Substrate cleaning structure for magnetron sputtering
By introducing an ultrasonic cleaning chamber and stirring rod structure into the magnetron sputtering cleaning device, the problem of uneven mixing of cleaning agent and water was solved, the cleaning effect was improved, and a high-efficiency substrate cleaning process was achieved through the drying component.
Patent Information
- Application Number
- CN202520061235.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-10
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2035-01-10
AI Technical Summary
Existing magnetron sputtering cleaning devices cannot achieve uniform mixing of cleaning agents and water, which affects the cleaning effect.
It adopts an ultrasonic cleaning box and stirring rod structure. The stirring rod is driven by a motor to stir the cleaning solution. Combined with ultrasonic cleaning and drying components, it ensures uniform distribution and rapid mixing of cleaning agent and water.
It achieves uniform distribution of cleaning agent and water, improves cleaning effect, and completes the substrate cleaning process in a time-saving and labor-saving manner through the drying component.
Smart Images
Figure CN223837532U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of substrate cleaning equipment, and in particular to a substrate cleaning structure for magnetron sputtering. Background Technology
[0002] Magnetron sputtering is a type of physical vapor deposition. General sputtering methods can be used to prepare various materials such as metals, semiconductors, and insulators. It has advantages such as simple equipment, easy control, large coating area, and strong adhesion. The substrate for magnetron sputtering refers to the basic material used to deposit sputtering materials during the magnetron sputtering coating process.
[0003] To prevent contaminants on the substrate surface from affecting the coating effect, a cleaning device is needed to clean the substrate before magnetron sputtering. However, current cleaning devices cannot quickly mix the cleaning agent and water after adding them, resulting in uneven distribution of the cleaning agent and water inside the cleaning tank, which affects the subsequent cleaning effect.
[0004] To address this issue, a substrate cleaning structure for magnetron sputtering is proposed. Utility Model Content
[0005] To overcome the above shortcomings, this utility model provides a substrate cleaning structure for magnetron sputtering, which aims to improve the problem that existing cleaning devices cannot stir and clean the substrate.
[0006] To achieve the above objectives, the present invention adopts the following technical solution:
[0007] A substrate cleaning structure for magnetron sputtering includes an ultrasonic cleaning chamber. A top cover is hinged to the top of the ultrasonic cleaning chamber via a shaft. A motor is fixedly connected to the top of the top cover. The output end of the motor extends through to the bottom of the top cover and is fixedly connected to a stirring rod. A concave plate is fixedly connected to the right side of the top of the top cover. A fixed box is fixedly connected to the right side of the top of the top cover. An arc-shaped plate is hinged to the top of the fixed box via a shaft. The bottom end of the arc-shaped plate extends through to the interior of the fixed box and is fixedly connected to a sliding rod. A retaining plate is provided inside the fixed box. Sliding sleeves are fixedly connected to the front and rear sides of the top of the retaining plate. The sliding sleeves slidably fit onto the surface of the sliding rod. A spring is fixedly connected to the left side of the sliding sleeve. The left end of the spring is fixedly connected to the interior of the fixed box. A retaining sleeve is fixedly connected to the right side of the top of the ultrasonic cleaning chamber. The right end of the retaining plate extends through to the interior of the retaining sleeve. A placement box is fixedly connected to the right side of the ultrasonic cleaning chamber. A drying assembly is provided on the right side of the placement box. A flow guiding assembly is provided at the bottom of the top cover.
[0008] As a further description of the above technical solution:
[0009] The drying assembly includes a heating box, which is fixedly connected to the right side of the placement box. A fan is connected to the bottom of the heating box, a heating tube is fixedly connected inside the heating box, and a universal bamboo tube is connected to the top of the heating box. An exhaust sleeve is connected to the top of the universal bamboo tube.
[0010] As a further description of the above technical solution:
[0011] A filter screen is fixedly connected to the bottom of the fan, and the bottom of the top cover is in contact with the top of the ultrasonic cleaning box.
