Circulating cooling water control device of plasma etching machine

Abstract

The utility model discloses a circulating cooling water control device of a plasma etching machine, which relates to the technical field of circulating cooling water control devices and comprises a frame, a circulating mechanism is arranged at the bottom end in the frame, a control mechanism is arranged at the bottom end in the frame, and the circulating mechanism comprises a cold water tank and a heat exchanger. A three-way pipe is fixedly installed at the water inlet end of the heat exchanger, and a first special-shaped pipe is fixedly installed at the water drainage end of the heat exchanger. And the control mechanism comprises a limiting frame plate, a control system is fixedly installed on one side of the limiting frame plate, a third water pump is fixedly installed at the bottom end of the interior of the frame, and a temperature sensor is installed at the upper end of the cold water tank in a penetrating mode. According to the utility model, the temperature can be accurately adjusted according to the requirement of the etching process, the consistency and accuracy of the etching result are prevented from being reduced, and the high-precision etching requirement can be met.

Description

Technical Field

[0001] This utility model relates to the technical field of circulating cooling water control devices, and in particular to a circulating cooling water control device for a plasma etching machine. Background Technology

[0002] Plasma etching is the most common form of dry etching. Its principle involves gas exposed to electrons forming plasma. The resulting ionized gas and the gas releasing high-energy electrons form plasma or ions. When ionized gas atoms are accelerated by an electric field, they release sufficient force and surface repulsion to tightly adhere to the material or etch the surface. In a plasma etching machine, plasma is generated by exciting the gas with a high-frequency electric field. During this process, collisions between ions and electrons, as well as chemical reactions, release heat. Therefore, a circulating cooling water control system is used to remove this heat. By maintaining a suitable temperature within the etching machine, the circulating cooling water control system can effectively reduce etching deviations caused by excessively high or uneven temperatures, such as localized over-etching or under-etching, thus improving the quality of the etched product.

[0003] However, in existing technologies, plasma etching processes are quite sensitive to temperature. Temperature changes can affect parameters such as etching rate, etching perpendicularity, and roughness. If the temperature of the circulating cooling water cannot be controlled, the temperature cannot be precisely adjusted according to the requirements of the etching process, resulting in reduced consistency and accuracy of the etching results, making it difficult to meet the requirements of high-precision etching. Utility Model Content

[0004] The purpose of this invention is to solve the problem in the prior art that if the temperature of the circulating cooling water cannot be controlled, the temperature cannot be precisely adjusted according to the requirements of the etching process, resulting in reduced consistency and accuracy of the etching results and difficulty in meeting the requirements of high-precision etching. Therefore, this invention proposes a circulating cooling water control device for a plasma etching machine.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: a circulating cooling water control device for a plasma etching machine, comprising a frame, a circulation mechanism provided at the bottom of the frame, a control mechanism provided at the bottom of the frame, the circulation mechanism comprising a cold water tank and a heat exchanger, a three-way pipe fixedly installed at the inlet end of the heat exchanger, and a first-shaped pipe fixedly installed at the outlet end of the heat exchanger.

[0006] The control mechanism includes a limiting frame plate, one side of the limiting frame plate is fixedly installed with a control system, the inside bottom end of the frame is fixedly installed with a third water pump, the upper end of the cold water tank is penetratedly installed with a temperature sensor, the water suction end of the third water pump is fixedly installed with a third special-shaped pipe, the water outlet end of the third water pump is fixedly installed with a flow guide pipe, the other end of the flow guide pipe is fixedly installed with a second electromagnetic valve, the temperature sensor is signal connected with the control system, and the third water pump and the second electromagnetic valve are signal connected with the control system.

[0007] Preferably, the inside bottom end of the frame is fixedly installed with a first water pump, the inside bottom end of the frame is fixedly installed with a second water pump, the water inlet end of the second water pump is fixedly installed with a second special-shaped pipe, and the water outlet end of the first water pump is fixedly installed with a communication pipe.

[0008] Preferably, the upper end of the cold water tank is penetratedly installed with a water level meter, the other end of the third special-shaped pipe penetrates into the inside of the cold water tank, and the other end of the second electromagnetic valve is fixed with one of the ports of the three-way pipe.

[0009] Preferably, the other end of the communication pipe is fixedly installed with a first electromagnetic valve, the first electromagnetic valve is signal connected with the control system, the other end of the first special-shaped pipe penetrates the upper end of the cold water tank and is located in the inside of the cold water tank.

