Evaporation component and display panel
By optimizing the evaporation aperture and nozzle size parameters of the evaporation assembly, the color mixing problem of the light-emitting units in the OLED display panel was solved, thus improving the display quality.
Patent Information
- Application Number
- CN202520528712.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-25
- Publication Date
- 2026-01-30
- Estimated Expiration
- 2035-03-25
AI Technical Summary
During the vapor deposition process of OLED display panels, the color mixing degree of the light-emitting units is relatively high, which leads to a decrease in display quality.
Design a vapor deposition assembly in which the dimensional parameters of the vapor deposition orifice and nozzle of the mask are optimized to control the width of the inner shadow area within a preset range and reduce the degree of color mixing.
By optimizing the size parameters of the vapor deposition through-holes and nozzles, the width of the inner shadow area of the display panel was significantly reduced, thereby improving the display quality of the display panel.
Smart Images

Figure CN223852740U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of display, and specifically provides a kind of evaporation assembly and display panel. BACKGROUND
[0002] In the manufacturing process of OLED (Organic Light-Emitting Diode) light-emitting device, the organic layer is usually manufactured by high-vacuum evaporation method. In the evaporation process, an evaporation source and a mask plate (high-precision metal mask plate) are used to manufacture the red (R), green (G) and blue (B) light-emitting layers of the light-emitting unit. When evaporating different color light-emitting units, the size of the evaporated light-emitting unit is generally slightly larger than the opening size of the mask plate, that is, a shadow zone is formed around the theoretically designed sub-light-emitting unit. Especially for large-size OLED display panels, the increase of the substrate size and the evaporation source size will further increase the shadow zone, thereby enhancing the color mixing degree of the light-emitting unit and reducing the display quality of the display panel. By adjusting the process parameters, the width of the shadow zone can be adjusted to meet the specific requirements. CONTENT OF THE UTILITY MODEL
[0003] The present application aims to solve the above technical problems, that is, to solve the problem of how to reduce the color mixing degree of the light-emitting unit of the display panel and thereby improve the display quality of the display panel.
[0004] In a first aspect, the present application provides an evaporation assembly, comprising:
[0005] a mask plate comprising a first surface facing a display panel to be evaporated and a second surface opposite to the first surface, the mask plate having a plurality of evaporation through holes penetrating through the first surface and the second surface;
[0006] an evaporation source comprising a plurality of arrayed nozzles, the nozzles all facing the second surface;
[0007] wherein the size parameters of the plurality of evaporation through holes and the size parameters of the plurality of nozzles are cooperatively designed so that the width of the inner shadow zone with the maximum width on the display panel to be evaporated is within a preset allowable range.
[0008] In one technical solution of the above evaporation assembly, the preset allowable range depends on the maximum allowable color mixing degree of adjacent light-emitting units on the display panel.
[0009] In one of the technical solutions of the above evaporation assembly, the sidewall of the evaporation through hole is concave, and comprises a first inclined portion and a second inclined portion, the first inclined portion is close to the first surface, the second inclined portion is close to the second surface, and the first inclined portion and the second inclined portion intersect to form a concave portion of the concave shape.
[0010] In one of the technical solutions of the above evaporation assembly, the preset allowable range is 6-7 μm.
[0011] In one of the technical solutions of the above evaporation assembly, the size parameters of the evaporation through hole include:
[0012] The included angle between the second inclined portion and the second surface is 55°-60°;
[0013] The depth of the evaporation through hole is less than 25 μm;
[0014] In the depth direction of the evaporation through hole, the distance between the concave portion and the first surface is less than 3.5 μm;
[0015] In the extension direction of the mask plate cross section, the transverse distance between the intersection of the concave portion and the first inclined portion and the first surface is less than 1.5 μm; and
[0016] The size parameters of the plurality of nozzles include:
[0017] The inclination angle of the plurality of nozzles gradually increases from the center of the evaporation source to the periphery, and the inclination angle of the nozzle at the center is 0°, and the inclination angle of the nozzle at the outermost edge is 20°, wherein the inclination angle refers to the included angle between the normal of the nozzle jet surface and the normal of the second surface;
[0018] The inner diameter of the plurality of nozzles gradually increases from the center of the evaporation source to the periphery, and the inner diameter of the nozzle at the center is 10 mm, and the inner diameter of the nozzle at the outermost edge is 15 mm.
