Drying rack for monocrystalline silicon wafer production

Abstract

The utility model discloses a drying rack for monocrystalline silicon wafer production, and relates to the technical field of monocrystalline silicon wafer production. The drying rack for monocrystalline silicon wafer production comprises a fixed frame, the output end of the driving motor is fixedly connected with a rotating shaft; a pneumatic rotating joint is mounted at the upper end of the rotating shaft; the surface of the rotating shaft is fixedly connected with a turntable, and the upper end of the turntable is slidably connected with a second monocrystalline silicon drying frame; limiting blocks are clamped to the surfaces of the second monocrystalline silicon drying frames, limiting rods are clamped to the interiors of the second monocrystalline silicon drying frames, the multiple first monocrystalline silicon drying frames are arranged between the two fixing frames, different monocrystalline silicon is dried through the first monocrystalline silicon drying frames and the second monocrystalline silicon drying frames, the drying space can be more effectively utilized, and the drying efficiency is improved. Different drying frames can dry different types of monocrystalline silicon wafers, and through rotation of the rotating disc, it is ensured that hot air can penetrate through the corresponding monocrystalline silicon wafers more uniformly, water evaporation is accelerated, and therefore the drying speed is increased.

Description

Technical Field

[0001] This utility model relates to the field of monocrystalline silicon wafer production technology, and in particular to a drying rack for monocrystalline silicon wafer production. Background Technology

[0002] Monocrystalline silicon wafers: A single crystal of silicon, a crystal with a basically complete lattice structure. Different directions have different properties. It is a good semiconductor material with a purity requirement of 99.9999%, or even higher than 99.9999999%. It is used to manufacture semiconductor devices, solar cells, etc. It is made by pulling high-purity polycrystalline silicon in a single crystal furnace. During the production of monocrystalline silicon wafers, they need to be dried. Chinese utility model patent, authorized announcement number "CN112144124A", discloses a drying rack for monocrystalline silicon wafers that is easy to disassemble and adjust. It includes two support frames, with an installation cylinder fixedly installed between the two support frames. The top and bottom walls of the inner cavity of the support frame are fixedly installed with bearing seats. A bidirectional threaded rod is movably installed between the two bearing seats. The left and right side walls of the inner cavity of the support frame are provided with guide grooves. A threaded moving rod seat that is threadedly connected to the bidirectional threaded rod is slidably connected between two adjacent guide grooves. A positioning insert rod that penetrates through and extends to the outside of the support frame is fixedly installed on the front surface of the threaded moving rod seat.

[0003] The above technical solution enables the threaded cylinder to move left and right along the overall structure consisting of the threaded cylinder, connecting block, and adjusting block. This allows for adjustment of the distance between adjacent adjusting blocks based on the amount of stored material, ensuring the neatness and uniformity of the material for easy unloading. However, the above technical solution still has certain drawbacks. The structure of the drying rack is fixed, and it can only hold one type of drying frame. This may not fully utilize the drying space, resulting in low drying efficiency. Different sizes or types of monocrystalline silicon wafers may not be suitable for the drying frame, and a single drying frame may not meet the drying needs of all silicon wafers, thus extending the drying cycle and reducing production efficiency. Therefore, this utility model proposes a novel solution. Utility Model Content

[0004] The purpose of this utility model is to at least solve one of the technical problems existing in the prior art, and to provide a drying rack for monocrystalline silicon wafer production. This solution solves the problems of the fixed structure of the drying rack, which can only hold one type of drying frame, which may not fully utilize the drying space, resulting in low drying efficiency. Different sizes or types of monocrystalline silicon wafers may not be suitable for the drying frame, and a single drying frame may not be able to meet the drying needs of all silicon wafers, thereby prolonging the drying cycle and reducing production efficiency.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a drying rack for monocrystalline silicon wafer production, comprising a fixed frame;

