Silicon wafer clamp for dry etching
By using a double-ended screw and elastic protective components in the silicon wafer clamp, the problems of particle jamming and chemical corrosion during dry etching are solved, achieving smooth and adaptable silicon wafer clamping and protecting the silicon wafer from damage.
Patent Information
- Application Number
- CN202520426050.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-12
- Publication Date
- 2026-01-30
- Estimated Expiration
- 2035-03-12
AI Technical Summary
Particles generated during dry etching can easily fall onto the threads of the screw, causing the screw to be difficult to adjust or to be chemically corroded, affecting the normal use of the fixture. Furthermore, traditional fixtures are difficult to adapt to silicon wafers of different sizes or shapes.
The silicon wafer clamping structure employs a double-ended screw with elastic protective components and buffers, including a slide, clamping blocks, bellows, and springs to prevent particles from entering the threaded area, and the position of the clamping blocks can be adjusted by rotating the handle to accommodate silicon wafers of different sizes.
It effectively prevents particulate matter from jamming the screw, ensures smooth adjustment, avoids chemical corrosion, and can adapt to the clamping requirements of silicon wafers of different sizes, protecting the silicon wafers from damage.
Smart Images
Figure CN223859646U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model belongs to the technical field of clamp, specifically point to a kind of silicon wafer clamp for dry etching. BACKGROUND
[0002] In the semiconductor manufacturing process, dry etching is a commonly used process, for forming fine patterns on the surface of silicon wafer, in the process of dry etching, silicon wafer needs to be firmly fixed on the clamp, to ensure the uniformity and accuracy of etching, the traditional silicon wafer clamp usually adopts mechanical clamping mode, directly clamps silicon wafer through screw rod and clamping block.
[0003] However, the particles generated in the process of dry etching are easy to fall on the screw thread of screw rod, causing screw rod adjustment not smooth or chemical corrosion, affecting the normal use of clamp, and the traditional clamp usually adopts single screw rod or fixed clamping mode, which is difficult to adapt to silicon wafers of different sizes or shapes. UTILITY MODEL CONTENTS
[0004] The technical problem to be solved by the utility model is that the particles generated in the process of dry etching are easy to fall on the screw thread of screw rod, causing screw rod adjustment not smooth or chemical corrosion, affecting the normal use of clamp.
[0005] In order to realize the above function, the technical scheme adopted by the utility model is as follows: a silicon wafer clamp for dry etching, comprising a base, a sliding groove is provided on the base, a double-end screw rod is rotatably provided on the sliding groove, a clamping block is threadedly connected to the double-end screw rod, the clamping block is slidably provided on the sliding groove, an elastic protection piece is sleeved on the double-end screw rod, and a buffer piece is provided on the clamping block.
[0006] Preferably, the elastic protection piece comprises a plurality of bellows, and the two ends of the bellows are fixed between the side wall of the clamping block and the side wall of the sliding groove.
[0007] Preferably, the buffer piece comprises a spring and a pad, the top side wall of the clamping block is provided with a groove, the end of the pad is slidably provided on the groove, the spring is arranged between the pad and the side wall of the groove, and the side wall of the pad is provided with a soft pad.
[0008] Preferably, the sliding groove is provided in a cross-shaped structure, the two ends of the double-end screw rod are rotatably provided on the side wall of the sliding groove, the middle part of the double-end screw rod is rotatably penetrated through the base, the double-end screw rod is provided in two groups, the two groups of double-end screw rods are perpendicular and not intersected, the side wall of the base is rotatably provided with a handle, and the end of the handle is rotatably penetrated through the base and connected to the double-end screw rod.
[0009] Preferably, the bottom wall of the base is provided with a foot pad.
[0010] Preferably, the base, clamping block, pad and bellows are all made of corrosion-resistant material.
[0011] The utility model discloses adopt above -mentioned structure and obtain beneficial effect as follows:
[0012] 1, the multiple groups of bellows on double -end screw can effectively wrap double -end screw, prevent the particulate matter produced in dry etching process from falling on the screw thread of screw, ensure that the screw adjustment is smooth, avoids the jamming phenomenon.