[0019] In one of the technical solutions of the above evaporation assembly, the size parameters of the evaporation through hole include:
[0020] The included angle between the second inclined portion and the second surface is less than 55°;
[0021] The depth of the evaporation through hole is less than 25 μm;
[0022] In the depth direction of the evaporation through hole, the distance between the concave portion and the first surface is less than 3.5 μm;
[0023] a transverse distance between the recess and the intersection of the first inclined portion and the first surface is less than 1.5 pm in a direction of extension of the cross-section of the mask plate; and
[0024] a size parameter of the plurality of nozzles comprises:
[0025] an inclination angle of the plurality of nozzles gradually increases from the center of the evaporation source to the periphery, and the inclination angle of the nozzle at the center is 0°, and the inclination angle of the nozzle at the periphery is 20°, wherein the inclination angle refers to an included angle between a normal line of a jet surface of the nozzle and a normal line of the second surface;
[0026] an inner diameter of the plurality of nozzles gradually increases from the center of the evaporation source to the periphery, and the inner diameter of the nozzle at the center is 10 mm, and the inner diameter of the nozzle at the periphery is 15 mm.
[0027] In one of the above technical solutions of the evaporation assembly, a size parameter of the evaporation through hole comprises:
[0028] an included angle between the second inclined portion and the second surface is less than 55°;
[0029] a depth of the evaporation through hole is less than 25 pm;
[0030] a distance between the recess and the first surface is less than 3.5 pm in a depth direction of the evaporation through hole;
[0031] a transverse distance between the recess and the intersection of the first inclined portion and the first surface is less than 1.5 pm in a direction of extension of the cross-section of the mask plate; and
[0032] a size parameter of the plurality of nozzles comprises:
[0033] an inclination angle of the plurality of nozzles gradually increases from the center of the evaporation source to the periphery, and the inclination angle of the nozzle at the center is 20°, and the inclination angle of the nozzle at the periphery is 30°, wherein the inclination angle refers to an included angle between a normal line of a jet surface of the nozzle and a normal line of the second surface;
[0034] an inner diameter of the plurality of nozzles gradually increases from the center of the evaporation source to the periphery, and the inner diameter of the nozzle at the center is 15 mm, and the inner diameter of the nozzle at the periphery is 18 mm.
[0035] In one of the above technical solutions of the evaporation assembly, the array of nozzles is centrosymmetric around the center of the evaporation source.
[0036] In a second aspect, the present application provides a display panel, comprising:
[0037] a substrate; and
[0038] A light emitting unit formed on the substrate, the light emitting unit being evaporated by the evaporation assembly of any one of the first aspect, so that a width of the inner shadow area with the largest width on the display panel to be evaporated is within a preset allowable range.
[0039] In one of the technical solutions of the above display panel, the preset allowable range depends on a maximum allowable color mixing degree of adjacent light emitting units on the display panel.
[0040] In the case of using the above technical solution, the present application simulates and analyzes the evaporation process of the light emitting unit based on the evaporation principle of the light emitting unit, so as to find the influencing factors of the inner shadow area of the light emitting unit, and then iteratively adjusts the size parameters of the evaporation through hole and the size parameters of the nozzle on the mask plate combined with actual tests, so as to maximize the width of the inner shadow area with the largest width in the multiple inner shadow areas of the display panel to be evaporated, and records the corresponding evaporation through hole size parameters and nozzle size parameters at this time. In this way, the size parameters of the evaporation through hole and the size parameters of the nozzle are adjusted to be within the preset allowable range, so that in the evaporation process of the light emitting unit of the display panel, the Shadow effect can be maximally reduced, especially the width of the inner shadow area of the light emitting unit in the edge region of the display panel, so as to reduce the color mixing degree of the light emitting unit and improve the display quality of the display panel. BRIEF DESCRIPTION OF DRAWINGS
[0041] The preferred embodiments of the present application will be described below with reference to the accompanying drawings, in which:
[0042] Figure 1 is a schematic diagram of an evaporation assembly according to an embodiment of the present application;
[0043] Figure 2 is a top view of a group of linearly arranged light emitting units on a display panel;
[0044] Figure 3 is a partial sectional view of a substrate of a display panel at a position of one of the light emitting units according to an embodiment of the present application;
[0045] Figure 4 is a partial sectional view of a display panel and a mask plate at a position of one of the light emitting units in an evaporation process according to an embodiment of the present application;
[0046] Figure 5 is a thickness curve diagram of the actual measurement of the thickness of the light emitting unit formed by evaporation; Figure 3
[0047] Figure 6 is a diagram showing the percentage of the contribution of each nozzle to the evaporation material of the light emitting unit corresponding to the leftmost evaporation hole in the mask plate during the evaporation of the light emitting unit by numerical simulation;
[0048] Figure 7 is based on Figure 5 the inner shadow affected area of the light emitting unit corresponding to the leftmost evaporation hole in the mask plate according to the simulation data;
[0049] Figure 8 is a diagram of the inner shadow affected area of the light emitting unit corresponding to the middle evaporation hole in the mask plate according to the simulation analysis.
