Deposition apparatus and deposition system

Abstract

The utility model discloses deposition equipment and a deposition system. The deposition equipment comprises an equipment main body, a process pipe and a baffle plate. At least one end of the equipment body is provided with an opening, and the equipment body is provided with a containing cavity communicated with the opening. The process pipe is detachably installed in the containing cavity through the opening. The baffle is detachably arranged in the containing cavity and located below the process pipe, and the baffle is arranged between the process pipe and the equipment body. In this way, the process pipe can be conveniently replaced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor technology, and in particular to a deposition device and a deposition system. BACKGROUND

[0002] A process tube of a deposition device can form a process cavity and can place a substrate and a carrier, and the process tube can also provide a flow of process gas. In the related art, the process tube needs to be replaced after being used for a period of time, but due to different materials and structures of the process tube and thermal stress in the deposition process, the process tube can be cracked, which increases the difficulty of replacing the process tube. CONTENT OF THE UTILITY MODEL

[0003] Embodiments of the present application provide a deposition device and a deposition system, which can facilitate replacement of a process tube.

[0004] In a first aspect, embodiments of the present application provide a deposition device. The deposition device includes a device main body, a process tube, and a baffle. At least one end of the device main body is provided with an opening, and the device main body has a receiving cavity in communication with the opening. The process tube is detachably installed in the receiving cavity through the opening. The baffle is detachably arranged in the receiving cavity and located below the process tube, and the baffle is arranged between the process tube and the device main body.

[0005] Optionally, in the axial direction of the process tube, the extension length of the baffle is greater than or equal to the extension length of the process tube, and the two ends of the baffle are provided with inner flanges extending in the direction close to the center of the process tube, and the inner flanges of the two ends of the baffle respectively abut the two ends of the process tube.

[0006] Optionally, the end of the baffle close to the opening of the device is provided with an outer flange extending in the direction away from the center of the process tube, so as to limit the axial movement of the baffle.

[0007] Optionally, the two ends of the baffle respectively abut the device main body, and the middle part of the baffle is spaced from the device main body.

[0008] Optionally, the deposition device further includes a pulling device, the pulling device is partially engaged with the end of the baffle and / or the process tube, and is used for detaching the baffle and the process tube from the receiving cavity.

[0009] Optionally, the pulling device includes a hoisting device, a connecting device, and an engaging device, the engaging device has an engaging groove engaged with the edge of the process tube and / or the baffle; and the connecting device connects the hoisting device and the engaging device.

[0010] Optionally, the deposition device further includes a bearing device, the bearing device is arranged between the hoisting device and the engaging device, and the connecting device is located above the bearing device; the bearing device includes a partition plate and a roller arranged on the partition plate, and the bearing device is used for bearing the baffle and the process tube after being detached from the receiving cavity.

[0011] Optionally, the one end of the device body with the opening is detachably provided with a pulley, and the pulley is used to provide support when the baffle is detached.

[0012] Optionally, the baffle surrounds at least part of the process tube, and in a cross section perpendicular to an axis of the process tube, the cross section of the baffle is arranged in an arc shape, and a circumferential angle corresponding to the cross section of the baffle is 120°-240°.

[0013] In a second aspect, an embodiment of the present application provides a deposition system. The deposition system comprises a mounting frame and the deposition device as described above, and a plurality of deposition devices are mounted on the mounting frame.

[0014] The present application has the following beneficial effects: since the process tube needs to be replaced after a period of process, and due to the length and material of the process tube in the related art and stress problems in the deposition process, the process tube is prone to breakage. By arranging the baffle below the process tube, the baffle can bear the process tube or even the broken process tube. On this basis, by detaching the baffle from the process tube, the process tube or even the broken process tube can be easily taken out of the device body, and the operation rate of the device is improved. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 is a structural schematic diagram of the deposition device embodiment of the present application;

[0016] Figure 2 is Figure 1 is a schematic diagram of the baffle and the process tube of the deposition device as shown in

[0017] Figure 3 is Figure 1 is an enlarged view of A in

[0018] Figure 4 is a schematic diagram of the position relationship between the baffle and the process tube of the deposition device embodiment of the present application.