[0013] 2, the buffer piece contains spring and cushion block, when the clamping block clamps silicon wafer, spring and soft pad can play double buffering effect, avoid the damage caused by the hard contact of clamping block to silicon wafer directly.
[0014] 3, through rotating handle, the position of clamping block can be conveniently adjusted, to adapt to the clamping need of different size silicon wafer. BRIEF DESCRIPTION OF DRAWINGS
[0015] Figure 1 It is the overall structure schematic view of the utility model embodiment;
[0016] Figure 2 It is the utility model embodiment sectional view;
[0017] Figure 3 It is Figure 2 A enlarged view of middle A part;
[0018] Figure 4 It is the utility model embodiment enlarged view.
[0019] Wherein, 1, base, 2, sliding slot, 3, double -end screw, 4, clamping block, 5, elastic protection piece, 6, buffer piece, 7, bellows, 8, spring, 9, cushion block, 10, recess, 11, soft pad, 12, handle, 13, foot pad. DETAILED DESCRIPTION
[0020] The technical scheme of the utility model will be described below in connection with the drawings, obviously, the described embodiment is a part of the embodiment of the utility model, instead of all the embodiment. Based on the embodiment in the utility model, all other embodiments obtained by the ordinary skill in the art without making creative labor belong to the range of protection of the utility model.
[0021] In the description of the utility model, it is necessary to explain, the term "center", "upper", "lower", "left", "right", "vertical", "horizontal", "internal", "external" and so on indicate the orientation or position relation based on the orientation or position relation shown in the drawing, only for the convenience of describing the utility model and simplifying the description, and not indicate or imply that the indicated device or element must have a particular orientation, construct and operate in a particular orientation, therefore, it cannot be understood as the limitation of the utility model. In addition, the terms "first", "second", "third" are only for the purpose of description, and cannot be understood as indicating or implying relative importance. The utility model will be further described in detail below in combination with the drawings.
[0022] As Figures 1-4 shown, the utility model provides a kind of for dry etching silicon wafer clamp, including base 1, the base 1 is equipped with sliding slot 2, double-end screw 3 is rotationally equipped on the sliding slot 2, clamping block 4 is threadedly connected on the double-end screw 3, the clamping block 4 is slidably equipped in sliding slot 2, elastic protection piece 5 is sleeved on the double-end screw 3, buffer piece 6 is equipped on the clamping block 4, elastic protection piece 5 wraps double-end screw 3, can also be telescopic with clamping block 4 and move to protect screw, can prevent the particulate matter generated in dry etching process from falling on the thread of screw, ensure that screw adjustment is smooth, avoid jamming phenomenon, and buffer piece 6 can buffer protection when clamping block 4 clamps silicon wafer.
[0023] As Figure 2 shown, the elastic protection piece 5 includes multiple groups of bellows 7, both ends of the bellows 7 are fixed between the side wall of clamping block 4 and the side wall of sliding slot 2, to wrap double-end screw 3, prevent particulate matter from entering.
[0024] As Figure 3 shown, the buffer piece 6 includes spring 8 and pad 9, the top side wall of the clamping block 4 is equipped with recess 10, the end of the pad 9 is slidably equipped in recess 10, the spring 8 is equipped between pad 9 and the side wall of recess 10, the side wall of the pad 9 is equipped with soft pad 11, for being contacted with silicon wafer.
[0025] As Figure 1 , 2As shown in Figure 4, the slide groove 2 is arranged in a cross shape. The two ends of the double-ended screw 3 are rotatably mounted on the side wall of the slide groove 2 and the middle part is rotatably mounted through the base 1. There are two sets of double-ended screws 3, which are arranged vertically and do not intersect. The side wall of the base 1 is rotatably provided with a handle 12. The end of the handle 12 is rotatably mounted through the base 1 and connected to the double-ended screw 3. Rotating the handle 12 on the side wall of the base 1 will cause the double-ended screw 3 connected to the handle 12 to rotate accordingly. Since the double-ended screw 3 is threadedly connected to the clamping block 4, the clamping block 4 will slide on the slide groove 2. At the same time, the other set of vertically arranged double-ended screws 3 can also be adjusted by the corresponding handle 12 so that the space enclosed by the two sets of clamping blocks 4 can be adapted to the size of the silicon wafer.