[0012] As a further description of the above technical solution:
[0013] An inclined plate is fixedly connected to the top left side of the ultrasonic cleaning box, and the bottom of the plate contacts the bottom of the inner wall of the box.
[0014] As a further description of the above technical solution:
[0015] A sealing ring is fixedly connected to the bottom of the top cover, and the inner wall of the sealing ring is in contact with the surface of the stirring rod.
[0016] As a further description of the above technical solution:
[0017] The flow guiding assembly includes a flow guiding channel, which is formed at the bottom of the top cover, and the stirring rod is located inside the flow guiding channel;
[0018] As a further description of the above technical solution:
[0019] A protective sleeve is fixedly connected to the top of the top cover, and the protective sleeve is fitted onto the surface of the motor.
[0020] As a further description of the above technical solution:
[0021] A support rod is fixedly connected to the left side of the inner wall of the fixed box, and the card plate is slidably sleeved on the surface of the support rod.
[0022] This utility model has the following beneficial effects:
[0023] 1. In this utility model, the spring sheet drives the card plate to be inserted into the inside of the card sleeve to fix the top cover through the sliding sleeve. Then, the motor drives the stirring rod to stir and mix the cleaning liquid. Finally, the ultrasonic cleaning box uses the cleaning liquid to perform ultrasonic cleaning on the substrate, which can achieve the effect of stirring and cleaning the substrate. The cleaning agent and water can be evenly distributed, which improves the cleaning effect to a certain extent.
[0024] 2. In this utility model, by using a combination of a heating box, a fan, a heating tube, a universal bamboo joint tube, and an exhaust sleeve, the substrate after cleaning can be dried without air drying, saving time and effort. Attached Figure Description
[0025] Figure 1 This is a three-dimensional schematic diagram of a substrate cleaning structure for magnetron sputtering proposed in this utility model;
[0026] Figure 2 This is a schematic diagram showing the opening of the top cover of a substrate cleaning structure for magnetron sputtering proposed in this utility model;
[0027] Figure 3 This is a schematic diagram of the universal bamboo-joint tube for substrate cleaning structure of magnetron sputtering proposed in this utility model;
[0028] Figure 4 This is a cross-sectional schematic diagram of the fixing box for a substrate cleaning structure for magnetron sputtering proposed in this utility model.
[0029] Legend:
[0030] 1. Ultrasonic cleaning box; 2. Top cover; 3. Motor; 4. Stirring rod; 5. Concave plate; 6. Fixing box; 7. Arc plate; 8. Sliding rod; 9. Clamping plate; 10. Sliding sleeve; 11. Spring; 12. Clamping sleeve; 13. Placement box; 14. Heating box; 15. Fan; 16. Heating tube; 17. Universal bamboo joint tube; 18. Exhaust sleeve; 19. Filter screen; 20. Inclined plate; 21. Sealing ring; 22. Guide channel; 23. Protective sleeve; 24. Support rod. Detailed Implementation
[0031] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0032] Reference Figure 1-3This utility model provides an embodiment of a substrate cleaning structure for magnetron sputtering, comprising an ultrasonic cleaning chamber 1, which is a small ultrasonic cleaner. A top cover 2 is hinged to the top of the ultrasonic cleaning chamber 1 via a shaft. A motor 3, a waterproof motor, is fixedly connected to the top of the top cover 2. A protective sleeve 23 is fixedly connected to the top of the top cover 2, covering the surface of the motor 3. The protective sleeve 23 protects the surface of the motor 3, preventing collisions with foreign objects. The output end of the motor 3 extends to the bottom of the top cover 2 and is fixedly connected to a stirring rod 4. A sealing ring 21 is fixedly connected to the bottom of the top cover 2, with its inner wall contacting the surface of the stirring rod 4. The sealing ring 21 reduces the gap between the top cover 2 and the stirring rod 4, improving the sealing performance of the top cover 2 and preventing cleaning fluid from flowing into the motor 3 through the gap. A concave plate 5 is fixedly connected to the right side of the top of the top cover 2, and a fixing box 6 is fixedly connected to the right side of the top of the top cover 2. An arc-shaped plate 7 is hinged to a shaft, and the bottom end of the