[0006] Single-crystalline silicon drying component, the single-crystalline silicon drying component includes a driving motor, the driving motor is fixed at the lower end of the fixed frame, the output end of the driving motor is fixedly connected with a rotating shaft, the number of fixed frames is two, the rotating shaft is rotationally connected with the two fixed frames, and a pneumatic rotary joint is installed at the upper end of the rotating shaft;

[0007] The surface of the rotating shaft is fixedly connected with a turntable, both the rotating shaft and the turntable are hollow, four exhaust holes are opened on the surface of the turntable, a connecting block is fixedly connected to the upper end of the turntable, and a second single-crystalline silicon drying frame is slidably connected to the upper end of the turntable;

[0008] The surface of the second single-crystalline silicon drying frame is clamped with a limiting block, a first through hole is opened on the surface of the second single-crystalline silicon drying frame, a second through hole is opened on the surface of the limiting block, a limiting rod is clamped inside the second single-crystalline silicon drying frame, and the limiting rod is clamped with the limiting block;

[0009] A plurality of first single-crystalline silicon drying frames are arranged between the two fixed frames.

[0010] Preferably, the single-crystalline silicon drying component further includes connecting rods, the number of connecting rods is four, the four connecting rods are all fixedly connected with the two fixed frames, and a plurality of first drying frame support frames are fixedly connected to the surfaces of the four connecting rods;

[0011] A second drying frame support frame is arranged on the opposite surfaces of the two fixed frames, the second drying frame support frame is in the shape of a "丰" character, two connecting frames are arranged on the front side of the fixed frame, bolts are threadedly connected inside the two connecting frames, and the second drying frame support frame is fixedly connected with the two fixed frames through the two connecting frames.

[0012] Preferably, the number of the turntables, connecting blocks, second single-crystalline silicon drying frames, and limiting blocks is five, and they are all arranged on the surface of the rotating shaft;

[0013] The plurality of first single-crystalline silicon drying frames are all square and have ventilation holes opened at the bottom, and the five second single-crystalline silicon drying frames are all disc-shaped and also have ventilation holes opened at the bottom.

[0014] Preferably, the number of the second drying frame support frames and connecting frames is two groups, and they are symmetrically arranged on the front and back sides of the fixed frame respectively.

[0015] Preferably, the plurality of first single-crystalline silicon drying frames are respectively slidably connected with the corresponding second drying frame support frames and first drying frame support frames.

[0016] Preferably, four support legs are fixedly connected to the lower end of the lower fixed frame, and two fixing frames are arranged between the two fixed frames, and the two fixing frames are in the shape of an "X";

[0017] The two fixed frames are fixedly connected to the corresponding connecting rods, and the connection points of the four connecting rods and the two fixed frames are all equipped with reinforcing ribs.

[0018] Compared with the prior art, the beneficial effects of this utility model are:

[0019] 1. This drying rack for monocrystalline silicon wafer production uses a first monocrystalline silicon drying frame and a second monocrystalline silicon drying frame to dry different monocrystalline silicon wafers. This allows for more efficient use of the drying space. Different drying frames can be used to dry different types of monocrystalline silicon wafers. Furthermore, the rotation of the turntable ensures that hot air can penetrate the corresponding monocrystalline silicon wafers more evenly, accelerating moisture evaporation and thus increasing the drying speed. Attached Figure Description

[0020] The present invention will be further described below with reference to the accompanying drawings and embodiments:

[0021] Figure 1 This is a schematic diagram of a drying rack structure for monocrystalline silicon wafer production according to the present invention;

[0022] Figure 2 This is a schematic diagram of the second drying frame support frame of this utility model;

[0023] Figure 3 This is a schematic diagram of the pneumatic rotary joint of this utility model;

[0024] Figure 4 This is a schematic diagram of the rotating shaft of this utility model;

[0025] Figure 5 This is a schematic diagram of the limiting block of this utility model;

[0026] Figure 6 This is a schematic diagram of the second monocrystalline silicon drying frame of this utility model.

