Polishing jig

Abstract

The utility model relates to a polishing jig, which relates to the technical field of polishing, and comprises a pressure head, a pressure plate, a pressure plate and a pressure plate, and the pressure head is used for providing pressing force for a to-be-polished part; the positioning ring is connected with the pressing head, a limiting groove is formed in the end, away from the pressing head, of the positioning ring, and a pressing air bag is arranged at the bottom of the limiting groove and used for transmitting pressing force provided by the pressing head to the to-be-polished part; the slide glass is installed in the limiting groove, the size of the slide glass is matched with that of the limiting groove, the slide glass is provided with a mounting hole used for containing a to-be-polished part, the size of the mounting hole is matched with that of the to-be-polished part, the slide glass can be limited to a certain position through the limiting groove, and the to-be-polished part can be limited to a certain position through the slide glass. Therefore, the problem that the to-be-polished piece is collided or rubbed in the polishing process to cause scratches or other damage to the product is avoided, and the polishing effect of the machined product is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to polishing technical field, concretely relates to a polishing fixture. BACKGROUND

[0002] In the polishing field, the AVGG product (micro-nano grating cathode assembly) may produce burrs in the cutting process of the micro-nano grating substrate during the production process, which not only affects the appearance quality of the product, but also may cause the sharp end discharge phenomenon. Therefore, during the processing, the burrs need to be treated to ensure the performance and reliability of the product.

[0003] The CMP (chemical mechanical polishing) technology is an advanced surface treatment technology, which realizes the uniform polishing of the complex surface through the combination of chemical reaction and mechanical friction, can not only remove the burrs and scratches on the surface, but also can significantly improve the surface finish and consistency of the product. However, the size of the AVGG product is special, and the original CMP polishing device cannot limit the AVGG product in the radial direction, which causes the product to collide or rub during the polishing process and produces scratches or other damage, affecting the final polishing effect.

[0004] Therefore, there is an urgent need for a polishing fixture that can improve the polishing effect of the AVGG product. UTILITY MODEL CONTENT

[0005] In order to solve the above problems, the utility model provides a polishing fixture, which can limit the product to be polished at a certain position through the cooperation of the carrier and the positioning ring, avoiding the problem of poor polishing effect caused by the position deviation of the product during the polishing process.

[0006] In order to achieve the above purpose, the utility model provides the following scheme:

[0007] A polishing fixture, comprising:

[0008] A pressure head for providing a pressing force to the part to be polished;

[0009] A positioning ring connected with the pressure head, an end of the positioning ring away from the pressure head is provided with a limiting groove, the bottom of the limiting groove is provided with a pressing air bag, the pressing air bag is used for transmitting the pressing force provided by the pressure head to the part to be polished;

[0010] A carrier installed in the limiting groove, the size of the carrier matches the size of the limiting groove, an installation hole for placing the part to be polished is opened on the carrier, the size of the installation hole matches the size of the part to be polished.

[0011] Preferably, the thickness of the carrier sheet is less than the height of the workpiece to be polished, so that both ends of the workpiece to be polished can extend out of both ends of the mounting hole.

[0012] Preferably, an auxiliary air bag is further included, which is arranged in the mounting hole and located on the side of the workpiece to be polished close to the pressing air bag, and the sum of the height of the auxiliary air bag and the height of the workpiece to be polished is greater than the thickness of the carrier sheet.

[0013] Preferably, the end of the auxiliary air bag away from the workpiece to be polished is provided with an anti-skid structure.

[0014] Preferably, the pressing head is connected with a rotary driving device, and the mounting hole is arranged at the center of the carrier sheet.

[0015] Preferably, the rotating direction of the pressing head is opposite to the rotating direction of the polishing pad.

[0016] Preferably, the sum of the thickness of the carrier sheet and the thickness of the pressing air bag is not less than the depth of the limiting groove.

[0017] Preferably, the positioning ring is detachably connected with the pressing head.

[0018] Preferably, the end of the carrier sheet away from the pressing air bag is smooth.

[0019] Preferably, the carrier sheet is made of wear-resistant material.

