Stable supporting structure for evaporation transmission arm

Abstract

The utility model relates to a stable support structure for an evaporation transmission arm, which comprises a base plate, a rotary table and a rotary driving mechanism, a telescopic arm moving along the horizontal direction is arranged above the base plate, a support disc is fixed on the upper part of the base plate, a support mechanism is arranged below the rotary table, and the support mechanism is positioned below the telescopic range of the telescopic arm. The supporting mechanism comprises a supporting frame connected to the lower portion of the rotary table, an upper rotating shaft and a lower rotating shaft, the upper rotating shaft is located above the supporting disc, the lower rotating shaft is located below the supporting disc, a plurality of upper rollers making contact with the upper surface of the supporting disc are arranged on the upper rotating shaft, and a plurality of lower rollers making contact with the lower surface of the supporting disc are arranged on the lower rotating shaft. According to the stable supporting structure, the upper roller and the lower roller can roll relative to the edge of the supporting disc, and the supporting disc can adjust the size and direction of the bearing reaction force acting on the supporting mechanism, so that torque change is resisted, the parallel relation between the rotary table and the substrate is kept, deformation of a rotating shaft of the rotary driving mechanism is avoided, and the service life of parts is prolonged.

Description

TECHNICAL FIELD

[0001] The utility model relates to evaporation technology field especially relates to a kind of stable support structure for evaporation transmission arm. BACKGROUND

[0002] Evaporation transmission arm is used to transfer evaporation substrate device.In cluster type vacuum coating equipment needs to make evaporation substrate enter each evaporation chamber in turn, finally from initial position send out evaporation equipment.Evaporation transmission arm includes rotating assembly and push assembly, push assembly is in the upper portion of rotating assembly and is driven to rotate by rotating assembly.Currently, the transmission arm for large-size material transmission in perovskite automation equipment industry, the support position mostly uses direct contact support, generates support reaction force, and causes great damage to structure.

[0003] Some technologies use roller with V-shaped groove and support disc with ridge to cooperate, and the support disc is equivalent to annular track, so that the roller walks along the circular path.However, the V-shaped groove and ridge structure are small, and the bearing capacity is small, and the slight deformation of the rotary table can easily cause jamming.

[0004] Therefore, it is necessary to improve the support structure to solve the above problems. INVENTION CONTENTS

[0005] The main purpose of the utility model is to provide a kind of stable support structure for evaporation transmission arm, can prevent telescopic arm to stretch out distance very long when the bending deformation of the rotary shaft of rotary table occurs, and the bearing capacity of roller is large, and the service life of part is long.

[0006] The utility model discloses a kind of stable support structure for evaporation transmission arm, including base plate, rotary table and the rotating drive mechanism of driving the rotary table rotates on the top of the base plate around vertical axis, the telescopic arm of the top of the base plate is equipped with and moves in horizontal direction, the upper portion of the base plate is fixed with support disc, the lower of the rotary table is equipped with support mechanism, the support mechanism is located below the telescopic range of the telescopic arm, the support mechanism includes the support frame connected to the lower portion of the rotary table, upper rotary shaft and lower rotary shaft connected to the support frame on horizontal direction, the upper rotary shaft is located above the support disc, the lower rotary shaft is located below the support disc, the upper rotary shaft is equipped with several upper rollers contacting the upper surface of the support disc, the lower rotary shaft is equipped with several lower rollers contacting the lower surface of the support disc.

[0007] Specifically, the lower of the rotary table is equipped with two support mechanisms, the rotary shaft of the rotary table is located between two support mechanisms, and two support mechanisms are located on the front and rear sides of the telescopic direction of the telescopic arm.

[0008] Furthermore, the support disk has a ring structure and is connected to the upper surface of the substrate by a number of connecting blocks evenly distributed around the axis. Each support mechanism has two lower rotating shafts coaxially arranged, and each of the two lower rotating shafts is provided with a number of lower rollers. The movement path of the lower rotating shafts avoids the connecting blocks.

[0009] Furthermore, the support frame includes a seat plate connected to the lower surface of the turntable and two through-shaft plates disposed at both ends of the seat plate. The two ends of the upper rotating shaft are respectively connected to the two through-shaft plates, and one side of each lower rotating shaft is connected to one of its through-shaft plates.