[0027] Reference numerals in the attached drawings: 1. Fixed frame; 2. Connecting rod; 3. Fixed bracket; 4. First drying frame support frame; 5. Second drying frame support frame; 6. Connecting frame; 7. First monocrystalline silicon drying frame; 8. Drive motor; 9. Rotating shaft; 10. Turntable; 11. Pneumatic rotary joint; 12. Connecting block; 13. Second monocrystalline silicon drying frame; 14. Limiting block; 15. Limiting rod; 16. First through hole; 17. Second through hole. Detailed Implementation

[0028] This section will describe in detail the specific embodiments of the present utility model. The preferred embodiments of the present utility model are shown in the accompanying drawings. The purpose of the drawings is to supplement the textual description with graphics, so that people can intuitively and vividly understand each technical feature and the overall technical solution of the present utility model, but they should not be construed as limiting the scope of protection of the present utility model.

[0029] In the description of this utility model, it should be understood that the directional descriptions, such as up, down, front, back, left, right, etc., indicate the directional or positional relationship based on the directional or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0030] In the description of this utility model, terms such as greater than, less than, and exceeding are understood to exclude the stated number, while terms such as above, below, and within are understood to include the stated number. The use of terms like "first" and "second" is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the quantity or sequence of the indicated technical features.

[0031] In the description of this utility model, unless otherwise explicitly defined, terms such as "setting," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this utility model in conjunction with the specific content of the technical solution.

[0032] Please see Figure 1-6 This utility model provides a technical solution: a drying rack for monocrystalline silicon wafer production, including a fixed frame 1, a monocrystalline silicon drying assembly, and a drive motor 8. The drive motor 8 is fixed to the lower end of the fixed frame 1, and a rotating shaft 9 is fixedly connected to the output end of the drive motor 8. There are two fixed frames 1, and the rotating shaft 9 is rotatably connected to both fixed frames 1. A pneumatic rotary joint 11 is installed on the upper end of the rotating shaft 9, and a turntable 10 is fixedly connected to the surface of the rotating shaft 9. Both the rotating shaft 9 and the turntable 10 are hollow. Four exhaust holes are provided on the surface. A connecting block 12 is fixedly connected to the upper end of the turntable 10. A second monocrystalline silicon drying frame 13 is slidably connected to the upper end of the turntable 10. A limiting block 14 is snapped onto the surface of the second monocrystalline silicon drying frame 13. A first through hole 16 is provided on the surface of the second monocrystalline silicon drying frame 13. A second through hole 17 is provided on the surface of the limiting block 14. A limiting rod 15 is snapped onto the inside of the second monocrystalline silicon drying frame 13. The limiting rod 15 is snapped onto the limiting block 14. Multiple first monocrystalline silicon drying frames 7 are provided between the two fixed frames 1.

[0033] Five of each of the turntable 10, connecting block 12, second monocrystalline silicon drying frame 13, and limiting block 14 are set on the surface of the rotating shaft 9. Multiple first monocrystalline silicon drying frames 7 are square and have ventilation holes at the bottom. Five second monocrystalline silicon drying frames 13 are disc-shaped and also have ventilation holes at the bottom.

[0034] The single-crystal silicon drying component further includes a connecting rod 2. There are four connecting rods 2, and all four connecting rods 2 are fixedly connected to the two fixed frames 1. A plurality of first drying frame support brackets 4 are fixedly connected to the surfaces of the four connecting rods 2. A second drying frame support bracket 5 is arranged on the opposite surfaces of the two fixed frames 1. The second drying frame support bracket 5 is in the shape of a Chinese character '丰' (丰). Two connecting brackets 6 are arranged on the front side of the fixed frame 1. Bolts are threadedly connected inside the two connecting brackets 6. The second drying frame support bracket 5 is fixedly connected to the two fixed frames 1 through the two connecting brackets 6.

[0035] There are two groups of the second drying frame support brackets 5 and the connecting brackets 6 respectively, which are symmetrically arranged on the front and rear sides of the fixed frame 1.

[0036] A plurality of first single-crystal silicon drying frames 7 are respectively slidably connected to the corresponding second drying frame support brackets 5 and the first drying frame support brackets 4.