[0010] Preferably, the other end of the first electromagnetic valve is fixed with another port of the three-way pipe, and the other end of the second special-shaped pipe penetrates into the inside of the cold water tank.

[0011] Preferably, the lower end of the cold water tank is fixed with the inside bottom end of the frame, and the lower end of the heat exchanger is fixed with the inside bottom end of the frame.

[0012] Compared with the prior art, the utility model has the advantages and positive effects that:

[0013] 1、In the utility model, through setting up control mechanism, the water temperature in the cold water tank can be controlled, so as to accurately adjust the temperature according to the requirement of etching process, prevent the consistency and accuracy of etching result from reducing, and meet the etching requirement of high precision.

[0014] 2、In the utility model, through setting up circulating mechanism, the first water pump guides the water outside to the inside of the communication pipe through the water inlet end, and the water enters the inside of the heat exchanger through the first electromagnetic valve and the three-way pipe, and the water is processed through the heat exchanger, so as to collect the water outside, the second water pump sucks the water in the cold water tank through the second special-shaped pipe, and the water is guided out through the water outlet end of the second water pump, so as to guide the processed water out, thereby the cooling water can be circularly used, and the utilization rate of water resource is improved. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 A three-dimensional structure schematic diagram of a circulating cooling water control device of a plasma etching machine is provided for the utility model;

[0016] Figure 2 A side view of a circulating cooling water control device of a plasma etching machine is provided for the utility model;

[0017] Figure 3 A structure schematic diagram of a part of circulating mechanism and control mechanism in a circulating cooling water control device of a plasma etching machine is provided for the utility model;

[0018] Figure 4 A system diagram of a circulating cooling water control device of a plasma etching machine is provided for the utility model;

[0019] Figure 5 A structure schematic diagram of a circulating mechanism in a circulating cooling water control device of a plasma etching machine is provided for the utility model.

[0020] Legend: 1, frame; 2, circulating mechanism; 21, cold water tank; 22, heat exchanger; 23, three-way pipe; 24, No. 1 water pump; 25, No. 2 water pump; 26, No. 1 special-shaped pipe; 27, No. 2 special-shaped pipe; 28, communication pipe; 29, No. 1 electromagnetic valve; 3, control mechanism; 31, limiting frame plate; 32, control system; 33, No. 3 water pump; 34, temperature sensor; 35, water level gauge; 36, No. 3 special-shaped pipe; 37, flow guide pipe; 38, No. 2 electromagnetic valve. DETAILED DESCRIPTION

[0021] In order to enable the above-mentioned purpose, features and advantages of the utility model to be more clearly understood, the utility model will be further described below in conjunction with the drawings and embodiments. It should be noted that the embodiments of the present application and the features in the embodiments can be combined with each other without conflict.

[0022] In the following description, many specific details are set forth in order to provide a thorough understanding of the utility model, however, the utility model can also be implemented in other ways different from the description herein, therefore, the utility model is not limited to the specific embodiments disclosed in the following description.

[0023] Embodiment one: as shown in the utility model provides a circulating cooling water control device of a plasma etching machine, including frame 1, the inside bottom end of frame 1 is provided with circulating mechanism 2, the inside bottom end of frame 1 is provided with control mechanism 3, circulating mechanism 2 includes cold water tank 21 and heat exchanger 22, the water inlet end of heat exchanger 22 is fixedly installed with three-way pipe 23, and the water outlet end of heat exchanger 22 is fixedly installed with No. 1 special-shaped pipe 26; Figure 1 - Figure 5 ​

[0024] The control mechanism 3 comprises a limiting frame plate 31, one side of the limiting frame plate 31 is fixedly installed with a control system 32, the inner bottom end of the frame 1 is fixedly installed with a third water pump 33, the upper end of the cold water tank 21 is penetratively installed with a temperature sensor 34, the water suction end of the third water pump 33 is fixedly installed with a third special-shaped pipe 36, the water outlet end of the third water pump 33 is fixedly installed with a flow guide pipe 37, the other end of the flow guide pipe 37 is fixedly installed with a second electromagnetic valve 38, the temperature sensor 34 is signal connected with the control system 32, the third water pump 33 and the second electromagnetic valve 38 are all signal connected with the control system 32, the upper end of the cold water tank 21 is penetratively installed with a water level meter 35, the other end of the third special-shaped pipe 36 penetrates into the inside of the cold water tank 21, and the other end of the second electromagnetic valve 38 is fixed with one of the ports of the three-way pipe 23.