[0010] Furthermore, the lower part of the lower roller contacts the upper surface of the substrate.

[0011] The beneficial effects of this utility model's technical solution are:

[0012] This stable support structure allows the upper and lower rollers to roll relative to the edge of the support plate when the turntable rotates. Furthermore, during the extension and retraction of the telescopic arm, the support plate can adjust the magnitude and direction of the reaction force acting on the support mechanism, thereby resisting the above torque changes, maintaining the parallel relationship between the turntable and the base plate, preventing deformation of the rotating drive mechanism's shaft, and extending the service life of the parts. Attached Figure Description

[0013] Figure 1 This is a top view of the stable support structure in the embodiment;

[0014] Figure 2 for Figure 1 A partial schematic diagram from the perspective of point A;

[0015] Figure 3 for Figure 2 A magnified view of the area at position B in the middle.

[0016] The numbers in the diagram represent:

[0017] 1-Substrate;

[0018] 2-Turntable;

[0019] 3- Rotary drive mechanism;

[0020] 4-Telescopic boom;

[0021] 5-Support plate, 51-Connecting block;

[0022] 6-Support mechanism, 61-Support frame, 611-Seat plate, 612-Through shaft plate, 62-Upper rotating shaft, 63-Lower rotating shaft, 64-Upper roller, 65-Lower roller. Detailed Implementation

[0023] The present invention will be further described in detail below with reference to specific embodiments.

[0024] Example:

[0025] like Figures 1 to 3 As shown, a stable support structure for a vapor deposition transfer arm according to this utility model includes a substrate 1, a turntable 2, and a rotary drive mechanism 3 that drives the turntable 2 to rotate around a vertical axis above the substrate 1. A telescopic arm 4 that moves horizontally is provided above the substrate 1. A support disk 5 is fixed to the upper part of the substrate 1. A support mechanism 6 is provided below the turntable 2. The support mechanism 6 is located below the telescopic range of the telescopic arm 4. The support mechanism 6 includes a support frame 61 connected to the lower part of the turntable 2, an upper rotating shaft 62 and a lower rotating shaft 63 horizontally connected to the support frame 61. The upper rotating shaft 62 is located above the support disk 5, and the lower rotating shaft 63 is located below the support disk 5. The upper rotating shaft 62 is provided with a plurality of upper rollers 64 that contact the upper surface of the support disk 5, and the lower rotating shaft 63 is provided with a plurality of lower rollers 65 that contact the lower surface of the support disk 5. The lower part of the lower rollers 65 contacts the upper surface of the substrate 1.

[0026] When the telescopic arm 4 extends outward, the center of gravity of the turntable 2 gradually shifts outward, resulting in a change in torque. The support plate 5 can exert an upward supporting force on the upper roller 64 and a downward pressure on the lower roller 65. On the one hand, when the turntable 2 rotates, the upper roller 64 and the lower roller 65 can roll relative to the edge of the support plate 5. On the other hand, during the extension and retraction of the telescopic arm 4, the support plate 5 can adjust the magnitude and direction of the reaction force acting on the support mechanism 6, thereby resisting the above torque changes, maintaining the parallel relationship between the turntable 2 and the base plate 1, avoiding deformation of the shaft of the rotation drive mechanism 3, and extending the service life of the parts. When the lower roller 65 contacts the upper surface of the base plate 1, the reaction force can be further transmitted to the base plate 1, which also reduces the load on the support plate 5 and prevents the support plate 5 itself from deforming.

[0027] like Figure 2 As shown, two support mechanisms 6 are provided below the turntable 2, and the rotating shaft of the turntable 2 is located between the two support mechanisms 6. The two support mechanisms 6 are located on the front and rear sides of the telescopic arm 4 in the telescopic direction.

[0028] The two support mechanisms 6 can jointly provide support reaction force from opposite sides of the turntable 2. When the center of gravity of the turntable 2 deviates from the center of gravity, the upper roller 64 of one support mechanism 6 is in close contact with the upper surface of the support plate 5, and the lower roller 65 of the other support mechanism 6 is in close contact with the lower surface of the support plate 5. This can distribute the force and reduce the wear of the support plate 5 during rotation.