[0037] Four support legs are fixedly connected to the lower end of the lower fixed frame 1. Two fixing frames 3 are arranged between the two fixed frames 1. The two fixing frames 3 are in the shape of an 'X'. The two fixing frames 3 are respectively fixedly connected to the corresponding connecting rods 2. Reinforcing ribs are arranged at the joints of the four connecting rods 2 and the two fixed frames 1.

[0038] When using this device, first place this device inside the drying box, place the second single-crystal silicon drying frame 13 on the surface of the turntable 10. Support the second single-crystal silicon drying frame 13 through the turntable 10, limit the second single-crystal silicon drying frame 13 through the connecting block 12. Place the limiting block 14 on the upper end of the second single-crystal silicon drying frame 13, and pass the limiting rod 15 through the first through hole 16 and the second through hole 17 on the surfaces of the second single-crystal silicon drying frame 13 and the limiting block 14. Snap the limiting rod 15 inside the second single-crystal silicon drying frame 13 and the limiting block 14 to limit and fix the second single-crystal silicon drying frame 13. Fix a plurality of second single-crystal silicon drying frames 13 by repeating the above process. Then connect the pneumatic rotary joint 11 to the drying pipeline of the drying box. Pass high-temperature and dry air into the inside of the pneumatic rotary joint 11. Pass the hot air into the inside of the rotating shaft 9 through the pneumatic rotary joint 11 and discharge it from the exhaust holes on the side of the turntable 10. The hot air is introduced to the surface of the second single-crystal silicon drying frame 13 through the upper end of the second single-crystal silicon drying frame 13 and the air-permeable holes at the bottom of the second single-crystal silicon drying frame 13, which is convenient for drying the single-crystal silicon wafers on the surface of the second single-crystal silicon drying frame 13.

[0039] At the same time, start the driving motor 8 to drive the rotating shaft 9 to rotate. The rotating shaft 9 drives the turntable 10 and the connecting block 12 to rotate. The connecting block 12 drives the second single-crystalline silicon drying frame 13 to rotate, which facilitates the rotation of the single-crystalline silicon wafers on the surface of the second single-crystalline silicon drying frame 13, and facilitates the air discharged from the exhaust holes of the turntable 10 to be evenly distributed inside the drying box, facilitating the drying of the single-crystalline silicon wafers, improving the uniformity during drying. At the same time, through the rotation of the second single-crystalline silicon drying frame 13, it is convenient to quickly separate the water vapor on the surface of the single-crystalline silicon wafers from the single-crystalline silicon wafers by centrifugal force, further improving the drying efficiency.

[0040] Since different single-crystalline silicon needs to be dried during the use of the drying rack, different drying frames are required during the drying process. When different single-crystalline silicon wafers need to be dried, place the second drying frame support 5 between the two fixed frames 1, and fix the two second drying frame supports 5 through the connecting frame 6 and the fixing bolts. At the same time, place the first single-crystalline silicon drying frame 7 on the surfaces of the first drying frame support 4 and the second drying frame support 5, and support the first single-crystalline silicon drying frame 7 through the first drying frame support 4 and the second drying frame support 5. During the use of the first single-crystalline silicon drying frame 7, start the driving motor 8 again to drive the rotating shaft 9 to rotate. The rotating shaft 9 drives the turntable 10 to rotate. The turntable 10 rotates the air discharged from its exhaust holes, facilitating the hot air to be evenly sprayed near the corresponding first single-crystalline silicon drying frame 7, and facilitating the hot air to be introduced to the surface of the first single-crystalline silicon drying frame 7 through the ventilation holes at the upper end and the bottom of the first single-crystalline silicon drying frame 7, facilitating the drying of the single-crystalline silicon wafers.

[0041] Drying different single-crystalline silicon with the first single-crystalline silicon drying frame 7 and the second single-crystalline silicon drying frame 13 can make more effective use of the drying space. Different drying frames can dry different types of single-crystalline silicon wafers to ensure that the hot air can penetrate the corresponding single-crystalline silicon wafers more evenly, accelerating the evaporation of moisture, and thus improving the drying speed.