arc-shaped plate 7 extends into the interior of the fixed box 6 and is fixedly connected to a sliding rod 8. A retaining plate 9 is installed inside the fixed box 6. An inclined plate 20 is fixedly connected to the top left side of the ultrasonic cleaning box 1. The bottom of the retaining plate 9 contacts the bottom of the inner wall of the fixed box 6. By setting the inclined plate 20, the top cover 2 can be supported after opening, improving the stability of the top cover 2. Sliding sleeves 10 are fixedly connected to the front and rear sides of the top of the retaining plate 9. A support is fixedly connected to the left side of the inner wall of the fixed box 6. The support rod 24 and the clamping plate 9 are slidably sleeved on the surface of the support rod 24. By setting the support rod 24, the clamping plate 9 can be limited, which improves the stability of the clamping plate 9 when it moves. The sliding sleeve 10 is slidably sleeved on the surface of the sliding rod 8. The left side of the sliding sleeve 10 is fixedly connected to the spring piece 11. The left end of the spring piece 11 is fixedly connected to the inside of the fixed box 6. The right side of the top of the ultrasonic cleaning box 1 is fixedly connected to the clamping sleeve 12. The right end of the clamping plate 9 passes through the inside of the clamping sleeve 12. The right side of the ultrasonic cleaning box 1 is fixedly connected to the placement box 13.
[0033] Reference Figure 2-4 A drying assembly is provided on the right side of the placement box 13. The drying assembly includes a heating box 14, which is fixedly connected to the right side of the placement box 13. A fan 15, which is a miniature axial flow fan, is connected to the bottom of the heating box 14. A heating tube 16 is fixedly connected inside the heating box 14. A universal bamboo tube 17 is connected to the top of the heating box 14. An exhaust sleeve 18 is connected to the top of the universal bamboo tube 17. By using the heating box 14, fan 15, heating tube 16, universal bamboo tube 17 and exhaust sleeve 18 together, the substrate after cleaning can be dried without air drying, saving time and effort. A filter screen 19 is fixedly connected to the bottom of the fan 15. The bottom of the top cover 2 contacts the top of the ultrasonic cleaning box 1. By setting the filter screen 19, dust can be filtered to prevent dust and impurities from entering the interior of the heating box 14.
[0034] Reference Figure 1-3 The bottom of the top cover 2 is provided with a flow guiding component, which includes a flow guiding groove 22. The flow guiding groove 22 is opened at the bottom of the top cover 2, and the stirring rod 4 is located inside the flow guiding groove 22. By setting the flow guiding groove 22, the cleaning liquid falling on the surface of the stirring rod 4 can be guided, so that the cleaning liquid can flow into the interior of the ultrasonic cleaning box 1.
[0035] Working principle: The user first pours the cleaning agent and water into the ultrasonic cleaning chamber 1 in sequence. Then, the magnetron sputtering substrate is placed in the external mesh basket, and the mesh basket is placed into the ultrasonic cleaning chamber 1. Next, the user holds the concave plate 5 and pushes the arc plate 7. The rotation of the arc plate 7 causes the slide rod 8 to slide inside the sliding sleeve 10. The sliding sleeve 10 compresses the spring piece 11 and simultaneously moves the clamping plate 9. Then, the top cover 2 is rotated. The top cover 2 drives the stirring rod 4 to move into the ultrasonic cleaning chamber 1 via the motor 3. Then, the arc plate 7 is released, and the spring piece 11 pushes the sliding sleeve 10 to reset. The sliding sleeve 10 then moves the clamping plate 9. Plate 9 is inserted into the sleeve 12 to fix the top cover 2 in position. Then, motor 3 and ultrasonic cleaning box 1 are started. Motor 3 drives stirring rod 4 to stir and mix the cleaning solution. At the same time, ultrasonic cleaning box 1 performs ultrasonic cleaning on the substrate through the cleaning solution. During the stirring process, the cleaning solution will form a water vortex inside ultrasonic cleaning box 1, so that the cleaning agent can fully contact the substrate and improve the cleaning efficiency. When cleaning some complex-shaped substrates with gaps or holes, stirring can make it easier for the cleaning solution to enter the gaps and carry out the dirt, thereby achieving the effect of stirring and cleaning the substrate.