[0019] REFERENCE NUMERALS:

[0020] deposition device, 1; device body, 11; process tube, 12; baffle, 13; pulling device, 14; hoisting device, 141; connecting device, 142; clamping device, 143; bearing device, 15; partition plate, 151; roller, 152; pulley, 16. DETAILED DESCRIPTION

[0021] With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all the other embodiments obtained by those of ordinary skill in the art without creative effort should fall within the scope of the present application.

[0022] During deposition, the carrier or the substrate usually needs to be heat treated, or the deposition is performed at the same time of heat treatment. The heat treatment process is usually performed in a deposition device. The deposition (including reaction process products) is deposited on the surface of the substrate at the same time of being deposited on the wall of the process tube. Due to the difference in thermal expansion coefficient between the process tube and the deposition, the thermal stress is different. The surface of the process tube with deposition is easy to break under the action of thermal stress during heating, and needs to be replaced in time. Since the deposition device itself has a certain length, the process tube is relatively difficult to disassemble. If the process tube is broken, the disassembly of the process tube will be further difficult. In order to improve the above technical problems, the present application can provide the following embodiments.

[0023] The embodiment of the present application provides a deposition system. The deposition system comprises a mounting frame and a plurality of deposition devices 1 mounted on the mounting frame. The specific embodiments of the deposition device 1 can be referred to the following description.

[0024] In combination Figures 1 to 3 , the embodiment of the present application provides a deposition device 1. The deposition device 1 comprises a device main body 11, a process tube 12 and a baffle 13. At least one end of the device main body 11 is provided with an opening. The device main body 11 can be provided with an opening only at one end, that is, a furnace mouth. The process tube 12 and the baffle 13 can be disassembled from the furnace mouth. The device main body 11 can be provided with an opening at both ends, that is, a furnace mouth and a furnace tail. The process tube 12 can be disassembled from the furnace mouth or the furnace tail.

[0025] The device main body 11 has a containing cavity in communication with the opening. The containing cavity can be used to contain the process tube 12. The inner wall of the device main body 11 can also be provided with a heating element, so that the device main body 11 can heat the process tube 12. The opening of the device main body 11 can be provided with a door body, which can close the opening. Optionally, the door body can also be provided with an air flow channel in communication with the process tube 12, so as to facilitate the introduction of process gas into the process tube 12.

[0026] The process tube 12 is detachably mounted in the containing cavity through the opening, and the process tube 12 can be replaced by disassembly. The process tube 12 can be a quartz tube. The process tube 12 forms a process cavity therein. The carrier or the substrate can be placed in the process cavity. The process cavity can be used for the process gas to flow through.

[0027] The baffle plate 13 is detachably arranged in the accommodating cavity and located below the process tube 12. The baffle plate 13 is arranged between the process tube 12 and the equipment main body 11. The baffle plate 13 can support the process tube 12 to a certain extent, and can assist the disassembly of the process tube 12 during the disassembly process of the process tube 12. The material of the baffle plate 13 can be ceramic or silicon carbide. The mechanical strength of the baffle plate 13 is higher than that of the process tube 12. By arranging the baffle plate 13, the process tube 12 or even the broken process tube 12 can be supported, thereby facilitating the disassembly of the process tube 12, improving the disassembly efficiency of the process tube 12, and improving the operation rate of the equipment.

[0028] In some embodiments, in the axial direction of the process tube 12, the extension length of the baffle plate 13 is greater than or equal to the extension length of the process tube 12. By arranging the extension length of the baffle plate 13 to be greater than or equal to the extension length of the process tube 12, the baffle plate 13 can sufficiently support the process tube 12. Even if the process tube 12 is broken, the broken fragments can be blocked by the baffle plate 13 as much as possible, so that the process tube 12 or even the broken process tube 12 can be easily disassembled by disassembling the baffle plate 13.