[0050] In the drawings, the reference signs refer to the following:
[0051] 1, mask plate; 100, evaporation hole; 101, first inclined portion; 102, second inclined portion; 103, recess; 11, first surface; 12, second surface; 2, evaporation source; 21, bottom plate; 22, nozzle; 300, substrate; 301, normal area; 302, inner shadow area; 303, outer shadow area; 400, inner shadow affected area. DETAILED DESCRIPTION
[0052] The preferred embodiments of the present application will be described below with reference to the accompanying drawings. Those skilled in the art will understand that these embodiments are only used to explain the technical principles of the present application, and are not used to limit the protection scope of the present application. Those skilled in the art can make adjustments as needed to adapt to specific application occasions.
[0053] It should be noted that in the description of the present application, the terms "upper", "lower", "left", "right", "inner", "outer" and the like indicating the direction or positional relationship are based on the direction or positional relationship shown in the drawings, which is only for the convenience of description, and does not indicate or imply that the related devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the ordinal numbers "first", "second" and the like are only for descriptive purposes, and cannot be understood as indicating or implying relative importance.
[0054] In addition, it should be noted that in the description of the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting" should be understood broadly, for example, it can be fixed connection, or detachable connection or integral connection; it can be mechanical connection, or electrical connection; it can be direct connection, or indirect connection through intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in the present application according to the specific circumstances.
[0055] Shadow area
[0056] In order to realize evaporation of the light emitting unit of the display panel, an evaporation assembly as shown in Figure 1 is needed, that is, a mask plate 1 and an evaporation source 2.
[0057] The mask plate 1 comprises a first surface 11 and an opposite second surface 12, and the evaporation source 2 comprises a bottom plate 21 and a plurality of nozzles 22 arranged on the bottom plate 21 in an array, each of the nozzles 22 is directed towards the second surface 12 and has a spacing with the second surface 12. The mask plate 1 has a plurality of evaporation through holes (not shown in the figure) penetrating through the first surface 11 and the second surface 12, the first surface 11 is directed towards the display panel to be evaporated (not shown in the figure), and the evaporation material sprayed by the nozzles 22 is deposited on the substrate after passing through the evaporation through holes respectively, so as to form a light emitting layer of the light emitting unit on the substrate.
[0058] As shown in Figure 2 and Figure 3 , the film thickness formed on the substrate 300 after the evaporation material passes through the evaporation through holes is not uniform due to the influence of the evaporation material spraying direction and the evaporation through hole size parameter, which is divided into a normal area 301, an inner shadow area 302 and an outer shadow area 303. Taking the evaporation area corresponding to the evaporation through hole at the leftmost side of the mask plate as an example, the thickness of the normal area 301 is the thickest, the inner shadow area 302 is the second, and the outer shadow area 303 is the thinnest.