[0036] Finally, it should be noted that the above are merely preferred embodiments of the present utility model and are not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A substrate cleaning structure for magnetron sputtering, comprising an ultrasonic cleaning chamber (1), characterized in that: The top of the ultrasonic cleaning box (1) is hinged to a top cover (2) via a shaft. A motor (3) is fixedly connected to the top of the top cover (2). The output end of the motor (3) extends through to the bottom of the top cover (2) and is fixedly connected to a stirring rod (4). A concave plate (5) is fixedly connected to the right side of the top of the top cover (2). A fixed box (6) is fixedly connected to the right side of the top of the top of the top cover (2). An arc-shaped plate (7) is hinged to the top of the fixed box (6) via a shaft. The bottom end of the arc-shaped plate (7) extends through to the interior of the fixed box (6) and is fixedly connected to a sliding rod (8). A retaining plate (9) is provided inside the fixed box (6). Sliding sleeves (10) are fixedly connected to the front and rear sides of the top of the card plate (9). The sliding sleeves (10) are slidably sleeved on the surface of the sliding rod (8). A spring piece (11) is fixedly connected to the left side of the sliding sleeve (10). The left end of the spring piece (11) is fixedly connected to the inside of the fixed box (6). A retaining sleeve (12) is fixedly connected to the right side of the top of the ultrasonic cleaning box (1). The right end of the card plate (9) extends into the inside of the retaining sleeve (12). A placement box (13) is fixedly connected to the right side of the ultrasonic cleaning box (1). A drying component is provided on the right side of the placement box (13). A flow guiding component is provided at the bottom of the top cover (2).
2. The substrate cleaning structure for magnetron sputtering according to claim 1, characterized in that: The drying assembly includes a heating box (14), which is fixedly connected to the right side of the placement box (13). A fan (15) is connected to the bottom of the heating box (14). A heating tube (16) is fixedly connected inside the heating box (14). A universal bamboo tube (17) is connected to the top of the heating box (14). An exhaust sleeve (18) is connected to the top of the universal bamboo tube (17).
3. The substrate cleaning structure for magnetron sputtering according to claim 2, characterized in that: A filter screen (19) is fixedly connected to the bottom of the fan (15), and the bottom of the top cover (2) is in contact with the top of the ultrasonic cleaning box (1).
4. The substrate cleaning structure for magnetron sputtering according to claim 1, characterized in that: An inclined plate (20) is fixedly connected to the top left side of the ultrasonic cleaning box (1), and the bottom of the card plate (9) is in contact with the bottom of the inner wall of the fixed box (6).
5. The substrate cleaning structure for magnetron sputtering according to claim 1, characterized in that: A sealing ring (21) is fixedly connected to the bottom of the top cover (2), and the inner wall of the sealing ring (21) is in contact with the surface of the stirring rod (4).
6. The substrate cleaning structure for magnetron sputtering according to claim 1, characterized in that: The flow guiding assembly includes a flow guiding groove (22), which is located at the bottom of the top cover (2), and the stirring rod (4) is located inside the flow guiding groove (22).
7. The substrate cleaning structure for magnetron sputtering according to claim 1, characterized in that: The top of the top cover (2) is fixedly connected to a protective sleeve (23), which is fitted onto the surface of the motor (3).
8. The substrate cleaning structure for magnetron sputtering according to claim 1, characterized in that: A support rod (24) is fixedly connected to the left side of the inner wall of the fixed box (6), and the card plate (9) is slidably sleeved on the surface of the support rod (24).