[0025] The specific settings and effects of the embodiment will be described below. According to the required temperature when the plasma etching machine works, the temperature value monitored by the temperature sensor 34 is set in advance by controlling the control system 32, and then the temperature sensor 34 is installed in the inside of the cold water tank 21. When the temperature value in the inside of the cold water tank 21 is lower than the set value, the temperature sensor 34 will transmit a signal to the control system 32, and the control system 32 will control the third water pump 33 to run, and at the same time, the second electromagnetic valve 38 is opened. The third water pump 33 transmits the water in the inside of the cold water tank 21 to the inside of the flow guide pipe 37 through the third special-shaped pipe 36, and then the water is guided into the inside of the heat exchanger 22 through the second electromagnetic valve 38 and the three-way pipe 23. The water is processed by the heat exchanger 22, and then the water is guided into the inside of the cold water tank 21 through the third special-shaped pipe 36. Thus, the temperature of the water in the inside of the cold water tank 21 can be controlled, so that the temperature can be accurately adjusted according to the requirements of the etching process, the consistency and accuracy of the etching result can be prevented from being reduced, and the high-precision etching requirement can be met.

[0026] The water level meter 35 is arranged, so that the staff can observe the water amount in the inside of the cold water tank 21 in real time.

[0027] The second electromagnetic valve 38 is arranged, so that the connection channel between the flow guide pipe 37 and the three-way pipe 23 can be controlled, and whether the water can enter the inside of the three-way pipe 23 through the flow guide pipe 37 can be controlled.

[0028] Embodiment two: as Figure 1 , Figure 2 , Figure 3 and Figure 5As shown, the circulation mechanism 2 includes a cold water tank 21 and a heat exchanger 22. A three-way pipe 23 is fixedly installed at the inlet end of the heat exchanger 22, and a first-shaped pipe 26 is fixedly installed at the outlet end of the heat exchanger 22. A first-type water pump 24 is fixedly installed at the bottom inside the frame 1, and a second-type water pump 25 is fixedly installed at the bottom inside the frame 1. A second-type pipe 27 is fixedly installed at the inlet end of the second-type water pump 25, and a connecting pipe 28 is fixedly installed at the outlet end of the first-type water pump 24. The other end of the connecting pipe 28... A first solenoid valve 29 is fixedly installed and is connected to the control system 32. The other end of the first shaped tube 26 passes through the upper end of the cold water tank 21 and is located inside the cold water tank 21. The other end of the first solenoid valve 29 is fixed to the other port of the three-way pipe 23. The other end of the second shaped tube 27 passes through the interior of the cold water tank 21. The lower end of the cold water tank 21 is fixed to the inner bottom end of the frame 1. The lower end of the heat exchanger 22 is fixed to the inner bottom end of the frame 1.

[0029] The overall effect of this embodiment is that, by operating the control system 32, the No. 1 water pump 24 and the No. 2 water pump 25 are controlled to operate. The No. 1 water pump 24 introduces external water into the interior of the connecting pipe 28 through the water inlet, and then enters the interior of the heat exchanger 22 through the No. 1 solenoid valve 29 and the three-way pipe 23. The water is processed by the heat exchanger 22 and then enters the interior of the cold water tank 21 through the No. 1 special-shaped pipe 26, which can collect the external water. The No. 2 water pump 25 sucks the water from the interior of the cold water tank 21 through the No. 2 special-shaped pipe 27 and discharges the sucked water through the water outlet of the No. 2 water pump 25, which can discharge the processed water, thereby enabling the cooling water to be recycled and improving the utilization rate of water resources.

