and control modes; that is, each thermocouple TC331 can function as either a control TC or a monitoring TC. When thermocouple TC 331 is set as a control TC, it can set and adjust the radiation temperature; when thermocouple TC 331 is set as a monitoring TC, it can only monitor the temperature, thus ensuring that the heat required by the target component is within a suitable range.

[0048] The actual distance between thermocouple TC 331 and the target component can be adjusted, and thermocouple TC 331 can be adjusted to contact the target component. For example, thermocouple TC 331 is mounted on a telescopic structure, which is mounted on support platform 21 or substrate bracket 222. The actual distance between thermocouple TC 331 and the target component is controlled by the telescopic movement of the telescopic structure.

[0049] Reference Figure 1 A clean air purification device 4 is installed on the frame 1, with one side of the device exposed to the outside and the other side exposed to the receiving space 11. The clean air purification device 4 filters outside air to supply clean air to the receiving space 11, thereby ensuring that the receiving space 11 can be or is approximately a clean space during annealing. This effectively reduces or avoids the impact of dust and other particulate matter from the external environment on the target component during annealing, improving the quality of the formed perovskite layer. Specifically, the clean air purification device 4 can be a high-efficiency Class 100 cleanroom FFU (Fan Filter Unit).

[0050] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and alterations to the above embodiments within the scope of the present invention without departing from the principles and spirit of the present invention, and all such changes should fall within the protection scope of the claims of the present invention.

Claims

1. An annealing apparatus characterized by comprising: The application relates to an annealing device. The device comprises a frame (1) with an accommodating space (11) formed inside; a lifting platform (2) arranged in the accommodating space (11) and used for supporting a target component to be annealed; and radiation lamps (32) arranged on one side of the lifting platform (2) and used for generating radiation light rays to irradiate the target component and anneal the target component. The radiation lamps (32) are infrared lamps, and a plurality of the radiation lamps (32) are uniformly and spacedly arranged, and the center positions of the plurality of radiation lamps (32) are located directly above the lifting platform (2). The device further comprises a radiation mounting rack (3) and a cooling fan (31), the radiation lamps (32) are mounted on the side of the radiation mounting rack (3) facing the target component, the cooling fan (31) is mounted on the radiation mounting rack (3), and the cooling fan (31) is located on the side of the radiation lamps (32) away from the lifting platform (2), and the cooling fan (31) is used for cooling the radiation lamps (32).

2. The annealing apparatus according to claim 1, wherein The device further comprises an infrared temperature detector (33) mounted on the radiation mounting rack (3), and the infrared temperature detector (33) is used for monitoring the radiation temperature of the radiation lamps (32).

3. The annealing apparatus according to claim 1, wherein The accommodating space (11) can be separated from the outside, and the device further comprises a dust-free air purification device (4) mounted on the frame (1), one side of the dust-free air purification device (4) is exposed to the outside, and the other side of the dust-free air purification device (4) is exposed to the accommodating space (11), and the dust-free air purification device (4) is used for filtering outside air to supply dust-free clean air to the accommodating space (11).

4. The annealing apparatus according to claim 3, wherein The lifting platform (2) comprises a supporting table (21) used for supporting the target component, a lifting assembly (22) used for driving the supporting table (21) to move towards or away from the radiation lamps (32), and a manual operating member (23) used for driving the lifting assembly (22) to move, and a user drives the lifting assembly (22) to move by operating the manual operating member (23).

5. The annealing apparatus of claim 1, wherein The lifting assembly (22) comprises a gear and a rack (221), the rack (221) extends in the vertical direction, the gear is connected with the manual operating member (23) and is driven by the manual operating member (23) to rotate, and the gear is engaged with the rack (221) to convert the rotation of the gear into the lifting movement in the vertical direction.

6. The annealing apparatus of claim 1, wherein ​ 7. The annealing apparatus according to claim 6, wherein ​ 8. The annealing apparatus according to claim 7, wherein The lifting platform (2) further comprises a fixed plate (24), the lifting assembly (22) further comprises a sliding block (25) and a sliding seat (26), the sliding block (25) is fixedly connected with the fixed plate (24), the rack (221) is installed on the sliding block (25), and the sliding block (25) and the rack (221) move synchronously; the sliding seat (26) is provided with a sliding groove (261), the sliding seat (26) is fixedly connected with the support table (21), and the gear and the manual operating part (23) are installed on the sliding seat (26); the sliding block (25) and the sliding seat (26) are slidingly matched to guide the lifting movement of the support table (21).

9. The annealing apparatus of claim 8, wherein The lifting assembly (22) further comprises a scale (27) and a pointer (28), the scale (27) is installed on the sliding block (25), and the pointer (28) is installed on the sliding seat (26); the pointer (28) is used for indicating the scale on the scale (27); And / or, the gear and the rack (221) are provided with one respectively, and the gear and the rack (221) are arranged in the middle part of the lifting platform (2).

10. The annealing apparatus of claim 1, wherein The bottom of the frame body (1) is provided with a plurality of universal wheels (12), and the universal wheels (12) are arranged at the edge positions of the bottom of the frame body (1). The target component includes a glass substrate and a perovskite thin film coated on the glass substrate.

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