[0042] Through the setting of the fixing frame 3, as an integral part of the drying rack, with its strong structural design, it can effectively enhance the stability and load-bearing capacity of the entire drying rack, enabling the drying rack to more stably support the single-crystalline silicon wafers during the drying process, avoiding shaking or tilting caused by excessive weight or uneven distribution, thus ensuring the safe progress of the drying process and improving the stability during the drying process.

[0043] During the use of the drying rack, reinforcing ribs are installed at the connection between the fixed frame 1 and the connecting rod 2. This can significantly enhance the overall structural strength and stability of the drying rack, ensuring that it is not easily deformed or damaged when bearing monocrystalline silicon wafers or during long-term use. It also improves the firmness of the connection between the fixed frame 1 and the connecting rod 2, enhances the overall load-bearing capacity and durability, and effectively resists these external forces, preventing loosening or damage at the connection. The reinforcing ribs can also help disperse stress and avoid localized damage to the drying rack caused by stress concentration.

[0044] Furthermore, by using the first monocrystalline silicon drying frame 7 and the second monocrystalline silicon drying frame 13 to dry different monocrystalline silicon wafers, the drying space can be utilized more effectively. Different drying frames can be used to dry different types of monocrystalline silicon wafers. In addition, the rotation of the turntable 10 ensures that hot air can penetrate the corresponding monocrystalline silicon wafers more evenly, accelerate moisture evaporation, and thus improve the drying speed.

[0045] By setting up the fixing frame 3, which is a component of the drying rack, the sturdy structural design of the fixing frame 3 can effectively enhance the stability and load-bearing capacity of the entire drying rack. During the use of the drying rack, the fixing frame 1 and the connecting rod 2 are reinforced with reinforcing ribs, which can significantly enhance the overall structural strength and stability of the drying rack. This ensures that it is not easily deformed or damaged when bearing monocrystalline silicon wafers or during long-term use, and avoids shaking or tilting due to excessive weight or uneven distribution, thereby ensuring the safe operation of the drying process and improving the stability of the drying process.

[0046] Structural Description: Fixed Frame 1: The main body of the device, used to support the drying rack.

[0047] Connecting rod 2 and fixing frame 3: Both connecting rod 2 and fixing frame 3 are fixed on the left and right sides of fixing frame 1 to support the drying rack. At the same time, reinforcing ribs are provided at the connection between fixing frame 1 and connecting rod 2 to assist in fixing and support.

[0048] First drying frame support frame 4: There are multiple first drying frame support frames 4, which are fixed on corresponding connecting rods 2 to support the first monocrystalline silicon drying frame 7.

[0049] The second drying frame support frame 5 and connecting frame 6 are used to provide auxiliary support for the drying frame and can also support the first monocrystalline silicon drying frame 7. They can be removed from the drying frame.

[0050] The first monocrystalline silicon drying frame 7 is square in shape and has ventilation holes at the bottom for placing and drying monocrystalline silicon wafers.

[0051] Drive motor 8: Fixed to the lower end of the fixed frame 1 on the lower side, providing power for the rotation of the rotating shaft 9, the turntable 10 and the second single crystal silicon drying frame 13;

[0052] Rotating shaft 9 and turntable 10: Rotatably connected between two fixed frames 1, and both rotating shaft 9 and turntable 10 are hollow. Turntable 10 can support the second single crystal silicon drying frame 13, and rotating shaft 9 can transmit power.

[0053] Pneumatic rotary joint 11: used to connect the rotating shaft 9 and the drying pipe of the drying box. The pneumatic rotary joint 11 is an existing structure, including a joint, filter, solenoid valve, cylinder, vacuum equipment, air pipe, etc., and is used as a transition connection sealing structure for inputting gas medium from the static system to the dynamic rotating system.