[0026] like Figure 1 , 2 As shown in Figure 4, the bottom wall of the base 1 is provided with foot pads 13 to increase the stability of the fixture. The base 1, clamping block 4, pad block 9 and corrugated pipe 7 are all made of corrosion-resistant materials to adapt to the dry etching environment.
[0027] In practical use, the handle 12 on the side wall of the rotating base 1 is rotated. For example, if the silicon wafer is large, the handle 12 is rotated clockwise, and the double-headed screw 3 connected to the handle 12 will rotate accordingly. Since the double-headed screw 3 is threadedly connected to the clamping block 4, the clamping block 4 will slide on the slide groove 2 in a direction away from the center. At the same time, another set of vertically arranged double-headed screws 3 can also be adjusted by the corresponding handle 12 so that the space enclosed by the two sets of clamping blocks 4 can be adapted to the size of the silicon wafer. Due to the protection of the bellows 7, particles will not enter the threaded area of the screw, ensuring smooth adjustment.
[0028] Place the silicon wafer in the central area enclosed by the clamping blocks 4, so that the edge of the silicon wafer is close to the buffer 6 on the clamping blocks 4. At this time, the soft pad 11 on the side wall of the pad 9 will first contact the silicon wafer. Under the action of the spring 8, the soft pad 11 will fit tightly against the edge of the silicon wafer, playing a role in buffering and fixing. Continue to rotate the handle 12 to bring the clamping blocks 4 closer to the silicon wafer until the silicon wafer is firmly clamped.
[0029] Place the fixture and silicon wafer together into the dry etching equipment and start the etching process. After etching is completed, rotate the handle 12 in the opposite direction to release the clamp 4 and remove the etched silicon wafer.
[0030] The present invention and its embodiments have been described above. This description is not restrictive, and the accompanying drawings are only one embodiment of the present invention; the actual structure is not limited thereto. In conclusion, if those skilled in the art are inspired by this description and design similar structures and embodiments without departing from the inventive spirit of the present invention, such designs should fall within the protection scope of the present invention.
Claims
1. A silicon wafer chuck for dry etching comprising a base (1) characterised in that: The base (1) is provided with a sliding groove (2), the double-head screw rod (3) is rotatably arranged on the sliding groove (2), the clamping block (4) is threadedly connected to the double-head screw rod (3), the clamping block (4) is slidably arranged on the sliding groove (2), the elastic protection member (5) is sleeved on the double-head screw rod (3), and the buffer member (6) is arranged on the clamping block (4).
2. The silicon wafer chuck for dry etching according to claim 1, wherein: The elastic protection member (5) comprises a plurality of groups of bellows (7), and the two ends of the bellows (7) are fixed between the side wall of the clamping block (4) and the side wall of the sliding groove (2).
3. A silicon wafer chuck for dry etching as defined in claim 2, wherein: The buffer member (6) comprises a spring (8) and a pad (9), the top side wall of the clamping block (4) is provided with a groove (10), the end of the pad (9) is slidably arranged on the groove (10), the spring (8) is arranged between the pad (9) and the side wall of the groove (10), and the side wall of the pad (9) is provided with a soft pad (11).
4. The wafer chuck for dry etching as claimed in claim 1, wherein: The sliding groove (2) is arranged in a cross-shaped structure, the two ends of the double-head screw rod (3) are rotatably arranged on the side walls of the sliding groove (2), the middle part of the double-head screw rod (3) is rotatably arranged through the base (1), the double-head screw rod (3) is provided with two groups, the two groups of double-head screw rods (3) are arranged vertically and do not intersect, the side wall of the base (1) is rotatably provided with a handle (12), and the end of the handle (12) is rotatably arranged through the base (1) and connected to the double-head screw rod (3).
5. The wafer chuck for dry etching as recited in claim 1, wherein: The bottom wall of the base (1) is provided with a foot pad (13).
6. The wafer chuck for dry etching as recited in claim 3, wherein: The base (1), the clamping block (4), the pad (9) and the bellows (7) are all made of corrosion-resistant materials.