[0029] Further, the two ends of the baffle plate 13 are arranged to extend in the direction close to the center of the process tube 12 and are provided with inner flanges. The inner flanges of the two ends of the baffle plate 13 respectively abut the two ends of the process tube 12. On the one hand, the inner flanges can abut the two ends of the process tube 12, so that the baffle plate 13 can transmit force in the axial direction to the process tube 12, so that the process tube 12 can be installed and disassembled together when the baffle plate 13 is disassembled or installed. On the other hand, the inner flanges can provide a gripping position for the pulling device 14 to engage, so that the pulling device 14 can disassemble the baffle plate 13 together with the process tube 12.

[0030] In some embodiments, the baffle plate 13 is arranged to extend in the direction away from the center of the process tube 12 at one end close to the equipment opening. By arranging the outer flange, the outer flange can abut the equipment main body 11, thereby limiting the axial movement of the baffle plate 13. The outer flange can also provide a gripping position for the pulling device 14 to engage, so that the pulling device 14 can disassemble the baffle plate 13 together with the process tube 12.

[0031] In some embodiments, the two ends of the baffle plate 13 respectively abut the equipment main body 11, and the middle part of the baffle plate 13 is spaced from the equipment main body 11. Since the baffle plate 13 inevitably rubs against the equipment main body 11 during disassembly, in order to reduce the wear of the baffle plate 13 and the equipment main body 11 caused by friction, the baffle plate 13 can be supported in the equipment main body 11 by supporting the middle part in the air.

[0032] Specifically, the outer flanges at both ends of the baffle 13 can abut against the bottom of the accommodating cavity, so as to space the middle part of the baffle 13 from the device body 11. Alternatively, the baffle 13 can be lifted by the support parts at both ends of the device body 11, so as to space the middle part of the baffle 13 from the device body 11. The baffle 13 can also be supported by the flanges at both ends of the device body 11, so as to space the middle part of the baffle 13 from the device body 11.

[0033] The pulling device 14 is described in detail below.

[0034] In some embodiments, the deposition device 1 further comprises a pulling device 14, which partially engages with the end of the baffle 13 and / or the process tube 12, for disassembling the baffle 13 and the process tube 12 from the accommodating cavity. The pulling device 14 can only pull the baffle 13, which can pull the process tube 12 together. The pulling device 14 can also only pull the process tube 12, which can pull the baffle 13 together. The pulling device 14 can also simultaneously pull the process tube 12 and the baffle 13, so as to simultaneously disassemble the baffle 13 and the process tube 12 together.

[0035] Specifically, the pulling device 14 comprises a hoisting device 141, a connecting device 142 and an engaging device 143. The engaging device 143 has an engaging slot. The engaging slot can engage with the edge of the process tube 12, or can engage with the edge of the baffle 13. The engaging device 143 can have multiple engaging slots, which can simultaneously engage the process tube 12 and the baffle 13. The connecting device 142 connects the hoisting device 141 and the engaging device 143. The connecting device 142 can be a steel wire or a high-strength composite non-metallic material. The connecting device 142 can also be a high-strength connecting rod. The hoisting device 141 can be a winch or a mechanical arm, etc.

[0036] In some embodiments, the deposition apparatus 1 further comprises a bearing device 15 disposed between the hoisting device 141 and the clamping device 143. The connecting device 142 is located above the bearing device 15. The bearing device 15 comprises a partition plate 151 and rollers 152 disposed on the partition plate 151, and is used to bear the baffle 13 and the process tube 12 after being detached from the accommodating cavity. During the process of detaching the baffle 13 and the process tube 12 from the apparatus body 11, since the baffle 13 and the process tube 12 have a certain length, as the detached part of the baffle 13 and the process tube 12 from the apparatus body 11 increases, the baffle 13 and the process tube 12 will bear an increasingly large bending moment. By disposing the bearing device 15, the part of the baffle 13 and the process tube 12 that has been detached can be mechanically supported. By disposing the partition plate 151, the debris that may exist during the detachment process can be collected, thereby reducing the impact of the falling debris on other equipment. By disposing the rollers 152, the resistance during the pulling process of the baffle 13 can be reduced. Optionally, in the direction perpendicular to the axis of the process tube 12, the rollers 152 can be disposed at intervals on opposite sides of the partition plate 151, and the surfaces of the two rollers 152 in contact with the baffle 13 can be inclinedly disposed, thereby better bearing and guiding the detachment of the baffle 13 and the process tube 12.