[0059] In an embodiment, taking the desired film thickness obtained by evaporation as 100% as a reference value, the above-mentioned "film thickness normal area 301" refers to an area whose thickness is, for example, 95%-100% of the desired film thickness, the above-mentioned "inner shadow area 302" refers to an area whose thickness is, for example, 90%-95% of the desired film thickness, and the above-mentioned "outer shadow area 303" refers to an area whose thickness is, for example, less than 90% of the desired film thickness. Of course, those skilled in the art can understand that the corresponding numerical range can be set according to the actual needs, for example, the thickness of the inner shadow area is 85%-90% of the desired film thickness.
[0060] In addition, due to the angle relationship between the nozzles 22 on the evaporation source 2 and the evaporation through holes 100 and the relative position relationship between the nozzles 22 and the evaporation through holes 100, the film thickness of the light emitting unit is not uniform at different positions on the substrate. The positions and widths of the shadow areas, that is, the inner shadow area 302 and the outer shadow area 303, are different at the periphery of the light emitting unit, the width of the inner shadow area 302 of the light emitting unit closest to the edge of the substrate is the largest, and conversely, the width of the inner shadow area 302 of the light emitting unit at the center position is the smallest, as shown in Figure 2 .
[0061] Simulation and experiment
[0062] As described in the background, the adjustment of process parameters can affect the width of the shadow area. In this application, the influence of the size parameters of the evaporation through hole and the size parameters of the nozzle of the evaporation source on the inner shadow area is focused on, and in simulation and experiment, the distance between the mask plate and the display panel, the distance between the mask plate and the evaporation source, and the distance between the nozzles of the evaporation source are set to fixed values (the specific reasons will be described later).
[0063] Figure 4 A partial schematic view of a mask plate 1 according to an embodiment of the present application, wherein,
[0064] Referring to Figure 4 In an implementation, the sidewall of the evaporation through hole 100 is concave, and includes a first inclined portion 101 close to the first surface 11 and a second inclined portion 102 close to the second surface 12, and the first inclined portion 101 and the second inclined portion 102 intersect to form a concave portion 103. The formation of the "concave" shape is because, in the process of processing the evaporation through hole 100 on the mask plate 1, a "two-way etching" method is adopted, that is, etching is performed on the first surface 11 and the second surface of the mask plate 1 respectively, and the influence of the anisotropy of the etchant causes the cross-sectional size of the evaporation through hole 100 to gradually decrease from both ends to the middle, thereby forming the first inclined portion 101 at the portion of the evaporation through hole 100 close to the first surface 11, forming the second inclined portion 102 at the portion of the evaporation through hole 100 close to the second surface 12, and forming the concave portion 103 at the intersection of the first inclined portion 101 and the second inclined portion 102.
[0065] In this embodiment, the evaporation through hole with such a shape is taken as the simulation and experiment object.
[0066] Next, the evaporation source used in simulation and experiment is described.
[0067] As shown in Figure 4 The edge position of the evaporation through hole 100 shown in FIG. 1 is taken as an example for description, and the arrow shown in the figure indicates the direction of the spray of part of the evaporation material from the nozzle 22 of the evaporation source 2. Figure 5 The thickness of the light emitting unit formed by evaporation is actually measured, and a thickness curve diagram is shown in FIG. 3, wherein the lines in the coordinate system show the thickness information of the light emitting unit, and the position framed by the box is the thickness of the inner shadow area 302 in FIG. 2. Figure 4 The thickness of the light emitting unit formed by evaporation is actually measured, and a thickness curve diagram is shown in FIG. 3, wherein the lines in the coordinate system show the thickness information of the light emitting unit, and the position framed by the box is the thickness of the inner shadow area 302 in FIG. 2. Figure 4 In FIG. 3, the size parameters of the outer shadow area 303 are greatly affected by the distance between the substrate 300 and the mask plate 1, the distance between the mask plate and the evaporation source, and the distance between the nozzles, while the size parameters of the inner shadow area 302 are mainly affected by the size parameters of the evaporation through hole 100 and the size parameters of the nozzle 22. The inner shadow area has a greater influence on color mixing than the outer shadow area, so the optimization of the influencing factors of the inner shadow area is focused on in this application.
[0068] Referring to Figure 6 and Figure 7 , Figure 6 FIG. 4 is a diagram showing the percentage of the contribution of each nozzle to the evaporation material of the light emitting unit corresponding to the leftmost evaporation hole in the mask plate when evaporation is performed using simulation, Figure 7 FIG. 5 is a diagram showing the inner shadow affected area of the light emitting unit corresponding to the leftmost evaporation hole based on the simulation data in Figure 6 .