[0020] The utility model discloses relative to prior art has obtained following technical effect:

[0021] In the polishing jig disclosed by the utility model, the pressing head provides pressing force for the workpiece to be polished through the pressing air bag to press the workpiece to be polished on the polishing pad, the size of the carrier sheet matches the size of the limiting groove, the carrier sheet can be limited at a position through the limiting groove, the size of the mounting hole arranged on the carrier sheet matches the size of the workpiece to be polished, and then the workpiece to be polished can be limited at a position through the cooperation of the limiting groove and the carrier sheet, so that the displacement of the workpiece to be polished along the radial direction of the pressing head in the polishing process is prevented, and the problem that the workpiece to be polished collides or rubs in the polishing process to cause scratches or other damages of the product is avoided, and the polishing effect of the processed product is improved. BRIEF DESCRIPTION OF DRAWINGS

[0022] In order to more clearly illustrate the technical scheme in the utility model or prior art, the following will briefly introduce the drawings needed to be used in the embodiments, and obviously, the drawings in the following description are only some embodiments of the utility model, and those skilled in the art can also obtain other drawings according to these drawings without paying creative labor.

[0023] Figure 2 is a schematic view of an embodiment of the present application; Fig. 1 Figure 3 is a schematic view of an embodiment of the present application;

[0024] Figure 4 is a schematic view of an embodiment of the present application. Fig. 2 Figure 5 is a schematic view of an embodiment of the present application.

[0025] Wherein, 1, pressure head; 2, positioning ring; 3, limit slot; 4, compression air bag; 5, carrier film; 6, mounting hole; 7, auxiliary air bag; 8, polishing pad. DETAILED DESCRIPTION

[0026] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0027] The object of the present application is to provide a polishing jig, which avoids the problem of radial displacement of products in the polishing process through the cooperation of the carrier film and the positioning ring, and improves the polishing effect of the products.

[0028] In order to make the above-mentioned objects, features and advantages of the present application more obvious and easy to understand, the present application will be further described in detail below with reference to the drawings and specific embodiments.

[0029] Reference Figs. 1-2The utility model discloses a polishing jig, including: pressure head 1, locating ring 2 and carrier 5, wherein, pressure head 1 is used for providing the pressure of the polishing piece, locating ring 2 is connected with pressure head 1, the one end of locating ring 2 away from pressure head 1 is equipped with the limiting groove 3, the bottom of limiting groove 3 is provided with the pressure gas bag 4, and the pressure of pressure head 1 can be transmitted to the polishing piece through pressure gas bag 4 to press the polishing piece on polishing pad 8, carrier 5 is installed in limiting groove 3, and the size of carrier 5 is matched with the size of limiting groove 3, and then the radial support force can be provided for carrier 5 through the inner wall of limiting groove 3 to carry out the radial location of carrier 5, and the mounting hole 6 is seted up on carrier 5, and the size of mounting hole 6 is matched with the size of the polishing piece. When polishing, the polishing piece is installed in the mounting hole 6, and the polishing piece is pressed on the polishing pad 8 through the pressure gas bag 4 seted up in the limiting groove 3, and the pressure head 1 rotates relative to the polishing pad 8, that is, the polishing piece rotates relative to the polishing pad 8 to polish, and since the size of the mounting hole 6 is matched with the size of the polishing piece, the radial location of the polishing piece can be carried out through the mounting hole 6 to prevent the radial displacement of the polishing piece in the polishing process, and then the collision or friction of the polishing piece in the polishing process is avoided, the problem that the product produces scratch or other damage is avoided, and the technical effect of improving the polishing effect of the processed product is realized.

[0030] The skilled person can understand that the relative rotation of the pressure head 1 and the polishing pad 8 can be the active rotation of any one of the pressure head 1 and the polishing pad 8, or the simultaneous rotation of the pressure head 1 and the polishing pad 8.

[0031] As a preferred embodiment, the thickness of the carrier 5 is less than the height of the polishing piece, so that the two ends of the polishing piece can protrude from the upper and lower ends of the mounting hole 6, and ensure that the pressure gas bag 4 can provide sufficient pressure to the polishing piece to complete the polishing.

[0032] As a preferred embodiment, it further includes an auxiliary gas bag 7, which is arranged in the mounting hole 6 and located on the side of the polishing piece close to the pressure gas bag 4, and the sum of the height of the auxiliary gas bag 7 and the height of the polishing piece is greater than the thickness of the carrier 5; when the height of the polishing piece is less than the thickness of the carrier 5, the pressure provided by the pressure gas bag 4 can be transmitted to the polishing piece through the auxiliary gas bag 7 to press the polishing piece on the polishing pad 8.

[0033] Preferably, the end of the auxiliary gas bag 7 away from the polishing piece is provided with an anti-skid structure to avoid the relative sliding of the auxiliary gas bag 7 and the pressure gas bag 4 in the polishing process.

[0034] Further, the auxiliary gas bag 7 and the pressure gas bag 4 are integrally arranged.