[0029] like Figure 3As shown, the support disk 5 has a ring structure. The support disk 5 is connected to the upper surface of the base plate 1 by several connecting blocks 51 evenly distributed around the axis. Each support mechanism 6 has two lower rotating shafts 63 coaxially arranged. Each of the two lower rotating shafts 63 is provided with several lower rollers 65. The movement path of the lower rotating shafts 63 avoids the connecting blocks 51.

[0030] The support plate 5 here does not need to be fixed from the center of the base plate 1, thus avoiding deformation of the support plate 5 itself. However, the support plate 5 needs to be connected to the base plate 1 by the connecting block 51, so that the entire support plate 5 is not easily deformed. Since the connecting block 51 is close to the support mechanism 6 and must be located below the support plate 5, the lower rotating shaft 63 and the lower roller 65 must be offset from the connecting block 51. Therefore, the lower rotating shaft 63 must be divided into two sections, so that when the turntable 2 rotates, the connecting block 51 can pass between the two lower rotating shafts 63.

[0031] like Figure 3 As shown, the support frame 61 includes a seat plate 611 connected to the lower surface of the turntable 2 and two through-shaft plates 612 located at both ends of the seat plate 611. The two ends of the upper rotating shaft 62 are respectively connected to the two through-shaft plates 612, and one side of each lower rotating shaft 63 is connected to one of its through-shaft plates 612.

[0032] The support frame 61 is a modular structure that can be pre-assembled outside the vapor deposition transfer arm. At this time, the base plate 611, two through-shaft plates 612, upper rotating shaft 62, and several upper rollers 64 are assembled into one unit. After this structure is in place, the lower rotating shaft 63 and lower rollers 65 are assembled onto the support frame 61, thereby forming an enclosure around the support plate 5.

[0033] The above descriptions are merely some embodiments of this utility model. For those skilled in the art, various modifications and improvements can be made without departing from the inventive concept of this utility model, and all such modifications and improvements fall within the protection scope of this utility model.

Claims

1. A stable support structure for a vapor deposition transfer arm, comprising a substrate, a turntable, and a rotary drive mechanism for driving the turntable to rotate about a vertical axis above the substrate, wherein a telescopic arm that moves in a horizontal direction is provided above the substrate, characterized in that: A support plate is fixed to the upper part of the base plate, and a support mechanism is provided below the turntable. The support mechanism is located below the extension range of the telescopic arm. The support mechanism includes a support frame connected to the lower part of the turntable, an upper rotating shaft and a lower rotating shaft horizontally connected to the support frame. The upper rotating shaft is located above the support plate, and the lower rotating shaft is located below the support plate. The upper rotating shaft is provided with a plurality of upper rollers that contact the upper surface of the support plate, and the lower rotating shaft is provided with a plurality of lower rollers that contact the lower surface of the support plate.

2. The stable support structure for the vapor deposition transfer arm according to claim 1, characterized in that: Two support mechanisms are provided below the turntable, and the turntable's pivot is located between the two support mechanisms. The two support mechanisms are located on the front and rear sides of the telescopic arm in the telescopic direction.

3. The stable support structure for the vapor deposition transfer arm according to claim 1 or 2, characterized in that: The support plate has a ring structure and is connected to the upper surface of the substrate by a number of connecting blocks evenly distributed around the axis. Each support mechanism has two lower rotating shafts coaxially arranged, and each of the two lower rotating shafts is provided with a number of lower rollers. The movement path of the lower rotating shafts avoids the connecting blocks.

4. The stable support structure for the vapor deposition transfer arm according to claim 3, characterized in that: The support frame includes a base plate connected to the lower surface of the turntable and two through-shaft plates located at both ends of the base plate. The two ends of the upper rotating shaft are respectively connected to the two through-shaft plates, and one side of each lower rotating shaft is connected to one of its through-shaft plates.

5. The stable support structure for a vapor deposition transfer arm according to claim 1 or 2, characterized in that: The lower part of the lower roller contacts the upper surface of the substrate.

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