[0069] In the simulation analysis shown in Figure 6 and Figure 7 , if the single side (i.e. the straight line direction along the single side of the evaporation source 2) of the evaporation source 2 includes 30 nozzles 22 as an example, it can be known that the area between the 15th nozzle and the 16th nozzle is the center of the evaporation source 2. In combination with simulation and actual experiments, it can be known that Figure 6 the area corresponding to the nozzles 22 whose contribution ratio in Figure 7 is less than the contribution threshold (the threshold is about 2%) has a major impact on the inner shadow area of the light emitting unit corresponding to the leftmost evaporation hole, that is, the inner shadow affected area 400 (the shadow area in ), and the nozzle parameters in the inner shadow affected area 400 will have an impact on the inner shadow area.
[0070] It should be understood that in the examples shown in Figure 6 and Figure 7 , the inner shadow affected area of the light emitting unit corresponding to the leftmost evaporation hole is shown, because for the numerous light emitting units on the substrate, the width of the inner shadow area of the light emitting unit in the area closer to the edge is larger (which has been analyzed above), and therefore, it is most meaningful to study the inner shadow affected area of the edge. However, this does not mean that the present application only analyzes the light emitting units in the edge area. For example, as shown in Figure 8 FIG. 6 is a diagram showing the inner shadow affected area of the light emitting unit corresponding to the evaporation hole in the middle of the substrate according to simulation analysis, and it can be seen that for the light emitting unit corresponding to the evaporation hole in the middle, the inner shadow affected area 400 is the nozzle close to the edge area of the evaporation source 2.
[0071] After the concept that different evaporation holes correspond to different inner shadow affected areas is obtained, when the inner shadow area of a certain evaporation hole is simulated, only the size parameters of the nozzles in the corresponding affected area can be adjusted, and the size parameters of the nozzles in the non-affected area do not have to be adjusted (for example, set to a fixed value), which is beneficial to save the number of simulations and improve the simulation efficiency.
[0072] The simulation and test of the present application are completed by setting the nozzle size parameters (including inner diameter and inclination angle) and the size parameters of the evaporation through hole (including the angle between the second inclined part 102 and the second surface 12, the depth of the evaporation through hole 100, i.e. the thickness of the mask plate, the distance between the recess 103 and the first surface 11 in the depth direction of the evaporation through hole 100, and the transverse distance between the junction of the recess 103 and the first inclined part 101 and the first surface 11 in the extension direction of the cross section of the mask plate 1) in the simulation, and based on the actual evaporation of the display panel after the simulation and the actual measurement as shown in Figure 5 The simulation and test of the present application are completed by setting the nozzle size parameters (including inner diameter and inclination angle) and the size parameters of the evaporation through hole (including the angle between the second inclined part 102 and the second surface 12, the depth of the evaporation through hole 100, i.e. the thickness of the mask plate, the distance between the recess 103 and the first surface 11 in the depth direction of the evaporation through hole 100, and the transverse distance between the junction of the recess 103 and the first inclined part 101 and the first surface 11 in the extension direction of the cross section of the mask plate 1) in the simulation, and based on the actual evaporation of the display panel after the simulation and the actual measurement as shown in
[0073] Evaporation assembly structure
[0074] It should be noted that for the plurality of light emitting units completed by evaporation, the inner shadow area with the maximum width usually corresponds to the evaporation through hole of the edge region of the mask plate, and therefore the width of the inner shadow area with the maximum width can be controlled within the preset allowable range. Alternatively, the preset allowable range depends on the maximum allowable color mixing degree of the adjacent light emitting units on the display panel, wherein the color mixing degree refers to the overlap or deviation of the evaporation material between different color light emitting units (such as R, G, B) due to the Shadow effect, thereby affecting the color purity and accuracy of the display panel, and therefore the preset allowable range can control the width of the inner shadow area according to the allowable color mixing degree, thereby reducing the overlap or deviation of the evaporation material.