[0054] Connecting block 12, limiting block 14 and limiting rod 15: Connecting block 12 is fixed to the upper end of turntable 10 and is used to cooperate with limiting block 14 and limiting rod 15 to limit the second monocrystalline silicon drying frame 13;

[0055] The second monocrystalline silicon drying frame 13 is circular and has ventilation holes at the bottom for placing and drying monocrystalline silicon wafers. It can also rotate under the drive of the rotating shaft 9.

[0056] The embodiments of the present utility model have been described in detail above with reference to the accompanying drawings. However, the present utility model is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present utility model.

Claims

1. A drying rack for monocrystalline silicon wafer production, characterized in that: It includes a fixed frame (1); A single-crystalline silicon drying component, which includes a driving motor (8). The driving motor (8) is fixed at the lower end of the fixed frame (1). The output end of the driving motor (8) is fixedly connected to a rotating shaft (9). There are two fixed frames (1). The rotating shaft (9) is rotationally connected to the two fixed frames (1). An air-driven rotary joint (11) is installed at the upper end of the rotating shaft (9); The surface of the rotating shaft (9) is fixedly connected to a turntable (10). Both the rotating shaft (9) and the turntable (10) are hollow. Four exhaust holes are provided on the surface of the turntable (10). A connecting block (12) is fixedly connected to the upper end of the turntable (10). A second single-crystalline silicon drying frame (13) is slidably connected to the upper end of the turntable (10); A limiting block (14) is snap-connected to the surface of the second single-crystalline silicon drying frame (13). A first through hole (16) is provided on the surface of the second single-crystalline silicon drying frame (13). A second through hole (17) is provided on the surface of the limiting block (14). A limiting rod (15) is snap-connected inside the second single-crystalline silicon drying frame (13). The limiting rod (15) is snap-connected to the limiting block (14); A plurality of first single-crystalline silicon drying frames (7) are arranged between the two fixed frames (1).

2. The drying rack for monocrystalline silicon wafer production according to claim 1, characterized in that: The single-crystalline silicon drying component further includes connecting rods (2). There are four connecting rods (2). All four connecting rods (2) are fixedly connected to the two fixed frames (1). A plurality of first drying frame support brackets (4) are fixedly connected to the surfaces of the four connecting rods (2); A second drying frame support bracket (5) is provided on the opposite surfaces of the two fixed frames (1). The second drying frame support bracket (5) is in the shape of "丰". Two connecting brackets (6) are provided on the front side of the fixed frame (1). Bolts are threadedly connected inside the two connecting brackets (6). The second drying frame support bracket (5) is fixedly connected to the two fixed frames (1) through the two connecting brackets (6).

3. A drying rack for monocrystalline silicon wafer production according to claim 1, characterized in that: The number of the turntable (10), the connecting block (12), the second single-crystalline silicon drying frame (13), and the limiting block (14) is five, and they are all arranged on the surface of the rotating shaft (9); The plurality of first single-crystalline silicon drying frames (7) are all square and have ventilation holes at the bottom. The five second single-crystalline silicon drying frames (13) are all disc-shaped and also have ventilation holes at the bottom.

4. A drying rack for monocrystalline silicon wafer production according to claim 2, characterized in that: The number of the second drying frame support brackets (5) and the connecting brackets (6) is two groups, which are symmetrically arranged on the front and back sides of the fixed frame (1) respectively.

5. A drying rack for monocrystalline silicon wafer production according to claim 1, characterized in that: The plurality of first single-crystalline silicon drying frames (7) are respectively slidably connected to the corresponding second drying frame support brackets (5) and first drying frame support brackets (4).

6. A drying rack for monocrystalline silicon wafer production according to claim 1, characterized in that: Four support legs are fixedly connected to the lower end of the lower fixed frame (1). Two fixing frames (3) are arranged between the two fixed frames (1). The two fixing frames (3) are in the shape of "X"; The two fixing frames (3) are respectively fixedly connected to the corresponding connecting rods (2). Reinforcing ribs are provided at the joints of the four connecting rods (2) and the two fixed frames (1).

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