[0030] The method for using the device and the working principle are as follows: firstly, the device is installed in a suitable position, the water outlet end of the plasma etching machine is connected with the water inlet end of the first water pump 24, and the water outlet end of the second water pump 25 is connected with the cooling mechanism of the plasma etching machine, then, according to the temperature required when the plasma etching machine works, the temperature value monitored by the temperature sensor 34 is set in advance by controlling the control system 32, and then the temperature sensor 34 is installed in the inside of the cold water tank 21, when the temperature value in the inside of the cold water tank 21 is lower than the set value, the temperature sensor 34 will transmit a signal to the control system 32, the control system 32 will control the third water pump 33 to run, and the second electromagnetic valve 38 is opened at the same time, the third water pump 33 transmits the water in the inside of the cold water tank 21 to the inside of the flow guide pipe 37 through the third special-shaped pipe 36, and the water is guided into the inside of the heat exchanger 22 through the second electromagnetic valve 38 and the three-way pipe 23, the water is processed in the heat exchanger 22, and then the water is guided into the inside of the cold water tank 21 through the third special-shaped pipe 36, so that the temperature of the water in the inside of the cold water tank 21 can be controlled, finally, when the circulating mechanism 2 works, the control system 32 is operated to control the first water pump 24 and the second water pump 25 to run, the first water pump 24 guides the external water into the inside of the communication pipe 28 through the water inlet end, and then the water enters the inside of the heat exchanger 22 through the first electromagnetic valve 29 and the three-way pipe 23, the water is processed in the heat exchanger 22, and then the water is guided into the inside of the cold water tank 21 through the first special-shaped pipe 26, so that the external water can be collected, and the second water pump 25 sucks the water in the inside of the cold water tank 21 through the second special-shaped pipe 27, and then the sucked water is guided out through the water outlet end of the second water pump 25, so that the processed water can be guided out and guided into the inside of the cooling mechanism.

[0031] The above is only a preferred embodiment of the present application, and is not intended to limit the present application in other forms, and any skilled person in the art can modify or change the above disclosed technical content to equivalent embodiments applied to other fields, but any simple modification, equivalent change and modification made on the basis of the technical essence of the present application to the above embodiments still falls within the protection scope of the present application.

Claims

1. A circulating cooling water control device for a plasma etching machine comprising a frame (1), characterized in that: The internal bottom end of the frame (1) is provided with a circulating mechanism (2), and the internal bottom end of the frame (1) is provided with a control mechanism (3), the circulating mechanism (2) comprises a cold water tank (21) and a heat exchanger (22), the water inlet end of the heat exchanger (22) is fixedly installed with a three-way pipe (23), and the water outlet end of the heat exchanger (22) is fixedly installed with a first special-shaped pipe (26). The control mechanism (3) comprises a limiting frame plate (31), one side of the limiting frame plate (31) is fixedly installed with a control system (32), the internal bottom end of the frame (1) is fixedly installed with a third water pump (33), the upper end of the cold water tank (21) is installed through a temperature sensor (34), the water suction end of the third water pump (33) is fixedly installed with a third special-shaped pipe (36), the water outlet end of the third water pump (33) is fixedly installed with a flow guide pipe (37), the other end of the flow guide pipe (37) is fixedly installed with a second electromagnetic valve (38), the temperature sensor (34) is signal connected with the control system (32), and the third water pump (33) and the second electromagnetic valve (38) are signal connected with the control system (32).

2. The circulating cooling water control device for a plasma etching machine according to claim 1, wherein: The internal bottom end of the frame (1) is fixedly installed with a first water pump (24), the internal bottom end of the frame (1) is fixedly installed with a second water pump (25), the water inlet end of the second water pump (25) is fixedly installed with a second special-shaped pipe (27), and the water outlet end of the first water pump (24) is fixedly installed with a communication pipe (28).

3. The circulating cooling water control device for a plasma etching machine according to claim 1, wherein: The upper end of the cold water tank (21) is installed through a water level meter (35), the other end of the third special-shaped pipe (36) penetrates into the cold water tank (21), and the other end of the second electromagnetic valve (38) is fixed with one of the ports of the three-way pipe (23).

4. The control device for circulating cooling water of a plasma etching machine according to claim 2, wherein: The other end of the communication pipe (28) is fixedly installed with a first electromagnetic valve (29), the first electromagnetic valve (29) is signal connected with the control system (32), the other end of the first special-shaped pipe (26) penetrates the upper end of the cold water tank (21) and is located in the cold water tank (21).

5. The control device for the circulating cooling water of a plasma etching machine according to claim 4, wherein: The other end of the first electromagnetic valve (29) is fixed with another port of the three-way pipe (23), and the other end of the second special-shaped pipe (27) penetrates into the cold water tank (21).

6. The control device for the circulating cooling water of a plasma etching machine according to claim 5, wherein: The lower end of the cold water tank (21) is fixed with the internal bottom end of the frame (1), and the lower end of the heat exchanger (22) is fixed with the internal bottom end of the frame (1).

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