[0075] The present application obtains the following parameter combination, when the following parameter combination is adopted, the width value of the inner shadow area 302 with the maximum width in the plurality of inner shadow areas 302 is within the range of 6-7 μm, i.e. the preset allowable range in the above is 6-7 μm.
[0076] First embodiment
[0077] In one embodiment, the size parameters of the evaporation through hole 100 include: the included angle between the second inclined portion 102 and the second surface 12 is 55°-60°; the depth of the evaporation through hole 100 is less than 25 μm; the distance between the concave portion 103 and the first surface 11 along the depth direction of the evaporation through hole 100 is less than 3.5 μm; the lateral distance between the intersection of the concave portion 103 and the first inclined portion 101 and the first surface 11 along the extension direction of the cross section of the mask plate 1 is less than 1.5 μm. The size parameters of the plurality of nozzles 22 include: the inclination angle of the plurality of nozzles 22 gradually increases from the center of the evaporation source 2 to the periphery, and the inclination angle of the nozzle 22 at the center is 0°, and the inclination angle of the nozzle 22 at the outermost edge is 20°, wherein the inclination angle refers to the included angle between the normal of the nozzle jet surface and the normal of the second surface; the inner diameter of the plurality of nozzles 22 gradually increases from the center of the evaporation source 2 to the periphery, and the inner diameter of the nozzle 22 at the center is 10 mm, and the inner diameter of the nozzle 22 at the outermost edge is 15 mm.
[0078] In order to verify that such a structure meets the preset requirements, the following test data is given.
[0079] In the case of using the above-mentioned parameter combination of the embodiment, the inventors take a group of specific numerical values within the range of the above-mentioned parameter combination, and respectively obtain the width of the inner shadow area of the light emitting unit (six light emitting units are taken on each side edge) on the left side edge region and the right side edge region of the substrate as shown in Table 1:
[0080] 3.2 6.7 5.3 3.2 1.4 1.1 4.2 6.3 6.3 3.2 2.5 1.1
[0081] Table 1
[0082] As can be seen from Table 1, the width value of the inner shadow area 302 with the largest width in the plurality of inner shadow areas 302 is 6-7 μm.
[0083] Second embodiment
[0084] The size parameters of the evaporation through hole 100 include: the included angle between the second inclined portion 102 and the second surface 12 is less than 55°; the depth of the evaporation through hole 100 is less than 25 μm; the distance between the recessed portion 103 and the first surface 11 along the depth direction of the evaporation through hole 100 is less than 3.5 μm; and the transverse distance between the intersection of the recessed portion 103 and the first inclined portion 101 and the first surface 11 along the extension direction of the cross section of the mask plate 1 is less than 1.5 μm. The size parameters of the plurality of nozzles 22 include: the inclination angles of the plurality of nozzles 22 gradually increase from the center of the evaporation source 2 to the periphery, and the inclination angle of the nozzle 22 at the center is 0°, and the inclination angle of the nozzle 22 at the most peripheral edge is 20°, wherein the inclination angle refers to the included angle between the normal of the nozzle jet surface and the normal of the second surface; and the inner diameters of the plurality of nozzles 22 gradually increase from the center of the evaporation source 2 to the periphery, and the inner diameter of the nozzle 22 at the center is 10 mm, and the inner diameter of the nozzle 22 at the most peripheral edge is 15 mm.
[0085] Third embodiment
[0086] The size parameters of the evaporation through hole 100 include: the included angle between the second inclined portion 102 and the second surface 12 is less than 55°; the depth of the evaporation through hole 100 is less than 25 μm; the distance between the recessed portion 103 and the first surface 11 along the depth direction of the evaporation through hole 100 is less than 3.5 μm; and the transverse distance between the intersection of the recessed portion 103 and the first inclined portion 101 and the first surface 11 along the extension direction of the cross section of the mask plate 1 is less than 1.5 μm. The size parameters of the plurality of nozzles 22 include: the inclination angles of the plurality of nozzles 22 gradually increase from the center of the evaporation source 2 to the periphery, and the inclination angle of the nozzle 22 at the center is 20°, and the inclination angle of the nozzle 22 at the most peripheral edge is 30°, wherein the inclination angle refers to the included angle between the normal of the nozzle jet surface and the normal of the second surface; and the inner diameters of the plurality of nozzles 22 gradually increase from the center of the evaporation source 2 to the periphery, and the inner diameter of the nozzle 22 at the center is 15 mm, and the inner diameter of the nozzle 22 at the most peripheral edge is 18 mm.