[0037] In some embodiments, the apparatus body 11 has an open end detachably provided with a pulley 16, which is used to provide support when the baffle 13 is detached. During the process of detaching the baffle 13 and the process tube 12 from the apparatus body 11, the support of the baffle 13 by the apparatus body 11 on the side close to the opening may no longer be sufficient. In order to increase the stability of the baffle 13 and the process tube 12 during the detachment process of the baffle 13, the pulley 16 can be disposed on the apparatus body 11, thereby providing effective and reliable support to the baffle 13 in time when the baffle 13 is detached from the opening. During the process of the deposition apparatus 1, the pulley 16 can be selected to be detached from the apparatus body 11, thereby reducing the impact on the process.

[0038] In combination Figure 4 In some embodiments, the baffle 13 surrounds at least part of the process tube 12, and in the cross section perpendicular to the axis of the process tube 12, the cross section of the baffle 13 is arc-shaped, and the corresponding circumferential angle of the cross section of the baffle 13 (in combination Figure 4 of ∠A) is 120°-240°. For example, the corresponding circumferential angle can be 150°, 180°, 200° or 220°. If the corresponding circumferential angle of the cross section of the baffle 13 is too small, in the case that the process tube 12 may be cracked, the baffle 13 cannot fully collect the cracked debris, and a large amount of debris may still fall on the apparatus body 11. If the corresponding circumferential angle of the cross section of the baffle 13 is too large, the baffle 13 will block most of the outer circumference of the process tube 12, resulting in a decrease in the efficiency of the apparatus body 11 in heating the process tube 12.

[0039] The above merely provides the examples of the present application, and does not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made by using the content of the present application specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A deposition apparatus, characterized by, The deposition apparatus comprises: a device body, at least one end of the device body is provided with an opening, the device body has a receiving cavity in communication with the opening; a process tube, which is detachably installed in the receiving cavity through the opening; a baffle, which is detachably installed in the receiving cavity and located below the process tube, the baffle is arranged between the process tube and the device body.

2. The deposition apparatus according to claim 1, wherein: in the axial direction of the process tube, the extension length of the baffle is greater than or equal to the extension length of the process tube, both ends of the baffle are provided with inner flanges extending towards the center of the process tube, and the inner flanges of both ends of the baffle respectively abut the two ends of the process tube.

3. The deposition apparatus according to claim 1, wherein: the baffle is provided with an outer flange extending away from the center of the process tube at the end close to the device opening, so as to limit the axial movement of the baffle.

4. The deposition apparatus according to claim 1, wherein: both ends of the baffle respectively abut the device body, and the middle part of the baffle is spaced from the device body.

5. The deposition apparatus according to claim 1, further comprising a pulling device, the pulling device is partially engaged with the end of the baffle and / or the process tube, and is used for detaching the baffle and the process tube from the receiving cavity.

6. The deposition apparatus according to claim 5, wherein: the pulling device comprises a hoisting device, a connecting device and an engaging device, the engaging device has an engaging groove engaged with the edge of the process tube and / or the baffle, and the connecting device connects the hoisting device and the engaging device.

7. The deposition apparatus according to claim 6, further comprising a bearing device, the bearing device is arranged between the hoisting device and the engaging device, and the connecting device is located above the bearing device; the bearing device comprises a partition plate and a roller arranged on the partition plate, and is used for bearing the baffle and the process tube after being detached from the receiving cavity.

8. The deposition apparatus according to any one of claims 1-5, wherein: one end of the device body provided with the opening is detachably provided with a pulley, and the pulley is used for providing support when the baffle is detached.

9. The deposition apparatus according to any one of claims 1-5, wherein: the baffle surrounds at least part of the process tube, in the cross section perpendicular to the axial line of the process tube, the cross section of the baffle is arranged in an arc shape, and the corresponding circumferential angle of the cross section of the baffle is 120°-240°. The deposition apparatus comprises a mounting rack and the deposition apparatus according to any one of claims 1-9, and a plurality of the deposition apparatuses are mounted on the mounting rack. ​ 10. A deposition system, characterized by, ​

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