[0035] As a preferred embodiment, the pressing head 1 is connected with the rotary driving device, and the mounting hole 6 is arranged at the center of the carrier 5; the pressing head 1 is connected with the rotary driving device, and then the carrier 5 and the workpiece to be polished can be driven to rotate together by the pressing air bag 4; the mounting hole 6 is arranged at the center of the carrier 5, so that the gravity center of the carrier 5 can be kept at the center of the carrier 5, and vibration of the carrier 5 caused by centrifugal force during high-speed rotation of the pressing head 1 is avoided, which not only increases noise, but also can cause fatigue damage of the carrier 5 and reduce the service life of the carrier 5.

[0036] Preferably, when the polishing pad 8 also rotates actively, the rotating direction of the pressing head 1 is opposite to the rotating direction of the polishing pad 8, so that the polishing efficiency is improved.

[0037] As a preferred embodiment, the sum of the thickness of the carrier 5 and the thickness of the pressing air bag 4 is not less than the depth of the limiting groove 3, so that the carrier 5 and the workpiece to be polished can be kept relatively stationary during polishing by the pressing air bag 4, and mutual friction between the inner wall of the carrier 5 and the workpiece to be polished is avoided.

[0038] As a preferred embodiment, the positioning ring 2 is detachably connected with the pressing head 1, so that the new and old parts can be replaced when the positioning ring 2 is damaged.

[0039] As a preferred embodiment, the end of the carrier 5 away from the pressing air bag 4 is smoothly arranged, so that the friction between the carrier 5 and the polishing pad 8 is effectively reduced, and the resistance in the polishing process is reduced.

[0040] As a preferred embodiment, the carrier 5 is made of wear-resistant material, which includes but is not limited to alumina ceramic, silicon carbide ceramic, polytetrafluoroethylene and diamond composite material, so that the service life of the carrier 5 is ensured.

[0041] Any adaptive changes according to actual needs are within the protection scope of the utility model.

[0042] It should be noted that, for those skilled in the art, it is obvious that the utility model is not limited to the details of the above exemplary embodiments, and the utility model can be realized in other specific forms without departing from the spirit or basic characteristics of the utility model. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting, the scope of the utility model is defined by the appended claims rather than the above description, and therefore all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the utility model. Any reference signs in the claims should not be regarded as limiting the involved claims.

Claims

1. A polishing tool, characterized by, The utility model relates to a polishing device, which comprises: a pressing head (1) for providing a pressing force to a workpiece to be polished; a positioning ring (2) connected to the pressing head (1), wherein an end of the positioning ring (2) away from the pressing head (1) is provided with a limiting groove (3), and the bottom of the limiting groove (3) is provided with a pressing air bag (4) for transmitting the pressing force provided by the pressing head (1) to the workpiece to be polished; a carrier sheet (5) installed in the limiting groove (3), wherein the carrier sheet (5) is matched in size with the limiting groove (3), and the carrier sheet (5) is provided with an installation hole (6) for placing the workpiece to be polished, and the size of the installation hole (6) is matched with the size of the workpiece to be polished.

2. The polishing tool of claim 1, wherein, The thickness of the carrier sheet (5) is less than the height of the workpiece to be polished, so that both ends of the workpiece to be polished can extend out of both ends of the installation hole (6).

3. The polishing tool of claim 1, wherein, The utility model further comprises an auxiliary air bag (7) arranged in the installation hole (6) and located on the side of the workpiece to be polished close to the pressing air bag (4), wherein the height of the auxiliary air bag (7) plus the height of the workpiece to be polished is greater than the thickness of the carrier sheet (5).

4. The polishing tool of claim 3, wherein, An anti-skid structure is arranged at the end of the auxiliary air bag (7) away from the workpiece to be polished.

5. The polishing tool of claim 1, wherein, The pressing head (1) is connected to a rotary driving device, and the installation hole (6) is arranged at the center of the carrier sheet (5).

6. The polishing tool of claim 5, wherein, The rotating direction of the pressing head (1) is opposite to the rotating direction of a polishing pad (8).

7. The polishing tool of claim 1, wherein, The thickness of the carrier sheet (5) plus the thickness of the pressing air bag (4) is not less than the depth of the limiting groove (3).

8. The polishing tool of claim 1, wherein, The positioning ring (2) is detachably connected to the pressing head (1).

9. The polishing tool of claim 1, wherein, The end of the carrier sheet (5) away from the pressing air bag (4) is smooth.

10. The polishing tool of claim 1, wherein, The carrier sheet (5) is made of wear-resistant material.

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