[0087] Through the inventor's experimental verification, in the case of using the above two embodiments, the width value of the inner shadow area 302 with the largest width in the plurality of inner shadow areas 302 is also in the range of 6-7 μm.
[0088] Optionally, in some embodiments of the present application, the plurality of nozzles 22 arranged in an array on the evaporation source 2 are centrally symmetric around the center of the evaporation source 2, so that the distribution state of the inner shadow area 302 of each light emitting unit is also centrally symmetric.
[0089] As described above, this application simulates and analyzes the evaporation process of the light-emitting unit based on the evaporation principle, thereby identifying the influencing factors of the shadow area within the light-emitting unit. Then, combined with actual experiments, the dimensional parameters of the evaporation through-hole 100 and the nozzle 22 on the mask 1 are repeatedly adjusted and iterated to minimize the width of the widest inner shadow area among multiple inner shadow areas of the display panel to be evaporated. The corresponding dimensional parameters of the evaporation through-hole and the nozzle are recorded at this point. In this way, by adjusting the dimensional parameters of the evaporation through-hole 100 and the nozzle 22 to a preset allowable range, the shadow effect can be minimized during the evaporation process of the light-emitting unit in the display panel, especially reducing the width of the inner shadow area of the light-emitting unit in the edge area of the display panel, thereby reducing the color mixing degree of the light-emitting unit and improving the display quality of the display panel.
[0090] It should be noted that in the above embodiments, the distance between the mask and the display panel is set to 2-5 μm; the distance between the mask and the vapor deposition source is set to 400-700 mm; and the nozzle spacing on the vapor deposition source is set to 10-70 mm. However, as mentioned earlier, through simulation and experimentation, the inventors found that these parameters have a very small impact on the inner shadow area and can basically be disregarded.
[0091] It should also be noted that although the above embodiments are illustrated using vapor-deposited through-holes with a specific morphology as an example, those skilled in the art will understand that, under the teachings of this application, they can apply the same principles to vapor-deposited through-holes with other morphologies.
[0092] This application also discloses a display panel, including a substrate; and a light-emitting unit formed on the substrate, wherein the light-emitting unit is processed by the above-mentioned vapor deposition assembly so that the width of the inner shadow area with the largest width on the display panel to be vapor deposited is within a preset allowable range.
[0093] The technical solutions of this application have been described above with reference to the preferred embodiments shown in the accompanying drawings. However, it will be readily understood by those skilled in the art that the scope of protection of this application is obviously not limited to these specific embodiments. Without departing from the principles of this application, those skilled in the art can make equivalent changes or substitutions to the relevant technical features, and the technical solutions after these changes or substitutions will all fall within the scope of protection of this application.
Claims
1. An evaporation assembly, characterized by include: A mask (1) includes a first surface (11) facing the display panel to be vapor-deposited and a second surface (12) opposite to the first surface (11). The mask (1) has a plurality of vapor deposition through holes (100) penetrating the first surface (11) and the second surface (12). The vapor deposition source (2) includes a plurality of nozzles (22) arranged in an array, all of which face the second surface (12); The size parameters of the plurality of vapor deposition through holes (100) and the size parameters of the plurality of nozzles (22) are designed to ensure that the width of the inner shadow area (302) with the largest width on the display panel to be vapor deposited is within a preset allowable range.
2. The evaporation assembly according to claim 1, characterized in that The preset allowable range depends on the maximum allowable color mixing degree of adjacent light-emitting units on the display panel.
3. The evaporation assembly according to claim 2, characterized in that The sidewall of the vapor-deposited through-hole (100) is concave and includes a first inclined portion (101) and a second inclined portion (102). The first inclined portion (101) is close to the first surface (11), and the second inclined portion (102) is close to the second surface (12). The first inclined portion (101) and the second inclined portion (102) intersect to form the concave recess (103).
4. The evaporation assembly according to claim 3, characterized in that The preset allowable range is 6-7 μm.
5. The vapor deposition assembly according to claim 3, characterized in that, The dimensional parameters of the vapor-deposited through-hole (100) include: The angle between the second inclined portion (102) and the second surface (12) is 55°-60°; The depth of the vapor-deposited through-hole (100) is less than 25 μm; Along the depth direction of the vapor-deposited through-hole (100), the distance between the recess (103) and the first surface (11) is less than 3.5 μm; In the extending direction along the cross-section of the mask plate (1), the lateral distance between the recess (103) and the junction of the first inclined portion (101) and the first surface (11) is less than 1.5 μm; and The dimensional parameters of the plurality of nozzles (22) include: The tilt angle of the plurality of nozzles (22) gradually increases from the center of the vapor deposition source (2) to the periphery, and the tilt angle of the nozzle (22) at the center is 0°, and the tilt angle of the nozzle (22) at the outermost edge is 20°, wherein the tilt angle refers to the angle between the normal of the spray surface of the nozzle (22) and the normal of the second surface (12). The inner diameter of the plurality of nozzles (22) gradually increases from the center of the vapor deposition source (2) to the periphery, with the inner diameter of the nozzle (22) at the center being 10 mm and the inner diameter of the nozzle (22) at the outermost edge being 15 mm.
6. The vapor deposition assembly according to claim 3, characterized in that, The dimensional parameters of the vapor-deposited through-hole (100) include: The angle between the second inclined portion (102) and the second surface (12) is less than 55°; The depth of the vapor-deposited through-hole (100) is less than 25 μm; A distance between the recess (103) and the first surface (11) in a depth direction of the evaporation through hole (100) is less than 3.5 μm; A transverse distance between the recess (103) and an intersection of the first inclined portion (101) and the first surface (11) in an extending direction of a cross section of the mask plate (1) is less than 1.5 μm; and Size parameters of the plurality of nozzles (22) include: An inclination angle of the plurality of nozzles (22) gradually increases from a center of the evaporation source (2) to a periphery, and the inclination angle of the nozzle (22) at the center is 0°, and the inclination angle of the nozzle (22) at the periphery is 20°, wherein the inclination angle refers to an included angle between a normal line of a jet surface of the nozzle (22) and a normal line of the second surface (12); An inner diameter of the plurality of nozzles (22) gradually increases from the center of the evaporation source (2) to the periphery, and the inner diameter of the nozzle (22) at the center is 10 mm, and the inner diameter of the nozzle (22) at the periphery is 15 mm.
7. The evaporation assembly of claim 3, wherein Size parameters of the evaporation through hole (100) include: An included angle between the second inclined portion (102) and the second surface (12) is less than 55°; A depth of the evaporation through hole (100) is less than 25 μm; A distance between the recess (103) and the first surface (11) in a depth direction of the evaporation through hole (100) is less than 3.5 μm; A transverse distance between the recess (103) and an intersection of the first inclined portion (101) and the first surface (11) in an extending direction of a cross section of the mask plate (1) is less than 1.5 μm; and Size parameters of the plurality of nozzles (22) include: An inclination angle of the plurality of nozzles (22) gradually increases from a center of the evaporation source (2) to a periphery, and the inclination angle of the nozzle (22) at the center is 20°, and the inclination angle of the nozzle (22) at the periphery is 30°, wherein the inclination angle refers to an included angle between a normal line of a jet surface of the nozzle (22) and a normal line of the second surface (12); An inner diameter of the plurality of nozzles (22) gradually increases from the center of the evaporation source (2) to the periphery, and the inner diameter of the nozzle (22) at the center is 15 mm, and the inner diameter of the nozzle (22) at the periphery is 18 mm.
8. The evaporation assembly according to any of claims 1 to 7, characterized in that The arrayed nozzles (22) are centrosymmetric around the center of the evaporation source (2).
9. A display panel, characterized by, Comprise: A substrate (300); and A light emitting unit formed on the substrate (300) is processed by using the evaporation assembly of any one of claims 1 to 8.
10. The display panel of claim 9, wherein, The preset allowable range depends on a maximum allowable color mixing degree of adjacent light emitting units on the display panel. The arrayed nozzles (22) are centrosymmetric around the center of the evaporation source (2).